CN115665965A - Spiral injection mirror structure for cyclotron and use method thereof - Google Patents
Spiral injection mirror structure for cyclotron and use method thereof Download PDFInfo
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- CN115665965A CN115665965A CN202211333128.0A CN202211333128A CN115665965A CN 115665965 A CN115665965 A CN 115665965A CN 202211333128 A CN202211333128 A CN 202211333128A CN 115665965 A CN115665965 A CN 115665965A
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Abstract
The invention provides a spiral injection reflector structure for a cyclotron and a using method thereof, and relates to the technical field of heavy ion accelerators. The structure comprises a positive electrode, a negative electrode, supporting and positioning ceramics, insulating ceramics, an electrode cover cylinder and a reflector fixing seat, wherein the positive electrode is arranged on the reflector fixing seat, the middle part of the positive electrode is fixed and insulated through the insulating ceramics, and the positive electrode and the negative electrode are connected and fixed through the supporting and positioning ceramics; the electrode cover cylinder contains the positive electrode and the negative electrode and is used for shielding an electric field, and gaps are respectively reserved between the electrode cover cylinder and the positive electrode and between the electrode cover cylinder and the negative electrode; the reflector fixing seat is used as a ground pole, one end of the reflector fixing seat is connected to the positive electrode, and the other end of the reflector fixing seat is connected to the inside of the cyclotron injector; the positive electrode is provided with a first electrode curved surface, the negative electrode is provided with a second electrode curved surface, the first electrode curved surface and the second electrode curved surface are both spiral curved surfaces, the widths of the curved surfaces are the same, and the first electrode curved surface and the second electrode curved surface are oppositely arranged and keep the same gap.
Description
Technical Field
The invention relates to the technical field of heavy ion accelerators, in particular to a spiral injection reflector structure for a cyclotron and a use method thereof.
Background
The Heavy Ion accelerator treatment device (HIMM-Heavy Ion Medical Machine) is composed of an accelerator system and a treatment terminal, wherein an injector of the Heavy Ion accelerator treatment device is a compact cyclotron with the energy of 7MeV/u, and the cyclotron adopts a spiral reflector to inject beam current.
Unlike traditional parallel plate electrostatic equipment, the reflecting mirror has spiral surface to deflect the injected beam from vertical to horizontal and inject it into the rotating injector, so that the injected beam is deflected and accelerated by the magnetic field and electric field in the rotating injector. In practical application, the installation space of the reflector is small, and the maximum voltage of +/-6 kV needs to be loaded. In design, insulation is required between the electrodes and the ground, and the overall installation of the electrodes is not affected. Therefore, the realization of the whole mechanism and function of the reflector is a main difficulty of design.
Disclosure of Invention
In view of the above problems, the present invention provides a spiral injection mirror structure for a cyclotron and a method for using the same to horizontally inject a beam in a vertical direction into the cyclotron.
In order to achieve the above object, an aspect of the present invention provides a spiral injection mirror structure for a cyclotron, including a positive electrode, a negative electrode, a supporting and positioning ceramic, an insulating ceramic, an electrode cover cylinder, and a mirror fixing base, wherein: the positive electrode is arranged on the reflector fixing seat, the middle of the reflector fixing seat is fixed and insulated through the insulating ceramic, and the positive electrode and the negative electrode are connected and fixed through the supporting and positioning ceramic; the electrode cover cylinder contains the positive electrode and the negative electrode and is used for shielding an electric field, and gaps are reserved between the electrode cover cylinder and the positive electrode and between the electrode cover cylinder and the negative electrode respectively; the reflector fixing seat is used as a ground pole, one end of the reflector fixing seat is connected to the positive electrode, and the other end of the reflector fixing seat is connected to the inside of the cyclotron injector; the positive electrode is provided with a first electrode curved surface, the negative electrode is provided with a second electrode curved surface, the first electrode curved surface and the second electrode curved surface are both spiral curved surfaces, the widths of the curved surfaces are the same, and the first electrode curved surface and the second electrode curved surface are arranged oppositely and keep the same gap.
