CN115595069A - Polishing wax and preparation method thereof - Google Patents

Abstract

The application relates to the technical field of polishing solution, and particularly discloses polishing wax and a preparation method thereof; a polishing wax comprises water, abrasive, lubricant, emulsifier, oil phase solvent, dispersant and thickener; wherein the lubricant is one or a combination of more of liquid fatty acid, liquid vegetable oil, liquid animal oil and fat and liquid synthetic ester; the polishing wax is oil-in-water emulsified polishing wax. The polishing wax is of an oil-in-water type, the water phase consists of water, an abrasive, a dispersant and an emulsifier, and the abrasive can be uniformly dispersed in the water phase under the action of the dispersant and the emulsifier; the oil phase consists of a lubricant, an emulsifier and an oil phase solvent, and because the lubricant selects liquid fatty acid, grease or synthetic ester substances, the emulsification of the oil phase does not need to be carried out by heating treatment, thereby realizing the reduction of energy consumption; the thickening agent is used for adjusting the consistency of the system, so that the abrasive is stably and uniformly distributed in the system, and the effects of prolonging the stability and prolonging the service life of the polishing agent are achieved.

Description

Polishing wax and preparation method thereof

Technical Field

The application relates to the technical field of polishing, in particular to polishing wax and a preparation method thereof.

Background

The prior traditional emulsification preparation process of the polishing wax material comprises a primary soap method, a phase inversion emulsification method, a low-energy emulsification method and the like. The polishing wax prepared by the primary soap emulsification process is prepared by respectively heating organic acid such as grease, stearic acid, oleic acid and the like and aqueous phase containing abrasive and alkali to a certain temperature, mixing and stirring to perform saponification reaction, and mixing the abrasive grease and water to obtain the polishing wax. The soap generated by saponification is used as an emulsifier to reduce the interfacial tension of oil-water two phases, and the stably dispersed oil has certain viscosity to better disperse the grinding materials so as to prepare the stable polishing wax.

Phase inversion emulsification is the preparation of the internal phase in a larger vessel in which emulsification takes place. The water phase is continuously increased, the emulsion is gradually thickened, but after the water phase is added to 66%, the emulsion is suddenly diluted and is converted into O/W type emulsion, the rest water phase is continuously and quickly added, and finally the O/W type emulsion is obtained to obtain the W/O type emulsion. The emulsion obtained by this process has very fine and uniform particle dispersion; however, in the preparation of polishing waxes, the aqueous phase contains a large amount of abrasive which is easily deposited and the previous emulsion is so thick that the abrasive is not well dispersed in the emulsion.

In the low-energy emulsification method, the outer phase is not heated completely and is divided into two parts of alpha phase and beta phase; alpha and beta respectively represent the mass fraction (alpha + beta = 1) divided into two phases, only beta is heated in the experimental process, the two phases are emulsified by an inner phase and a beta outer phase to prepare concentrated emulsion, and then the concentrated emulsion is diluted by the alpha outer phase at normal temperature to finally obtain the emulsion.

The method for preparing the polishing wax has the defects of high energy consumption caused by heating in the process or poor dispersibility, so that the polishing wax with good dispersibility while reducing the energy consumption in the preparation process needs to be developed.

Disclosure of Invention

The application aims to develop the polishing wax with low energy consumption in the preparation process and good dispersibility after preparation; the application provides a polishing wax and a preparation method thereof.

In a first aspect, the present application provides a polishing wax, which adopts the following technical scheme:

a polishing wax comprising water, an abrasive, a lubricant, an emulsifier, an oil phase solvent, a dispersant, and a thickener; wherein the lubricant is one or a combination of more of liquid fatty acid, liquid vegetable oil, liquid animal oil and fat and liquid synthetic ester;

optionally, the content of the lubricant is 10-15% by weight.

