CN1157103C - Composite probe for plasma diagnosis - Google Patents
Composite probe for plasma diagnosis Download PDFInfo
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- CN1157103C CN1157103C CNB021095191A CN02109519A CN1157103C CN 1157103 C CN1157103 C CN 1157103C CN B021095191 A CNB021095191 A CN B021095191A CN 02109519 A CN02109519 A CN 02109519A CN 1157103 C CN1157103 C CN 1157103C
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Abstract
The present invention relates to a novel composite probe used for high-precision and real-time measurement with spatial resolution for plasma parameters, which belongs to the technical field of plasma diagnosis. The present invention is characterized in that a Langmuir single probe and a difference emission probe are integrated and installed into the same probe tube so as to form the novel composite probe. The present invention realizes the high-precision and real-time measurement of plasma parameters by combining a Langmuir single probe scanning circuit, an automatic tracking circuit of the space electric potential for the difference emission probe, a pulse generating circuit of square waves, a computer interface circuit and a computer software for automatically collecting and analyzing data. The present invention has the characteristics of high measuring precision and high measuring speed, and besides, the present invention can obtain time and spatial distribution information of plasma parameters as well as observe a voltampere (V-I) characteristic curve of the Langmuir single probe in real time. The present invention is widely suitable for the scientific research and the industrial application of plasmas.
Description
Technical field
The invention belongs to the Plasma Diagnostics field.Be a kind of new combined probe diagnostic techniques that forms based on bright wrong your (Langmuir) single probe is combined with the difference emitting probe, relate to the accurate mensuration of plasma parameter, monitoring in real time and spatial and temporal distributions measurement.
Background technology
At present, bright wrong your (Langmuir) electrostatic probe that is used for plasma diagnostic has single probe, two probe, emitting probe and difference emitting probe etc.The structure of single probe as shown in Figure 1, front end (being probe) is a dystectic fine wire (or little metal disk, or little metal ball), with the lead that is enclosed within the insulating sleeve (or metal sleeve of interior insulation) probe is connected with a scalable power supply.During use, probe portion is placed in the plasma, one of scalable power supply end is connected with probe lead, the other end is connected with plasma chamber wall (this locular wall should have good the contact with plasma), and locular wall is connected with ground, laboratory.And by figure access potentiometer and ammeter.Suppose that plasma is in stable status, regulate regulated power supply and make it apply different current potentials to probe that each current potential (being read by potentiometer) of corresponding probe is by the electric current of ammeter reading flow through probe.With measured probe current potential is abscissa, is the ordinate mapping with the probe current, promptly gets volt-ampere (V-I) characteristic curve (accompanying drawing 2) of the single probe of Langmuir.The voltage-current characteristic of analysis list probe can get the information such as electron temperature, electron density (and ion concentration), space potential, floating potential and Electron energy distribution function of the plasma of surveying.It is worthy of note that, the plasma space current potential generally is that the flex point from single probe volt-ampere characteristic reads, and is commonly called as to be bathmometry here.On the principle, the flex point of single probe volt-ampere characteristic be so a bit, equate with the plasma space current potential at this spot scan voltage, probe current reaches the electronics saturation current, scanning voltage continues to improve, probe current still remains unchanged, be that single probe volt-ampere characteristic is after having crossed the scanning voltage value of corresponding plasma space current potential, should remain a horizontal linear, shown in dotted line in the accompanying drawing 2, meaning promptly when abscissa is the plasma space current potential, a bit fairly obvious flex point can occur; In fact, there are reasons such as edge effect owing to probe, when the probe current potential is higher than the plasma space current potential, probe current still continues slightly to increase, shown in solid line in the accompanying drawing 2, therefore the position of flex point becomes not really definite, and meaning is about to produce the flex point position error, makes that the plasma space potential errors of trying to achieve with single probe bathmometry is bigger.Moreover, because corresponding this abscissa value of plasma space current potential, its ordinate value is electronics saturation current I
E0And the electronics saturation current will be used to find the solution electron density (and ion concentration).So, the plasma space current potential than mistake also will cause electron density (and ion concentration) than mistake.As seen it is very important accurately measuring the plasma space current potential.For this reason, emitting probe and difference emitting probe are invented in succession.Difference emitting probe as shown in accompanying drawing 3, it can directly indicate the plasma space current potential of probe present position in real time.Unfortunately, emitting probe or difference emitting probe can only provide the information of plasma space current potential aspect; But people need the information of other parameters toward contact.In this case, people have to adopt two kinds of probes simultaneously: difference emitting probe (or emitting probe) and single probe.Try to achieve the plasma space current potential with the difference emitting probe, on the volt-ampere characteristic of single probe, find out corner position more exactly according to this space potential value again, thereby find out electronics saturation current value more exactly, and then try to achieve electron density (and ion concentration).Though thing has had progress, problem still exists.Please imagine practical situations: if two kinds of probes are installed in same plasma device simultaneously, one is the insertion of two probes, the disturbance that must strengthen the article on plasma body; The 2nd, the plasma space current potential of difference emitting probe position is not necessarily to be exactly the value of single probe position, can only be a kind of approximate, and this just has error.That has just more bothered if use two kinds of probes in succession at same position, and error is also bigger.
