CN115789520A

CN115789520A - Liquid source supply device and method and semiconductor process system

Info

Publication number: CN115789520A
Application number: CN202211451356.8A
Authority: CN
Inventors: 纪雪峰; 陈亮; 范威威
Original assignee: Shanghai Liangwei Electromechanical Engineering Co ltd
Current assignee: Shanghai Liangwei Electromechanical Engineering Co ltd
Priority date: 2022-11-20
Filing date: 2022-11-20
Publication date: 2023-03-14

Abstract

The invention relates to a liquid source supply device, a liquid source supply method and a semiconductor process system. The liquid storage unit and the buffer unit are used for carrying out double backup, the liquid storage unit can be only closed under the condition that the liquid source of the liquid storage unit is insufficient, the buffer unit continues to supply the liquid source to the process chamber, the condition that the process chamber is stopped and started is avoided, the production efficiency is greatly improved, the production yield is improved, and meaningless loss is reduced; by utilizing the dual functions of the exhaust unit and the blowing unit, when the liquid storage unit is replaced, the pipeline unit communicated with the liquid storage unit can be exhausted and blown, so that the pipeline unit is clean and free of impurities, and the replaced liquid storage unit is prevented from being polluted; the gas-liquid separation unit is used for carrying out gas-liquid separation on the liquid source, so that the liquid source carrying trace gas is prevented from entering the process chamber, and the production stability is ensured.

Description

Liquid source supply device and method and semiconductor process system

Technical Field

The invention relates to the technical field of semiconductor production, in particular to a liquid source supply device and method and a semiconductor process system.

Background

In the semiconductor production process, the stable liquid source supply can ensure the production efficiency and the production yield. However, due to the limited volume of the liquid source supply equipment (e.g., gas cylinders), etc., when the weight of the liquid source is below a safe threshold, the entire semiconductor manufacturing line may need to be shut down to replace the liquid source supply equipment.

In the shutdown process, impurities exist in the pipeline due to the fact that the gas cylinder is replaced, and the pipeline needs to be cleaned after replacement. Resulting in extended overall down time for maintenance and thus lost production.

In addition, in the process of supplying the liquid source, the liquid source is driven to flow by air pressure, so that a certain amount of gas can be dissolved in the liquid source, and if the gas dissolved in the liquid source is not removed, the yield of semiconductor production is low, and loss is caused.

When the liquid source is normally supplied and the gas cylinder is replaced, the pressure of a pipeline cannot be determined, and if pressure changes exist, semiconductor production is affected.

In addition, in the process flow, due to the reason of pipeline tightness and the damage of partial equipment, the liquid leakage situation can occur, and further the safety can not be ensured.

At present, an effective solution is not provided aiming at the problems that the gas cylinder needs to be stopped and replaced, the pipeline cannot be cleaned in the production process, the gas in the liquid source cannot be removed, the pressure change of the pipeline cannot be detected, the liquid leakage condition cannot be detected and the like in the related technology.

Disclosure of Invention

The invention aims to provide a liquid source supply device, a liquid source supply method and a semiconductor process system aiming at the defects in the prior art, and aims to solve the problems that in the related art, a gas cylinder needs to be stopped for replacement, a pipeline cannot be cleaned in the production process, gas in a liquid source cannot be removed, the pressure change of the pipeline cannot be detected, the leakage situation cannot be detected and the like.

In order to achieve the purpose, the invention adopts the technical scheme that:

in a first aspect, the present invention provides a liquid source supply apparatus, comprising:

the liquid storage unit is used for storing a liquid source;

the buffer unit is arranged at the downstream of the liquid storage unit, is communicated with the liquid storage unit and is used for buffering a liquid source;

the gas supply unit is arranged at the upstream of the liquid storage unit and the buffer unit, is respectively communicated with the liquid storage unit and the buffer unit, and is used for respectively supplying gas to the liquid storage unit and the buffer unit so that the liquid source of the liquid storage unit flows to the buffer unit and the liquid source of the buffer unit flows downstream;

the gas-liquid separation unit is arranged at the downstream of the buffer unit, is communicated with the buffer unit, and is used for carrying out gas-liquid separation on the liquid source flowing downstream of the buffer unit so as to remove gas in the liquid source and flowing the liquid source subjected to gas-liquid separation to the process chamber;

the exhaust unit is communicated with the liquid storage unit and is used for providing vacuum negative pressure for the liquid storage unit;

and the purging unit is communicated with the liquid storage unit and is used for supplying gas to the liquid storage unit and purging the liquid storage unit before and after the liquid storage unit is replaced.

In some embodiments, the buffer unit is further communicated with the exhaust unit and the purge unit respectively.

In some of these embodiments, the reservoir unit comprises:

the liquid storage element is respectively communicated with the buffer unit, the gas supply unit, the exhaust unit and the purging unit and is used for storing a liquid source;

a first valve element disposed in a line communicating with the liquid storage element and located upstream of the liquid storage element, downstream of the gas supply unit, downstream of the exhaust unit, and downstream of the purge unit;

a second valve element provided in a line communicating with the liquid storage element, and located downstream of the liquid storage element, upstream of the buffer unit, downstream of the exhaust unit, and downstream of the purge unit;

the first weight monitoring element is arranged below the liquid storage element and used for monitoring weight information of the liquid storage element;

the first pressure monitoring element is arranged on a pipeline communicated with the liquid storage element, is positioned at the upstream of the liquid storage element, and is used for monitoring pressure information of an inlet position of the liquid storage element;

and the second pressure monitoring element is arranged on a pipeline communicated with the liquid storage element, is positioned at the downstream of the liquid storage element and is used for monitoring pressure information of the outlet position of the liquid storage element.

In some of these embodiments, the buffer unit comprises:

the buffer element is respectively communicated with the liquid storage unit, the gas supply unit and the gas-liquid separation unit and is used for buffering a liquid source;

a third valve element disposed on a conduit in communication with the cushioning element and between the reservoir unit and the cushioning element;

a second weight-monitoring element disposed below the cushioning element for monitoring weight information of the cushioning element.

In some of these embodiments, the buffer unit further comprises:

a thirteenth valve element provided in a line communicating with the buffer element and located upstream of the buffer element, downstream of the gas supply unit, downstream of the exhaust unit, downstream of the purge unit;

a fourteenth valve element that is provided in a pipeline communicating with the buffer element, and that is located downstream of the buffer element, upstream of the gas-liquid separation unit, downstream of the exhaust unit, and downstream of the purge unit;

the seventh pressure monitoring element is arranged on a pipeline communicated with the buffer element, is positioned at the upstream of the buffer element and is used for monitoring the pressure information of the inlet position of the buffer element;

and the eighth pressure monitoring element is arranged on a pipeline communicated with the buffer element, is positioned at the downstream of the buffer element and is used for monitoring the pressure information of the outlet position of the buffer element.

In some of these embodiments, the gas supply unit includes:

the first gas supply element is arranged at the upstream of the liquid storage unit, is communicated with the liquid storage unit and is used for supplying gas to the liquid storage unit so as to enable a liquid source of the liquid storage unit to flow to the buffer unit;

the second gas supply element is arranged at the upstream of the buffer unit, is communicated with the buffer unit and is used for supplying gas to the buffer unit so as to enable the liquid source of the buffer unit to flow to the gas-liquid separation unit;

a fourth valve element provided in a pipe communicating with the first gas supply element and located between the first gas supply element and the liquid storage unit;

a fifth valve element disposed in a pipe communicating with the second gas supply element and between the second gas supply element and the buffer unit.

In some of these embodiments, the gas supply unit further comprises:

the fifth pressure monitoring element is arranged on a pipeline communicated with the first gas supply element, is positioned at the upstream of the liquid storage unit and is used for monitoring the pressure information of the pipeline communicated with the first gas supply element;

and the sixth pressure monitoring element is arranged on a pipeline communicated with the second gas supply element, is positioned at the upstream of the buffer unit and is used for monitoring the pressure information of the pipeline communicated with the second gas supply element.

In some of these embodiments, the gas-liquid separation unit comprises:

the gas-liquid separation element is arranged at the downstream of the buffer unit, is communicated with the buffer unit, and is used for carrying out gas-liquid separation on the liquid source flowing downstream from the buffer unit so as to remove gas in the liquid source and flowing the liquid source subjected to the gas-liquid separation to the process chamber;

the first vacuum element is communicated with the gas-liquid separation element and is used for providing vacuum negative pressure for the gas-liquid separation element;

a sixth valve element provided in a pipe communicating with the gas-liquid separation element and located between the buffer element and the gas-liquid separation element;

the seventh valve element is arranged on a pipeline communicated with the gas-liquid separation element and is positioned between the gas-liquid separation element and the process chamber;

an eighth valve element provided in a pipe communicating with the gas-liquid separation element and located downstream of the seventh valve element;

and a ninth valve element provided in a pipe communicating with the gas-liquid separation element and located between the gas-liquid separation element and the first vacuum element.

In some of these embodiments, the gas-liquid separation unit further comprises:

the fault monitoring element is arranged on one side of the gas-liquid separation element and is used for monitoring whether the gas-liquid separation element has a fault or not;

and the twelfth valve element is arranged on a pipeline communicated with the gas-liquid separation element, is positioned between the buffer element and the process chamber, and is connected with the sixth valve element and the seventh valve element in parallel.

In some of these embodiments, the exhaust unit comprises:

the second vacuum element is communicated with the liquid storage unit and is used for providing vacuum negative pressure for the liquid storage unit;

a tenth valve element provided in a pipe communicating with the second vacuum element and located between the second vacuum element and the liquid storage unit;

and the third pressure monitoring element is arranged on a pipeline communicated with the second vacuum element and used for monitoring the pressure information of the pipeline communicated with the second vacuum element.