By adopting the technical scheme, as the lubricant is liquid fatty acid, grease or synthetic ester substances, the emulsification of the oil phase does not need to be carried out by heating treatment, the grease is better emulsified and dispersed in the system in a liquid state, the surface free energy is reduced, a firm emulsion film is formed, and the effects of good cooling, lubrication, cleaning, rust prevention and the like are achieved; the oil phase and the water phase are mutually fused under the action of an emulsifier, and the emulsifier is adsorbed on the surface of the liquid drop. The thickening agent is matched to adjust the consistency of the system, so that the abrasive is stably and uniformly distributed in the system, and the stability and the service life of the polishing agent are prolonged.

Optionally, the emulsifier comprises one or more of polyoxyethylene, sorbitan fatty acid ester, glyceryl monooleate, dodecylphenol polyoxyethylene ether and fatty alcohol polyoxyethylene ether.

Optionally, the content of the emulsifier is 3-5% by weight.

By adopting the technical scheme, the water-soluble emulsifier is adopted to adjust the emulsification and fusion of the water phase and the oil phase, and the formation of the emulsion greatly increases the interfacial area of the system, namely, the system needs to do work, so that the interfacial energy of the system is increased, and the system is unstable. Therefore, the interfacial tension is reduced, the total interfacial energy is reduced, and the stability of the system can be increased; emulsifiers are capable of reducing interfacial tension. The lipophilic group and the hydrophilic group of the emulsifier can be inserted into one side with the same property, so that the emulsifier is positioned at a water-oil interface, and the effect of more uniform and stable distribution of a polishing wax system is further obtained.

Optionally, the dispersant comprises one or more of polyethylene glycol, sodium polyacrylate, sodium dodecyl sulfate, and fatty acid polyglycol ester.

Optionally, the content of the dispersant is 1-3% by weight.

By adopting the technical scheme, the dispersing agent is attached to the surface of the solid particles, so that the interfacial tension between liquid and liquid or between solid and liquid is reduced, and the surface of the coagulated solid particles is easy to wet; a polymer dispersant, which forms an adsorption layer on the surface of solid particles to increase the charges on the surface of the solid particles, and improves the reaction force between the particles to form steric hindrance, so that the surface of the solid particles forms a bilayer structure; the polar end of the outer-layer dispersant has stronger affinity with water, so that the wetting degree of solid particles by water is increased, and the solid particles are far away from each other due to electrostatic repulsion; by adopting the water-soluble dispersing agent, the suspension performance of the abrasive is improved, the abrasive is not easy to precipitate, the physicochemical properties of the whole system tend to be consistent, and the effect of more uniform and stable distribution of the abrasive is realized.

Optionally, the thickener is one of natural gum and its modified product, cellulose and its synthetic product, polyacrylic acid, and polyoxyethylene.

Optionally, the content of the thickener is 1 to 5 weight percent.

By adopting the technical scheme, the water-soluble polymer thickening agent is adopted, and is a hydrophilic polymer substance, so that the water-soluble polymer thickening agent has high viscosity when dissolved in water, and a system has thick feeling; after the viscosity is increased, the dispersed phase in the system is not easy to aggregate and agglomerate, so that the dispersed system can be stable; meanwhile, most thickeners have the function of a surfactant, can be adsorbed on the surface of a disperse phase, have certain hydrophilicity and are easy to disperse in a water system; the polymer thickener can reach the required viscosity with less amount, so as to realize the function of regulating the viscosity of the water-based polishing wax, keep the polishing wax system in a uniform and stable suspension state or an emulsion state and improve the stability of the polishing wax; in addition, the thickening agent has wide viscosity range, is beneficial to the preparation of the whole formula and reduces the product cost.

On the other hand, the application also provides a preparation method of the polishing wax, which adopts the following technical scheme:

a method of preparing a polishing wax comprising the steps of:

taking part of water, sequentially adding the grinding material, the dispersing agent and part of the emulsifying agent into a stirrer, and uniformly stirring to obtain a component A; weighing the lubricant and the rest part of the emulsifier into a stirrer, and uniformly stirring to obtain a component B;

weighing part of deionized water and the thickening agent in percentage by weight to a stirrer, and uniformly stirring to obtain a component C;

adding the component B into the component A, and homogenizing to obtain a mixed solution D;

and adding the mixed solution D into the component C, and uniformly stirring to obtain the polishing wax.

