CN115721055A - Porous metal atomizing core and preparation method thereof - Google Patents

Porous metal atomizing core and preparation method thereof Download PDF

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CN115721055A
CN115721055A CN202211583831.7A CN202211583831A CN115721055A CN 115721055 A CN115721055 A CN 115721055A CN 202211583831 A CN202211583831 A CN 202211583831A CN 115721055 A CN115721055 A CN 115721055A
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porous metal
metal plate
atomizing core
layer
slurry
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丁磊
聂革
姬星星
钟勇
刘斌
赵贯云
赵波洋
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Shenzhen Woody Vapes Technology Co Ltd
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Shenzhen Woody Vapes Technology Co Ltd
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Abstract

The invention discloses a porous metal atomizing core and a preparation method thereof, and relates to the technical field of metal atomizing core production. A porous metal atomizing core comprises a porous metal plate, a dielectric layer and a heating layer, wherein the dielectric layer is positioned between the porous metal plate and the heating layer and has the thickness of 10-35 mu m; the heating layer is sintered on the surface of the dielectric layer; the dielectric layer is obtained by drying and sintering dielectric slurry; the medium slurry comprises the following components in parts by weight: 1-13% of aluminum oxide, 2-12% of silicon dioxide, 0-3% of copper oxide, 0-5% of molybdenum oxide, 0.5-5% of zinc oxide, 15-45% of glass powder, 0.5-5.5% of sodium silicate, 0-4.5% of titanium dioxide, 0.5-8% of polyvinyl alcohol, 0.5-5% of dispersing agent and the balance of pure water. According to the porous metal atomizing core, the viscosity and the insulativity between the porous metal atomizing core and a porous metal plate are improved by optimizing the component proportion and the thickness selection of the medium layer; meanwhile, the material has the advantages of high strength and toughness, impact resistance, no powder falling, long service life, reliability and the like.

Description

Porous metal atomizing core and preparation method thereof
Technical Field
The invention relates to the technical field of metal atomization core production, in particular to a porous metal atomization core and a preparation method thereof.
Background
The existing atomizing cores are generally divided into two categories, namely cotton cores and ceramic cores. For ceramic atomizing cores, it is common to include a ceramic substrate and a heating circuit. Heating circuits currently include many forms such as resistance wires, etched mesh sheets, and thick film printed circuits. The heating circuits in the forms are all solid heating bodies, heat generated by the heating circuits is transferred to the ceramic during atomization, then a thermal gradient is formed by taking the solid heating bodies as centers, and the ceramic bodies heat and vaporize atomized liquid to form atomized aerosol.
In the existing porous ceramic atomizing core, an atomizing interface is arranged on the ceramic at the periphery of a heating wire. The working heating circuit heats, heat is transferred to peripheral ceramics, the ceramics heat the atomized liquid, and more useless work is generated through twice transfer, most of power is lost, so that the atomization efficiency is low, the explosive force is weak during atomization, and the experience is influenced; moreover, the reduction degree of the atomized tobacco tar is low based on the structural limitation of the ceramic material; and the porous ceramic has low strength, is easy to break and fall off. In addition, according to the characteristics of the ceramic preparation process, the ceramic has blind holes, atomized liquid in the blind holes cannot be vaporized at high temperature, and the atomized liquid is cracked, aggregated and carbonized in an overheated state, so that the taste is changed.
Therefore, optimize to current atomizing core, replace ceramic atomizing core for porous metal atomizing core, can avoid ceramic atomizing core as the restriction of ceramic material structure itself, improve the toughness, the impact resistance of atomizing core, prevent to fall the powder, prolong atomizing core's reliability and life simultaneously.
However, the existing research on the porous metal atomizing core is less, and particularly, how to perform the blocking and conducting between the heating layer and the porous metal atomizing core and improve the viscosity and the insulativity of the blocking and conducting layer is a research focus.
