CN115716761A - Method for treating quartz surface roughness by chemical reaction mode - Google Patents
Method for treating quartz surface roughness by chemical reaction mode Download PDFInfo
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- CN115716761A CN115716761A CN202211440190.XA CN202211440190A CN115716761A CN 115716761 A CN115716761 A CN 115716761A CN 202211440190 A CN202211440190 A CN 202211440190A CN 115716761 A CN115716761 A CN 115716761A
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- quartz
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- quartz component
- chemical reaction
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 108
- 239000010453 quartz Substances 0.000 title claims abstract description 94
- 238000006243 chemical reaction Methods 0.000 title claims abstract description 21
- 238000000034 method Methods 0.000 title claims abstract description 19
- 230000003746 surface roughness Effects 0.000 title claims abstract description 15
- 238000004140 cleaning Methods 0.000 claims abstract description 23
- 238000010438 heat treatment Methods 0.000 claims abstract description 17
- 238000002791 soaking Methods 0.000 claims abstract description 14
- 238000001035 drying Methods 0.000 claims abstract description 12
- 238000005498 polishing Methods 0.000 claims abstract description 12
- 238000005406 washing Methods 0.000 claims abstract description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 7
- 238000007664 blowing Methods 0.000 claims abstract 4
- 239000000243 solution Substances 0.000 claims description 49
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 44
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims description 30
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 claims description 22
- 239000007864 aqueous solution Substances 0.000 claims description 22
- 238000002156 mixing Methods 0.000 claims description 18
- 238000007654 immersion Methods 0.000 claims description 3
- 238000007605 air drying Methods 0.000 claims 1
- 238000009736 wetting Methods 0.000 claims 1
- 235000012239 silicon dioxide Nutrition 0.000 description 71
- 238000005422 blasting Methods 0.000 description 6
- 239000000377 silicon dioxide Substances 0.000 description 5
- 238000002360 preparation method Methods 0.000 description 4
- 229910052500 inorganic mineral Inorganic materials 0.000 description 3
- 239000011707 mineral Substances 0.000 description 3
- 229910052681 coesite Inorganic materials 0.000 description 2
- 229910052906 cristobalite Inorganic materials 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000000227 grinding Methods 0.000 description 2
- 239000002932 luster Substances 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 229910052682 stishovite Inorganic materials 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229910052905 tridymite Inorganic materials 0.000 description 2
- 229910000519 Ferrosilicon Inorganic materials 0.000 description 1
- 239000006004 Quartz sand Substances 0.000 description 1
- 238000003776 cleavage reaction Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 239000004519 grease Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052592 oxide mineral Inorganic materials 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 239000011819 refractory material Substances 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 230000007017 scission Effects 0.000 description 1
- 230000035922 thirst Effects 0.000 description 1
- 229910021489 α-quartz Inorganic materials 0.000 description 1
- 229910000500 β-quartz Inorganic materials 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
The invention discloses a method for treating quartz surface roughness by a chemical reaction mode, which comprises the following steps: s1: polishing the surface of the quartz component to be subjected to rough treatment, and polishing the rough surface; s2: and cleaning the polished surface of the quartz component, and then, blowing and drying the surface of the quartz component by adopting a blowing drying device. And soaking the dried quartz component in the final solution obtained in the step S4, heating to 80-90 ℃, maintaining the temperature for soaking, fully cleaning the attachments on the surface of the quartz component, and washing with plasma water after cleaning is finished, so that the effect of treating the roughness of the quartz surface in a chemical reaction manner is achieved, and the effect of meeting the application requirement at a higher degree is achieved.
Description
Technical Field
The invention relates to the technical field of quartz processing, in particular to a method for treating quartz surface roughness by a chemical reaction mode.
