CN115805116A - Preparation method of high-purity optical coating material silicon dioxide - Google Patents

Abstract

The invention relates to the technical field of silicon dioxide preparation, and discloses a preparation method of high-purity optical coating material silicon dioxide, which comprises the following preparation steps: throw in the quartz raw materials to breaker inside respectively, further effectual broken quartz raw materials through the crushing roller, the material after the breakage falls into the unloading passageway, get into crushing grinder through feed inlet one, automated control drive shaft and crushing grinding plate grind and smash quartz granule, large granule quartz cake or impurity persist in crushing grinder's inboard bottom, adsorb including the metalliferous granule in the quartz granule through the magnetism board of inhaling, open the baffle of unloading and can take out it, start the fan of silica dust transfer mechanism, inhale inside quartz powder material gets into the sieving mechanism through feed inlet two, higher purity silica is collected through the silica discharge gate, be convenient for strike through the multiple processes, breakage and grinding crushing silica raw materials, combine to adsorb to shift and the vibration screening makes the purity of preparation material higher.

Description

Preparation method of high-purity optical coating material silicon dioxide

Technical Field

The invention relates to the technical field of silicon dioxide preparation, in particular to a preparation method of high-purity optical coating material silicon dioxide.

Background

The high-purity silicon dioxide has excellent physical and chemical characteristics, high hardness, high temperature resistance, corrosion resistance, low conductivity, good wave-transmitting performance and stable performance. Especially, the intrinsic molecular chain structure, the crystal shape and the lattice change rule thereof ensure that the material has small thermal expansion coefficient, high insulation, piezoelectric effect, resonance effect and unique optical characteristics, and is more and more widely applied in various high-tech fields such as novel electric light sources, microelectronics, high-insulation sealing, aerospace, national defense war industry and the like. With the rapid development of high and new technology industries such as optical fiber industry, electronic industry, microelectronic industry and the like, the requirement for high-purity ultrafine silicon dioxide is higher and higher, and the demand is also higher and higher.

The existing preparation of the optical coating material silicon dioxide has the following defects: the silicon dioxide raw materials or the impurity content adopted by the method are very different, the purity of the high-purity superfine quartz powder prepared by the traditional process cannot be guaranteed, the production efficiency is low, the automation degree is low, and the large-scale application is inconvenient. For this reason, a corresponding technical scheme needs to be designed for solution.

Disclosure of Invention

Technical problem to be solved

Aiming at the defects of the prior art, the invention provides a preparation method of high-purity optical coating material silicon dioxide, which solves the technical problems that the adopted silicon dioxide raw material or impurity content is very different, the purity of high-purity superfine quartz powder prepared by the traditional process cannot be ensured, the production efficiency is low, the automation degree is low, and the large-scale application is inconvenient.

(II) technical scheme

In order to realize the purpose, the invention is realized by the following technical scheme: a preparation method of high-purity optical coating material silicon dioxide comprises the following preparation steps:

s1, respectively feeding quartz raw materials into a crushing device, automatically starting an air cylinder of an impact mechanism, and controlling a pneumatic rod to rapidly stretch so that an impact head directly impacts massive quartz raw materials, and further effectively crushing the quartz raw materials through a crushing roller;

s2, the crushed material falls into a blanking channel, an electric push rod device is automatically started, a push rod is controlled to stretch, so that a blanking baffle plate moves rightwards, the safety limit of the blanking baffle plate is realized through a second limit plate, the blanking baffle plate is closed after blanking is finished, and the blanking baffle plate is sealed and closed through the first limit plate;

s3, feeding the quartz powder into a crushing and grinding device through the first feeding hole, falling into the crushing and grinding device through a tip structure at the top of the sliding adjusting device, starting a driving motor, and automatically controlling a driving shaft and a crushing and grinding plate to grind and grind crushed quartz particles;

s4, combining a sliding adjusting device, automatically controlling the transverse sliding adjusting position outside the sliding rod, fully grinding, and pushing out the quartz particles through an extending push plate to avoid blocking;

s5, large-particle quartz blocks or impurities are reserved at the bottom of the inner side of the grinding device, metal-containing particles in the quartz particles are adsorbed through a magnetic attraction plate, and the quartz particles can be taken out by opening an unloading baffle;

s6, starting a fan of the silicon dioxide dust transfer mechanism, so that the quartz powder material is sucked into the silicon dioxide dust transfer mechanism through an air suction opening at the inner side end of an air suction pipe, is discharged through an air outlet at the bottom of an air outlet pipe, and enters the interior of the screening device through a feeding opening II;

and S7, starting the vibration device to vibrate the screening device, screening the falling through the through holes in the screening plate, discharging the impurity floating objects out of the impurity collecting device through the impurity discharging port, collecting the impurity floating objects through the discharging port, and discharging and collecting the high-purity silicon dioxide through the silicon dioxide discharging port.