In some of these embodiments, the purge unit comprises:

the third gas supply element is communicated with the liquid storage unit and used for supplying gas to the liquid storage unit and purging the liquid storage unit before and after the liquid storage unit is replaced;

an eleventh valve element that is provided in a pipe line communicating with the third gas supply element and that is located between the third gas supply element and the liquid storage unit;

and the fourth pressure monitoring element is arranged on a pipeline communicated with the third gas supply element and is used for monitoring the pressure information of the pipeline communicated with the third gas supply element.

In some of these embodiments, further comprising:

and the safety guarantee unit is arranged at the top of the environment where the liquid source supply device is positioned and used for monitoring environment information.

In some of these embodiments, the security and safety unit comprises:

the smoke monitoring element is arranged at the top of the environment where the liquid source supply device is located and used for monitoring smoke information of the environment;

the liquid spraying element is arranged on the top of the environment where the liquid source supply device is positioned and used for spraying liquid to the environment;

the ultraviolet infrared switch is arranged at the top of the environment where the liquid source supply device is located and used for monitoring whether open fire exists in the environment;

the air blowing element is arranged at the top of the environment where the liquid source supply device is located and used for exhausting the gas of the environment.

In a second aspect, the present invention provides a liquid source supply method applied to the liquid source supply apparatus according to the first aspect.

In a third aspect, the present invention provides a semiconductor processing system, comprising:

the liquid source supply apparatus as described in the first aspect.

By adopting the technical scheme, compared with the prior art, the invention has the following technical effects:

according to the liquid source supply device, the liquid source supply method and the semiconductor process system, double backup is carried out by using the liquid storage unit and the buffer unit, the liquid storage unit can be only closed under the condition that the liquid source of the liquid storage unit is insufficient, the buffer unit continues to supply the liquid source to the process chamber, the condition that the machine is stopped and started is avoided, the production efficiency is greatly improved, the production yield is improved, and unnecessary loss is reduced; by utilizing the dual functions of the exhaust unit and the blowing unit, when the liquid storage unit is replaced, the pipeline unit communicated with the liquid storage unit can be exhausted and blown, so that the pipeline unit is clean and free of impurities, and the replaced liquid storage unit is prevented from being polluted; the gas-liquid separation unit is used for carrying out gas-liquid separation on the liquid source conveyed by the buffer unit, so that the liquid source carrying trace gas is prevented from entering a process chamber, and the production stability is ensured; the pressure monitoring elements are arranged in each unit, so that the pipeline pressure can be monitored, the normal pipeline pressure is ensured, and the pressure change and the pipeline leakage are avoided.

Drawings

FIG. 1 is a schematic diagram (one) of a liquid source supply apparatus according to an embodiment of the present invention;

FIG. 2 is a schematic view of a reservoir unit according to an embodiment of the invention;

FIG. 3 is a schematic diagram (one) of a buffer unit according to an embodiment of the present invention;

FIG. 4 is a schematic view of a gas supply unit according to an embodiment of the invention;

FIG. 5 is a schematic diagram (one) of a gas-liquid separation unit according to an embodiment of the present invention;

FIG. 6 is a schematic view of an exhaust unit according to an embodiment of the invention;

FIG. 7 is a schematic diagram of a purge unit according to an embodiment of the invention;

FIG. 8 is a schematic view (two) of a gas-liquid separation unit according to an embodiment of the present invention;

FIG. 9 is a schematic view (two) of a liquid source supply apparatus according to an embodiment of the present invention;

FIG. 10 is a schematic diagram of a buffer unit according to an embodiment of the present invention;

fig. 11 is a schematic view (iii) of a liquid source supply apparatus according to an embodiment of the present invention;

FIG. 12 is a schematic diagram of a security and safety unit according to an embodiment of the invention;

fig. 13 is a concrete embodiment of a liquid source supply apparatus according to an embodiment of the present invention.

Wherein the reference numerals are: 100. a liquid storage unit; 110. a liquid storage element; 120. a first valve element; 130. a second valve element; 140. a first weight monitoring element; 150. a first pressure monitoring element; 160. a second pressure monitoring element;

200. a buffer unit; 210. a buffer element; 220. a third valve element; 230. a second weight-monitoring element; 240. a thirteenth valve element; 250. a fourteenth valve element; 260. a seventh pressure monitoring element; 270. an eighth pressure monitoring element;

300. a gas supply unit; 310. a first gas supply element; 320. a second gas supply element; 330. a fourth valve element; 340. a fifth valve element; 350. a fifth pressure monitoring element; 360. a sixth pressure monitoring element;

400. a gas-liquid separation unit; 410. a gas-liquid separation element; 420. a first vacuum element; 430. a sixth valve element; 440. a seventh valve element; 450. an eighth valve element; 460. a ninth valve element; 470. a fault monitoring element; 480. a twelfth valve element;

500. an exhaust unit; 510. a second vacuum element; 520. a tenth valve element; 530. a third pressure monitoring element;

600. a purging unit; 610. a third gas supply element; 620. an eleventh valve element; 630. a fourth pressure monitoring element;

700. a security assurance unit; 710. a smoke monitoring element; 720. a liquid spray element; 730. an ultraviolet infrared switch; 740. a blower element.

Detailed Description

In order to make the objects, technical solutions and advantages of the present application more clearly understood, the present application is described and illustrated below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the present application and are not intended to limit the present application. All other embodiments obtained by a person of ordinary skill in the art based on the embodiments provided in the present application without any inventive step are within the scope of protection of the present application.

It is obvious that the drawings in the following description are only examples or embodiments of the present application, and that it is also possible for a person skilled in the art to apply the present application to other similar contexts on the basis of these drawings without inventive effort. Moreover, it should be appreciated that in the development of any such actual implementation, as in any engineering or design project, numerous implementation-specific decisions must be made to achieve the developers' specific goals, such as compliance with system-related and business-related constraints, which may vary from one implementation to another.

Reference in the specification to "an embodiment" means that a particular feature, structure, or characteristic described in connection with the embodiment can be included in at least one embodiment of the specification. The appearances of the phrase in various places in the specification are not necessarily all referring to the same embodiment, nor are separate or alternative embodiments mutually exclusive of other embodiments. Those of ordinary skill in the art will explicitly and implicitly appreciate that the embodiments described herein may be combined with other embodiments without conflict.

Unless defined otherwise, technical or scientific terms referred to herein shall have the ordinary meaning as understood by those of ordinary skill in the art to which this application belongs. The use of the terms "a" and "an" and "the" and similar referents in the context of describing the invention (including a single reference) are to be construed in a non-limiting sense as indicating either the singular or the plural. The present application is directed to the use of the terms "including," "comprising," "having," and any variations thereof, which are intended to cover non-exclusive inclusions; for example, a process, method, system, article, or apparatus that comprises a list of steps or elements (elements) is not limited to the listed steps or elements, but may include other steps or elements not expressly listed or inherent to such process, method, article, or apparatus. Reference to "connected," "coupled," and the like in this application is not intended to be limited to physical or mechanical connections, but may include electrical connections, whether direct or indirect. Reference to "a plurality"/"a plurality" in this application means two or more. "and/or" describes the association relationship of the associated object, indicating that there may be three relationships, for example, "a and/or B" may indicate: a exists alone, A and B exist simultaneously, and B exists alone. The character "/" generally indicates that the former and latter associated objects are in an "or" relationship. Reference herein to the terms "first," "second," "third," and the like, are merely to distinguish similar objects and do not denote a particular ordering for the objects.

Example 1

The present embodiment relates to a liquid source supply apparatus of the present invention.

An exemplary embodiment of the present invention, as shown in fig. 1, a liquid source supply apparatus includes a liquid storage unit 100, a buffer unit 200, a gas supply unit 300, a gas-liquid separation unit 400, an exhaust unit 500, and a purge unit 600. The liquid storage unit 100 is used for storing a liquid source; the buffer unit 200 is arranged at the downstream of the liquid storage unit 100, is communicated with the liquid storage unit 100, and is used for buffering a liquid source; the gas supply unit 300 is arranged at the upstream of the liquid storage unit 100 and the buffer unit 200, is respectively communicated with the liquid storage unit 100 and the buffer unit 200, and is used for respectively supplying gas to the liquid storage unit 100 and the buffer unit 200 so that the liquid source of the liquid storage unit 100 flows to the buffer unit 200 and the liquid source of the buffer unit 200 flows downstream; the gas-liquid separation unit 400 is arranged at the downstream of the buffer unit 200, is communicated with the buffer unit 200, and is used for performing gas-liquid separation on the liquid source flowing downstream from the buffer unit 200 to remove gas in the liquid source and flowing the liquid source subjected to gas-liquid separation to the process chamber; the exhaust unit 500 is communicated with the liquid storage unit 100 and is used for providing vacuum negative pressure for the liquid storage unit 100; the purge unit 600 is communicated with the liquid storage unit 100, and supplies gas to the liquid storage unit 100 to purge the liquid storage unit 100 before and after replacement of the liquid storage unit 100.

In the present invention, liquid sources include, but are not limited to, TEOS, TMA, BDEAS, DEMS, ATRP, HCDS, 4MS, OMCTS, TEB, TEPO, TICL4, DIPAS, BTBAS, TDMAT.

