CN115529710A - Electron curtain accelerator - Google Patents
Electron curtain accelerator Download PDFInfo
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- CN115529710A CN115529710A CN202211191741.3A CN202211191741A CN115529710A CN 115529710 A CN115529710 A CN 115529710A CN 202211191741 A CN202211191741 A CN 202211191741A CN 115529710 A CN115529710 A CN 115529710A
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Abstract
The application relates to the technical field of electron acceleration, and provides an electron curtain accelerator which comprises an electron gun, a beam spot processing device and a focusing device, wherein the electron gun comprises a cathode, the cathode is provided with an emission surface for emitting electron beam current, and the electron beam current is transmitted along the Z direction; the beam spot processing device is communicated with the electron gun and is used for carrying out beam spot expansion and homogenization operation on the electron beam; a focusing device is located downstream of the beam spot processing device in the Z direction, the focusing device in communication with the beam spot processing device, the focusing device configured to manipulate the stream of electron beams into a converging beam or a parallel beam to irradiate the object. The beam spot processing device enlarges the beam spot and shapes the beam spot into uniform distribution, and the focusing device focuses the electron beam, so that the cathode can emit the electron beam by adopting the emitting surface, the electron beam is processed into the electron curtain by the beam spot processing device and the focusing device, and the electron curtain is realized without adopting a filament-shaped cathode.
Description
Technical Field
The application relates to the technical field of electron acceleration, in particular to an electron curtain accelerator.
Background
The electronic curtain accelerator is widely applied to the fields of sterilization of food and medical supplies, desulfurization and denitration of flue gas, radiation curing and the like. Radiation curing refers to the curing of the printed and dyed coating by electron beams of an electron curtain accelerator. At present, the printing and dyeing coating is cured by adopting an ultraviolet ray or a chemical method. However, some coating dyes are not curable by uv light, chemical curing presents harmful chemical residues, and curing of printed coatings using electron beam does not present the above problems. Flue gas desulfurization denitration carries out the SOx/NOx control to the coal-fired waste gas of power plant, can solve the pollution problem on the one hand, and on the other hand can produce chemical fertilizer, realizes waste utilization.
The electron energy output by the electron curtain accelerator is 80keV (kilo-electron volts) to 300keV, and the electron current intensity is tens of milliamperes to hundreds of milliamperes. In the related art, an electron gun of an electron curtain accelerator emits an electron beam by using a filament, and in order to realize the electron curtain accelerator, the electron gun needs to be designed into a single filament about 1 meter long or a plurality of short filaments arranged side by side. The working temperature of the filament is 500-1000 ℃, and the filament droops due to single filament expansion caused by heating, thereby changing a series of problems such as electron beam optical structure and the like. The problem of thermal expansion of the plurality of short filaments is light, but the problem of uniformity of the emission current of the plurality of short filaments needs to be solved. No matter a single filament or a plurality of short filaments are adopted, the mechanical structure is very complicated, the difficulty in designing, manufacturing, installing and operating the electron gun is very high, and the manufacturing, installing and operating stability of the electron gun can hardly meet the requirement of industrial operation.
Disclosure of Invention
In view of the above, it is desirable to provide an electron curtain accelerator capable of reducing the difficulty of manufacturing an electron gun.
To achieve the above object, an embodiment of the present application provides an electronic curtain accelerator, including:
an electron gun comprising a cathode having an emission face for emitting an electron beam, the electron beam being transported in a Z-direction;
the beam spot processing device is communicated with the electron gun and is used for carrying out beam spot expansion and homogenization operation on the electron beam;
a focusing device located downstream of the beam spot processing device in a Z direction, the focusing device in communication with the beam spot processing device, the focusing device configured to manipulate the electron beam stream into a focused beam or a parallel beam to irradiate an object.
In some embodiments, the focusing device is a one-dimensional focusing magnet.
In some embodiments, the one-dimensional focusing magnet comprises two strip-shaped iron cores, each of which is wound with a first coil, the two strip-shaped iron cores are arranged in parallel along a Y direction at intervals to form a flow passage, and the two strip-shaped iron cores are excited in the flow passage to generate a one-dimensional linear gradient magnetic field along an X direction, wherein the X direction, the Y direction and the Z direction are perpendicular to each other.
In some embodiments, the one-dimensional focusing magnet includes two non-magnetic-conductive fixing members, and the two non-magnetic-conductive fixing members are respectively located at two ends of the two bar-shaped iron cores along the X direction to connect end portions of the two bar-shaped iron cores.