Preferably, the crushing roller is arranged and distributed in the crushing device, the blanking channel is fixedly arranged at the bottom of the crushing device, the crushing and grinding device is fixedly arranged at the bottom of the blanking channel, the crushing and grinding device can effectively crush quartz raw materials through the crushing roller, the first supporting leg is welded at the lower end of the side part of the crushing device, the cross rods are welded and distributed between the side part of the crushing and grinding device and the first supporting leg, the silicon dioxide dust transfer mechanism is connected to the right side of the crushing and grinding device in a penetrating mode, and the screening device is arranged at the lower end of the silicon dioxide dust transfer mechanism.

Preferably, the impact mechanism is arranged and distributed at the upper end inside the crushing device and comprises an air cylinder and an impact head, the air cylinder is embedded inside the crushing device, the inner side end of the air cylinder is connected with a pneumatic rod, the impact head is welded at the lower end of the pneumatic rod, and the air cylinder of the impact mechanism is started to control the pneumatic rod to rapidly stretch and retract, so that the impact head directly impacts massive quartz raw materials.

Preferably, the inside of unloading passageway is equipped with the unloading baffle, the medial extremity welding of unloading baffle has limiting plate two, the medial extremity of limiting plate two is the arc structure, the lateral extremity welding of unloading baffle has limiting plate one, the outer end welding of limiting plate one has the push rod, the outer end of push rod is connected with the electric putter device, the bottom of electric putter device is equipped with the mounting bracket, the mounting bracket passes through bolted connection in the upper right end of smashing grinder, and it is flexible to start electric putter device control push rod for the unloading baffle moves the unloading to the right, through limiting plate two safety limits.

Preferably, feed inlet one has been seted up at crushing grinder's top, crushing grinder's inside upper end is equipped with the slide bar, the outer end sliding connection of slide bar has sliding adjustment device, the fixed push pedal that extends that is equipped with in sliding adjustment device's both ends, sliding adjustment device's the fixed most advanced structure that is equipped with in top, sliding adjustment device's welded distribution has the fixed axle, the bottom welding of fixed axle has driving motor, driving motor's bottom is connected with the drive shaft, the fixed grinding board that is equipped with in bottom of drive shaft, automated control drive shaft and grinding board grind and smash quartz granules, and sliding adjustment device automated control is fully ground at the outside lateral sliding adjusting position of slide bar, and the quartz granules of release are avoided blockking through extending the push pedal.

Preferably, smash grinder's bottom both ends and be equipped with the baffle of unloading, the fixed magnetism suction disc that is equipped with in top of the baffle of unloading, the fixed outer mounting panel that is equipped with in bottom of the baffle of unloading, bolted connection is passed through in grinder's bottom in the outer end of outer mounting panel, the bottom welding of outer mounting panel has the handle, and large granule quartz capsule or impurity persist in the inboard bottom of smashing grinder, and the board adsorbs including the granule in the quartz capsule through magnetism, opens the baffle of unloading and can take out it.

Preferably, silica dust shifts mechanism is including fan, aspiration channel and play tuber pipe, the top welding of fan has the fixing base, the fixing base welds in the right-hand member of supporting leg one, the aspiration channel is connected in the medial extremity of fan, aspiration channel through connection is in the inside of smashing grinder, the medial extremity of aspiration channel is equipped with the inlet scoop, it connects in the right-hand member of fan to go out the tuber pipe, the lower extreme that goes out the tuber pipe is equipped with the air outlet, and quartz powder material inhales through aspiration channel and inlet scoop, passes through again to go out tuber pipe and air outlet discharge, inside two entering sieving mechanisms of feed inlet.