Optionally, the positive electrode is further provided with a first ceramic positioning hole, a first high-voltage connecting end and a first vacuum exhaust hole, and the negative electrode is further provided with a second ceramic positioning hole, a second high-voltage connecting end and a second vacuum exhaust hole, wherein: the first ceramic positioning hole is used for fixing the position of the positive electrode, the first high-voltage connecting end is a feed-in position of positive high voltage and is used for connecting a high-voltage power line with the positive electrode, and the first vacuum exhaust hole is used for opening the blind hole for exhausting; the second ceramic positioning hole is used for fixing the position of the negative electrode, the second high-voltage connecting end is a negative high-voltage feed-in position and used for connecting the high-voltage power line and the negative electrode, and the second vacuum exhaust hole is used for opening exhaust of the blind hole.
Optionally, one or more first vacuum exhaust holes are formed, and the opening directions of the first vacuum exhaust holes are staggered with the first electrode curved surface; the second vacuum exhaust holes are one or more, and the second electrode curved surfaces are staggered in the opening direction.
Optionally, the supporting and positioning ceramic includes a ceramic support and an electrode positioning hole, wherein: the ceramic support is used for fixing the positive electrode and the negative electrode; the electrode positioning holes are formed in two ends of the ceramic support and used for limiting the positive electrode and the negative electrode so as to ensure that the gaps between the first electrode curved surface and the second electrode curved surface are the same.
Optionally, the axial directions of the electrode positioning holes at the two ends of the ceramic support are mutually perpendicular and staggered spatially.
Optionally, the ceramic support is made of 95% Al 2 O 3 Ceramic and the surface polishing roughness is less than Ra0.8.
Optionally, the material of the insulating ceramic is 95% of Al 2 O 3 And (3) ceramic.
Optionally, the insulating ceramic is of a flat plate structure, the upper end surface of the insulating ceramic is attached to the bottom of the positive electrode, and the lower end surface of the insulating ceramic is attached to the top of the reflector fixing seat; and the middle part of the flat plate structure is provided with a plurality of positioning holes for respectively limiting the positive electrode and the reflector fixing seat.
In another aspect, the present invention provides a method for using a spiral injection mirror structure for a cyclotron, comprising the steps of: pre-electrifying and aging the spiral injection reflector structure in advance before formal operation until the voltage operation is stable and no discharge ignition phenomenon occurs; and respectively carrying out high-voltage loading on a positive electrode and a negative electrode in the spiral injection reflector structure through two high-voltage power supplies with different polarities.
Optionally, the power-on speed of the positive electrode and the negative electrode does not exceed 0.1kV/s during the high-voltage loading.
Compared with the prior art, the spiral injection reflector structure for the cyclotron and the use method thereof provided by the invention at least have the following beneficial effects:
the spiral injection reflector structure is compact in overall structure, effectively provides an electric field for converting beam current from a vertical direction to a horizontal direction, meets smaller space installation conditions, and well solves the problems of space compactness and function realization. And the whole structure is feasible, an electrostatic field can be generated in the spiral track, and the charged particle beam is injected into the horizontal track of the cyclotron from the vertical track, so that the injection requirement of the beam is met.
Drawings
The above and other objects, features and advantages of the present invention will become more apparent from the following description of the embodiments of the present invention with reference to the accompanying drawings, in which:
fig. 1 schematically shows a structural view of a spiral injection mirror structure for a cyclotron according to an embodiment of the present invention;
fig. 2 schematically shows a structural view of a positive electrode according to an embodiment of the present invention;
FIG. 3 schematically shows a structural view of a negative electrode according to an embodiment of the invention;
FIG. 4 schematically illustrates a block diagram of a positioning support ceramic according to an embodiment of the invention;
FIG. 5 schematically shows a structural view of an insulating ceramic according to an embodiment of the present invention;
FIG. 6 schematically illustrates a block diagram of an electrode shield can according to an embodiment of the invention;
FIG. 7 schematically shows a structural view of a mirror mount according to an embodiment of the present invention;
figure 8 schematically illustrates a flow diagram of a method of using a helical injection mirror structure for a cyclotron, in accordance with an embodiment of the present invention.