As shown in FIG. 2, the reservoir unit 100 includes a reservoir component 110, a first valve component 120, a second valve component 130, a first weight monitoring component 140, a first pressure monitoring component 150, and a second pressure monitoring component 160. The liquid storage element 110 is respectively communicated with the buffer unit 200, the gas supply unit 300, the exhaust unit 500 and the purging unit 600, and is used for storing a liquid source; the first valve element 120 is provided in a line communicating with the liquid storage element 110, and is located upstream of the liquid storage element 110, downstream of the gas supply unit 300, downstream of the exhaust unit 500, and downstream of the purge unit 600; the second valve element 130 is disposed in a line communicating with the liquid storage element 110, and is located downstream of the liquid storage element 110, upstream of the buffer unit 200, downstream of the exhaust unit 500, and downstream of the purge unit 600; the first weight monitoring component 140 is disposed below the liquid storage component 110 and is used for monitoring weight information of the liquid storage component 110; the first pressure monitoring element 150 is arranged on a pipeline communicated with the liquid storage element 110, is positioned at the upstream of the liquid storage element 110, and is used for monitoring pressure information of an inlet position of the liquid storage element 110; the second pressure monitoring element 160 is disposed in a conduit in communication with the reservoir element 110 and downstream of the reservoir element 110 for monitoring pressure information at an outlet of the reservoir element 110.

The reservoir element 110 includes a reservoir body, a first inlet, a first outlet, a first inlet valve, and a first outlet valve. Wherein, the first inlet is arranged at the upper part of the liquid storage main body and is communicated with the gas supply unit 300; the first outlet is arranged at the upper part of the liquid storage main body and is communicated with the buffer unit 200; the first inlet valve is arranged at the first inlet and used for controlling the opening and closing of the first inlet; the first outlet valve is arranged at the first outlet and used for controlling the opening and closing of the first outlet.

Wherein, the first import comprises first intake pipe and first air inlet interface. The first air inlet pipe is communicated with the liquid storage main body; the first air inlet port is provided at an end of the first air inlet pipe for communicating with the gas supply unit 300.

Wherein, the first outlet comprises first outlet duct and the first interface of giving vent to anger. The first air outlet pipe is communicated with the liquid storage main body; the first air outlet port is arranged at the end of the first air outlet pipe and is used for being communicated with the buffer unit 200.

Wherein, the first inlet valve is arranged in the first air inlet pipe. Including but not limited to manual diaphragm valves, pneumatic diaphragm valves. Preferably, the first inlet valve is a manual diaphragm valve.

Wherein, first outlet valve sets up in first outlet duct. Including but not limited to manual diaphragm valves, pneumatic diaphragm valves. Preferably, the first outlet valve is a manual diaphragm valve.

In some embodiments, the reservoir element 110 includes, but is not limited to, a fluid reservoir, a reservoir cylinder, and the like.

In some of these embodiments, the first valve element 120 includes, but is not limited to, a diaphragm valve.

In some of these embodiments, the first valve element 120 includes, but is not limited to, a manual diaphragm valve, a pneumatic diaphragm valve.

Specifically, the first valve element 120 comprises a first pneumatically actuated diaphragm valve. The first pneumatic diaphragm valve is disposed in a pipeline communicating with the liquid storage element 110, and is located upstream of the liquid storage element 110, downstream of the gas supply unit 300, downstream of the exhaust unit 500, and downstream of the purge unit 600.

In some of these embodiments, the second valve element 130 includes, but is not limited to, a diaphragm valve.

In some of these embodiments, the second valve element 130 includes, but is not limited to, a manual diaphragm valve, a pneumatic diaphragm valve.

Specifically, the second valve element 130 comprises a second pneumatic diaphragm valve. The second pneumatic diaphragm valve is disposed in a pipeline communicating with the liquid storage element 110, and is located downstream of the liquid storage element 110, upstream of the buffer unit 200, downstream of the exhaust unit 500, and downstream of the purge unit 600.

The first weight detecting element 140 is disposed directly below the liquid storage element 110, i.e., the liquid storage element 110 is disposed above the first weight detecting element 104.

In some of these embodiments, the first weight monitoring element 140 includes, but is not limited to, a weight sensor, a scale.

Preferably, the first weight monitoring element 140 is a first scale.

The first pressure monitoring element 150 is disposed between the reservoir element 110 and the first valve element 120.

In some of these embodiments, the first pressure monitoring element 150 is a pressure sensor.

The second pressure monitoring element 160 is disposed between the reservoir element 110 and the second valve element 130.

In some of these embodiments, the second pressure monitoring element 160 is a pressure sensor.

As shown in fig. 3, the buffer unit 200 includes a buffer element 210, a third valve element 220, and a second weight-monitoring element 230. The buffer element 210 is respectively communicated with the liquid storage unit 100, the gas supply unit 300 and the gas-liquid separation unit 400, and is used for buffering a liquid source; the third valve element 220 is arranged on a pipeline communicated with the buffer element 210 and is positioned between the liquid storage unit 100 and the buffer element 210; the second weight monitoring element 230 is disposed below the buffering element 210, and is used for monitoring weight information of the buffering element 210.

Specifically, the damping element 210 is in communication with the reservoir element 110.

The damping element 210 includes a damping body, a second inlet, a third inlet, a second outlet, a second inlet valve, a third inlet valve, and a third outlet valve. Wherein the second inlet is disposed at an upper portion of the buffer main body and is communicated with the gas supply unit 300; the third inlet is arranged at the upper part of the buffer main body and is communicated with the liquid storage element 110; the second outlet is disposed at the upper portion of the buffer main body and is communicated with the gas-liquid separation unit 400; the second inlet valve is arranged at the second inlet and used for controlling the opening and closing of the second inlet; the third inlet valve is arranged at the third inlet and used for controlling the opening and closing of the third inlet; the second outlet valve is arranged at the second outlet and used for controlling the opening and closing of the second outlet.

The second inlet is formed by a second air inlet pipe and a second air inlet connector. The second air inlet pipe is communicated with the buffer main body; the second air inlet port is provided at an end portion of the second air inlet pipe for communicating with the gas supply unit 300.

Wherein, the third inlet is formed by a third air inlet pipe and a third air inlet interface. The third air inlet pipe is communicated with the buffer main body; the third air inlet interface is arranged at the end part of the third air inlet pipe and is used for being communicated with the liquid storage element 110.

Wherein, the second outlet is formed by a second air outlet pipe and a second air outlet connector. The second air outlet pipe is communicated with the buffer main body; the second outlet port is disposed at an end of the second outlet pipe, and is used for communicating with the gas-liquid separation unit 400.

Wherein the second inlet valve is arranged in the second air inlet pipe. Including but not limited to manual diaphragm valves, pneumatic diaphragm valves. Preferably, the second inlet valve is a manual diaphragm valve.

Wherein, the third inlet valve is arranged on the third air inlet pipe. Including but not limited to manual diaphragm valves, pneumatic diaphragm valves. Preferably, the third inlet valve is a manual diaphragm valve.

Wherein, the second outlet valve is arranged on the second air outlet pipe. Including but not limited to manual diaphragm valves, pneumatic diaphragm valves. Preferably, the second outlet valve is a manual diaphragm valve.

In some of these embodiments, the buffer element 210 includes, but is not limited to, a buffer tank, a buffer cylinder, and the like.

In some of these embodiments, the third valve element 220 includes, but is not limited to, a diaphragm valve.

In some of these embodiments, the third valve element 220 includes, but is not limited to, a manual diaphragm valve, a pneumatic diaphragm valve.

In some embodiments, the third valve element 220 includes a plurality of diaphragm valves, and the plurality of diaphragm valves are spaced apart from each other and are connected to the conduits respectively communicating with the liquid storage element 110 and the buffer element 210.

Specifically, the third valve element 220 includes a third pneumatic diaphragm valve, a first manual diaphragm valve, and a fourth pneumatic diaphragm valve. Wherein, the third pneumatic diaphragm valve is arranged at the inlet of a pipeline communicated with the liquid storage element 110; the first pneumatic diaphragm valve is arranged at the downstream of the third pneumatic diaphragm valve; a fourth pneumatic diaphragm valve is provided at the outlet of the conduit communicating with the damping element 210, downstream of the first pneumatic diaphragm valve.

The second weight-monitoring element 230 is disposed right below the buffering element 210, i.e. the buffering element 210 is disposed above the second weight-monitoring element 230.

In some of these embodiments, the second weight monitoring element 230 includes, but is not limited to, a weight sensor, a scale.

Preferably, the second weight monitoring element 230 is a second scale.

As shown in fig. 4, the gas supply unit 300 includes a first gas supply member 310, a second gas supply member 320, a fourth valve member 330, and a fifth valve member 340. The first gas supply component 310 is disposed upstream of the liquid storage unit 100, is communicated with the liquid storage unit 100, and is configured to supply gas to the liquid storage unit 100, so that the liquid source of the liquid storage unit 100 flows to the buffer unit 200; the second gas supply element 320 is disposed upstream of the buffer unit 200, communicates with the buffer unit 200, and is configured to supply gas to the buffer unit 200 so that the liquid source of the buffer unit 200 flows toward the gas-liquid separation unit 400; the fourth valve element 330 is disposed in a pipeline communicating with the first gas supply element 310 and between the first gas supply element 310 and the liquid storage unit 100; the fifth valve element 340 is disposed in a pipe communicating with the second gas supply element 320 and between the second gas supply element 320 and the buffer unit 200.

Specifically, the first gas supply element 310 communicates with the reservoir element 110 for supplying gas to the reservoir element 110; the second gas supply member 320 communicates with the buffer member 210 for supplying gas to the buffer member 210.

The first gas supply element 310 includes a first gas supply source and a third outlet. Wherein the third outlet is disposed at the first gas supply source and is communicated with the liquid storage element 110.

And the third outlet consists of a third air outlet pipe and a third air outlet connector. The third gas outlet pipe is communicated with the first gas supply source; the third air outlet interface is arranged at the end of the third air outlet pipe and is used for being communicated with the liquid storage element 110.

The second gas supply element 320 includes a second gas supply source and a fourth outlet. Wherein the fourth outlet is disposed at the second gas supply source and is communicated with the buffer element 210.

And the fourth outlet is formed by a fourth air outlet pipe and a fourth air outlet connector. The fourth gas outlet pipe is communicated with a second gas supply source; the fourth air outlet port is arranged at the end of the fourth air outlet pipe and is used for being communicated with the liquid storage element 110.