Preferably, a second feeding port is formed in the top of the screening device, the air outlet is formed in the top of the second feeding port, supporting legs are arranged on the outer side of the screening device in a welding mode, a screening plate is arranged inside the screening device and is of a structure inclining rightwards, through holes are formed in the screening plate in a distributed mode, an impurity discharging port is formed in the right side of the screening device and is formed in the right end of the screening plate, an impurity collecting device is arranged at the outer end of the impurity discharging port, a discharging port is formed in the bottom of the impurity collecting device, vibrating devices are installed at two ends of the bottom of the screening device, a silicon dioxide discharging port is formed in the middle of the bottom of the screening device, silicon dioxide with high purity is obtained in a vibrating screening falling mode, and impurity floating objects are discharged out of the impurity collecting device through the impurity discharging port.

(III) advantageous effects

The preparation method of the high-purity optical coating material silicon dioxide is convenient for sequentially impacting, crushing and grinding the silicon dioxide raw material through multiple processes, and the purity of the prepared material is higher by combining adsorption transfer and vibration screening, the process structural design is reasonable, the production efficiency is improved, the automation degree is high, and the preparation method is suitable for industrial large-scale application.

Drawings

FIG. 1 is a schematic view of the overall structure of the present invention;

FIG. 2 is a schematic view of the impact mechanism of the present invention;

FIG. 3 is a schematic view of an internal baffle adjustment mechanism of the blanking channel of the present invention;

FIG. 4 is a perspective view of the damper adjustment mechanism of the present invention;

FIG. 5 is a schematic view of the crushing and grinding apparatus according to the present invention;

FIG. 6 is a schematic view of the inside of the crushing and grinding apparatus according to the present invention;

FIG. 7 is a schematic view of a magnetic discharging plate according to the present invention;

FIG. 8 is a schematic view of a dust transfer mechanism of the present invention;

fig. 9 is a schematic view of the internal structure of the screening apparatus of the present invention.

In the figure, the crushing device 1, the impact mechanism 11, the cylinder 111, the pneumatic rod 112, the impact head 113, the crushing roller 12, the first support leg 13, the cross rod 14, the blanking channel 15, the electric push rod device 151, the push rod 152, the blanking baffle 153, the first limit plate 1531, the second limit plate 1532, the mounting rack 154, the crushing and grinding device 2, the first feed inlet 21, the blanking baffle 22, the outer mounting plate 221, the magnetic suction plate 222, the handle 223, the slide adjusting device 23, the slide rod 231, the tip structure 232, the extension push plate 233, the crushing and grinding plate 24, the drive shaft 241, the drive motor 242, the fixed shaft 243, the silica dust transfer mechanism 3, the fan 30, the fixed seat 301, the air suction pipe 31, the air suction inlet 311, the air outlet pipe 32, the air outlet 321, the screening device 4, the second support leg 41, the second feed inlet 42, the silica discharge outlet 43, the screening plate 44, the through hole 441, the impurity discharge outlet 45, the impurity collecting device 451, the discharge outlet 452 and the vibrating device 46.

Detailed Description

The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be obtained by a person skilled in the art without making any creative effort based on the embodiments in the present invention, belong to the protection scope of the present invention.

Referring to fig. 1 to 9, an embodiment of the invention provides a technical solution: a preparation method of high-purity optical coating material silicon dioxide comprises the following preparation steps:

s1, respectively feeding quartz raw materials into a crushing device 1, automatically starting an air cylinder 111 of an impact mechanism 11, and controlling a pneumatic rod 112 to rapidly stretch and retract so that an impact head 113 directly impacts massive quartz raw materials, and further effectively crushing the quartz raw materials through a crushing roller 12;

s2, the crushed materials fall into the blanking channel 15, the electric push rod device 151 is automatically started, the push rod 152 is controlled to stretch, the blanking baffle 153 moves rightwards, the materials are safely limited by the second limiting plate 1532, the blanking baffle 153 is closed after blanking is finished, and the materials are sealed and closed by the first limiting plate 1531;

s3, the quartz powder enters the crushing and grinding device 2 through the first feeding hole 21, falls into the crushing and grinding device 2 through the tip structure 232 at the top of the sliding adjusting device 23, starts the driving motor 242, and automatically controls the driving shaft 241 and the crushing and grinding plate 24 to grind and grind crushed quartz particles;

s4, combining the sliding adjusting device 23, automatically controlling the transverse sliding adjusting position outside the sliding rod 231, fully grinding, and pushing out the quartz particles through the extension push plate 233 to avoid blocking;

s5, large-particle quartz blocks or impurities are left at the bottom of the inner side of the crushing and grinding device 2, metal-containing particles in the quartz particles are adsorbed by the magnetic adsorption plate 222, and the discharge baffle 22 is opened to take out the quartz particles;

