CN115662940A - Gallium nitride wafer XRD test fixing device and use method thereof - Google Patents
Gallium nitride wafer XRD test fixing device and use method thereof Download PDFInfo
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- CN115662940A CN115662940A CN202211266429.6A CN202211266429A CN115662940A CN 115662940 A CN115662940 A CN 115662940A CN 202211266429 A CN202211266429 A CN 202211266429A CN 115662940 A CN115662940 A CN 115662940A
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Abstract
The invention discloses a gallium nitride wafer XRD test fixing device and a using method thereof, wherein the fixing device comprises: the carrying platform is used for placing a wafer; the outer frame is arranged on the periphery of the platform deck; the fixed block is fixedly connected to the peripheral surface of the outer frame; the positioning pin is vertically arranged in the fixing block; the handle nut is in threaded fit with the positioning pin at the bottom of the fixing block; the wafer positioning device comprises a positioning pin, a pressing block and a positioning pin, wherein the pressing block comprises a horizontal fixed end, a transition end and a horizontal free end, the horizontal fixed end is fixedly connected to the top of the positioning pin through a first screw, the tail end of the horizontal free end is located above a wafer, and the horizontal fixed end and the horizontal free end are connected into a whole through the transition end; and the spring is sleeved on the positioning pin between the horizontal fixed end and the fixed block. The invention has the advantages that the problem of 'curvature radius' data test distortion of the wafer caused by the existing vacuum adsorption of the wafer is solved; the problem of wafer surface adhesive residue caused by fixing the test wafer by using an adhesive tape is solved.
Description
Technical Field
The invention relates to the field of quality testing of gallium nitride crystals, in particular to a gallium nitride wafer XRD testing fixing device and a using method thereof.
Background
For example, chinese patent publication No. CN107263301B discloses a method for polishing a gallium nitride wafer by a grinding-chemical mechanical polishing method, wherein the gallium nitride wafer is firstly cleaned, and then the gallium nitride wafer is fixed on a grinding platform by using a vacuum adsorption method, and as another XRD sample stage device disclosed in chinese utility model patent publication No. CN2916626Y, which considers both orientation and non-orientation crystal analysis, the end face (7) of the shaft sleeve is provided with a detachable suction cup (16), and both wafers are fixed by using a vacuum adsorption method. Regarding the 'curvature test' of the wafer, the gallium nitride wafer generates the distortion of the curvature data of the test under the vacuum adsorption state, and the actual 'curvature radius' of the gallium nitride wafer cannot be detected. In order to detect the curvature radius, the wafer is fixed by tape bonding to test the curvature radius, although the test result can be actually obtained, the tape leaves residual glue on the surface of the gan wafer, and the introduction of the residual glue changes the quality of the surface of the wafer, further affecting the cleaning quality of the wafer. In the epitaxial layer growth process, the curvature control of the wafer surface is crucial to the growth process, and the control is related to the performance and stability of the product. Therefore, the problems of the curvature radius test of the gallium nitride wafer and the residual adhesive left after the tape bonding are solved.
Disclosure of Invention
The invention aims to solve the technical problem that the existing vacuum adsorption type fixed wafer and the existing adhesive tape sticking type fixed wafer are not suitable for measuring the curvature radius, and provides a gallium nitride wafer XRD test fixing device and a using method thereof.
The technical scheme of the invention is as follows: gallium nitride wafer XRD test fixing device includes: the carrying platform is used for placing a wafer; the outer frame is arranged on the periphery of the carrying platform through a plurality of screws; the fixed block is fixedly connected to the peripheral surface of the outer frame; the positioning pin is vertically arranged in the fixing block; the handle nut is in threaded fit with the positioning pin at the bottom of the fixing block; the wafer positioning device comprises a positioning pin, a pressing block and a clamping piece, wherein the pressing block comprises a horizontal fixed end, a transition end and a horizontal free end, the horizontal fixed end is fixedly connected to the top of the positioning pin through a screw, the tail end of the horizontal free end is positioned above a wafer, and the horizontal fixed end and the horizontal free end are connected into a whole through the transition end; and the spring is sleeved on the positioning pin between the horizontal fixed end and the fixed block.