[ description of reference ]
1-a positive electrode; 2-a negative electrode; 3-supporting and positioning the ceramic; 4-insulating ceramic; 5-electrode cover cylinder; 6-reflector fixing seat.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention is further described in detail with reference to the following embodiments and the accompanying drawings. It is to be understood that the embodiments described are only a few embodiments of the present invention, and not all embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
The terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. The terms "comprises," "comprising," and the like, as used herein, specify the presence of stated features, steps, operations, and/or components, but do not preclude the presence or addition of one or more other features, steps, operations, or components.
All terms (including technical and scientific terms) used herein have the same meaning as commonly understood by one of ordinary skill in the art unless otherwise defined. It is noted that the terms used herein should be interpreted as having a meaning that is consistent with the context of this specification and should not be interpreted in an idealized or overly formal sense.
Referring to fig. 1, the spiral injection mirror structure for a cyclotron according to the embodiment includes a positive electrode 1, a negative electrode 2, a supporting and positioning ceramic 3, an insulating ceramic 4, an electrode cover cylinder 5, and a mirror fixing base 6.
The positive electrode 1 is arranged on the reflector fixing seat 6, the middle of the reflector fixing seat is fixed and insulated through the insulating ceramic 4, and the positive electrode 1 and the negative electrode 2 are connected and fixed through the supporting and positioning ceramic 3. The electrode cover cylinder 5 contains the positive electrode 1 and the negative electrode 2 and is used for shielding an electric field, and gaps are respectively reserved between the electrode cover cylinder 5 and the positive electrode 1 and between the electrode cover cylinder 5 and the negative electrode 2. The mirror holder 6 serves as a ground, one end of which is connected to the positive electrode 1 and the other end of which is connected to the inside of the cyclotron injector. The positive electrode 1 is provided with a first electrode curved surface, the negative electrode 2 is provided with a second electrode curved surface, the first electrode curved surface and the second electrode curved surface are both spiral curved surfaces, the widths of the curved surfaces are the same, and the first electrode curved surface and the second electrode curved surface are oppositely arranged and keep the same gap.
Through the structure, the supporting and positioning ceramic is used for connecting the positive electrode and the negative electrode, and fixing and limiting the two electrodes so as to ensure that the gaps between the curved surfaces of the two electrodes are consistent. Therefore, the spiral injection reflector structure is compact in overall structure, effectively provides an electric field for converting beam current from a vertical direction to a horizontal direction, meets smaller space installation conditions, and well solves the problems of space compactness and function realization.
Referring to fig. 2-3, the first electrode curved surface is a spiral curved surface provided by physical design, and the curved surfaces have the same width. Similarly, the curved surface of the second electrode is also a spiral curved surface provided by physical design, and the width of the curved surface is the same. On this basis, the positive electrode 1 is further provided with a first ceramic positioning hole, a first high-voltage connecting end and a first vacuum exhaust hole, and the negative electrode 2 is further provided with a second ceramic positioning hole, a second high-voltage connecting end and a second vacuum exhaust hole, wherein: the first ceramic positioning hole is used for fixing the position of the positive electrode 1, the first high-voltage connecting end is a positive high-voltage feed-in position and is used for connecting a high-voltage power line with the positive electrode 1, and the first vacuum exhaust hole is used for opening the blind hole for exhausting; the second ceramic positioning hole is used for fixing the position of the negative electrode 2, the second high-voltage connecting end is a negative high-voltage feed-in position and used for connecting a high-voltage power line with the negative electrode 2, and the second vacuum exhaust hole is used for exhausting air for opening the blind hole.
Furthermore, one or more first vacuum exhaust holes are formed, and the forming directions of the first vacuum exhaust holes are staggered with the first electrode curved surface; the second vacuum exhaust holes are one or more, and the second electrode curved surfaces are staggered in the opening direction.
Referring to fig. 4, in the embodiment of the present invention, the supporting and positioning ceramic 3 includes a ceramic support and an electrode positioning hole, wherein: the ceramic support is used for fixing the positive electrode 1 and the negative electrode 2; the electrode positioning holes are arranged at two ends of the ceramic support and used for limiting the positive electrode 1 and the negative electrode 2 so as to ensure that the gaps between the first electrode curved surface and the second electrode curved surface are the same.