By adopting the technical scheme, the component A is a water phase and is used for uniformly emulsifying and dispersing the grinding material; the component B is an oil phase, contains a liquid lubricant, does not need to be heated and emulsified, and is used for providing an emulsifying system for the system, and the mixing of the component A and the component B improves the dispersion stability of the aqueous phase abrasive and the effect of cooling the polishing product; the component C is used for adjusting the consistency of the system and adapting to the application of different scenes; meanwhile, the component C can further stabilize the system and reduce component layering, thereby prolonging the service life of the polishing wax.

Optionally, the homogenization conditions are as follows: the rotation speed of the homogenizing rotor is 2000-4000 r/min, and the homogenizing time is 30-60 min.

By adopting the technical scheme and the homogenizing process, the homogenizer rotor stably rotates at a high speed to form high-frequency and strong comprehensive kinetic energy effects such as circumferential tangential velocity, angular velocity and the like; under the action of the stator, the stator and the rotor form strong and reciprocating comprehensive effects of hydraulic shearing, friction, centrifugal extrusion, liquid flow collision and the like in a reasonable and narrow gap, and the materials circularly reciprocate in the container to obtain the stable and uniform polishing wax.

Optionally, the component C further comprises 0.1% of a preservative.

By adopting the technical scheme, the preservative can reduce the influence on the overall stability of the polishing wax caused by the deterioration of the lubricant in the polishing wax, and further prolong the service life of the polishing wax.

In summary, the present application has the following beneficial effects:

1. because the liquid lubricant is adopted, the emulsification process does not need heating and melting treatment, and the effect of reducing energy consumption is obtained; dispersing the grinding material by selecting a dispersing agent and an emulsifying agent through compatibility; the oil phase is compounded to obtain a stable emulsifying system, the thickening agent is used for adjusting the consistency of the system and providing a more stable system, so that the effect of improving the uniform and stable dispersion of the abrasive is realized, and further, the cutting force and the good surface effect of the polishing wax in the polishing and grinding process are improved.

2. The application preferably adopts a plurality of lubricants to be matched for use, and the adhesion of the polishing wax to the workpiece to be processed is improved, so that better utilization rate and stronger cutting force are obtained, and a smoother effect is achieved.

3. According to the method, the water phase and the oil phase are independently prepared, mixed, homogenized and ground, and the thickening system is used for blending, so that the effects of simple preparation process and stable system of the oil-in-water polishing wax are achieved.

Detailed Description

The present application will be described in further detail with reference to examples. The special description is as follows: the following examples, in which specific conditions are not specified, were conducted under conventional conditions or conditions recommended by the manufacturer, and the starting materials used in the following examples were obtained from ordinary commercial sources unless otherwise specified.

Examples

A preparation method of polishing wax comprises the following preparation methods:

s1, referring to table 1, weighing raw materials in corresponding weight percentage for later use;

s2, preparing a component A, namely adding the grinding material, the dispersing agent, part of the emulsifying agent and part of deionized water into a high-speed dispersion stirrer, and stirring for 30 minutes at the rotating speed of 1000r/min to obtain the component A;

s3, preparing a component B, namely adding a lubricant and part of an emulsifier into a high-speed dispersion mixer, and stirring for 30 minutes at the rotating speed of 1000r/min of the dispersion mixer to obtain the component B;

s4, preparing a component C, weighing part of deionized water and a thickening agent, adding into a stirrer, and stirring for 30 minutes at a rotating speed of 1000r/min to obtain the component C;

s5, preparing a component D, adding the component B into the component A, placing the component A into a homogenizer at a rotating speed of 3000r/min, and homogenizing and emulsifying for 30 minutes to obtain the component D;

and S6, mixing the component D and the component C in a stirrer, and stirring for 30 minutes to obtain the polishing wax.