The improvement of the scheme is that the upper surface of the outer frame is provided with a positioning surface extending towards the carrying platform.
In the scheme, the two fixing blocks, the two positioning pins, the two handle nuts, the two pressing blocks and the two springs are symmetrically distributed about the center of the carrying platform.
In the scheme, the two positioning surfaces are symmetrically distributed about the center of the carrier.
In the scheme, the plurality of screws are arranged along the radial direction of the outer frame and the carrying platform.
The use method of the gallium nitride wafer XRD test fixing device comprises the following steps: the wafer is placed on the carrying platform, the handle nut is rotated, so that the positioning pin moves downwards, the pressing block is driven to move downwards, and the horizontal free end is tightly pressed on the surface of the wafer.
The invention has the advantages that the problem of 'curvature radius' data test distortion of the wafer caused by the existing vacuum adsorption of the wafer is solved; the problem of wafer surface adhesive residue caused by fixing the test wafer by using an adhesive tape is solved.
Drawings
FIG. 1 is a schematic view of an XRD test fixture for a gallium nitride wafer according to the present invention;
FIG. 2 is a cross-sectional view of FIG. 1;
FIG. 3 is an enlarged view of a portion of FIG. 2;
in the figure, 1, a pressing block 2, a first screw 3, a spring 4, an outer frame 5, a handle nut 6, a positioning pin 7, a wafer 8, a carrying platform 9, a second screw 10 and a positioning surface.
Detailed Description
The technical scheme in the embodiment of the invention is clearly and completely described below with reference to the accompanying drawings. It should be apparent that the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments without creative efforts of those skilled in the art are within the protection scope of the present invention.
As shown in fig. 1-3, example 1: a gallium nitride wafer XRD (X-ray diffractometer) test fixture, comprising: the outer frame 4 is fixed on the outer peripheral surface of the carrier by using a plurality of second screws 9, the shape of the outer frame is matched with the shape of the carrier conformally, for example, when the carrier is circular, the outer frame is circular, when the carrier is rectangular, the outer frame is also rectangular, and the number of the second screws can be two, three or more. The second screws connect the outer frame and the carrier in the radial direction of the carrier. The locating pin is vertically installed in the fixing block, two ends of the locating pin 6 are respectively located outside two ends of the fixing block, and left-right rotation limiting is achieved through matching of the locating pin inside and the outer frame. Briquetting 1, the briquetting includes horizontal stiff end, transition end and horizontal free end, the horizontal stiff end passes through 2 rigid couplings of first screw at the top of locating pin, the end of horizontal free end is located the wafer top, the transition end links horizontal stiff end and horizontal free end as an organic whole. And the spring 3 is sleeved on the positioning pin between the horizontal fixed end and the fixed block, and the spring is preferably a flat head spring. And the handle nut 5 is in threaded fit with the positioning pin at the bottom of the fixing block, and the wafer 7 is pressed through the vertical rotation of the handle nut 5. The two fixing blocks, the two positioning pins, the two handle nuts, the two pressing blocks and the two springs are symmetrically distributed about the center of the carrying platform.
As a set of variations of the above-described embodiment, the fixing block, the positioning pin, the handle nut, the pressing block, and the spring are all three and symmetrically distributed about the center of the stage.
Example 2: the difference from embodiment 1 is that the upper surface of the outer frame is formed with two positioning surfaces 10 extending toward the stage, and the two positioning surfaces are symmetrically distributed about the center of the stage. Or three or more positioning surfaces are symmetrically distributed about the center of the carrier.