s6, starting the fan 30 of the silicon dioxide dust transfer mechanism 3, so that the quartz powder material is sucked into the quartz powder material through the suction opening 311 at the inner side end of the suction pipe 31, is discharged through the air outlet 321 at the bottom of the air outlet pipe 32, and enters the screening device 4 through the second feeding hole 42;

and S7, starting the vibration device 46 to enable the screening device 4 to vibrate, screening and falling through the through hole 441 in the screening plate 44, discharging the impurity floating objects to the impurity collecting device 451 through the impurity discharging port 45, collecting through the discharging port 452, and discharging and collecting the high-purity silicon dioxide through the silicon dioxide discharging port 43.

Further improve ground, the internally mounted of breaker 1 distributes and has crushing roller 12, the fixed unloading passageway 15 that is equipped with in bottom of breaker 1, the fixed grinding device 2 that smashes that is equipped with in bottom of unloading passageway 15, pass through the effectual broken quartz raw materials of crushing roller 12 again, the welding of lateral part lower extreme of breaker 1 has supporting leg 13, it has horizontal pole 14 to smash welding distribution between the lateral part of grinding device 2 and supporting leg 13, the right side through connection of smashing grinding device 2 has silica dust to shift mechanism 3, the lower extreme of silica dust shift mechanism 3 is equipped with sieving mechanism 4.

Further improved, the impact mechanism 11 is installed and distributed at the upper end inside the crushing device 1, the impact mechanism 11 comprises an air cylinder 111 and an impact head 113, the air cylinder 111 is embedded inside the crushing device 1, the inner side end of the air cylinder 111 is connected with a pneumatic rod 112, the impact head 113 is welded at the lower end of the pneumatic rod 112, the air cylinder 111 of the impact mechanism 11 is started to control the pneumatic rod 112 to rapidly extend and retract, and therefore the impact head 113 directly impacts massive quartz raw materials.

Further improved ground, the inside of unloading passageway 15 is equipped with unloading baffle 153, the inboard end welding of unloading baffle 153 has two 1532 of limiting plate, the inboard end of two 1532 of limiting plate is the arc structure, the outboard end welding of unloading baffle 153 has one 1531 of limiting plate, the outer end welding of one 1531 of limiting plate has push rod 152, the outer end of push rod 152 is connected with electric putter device 151, electric putter device 151's bottom is equipped with mounting bracket 154, mounting bracket 154 passes through bolted connection in the upper right end of smashing grinder 2, it is flexible to start electric putter device 151 control push rod 152, make unloading baffle 153 remove the unloading to the right, it is safe spacing through two 1532 of limiting plate.

In a further improvement, a first feeding hole 21 is formed in the top of the crushing and grinding device 2, a sliding rod 231 is arranged at the upper end inside the crushing and grinding device 2, a sliding adjusting device 23 is slidably connected to the outer end of the sliding rod 231, extending push plates 233 are fixedly arranged at two ends of the sliding adjusting device 23, a tip structure 232 is fixedly arranged at the top of the sliding adjusting device 23, a fixed shaft 243 is welded to the sliding adjusting device 23, a driving motor 242 is welded to the bottom of the fixed shaft 243, a driving shaft 241 is connected to the bottom of the driving motor 242, a crushing and grinding plate 24 is fixedly arranged at the bottom of the driving shaft 241, the automatic control driving shaft 241 and the crushing and grinding plate 24 grind and grind crushed quartz particles, the sliding adjusting device 23 automatically controls transverse sliding adjusting positions outside the sliding rod 231 to be fully ground, and the quartz particles are pushed out through the extending push plates 233 to avoid blocking.

Further improved, the two ends of the bottom of the grinding device 2 are provided with the discharge baffle 22, the top of the discharge baffle 22 is fixedly provided with the magnetic suction plate 222, the bottom of the discharge baffle 22 is fixedly provided with the outer mounting plate 221, the outer end of the outer mounting plate 221 is connected to the bottom of the grinding device 2 through a bolt, the bottom of the outer mounting plate 221 is welded with the handle 223, large-particle quartz blocks or impurities are reserved at the bottom of the inner side of the grinding device 2, the magnetic suction plate 222 adsorbs metal-containing particles in the quartz particles, and the discharge baffle 22 is opened to be taken out.

