CN115460760A - Vacuum control system of cyclotron - Google Patents
Vacuum control system of cyclotron Download PDFInfo
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- CN115460760A CN115460760A CN202211398276.0A CN202211398276A CN115460760A CN 115460760 A CN115460760 A CN 115460760A CN 202211398276 A CN202211398276 A CN 202211398276A CN 115460760 A CN115460760 A CN 115460760A
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- cyclotron
- pump
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H13/00—Magnetic resonance accelerators; Cyclotrons
- H05H13/005—Cyclotrons
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B37/00—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
- F04B37/06—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for evacuating by thermal means
- F04B37/08—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for evacuating by thermal means by condensing or freezing, e.g. cryogenic pumps
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B37/00—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
- F04B37/10—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use
- F04B37/14—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use to obtain high vacuum
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B41/00—Pumping installations or systems specially adapted for elastic fluids
- F04B41/06—Combinations of two or more pumps
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B49/00—Control, e.g. of pump delivery, or pump pressure of, or safety measures for, machines, pumps, or pumping installations, not otherwise provided for, or of interest apart from, groups F04B1/00 - F04B47/00
- F04B49/06—Control using electricity
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04D—NON-POSITIVE-DISPLACEMENT PUMPS
- F04D19/00—Axial-flow pumps
- F04D19/02—Multi-stage pumps
- F04D19/04—Multi-stage pumps specially adapted to the production of a high vacuum, e.g. molecular pumps
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
- H05H7/14—Vacuum chambers
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E30/00—Energy generation of nuclear origin
- Y02E30/10—Nuclear fusion reactors
Abstract
The invention discloses a vacuum control system of a cyclotron, which comprises: a cyclotron; the molecular pump and the cryogenic pump are respectively connected with the cyclotron and are used for vacuumizing the cyclotron; the mechanical pump unit is respectively connected with the molecular pump and the cryogenic pump through vacuum pipelines and is used as a front stage of the molecular pump and a regeneration pump of the cryogenic pump; the gate valve is used for controlling the on-off of the molecular pump, the cryogenic pump and the cyclotron; the angle valve is used for controlling the on-off of the vacuum pipeline; the first compound gauge and the second compound gauge are respectively used for measuring the vacuum degrees of the cyclotron and the vacuum pipeline to obtain a first measuring result and a second measuring result; and the vacuum control device is used for controlling the molecular pump, the cryogenic pump, the mechanical pump unit, the gate valve and the angle valve according to the first measurement result and the second measurement result so as to vacuumize the cyclotron to a target vacuum degree. Therefore, the system can reduce the overall cost of the system and improve the compactness of the system.
Description
Technical Field
The invention relates to the technical field of radioactive medical instrument vacuum, in particular to a vacuum control system of a cyclotron.
Background
The vacuum system on a compact cyclotron needs to maintain a high vacuum state inside the cyclotron, and has the characteristics of high compactness and low cost. At present, the commonly used means is a molecular pump and a cryogenic pump, but the requirements of rough pumping of the molecular pump and the cryogenic pump are different, even conflicting for some time periods, so that two sets of mechanical pumps are commonly used for rough pumping respectively. However, this not only increases the cost, but also makes the system not compact enough.
Disclosure of Invention
One objective of the present invention is to provide a vacuum control system for a cyclotron, which can reduce the overall cost of the system and improve the compactness of the system.
In order to achieve the above object, a first embodiment of the present invention provides a vacuum control system for a cyclotron, which includes: the molecular pump is connected with the cyclotron and is used for vacuumizing the cyclotron; the cryogenic pump is connected with the cyclotron and is used for vacuumizing the cyclotron; the mechanical pump unit is respectively connected with the molecular pump and the cryogenic pump through vacuum pipelines and is used as a front stage of the molecular pump and a regeneration pump of the cryogenic pump; the gate valve is respectively connected with the cyclotron, the molecular pump and the cryogenic pump and used for controlling the on-off of the molecular pump, the cryogenic pump and the cyclotron; the angle valve is respectively connected with the cyclotron and the vacuum pipeline and is used for controlling the on-off of the vacuum pipeline; the first compound gauge is used for measuring the vacuum degree of the cyclotron to obtain a first measurement result; the second composite gauge is used for measuring the vacuum degree of the vacuum pipeline to obtain a second measurement result; and the vacuum control device is respectively connected with the molecular pump, the cryogenic pump, the mechanical pump unit, the gate valve, the angle valve, the first composite gauge and the second composite gauge and is used for controlling the molecular pump, the cryogenic pump, the mechanical pump unit, the gate valve and the angle valve according to the first measurement result and the second measurement result so as to vacuumize the cyclotron to a target vacuum degree.