Through the structure, the ceramic support is mainly used for fixing the anode and the cathode of the reflector. The positive and negative electrode positioning holes can ensure the relative position between the two electrodes.
Preferably, the axial directions of the electrode positioning holes at the two ends of the ceramic support are mutually vertical and staggered.
In the embodiment of the invention, the material of the ceramic bracket is 95 percent of Al 2 O 3 Ceramic and the surface polishing roughness is less than Ra0.8.
Referring to FIG. 5, in the embodiment of the present invention, the material of the insulating ceramic 4 is 95% Al 2 O 3 A ceramic.
Preferably, the insulating ceramic 4 is a flat plate structure, the upper end surface of which is attached to the bottom of the positive electrode 1, and the lower end surface of which is attached to the top of the reflector fixing seat 6; a plurality of positioning holes are formed in the middle of the flat plate structure and used for limiting the positive electrode 1 and the reflector fixing seat 6 respectively.
Referring to fig. 6, the electrode cover can 5 completely encloses the positive electrode and the negative electrode, and has a gap therebetween, which is mainly used for shielding the electric field and preventing the electric field from diverging and affecting the beam trajectory after injection.
Referring to fig. 7, the reflector holder 6 is a fixing device for the reflector as a whole, and is used to connect the reflector and the interior of the spin injector for positioning.
Through the structure, the whole structure is feasible, the electrostatic field can be generated in the spiral track, and the charged particle beam is injected into the horizontal track of the cyclotron from the vertical track, so that the injection requirement of the beam is met.
Based on the above disclosure, as shown in fig. 8, another aspect of the present invention provides a method for using a spiral injection mirror structure for a cyclotron, comprising the following steps S810 to S820:
s810, pre-electrifying and aging the spiral injection reflector structure in advance before formal operation until the voltage operation is stable and no discharge and ignition phenomena occur;
and S820, respectively carrying out high-voltage loading on a positive electrode and a negative electrode in the spiral injection reflector structure through two high-voltage power supplies with different polarities.
Specifically, in the high-voltage loading process, the power-on speed of the positive electrode and the power-on speed of the negative electrode do not exceed 0.1kV/s.
In summary, embodiments of the present invention provide a spiral injection mirror structure for a cyclotron and a method for using the same, in which a beam in a vertical direction is horizontally injected into the cyclotron. The spiral injection reflector structure is compact in overall structure, effectively provides an electric field for converting beam current from a vertical direction to a horizontal direction, meets smaller space installation conditions, and well solves the problems of space compactness and function realization. And the whole structure is feasible, an electrostatic field can be generated in the spiral track, and the charged particle beam is injected into the horizontal track of the cyclotron from the vertical track, so that the injection requirement of the beam is met.
Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of the present invention, "a plurality" means at least two, e.g., two, three, etc., unless explicitly specified otherwise. Further, the word "a" or "an" preceding an element does not exclude the presence of a plurality of such elements.
The above-mentioned embodiments, objects, technical solutions and advantages of the present invention are further described in detail, it should be understood that the above-mentioned embodiments are only examples of the present invention, and should not be construed as limiting the present invention, and any modifications, equivalents, improvements and the like made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (10)
1. A spiral injection mirror structure for a cyclotron, comprising a positive electrode (1), a negative electrode (2), a support positioning ceramic (3), an insulating ceramic (4), an electrode cover cylinder (5), and a mirror mount (6), wherein:
the positive electrode (1) is arranged on the reflector fixing seat (6), the middle of the reflector fixing seat is fixed and insulated through the insulating ceramic (4), and the positive electrode (1) and the negative electrode (2) are connected and fixed through the supporting and positioning ceramic (3);
the electrode cover cylinder (5) contains the positive electrode (1) and the negative electrode (2) and is used for shielding an electric field, and gaps are reserved between the electrode cover cylinder (5) and the positive electrode (1) and between the electrode cover cylinder and the negative electrode (2) respectively;
the reflector fixing seat (6) is used as a ground pole, one end of the reflector fixing seat is connected to the positive electrode (1), and the other end of the reflector fixing seat is connected to the inside of the cyclotron injector;
the positive electrode (1) is provided with a first electrode curved surface, the negative electrode (2) is provided with a second electrode curved surface, the first electrode curved surface and the second electrode curved surface are both spiral curved surfaces, the widths of the curved surfaces are the same, and the first electrode curved surface and the second electrode curved surface are oppositely arranged and keep the same gap.