In some embodiments, the one-dimensional focus magnet includes two deflection units, the deflection unit is including the magnetic pole pair around the connector that is equipped with the second solenoid and has two magnetic poles, two magnetic poles of magnetic pole pair set up along the Y direction interval, the connector is connected the one end of two magnetic poles of magnetic pole pair, the other end of two magnetic poles of magnetic pole pair is for deflecting the end, two gaps that deflect between the end of magnetic pole pair are the circulation passageway, the end that deflects of magnetic pole pair is the magnetic pole face along the relative parallel plane of Y direction, the end that deflects is the rectangle in the projection of perpendicular to Z direction, the end that deflects is the wedge in the projection of perpendicular to Y direction, two the magnetic pole is to setting up along X direction interval symmetry.
In some embodiments, the beam spot processing apparatus comprises:
a first beam expanding magnet configured to expand a beam spot of the electron beam in an X direction;
a one-dimensional homogenizing magnet located downstream of the first beam expanding magnet in the Z direction, the one-dimensional homogenizing magnet configured to homogenize a beam spot of the electron beam current in the X direction.
In some embodiments, the beam spot processing apparatus comprises:
a second beam expanding magnet located downstream of the one-dimensional homogenizing magnet in the Z direction, the second beam expanding magnet configured to expand a beam spot of the electron beam in the X direction.
In some embodiments, the first axis of symmetry of the one-dimensional homogenizing magnet extends along the X direction and includes a bare pole pair and two wound pole pairs, where the bare pole pair and the wound pole pair each have two pole heads, the two wound pole pairs are respectively located on two sides of the bare pole pair along the X direction, neither of the two pole heads of the bare pole pair is provided with a coil and is symmetrically distributed along the first axis of symmetry, and both pole heads of the wound pole pair are provided with a coil and are symmetrically distributed along the first axis of symmetry; the magnetic field distribution curve of the magnetic field generated by the two winding magnetic pole pairs along the X direction is an odd function.
In some embodiments, the magnetic field profile in the X direction of the magnetic field generated by the two wound pole pairs is a power exponent function, the power exponent of the power exponent function is between 1.8 and 2.2, and the power exponent is not a constant over the entire curve.
In some embodiments, the electron curtain accelerator includes a vacuum tube and a vacuum box, the electron gun and the beam spot processing device are communicated through the vacuum tube, the vacuum box includes a vacuum chamber, an inlet and an outlet, the inlet and the outlet are both communicated with the vacuum chamber, the inlet is communicated with an exit port of the beam spot processing device, the outlet is communicated with the focusing device, and the size of the vacuum chamber in the X direction gradually increases from the inlet to the outlet.
The electron curtain accelerator that this application embodiment provided, on the one hand, because the density of the electron beam stream that the emission surface sent is gaussian distribution, the density distribution of electron beam stream is inhomogeneous promptly, can't directly be used for irradiation object, consequently, this application enlarges the beam spot and the integer is evenly distributed through beam spot processing apparatus, enlarge and the homogenization operation to electron beam through beam spot processing apparatus promptly, carry out the focusing operation to electron beam through the focusing device, so, the negative pole can adopt the emission surface to emit electron beam to handle electron beam into the electron curtain through beam spot processing apparatus and focusing device, need not adopt filliform negative pole to realize the electron curtain. Compared with a filament-shaped cathode, the electron gun adopting the emitting surface to emit the electron beam can avoid the problems that the optical structure of the electron beam is changed by the sagging of the filament, the consistency of a plurality of filaments is poor, and the like, has a simple structure, is convenient to assemble, and overcomes the defects of high difficulty in developing the electron gun of the electron curtain accelerator, poor operation reliability, short service life and the like in the prior art. On the other hand, the parallel beams output by the focusing device have large coverage area and uniform density distribution, and can irradiate the object. The convergent beams output by the focusing device not only can realize synchronous irradiation of a plurality of surfaces of an object, such as three surfaces of a square object, but also can improve the dose uniformity along the direction of the incident object.