Disclosure of Invention
Aiming at the defects of the prior art, the invention provides the porous metal atomizing core, which adopts the porous metal plate to replace porous ceramic as a base material, optimizes the component proportion and the thickness selection of the medium layer, improves the viscosity and the insulativity between the porous metal plate and the medium layer, ensures the isolation and conduction between the porous metal plate and the heating layer, ensures that the medium layer does not block the pores of the porous metal plate, and ensures the atomizing effect; the porous metal atomizing core has the advantages of high strength and toughness, impact resistance, no powder falling, long service life, reliability and the like.
Meanwhile, according to the preparation method of the porous metal atomizing core, the dielectric layer and the heating layer are coated or sintered after being coated, so that the layers are connected more tightly, the operation is simple and convenient, and the preparation method is suitable for large-scale production.
Specifically, the invention provides a porous metal atomization core which comprises a porous metal plate, a dielectric layer and a heating layer, wherein the dielectric layer is positioned between the porous metal plate and the heating layer and has the thickness of 10-35 mu m; the heating layer is sintered on the surface of the dielectric layer;
the dielectric layer is obtained by drying and sintering dielectric slurry; the medium slurry comprises the following components in parts by weight: 1-13% of aluminum oxide, 2-12% of silicon dioxide, 0-3% of copper oxide, 0-5% of molybdenum oxide, 0.5-5.0% of zinc oxide, 15-45% of glass powder, 0.5-5.5% of sodium silicate, 0-4.5% of titanium dioxide, 0.5-8.0% of polyvinyl alcohol, 0.5-5.0% of dispersing agent and the balance of water; the solid content of the medium slurry is 25-65%.
Preferably, the weight ratio of the sodium silicate to the glass powder is 1:8-39;
preferably, the weight ratio of the polyvinyl alcohol to the sodium silicate is 1-5:1.
preferably, the porous metal plate has a porosity of 55 to 85% and a pore diameter of 35 to 100 μm.
Preferably, the material of the porous metal plate is at least one of an iron-based material, a nickel-based material and stainless steel.
Preferably, the material of the heat generating layer is at least one of gold, silver palladium, platinum and nickel-based alloy.
The invention also provides a preparation method of the porous metal atomization core, which comprises the following steps:
s1, pretreatment, namely cleaning and drying a porous metal plate;
s2, coating the medium slurry, namely soaking the pretreated porous metal plate into the medium slurry, taking out and drying the porous metal plate, and repeating the operation until the thickness of the medium slurry coated on the surface of the porous metal plate reaches 10-35 mu m; or, the dielectric paste is evenly sprayed on the surface of the porous metal plate until the thickness of the dielectric paste on the surface of the porous metal plate reaches 10-35 μm;
s3, preparing a medium layer, and drying and pre-sintering the porous metal plate coated with the medium slurry;
s4, preparing a heating layer, printing the heating layer on the surface of the medium layer, and sintering to obtain the porous metal atomizing core.
Preferably, in step S1, the drying conditions are: the drying temperature is 60-120 ℃, and the drying time is 3-12h.
Preferably, in the step S3, the pre-sintering time is 30-80min.
Preferably, in the step S4, the sintering is performed in vacuum or air or protective gas atmosphere, and the sintering time is 30-100min.
Has the advantages that:
(1) The porous metal atomizing core takes a porous metal plate as a base material, and a dielectric layer and a heating layer are coated on the porous metal plate; the porous metal plate is used for replacing porous ceramic, so that the limitation of a ceramic material can be avoided, the porous metal plate is higher in strength, better in toughness and stronger in impact resistance, the reliability of the atomizing core can be improved, and the service life of the atomizing core can be prolonged; the dielectric layer is arranged between the porous metal plate and the heating layer, plays a role in blocking the heating layer and the porous metal plate from being conducted, meanwhile, the dielectric layer does not block the pores of the porous metal plate, and the porous metal plate can conduct heat with the heating layer through the pores, so that the atomization efficiency is improved.