Further improve ground, silica dust transfer mechanism 3 is including fan 30, aspiration channel 31 and play tuber pipe 32, the welding of fan 30's top has fixing base 301, fixing base 301 welds in the right-hand member of supporting leg 13, aspiration channel 31 is connected in the medial extremity of fan 30, aspiration channel 31 through connection is in the inside of smashing grinder 2, the medial extremity of aspiration channel 31 is equipped with inlet scoop 311, it connects in the right-hand member of fan 30 to go out tuber pipe 32, the lower extreme that goes out tuber pipe 32 is equipped with air outlet 321, quartz powder material inhales through aspiration channel and inlet scoop, discharge through going out tuber pipe and air outlet again, inside feed inlet two gets into sieving mechanism 4.

Specifically, improve ground, feed inlet two 42 has been seted up at sieving mechanism 4's top, the top of feed inlet two 42 is located to air outlet 321, sieving mechanism 4's outside welded distribution has supporting leg two 41, sieving mechanism 4's inside is equipped with sieve plate 44, sieve plate 44 is the structure that inclines to the right side, sieve plate 44's inside is seted up and is distributed and is had through-hole 441, impurity feed opening 45 has been seted up on sieving mechanism 4's right side, impurity feed opening 45 locates sieve plate 44's right-hand member, impurity feed opening 45's outer end is equipped with impurity collection device 451, impurity collection device 451's bottom is equipped with discharge port 452, vibrating device 46 is installed at sieving mechanism 4's bottom both ends, sieving mechanism 4's bottom middle-end is equipped with silica discharge gate 43, the vibration screening whereabouts obtains higher purity silica, the impurity floater is arranged in impurity collection device through impurity feed opening.

The working principle is as follows: quartz raw materials are respectively put into the crushing device 1, the air cylinder 111 of the impact mechanism 11 is automatically started, the air pressure rod 112 is controlled to rapidly stretch and retract, so that the impact head 113 directly impacts massive quartz raw materials, the massive quartz raw materials are further and effectively crushed by the crushing roller 12, the crushed materials fall into the blanking channel 15, the electric push rod device 151 is automatically started to control the push rod 152 to stretch and retract, the blanking baffle 153 moves rightwards to perform blanking, the quartz raw materials are safely limited by the second limiting plate 1532, after the blanking is finished, the blanking baffle 153 is closed, the quartz raw materials are hermetically closed by the first limiting plate 1531 and enter the crushing and grinding device 2 through the first feeding hole 21, the quartz raw materials fall into the crushing and grinding device 2 through the tip structure 232 at the top of the sliding adjusting device 23 to avoid accumulation, the driving motor 242 is started to automatically control the driving shaft 241 and the crushing and grinding plate 24 to grind and grind quartz particles, the sliding adjusting device 23 is combined to automatically control the transverse sliding adjusting position outside the sliding rod 231 to fully grind, large-particle quartz blocks or impurities are reserved at the bottom of the inner side of the grinding device 2, metal-containing particles in the quartz particles are adsorbed by the magnetic suction plate 222, the discharging baffle 22 is opened to take out the quartz particles, the fan 30 of the silicon dioxide dust transfer mechanism 3 is started to ensure that the quartz powder material sucks the quartz powder material through the suction opening 311 at the inner side end of the suction pipe 31, the material is discharged through the air outlet 321 at the bottom of the air outlet pipe 32 and enters the screening device 4 through the two feed inlets 42, the vibration device 46 is started to ensure that the screening device 4 vibrates and is screened and dropped through the through hole 441 in the screening plate 44, the impurity floating objects are discharged from the impurity collecting device 451 through the impurity discharge opening 45 and are collected through the discharge opening 452, and the high-purity silicon dioxide is discharged and collected through the silicon dioxide discharge opening 43, the multiple processes of impacting, crushing and grinding the crushed silicon dioxide raw material, and combining adsorption transfer and vibration screening make the purity of the prepared material higher.