Drawings
Fig. 1 is a schematic structural diagram of an electronic curtain accelerator in an embodiment of the present application;
FIG. 2 is a schematic diagram of a focusing device for focusing an electron beam into a parallel beam according to an embodiment of the present disclosure;
FIG. 3 is a diagram illustrating an exemplary focusing apparatus for focusing an electron beam into a focused beam according to an embodiment of the present disclosure;
FIG. 4 is a schematic structural diagram of a first one-dimensional focusing magnet according to an embodiment of the present application;
FIG. 5 is a schematic diagram of the two-dimensional magnetic field distribution of the first one-dimensional focusing magnet shown in FIG. 4;
fig. 6 is a schematic diagram of a one-dimensional magnetic field distribution of the first one-dimensional focusing magnet shown in fig. 4;
FIG. 7 is a schematic structural diagram of a second one-dimensional focusing magnet according to an embodiment of the present application;
fig. 8 is a schematic diagram of a beam envelope of an electron curtain accelerator in an embodiment of the present application;
FIG. 9 is a schematic view of a partial structure of a one-dimensional homogenizing magnet according to an embodiment of the present application;
FIG. 10 is a schematic view of the beam spot of the electron beam stream at the one-dimensional homogenizing magnet after being expanded by the first beam expanding magnet according to an embodiment of the present disclosure;
fig. 11 is a schematic diagram of a beam spot of an electron beam after one-dimensional expansion and one-dimensional homogenization of the beam spot processing apparatus according to an embodiment of the present application;
fig. 12 is a schematic structural diagram of a quadrupole magnet according to an embodiment of the present application.
Description of the reference numerals
An electron gun 1;
a beam spot processing device 2; a first beam expanding magnet 21; a one-dimensional homogenizing magnet 22; the pole face portion 22a; a constricted portion 22b; a bare pole pair 221; a pair of wound poles 222; a first wound pole pair 2221; a second wound pole pair 2222; a second beam expanding magnet 23; a head portion 23a; a neck portion 23b;
a focusing device 3; a strip-shaped iron core 31; the flow-through channel 31a; a first line pack 32; a non-magnetically conductive fixing member 33; a deflection unit 301; a second line pack 3011; a connecting body 3012; a pole pair 3013; the deflection end 30131; flow-through channels 30131a; pole face 30131b;
a vacuum tube 4;
a vacuum box 5;
an object 1000;
Detailed Description
It should be noted that, in the present application, technical features in examples and embodiments may be combined with each other without conflict, and the detailed description in the specific embodiment should be understood as an explanation of the gist of the present application and should not be construed as an improper limitation to the present application.
In the present application, the orientation or positional relationship is based on the orientation or positional relationship shown in fig. 1, it is to be understood that these terms are merely for convenience of description and simplicity of description, and do not indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore should not be construed as limiting the application. The present application will now be described in further detail with reference to the accompanying drawings and specific examples.
Referring to fig. 1, an electron curtain accelerator according to an embodiment of the present application includes an electron gun 1, a beam spot processing device 2, and a focusing device 3.
The electron gun 1 comprises a cathode having an emission face for emitting an electron beam, which is transported in the Z direction. The density of the electron beam flow emitted by the emitting surface is approximately Gaussian distribution by taking a plane vertical to the Z direction as a projection plane.
The projection of the emitting surface on a projection plane vertical to the Z direction is planar. Illustratively, the emitting surface may be a plane, a convex arc surface, a concave arc surface, or the like, along the Z direction.
Referring to fig. 1 and 11, a beam spot processing device 2 is in communication with an electron gun 1, and the beam spot processing device 2 is used for performing a beam spot enlarging and homogenizing operation on an electron beam. Specifically, the beam spot processing device 2 is used for performing one-dimensional beam spot enlargement and one-dimensional beam spot homogenization on the electron beam. In other words, the beam spot processing apparatus 2 is used to perform beam spot enlargement in the X direction and homogenization in the X direction on the electron beam. The beam spot of the electron beam flux processed by the beam spot processing device 2 is expanded and uniformly distributed in a one-dimensional direction, for example, the X direction.
With continued reference to fig. 1, the focusing device 3 is located downstream of the beam spot processing device 2 in the Z direction. That is, the focusing device 3 is located on the side of the beam spot processing device 2 away from the electron gun 1. In the Z direction, the electron beam passes through the beam spot processing device 2 and then the focusing device 3.
The focusing device 3 is communicated with the beam spot processing device 2. In this way, the electron beam current processed by the beam spot processing device 2 can enter the focusing device 3.