Summary of the invention
The objective of the invention is to take into account the two advantage of bright wrong your (Langmuir) single probe and difference emitting probe, in conjunction with microcomputer data collection and analysis technology, provide a kind of new high-precision, can gather and analyze data automatically and be convenient to the probe system of experimental observation.
Technical scheme of the present invention is that bright wrong that (Langmuir) single probe and the two integrated being installed in of difference emitting probe are constituted combined probe in the same probe tube, and the distance between single probe and the difference emitting probe is 0.6 millimeter to 2.0 millimeters; The combined probe circuit comprises single probe scanning circuit, difference emitting probe space potential tracking circuit, square wave pulse generating circuit and computer interface circuit.Single probe scanning circuit will be signal with respect to ground, laboratory with respect to probe current conversion of signals virtually by isolating operational amplifier, so that this signal of computer acquisition; The square wave pulse generating circuit is used for the continuous sweep of single probe off line, so that oscilloscope is observed the volt-ampere characteristic of single probe.When with microcomputer when online, finish of the automatic collection of bright wrong your (Langmuir) single probe V-I characteristic curve data by software with the plasma space current potential of difference emitting probe tracking, then software carries out analyzing and processing according to the plasma space current potential that the difference emitting probe provides to bright wrong your (Langmuir) single probe V-I characteristic curve data, thereby draws plasma space current potential, electron density and ion concentration, floating potential, electron temperature and Electron energy distribution function etc.; When with the microcomputer off line, by the scanning of square wave pulse generator continuous trigger V-I characteristic curve, thereby available oscilloscope is observed the V-I characteristic curve, and can read the plasma space current potential from voltmeter at any time.
Effect of the present invention and benefit are detection accuracy and the speed that has significantly improved plasma parameter, but article on plasma body parameter is measured in real time; In conjunction with dynamic seal (packing) mechanism, but article on plasma body parameter is carried out the spatial distribution measurement; Also available oscilloscope Direct observation V-I characteristic curve is convenient to article on plasma body generator and is debugged.
Description of drawings
Accompanying drawing 1 is single probe basic circuit diagram.
Accompanying drawing 2 is single probe V-I performance diagrams.
Accompanying drawing 3 is difference emitting probe basic circuit diagrams.
Accompanying drawing 4 is combined probe basic circuit diagrams.
1 plasma among the figure, 2 quartz conduit, 3 tungsten tipped probes, 4 shading rings, 5 locular walls, 6 ring flanges, 7 nickel wires, 8 movable sealings, 9 probe tubes, 10 vacuum seal plugs, 11 ammeters, 12 potentiometers, 13 potentiometers, 14 battery pack, 15 difference emitting probe plasma space current potential automatic tracking circuits, 16 difference emitting probes, 17 squarers, the trigger-type saw-toothed wave generator of 18 band power amplifications, 19 isolate operational amplifier, 20 dual channel oscilloscopes, 21 computer interfaces.
Though this combined probe possesses the function of bright wrong that (Langmuir) single probe and difference emitting probe simultaneously, it only inserts in the plasma as a probe.Like this, what ensured not only that the two obtains is the information of plasma space same point, and has reduced the interference of article on plasma body.
This combined probe possesses the function of bright wrong that (Langmuir) single probe and difference emitting probe simultaneously, but it is not the two simple addition, but the two organic combination.The two not only is in the same point of plasma space, and the two control by computer can provide the plasma parameter information (so-called " synchronization " is relevant with scanning voltage speed and data sampling speed, can accomplish the microsecond magnitude at present) of synchronization probe position here.Therefore, the volt-ampere characteristic that the plasma space current potential that utilizes the same position synchronization accurately to be measured by the difference emitting probe comes the analysis list probe will obviously improve the accuracy and the confidence level of gained plasma parameter.