In some of these embodiments, the fourth valve element 330 includes, but is not limited to, a diaphragm valve, a pressure regulating valve, a one-way valve.

In some of these embodiments, the fourth valve element 330 includes, but is not limited to, a manual diaphragm valve, a pneumatic diaphragm valve.

In some of these embodiments, the fourth valve element 330 includes diaphragm valves, pressure regulating valves, and check valves. Wherein, a plurality of diaphragm valves, pressure regulating valves, and check valves are disposed at intervals in the pipelines respectively communicating with the first gas supply component 310 and the liquid storage component 110.

Specifically, the fourth valve element 330 includes a second manual diaphragm valve, a first check valve, a first pressure regulating valve, a third manual diaphragm valve, and a fifth pneumatic diaphragm valve. Wherein the second manual diaphragm valve is disposed at the inlet of the conduit communicating with the first gas supply element 310; the first one-way valve is arranged at the downstream of the second manual diaphragm valve; the first pressure regulating valve is arranged at the downstream of the first one-way valve; the third manual diaphragm valve is arranged at the downstream of the first pressure regulating valve; a fifth pneumatic diaphragm valve is provided at the outlet of the conduit communicating with the reservoir component 110, downstream of the third manual diaphragm valve.

In some of these embodiments, the fifth valve element 340 includes, but is not limited to, a diaphragm valve, a pressure regulating valve, a one-way valve.

In some of these embodiments, the fifth valve element 340 includes, but is not limited to, a manual diaphragm valve, a pneumatic diaphragm valve.

In some of these embodiments, the fifth valve element 340 includes diaphragm valves, pressure regulating valves, and check valves. Wherein, a plurality of diaphragm valves, pressure regulating valves, and check valves are disposed at intervals in the pipelines respectively communicating with the second gas supply element 320 and the buffer element 210.

Specifically, the fifth valve element 340 includes a fourth manual diaphragm valve, a second one-way valve, a second pressure regulating valve, a fifth manual diaphragm valve, and a sixth pneumatic diaphragm valve. Wherein a fourth manual diaphragm valve is provided at an inlet of the pipe communicating with the second gas supply element 320; the second one-way valve is arranged at the downstream of the ninth manual diaphragm valve; the second pressure regulating valve is arranged at the downstream of the second one-way valve; the fifth manual diaphragm valve is arranged at the downstream of the second pressure regulating valve; a sixth pneumatic diaphragm valve is provided at the outlet of the conduit through which the damping element 210 communicates, downstream of the fifth manual diaphragm valve.

Further, the gas supply unit 300 further includes a fifth pressure monitoring element 350 and a sixth pressure monitoring element 360. The fifth pressure monitoring element 350 is disposed in the pipeline communicated with the first gas supply element 310, and is located upstream of the liquid storage unit 100, and is used for monitoring pressure information of the pipeline communicated with the first gas supply element 310; the sixth pressure monitoring unit 360 is disposed in the pipeline communicating with the second gas supply unit 320, and is located upstream of the buffer unit 200, for monitoring pressure information of the pipeline communicating with the second gas supply unit 320.

In some of these embodiments, a fifth pressure monitoring element 350 is disposed between the first pressure regulating valve and the third manual diaphragm valve.

In some of these embodiments, the fifth pressure monitoring element 350 is a pressure sensor.

In some of these embodiments, a sixth pressure monitoring element 360 is disposed between the second pressure regulating valve and the fifth manual diaphragm valve.

In some of these embodiments, the sixth pressure monitoring element 360 is a pressure sensor.

As shown in fig. 5, the gas-liquid separation unit 400 includes a gas-liquid separation element 410, a first vacuum element 420, a sixth valve element 430, a seventh valve element 440, an eighth valve element 450, and a ninth valve element 460. The gas-liquid separation element 410 is arranged at the downstream of the buffer unit 200, is communicated with the buffer unit 200, and is used for performing gas-liquid separation on the liquid source flowing downstream of the buffer unit 200 to remove gas in the liquid source and flowing the liquid source subjected to the gas-liquid separation to the process chamber; the first vacuum unit 420 is in communication with the gas-liquid separation unit 410, and is configured to provide a vacuum negative pressure to the gas-liquid separation unit 410; the sixth valve element 430 is provided in a pipe communicating with the gas-liquid separating element 410, and is located between the buffer element 210 and the gas-liquid separating element 410; the seventh valve element 440 is disposed in a pipe line communicating with the gas-liquid separating element 410, and between the gas-liquid separating element 410 and the process chamber; the eighth valve element 450 is provided in the pipeline communicating with the gas-liquid separation element 410, and is located downstream of the seventh valve element 440; the ninth valve element 460 is disposed in a pipe line communicating with the gas-liquid separating element 410, and is located between the gas-liquid separating element 410 and the first vacuum element 420.

Specifically, the gas-liquid separation element 410 is disposed downstream of the buffer element 210, and communicates with the buffer element 210.

The gas-liquid separating element 410 includes a gas-liquid separator, a fourth inlet, a fifth outlet, and a sixth outlet. Wherein, the fourth inlet is arranged at one end of the gas-liquid separator and is communicated with the buffer element 210; the fifth outlet is arranged at one end of the gas-liquid separator and is communicated with the outside vacuum negative pressure; the sixth outlet is arranged at one end of the gas-liquid separator and is communicated with the process chamber.

The fourth inlet is composed of a fourth air inlet pipe and a fourth air inlet connector. The fourth air inlet pipe is communicated with the gas-liquid separator; the fourth air inlet port is disposed at an end portion of the fourth air inlet pipe, and is used for communicating with the buffer element 210.

And the fifth outlet is formed by a fifth air outlet pipe and a fifth air outlet connector. A fifth air outlet pipe is communicated with the gas-liquid separator; and the fifth air outlet interface is arranged at the end part of the fifth air outlet pipe and is used for being communicated with the external vacuum negative pressure.

And the sixth outlet consists of a sixth air outlet pipe and a sixth air outlet connector. The sixth air outlet pipe is communicated with the gas-liquid separator; and the sixth air outlet interface is arranged at the end part of the sixth air outlet pipe and is used for being communicated with the process chamber.

The first vacuum unit 420 provides a vacuum negative pressure to the gas-liquid separation unit 410 to separate the gas dissolved in the liquid source and the liquid source inside the gas-liquid separation unit 410; and the separated gas is discharged to the outside through the first vacuum member 420 by the vacuum negative pressure.

In some of these embodiments, the first vacuum element 420 is a vacuum pump.

In some of these embodiments, the sixth valve element 430 includes, but is not limited to, a diaphragm valve.

In some of these embodiments, the sixth valve element 430 includes, but is not limited to, a manual diaphragm valve, a pneumatic diaphragm valve.

Specifically, the sixth valve element 430 includes a seventh pneumatic diaphragm valve. Wherein, the seventh pneumatic diaphragm valve is disposed in a pipeline respectively communicated with the buffer element 210 and the gas-liquid separation element 410, and is disposed close to the gas-liquid separation element 410.

In some of these embodiments, the seventh valve element 440 includes, but is not limited to, a diaphragm valve.

In some of these embodiments, the seventh valve element 440 includes, but is not limited to, a manual diaphragm valve, a pneumatic diaphragm valve.

Specifically, the seventh valve element 440 comprises an eighth pneumatic diaphragm valve. Wherein, the eighth pneumatic diaphragm valve is disposed on the pipeline respectively communicated with the gas-liquid separation element 410 and the process chamber, and is disposed close to the gas-liquid separation element 410.

In some embodiments thereof, the eighth valve element 450 includes, but is not limited to, a diaphragm valve.

In some embodiments thereof, the eighth valve element 450 includes, but is not limited to, a manual diaphragm valve, a pneumatic diaphragm valve.

Specifically, the eighth valve element 450 comprises a sixth manual diaphragm valve. Wherein, the sixth manual diaphragm valve is disposed on the pipeline respectively communicated with the gas-liquid separation element 410 and the process chamber, and is located downstream of the eighth pneumatic diaphragm valve.

In some embodiments thereof, the ninth valve element 460 includes, but is not limited to, a diaphragm valve.

In some of these embodiments, the ninth valve element 460 includes, but is not limited to, a manual diaphragm valve, a pneumatic diaphragm valve.

Specifically, the ninth valve element 460 comprises a ninth pneumatic diaphragm valve. The ninth pneumatic diaphragm valve is disposed in a pipeline that is respectively communicated with the gas-liquid separation element 410 and the first vacuum element 420, and is disposed near the gas-liquid separation element 410.

As shown in fig. 6, the exhaust unit 500 includes a second vacuum element 510, a tenth valve element 520, and a third pressure monitoring element 530. The second vacuum element 510 is communicated with the liquid storage unit 100 and is used for providing vacuum negative pressure to the liquid storage unit 100; the tenth valve element 520 is disposed in a pipe communicating with the second vacuum element 510 and between the second vacuum element 510 and the reservoir unit 100; the third pressure monitoring unit 530 is disposed in the pipeline communicating with the second vacuum unit 510 for monitoring the pressure information of the pipeline communicating with the second vacuum unit 510.

Specifically, the second vacuum element 510 is in communication with the reservoir element 110 and the buffer element 210, respectively.

The second vacuum element 510 includes a vacuum generator, a fifth inlet, a sixth inlet, and a seventh outlet. The fifth inlet is arranged at one end of the vacuum generator and is respectively communicated with the liquid storage element 110 and the buffer element 210; the sixth inlet is arranged at one end of the vacuum generator and is used for the inflow of external gas; the seventh outlet is provided at one end of the vacuum generator for exhausting gas from a line communicating with the reservoir 110.