Referring to fig. 2 and 3, the focusing device 3 is configured to operate the stream of electron beams as a converging beam or a parallel beam to irradiate the object 1000. That is, the focusing device 3 can refocus the electron beam current subjected to the enlarging and homogenizing operation into a focused beam or a parallel beam. Specifically, the focusing device 3 is used for performing a beam spot one-dimensional focusing operation on the electron beam. In other words, the focusing device 3 is used for performing a beam spot focusing operation in the X direction on the electron beam current. That is, the beam spot of the electron beam current processed by the focusing device 3 is focused in a one-dimensional direction, for example, the X direction.
In the related art, in order to make the electron beam current be an electron curtain, a filament-shaped cathode is required to be adopted to emit the electron beam current, the filament-shaped cathode has the problems that the filament droops due to the expansion of a single filament, the optical structure of the electron beam current is changed, the consistency of a plurality of filaments is poor, and the like.
The electron curtain accelerator that this application embodiment provided, on the one hand, because the density of the electron beam stream that the emission surface sent is gaussian distribution, the density distribution of electron beam stream is inhomogeneous promptly, can't directly be used for irradiation object 1000, therefore, this application enlarges the beam spot and the integer is evenly distributed through beam spot processing apparatus 2, enlarge and the homogenization operation to electron beam through beam spot processing apparatus 2 promptly, carry out the focus operation to electron beam through focusing device 3, so, the negative pole can adopt the emission surface to emit electron beam, so that process electron beam into the electron curtain through beam spot processing apparatus 2 and focusing device 3, need not adopt filament-shaped negative pole to realize the electron curtain. Compared with a filament-shaped cathode, the electron gun 1 adopting the emitting surface to emit the electron beam can avoid the problems that the optical structure of the electron beam is changed by the sagging of the filament, the consistency of a plurality of filaments is poor and the like, has a simple structure, is convenient to assemble, and overcomes the defects of high difficulty in developing the electron gun of the electron curtain accelerator, poor operation reliability, short service life and the like in the prior art. On the other hand, the parallel beams output by the focusing device 3 have a large coverage area and uniform density distribution, and can irradiate the object 1000. The convergent beams output by the focusing device 3 can not only realize synchronous irradiation of a plurality of surfaces of the object 1000, such as three surfaces of the square object 1000, but also improve the dose uniformity along the direction of the incident object 1000.
The projection shape of the emission surface on the projection plane perpendicular to the Z direction is not limited, and exemplary projection shapes of the emission surface on the projection plane perpendicular to the Z direction include, but are not limited to, a circle. The density of the electron beam stream emitted from the circular emitting surface is closer to the gaussian distribution.
In some embodiments, the electron gun 1 is electrically connected to a high voltage power supply, and the emission surface draws an electron beam under the action of the high voltage power supply. The high-voltage power supply is used for providing high-voltage power for the electron gun 1, so that high-energy and high-current electron beams are led out.
In some embodiments, the electron beam current of the present application is not limited in intensity, and the electron beam current may be an intense electron beam current. In other words, the electron beam current is stronger than 10mA (milliampere). Illustratively, the beam current is adjustable in intensity, ranging from 0.02A to 1A.
In one embodiment, referring to fig. 4 and 7, the focusing device 3 is a one-dimensional focusing magnet. The one-dimensional focusing magnet is used for carrying out beam spot one-dimensional focusing operation on the electron beam. That is, the beam spot of the electron beam current processed by the one-dimensional focusing magnet is focused in a one-dimensional direction, for example, the X direction.
In one embodiment, referring to fig. 4 to 6, the one-dimensional focusing magnet includes two bar-shaped iron cores 31 wound with the first wire packets 32, and the two bar-shaped iron cores 31 are arranged in parallel along the Y direction at intervals to form the current passing channel 31a. Specifically, the flow passage 31a is used to flow the electron beam current. The two strip-shaped iron cores 31 are excited in the flow passage 31a to generate a one-dimensional linear gradient magnetic field along the X direction, wherein the X direction, the Y direction and the Z direction are perpendicular to each other. That is, the one-dimensional linear gradient magnetic field can focus the electron beam current flowing through the flow channel 31a in the X direction.
In one embodiment, referring to fig. 4, the one-dimensional focusing magnet includes two non-magnetic-conductive fixing members 33, and the two non-magnetic-conductive fixing members 33 are respectively located at two ends of the two bar cores 31 along the X direction to connect the ends of the two bar cores 31. That is, both ends of the two strip cores 31 in the X direction are fixed by the non-magnetic conductive fixing members 33, respectively. In this way, the relative positions of the two bar cores 31 are kept constant by the non-magnetic conductive fixing member 33.