(2) According to the porous metal atomizing core, the porous metal plate is limited, and the porous metal atomizing core is specifically limited to have proper porosity and pore size, so that heat conduction is facilitated, the atomizing efficiency is improved, and the atomizing rate is controlled; through component optimization and thickness selection of the dielectric layer dielectric slurry, the viscosity and the insulativity of the dielectric layer are improved, current conduction between the porous metal plate and the heating layer can be better prevented, and the service life of the atomizing core is prolonged; the heating layer material is selected from metal materials with small resistivity and good conductive effect, and is more favorable for conducting and heating.
(3) According to the preparation method of the porous metal atomizing core, the dielectric layer and the heating layer are coated or sintered after being coated, so that the layers are connected more tightly, the operation is simple and convenient, and the preparation method is suitable for large-scale production.
Drawings
In order to more clearly illustrate the technical solution of the present invention, the drawings needed to be used in the description of the embodiments are briefly introduced below, and it is obvious that the drawings in the following description are some embodiments of the present invention, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without creative efforts.
FIG. 1 is a schematic view of a porous metallic atomizing core of the present invention;
FIG. 2 is a top view of one embodiment of a porous metal atomizing core of the present invention;
FIG. 3 is a top view of one embodiment of a porous metal atomizing core of the present invention;
FIG. 4 is a microscopic view of a porous metal substrate prepared in example 1 of the present application;
fig. 5 is a microscopic view of the porous metal matrix prepared in comparative example 5.
Description of reference numerals: 1-a porous metal plate; 2-a dielectric layer; 3-heating layer.
Detailed Description
The technical solution in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention. It is to be understood that the embodiments described are only a few embodiments of the present invention, and not all embodiments. All other embodiments, which can be obtained by a person skilled in the art without making any creative effort based on the embodiments in the present invention, belong to the protection scope of the present invention.
It will be understood that the terms "comprises" and/or "comprising," when used in this specification and the appended claims, specify the presence of stated features, integers, steps, operations, elements, and/or components, but do not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components, and/or groups thereof.
It is also to be understood that the terminology used in the description of the invention herein is for the purpose of describing particular embodiments only and is not intended to be limiting. As used in the specification of the present invention and the appended claims, the singular forms "a," "an," and "the" are intended to include the plural forms as well, unless the context clearly indicates otherwise.
It should be further understood that the term "and/or" as used in this specification and the appended claims refers to any and all possible combinations of one or more of the associated listed items and includes such combinations.
It should be further understood that the term "concentration" as used in the present specification and appended claims refers to mass concentration, while "%" refers to mass percent content; unless otherwise indicated.
A porous metal atomizing core is composed of a core body,
as shown in fig. 1, the heat-generating heat-insulating plate comprises a porous metal plate 1, a medium layer 2 and a heat-generating layer 3; the medium layer 2 is positioned between the porous metal plate 1 and the heating layer 3, and the medium layer 2 is coated on the porous metal plate 1, so that the through state of the pores of the porous metal plate 1 is not influenced, namely the medium layer 2 does not block the pores of the porous metal plate 1.
The porous metal plate 1 has a porosity of 55 to 85% and a pore diameter of 35 to 100 μm, and the material of the porous metal plate 1 is preferably at least one of an iron-based material, a nickel-based material, and stainless steel. Specifically, the porous metal plate 1 is an atomizing core matrix and has the advantages of high strength, good toughness, strong impact resistance, no powder falling problem and the like; the material of the porous metal plate can be prepared by adopting a melt foaming method, a seepage casting method, a gas blowing method, a solid-gas eutectic reaction method, an investment casting method, a powder sintering method or a slurry foaming method and the like, so that the prepared material meets the requirements of 55-85% of porosity and 35-100 mu m of pore diameter.
The dielectric layer 2 is obtained by drying and sintering dielectric slurry and has the thickness of 10-35 mu m. The medium slurry comprises the following components in parts by weight: 1-13% of aluminum oxide, 2-12% of silicon dioxide, 0-3% of copper oxide, 0-5% of molybdenum oxide, 0.5-5.0% of zinc oxide, 15-45% of glass powder, 0.5-5.5% of sodium silicate, 0-4.5% of titanium dioxide, 0.5-8.0% of polyvinyl alcohol, 0.5-5.0% of dispersing agent and the balance of water; the slurry solid content of the medium is preferably 25-65%. Wherein the weight ratio of the sodium silicate to the glass powder is preferably 1:8-39; the weight ratio of the polyvinyl alcohol to the sodium silicate is preferably 1-5:1; the dispersant can be at least one of stearic acid, PVP (polyvinylpyrrolidone) and polyacrylic acid; the water is preferably pure water.