Background
Quartz, a geological term generally used to refer to low temperature quartz (α -quartz), is the most widely distributed one of the minerals in the quartz family, and also includes high temperature quartz (β -quartz), chrysolite, and the like. The main component is SiO2, which is colorless and transparent, often contains a small amount of impurity components, and becomes semitransparent or opaque crystals with hard texture. Quartz is a mineral resource with stable physical and chemical properties, belongs to oxide minerals of trigonal systems, is also called silica, is mainly a raw material for producing quartz sand (also called silica sand), is also a quartz refractory material and a raw material for firing ferrosilicon, is a mineral composed of silicon dioxide, and has a chemical formula of SiO2. The pure quartz is colorless and transparent, and has various colors due to the trace pigment ions or the finely dispersed inclusion or the color center, and the transparency is reduced; glass luster, fracture grease luster. A hardness of 7; no cleavage is carried out; shell-like fractures. The specific gravity is 2.65. Has piezoelectricity. Colorless, transparent quartz, known by greeks as "Krystallos," means "white ice," they believe that quartz is a durable, strong ice. Ancient Chinese believes that the crystal contained cold in the mouth can quench thirst.
At present, in the process of processing quartz, the rough treatment of the quartz surface is basically carried out by grinding and polishing, but the smoothness of the treatment in the way is limited, and the higher application requirement is difficult to meet.
Disclosure of Invention
The invention aims to solve the defects in the prior art, and provides a method for treating quartz surface roughness by a chemical reaction mode.
A method for treating quartz surface roughness by a chemical reaction mode comprises the following steps:
s1: polishing the surface of the quartz component needing to be subjected to rough treatment, and polishing the rough surface;
s2: cleaning the polished surface of the quartz component, and then, blasting and drying the surface of the quartz component by adopting blasting drying equipment;
s3: preparing a chemical reaction solution for treating the ear with rough quartz surface, and mixing a hydrofluoric acid gas aqueous solution with the concentration of 36.5% -42.5% and ammonium fluoride with the concentration of more than 85%, wherein the mass ratio of the hydrofluoric acid gas aqueous solution to the ammonium fluoride is 1.85, so as to obtain a preparation solution;
s4: mixing the hydrofluoric acid gas aqueous solution and the ammonium fluoride in a mass ratio of 1.85 to dissolve the ammonium fluoride in the hydrofluoric acid gas aqueous solution, and mixing the solution with a pure acetic acid solution to obtain a final solution;
s5: soaking the dried quartz component in the final solution in the step S4;
s6: and (5) heating the final solution soaked in the quartz component in the step (S5), heating to 80-90 ℃, and maintaining the temperature for soaking.
S7: and taking out the heated and soaked quartz component, fully cleaning the surface of the quartz component, fully cleaning the attachments on the surface of the quartz component, washing the quartz component by plasma water once after the cleaning is finished, and drying the quartz component.
Preferably; the concentration of the mixed pure acetic acid solution in the step S4 is more than 98 percent and 5 percent.
Preferably; the time for the quartz member to be immersed in the final solution in step S4 in step S5 is forty-five to fifty-five minutes.
Preferably; the final solution impregnated into the quartz member in step S6 is maintained for 25 to 35 minutes after heating.
Preferably; the time for which the final solution impregnated into the quartz member is maintained after heating in step S6 is 15 minutes to 20 minutes.
The invention provides a method for treating quartz surface roughness by a chemical reaction mode, which comprises the steps of preparing a hydrofluoric acid gas aqueous solution with the concentration of 36.5-42.5% and mixing ammonium fluoride with the concentration of more than 85%, mixing the hydrofluoric acid gas aqueous solution with the mass ratio of 1:1.85 with the ammonium fluoride to dissolve the ammonium fluoride in the hydrofluoric acid gas aqueous solution, mixing the solution with a pure acetic acid preparation solution, soaking a dried quartz component in the final solution in the step S4, finally heating, heating to the temperature of 80-90 ℃, maintaining the temperature for soaking, fully cleaning attachments on the surface of the quartz component, and washing by plasma water after cleaning is finished, so that the effect of treating the quartz surface roughness by the chemical reaction mode is achieved, and the effect of meeting application requirements of higher degree is achieved.
Detailed Description
The present invention will be further illustrated with reference to the following specific examples.