The non-magnetic conductive fixing member 33 refers to a structure using a non-magnetic conductive material. Non-magnetically conductive materials include, but are not limited to, aluminum. The non-magnetic conductive fixing member 33 has a low magnetic permeability. The non-magnetic conductive fixing member 33 cannot be magnetized in general. In this way, the non-magnetically conductive fixing member 33 is prevented from affecting the magnetic field distribution in the flow passage 31a.
In an embodiment, referring to fig. 7, the one-dimensional focusing magnet includes two deflecting units 301, the deflecting unit 301 includes a connecting body 3012 around which the second wire packet 3011 is wound and a magnetic pole pair 3013 having two magnetic poles, the two magnetic poles of the magnetic pole pair 3013 are arranged at intervals along the Y direction, the connecting body 3012 connects one end of the two magnetic poles of the magnetic pole pair 3013, and the other end of the two magnetic poles of the magnetic pole pair 3013 is a deflecting end 30131. The deflecting end 30131 is the end of the pole remote from the connecting body 3012. The gap between the two deflecting ends 30131 of the pole pair 3013 is a flow channel 30131a.
The parallel surfaces of the deflection end 30131 of the magnetic pole pair 3013 opposite to each other along the Y direction are magnetic pole surfaces 30131b, the projection of the deflection end 30131 on the projection plane perpendicular to the Z direction is rectangular, the projection of the deflection end 30131 on the projection plane perpendicular to the Y direction is wedge-shaped, and the two magnetic pole pairs 3013 are arranged symmetrically along the X direction. That is, the deflection ends 30131 of the two magnetic pole pairs 3013 are arranged at intervals in the X direction, and the deflection ends 30131 of the two magnetic pole pairs 3013 do not touch. The pole face 30131b is wedge-shaped.
The flow channel 30131a is used to flow an electron beam. That is, the electron beam passes through between the two magnetic pole faces 30131b of the magnetic pole pair 3013, the magnetic field in the flow channel 30131a does not change much in the X direction, but the magnetic field regions passed by the electrons located at different positions of the flow channel 30131a have different sizes, so that the deflection force applied to the electrons far from the central axis is greater than the deflection force applied to the electrons close to the central axis, thereby realizing one-dimensional focusing.
The wedge shape means that the dimension of the pole face 30131b in the Z direction gradually increases from the direction closer to the central axis toward the direction farther from the central axis.
The connector 3012 is an iron yoke. Thus, the connecting body 3012 has good magnetic permeability.
Note that the central axis extends in the Z direction and is located between the deflecting ends 30131 of the two magnetic pole pairs 3013.
In one embodiment, referring to fig. 1 and 8, the beam spot processing apparatus 2 includes a first beam expanding magnet 21 and a one-dimensional homogenizing magnet 22.
The first beam expanding magnet 21 is configured to expand a beam spot of the electron beam in the X direction. The beam spot of the electron beam passing through the first beam expanding magnet 21 is substantially a flat beam spot.
Illustratively, the first size of the beam spot of the electron beam passing through the first beam expanding magnet 21 in the X direction is 5 times or more the second size in the Y direction. Therefore, beam expansion is carried out along the X direction, so that the coverage area of the electron beam is enlarged, and the requirement on the radiation range is met.
A first dimension of the beam spot in the X direction is substantially greater than a second dimension in the Y direction. For example, in one embodiment, referring to FIG. 10, the first dimension of the beam spot in the X direction is between 50mm and 150 mm. For example, the first dimension of the beam spot in the X-direction is 50mm, 100mm, 110mm, 120mm, 150mm, or the like. Referring to FIG. 10, the size of the beam spot along the Y direction is between 5mm and 20 mm. For example, the first dimension of the beam spot in the X-direction is 5mm, 10mm or 20mm, etc.
With continued reference to fig. 1 and 8, the one-dimensional uniformizing magnet 22 is located downstream of the first beam expanding magnet 21 in the Z direction. That is, the one-dimensional uniformizing magnet 22 is located between the first beam expanding magnet 21 and the focusing device 3. The electron beam from the emitting surface passes through the first beam expanding magnet 21 and then passes through the one-dimensional homogenizing magnet 22.
The one-dimensional uniformizing magnet 22 is arranged to uniformize a beam spot of the electron beam current in the X direction. Electrons of the electron beam flow are uniformly distributed in the X direction after being operated by the one-dimensional homogenizing magnet 22.