According to the vacuum control system of the cyclotron, the overall cost of the system can be reduced, and the compactness of the system can be improved.
In addition, the vacuum control system for the cyclotron provided by the above embodiment of the present invention may further have the following additional technical features:
according to one embodiment of the invention, the number of the cryogenic pumps is two, the cryogenic pumps are respectively a first cryogenic pump and a second cryogenic pump, the gate valve comprises a first gate valve, a second gate valve and a third gate valve, the angle valve comprises a first angle valve, the molecular pump is connected with the cyclotron through the first gate valve, the first cryogenic pump is connected with the cyclotron through the second gate valve, the second cryogenic pump is connected with the cyclotron through the third gate valve, the first angle valve is connected to the vacuum pipeline, and the mechanical pump unit is respectively connected with the molecular pump, the first cryogenic pump and the second cryogenic pump through the first angle valve; and the vacuum control device is also connected with the first angle valve, the first gate valve, the second gate valve and the third gate valve respectively and used for controlling the opening or closing of the first angle valve, the first gate valve, the second gate valve and the third gate valve according to the first measurement result.
According to an embodiment of the invention, the mechanical pump assembly comprises a first mechanical pump and a second mechanical pump, the second mechanical pump being connected between the first mechanical pump and the first angle valve, the vacuum control device being configured to: when the first measurement result is smaller than a first preset vacuum degree, opening the first angle valve, starting the first mechanical pump, and when the second measurement result is smaller than a second preset vacuum degree, starting the second mechanical pump, wherein the second preset vacuum degree is larger than the first preset vacuum degree; when the vacuum degree of the vacuum pipeline is reduced to the first preset vacuum degree, starting the molecular pump, and when the working frequency of the molecular pump reaches a first preset frequency, opening the first gate valve; and when the vacuum degree of the cyclotron is reduced to a third preset vacuum degree, starting the first cryogenic pump and the second cryogenic pump, and opening the second gate valve and the third gate valve, wherein the first preset vacuum degree is greater than the third preset vacuum degree.
According to an embodiment of the invention, the angle valve further comprises a second angle valve connected between the cyclotron and an end of the first angle valve remote from the second mechanical pump; the vacuum control device is further connected with the second angle valve and is further used for controlling the second angle valve to be opened or closed according to the first measurement result.
According to one embodiment of the invention, the vacuum control device is configured to: when the first measurement result is greater than the first preset vacuum degree, opening the first angle valve and the second angle valve, starting the first mechanical pump, and when the second measurement result is less than the second preset vacuum degree, starting the second mechanical pump; when the vacuum degree of the cyclotron is reduced to the first preset vacuum degree, closing the second angle valve, opening the first gate valve and starting the molecular pump; and when the vacuum degree of the cyclotron is reduced to a third preset vacuum degree, starting the first cryogenic pump and the second cryogenic pump, and opening the second gate valve and the third gate valve.
According to one embodiment of the invention, the system further comprises a nitrogen valve, the nitrogen valve is connected to a nitrogen pipeline, one end of the nitrogen pipeline is connected with the cyclotron, and the other end of the nitrogen pipeline is used for inputting nitrogen; the vacuum control device is also connected with the nitrogen valve and is also used for controlling the nitrogen valve to be opened or closed so as to break vacuum of the cyclotron.
According to an embodiment of the invention, the vacuum control means is adapted to break a vacuum in the cyclotron after evacuation of the cyclotron.
Further, the vacuum control device is used for, when the cyclotron is vacuumized: and closing the first gate valve, the second gate valve, the third gate valve, the molecular pump, the first angle valve, the first mechanical pump and the second mechanical pump in sequence, and then opening the nitrogen valve.