TABLE 1 EXAMPLES 1-3 compositions and relative amounts of the polishing waxes

Example 4

Example 4 compared to example 2, the C component also added 0.1% preservative, wherein the preservative was cason.

Examples 5 to 7

Examples 5-7 differ from example 2 in the composition of the components and the amounts of the components added, as shown in Table 2, and in Table 2 examples 5-7 polishing waxes

In other embodiments, the emulsifier may be one or a combination of more of dodecylphenol polyoxyethylene ether and fatty alcohol polyoxyethylene ether;

the dispersant may also be: fatty acid polyglycol esters;

the oil phase solvent may also be: isopropyl alcohol;

the thickener may also be: polysaccharide, polysaccharide derivative, synthetic polysaccharide, propylene glycol alginate, methylcellulose, sodium starch phosphate, sodium alginate, casein, sodium polyacrylate, polyoxyethylene, and polyvinylpyrrolidone; the lubricant may also be: one or more of other liquid fatty acid, liquid vegetable oil, liquid animal oil and fat, and liquid synthetic ester;

the abrasive may also be: silicon carbide;

the tween refers to polyoxyethylene sorbitan fatty acid ester; span refers to sorbitan fatty acid esters; carbomer belongs to a high molecular polymer of acrylic acid bonded allyl sucrose or pentaerythritol allyl ether, wherein a non-benzene solvent is a polymerization solvent; the cason preservative is a mixture of 2-methyl-4-isothiazoline-3-ketone (MI), 2-methyl-5-chlorine-4-isothiazoline-3-ketone (CMI) and an inorganic salt stabilizer.

Comparative example

Comparative example 1

The polishing wax of comparative example 1 was prepared as follows:

weighing 20% of alpha-alumina with the grain diameter of 2um, 5% of paraffin, 1.5% of fatty alcohol-polyoxyethylene ether, 8% of stearic acid and the balance of deionized water.

Sequentially adding the raw materials in the proportion into a clean industrial container, heating to 80 ℃ in a water bath, and continuously stirring for 30min to ensure that all the components are uniformly stirred and emulsified; and (5) preparing the polishing wax.

Comparative example 2

Weighing 20% of white corundum with the particle size of 2um, 1.5% of No. 10 white mineral oil, 1% of alkylphenol polyoxyethylene ether, 1.5% of triethanolamine, 5% of stearic acid, 4% of oleic acid and the balance of deionized water;

sequentially adding the raw materials in the proportion into a clean industrial container, heating the raw materials to 80 ℃ in a water bath, and continuously stirring for 30min to ensure that the components are uniformly stirred and emulsified; and (5) preparing the polishing wax.

Comparative example 3

Comparative example 3 differs from example 2 in that the lubricant is replaced with deionized water.

Comparative example 4

Comparative example 4 differs from example 2 in that the emulsifier is replaced with deionized water.

Comparative example 5

Comparative example 5 differs from example 2 in that the dispersant is replaced with deionized water.

Comparative example 6

Comparative example 6 differs from example 2 in that the thickener is replaced with deionized water.

Performance test

Polishing test

The 12 types of polishing wax prepared in the above examples 1 to 7 and comparative examples 1 to 6 are used for respectively carrying out fine polishing treatment on 1000 pieces of middle-ground stainless steel sheets, the middle grinding in the previous step adopts 3000# abrasive paper matched with cutting fluid, and the 1000 pieces of stainless steel sheets have no other defects except polishing grains after the middle grinding.

Adopting a five-axis machine to match with a bleaching cloth vehicle line cloth wheel, and pressure: 80N, rotating speed: 1200RPM, time: 2MIN, the stainless steel sheet is finely polished, and the on-site quality detection effect is shown in Table 3. Poor polishing is limited to scratches, bruises, bumps, non-polished surfaces and the like.

The removal amount was measured by a weight loss method using an analytical balance with a decimal point and a 4-digit number before and after polishing, and the results are shown in table 3.