2. The screw type injection mirror structure for a cyclotron according to claim 1, wherein the positive electrode (1) is further provided with a first ceramic positioning hole, a first high voltage connection terminal, and a first vacuum exhaust hole, and the negative electrode (2) is further provided with a second ceramic positioning hole, a second high voltage connection terminal, and a second vacuum exhaust hole, wherein:
the first ceramic positioning hole is used for fixing the position of the positive electrode (1), the first high-voltage connecting end is a positive high-voltage feed-in position and is used for connecting a high-voltage power line with the positive electrode (1), and the first vacuum exhaust hole is used for opening blind holes for exhausting;
the second ceramic positioning hole is used for fixing the position of the negative electrode (2), the second high-voltage connecting end is a negative high-voltage feed-in position and is used for connecting the high-voltage power line with the negative electrode (2), and the second vacuum exhaust hole is used for exhausting air which is communicated with the blind hole.
3. The helical injection reflector structure for a cyclotron of claim 2, wherein the first vacuum exhaust holes are one or more, and the opening directions are all staggered from the first electrode curved surface;
the second vacuum exhaust holes are one or more, and the directions of the second vacuum exhaust holes are staggered with the curved surfaces of the second electrodes.
4. The helical injection mirror structure for a cyclotron according to claim 1, wherein the support positioning ceramic (3) comprises a ceramic support and an electrode positioning hole, wherein:
the ceramic bracket is used for fixing the positive electrode (1) and the negative electrode (2);
the electrode positioning holes are formed in two ends of the ceramic support and used for limiting the positive electrode (1) and the negative electrode (2) so as to ensure that the gaps between the first electrode curved surface and the second electrode curved surface are the same.
5. The spiral injection mirror structure for a cyclotron according to claim 4, wherein the axial directions of the electrode positioning holes at both ends of the ceramic support are perpendicular to each other and spatially staggered.
6. Screw for a cyclotron as claimed in claim 4The rotary injection reflector structure is characterized in that the ceramic support is made of 95% of Al 2 O 3 Ceramic and the surface polishing roughness is less than Ra0.8.
7. The helical injection mirror structure for a cyclotron according to claim 1, wherein the material of the insulating ceramic (4) is 95% Al 2 O 3 And (3) ceramic.
8. The screw-type injection reflector structure for a cyclotron according to claim 1, wherein the insulating ceramic (4) is a flat plate structure, the upper end surface of which is attached to the bottom of the positive electrode (1), and the lower end surface of which is attached to the top of the reflector fixing base (6);
and the middle part of the flat plate structure is provided with a plurality of positioning holes for respectively limiting the positive electrode (1) and the reflector fixing seat (6).
9. A method of using a helical injection mirror structure for a cyclotron as claimed in claim 1, comprising the steps of:
pre-electrifying and aging the spiral injection reflector structure in advance before formal operation until the voltage operation is stable and no discharge ignition phenomenon occurs;
and respectively carrying out high-voltage loading on a positive electrode (1) and a negative electrode (2) in the spiral injection reflector structure through two high-voltage power supplies with different polarities.
10. The use method according to claim 9, characterized in that the power-on speed of the positive electrode (1) and the negative electrode (2) does not exceed 0.1kV/s during the high-voltage loading.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211333128.0A CN115665965A (en) | 2022-10-27 | 2022-10-27 | Spiral injection mirror structure for cyclotron and use method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211333128.0A CN115665965A (en) | 2022-10-27 | 2022-10-27 | Spiral injection mirror structure for cyclotron and use method thereof |
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| Publication Number | Publication Date |
|---|---|
| CN115665965A true CN115665965A (en) | 2023-01-31 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN202211333128.0A Pending CN115665965A (en) | 2022-10-27 | 2022-10-27 | Spiral injection mirror structure for cyclotron and use method thereof |
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| CN (1) | CN115665965A (en) |
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- 2022-10-27 CN CN202211333128.0A patent/CN115665965A/en active Pending
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