Example 1: the invention provides a method for treating quartz surface roughness by a chemical reaction mode, which comprises the following steps:
s1: polishing the surface of the quartz component needing to be subjected to rough treatment, and polishing the rough surface;
s2: cleaning the polished surface of the quartz component, and then, blasting and drying the surface of the quartz component by adopting blasting drying equipment;
s3: preparing a chemical reaction solution for treating the ear with rough quartz surface, and mixing a hydrofluoric acid gas aqueous solution with the concentration of 36.5% -42.5% and ammonium fluoride with the concentration of more than 85%, wherein the mass ratio of the hydrofluoric acid gas aqueous solution to the ammonium fluoride is 1.85, so as to obtain a prepared solution;
s4: mixing the hydrofluoric acid gas aqueous solution and the ammonium fluoride in a mass ratio of 1.85 to dissolve the ammonium fluoride in the hydrofluoric acid gas aqueous solution, and mixing the solution with a pure acetic acid solution to obtain a final solution;
s5: soaking the dried quartz component in the final solution in the step S4;
s6: and (5) heating the final solution soaked in the quartz component in the step (S5), heating to 80-90 ℃, and maintaining the temperature for soaking.
S7: and taking out the heated and soaked quartz component, fully cleaning the surface of the quartz component, fully cleaning the attachments on the surface of the quartz component, washing the quartz component by plasma water once after the cleaning is finished, and drying the quartz component.
Wherein, the concentration of the mixed pure acetic acid solution in the step S4 is more than 98 percent and 5 percent.
Wherein the immersion time in the final solution of step S4 for the quartz member in step S5 is from forty-five minutes to fifty-five minutes.
Wherein the final solution soaked in the quartz component in the step S6 is maintained for 25 to 35 minutes after being heated.
Example 2: the invention provides a method for treating quartz surface roughness by a chemical reaction mode, which comprises the following steps:
s1: polishing the surface of the quartz component to be subjected to rough treatment, and polishing the rough surface;
s2: cleaning the polished surface of the quartz component, and then, blasting and drying the surface of the quartz component by adopting blasting drying equipment;
s3: preparing a chemical reaction solution for treating the ear with rough quartz surface, and mixing a hydrofluoric acid gas aqueous solution with the concentration of 36.5% -42.5% and ammonium fluoride with the concentration of more than 85%, wherein the mass ratio of the hydrofluoric acid gas aqueous solution to the ammonium fluoride is 1.85, so as to obtain a preparation solution;
s4: mixing the hydrofluoric acid gas aqueous solution and ammonium fluoride according to the mass ratio of 1.85 to dissolve the ammonium fluoride in the hydrofluoric acid gas aqueous solution, and mixing the solution and the pure acetic acid solution to obtain a final solution;
s5: soaking the dried quartz component in the final solution in the step S4;
s6: and (5) heating the final solution soaked in the quartz component in the step (S5), heating to 80-90 ℃, and maintaining the temperature for soaking.
S7: and taking out the heated and soaked quartz component, fully cleaning the surface of the quartz component, fully cleaning the attachments on the surface of the quartz component, washing the quartz component by plasma water once after the cleaning is finished, and drying the quartz component.
Wherein, the concentration of the mixed pure acetic acid solution in the step S4 is more than 98 percent and 5 percent.
Wherein the time for the quartz member to be immersed in the final solution in step S4 in step S5 is forty-five to fifty-five minutes.
Wherein the time for heating and maintaining the final solution impregnated into the quartz member in step S6 is 15 to 20 minutes.
The invention provides a method for treating quartz surface roughness by a chemical reaction mode, which comprises the steps of preparing a hydrofluoric acid gas aqueous solution with the concentration of 36.5-42.5% and mixing ammonium fluoride with the concentration of more than 85%, mixing the hydrofluoric acid gas aqueous solution with the mass ratio of 1.85 and the ammonium fluoride to dissolve the ammonium fluoride in the hydrofluoric acid gas aqueous solution, mixing the solution with a pure acetic acid preparation solution, soaking a dried quartz component in the final solution in the step S4, heating to the temperature of 80-90 ℃, maintaining the temperature for soaking, fully cleaning attachments on the surface of the quartz component, and washing by plasma water after cleaning is finished, so that the effect of treating the surface roughness of the quartz by the chemical reaction mode is achieved, and the effect of meeting application requirements of higher degree is achieved; the method solves the problems that the rough treatment of the quartz surface is basically carried out by grinding and polishing in the prior quartz processing process, but the smooth degree of the treatment by the method is limited, and the higher application requirement is difficult to meet.