The medium slurry is prepared by a ball milling method, can be uniformly coated on the surface framework of the porous metal plate 1 by methods of dipping, coating, spraying or printing and the like, has the thickness of 10-35um, is dried and then is sintered and solidified at high temperature in vacuum, air or protective gas atmosphere, and the protective gas is preferably clean gas such as nitrogen, hydrogen, argon and the like.
The dielectric layer 2 functions to block the conduction of current between the heat generating layer 3 and the porous metal plate 1.
The heat generating layer 3 is disposed on the dielectric layer 2, preferably, at least one of gold, silver palladium, platinum, nickel-based alloy, and the like, and is disposed on the dielectric layer 2 by printing or spraying, without limitation to a specific pattern, the heat generating layer may be a regular pattern, such as a square, a rectangle, a circle, and the like, or an irregular pattern, specifically, in some embodiments, the pattern of the heat generating layer 3 is as shown in fig. 2, and in other embodiments, the pattern of the heat generating layer 3 is as shown in fig. 3. The heating layer 3 can be prepared by vacuum, air or protective gas atmosphere high-temperature sintering, and the protective gas is preferably clean gas such as nitrogen, hydrogen, argon and the like.
The utility model provides an atomizing process of porous metal atomizing core, it is specific, generate heat after 3 circular telegrams in layer that generate heat, then through dielectric layer 2 and porous metal plate 1's hole heat-conduction, heat conduction to porous metal plate 1's inside, the atomizing material that makes cladding or place in the porous metal plate 1 atomizes.
A method for preparing a porous metal atomizing core,
the method comprises the following steps:
s1, pretreatment, namely cleaning and drying a porous metal plate;
s2, coating the medium slurry, immersing the pretreated porous metal plate into the medium slurry, taking out and drying, and repeating the operation until the thickness of the medium slurry coated on the surface of the porous metal plate reaches 10-35 mu m; or, the dielectric paste is evenly sprayed on the surface of the porous metal plate until the thickness of the dielectric paste on the surface of the porous metal plate reaches 10-35 μm;
s3, preparing a dielectric layer, and drying and presintering the porous metal plate coated with the dielectric slurry;
s4, preparing a heating layer, printing the heating layer on the surface of the medium layer, and sintering to obtain the porous metal atomizing core.
In particular, the method comprises the following steps of,
(1) Washing the porous metal plate with low-concentration acid and alkali, ultrasonically cleaning with clear water, and drying at 60-120 ℃ for 3-12h; specifically, the acid washing can be performed by using low-concentration acid such as dilute hydrochloric acid, dilute sulfuric acid, dilute nitric acid and the like, and the alkali washing can be performed by using sodium carbonate, potassium carbonate, low-concentration sodium hydroxide, low-concentration potassium hydroxide and the like.
(2) Immersing one surface of the porous metal plate obtained in the step (1) into the dielectric slurry for 3-15s, taking out, airing or drying, and repeating the operation for 1-5 times to ensure that the thickness of the dielectric slurry coated on the surface of the framework of the surface of the porous metal plate reaches 10-35um; or uniformly spraying medium slurry with the thickness of 10-35um on the surface of the porous metal plate;
(3) Putting the porous metal plate obtained in the step (2) into a drying oven for drying for 30-60min;
(4) Pre-sintering the porous metal plate obtained in the step (3) for 30-80min;
(5) Printing a layer of the heating layer on the surface of the medium layer of the porous metal plate obtained in the step (4) by a printing method;
(6) And (6) sintering the porous metal plate obtained in the step (5) in a vacuum, air or protective gas atmosphere for 30-100min to obtain the porous metal atomization core.