Surface roughness measurements were made using a laser interferometer and the results are shown in Table 4

TABLE 3 results I of polishing wax test for examples 1 to 7 and comparative examples 1 to 6

Polishing wax	Input amount	Polishing related failures	Polishing yield
				Example 1	1000	55	94.5％
Example 2	1000	58	94.2％
				Example 3	1000	61	93.9％
Example 4	1000	59	94.1％
				Example 5	1000	9	99.1％
Example 6	1000	7	99.3％
				Example 7	1000	18	98.2％
Comparative example 1	1000	137	86.3％
				Comparative example 2	1000	281	71.9％
Comparative example 3	1000	191	80.9％
				Comparative example 4	1000	214	78.6％
Comparative example 5	1000	257	74.3％
				Comparative example 6	1000	137	86.3％

TABLE 4 results of polishing wax test II for examples 1 to 7 and comparative examples 1 to 6

Referring to Table 3, the polishing treatment of the stainless steel sheet was performed by comparing the polishing waxes obtained in comparative examples 1 to 6 and examples 1 to 7. It can be found that the use of the polishing waxes of examples 1 to 7 gives a high yield, about 92% to 99%. From table 4, it can be found that the cutting force is larger in unit time and the surface roughness is smaller in examples 5 to 7, and the difference lies in that the adhesion of the polishing wax to the cloth wheel and the stainless steel workpiece is better under the coordination of all components, the emulsification compatibility of various oils is more reasonable, the utilization rate of the polishing abrasive is higher, a stronger cutting force is achieved, a smoother surface is achieved, the oils play a role in cooling and lubricating, and the generated heat, residual wax and waste chips can be taken away, so that the polishing defects are reduced.

Compared with the normal-temperature emulsification process adopted in the application, the heating emulsification process is adopted in the comparative examples 1-2, the emulsification stability of the polishing wax is poor, the adhesion type of the abrasive is insufficient, the cutting effect cannot be well played, and therefore the polishing reject ratio is high.

In comparative examples 3 to 6, the polishing wax obtained by replacing the additive emulsifier or thickener or lubricant or dispersant alone had poor dispersibility of the abrasive in the system due to insufficient emulsion stability, and therefore, in use, cutting force distribution was not uniform, abrasion was large in some places, abrasion was small in some places, and further, poor polishing occurred.

Emulsion stability test

Using 100g of each of the 13 types of polishing waxes obtained in examples 1 to 7 and comparative examples 1 to 6, the wax was put into a centrifuge tube and subjected to an emulsion stability test, and the height of the supernatant was recorded by using a centrifuge with a maximum rotation speed of 6000RPM, and the emulsion stability was measured, and the results are shown in Table 5. A smaller height represents a better stability of the polishing liquid.

TABLE 5 results of emulsion stability test of polishing waxes of examples 1 to 6 and comparative examples 1 to 6

Referring to table 5, after resting for 2 hours, the polishing waxes of comparative examples 1 to 6 and examples 1 to 7 were centrifuged at 5000rpm and the height of the supernatant was measured, wherein the height of the supernatant of comparative examples 1 to 6 was approximately 2 to 5 times that of examples 1 to 7; the supernatant was collected by centrifugation at 6000rpm, and the heights of the supernatants of comparative examples 1-6 were approximately 4-6 times the heights of the supernatants of examples 1-6. The height of the supernatant after centrifugation of the polishing wax was also measured after different storage times. The results show that the polishing wax supernatants of comparative examples 1-6 increase in height much more than the polishing wax supernatants of examples 1-7 after centrifugation as the standing time increases. It shows that in the polishing wax system, the dispersing agent, the emulsifying agent, the lubricating agent, the thickening agent and the homogenization treatment in the preparation process have great influence on the stability of the system.

Comparing comparative examples 1-2 with example 1, it can be seen that the stability of the polishing wax system obtained under the synergistic effect of the additives such as emulsifier, thickener, etc. and the homogenization process is better under the process conditions of normal temperature emulsification, and compared with the heating emulsification process of comparative examples 1-2, the application can also reduce energy consumption, thereby reducing processing cost.