According to an embodiment of the present invention, the vacuum control means, before opening the nitrogen gas valve, is further configured to: acquiring the pressure of nitrogen input by the nitrogen pipeline; and if the nitrogen pressure is within a preset range, opening the nitrogen valve, wherein the preset range is 0.05-0.1MPa.
According to an embodiment of the invention, the vacuum control device is further configured to close the first gate valve, the second gate valve, the third gate valve and the molecular pump when a system fault is detected, and prompt a manual intervention operation.
Additional aspects and advantages of the invention will be set forth in part in the description which follows and, in part, will be obvious from the description, or may be learned by practice of the invention.
Drawings
FIG. 1 is a schematic diagram of the vacuum control system of the cyclotron in accordance with one embodiment of the present invention;
figure 2 is a schematic diagram of the vacuum control system of the cyclotron in accordance with one embodiment of the present invention.
Detailed Description
Reference will now be made in detail to embodiments of the present invention, examples of which are illustrated in the accompanying drawings, wherein like reference numerals refer to the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the accompanying drawings are illustrative and intended to explain the present invention and should not be construed as limiting the present invention.
The vacuum control system of the cyclotron according to the embodiment of the present invention will be described in detail with reference to the drawings and the detailed description.
Fig. 1 is a schematic configuration diagram of a vacuum control system of a cyclotron according to an embodiment of the present invention. As shown in fig. 1, a vacuum control system 100 for a cyclotron includes: the device comprises a cyclotron 10, a molecular pump 20, a cryogenic pump 30, a mechanical pump unit 40, a gate valve 50, an angle valve 60, a first compound gauge 71, a second compound gauge 72 and a vacuum control device 80.
Wherein, the molecular pump 20 is connected with the cyclotron 10 and is used for vacuumizing the cyclotron 10; the cryogenic pump 30 is connected with the cyclotron 10 and is used for vacuumizing the cyclotron 10; a mechanical pump unit 40 connected to the molecular pump 20 and the cryopump 30 through vacuum lines, respectively, and serving as a backing pump for the molecular pump 20 and a regeneration pump for the cryopump 30; the gate valve 50 is respectively connected with the cyclotron 10, the molecular pump 20 and the cryogenic pump 30 and is used for controlling the on-off of the molecular pump 20 and the cryogenic pump 30 and the cyclotron 10; the angle valve 60 is respectively connected with the cyclotron 10 and the vacuum pipeline and is used for controlling the on-off of the vacuum pipeline; the first combination gauge 71 is used for measuring the vacuum degree of the cyclotron 10 to obtain a first measurement result; the second combination gauge 72 is used for measuring the vacuum degree of the vacuum pipeline to obtain a second measurement result; the vacuum control device 80 is respectively connected with the molecular pump 20, the cryogenic pump 30, the mechanical pump unit 40, the gate valve 50, the angle valve 60, the first combination gauge 71 and the second combination gauge 72, and is used for controlling the molecular pump 20, the cryogenic pump 30, the mechanical pump unit 40, the gate valve 50 and the angle valve 60 according to the first measurement result and the second measurement result so as to vacuumize the cyclotron 10 to a target vacuum degree.
In particular, the cyclotron 10, which uses hydrogen as the working gas, also requires a better vacuum environment to be maintained during operation, generally at 10 -3 Magnitude and above, this requires vacuum systems optimized for hydrogen evacuation, with current high vacuum solutions utilizing molecular pumps to maintain high internal vacuum for long periods of time and cryogenic pumps to evacuate H 2 Has the great advantage that the cryopump needs to be stopped and regenerated periodically, thereby combining long-term operation and high-performance high-vacuum performance. The vacuum control device 80 of the present invention controls the molecular pump 20, the cryopump 30, and the mechanical pump unit 40 according to the degree of vacuum of the cyclotron 10 measured by the first combination gauge 71 and the degree of vacuum of the vacuum line measured by the second combination gauge 72 to evacuate the cyclotron 10 to a target degree of vacuum. Therefore, compared with the scheme that the molecular pump and the cryogenic pump are respectively provided with a set of mechanical pump, the mechanical pump unit is respectively connected with the molecular pump and the cryogenic pump through the vacuum pipelines and used as a front stage of the molecular pump and a regeneration pump of the cryogenic pump, the overall cost of the system can be reduced, and the compactness of the system can be improved.