In an exemplary embodiment, the nonuniformity of the density distribution of the electron beam in the X direction after being homogenized by the one-dimensional homogenizing magnet 22 is better than 10%. That is, the nonuniformity of the density distribution of the electron beam in the X direction, which is homogenized by the one-dimensional homogenizing magnet 22, is 10% or less.
In an embodiment, referring to fig. 1, 8 and 11, the beam spot processing apparatus 2 includes a second beam expanding magnet 23, and the second beam expanding magnet 23 is located downstream of the one-dimensional uniformizing magnet 22 along the Z direction. That is, the second beam expanding magnet 23 is located between the one-dimensional uniformizing magnet 22 and the focusing device 3. The electron beam homogenized by the one-dimensional homogenizing magnet 22 is expanded by the second expanding magnet 23. The second beam expanding magnet 23 is configured to expand a beam spot of the electron beam in the X direction. In this way, the third size of the beam spot of the electron beam in the X direction is further enlarged by the second beam expander magnet 23. On the one hand, the first beam expanding magnet 21 and the second beam expanding magnet 23 expand the beams, so that the size of the beam spot of the electron beam in the X direction can be adjusted in a wide range. On the other hand, the one-dimensional uniformizing magnet 22 is provided between the first beam expanding magnet 21 and the second beam expanding magnet 23, and the uniformity of the density distribution of the electron beam in the X direction is improved.
Illustratively, referring to FIG. 11, the third dimension of the beam spot in the X-direction is between about 200mm and about 1500 mm. Illustratively, in one embodiment, the third dimension of the beam spot in the X-direction is between 200mm and 1500 mm. For example, the third dimension of the beam spot in the X-direction is 200mm, 300mm, 500mm, 900mm, 1500mm, or the like.
In one embodiment, referring to fig. 1 and 9, the one-dimensional homogenizing magnet 22 is an axisymmetric figure, the first axis of symmetry extends along the X-direction, and fig. 9 shows a half-sectional view of the one-dimensional homogenizing magnet taken along the first axis of symmetry, the one-dimensional homogenizing magnet includes a bare pole pair 221 and two wound pole pairs 222. The number of the wound pole pairs 222 is two, and the number of the bare pole pairs 221 is one. The bare pole pair 221 and the wound pole pair 222 each have two pole heads.
The two wound magnetic pole pairs 222 are respectively located on two sides of the bare magnetic pole pair 221 along the X direction, two pole heads of the bare magnetic pole pair 221 are not provided with a coil and are symmetrically distributed along a first symmetric axis, and two pole heads of the wound magnetic pole pair 222 are provided with a coil and are symmetrically distributed along the first symmetric axis.
Here, the six pole heads of the one-dimensional homogenizing magnet are arranged in a circumferential direction around the central axis. The bare magnetic pole pair 221 is used for optimizing the magnetic field distribution, and through the structural design of the bare magnetic pole pair 221 and the wound magnetic pole pair 222, the magnetic field formed by the one-dimensional homogenizing magnet can provide focusing effect for electrons along the X direction, so that electron beam current flowing through the one-dimensional homogenizing magnet can be uniformly distributed along the X direction.
It will be appreciated that the first axis of symmetry intersects the central axis perpendicularly.
In one embodiment, referring to fig. 9, the arrows in fig. 9 schematically show the magnetic field directions, and the magnetic fields generated by the two wound pole pairs 222 are in opposite directions. In other words, one of the two bobbin pole pairs 222 is defined as a first bobbin pole pair 2221, and the other of the two bobbin pole pairs 222 is defined as a second bobbin pole pair 2222. The direction of the magnetic field of the first winding pole pair 2221 is opposite to the direction of the magnetic field of the second winding pole pair 2222. For example, the magnetic field direction of the first winding magnetic pole pair 2221 is upward in the Y direction, and the magnetic field direction of the second winding magnetic pole pair 2222 is downward in the Y direction.
It will be appreciated that the magnetic field generated between the pole tips can be varied by varying the excitation current in the coil of the one-dimensional homogenizing magnet.
The shape of the pole head of the one-dimensional homogenizing magnet is not limited, and for example, referring to fig. 9, the pole head of the wound magnetic pole pair 222 includes a pole face portion 22a and a constricted portion 22b, and an end face of the pole face portion 22a away from the constricted portion 22b is a pole face. The width of the projection of the constricted portion 22b is smaller than the width of the projection of the polar portion 22a, taking a plane perpendicular to the Z direction as a projection plane. The projection of the pole head of the one-dimensional homogenizing magnet is roughly mushroom-shaped. Thus, the pole face of the pole face portion 22a can meet the requirement, the narrow width of the contraction portion 22b facilitates winding of the coil, and the pole face portion 22a can limit the movement of the coil.