The above description is only for the preferred embodiment of the present invention, but the scope of the present invention is not limited thereto, and any person skilled in the art should be considered to be within the technical scope of the present invention, and the technical solutions and the inventive concepts thereof according to the present invention should be equivalent or changed within the scope of the present invention.
Claims (5)
1. A method for treating quartz surface roughness by a chemical reaction mode is characterized by comprising the following steps:
s1: polishing the surface of the quartz component to be subjected to rough treatment, and polishing the rough surface;
s2: cleaning the surface of the polished quartz component, and then blowing air to dry the surface of the quartz component by adopting a blowing air drying device;
s3: preparing a chemical reaction solution for treating the ear with rough quartz surface, and mixing a hydrofluoric acid gas aqueous solution with the concentration of 36.5% -42.5% and ammonium fluoride with the concentration of more than 85%, wherein the mass ratio of the hydrofluoric acid gas aqueous solution to the ammonium fluoride is 1.85, so as to obtain a prepared solution;
s4: mixing the hydrofluoric acid gas aqueous solution and ammonium fluoride according to the mass ratio of 1.85 to dissolve the ammonium fluoride in the hydrofluoric acid gas aqueous solution, and mixing the solution and the pure acetic acid solution to obtain a final solution;
s5: soaking the dried quartz component in the final solution in the step S4;
s6: and (5) heating the final solution soaked in the quartz component in the step (S5), heating to 80-90 ℃, and maintaining the temperature for soaking.
S7: and taking out the heated and soaked quartz component, fully cleaning the surface of the quartz component, fully cleaning the attachments on the surface of the quartz component, washing the quartz component by plasma water once after the cleaning is finished, and drying the quartz component.
2. The method for treating the quartz surface roughness by the chemical reaction mode according to claim 1, wherein the concentration of the pure acetic acid solution mixed in the step S4 is more than 98%. 5.
3. The method for treating the roughness of the quartz surface by the chemical reaction manner as claimed in claim 1, wherein the immersion time of the quartz member in the final solution in the step S4 for the immersion in the step S5 is from forty-five minutes to fifty-five minutes.
4. The method as claimed in claim 1, wherein the heating of the final solution for wetting the quartz member in step S6 is maintained for a period of 25 to 35 minutes.
5. The method for treating the quartz surface roughness by the chemical reaction manner as claimed in claim 1, wherein the time for heating the final solution infiltrated into the quartz component in the step S6 is 15 minutes to 20 minutes.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211440190.XA CN115716761A (en) | 2022-11-17 | 2022-11-17 | Method for treating quartz surface roughness by chemical reaction mode |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211440190.XA CN115716761A (en) | 2022-11-17 | 2022-11-17 | Method for treating quartz surface roughness by chemical reaction mode |
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| Publication Number | Publication Date |
|---|---|
| CN115716761A true CN115716761A (en) | 2023-02-28 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202211440190.XA Pending CN115716761A (en) | 2022-11-17 | 2022-11-17 | Method for treating quartz surface roughness by chemical reaction mode |
Country Status (1)
| Country | Link |
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Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101367618A (en) * | 2008-09-23 | 2009-02-18 | 沈阳汉科半导体材料有限公司 | Chemical granulation processing method for quartz surface |
| CN110510886A (en) * | 2019-09-18 | 2019-11-29 | 沈阳汉科半导体材料有限公司 | Chemical granulation processing method for quartz surface |
-
2022
- 2022-11-17 CN CN202211440190.XA patent/CN115716761A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101367618A (en) * | 2008-09-23 | 2009-02-18 | 沈阳汉科半导体材料有限公司 | Chemical granulation processing method for quartz surface |
| CN110510886A (en) * | 2019-09-18 | 2019-11-29 | 沈阳汉科半导体材料有限公司 | Chemical granulation processing method for quartz surface |
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Application publication date: 20230228 |
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