When mounting, the outer frame 4 is mounted on the stage 8, and the angle is confirmed to prevent interference with X-rays when mounting, and is locked by the second screws 9. The handle nut 5 is rotated downwards, the positioning pin 6 is pulled out upwards until the pin in the positioning pin 6 is completely separated from the outer frame 4, the pressing block 1 is pushed out from left to right, the gallium nitride wafer is placed in the center of the loading platform, the pressing block 1 is pushed back to be clamped into the outer frame 4, the handle nut 5 is screwed, when the free end of the pressing block 1 just compresses the gallium nitride wafer, the flat-head spring 3 exerts elastic pressure to compress the gallium nitride wafer, and the wafer is guaranteed not to deform. (the deformation is the most direct reason for influencing the data distortion of the curvature radius measurement), the curvature radius data test is fixedly completed, the authenticity of the curvature radius test data is ensured, and meanwhile, the pressing block is made of Teflon material, so that no residue is left on the surface of the gallium nitride wafer, and the surface quality of the cleaned gallium nitride wafer is further ensured.
Claims (6)
1. Gallium nitride wafer XRD tests fixing device, characterized by: the method comprises the following steps: a stage (8) for placing a wafer (7); the outer frame (4) is arranged on the periphery of the carrying platform through a plurality of second screws (9); the fixed block is fixedly connected to the peripheral surface of the outer frame; the positioning pin (6) is vertically arranged in the fixing block; the handle nut (5) is in threaded fit with the positioning pin at the bottom of the fixing block; the wafer positioning device comprises a pressing block (1), a positioning pin and a positioning pin, wherein the pressing block comprises a horizontal fixed end, a transition end and a horizontal free end, the horizontal fixed end is fixedly connected to the top of the positioning pin through a first screw (2), the tail end of the horizontal free end is located above a wafer, and the horizontal fixed end and the horizontal free end are connected into a whole through the transition end; and the spring (3) is sleeved on the positioning pin between the horizontal fixed end and the fixed block.
2. An XRD test fixture for gallium nitride wafers as set forth in claim 1 wherein: the upper surface of the outer frame is provided with a positioning surface (10) extending towards the carrying platform.
3. A gallium nitride wafer XRD test fixture, according to claim 1, wherein: the fixed block, the positioning pin, the handle nut, the pressing block and the spring are two and are symmetrically distributed relative to the center of the carrying platform.
4. A gallium nitride wafer XRD test fixture, according to claim 2, wherein: the number of the positioning surfaces is two, and the two positioning surfaces are symmetrically distributed relative to the center of the carrying platform.
5. A gallium nitride wafer XRD test fixture, according to claim 1, wherein: the second screws are arranged along the radial direction of the outer frame and the carrying platform.
6. A method of using a gallium nitride wafer XRD test fixture as claimed in any one of claims 1 to 5, characterized by: the method comprises the following steps: the wafer is placed on the carrying platform, the handle nut is rotated, so that the positioning pin moves downwards, the pressing block is driven to move downwards, and the horizontal free end is tightly pressed on the surface of the wafer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211266429.6A CN115662940A (en) | 2022-10-17 | 2022-10-17 | Gallium nitride wafer XRD test fixing device and use method thereof |
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| Application Number | Priority Date | Filing Date | Title |
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| CN202211266429.6A CN115662940A (en) | 2022-10-17 | 2022-10-17 | Gallium nitride wafer XRD test fixing device and use method thereof |
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| CN115662940A true CN115662940A (en) | 2023-01-31 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116540503A (en) * | 2023-07-03 | 2023-08-04 | 之江实验室 | Fixing device for laser direct writing sample and working method |
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- 2022-10-17 CN CN202211266429.6A patent/CN115662940A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116540503A (en) * | 2023-07-03 | 2023-08-04 | 之江实验室 | Fixing device for laser direct writing sample and working method |
| CN116540503B (en) * | 2023-07-03 | 2023-10-24 | 之江实验室 | Fixing device for laser direct writing sample and working method |
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