And the fifth inlet is formed by a fifth air inlet pipe and a fifth air inlet connector. The fifth air inlet pipe is communicated with a vacuum generator; the fifth air inlet port is arranged at the end of the fifth air inlet pipe and is used for being communicated with the liquid storage element 110 and the buffer element 210 respectively.

And the sixth inlet is formed by a sixth air inlet pipe and a sixth air inlet connector. The sixth air inlet pipe is communicated with the vacuum generator; the sixth air inlet connector is arranged at the end part of the sixth air inlet pipe and is used for being communicated with an external air source.

Wherein, the seventh outlet is composed of a seventh air outlet pipe and a seventh air outlet connector. The seventh air outlet pipe is communicated with the vacuum generator; the seventh air outlet connector is arranged at the end part of the seventh air outlet pipe and is used for being communicated with the outside.

In some of these embodiments, the second vacuum element 510 is a vacuum generator.

In some of these embodiments, the tenth valve element 520 includes, but is not limited to, a diaphragm valve.

In some of these embodiments, the tenth valve element 520 includes, but is not limited to, a manual diaphragm valve, a pneumatic diaphragm valve.

In some embodiments, the tenth valve element 520 includes a plurality of diaphragm valves, and the plurality of diaphragm valves are spaced apart from each other in a channel communicating with the reservoir element 110 and the second vacuum element 510.

Specifically, the tenth valve element 520 includes seventh and tenth manual diaphragm valves. Wherein, the seventh manual diaphragm valve is arranged on a pipeline which is respectively communicated with the liquid storage component 110 and the second vacuum component 510 and is close to the second vacuum component 510; the tenth pneumatic diaphragm valve is disposed in a conduit that communicates with the reservoir 110 and the second vacuum element 510, respectively, and is disposed adjacent to the reservoir 110.

In some of these embodiments, the third pressure monitoring element 530 is disposed between the seventh manual diaphragm valve and the tenth pneumatic diaphragm valve.

In some of these embodiments, the third pressure monitoring element 530 is a pressure sensor.

As shown in fig. 7, the purge unit 600 includes a third gas supply element 610, an eleventh valve element 620, and a fourth pressure monitoring element 630. The third gas supply component 610 is communicated with the liquid storage unit 100 and is used for supplying gas to the liquid storage unit 100 and purging the liquid storage unit 100 before and after replacement of the liquid storage unit 100; the eleventh valve element 620 is disposed in a pipeline communicated with the third gas supply element 610 and located between the third gas supply element 610 and the liquid storage unit 100; the fourth pressure monitoring unit 630 is disposed on a pipeline communicated with the third gas supply unit 610, and is used for monitoring pressure information of the pipeline communicated with the third gas supply unit 610.

Specifically, the third gas supply element 610 is in communication with the liquid storage element 110 and the buffer element 210, respectively.

The third gas supply element 610 includes a third gas supply source and an eighth outlet. The eighth outlet is disposed at the third gas supply source and is respectively communicated with the liquid storage element 110 and the buffer element 210.

Wherein, the eighth outlet comprises an eighth outlet pipe and an eighth outlet connector. The eighth gas outlet pipe is communicated with a third gas supply source; the eighth air outlet interface is arranged at the end of the eighth air outlet pipe and is used for being communicated with the liquid storage element 110 and the buffer element 210.

In some embodiments thereof, the eleventh valve element 620 comprises, but is not limited to, a diaphragm valve, a microleak valve, a one-way valve, a pressure regulating valve.

In some of these embodiments, the eleventh valve element 620 includes, but is not limited to, a manual diaphragm valve, a pneumatic diaphragm valve.

In some of these embodiments, the eleventh valve element 620 comprises a number of diaphragm valves, microleakage valves, pressure regulating valves, and one-way valves. The diaphragm valves, the microleakage valves, the pressure regulating valves and the check valves are arranged at intervals on pipelines respectively communicated with the liquid storage element 110 and the third gas supply element 610.

Specifically, the eleventh valve element 620 includes an eleventh pneumatic diaphragm valve, a pneumatic microleak valve, a third one-way valve, a third pressure regulating valve, and a twelfth pneumatic diaphragm valve. Wherein, the eleventh pneumatic diaphragm valve is arranged on the pipeline which is respectively communicated with the liquid storage component 110 and the third gas supply component 610, and is arranged close to the third gas supply component 610; the pneumatic micro-leakage valve is arranged at the downstream of the eleventh pneumatic diaphragm valve; the third one-way valve is arranged at the downstream of the pneumatic micro-leakage valve; the third pressure regulating valve is arranged at the downstream of the third one-way valve; the twelfth pneumatic diaphragm valve is disposed in a pipeline communicating with the liquid storage element 110 and the third gas supply element 610, downstream of the third pressure regulating valve, and near the liquid storage element 110.

In some of these embodiments, a fourth pressure monitoring element 630 is disposed between the third pressure regulating valve and the twelfth pneumatic diaphragm valve.

In some of these embodiments, the fourth pressure monitoring element 630 is a pressure sensor.

The application method of the embodiment is as follows:

supplying a liquid source;

in the event that the weight of the source of liquid from the reservoir element 110 is sufficient, opening the third valve element 220;

opening the fourth valve element 330, the first gas supply element 310 supplying gas to the reservoir element 110;

under the action of the gas pressure, the liquid source of the reservoir element 110 is delivered to the buffer element 210;

the fifth valve element 340 is opened, and the second gas supply element 320 supplies gas to the damping element 210;

under the action of the gas pressure, the liquid source of the buffer member 210 is delivered to the gas-liquid separation member 410;

opening the sixth, seventh and

ninth valve elements

430, 440 and 460, the liquid source of the buffer element 210 enters the gas-liquid separation element 410;

the liquid source after the gas-liquid separation treatment by the gas-liquid separation element 410 enters the process chamber;

the gas subjected to the gas-liquid separation process by the gas-liquid separation element 410 is introduced into the outside through the first vacuum element 420.

(II) replacing the liquid storage unit 100;

in the event that the weight of the source of liquid from the reservoir element 110 does not meet the requirements, closing the third and

fourth valve elements

220, 330;

opening the eleventh valve element 620;

in the event that the pressure value of the first pressure monitoring element 150 is equal to the pressure value of the second pressure monitoring element 160, closing the first inlet valve and the first outlet valve of the reservoir element 110;

opening the tenth valve element 520 to vent the associated line element in communication with the reservoir element 110;

in the event that the pressure value of the third pressure monitoring element 530 is satisfactory, the tenth valve element 520 is closed;

the eleventh valve element 620 is opened to purge the associated line elements communicating with the reservoir element 110;

in the event that the pressure value at the fourth pressure monitoring element 630 meets the requirement, the eleventh valve element 620 is closed;

the venting and purging are repeated several times, closing the tenth valve element 520 in case the pressure value of the third pressure monitoring element 530 meets the requirement;

replacing the reservoir component 110 without changing the pressure value of the first pressure monitoring component 150 and the pressure value of the second pressure monitoring component 160;

after the replacement is completed, the exhaust and purge are repeated several times, and in the case that the pressure value of the fourth pressure monitoring element 630 meets the requirement, the eleventh valve element 620 is closed;

repeating the exhausting and purging several times in the case where the pressure value of the first pressure monitoring element 150 and the pressure value of the second pressure monitoring element 160 do not vary, and closing the tenth valve element 520 in the case where the pressure value of the third pressure monitoring element 530 meets the requirement;

opening the third valve element 220 and opening the first inlet valve and the first outlet valve of the reservoir element 110;

the fourth valve element 330 is opened and the reservoir element 110 resumes supplying liquid to the damping element 210.

The embodiment has the advantages that the liquid storage unit and the buffer unit are used for double backup, so that the liquid storage unit can be only closed under the condition that the liquid source of the liquid storage unit is insufficient, the buffer unit continues to supply the liquid source to the process chamber, the condition of stopping and starting is avoided, the production efficiency is greatly improved, the production yield is improved, and unnecessary loss is reduced; utilize the exhaust unit and sweep the dual function of unit, can be when changing stock solution unit, to the pipeline unit of stock solution unit intercommunication exhaust and sweep, guarantee that the pipeline unit is clean free from impurities, avoid polluting the stock solution unit after changing.

Example 2

This embodiment is a modification of embodiment 1. This example differs from example 1 in that: the gas-liquid separation unit 400 has a different structure.

As shown in fig. 8, the gas-liquid separation unit 400 further includes a failure monitoring element 470 and a twelfth valve element 480. The fault monitoring element 470 is disposed at one side of the gas-liquid separation element 410, and is configured to monitor whether the gas-liquid separation element 410 has a fault; the twelfth valve element 480 is disposed in a pipe communicating with the gas-liquid separating element 410, between the buffer element 210 and the process chamber, and is disposed in parallel with the sixth valve element 430 and the seventh valve element 440.

In some of these embodiments, the fault monitoring element 470 is a leakage sensor.

In some of these embodiments, the twelfth valve element 480 includes, but is not limited to, a diaphragm valve.

In some embodiments, the twelfth valve element 480 includes, but is not limited to, a manual diaphragm valve, a pneumatic diaphragm valve.

In some embodiments, the twelfth valve element 480 includes several diaphragm valves, and the several diaphragm valves are disposed at intervals in the pipeline respectively communicating with the buffer element 210 and the process chamber.

Specifically, the twelfth valve element 480 includes a thirteenth pneumatic diaphragm valve and a fourteenth pneumatic diaphragm valve. Wherein, the thirteenth pneumatic diaphragm valve is arranged on the pipeline respectively communicated with the buffer element 210 and the process chamber, and is arranged close to the buffer element 210; the fourteenth pneumatic diaphragm valve is disposed in a pipeline respectively communicating with the buffer element 210 and the process chamber, and is disposed close to the process chamber.

Wherein the thirteenth pneumatic diaphragm valve is disposed in parallel with the sixth valve element 430 and the fourteenth pneumatic diaphragm valve is disposed in parallel with the seventh valve element 440.