The invention relates to a crushing device 1, an impact mechanism 11, a cylinder 111, a pneumatic rod 112, an impact head 113, a crushing roller 12, a first supporting leg 13, a cross rod 14, a blanking channel 15, an electric push rod device 151, a push rod 152, a blanking baffle 153, a first limiting plate 1531, a second limiting plate 1532, a mounting rack 154, a crushing and grinding device 2, a first feed inlet 21, a blanking baffle 22, an outer mounting plate 221, a magnetic suction plate 222, a handle 223, a sliding adjusting device 23, a sliding rod 231, a tip structure 232, an extending push plate 233, a crushing and grinding plate 24, a driving shaft 241, a driving motor 242, a fixed shaft 243, a silica dust transfer mechanism 3, a fan 30, a fixed seat 301, an air suction pipe 31, an air suction opening 311, an air outlet pipe 32, an air outlet 321, a screening device 4, a second supporting leg 41, a second feed inlet 42, a silica discharge opening 43, a screening plate 44, a through hole 441, an impurity discharge opening 45, an impurity collecting device 451, a discharge opening 452 and a vibrating device 46, the parts are all universal standard parts or parts known by technicians in the field, the structure and the principle of the parts can be known by technicians through technical manuals or conventional experimental methods, the problems of the invention are that the adopted silicon dioxide raw materials or the impurity content is very different, the purity of the high-purity superfine quartz powder prepared by the traditional process cannot be guaranteed, the production efficiency is low, the automation degree is low, and the large-scale application is inconvenient.

While there have been shown and described what are at present considered the fundamental principles and essential features of the invention and its advantages, it will be apparent to those skilled in the art that the invention is not limited to the details of the foregoing exemplary embodiments, but is capable of other specific forms without departing from the spirit or essential characteristics thereof. The present embodiments are therefore to be considered in all respects as illustrative and not restrictive, the scope of the invention being indicated by the appended claims rather than by the foregoing description, and all changes which come within the meaning and range of equivalency of the claims are therefore intended to be embraced therein. Any reference sign in a claim should not be construed as limiting the claim concerned.

Furthermore, it should be understood that although the present specification describes embodiments, not every embodiment includes only a single embodiment, and such description is for clarity purposes only, and it is to be understood that all embodiments may be combined as appropriate by one of ordinary skill in the art to form other embodiments as will be apparent to those of skill in the art from the description herein.

Claims (8)

1. A preparation method of high-purity optical coating material silicon dioxide is characterized by comprising the following preparation steps:

s1, respectively feeding quartz raw materials into a crushing device (1), automatically starting an air cylinder (111) of an impact mechanism (11), and controlling a pneumatic rod (112) to rapidly extend and retract so that an impact head (113) directly impacts massive quartz raw materials, and further effectively crushing the quartz raw materials through a crushing roller (12);

s2, the crushed material falls into the blanking channel (15), the electric push rod device (151) is automatically started, the push rod (152) is controlled to stretch and retract, so that the blanking baffle (153) moves rightwards and is safely limited by the second limiting plate (1532), after blanking is finished, the blanking baffle (153) is closed, and the blanking baffle is sealed and closed by the first limiting plate (1531);

s3, the quartz particles enter the crushing and grinding device (2) through the feeding hole I (21), fall into the crushing and grinding device (2) through a tip structure (232) at the top of the sliding adjusting device (23), start a driving motor (242), and automatically control a driving shaft (241) and a crushing and grinding plate (24) to grind and grind the crushed quartz particles;

s4, combining with a sliding adjusting device (23), automatically controlling the transverse sliding adjusting position outside the sliding rod (231), fully grinding, and pushing out the quartz particles through an extending push plate (233) to avoid blocking;

s5, large-particle quartz blocks or impurities are left at the bottom of the inner side of the grinding device (2), metal-containing particles in the quartz particles are adsorbed by a magnetic adsorption plate (222), and the quartz blocks or impurities can be taken out by opening a discharge baffle (22);

s6, starting a fan (30) of the silicon dioxide dust transfer mechanism (3) to enable the quartz powder material to be sucked into the quartz powder material through an air suction opening (311) at the inner side end of an air suction pipe (31), discharging the material through an air outlet (321) at the bottom of an air outlet pipe (32), and enabling the material to enter the screening device (4) through a second feeding opening (42);

and S7, starting the vibration device (46) to enable the screening device (4) to vibrate, screening and falling through the through hole (441) in the screening plate (44), discharging the impurity floating objects to the impurity collecting device (451) through the impurity discharging hole (45), collecting through the discharging hole (452), and discharging and collecting the high-purity silicon dioxide through the silicon dioxide discharging hole (43).