This combined probe adopts movable sealing to be installed on the locular wall of plasma device, therefore can change the position of probe in plasma easily, for condition has been created in the spatial distribution measurement of plasma parameter.
In this combined probe circuit, the setting of oscilloscope interface is convenient to observe at any time single probe volt-ampere characteristic in experiment, provides a kind of approach effectively easily for monitoring isoionic state in real time, and is particularly useful when the debugging plasma generator.
This combined probe software comprises the control to probe system, the collection of data and the processing of data, and plasma space position various parameters constantly can obtain in the time of inferior millisecond magnitude, and shows or print.
Embodiment
Describe embodiments of the invention in detail below in conjunction with accompanying drawing.
As accompanying drawing 4, combined probe is pack into simultaneously in a probe tube single probe 3 and difference emitting probe 16.The combined probe circuit comprises single probe scanning circuit, difference emitting probe space potential tracking circuit 15, square wave pulse generating circuit 17 and computer interface circuit 21.Single probe scanning circuit comprises trigger-type saw-toothed wave generator 18, isolation operational amplifier 19, probe voltage dividing potential drop sample resistance R1 and R2 and the probe current sample resistance R3 that is with power amplification again.Here, isolation operational amplifier 19 will be converted to the signal with respect to ground, laboratory with respect to probe current signal (being IxR3) virtually, so that computer acquisition.S1 to S5 is 5 double-pole double throw switches.When S1 to S5 places dotted line position, be off-line state, system is used to observe the V-I characteristic curve of single probe.This moment, square-wave generator 17 generation series of rectangular ripples made it to produce a series of sawtooth waveforms thereby trigger saw-toothed wave generator 18.These sawtooth waveforms are added on single probe 3 by R3.Corresponding each sawtooth waveforms, its voltage magnitude is delivered to oscillographic passage 1 (CH1) by R1 and the sampling of R2 dividing potential drop; And probe current signal (I) is delivered to oscillographic passage 2 (CH2) by sample resistance R3 sampling (IxR3) through isolating amplifier 19.Like this, oscilloscope promptly shows the V-I characteristic curve of single probe under the X-Y pattern.Corresponding a series of sawtooth waveforms can repeat to show to make it the V-I characteristic curve of single probe to be convenient to observe.Also can read the plasma space current potential at any time from the voltmeter (Vp) the difference emitting probe circuit 15 this moment.When S1 to S5 placed solid line position, system and computer interconnection were on line state, were gathered the V-I characteristic curve of plasma space current potential and single probe by computer control.Its step is as follows: at first export a square wave by software control on the D/A output line, in order to trigger saw-toothed wave generator 18, make it to export a sawtooth waveforms and be added on single probe 3.During this sawtooth waveforms, software promptly obtains the V-I characteristic curve data of single probe by data wire A/D (1) and A/D (2) circle collection probe voltage (V) and probe current (I) signal; After the sawtooth waveforms, read plasma space current potential Vp by data wire A/D (3).Then the plasma space current potential Vp that is obtained from the difference emitting probe by the computer utilization carries out data processing to the V-I characteristic curve of single probe, thereby obtain a series of plasma parameters, i.e. plasma space current potential, electron temperature, electron density, ion concentration, floating potential and Electron energy distribution function etc.
This combined probe adopts movable sealing to be installed on the locular wall of plasma device, therefore can change the position of probe in plasma easily, has created condition for the spatial distribution measurement of plasma parameter, and spatial resolution can reach a millimeter magnitude.When combined probe is in a certain position of plasma space, can obtain above-mentioned plasma parameter constantly in difference, time sense depends on the A/D conversion speed of computer interface 21, and establishing A/D change-over time is 1 microsecond, gather 100 pairs of V-I data, then time sense can reach 0.25 millisecond.