The composite gauge is a combination of a pirani gauge and an ion gauge.
Referring to fig. 2, the number of the cryopumps 30 is two, which are respectively the first cryopump 31 and the second cryopump 32, the gate valve 50 may include a first gate valve 51, a second gate valve 52 and a third gate valve 53, the angle valve 60 includes a first angle valve 61, the molecular pump 20 is connected with the cyclotron 10 through the first gate valve 51, the first cryopump 31 is connected with the cyclotron 10 through the second gate valve 52, the second cryopump 32 is connected with the cyclotron 10 through the third gate valve 53, the first angle valve 61 is connected on the vacuum pipeline, and the mechanical pump unit 40 is connected with the molecular pump 20, the first cryopump 31 and the second cryopump 32 through the first angle valve 61.
In this example, the vacuum control device 80 is also connected to the first angle valve 61, the first gate valve 51, the second gate valve 52, and the third gate valve 53, respectively (not shown in the drawings), for performing opening or closing control of the first angle valve 61, the first gate valve 51, the second gate valve 52, and the third gate valve 53 according to the first measurement result. Therefore, the gate valves are arranged among the molecular pump, the first cryogenic pump, the second cryogenic pump and the cyclotron to control the on-off of the molecular pump, the first cryogenic pump, the second cryogenic pump and the cyclotron, so that the molecular pump, the first cryogenic pump and the second cryogenic pump are protected.
Referring to fig. 2, the mechanical pump assembly 40 may include a first mechanical pump 41 and a second mechanical pump 42, and the second mechanical pump 42 is connected between the first mechanical pump 41 and a first angle valve 61. The vacuum control device 80 is used for: when the first measurement result is smaller than a first preset vacuum degree (for example, 10 Pa), opening the first angle valve 61, starting the first mechanical pump 41, and when the second measurement result is smaller than a second preset vacuum degree, starting the second mechanical pump 42, wherein the second preset vacuum degree is larger than the first preset vacuum degree; when the vacuum degree of the vacuum pipeline is reduced to a first preset vacuum degree, starting the molecular pump 20, and when the working frequency of the molecular pump 20 reaches a first preset frequency (such as 200 Hz), opening the first gate valve 51; when the vacuum degree of the cyclotron 10 is reduced to a third preset vacuum degree (such as 1E-2 Pa), the first cryogenic pump 31 and the second cryogenic pump 32 are started, and the second gate valve 52 and the third gate valve 53 are opened, wherein the first preset vacuum degree is greater than the third preset vacuum degree.
Specifically, the vacuum control device 80 opens the first angle valve 61 to turn on the first mechanical pump 41 when the first measurement result is less than a first preset vacuum degree (e.g., 10 Pa), and turns on the second mechanical pump 42 when the second measurement result is less than a second preset vacuum degree (e.g., 1000 Pa). When the vacuum degree of the vacuum pipeline is reduced to a first preset vacuum degree, the vacuum control device 80 starts the molecular pump 20, and opens the first gate valve 51 when the working frequency of the molecular pump 20 reaches a first preset frequency (e.g., 200 Hz). When the degree of vacuum of the cyclotron 10 is reduced to a third preset degree of vacuum (e.g., 0.1 Pa), the vacuum control device 80 turns on the first cryopump 31 and the second cryopump 32, and turns on the second gate valve 52 and the third gate valve 53. Therefore, the molecular pump and the cryogenic pump can run synchronously, and cross conflict is avoided.
In the present invention, when the determination is performed using the first measurement result, which is the vacuum degree of the cyclotron 10, the average vacuum degree of the cyclotron 10 may be used instead, for example: the vacuum control means 80 may also turn on the first and second cryopumps 31 and 32 and turn on the second and third gate valves 52 and 53 when the average vacuum degree of the cyclotron 10 is reduced to a third preset vacuum degree. Wherein the average vacuum level of the cyclotron 10 can be calculated and averaged over a plurality of first measured values.