Example 1
The atomizing core is made of an open porous metal plate as an atomizing core substrate, wherein the porosity of the porous metal plate is 70-75%, the pore diameter is 85-95 microns, and the material is stainless steel.
Preparing a dielectric layer on the surface of the porous metal plate by using an immersion method, wherein the dielectric slurry comprises the following components in parts by weight: 5.5% of alumina, 6% of silica, 0.6% of copper oxide, 2.5% of zinc oxide, 19.4% of glass powder, 0.5% of sodium silicate, 3.5% of titanium dioxide, 2.5% of PVA (polyvinyl alcohol), 0.8% of dispersant and the balance of pure water. The dispersant is selected from stearic acid.
The solid content of the medium slurry is about 38 percent, and the medium slurry with the fineness less than 5um and uniform dispersion is prepared by ball milling for 24-48h by a ball mill. The thickness of the metal framework adhesive medium slurry on the surface of the porous metal plate is 20-30um, the porous metal plate is sintered after being dried, the sintering temperature is 1000-1200 ℃, the temperature is kept for 30min, the medium slurry is presintered and solidified on the surface of the porous metal plate, and open pores are reserved.
And then, printing nickel-based resistance slurry on the surface of the dielectric layer of the porous metal plate of the pre-sintered dielectric layer in a screen printing mode to form a heating circuit, drying, and sintering for 30-60min at the high temperature of 950-1100 ℃ in a vacuum or protective atmosphere to sinter the heating layer circuit and tightly adhere the heating layer circuit to the surface of the dielectric layer, thereby completing the preparation of the porous metal atomization core.
Example 2
The porous metal plate with the open pores is used as an atomizing core substrate, the porosity of the porous metal plate is 60-65%, the pore diameter is 55-65um, and the selected material is a nickel-based material.
Preparing a dielectric layer on the surface of the porous metal plate by a spraying method, wherein the dielectric slurry comprises the following components in parts by weight: 1.2% of alumina, 2.6% of silica, 2.2% of copper oxide, 2.5% of molybdenum oxide, 0.5% of zinc oxide, 35% of glass powder, 1% of sodium silicate, 4.5% of PVA, 1.2% of dispersant and the balance of pure water. The dispersing agent is PVP (polyvinylpyrrolidone).
The solid content of the medium slurry is about 45 percent, and the medium slurry with the fineness less than 3um and uniform dispersion is prepared by ball milling for 24-48h by a ball mill. Spraying the medium slurry onto the surface of the porous metal plate, wherein the thickness of the medium slurry of the metal framework is 12-18um, drying and sintering, wherein the sintering temperature is 800-1000 ℃, the heat preservation is carried out for 30min, and the medium slurry is presintered and solidified on the surface of the porous metal plate and the open pores are reserved.
And then printing silver-palladium resistance paste on the surface of the medium layer of the porous metal plate of the pre-sintered medium layer in a screen printing mode to form a heating layer, drying, and sintering at 700-900 ℃ for 30-60min to sinter the heating layer circuit and tightly adhere the heating layer circuit to the surface of the medium layer, thereby completing the preparation of the porous metal atomization core.
Example 3
The porous metal plate with the open pores is used as an atomizing core matrix, the porosity of the porous metal plate is 55-65%, the pore diameter of the porous metal plate is 85-100 microns, and the porous metal plate is made of an iron-based material.
Preparing a dielectric layer on the surface of the porous metal plate by a spraying method, wherein the dielectric slurry comprises the following components in parts by weight: 13.0 percent of alumina, 2.0 percent of silicon dioxide, 3.0 percent of copper oxide, 5.0 percent of molybdenum oxide, 5.0 percent of zinc oxide, 15 percent of glass powder, 5.5 percent of sodium silicate, 1 percent of titanium dioxide, 0.5 percent of PVA, 0.5 percent of dispersant and the balance of pure water. The dispersant is polyacrylic acid.