The method of use of this example is as follows:

(III) turning off the gas-liquid separation Unit 400

Closing the sixth, seventh, and

ninth valve elements

430, 440, 460;

the twelfth valve element 480 is opened and the liquid source of the buffer element 210 is directed into the process chamber.

The advantage of this embodiment is that, under the condition that the gas-liquid separation unit breaks down, can be through opening twelfth valve element temporarily for the liquid source still can be carried to the process chamber, avoids producing the line and shuts down.

Example 3

This embodiment is a modification of embodiments 1 to 2.

As shown in fig. 9, the buffer unit 200 is also in communication with the exhaust unit 500 and the purge unit 600, respectively.

As shown in FIG. 10, the damping unit 200 further includes a thirteenth valve element 240, a fourteenth valve element 250, a seventh pressure monitoring element 260, and an eighth pressure monitoring element 270. Wherein the thirteenth valve element 240 is disposed in a pipeline communicating with the buffer element 210, and is located upstream of the buffer element 210, downstream of the gas supply unit 300, downstream of the exhaust unit 500, and downstream of the purge unit 600; the fourteenth valve element 250 is provided in a line communicating with the buffer element 210, and is located downstream of the buffer element 210, upstream of the gas-liquid separation unit 400, downstream of the exhaust unit 500, and downstream of the purge unit 600; the seventh pressure monitoring element 260 is disposed in a pipeline communicated with the buffering element 210, and is located upstream of the buffering element 210, and is used for monitoring pressure information of an inlet position of the buffering element 210; an eighth pressure monitoring element 270 is disposed in the conduit communicating with the damping element 210 and downstream of the damping element 210 for monitoring pressure information at the outlet location of the damping element 210.

Specifically, the thirteenth valve element 240 is disposed downstream of the second gas supply element 320, downstream of the second vacuum element 510, and downstream of the third gas supply element 610; the fourteenth valve element 250 is disposed upstream of the gas-liquid separating element 410, downstream of the second vacuum element 510, and downstream of the third gas supplying element 610.

In some embodiments thereof, the thirteenth valve element 240 includes, but is not limited to, a diaphragm valve.

In some embodiments thereof, the thirteenth valve element 240 includes, but is not limited to, a manual diaphragm valve, a pneumatic diaphragm valve.

Specifically, the thirteenth valve element 240 includes a fifteenth pneumatic diaphragm valve. Wherein, the fifteenth pneumatic diaphragm valve is disposed in the pipeline communicating with the buffer component 210, and is located upstream of the buffer component 210, downstream of the second gas supply component 320, downstream of the second vacuum component 510, and downstream of the third gas supply component 610.

In some of these embodiments, the fourteenth valve element 250 includes, but is not limited to, a diaphragm valve.

In some of these embodiments, the fourteenth valve element 250 includes, but is not limited to, a manual diaphragm valve, a pneumatic diaphragm valve.

In particular, the fourteenth valve element 250 comprises a sixteenth pneumatic diaphragm valve. The sixteenth pneumatic diaphragm valve is disposed in a pipeline communicating with the buffer member 210, and is located downstream of the buffer member 210, upstream of the gas-liquid separation member 410, downstream of the second vacuum member 510, and downstream of the third gas supply member 610.

A seventh pressure monitoring element 260 is disposed between damping element 210 and thirteenth valve element 240.

In some of these embodiments, the seventh pressure monitoring element 260 is a pressure sensor.

The eighth pressure monitoring element 270 is disposed between the damping element 210 and the fourteenth valve element 250.

In some of these embodiments, the eighth pressure monitoring element 270 is a pressure sensor.

Further, the tenth valve element 520 also includes a seventeenth pneumatic diaphragm valve. Wherein, the seventeenth pneumatic diaphragm valve is disposed on the pipeline respectively communicated with the buffer component 210 and the second vacuum component 510, and is disposed close to the buffer component 210.

Further, the eleventh valve element 620 also includes an eighteenth pneumatic diaphragm valve. Wherein, the eighteenth pneumatic diaphragm valve is disposed on the pipeline respectively communicating with the buffer element 210 and the third gas supply element 610, and is located downstream of the third pressure regulating valve and near the buffer element 210.

The method of use of this example is substantially the same as example 1, except that: this embodiment needs the production line to be shut down to clean, change the buffer unit.

Example 4

This embodiment is a modification of embodiments 1 to 3.

As shown in fig. 11, the liquid source supply apparatus further includes a safety assurance unit 700. The safety guarantee unit 700 is disposed on the top of the environment where the liquid source supply device is located, and is used for monitoring environmental information.

As shown in fig. 12, the safety and security unit 700 includes a smoke monitoring element 710, a liquid spray element 720, an ultraviolet-infrared switch 730, and a blower element 740. The smoke monitoring element 710 is disposed at the top of the environment where the liquid source supply device is located, and is configured to monitor smoke information of the environment; the liquid spraying element 720 is arranged on the top of the environment where the liquid source supply device is located and is used for spraying liquid to the environment; the ultraviolet infrared switch 730 is arranged on the top of the environment where the liquid source supply device is located and used for monitoring whether open fire exists in the environment; the blower 740 is disposed on the top of the environment where the liquid source supply device is located, and is used for exhausting the gas of the environment.

In some of these embodiments, the smoke monitoring element 710 is a smoke detector.

In some of these embodiments, the liquid spray elements 720 are showerheads.

In some of these embodiments, the ultraviolet infrared switch 730 is a red ultraviolet switch (IRSwitch).

In some of these embodiments, the blowing element 740 includes, but is not limited to, an exhaust fan.

In some of these embodiments, the safety and security unit 700 further comprises a gas monitoring element, a flame monitoring element, a temperature monitoring element.

The embodiment has the advantages that under the condition that the liquid source supply device leaks and burns, the smoke monitoring element is used for early warning; the liquid spraying element is used for spraying to reduce the concentration of relevant gas and liquid in the environment and prevent explosion; the gas in the environment can be rapidly discharged to the exhaust gas treatment system by the blower element.

Example 5

The present embodiment relates to a liquid source supply method according to the present invention, which is applied to the liquid source supply apparatuses described in embodiments 1 to 4.

In one exemplary embodiment of the present invention, a liquid source supply method includes:

(exhaust step):

under the condition that the weight of a liquid source of the liquid storage unit reaches a preset weight threshold value, the communication between the liquid storage unit and the gas supply unit and the communication between the liquid storage unit and the buffer unit are closed;

starting an exhaust unit, and providing vacuum negative pressure for a pipeline unit communicated with the liquid storage unit so as to exhaust internal gas of the pipeline unit;

closing the exhaust unit when the pressure of the pipeline unit reaches a first preset pressure threshold value;

(purging step):

starting a purging unit, wherein the purging unit supplies gas to a pipeline unit communicated with the liquid storage unit;

closing the purging unit when the pressure of the pipeline unit reaches a second preset pressure threshold value;

(first pressure holding step):

repeating the exhausting step and the purging step until the pressure of the pipeline unit reaches a first preset pressure threshold value;

(replacement step):

replacing the liquid storage unit;

(second pressure holding step):

after the replacing step, repeating the exhausting step and the purging step until the pressure of the pipeline unit reaches a second preset pressure threshold value;

(third pressure holding step):

after the second pressure maintaining step, repeating the exhausting step and the purging step until the pressure of the pipeline unit reaches a first preset pressure threshold value;

(liquid source supply step):

and after the third pressure maintaining step, the communication between the liquid storage unit and the gas supply unit and the communication between the liquid storage unit and the buffer unit are opened.

Further, before the exhausting step, the method further comprises:

(back pressure step):

and starting the purging unit, and closing the liquid storage unit under the condition that the upstream pressure and the downstream pressure of the liquid storage unit are equal.

Specifically, the liquid source supply method includes:

(back pressure step):

in the event that the weight of the source of liquid at the reservoir element 110 reaches the preset weight threshold of the first weight monitoring element 140, closing the third and

fourth valve elements

220, 330 to disconnect the reservoir element 110 from the buffer element 210 and the first gas supply element 310;

activating the third gas supply element 610, opening the eleventh valve element 620, the first valve element 120, and the second valve element 130, observing the first pressure monitoring element 150 and the second pressure monitoring element 160, and closing the reservoir element 110 in the event that the upstream pressure and the downstream pressure of the reservoir element 110 are equal;

(exhaust step):

in the event that the weight of the source of liquid from the reservoir element 110 reaches the preset weight threshold of the first weight monitoring element 140, closing the third and

fourth valve elements

activating the second vacuum element 510, opening the tenth valve element 520, the first valve element 120 and the second valve element 130, and supplying vacuum negative pressure to the pipe unit communicated with the liquid storage element 110 to exhaust the internal gas of the pipe;

observing the third pressure monitoring element 530, the first pressure monitoring element 150, the second pressure monitoring element 160, and closing the second vacuum element 510 when the pressure in the pipeline reaches the first preset pressure threshold;

(purging step):

activating the third gas supply element 610 to open the eleventh valve element 620, the first valve element 120 and the second valve element 130, the third gas supply element 610 supplying gas to a conduit communicating with the reservoir element 110;

observing the fourth pressure monitoring element 630, the first pressure monitoring element 150, the second pressure monitoring element 160, and closing the third gas supply element 610 if the pressure of the line reaches a second preset pressure threshold;

(first pressure maintaining step):

repeating the exhausting step and the purging step, observing the third pressure monitoring element 530, the first pressure monitoring element 150 and the second pressure monitoring element 160 until the pressure of the pipeline reaches a first preset pressure threshold value, closing the tenth valve element 520, and maintaining the pressure for 3 hours;

(replacement step):

turning off the second vacuum unit 510, turning on the third gas supply unit 610, and replacing the reservoir unit 110 when the pneumatic micro leak valve of the eleventh valve unit 620 is closed and a constant flow rate of gas flows out from the third gas supply unit 610;

(second pressure holding step):

after the replacing step, repeating the exhausting step and the purging step, observing the fourth pressure monitoring element 630, the first pressure monitoring element 150 and the second pressure monitoring element 160 until the pressure of the pipeline reaches a second preset pressure threshold value, closing the eleventh valve element 620, and maintaining the pressure for three hours;

(third pressure holding step):

after the second pressure maintaining step, repeating the exhausting step and the purging step, and observing the third pressure monitoring element 530, the first pressure monitoring element 150 and the second pressure monitoring element 160 until the pressure of the pipeline reaches a first preset pressure threshold value;

(liquid source supply step):

after the third pressure maintaining step, the third valve element 220 and the fourth valve element 330 are opened to open the communication between the liquid storage element 110 and the buffer element 210 and the first gas supply element 310, and the use of the liquid storage element 110 is resumed.