Referring to fig. 2, the angle valve 60 may further include a second angle valve 62, the second angle valve 62 being connected between the cyclotron 10 and an end of the first angle valve 61 remote from the second mechanical pump 42; wherein the vacuum control device 80 is further connected to the second angle valve 62 (not shown in the drawings), and is further configured to control the second angle valve 62 to open or close according to the first measurement result.
In this example, the vacuum control device 80 is used to: when the first measurement result is greater than the first preset vacuum degree, opening a first angle valve 61 and a second angle valve 62, starting a first mechanical pump 41, and when the second measurement result is less than the second preset vacuum degree, starting a second mechanical pump 42; when the vacuum degree of the cyclotron 10 is reduced to a first preset vacuum degree, closing the second angle valve 62, opening the first gate valve 51, and starting the molecular pump 20; when the vacuum degree of the cyclotron 10 is reduced to a third preset vacuum degree, the first cryogenic pump 31 and the second cryogenic pump 32 are started, and the second gate valve 52 and the third gate valve 53 are opened.
Specifically, the vacuum control device 80 opens the first and second angle valves 61 and 62 to turn on the first mechanical pump 41 when the first measurement result is greater than the first preset vacuum degree, and turns on the second mechanical pump 42 when the second measurement result is less than the second preset vacuum degree. When the vacuum degree of the cyclotron 10 is reduced to the first preset vacuum degree, the vacuum control device 80 closes the second angle valve 62, opens the first gate valve 51, and opens the molecular pump 20. When the degree of vacuum of the cyclotron 10 is reduced to a third preset degree of vacuum, the vacuum control device 80 turns on the first cryopump 31 and the second cryopump 32, and turns on the second gate valve 52 and the third gate valve 53. Therefore, the molecular pump and the cryogenic pump can run synchronously, and cross conflict is avoided.
It should be noted that the vacuum control device 80 may further open the first angle valve 61 and the second angle valve 62 to start the first mechanical pump 41 when the average vacuum degree of the cyclotron 10 is greater than the first preset vacuum degree, and start the second mechanical pump 42 when the second measurement result is less than the second preset vacuum degree. When the average vacuum degree of the cyclotron 10 is reduced to the first preset vacuum degree, the vacuum control device 80 closes the second angle valve 62, opens the first gate valve 51, and opens the molecular pump 20. When the average vacuum degree of the cyclotron 10 is reduced to a third preset vacuum degree, the vacuum control device 80 starts the first cryopump 31 and the second cryopump 32, and opens the second gate valve 52 and the third gate valve 53.
Referring to fig. 2, the vacuum control system 100 of the cyclotron may further include a nitrogen valve 90, the nitrogen valve 90 is connected to a nitrogen pipeline, one end of the nitrogen pipeline is connected to the cyclotron 10, and the other end is used for inputting nitrogen; the vacuum control device 80 is further connected to a nitrogen valve 90 (not shown in the drawings), and is further configured to open or close the nitrogen valve 90 to break vacuum in the cyclotron 10.
In this example, the vacuum control device 80 is used to break the vacuum in the cyclotron 10 after the cyclotron 10 is evacuated. The vacuum control means 80 is configured to, when breaking vacuum in the cyclotron 10: and closing the first gate valve 51, the second gate valve 52, the third gate valve 53, the molecular pump 20, the first angle valve 61, the first mechanical pump 41 and the second mechanical pump 42 in sequence, and then opening the nitrogen valve 90.
It should be noted that the vacuum control device 80 is further configured to, before opening the nitrogen valve 90: acquiring nitrogen pressure input by a nitrogen pipeline; and if the nitrogen pressure is in a preset range, opening the nitrogen valve 90, wherein the preset range is 0.05-0.1MPa.
It should be noted that, the impurities and water vapor in the air are carried into the vacuum chamber by breaking the vacuum with the air, which makes it difficult to drop the vacuum at a later stage when the vacuum is removed again. In order to quickly establish vacuum again, the vacuum is broken by nitrogen, namely, the nitrogen is filled into the vacuum chamber to restore the vacuum chamber to the normal pressure state, so that the purpose of breaking vacuum is realized.