The solid content of the medium slurry is about 49.5 percent, and the medium slurry with the fineness less than 3um and uniform dispersion is prepared by ball milling for 24-48h by a ball mill. Spraying the medium slurry on the surface of the porous metal plate, wherein the thickness of the medium slurry of the metal framework is 12-18um, drying and sintering, the sintering temperature is 900-1200 ℃, keeping the temperature for 30min, and pre-sintering and solidifying the medium slurry on the surface of the porous metal plate and reserving open pores.
And printing platinum resistance slurry on the surface of the medium layer of the porous metal plate of the pre-sintered medium layer in a screen printing mode to form a heating circuit, drying, and sintering at 800-1000 ℃ for 30-60min to sinter the heating layer circuit and tightly adhere the heating layer circuit to the surface of the medium layer, thereby completing the preparation of the porous metal atomization core.
Example 4
The atomizing core is made of an open porous metal plate serving as an atomizing core substrate, wherein the porosity of the porous metal plate is 75-85%, the pore diameter of the porous metal plate is 35-45 mu m, and the porous metal plate is made of stainless steel.
Preparing a dielectric layer on the surface of the porous metal plate by a spraying method, wherein the dielectric slurry comprises the following components in parts by weight: 1.0% by weight of alumina, 12.0% by weight of silica, 0.5% by weight of molybdenum oxide, 0.5% by weight of zinc oxide, 35% by weight of glass frit, 1.5% by weight of sodium silicate, 4.5% by weight of titanium dioxide, 8% by weight of PVA, 5% by weight of dispersant, and the balance pure water. The dispersing agent is a mixture of stearic acid (weight content of 0.2%) and polyacrylic acid (weight content of 0.3%).
The solid content of the medium slurry is about 55 percent, and the medium slurry with the fineness less than 3um and uniform dispersion is prepared by ball milling for 24-48 hours by a ball mill. Spraying the medium slurry on the surface of the porous metal plate, wherein the thickness of the medium slurry of the metal framework is 12-18um, drying and sintering, the sintering temperature is 800-1000 ℃, keeping the temperature for 30min, and pre-sintering and solidifying the medium slurry on the surface of the porous metal plate and reserving open pores.
And then, printing gold resistance paste on the surface of the medium layer of the porous metal plate of the pre-sintered medium layer in a screen printing mode to form a heating circuit, and sintering for 30-60min at 700-900 ℃ after drying to enable the heating layer circuit to be sintered and tightly adhered to the surface of the medium layer, thereby completing the preparation of the porous metal atomization core.
While a comparative example was set up according to example 1. The differences between the comparative example and example 1 are shown in Table 1.
TABLE 1 differences between the comparative example and example 1
Figure BDA0003991527710000111
The ceramic substrates obtained in examples 1 to 4 and comparative examples 1 to 8 were examined, and the results obtained are shown in Table 2 below.
And (3) medium layer viscosity: the medium layer is scratched by a hard object, the adhesion of the medium layer is observed by a CCD magnifier, and the separation condition is used for judging whether the medium layer is adhered or not (the grades are superior, good, better, poorer and poor).
Dielectric layer insulation: testing the square resistance value of the dielectric layer by adopting a square resistance instrument-four-point probe method to judge the insulativity, wherein if the square resistance is less than 1 MOmega, the insulativity is poor in conductivity; if the sheet resistance is greater than 1M omega or infinity, the insulation is considered to be good and non-conductive. The service life of the atomization core is as follows: and (4) testing by adopting a smoke extractor with the same smoke cartridge structure, wherein the smoke extractor stops for 8s under the test condition, and 45ml or 55ml of smoke is tested to be invalid at each port, and the test times are compared.
Atomization efficiency: the smoke quantity per mouth is calculated according to the test process to be characterized.
TABLE 2 table of performance results for examples 1-4 and comparative examples 1-8
Figure BDA0003991527710000121
As can be seen from Table 3, the atomizing cores prepared in examples 1-4 had a service life of greater than 750 mouths and an aerosol amount of greater than 6.59mg. The dielectric layers of the comparative examples 1, 3, 5 and 6 have poor viscosity and insufficient insulativity, and do not meet the preparation requirement of the atomizing core; the atomizing cores of comparative examples 2, 4, 7 and 8 have obviously lower service life or lower smoke amount and do not meet the use requirement of the atomizing cores.