More specifically, the liquid source supply method of the present embodiment is as follows:

and (4) normal work: under the condition that the liquid storage element 110 does not supply the liquid source to the buffer element 210, all the manual diaphragm valves and the pressure regulating valves are started, the first pneumatic diaphragm valve, the second pneumatic diaphragm valve, the third pneumatic diaphragm valve, the fourth pneumatic diaphragm valve, the eleventh pneumatic diaphragm valve, the tenth pneumatic diaphragm valve, the twelfth pneumatic diaphragm valve, the thirteenth pneumatic diaphragm valve, the fourteenth pneumatic diaphragm valve, the sixteenth pneumatic diaphragm valve, the fifteenth pneumatic diaphragm valve, the seventeenth pneumatic diaphragm valve, the eighteenth pneumatic diaphragm valve and the pneumatic microleakage valves are closed, and the rest pneumatic diaphragm valves are opened;

in the case where the liquid storage element 110 supplies the liquid source to the cushioning element 210, the fourth and third pneumatic diaphragm valves are opened.

(1) Back pressure: manually closing the first pneumatic diaphragm valve, closing the third pneumatic diaphragm valve, the fourth pneumatic diaphragm valve and the fifth pneumatic diaphragm valve by the system, opening the eleventh pneumatic diaphragm valve and the pneumatic microleak valve, observing the value of the fourth pressure detection element 630, if the value rises normally, opening the second pneumatic diaphragm valve, the first pneumatic diaphragm valve and the twelfth pneumatic diaphragm valve, observing the first pressure detection element 150 and the second pressure detection element 160, manually closing the first inlet valve and the first outlet valve on the liquid storage element 110 after 2 pressure values are the same, clicking on a screen to replace a steel cylinder, and automatically closing the twelfth pneumatic diaphragm valve by the system.

(2) Exhausting: the system opens the second vacuum element 510, the gas flows through the GN2 pipe on one side, the pipe on one side of the seventh manual diaphragm valve is pumped to negative pressure, the gas in the pipe is exhausted, and the system observes that the value of the third pressure monitoring element 530 is negative, which indicates that the second vacuum element 510 works normally. The system opens the tenth pneumatic diaphragm valve. Every 5 seconds the system will detect the values of the third pressure monitoring element 530, the first pressure detecting element 150, the second pressure detecting element 160, and automatically close the tenth pneumatic diaphragm valve when the pressure drops to-10 psig. Switching to the purge step.

(3) Purging: the system automatically opens the eleventh pneumatic diaphragm valve and the pneumatic micro-leakage valve, the purging gas flows into the pipe, if the value of the fourth pressure detection element 630 rises normally, the system opens the twelfth pneumatic diaphragm valve again, the values of the first pressure detection element 150 and the second pressure detection element 160 are detected, and when the pressure rises to 100psig, the twelfth pneumatic diaphragm valve is closed. Switching back to the exhaust step.

(4) And (3) maintaining negative pressure: and repeating the circulating exhaust step and the purging step for a plurality of times, and keeping the pressure of the pipeline in a negative pressure state after the completion, wherein the pressure is constant at minus 10psig, and considering that the pipeline is purged cleanly. The system closes the tenth pneumatic diaphragm valve and the second vacuum element 510, holding pressure for 3h. The system detects that the first pressure monitoring element 150 and the second pressure monitoring element 160 have countless value changes, and automatically performs pressure correction and several times of air exhaust and purging before bottle replacement after no change.

(5) Replacement of the liquid storage unit 100: clicking a screen to change bottles for confirmation, closing the pneumatic micro-leakage valve by the system, and opening a twelfth pneumatic diaphragm valve and an eleventh pneumatic diaphragm valve. When the pneumatic micro-leakage valve is closed, a small flow of gas flows into the pipeline from one side of the eleventh pneumatic diaphragm valve, so that the cleanness of the interior of the pipeline is ensured during bottle replacement. The connections between the first inlet and the first outlet of the reservoir 110 and the first gas supply component 310 and the buffer component 210 are disconnected to start the manual replacement of the reservoir 110.

(6) Keeping the positive pressure: and after the liquid storage element 110 is replaced, repeating the exhausting step and the purging step for a plurality of times, keeping the positive pressure of the pipeline to 100psig after the replacement is finished, closing the eleventh pneumatic diaphragm valve and the twelfth pneumatic diaphragm valve, and keeping the pressure for 3 hours.

(7) And (3) negative pressure maintaining: the first pressure monitoring element 150 and the second pressure monitoring element 160 are observed to have infinite variations. After the change does not exist, the system repeats the exhausting step and the purging step for a plurality of times, the pipeline is kept in a negative pressure state, the first pneumatic diaphragm valve, the second pneumatic diaphragm valve and the tenth pneumatic diaphragm valve are closed, and the pipeline is waited to be on-line;

(8) Liquid source supply: on line, the first diaphragm valve is manually opened, slowly opening the first inlet valve and the first outlet valve of the reservoir 110. Clicking to reach the online state, and automatically opening a third pneumatic diaphragm valve, a fourth pneumatic diaphragm valve and a fifth pneumatic diaphragm valve by the system to recover the supply of the liquid source.

The technical effect of this embodiment is substantially the same as that of embodiment 1, and is not described herein again.

Example 6

This embodiment is a modification of embodiment 5.

Further, the liquid source supply method further includes:

(shield gas-liquid separation unit):

under the condition that the gas-liquid separation unit fails, the gas-liquid separation unit is closed to be communicated with the buffer unit, the process chamber and the vacuum negative pressure unit;

communication of the buffer unit with the process chamber is initiated.

Specifically, the liquid source supply method further includes:

in the event of a failure of the gas-liquid separation element 410, the sixth, seventh, and

ninth valve elements

430, 440, and 460 are closed;

the twelfth valve element 480 is opened to communicate the buffer element 210 with the process chamber.

(9) Shield gas-liquid separation unit 400: the system shuts down the seventh, eighth, and ninth pneumatic diaphragm valves. The system opens the thirteenth pneumatic diaphragm valve and the fourteenth pneumatic diaphragm valve; the gas-liquid separation element 410 is replaced.

(10) Replacement/maintenance of the gas-liquid separation unit 400: after the replacement/maintenance of the gas-liquid separation element 410 is finished, the system closes the thirteenth pneumatic diaphragm valve and the fourteenth pneumatic diaphragm valve, and opens the seventh pneumatic diaphragm valve, the eighth pneumatic diaphragm valve and the ninth pneumatic diaphragm valve.

The technical effect of this embodiment is substantially the same as that of embodiment 2, and is not described herein again.

Example 7

The present embodiments relate to semiconductor processing systems of the present invention.

An exemplary embodiment of the present invention, a semiconductor processing system, includes the liquid source supply apparatus as described in any one of embodiments 1-3.

Furthermore, the semiconductor processing system also comprises a plurality of process chambers which are respectively communicated with the liquid source supply device.

Specifically, the plurality of process chambers are respectively communicated with the gas-liquid separation unit 400.

Further, the plurality of process chambers are also respectively communicated with the purge unit 600.

For each process chamber, a seventeenth pneumatic diaphragm valve, an eighteenth pneumatic diaphragm valve and an eighth manual diaphragm valve are further provided on the pipe thereof communicating with the third gas supply element 610 and the gas-liquid separation element 410. Wherein, the seventeenth pneumatic diaphragm valve is arranged at the inlet of the pipeline which is respectively communicated with the gas-liquid separation element 410 and the process chamber; an eighteenth pneumatic diaphragm valve is disposed in the pipeline respectively communicating with the third gas supply element 610 and the process chamber, and is located downstream of the seventeenth pneumatic diaphragm valve; the eighth manual diaphragm valve is disposed at an outlet of the piping that communicates with the gas-liquid separation element 410 and the process chamber, respectively, and is located downstream of the eighteenth pneumatic diaphragm valve.

Example 8

This example relates to a specific embodiment of the present invention.

As shown in fig. 13, a liquid source supply device includes a liquid source container module, a liquid source buffer module, a gas supply module, a gas-liquid separation module, an exhaust module, a purge module, and a life safety guarantee module.

The liquid source container module comprises a container tank (steel cylinder), a pneumatic diaphragm valve PV1L, a pneumatic diaphragm valve PV2L, a pressure sensor PT1L and a pressure sensor PT2L.

The liquid source buffer module comprises a buffer tank (steel cylinder), a pneumatic diaphragm valve LPIL, a manual diaphragm valve MV2L, a pneumatic diaphragm valve RCV, a pneumatic diaphragm valve PV1R, a pneumatic diaphragm valve PV2R, a pressure sensor PT1R and a pressure sensor PT12R.