As an example, the vacuum control device 80 is further configured to close the first gate valve 51, the second gate valve 52, the third gate valve 53, the molecular pump 20 and prompt a human intervention operation when a system failure is detected. It should be noted that the cyclotron 10 has radioactivity, and even after the operation is stopped, the surrounding environment still has a certain amount of radioactive substance remaining, and it takes a certain time for a person to enter. Therefore, the field fault signal can be rapidly identified, and misoperation of personnel is avoided.
In conclusion, the vacuum control system of the cyclotron controls the molecular pump, the cryogenic pump, the mechanical pump unit, the gate valve and the angle valve according to the first measurement result and the second measurement result so as to vacuumize the cyclotron to the target vacuum degree, the overall cost of the system can be reduced, the compactness of the system can be improved, and the system can be operated more safely, efficiently and flexibly.
In the description herein, references to the description of the term "one embodiment," "some embodiments," "an example," "a specific example," or "some examples," etc., mean that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the invention. In this specification, the schematic representations of the terms used above do not necessarily refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.
In the description of the present invention, it is to be understood that the terms "central," "longitudinal," "lateral," "length," "width," "thickness," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," "clockwise," "counterclockwise," "axial," "radial," "circumferential," and the like are used in the orientations and positional relationships indicated in the drawings for convenience in describing the invention and to simplify the description, and are not intended to indicate or imply that the referenced devices or elements must have a particular orientation, be constructed and operated in a particular orientation, and are therefore not to be considered limiting of the invention.
Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one such feature. In the description of the present invention, "a plurality" means at least two, e.g., two, three, etc., unless specifically limited otherwise.
In the present invention, unless otherwise expressly stated or limited, the terms "mounted," "connected," "secured," and the like are to be construed broadly and can, for example, be fixedly connected, detachably connected, or integrally formed; can be mechanically or electrically connected; they may be directly connected or indirectly connected through intervening media, or they may be connected internally or in any other suitable relationship, unless expressly stated otherwise. The specific meanings of the above terms in the present invention can be understood by those skilled in the art according to specific situations.
In the present invention, unless otherwise expressly stated or limited, the first feature "on" or "under" the second feature may be directly contacting the first and second features or indirectly contacting the first and second features through an intermediate. Also, a first feature "on," "over," and "above" a second feature may be directly or diagonally above the second feature, or may simply indicate that the first feature is at a higher level than the second feature. A first feature being "under," "below," and "beneath" a second feature may be directly under or obliquely under the first feature, or may simply mean that the first feature is at a lesser elevation than the second feature.
Although embodiments of the present invention have been shown and described above, it is understood that the above embodiments are exemplary and should not be construed as limiting the present invention, and that variations, modifications, substitutions and alterations can be made to the above embodiments by those of ordinary skill in the art within the scope of the present invention.
Claims (10)
1. A vacuum control system for a cyclotron, the system comprising:
a cyclotron;
the molecular pump is connected with the cyclotron and is used for vacuumizing the cyclotron;
the cryogenic pump is connected with the cyclotron and is used for vacuumizing the cyclotron;
the mechanical pump unit is respectively connected with the molecular pump and the cryogenic pump through vacuum pipelines and is used as a front stage of the molecular pump and a regeneration pump of the cryogenic pump;
the gate valve is respectively connected with the cyclotron, the molecular pump and the cryogenic pump and is used for controlling the on-off of the molecular pump, the cryogenic pump and the cyclotron;
the angle valve is respectively connected with the cyclotron and the vacuum pipeline and is used for controlling the on-off of the vacuum pipeline;
the first compound gauge is used for measuring the vacuum degree of the cyclotron to obtain a first measurement result;
the second composite gauge is used for measuring the vacuum degree of the vacuum pipeline to obtain a second measurement result;
and the vacuum control device is respectively connected with the molecular pump, the cryogenic pump, the mechanical pump unit, the gate valve, the angle valve, the first composite gauge and the second composite gauge and is used for controlling the molecular pump, the cryogenic pump, the mechanical pump unit, the gate valve and the angle valve according to the first measurement result and the second measurement result so as to vacuumize the cyclotron to a target vacuum degree.