In one embodiment, the magnetic field profile in the X direction of the magnetic field generated by the two wound pole pairs 222 is an odd function. That is, the magnetic field distribution curve in the X direction of the magnetic field generated between the two pole heads of the two described wound pole pairs 222 is an odd function. Specifically, the origin of coordinates of the odd function is at the intersection of the first axis of symmetry and the center axis, with a plane perpendicular to the Z direction as a projection plane. In this way, the magnetic fields generated by the two wound magnetic pole pairs 222 are symmetric with respect to the origin of coordinates, and can provide a good homogenization effect on the beam spot of the electron beam.
In one embodiment, the magnetic field profile of the magnetic field generated by the two wound pole pairs 222 along the X direction is a power exponential function. The power exponent of the power exponent function is between 1.8 and 2.2, and the power exponent is not a constant over the entire curve. That is, the power of the power function of the magnetic field distribution curve in the X direction of the magnetic field generated between the two pole heads of the two described wound magnetic pole pairs 222 is varied. In this way, the magnetic field gradient in the X direction generated by the two wound magnetic pole pairs 222 is moderate, so as to improve the uniformity of the beam spot of the electron beam.
In some embodiments, the power exponent may be adjusted according to a beam spot distribution density of the electron beam current. Therefore, the one-dimensional homogenizing magnet can adapt to different densities.
In an embodiment, referring to fig. 10, the first beam expanding magnet 21 and the second beam expanding magnet 23 are both quadrupole magnets. The four-pole magnet is in an axisymmetric pattern.
In an embodiment, referring to fig. 10, the quadrupole magnet includes four pole heads each wound with a coil, the pole heads of the quadrupole magnet include a head portion 23a and a neck portion 23b, and an end surface of the head portion 23a away from the neck portion 23b is a pole surface. The width of the projection of the neck portion 23b is smaller than the width of the projection of the head portion 23a, taking a plane perpendicular to the Z direction as a projection plane. The projection of the pole heads of the quadrupole magnets is roughly mushroom-shaped. Thus, the polar surface of the head 23a can meet the requirement, the width of the neck 23b is small, the coil can be wound conveniently, and the head 23a can limit the movement of the coil.
In one embodiment, referring to fig. 1, the electron curtain accelerator includes a vacuum tube 4 and a vacuum box 5, the electron gun 1 and the beam spot processing device 2 are communicated through the vacuum tube 4, the vacuum box 5 includes a vacuum chamber, an inlet and an outlet, the inlet and the outlet are both communicated with the vacuum chamber, the inlet is communicated with an exit port of the beam spot processing device 2, the outlet is communicated with the focusing device 3, and the size of the vacuum chamber in the X direction gradually increases from the inlet to the outlet.
After the electron beam from the emitting surface is subjected to one-dimensional beam spot expansion and one-dimensional homogenization by the beam spot processing device 2, the beam spot of the electron beam is gradually expanded in the X direction, so that the size of the vacuum cavity in the X direction is gradually increased from the inlet to the outlet, and the electron beam is conveniently transmitted.
Illustratively, the projection shape of the vacuum chamber may be substantially a fan shape with a plane perpendicular to the Y direction as a projection plane.
In one embodiment, the dimension of the vacuum chamber in the Y direction is uniform from the inlet to the outlet. That is, the size of the vacuum chamber in the Y direction remains unchanged.
It is understood that the inner space of the vacuum tube 4 and the vacuum chamber are in a vacuum state.
In one embodiment, the electron curtain accelerator includes a titanium membrane covering the outlet. The titanium film is used to isolate the vacuum chamber from the atmosphere so that a vacuum is maintained in the vacuum chamber. The electron beam current passes through the titanium film and enters the focusing device 3.
For example, in some embodiments, referring to fig. 1, the focusing device 3 may be spaced from the vacuum box 5 along the Z-direction. In other embodiments, the focusing device 3 may be arranged in abutment with the vacuum box 5 in the Z-direction.