Comparing comparative examples 3 to 6 with example 1, it can be seen that the prepared polishing wax is easy to break and delaminate and has poor stability without adding a thickener, an emulsifier, a dispersant or a lubricant; after the viscosity of the polishing wax is increased by the thickening agent, the oil water and the grinding material are more stable; and the emulsifier, the dispersant and the lubricant form a better dispersion system among the oil water and the grinding material.

In comparative examples 1 to 3, the water content in the system was gradually reduced from example 1 to example 3, but the stability was not significantly different from that in the system, which indicates that the oil-in-water type polishing wax formed by homogenization treatment was excellent in stability under the synergistic effect of the emulsifier, the lubricant, the dispersant and the thickening agent.

Compared with the embodiment 2 and the embodiment 5-7, under the same proportion of deionized water, the oil phase formed by the compounded lubricant is easier to emulsify, has lower surface free energy, can be better dispersed in a system to form a firm emulsion film, and further maintains a more stable emulsification system.

The present embodiment is only for explaining the present application, and it is not limited to the present application, and those skilled in the art can make modifications of the present embodiment without inventive contribution as needed after reading the present specification, but all of them are protected by patent law within the scope of the claims of the present application.

Claims (10)

1. A polishing wax comprising water and an abrasive, wherein: the polishing wax also comprises a lubricant, an emulsifier, an oil phase solvent, a dispersant and a thickening agent;

wherein the lubricant is one or more of liquid fatty acid, liquid vegetable oil, liquid animal oil and liquid synthetic ester;

the polishing wax is oil-in-water emulsified polishing wax.

2. The polishing wax of claim 1, wherein: the emulsifier comprises one or more of polyoxyethylene, sorbitan fatty acid ester, glyceryl monooleate, dodecylphenol polyoxyethylene ether and fatty alcohol polyoxyethylene ether.

3. The polishing wax according to claim 1 or 2, wherein: the content of the emulsifier is 3-5% by weight.

4. The polishing wax of claim 1, wherein: the dispersing agent comprises one or more of polyethylene glycol, sodium polyacrylate, sodium dodecyl sulfate and fatty acid polyglycol ester.

5. The polishing wax as set forth in claim 1 or 4, wherein: the content of the dispersing agent is 1-3% by weight.

6. The polishing wax as set forth in claim 1, wherein: the thickener is one of natural gum and its modified matter, cellulose and its synthetic product, polyacrylic acid and polyoxyethylene.

7. The polishing wax of claim 1 or 6, wherein: the content of the thickening agent is 1-5% by weight.

8. A preparation method of polishing wax is characterized in that: the method comprises the following steps:

weighing part of deionized water, sequentially adding the grinding material, the dispersing agent and part of the emulsifying agent in percentage by weight into a stirrer, and uniformly stirring to obtain a component A;

weighing the lubricant and the rest part of the lubricant into a stirrer, and uniformly stirring to obtain a component B; a (c)

Weighing the rest percentage of deionized water and the thickener in percentage by weight into a stirrer, and uniformly stirring to obtain a component C;

adding the component B into the component A, and homogenizing to obtain a mixed solution D;

and adding the mixed solution D into the component C, and uniformly stirring to obtain the polishing wax.

9. The method of producing the polishing wax according to claim 8, wherein: the homogenization condition is that the intermittent high-shear dispersion is that the rotor rotates stably at a high speed to form high-frequency and strong comprehensive kinetic energy effects such as circumferential tangential velocity, angular velocity and the like; under the action of the stator, the stator and the rotor form strong and reciprocating comprehensive effects of hydraulic shearing, friction, centrifugal extrusion, liquid flow collision and the like in a reasonable and narrow gap, and the materials circularly reciprocate in the container to obtain the stable and uniform polishing wax.

10. The method of preparing a polishing wax as claimed in claim 9, wherein: the component C also comprises 0.1% of preservative.