Wherein, a microscopic view of the porous metal matrix prepared in example 1 of the present application, as shown in fig. 4; a microscopic view of the porous metal matrix prepared in comparative example 5, as shown in fig. 5. Fig. 4 corresponds to the structure at a in fig. 5, and the structure at B corresponds; therefore, as shown by comparing the structures at A and B in FIGS. 4-5, the porous metal matrix prepared in comparative example 5 has a low porosity and a poor adhesion.
In the above embodiments, the descriptions of the respective embodiments have respective emphasis, and for parts that are not described in detail in a certain embodiment, reference may be made to related descriptions of other embodiments.
The above description is only an embodiment of the present invention, and not intended to limit the scope of the present invention, and all modifications of equivalent structures and equivalent processes performed by the present specification and drawings, or directly or indirectly applied to other related technical fields, are included in the scope of the present invention.

Claims (10)

1. A porous metal atomization core is characterized by comprising a porous metal plate, a dielectric layer and a heating layer, wherein the dielectric layer is positioned between the porous metal plate and the heating layer and has the thickness of 10-35 mu m; the heating layer is sintered on the surface of the dielectric layer;
the dielectric layer is obtained by drying and sintering dielectric slurry; the medium slurry comprises the following components in parts by weight: 1-13% of aluminum oxide, 2-12% of silicon dioxide, 0-3% of copper oxide, 0-5% of molybdenum oxide, 0.5-5.0% of zinc oxide, 15-45% of glass powder, 0.5-5.5% of sodium silicate, 0-4.5% of titanium dioxide, 0.5-8.0% of polyvinyl alcohol, 0.5-5.0% of dispersing agent and the balance of water; the solid content of the medium slurry is 25-65%.
2. The porous metal atomizing core of claim 1, wherein the weight ratio of the sodium silicate to the glass frit is 1:8-39.
3. The porous metal atomizing core of claim 1, wherein the weight ratio of polyvinyl alcohol to sodium silicate is from 1 to 4:1.
4. the porous metal atomizing core according to claim 1, wherein the porous metal plate has a porosity of 55 to 85% and a pore diameter of 35 to 100 μm.
5. The porous metal atomizing core of claim 1, wherein the material of the porous metal plate is at least one of an iron-based material, a nickel-based material, and stainless steel.
6. The porous metal atomizing core according to claim 1, wherein the heat generating layer is made of at least one of gold, silver palladium, platinum and nickel-based alloy.
7. The method of making a porous metallic atomizing core according to any one of claims 1 to 6, comprising the steps of:
s1, pretreatment, namely cleaning and drying a porous metal plate;
s2, coating the medium slurry, immersing the pretreated porous metal plate into the medium slurry, taking out and drying, and repeating the operation until the thickness of the medium slurry coated on the surface of the porous metal plate reaches 10-35 mu m; or, the dielectric paste is uniformly sprayed on the surface of the porous metal plate until the thickness of the dielectric paste on the surface of the porous metal plate reaches 10-35 μm;
s3, preparing a dielectric layer, and drying and presintering the porous metal plate coated with the dielectric slurry;
s4, preparing a heating layer, printing the heating layer on the surface of the medium layer, and sintering to obtain the porous metal atomizing core.
8. The method for preparing a porous metal atomizing core according to claim 7, wherein in the step S1, the drying conditions are as follows: the drying temperature is 60-120 ℃, and the drying time is 3-12h.
9. The method for preparing a porous metal atomizing core according to claim 7, wherein the pre-sintering time in the step S3 is 30 to 80min.
10. The method for preparing the porous metal atomizing core according to claim 7, wherein in the step S4, the sintering is performed in vacuum or air or protective gas atmosphere, and the sintering time is 30-100min.
CN202211583831.7A 2022-12-09 2022-12-09 Porous metal atomizing core and preparation method thereof Pending CN115721055A (en)

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