The above description is only for the specific embodiments of the present application, but the scope of the present application is not limited thereto, and any person skilled in the art can easily conceive of the changes or substitutions within the technical scope of the present application, and shall be covered by the scope of the present application. Therefore, the protection scope of the present application shall be subject to the protection scope of the claims.
Claims (10)
1. An electron curtain accelerator, comprising:
an electron gun comprising a cathode having an emission face for emitting an electron beam, the electron beam being transported in a Z-direction;
the beam spot processing device is communicated with the electron gun and is used for carrying out beam spot expansion and homogenization operation on the electron beam;
a focusing device located downstream of the beam spot processing device in a Z direction, the focusing device in communication with the beam spot processing device, the focusing device configured to manipulate the electron beam stream into a focused beam or a parallel beam to irradiate an object.
2. The accelerator according to claim 1 wherein said focusing means is a one-dimensional focusing magnet.
3. The accelerator according to claim 2, wherein the one-dimensional focusing magnet comprises two bar-shaped iron cores wound with a first coil, the two bar-shaped iron cores are arranged in parallel along a Y direction at intervals to form a flow passage, and the two bar-shaped iron cores are excited in the flow passage to generate a one-dimensional linear gradient magnetic field along an X direction, wherein the X direction, the Y direction and the Z direction are perpendicular to each other.
4. The accelerator according to claim 3, wherein the one-dimensional focusing magnet comprises two non-magnetically conductive fixing members, and the two non-magnetically conductive fixing members are respectively located at two ends of the two bar-shaped iron cores along the X direction so as to connect the ends of the two bar-shaped iron cores.
5. The accelerator of claim 2, wherein the one-dimensional focusing magnet comprises two deflection units, each deflection unit comprises a pair of magnetic poles with two magnetic poles and a connecting body wound around a second coil, the two magnetic poles of the pair of magnetic poles are arranged at intervals along the Y direction, the connecting body connects one ends of the two magnetic poles of the pair of magnetic poles, the other ends of the two magnetic poles of the pair of magnetic poles are deflection ends, a gap between the two deflection ends of the pair of magnetic poles is a flow channel, the deflection ends of the pair of magnetic poles are magnetic pole faces along the parallel plane opposite to the Y direction, the projection of the deflection ends on the projection plane perpendicular to the Z direction is rectangular, the projection of the deflection ends on the projection plane perpendicular to the Y direction is wedge-shaped, and the two magnetic poles are symmetrically arranged at intervals along the X direction.
6. The electron curtain accelerator according to any one of claims 1 to 5, wherein the beam spot processing means comprises:
a first beam expanding magnet configured to expand a beam spot of the electron beam in an X direction;
a one-dimensional homogenizing magnet located downstream of the first beam expanding magnet in the Z direction, the one-dimensional homogenizing magnet configured to homogenize a beam spot of the electron beam current in the X direction.
7. The electron curtain accelerator of claim 6, wherein the beam spot processing device comprises:
a second beam expanding magnet located downstream of the one-dimensional homogenizing magnet in the Z direction, the second beam expanding magnet configured to expand a beam spot of the electron beam in the X direction.
8. The accelerator according to claim 6, wherein the first axis of symmetry of the homogenizing magnet extends along the X direction, and comprises a bare pole pair and two wound pole pairs, the bare pole pair and the wound pole pair each have two pole heads, the two wound pole pairs are respectively located at two sides of the bare pole pair along the X direction, neither of the two pole heads of the bare pole pair is provided with a coil and is symmetrically distributed along the first axis of symmetry, and both pole heads of the wound pole pair are provided with a coil and are symmetrically distributed along the first axis of symmetry; the magnetic field distribution curve of the magnetic field generated by the two winding magnetic pole pairs along the X direction is an odd function.
9. The accelerator according to claim 8, wherein the magnetic field distribution curve of the magnetic field generated by the two wound magnetic pole pairs along the X direction is a power exponent function, the power exponent of the power exponent function is between 1.8 and 2.2, and the power exponent is not a constant over the entire curve.
10. The electron curtain accelerator according to any one of claims 1 to 5, wherein the electron curtain accelerator comprises a vacuum tube and a vacuum box, the electron gun and the beam spot processing device are communicated through the vacuum tube, the vacuum box comprises a vacuum chamber, an inlet and an outlet, the inlet and the outlet are both communicated with the vacuum chamber, the inlet is communicated with an exit port of the beam spot processing device, the outlet is communicated with the focusing device, and the size of the vacuum chamber in the X direction is gradually increased from the inlet to the outlet.
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