2. The vacuum control system of a cyclotron of claim 1, wherein the number of cryogenic pumps is two, and the cryogenic pumps are a first cryogenic pump and a second cryogenic pump, respectively, the gate valves include a first gate valve, a second gate valve and a third gate valve, the angle valves include a first angle valve, the molecular pump is connected to the cyclotron through the first gate valve, the first cryogenic pump is connected to the cyclotron through the second gate valve, the second cryogenic pump is connected to the cyclotron through the third gate valve, the first angle valve is connected to the vacuum pipeline, and the mechanical pump unit is connected to the molecular pump, the first cryogenic pump and the second cryogenic pump through the first angle valve, respectively;
the vacuum control device is further connected with the first angle valve, the first gate valve, the second gate valve and the third gate valve respectively, and is used for controlling the opening or closing of the first angle valve, the first gate valve, the second gate valve and the third gate valve according to the first measurement result.
3. The vacuum control system for a cyclotron of claim 2, wherein the mechanical pump assembly comprises a first mechanical pump and a second mechanical pump, the second mechanical pump being connected between the first mechanical pump and the first angular valve, the vacuum control device being configured to:
when the first measurement result is smaller than a first preset vacuum degree, opening the first angle valve, starting the first mechanical pump, and when the second measurement result is smaller than a second preset vacuum degree, starting the second mechanical pump, wherein the second preset vacuum degree is larger than the first preset vacuum degree;
when the vacuum degree of the vacuum pipeline is reduced to the first preset vacuum degree, starting the molecular pump, and when the working frequency of the molecular pump reaches a first preset frequency, opening the first gate valve;
and when the vacuum degree of the cyclotron is reduced to a third preset vacuum degree, starting the first cryogenic pump and the second cryogenic pump, and opening the second gate valve and the third gate valve, wherein the first preset vacuum degree is greater than the third preset vacuum degree.
4. The vacuum control system for a cyclotron of claim 3, wherein the angle valve further comprises a second angle valve connected between the cyclotron and an end of the first angle valve distal from the second mechanical pump;
the vacuum control device is further connected with the second angle valve and is further used for controlling the second angle valve to be opened or closed according to the first measurement result.
5. The vacuum control system of a cyclotron of claim 4, wherein the vacuum control means is configured to:
when the first measurement result is greater than the first preset vacuum degree, opening the first angle valve and the second angle valve, starting the first mechanical pump, and when the second measurement result is less than the second preset vacuum degree, starting the second mechanical pump;
when the vacuum degree of the cyclotron is reduced to the first preset vacuum degree, closing the second angle valve, opening the first gate valve and starting the molecular pump;
and when the vacuum degree of the cyclotron is reduced to a third preset vacuum degree, starting the first cryogenic pump and the second cryogenic pump, and opening the second gate valve and the third gate valve.
6. The vacuum control system for a cyclotron of claim 5, further comprising a nitrogen valve, wherein the nitrogen valve is connected to a nitrogen line, one end of the nitrogen line is connected to the cyclotron, and the other end of the nitrogen line is used for inputting nitrogen gas;
the vacuum control device is also connected with the nitrogen valve and is also used for controlling the opening or closing of the nitrogen valve so as to break vacuum of the cyclotron.
7. The vacuum control system for a cyclotron of claim 6, wherein the vacuum control means is configured to break a vacuum in the cyclotron after the cyclotron is evacuated.
8. The vacuum control system for a cyclotron of claim 7, wherein the vacuum control means, when de-vacuuming the cyclotron, is configured to:
and closing the first gate valve, the second gate valve, the third gate valve, the molecular pump, the first angle valve, the first mechanical pump and the second mechanical pump in sequence, and then opening the nitrogen valve.
9. The vacuum control system for a cyclotron of any of claims 6 to 8, wherein the vacuum control means, before opening the nitrogen valve, is further configured to:
acquiring the pressure of nitrogen input by the nitrogen pipeline;
and if the nitrogen pressure is within a preset range, opening the nitrogen valve, wherein the preset range is 0.05-0.1MPa.
10. The vacuum control system of claim 5, wherein the vacuum control device is further configured to close the first gate valve, the second gate valve, the third gate valve, and the molecular pump and prompt a human intervention operation when a system fault is detected.
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