The gas supply module includes a first PUSHGASIntlet, a second PUSHGASIntlet, a manual diaphragm valve MV5L, a check valve CV2, a check valve CV3, a pressure regulating valve REG, a manual diaphragm valve MV4L, a pneumatic diaphragm valve PV5L, a manual diaphragm valve MV5R, a check valve CV3, a pressure regulating valve REG, a manual diaphragm valve MV4R, a pneumatic diaphragm valve PV5R, a pressure sensor PT5L, and a pressure sensor PT5R.

The gas-liquid separation module comprises a DEGASSER, a pneumatic diaphragm valve LPIR, a pneumatic diaphragm valve PV6R, a manual diaphragm valve MV2R, a pneumatic diaphragm valve PV9R, a pneumatic diaphragm valve PV7R and a pneumatic diaphragm valve PV8R.

Further, the gas-liquid separation module also comprises a leakage monitoring sensor.

The exhaust module comprises a vacuum generator VG/BV/CV, a manual diaphragm valve MV3, a pneumatic diaphragm valve PV3L, a pneumatic diaphragm valve PV3R and a pressure sensor PT3.

The purging module comprises a purgegas Intlet, a pneumatic diaphragm valve PGI, a pneumatic microleak valve PGBV, a one-way valve CV1, a pressure regulating valve REG, a pneumatic diaphragm valve PV4L, a pneumatic diaphragm valve PV4R and a pressure sensor PT4.

Further, the purging module also comprises a pneumatic diaphragm valve LPVn, wherein n is more than or equal to 1.

The life safety guarantee module comprises a gas detector, a flame detector, a temperature sensor, a smoke sensor, a weighing system and a pressure system, and is provided with a touch control module and an audible and visual alarm module.

The method of use of this example is as follows:

(1) Normal operation

When the liquid is not supplied to the container tank, all the manual diaphragm valves and the pressure regulating valves are in an open state, PV1L, PV2L, PV3L, PV4L, PV1R, PV2R, PV3R, PV4R, RCV, LPIL, PV7R, PV8R, LPV1, LPV2, LPV3, LPV4, PGI and PGBV are in an off state, and the rest pneumatic diaphragm valves are in an on state.

When the canister is on, the RCV and LPIL are on.

(2) Back pressure

MV2L is manually closed, PV5L, LPIL and RCV are closed by the system, and PGI and PGBV are opened.

Observe PT4 numerical value, if normal rising, open PV4L, PV1L, PV2L, observe PT1L and PT2L, treat that 2 PT numerical values are the same, two manual diaphragm valves of manual shut-off tank jar click the change steel bottle on the screen, the system can self-closing PV4L.

(3) Exhaust gases

The VG/BV/CV is opened by the system, GN2 gas on one side of the pipeline flows through the system, MV3 gas on one side of the pipeline is pumped to negative pressure, the gas in the pipeline is exhausted, and the PT3 value observed by the system is negative, which indicates that VG works normally.

The system turns on PV3L. Every 5s, the system will detect PT3, PT1L, PT2L values, when the pressure drops to-10 psig, automatically turn off PV3L, switch to the purge step.

(4) Blowing and sweeping

The system automatically turns on PGI and PGBV, and the purge gas flows into the pipe.

If PT4 value normally rises, the system opens PV4L again, detects PT1L and PT2L values, and closes PV4L when the pressure rises to 100 psig. Switching to the exhaust step.

(5) Negative pressure maintaining device

And (5) repeating the step (3) and the step (4) (the times are adjustable), and after the step (3) and the step (4) are completed, keeping the pressure of the pipeline in a negative pressure state, keeping the pressure to be-10 psig unchanged, and considering that the pipeline is purged cleanly.

The system shuts down PV3L and VG and maintains the pressure for 3h.

The system detects that the PT1L and the PT2L have countless value changes, and automatically performs PT correction and a plurality of times of air exhaust and purging before bottle replacement after no change.

(6) Bottle changing

Click screen bottle change confirmation, system turn off PGBV, turn on PV4L and PGI.

When the PGBV is closed, a small flow of gas will flow into the interior of the pipeline from the PGI side to ensure the cleanliness of the pipeline during bottle change.

And (4) disassembling the joints of the two manual diaphragm valves on the container tank and the upper part of pipelines to start manual bottle replacement.

(7) Keeping positive pressure

And (3) repeating the steps (3) and (4) for a plurality of times after bottle replacement is finished, keeping the positive pressure of the pipeline to 100psig after the bottle replacement is finished, closing PV4L and PGI, keeping the pressure for 3 hours, and observing that the PT1L and the PT2L have countless changes.

And after the change is not generated, the system exhausts and purges for several times, the pipeline is kept in a negative pressure state, PV1L, PV2L and PV3L are closed, and the pipeline is waited to be on-line.

(8) Threading

When the container is on line, the MV2L is opened manually, and the two manual diaphragm valves of the container tank are opened slowly.

Clicking on the line, the system automatically opens PV5L, LPIL and RCV, and the stock solution supply is restored.

The first pushgasintitlet pressurizes the canister to allow stock solution to flow out of the canister at the other end.

For the container tank, the stock solution flows into the buffer tank from the container tank through the pipeline where the LPIL is located, and the stock solution is replenished to the buffer tank.

And when the value of the platform scale supplemented to the buffer tank reaches a set value, the system closes the RCV and the LPIL and stops liquid supply of the container tank.

After pressurization of the buffer tank, the feed solution is passed through the degass's to separate the gas molecules for supply to the process piping.

Further, for the gas-liquid separation module, when the gas-liquid separation module leaks, the working steps are as follows:

when leakage is detected, the system automatically turns off LPIR and PV6R and turns on PV7R and PV8R.

(9) Replacement of the DEGASSER

The DEGASSER is replaced during the leisure of the process pipeline, and the whole process needs manual operation.

The purging module presses liquid between the gas-liquid separation module and the process pipeline back to the liquid source buffer module, and a manual diaphragm valve, a PV6R and a PV9R of the liquid source buffer module are closed;

PV1R and PV3R are opened, the exhaust module is pumped to negative pressure, the pressure of PT2R is observed, and the pressure is unchanged to-10 psig;

closing PV3R, opening PV4R, purging by a purging module, observing the pressure of PT2R, and keeping the pressure unchanged until the pressure reaches 100 psig;

repeating the steps of exhausting and purging, keeping the pressure in the pipeline at-10 psig and maintaining the pressure for three hours;

observing PT2R, if no pressure change exists, closing all valves connected with the gas-liquid separation module, and replacing the DEGASSER;

repeating the steps of exhausting and purging, keeping the pressure in the pipeline in a positive pressure state, keeping the pressure at 100psig, and keeping the pressure for three hours;

and (4) observing PT2R, if no pressure change exists, pumping the exhaust module to negative pressure, and recovering the DEGASSER to be used under the negative pressure state.

While the invention has been described with reference to a preferred embodiment, it will be understood by those skilled in the art that various changes in form and detail may be made therein without departing from the spirit and scope of the invention.

Claims

1. A liquid source supply apparatus, comprising:

the liquid storage unit is used for storing a liquid source;

the gas supply unit is arranged at the upstream of the liquid storage unit and the buffer unit, is respectively communicated with the liquid storage unit and the buffer unit, and is used for respectively supplying gas to the liquid storage unit and the buffer unit so that a liquid source of the liquid storage unit flows to the buffer unit and a liquid source of the buffer unit flows downstream;

2. The liquid source supply apparatus as defined in claim 1, wherein the reservoir unit includes:

the liquid storage element is communicated with the buffer unit, the gas supply unit, the exhaust unit and the purging unit respectively and is used for storing a liquid source;

a first valve element provided in a line communicating with the liquid storage element and located upstream of the liquid storage element, downstream of the gas supply unit, downstream of the exhaust unit, and downstream of the purge unit;

the first pressure monitoring element is arranged on a pipeline communicated with the liquid storage element, is positioned at the upstream of the liquid storage element and is used for monitoring pressure information of an inlet position of the liquid storage element;

and the second pressure monitoring element is arranged on a pipeline communicated with the liquid storage element, is positioned at the downstream of the liquid storage element and is used for monitoring pressure information of an outlet position of the liquid storage element.

3. The liquid source supply apparatus according to claim 1, wherein the buffer unit includes:

a third valve element disposed on a conduit communicating with the buffer element and located between the reservoir unit and the buffer element;

4. The liquid source supply apparatus according to claim 1, wherein the gas supply unit includes:

5. The liquid source supply apparatus according to claim 1, wherein the gas-liquid separation unit includes:

the gas-liquid separation element is arranged at the downstream of the buffer unit, is communicated with the buffer unit, and is used for performing gas-liquid separation on the liquid source flowing downstream of the buffer unit so as to remove gas in the liquid source and enabling the liquid source subjected to the gas-liquid separation to flow to the process chamber;

a sixth valve element provided in a pipeline communicating with the gas-liquid separation element and located between the buffer element and the gas-liquid separation element;

an eighth valve element provided in a pipeline communicating with the gas-liquid separation element, and located downstream of the seventh valve element;

6. The liquid source supply apparatus as claimed in claim 1, wherein the gas exhaust unit includes:

and the third pressure monitoring element is arranged on a pipeline communicated with the second vacuum element and is used for monitoring the pressure information of the pipeline communicated with the second vacuum element.

7. The liquid source supply apparatus of claim 1, wherein the purge unit comprises:

a third gas supply element which is communicated with the liquid storage unit and is used for supplying gas to the liquid storage unit and purging the liquid storage unit before and after the liquid storage unit is replaced;

8. The liquid source supply apparatus as claimed in any one of claims 1 to 7, further comprising:

and the safety guarantee unit is arranged at the top of the environment where the liquid source supply device is positioned and is used for monitoring environmental information.

9. A liquid source supply method applied to the liquid source supply apparatus according to any one of claims 1 to 8.

10. A semiconductor processing system, comprising:

the liquid source supply apparatus as claimed in any one of claims 1 to 8.