2. The method for preparing high-purity optical coating material silicon dioxide according to claim 1, characterized by comprising the following steps: the utility model discloses a crushing device, including breaker (1), fixed unloading passageway (15) that are equipped with in the bottom of breaker (1), the fixed grinding device (2) that smash that is equipped with in bottom of unloading passageway (15), the welding of the lateral part lower extreme of breaker (1) has supporting leg (13), it has horizontal pole (14) to smash welding distribution between the lateral part of grinding device (2) and supporting leg (13), the right side through connection of smashing grinding device (2) has silica dust transfer mechanism (3), the lower extreme of silica dust transfer mechanism (3) is equipped with sieving mechanism (4).

3. The method for preparing high-purity optical coating material silicon dioxide according to claim 1, characterized by comprising the following steps: the crushing device is characterized in that impact mechanisms (11) are arranged and distributed at the upper end of the interior of the crushing device (1), each impact mechanism (11) comprises an air cylinder (111) and an impact head (113), the air cylinders (111) are embedded in the crushing device (1), the inner side ends of the air cylinders (111) are connected with air pressure rods (112), and the impact heads (113) are welded at the lower ends of the air pressure rods (112).

4. The method for preparing high-purity optical coating material silicon dioxide according to claim 2, characterized in that: the inside of unloading passageway (15) is equipped with unloading baffle (153), the inboard end welding of unloading baffle (153) has two (1532) of limiting plate, the inboard end of two (1532) of limiting plate is the arc structure, the outside end welding of unloading baffle (153) has one (1531) of limiting plate, the outer end welding of one (1531) of limiting plate has push rod (152), the outer end of push rod (152) is connected with electric putter device (151), the bottom of electric putter device (151) is equipped with mounting bracket (154), mounting bracket (154) are through bolted connection in the upper right end of smashing grinder (2).

5. The method for preparing high-purity optical coating material silicon dioxide according to claim 1, characterized in that: feed inlet one (21) has been seted up at the top of smashing grinder (2), the inside upper end of smashing grinder (2) is equipped with slide bar (231), the outer end sliding connection of slide bar (231) has slide adjusting device (23), the fixed push pedal (233) that extends that is equipped with in both ends of slide adjusting device (23), the fixed most advanced structure (232) that is equipped with in top of slide adjusting device (23), the welded distribution of slide adjusting device (23) has fixed axle (243), the bottom welding of fixed axle (243) has driving motor (242), the bottom of driving motor (242) is connected with drive shaft (241), the fixed grinding board (24) that smashes that is equipped with in bottom of drive shaft (241).

6. The method for preparing high-purity optical coating material silicon dioxide according to claim 1, characterized in that: smash the bottom both ends of grinder (2) and be equipped with baffle (22) of unloading, the fixed magnetism that is equipped with in top of baffle (22) of unloading inhales board (222), the fixed outer mounting panel (221) that is equipped with in bottom of baffle (22) of unloading, bolted connection is passed through in the bottom of smashing grinder (2) in the outer end of outer mounting panel (221), the bottom welding of outer mounting panel (221) has handle (223).

7. The method for preparing high-purity optical coating material silicon dioxide according to claim 1, characterized in that: silica dust shifts mechanism (3) including fan (30), aspiration channel (31) and play tuber pipe (32), the top welding of fan (30) has fixing base (301), fixing base (301) weld in the right-hand member of supporting leg (13), aspiration channel (31) are connected in the medial extremity of fan (30), aspiration channel (31) through connection is in the inside of smashing grinder (2), the medial extremity of aspiration channel (31) is equipped with inlet scoop (311), it connects in the right-hand member of fan (30) to go out tuber pipe (32), the lower extreme that goes out tuber pipe (32) is equipped with air outlet (321).

8. The method for preparing high-purity optical coating material silicon dioxide according to claim 1, characterized by comprising the following steps: feed inlet two (42) have been seted up at the top of sieving mechanism (4), the top of feed inlet two (42) is located in air outlet (321), the outside welded distribution of sieving mechanism (4) has supporting leg two (41), the inside of sieving mechanism (4) is equipped with screening plate (44), screening plate (44) are right slope structure, the inside of screening plate (44) is seted up and is distributed and is had through-hole (441), impurity feed opening (45) have been seted up on the right side of sieving mechanism (4), the right-hand member of screening plate (44) is located in impurity feed opening (45), the outer end of impurity feed opening (45) is equipped with impurity collection device (451), the bottom of impurity collection device (451) is equipped with discharge port (452), vibrating device (46) are installed to the bottom both ends of sieving mechanism (4), the bottom middle end of sieving mechanism (4) is equipped with silica discharge gate (43).

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