Claims (1)
1. combined probe that is used for plasma diagnostic, it is characterized in that: constitute combined probe with single probe and integrated being installed in the same probe tube of difference emitting probe, cooperate the combined probe circuit, the combined probe circuit comprises that single probe scanning circuit, difference emitting probe space potential tracking circuit, square wave pulse generating circuit and computer interface circuit and computer software measure the various parameters of plasma in real time.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB021095191A CN1157103C (en) | 2002-04-19 | 2002-04-19 | Composite probe for plasma diagnosis |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB021095191A CN1157103C (en) | 2002-04-19 | 2002-04-19 | Composite probe for plasma diagnosis |
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| CN1380811A CN1380811A (en) | 2002-11-20 |
| CN1157103C true CN1157103C (en) | 2004-07-07 |
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| Application Number | Title | Priority Date | Filing Date |
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| CNB021095191A Expired - Fee Related CN1157103C (en) | 2002-04-19 | 2002-04-19 | Composite probe for plasma diagnosis |
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Families Citing this family (31)
| Publication number | Priority date | Publication date | Assignee | Title |
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| JP4008408B2 (en) * | 2003-11-07 | 2007-11-14 | 日本電子材料株式会社 | Probe card |
| US8889021B2 (en) | 2010-01-21 | 2014-11-18 | Kla-Tencor Corporation | Process condition sensing device and method for plasma chamber |
| CN102650663B (en) * | 2011-02-28 | 2014-12-31 | 中国科学院空间科学与应用研究中心 | Method for acquiring voltage-current characteristic curve of plasma |
| CN102543788A (en) * | 2011-11-29 | 2012-07-04 | 上海华力微电子有限公司 | Device for plasma detection |
| CN103140009B (en) * | 2013-01-31 | 2015-11-11 | 北京航空航天大学 | For the Langmuir multiprobe control circuit of plasma diagnostic |
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| CN104244555A (en) * | 2014-09-29 | 2014-12-24 | 北京航空航天大学 | Langmuir emitting probe for plasma space potential diagnosing |
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| CN104849678B (en) * | 2015-05-22 | 2017-07-21 | 大连理工大学 | The probe of alternating magnetic field ionization meter a kind of electric discharge suitable for low pressure very high frequency(VHF) |
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| CN106413237A (en) * | 2016-10-31 | 2017-02-15 | 大连理工大学 | Plasma diagnostic method of multi-amplitude AC bias probe based on data acquisition card |
| CN106771675A (en) * | 2016-12-19 | 2017-05-31 | 兰州空间技术物理研究所 | Using the probe and measuring method of bias current measurement Plasma space potential |
| CN106714433B (en) * | 2017-01-04 | 2023-09-15 | 中国工程物理研究院激光聚变研究中心 | Plasma space characteristic diagnostic device |
| CN106851953B (en) * | 2017-02-22 | 2018-12-21 | 大连理工大学 | A kind of convex-concave probe and its plasma diagnostic method |
| CN106888543B (en) * | 2017-03-24 | 2019-04-16 | 大连理工常州研究院有限公司 | A kind of automatically scanning emitting probe device |
| CN109803475A (en) * | 2017-11-15 | 2019-05-24 | 中国科学院国家空间科学中心 | A kind of device for establishing detector reference potential in space plasma environment |
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| CN111315105B (en) * | 2020-02-25 | 2021-04-16 | 北京航空航天大学 | Multifunctional probe and vacuum plume detection device |
| CN111278204B (en) * | 2020-02-25 | 2021-01-19 | 北京航空航天大学 | Combined probe |
| CN111665014B (en) * | 2020-05-20 | 2022-02-22 | 中国科学院力学研究所 | Hypersonic aircraft boundary layer electron density diagnostic system based on high-frequency electrostatic probe |
| CN111935893B (en) * | 2020-07-23 | 2021-07-16 | 中国科学院力学研究所 | Electrostatic probe system with three-electrode structure |
| CN112004302A (en) * | 2020-08-18 | 2020-11-27 | 华虹半导体(无锡)有限公司 | Plasma distribution monitoring device and method |
| CN112930015B (en) * | 2021-03-17 | 2021-11-30 | 核工业西南物理研究院 | Electromagnetic composite probe for plasma electromagnetic characteristic diagnosis |
| CN113225887B (en) * | 2021-05-11 | 2022-06-07 | 山东大学 | Telescopic cold and hot probe assembly, plasma diagnosis system and diagnosis method |
| CN115002996B (en) * | 2022-06-15 | 2023-11-10 | 哈尔滨工业大学 | Three-probe diagnosis system suitable for near space high-pressure collision wide-range plasma density measurement and application method thereof |
| CN116669269B (en) * | 2023-06-25 | 2024-03-29 | 中国科学院力学研究所 | Multi-point redundant rocket combustion plasma diagnosis method and system |
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- 2002-04-19 CN CNB021095191A patent/CN1157103C/en not_active Expired - Fee Related
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| Publication number | Publication date |
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| CN1380811A (en) | 2002-11-20 |
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