CN115365023A - Automatic coating system for surface treatment and development - Google Patents
Automatic coating system for surface treatment and development Download PDFInfo
- Publication number
- CN115365023A CN115365023A CN202210977931.1A CN202210977931A CN115365023A CN 115365023 A CN115365023 A CN 115365023A CN 202210977931 A CN202210977931 A CN 202210977931A CN 115365023 A CN115365023 A CN 115365023A
- Authority
- CN
- China
- Prior art keywords
- fixedly connected
- communicated
- surface treatment
- air bag
- coating system
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B1/00—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means
- B05B1/30—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means designed to control volume of flow, e.g. with adjustable passages
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B1/00—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means
- B05B1/28—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means with integral means for shielding the discharged liquid or other fluent material, e.g. to limit area of spray; with integral means for catching drips or collecting surplus liquid or other fluent material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B12/00—Arrangements for controlling delivery; Arrangements for controlling the spray area
- B05B12/02—Arrangements for controlling delivery; Arrangements for controlling the spray area for controlling time, or sequence, of delivery
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B9/00—Spraying apparatus for discharge of liquids or other fluent material, without essentially mixing with gas or vapour
- B05B9/03—Spraying apparatus for discharge of liquids or other fluent material, without essentially mixing with gas or vapour characterised by means for supplying liquid or other fluent material
- B05B9/04—Spraying apparatus for discharge of liquids or other fluent material, without essentially mixing with gas or vapour characterised by means for supplying liquid or other fluent material with pressurised or compressible container; with pump
- B05B9/0403—Spraying apparatus for discharge of liquids or other fluent material, without essentially mixing with gas or vapour characterised by means for supplying liquid or other fluent material with pressurised or compressible container; with pump with pumps for liquids or other fluent material
- B05B9/0423—Spraying apparatus for discharge of liquids or other fluent material, without essentially mixing with gas or vapour characterised by means for supplying liquid or other fluent material with pressurised or compressible container; with pump with pumps for liquids or other fluent material for supplying liquid or other fluent material to several spraying apparatus
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Coating Apparatus (AREA)
Abstract
The invention discloses a surface treatment and development automatic coating system, which belongs to the technical field of coating and comprises a base, wherein the top of the base is fixedly connected with a box body. According to the invention, the developing solution entering the shell can enable the second baffle plate to stretch the first shrinkage air bag under the action of gravity, the first shrinkage air bag extracts gas in the second shrinkage air bag, the sliding block and the first baffle plate move, the developing solution can be sprayed out through the coating nozzle to coat the surface of the wafer, after the coating is finished, the arc-shaped elastic air bag and the acting force of the first shrinkage air bag enable the second baffle plate to reset, at the moment, the second baffle plate conveys the gas in the first shrinkage air bag to the inside of the second shrinkage air bag, the second baffle plate drives the sliding block and the first baffle plate to move, the bottom of the mounting sleeve is blocked, and further residual liquid drops are prevented from easily existing in the coating nozzle, and the residual liquid drops can drop on the surface of the wafer along with the action of gravity, so that the pattern formation on the surface of the wafer is influenced.
Description
Technical Field
The invention belongs to the technical field of coating, and particularly relates to an automatic coating system for surface treatment and development.
Background
With the continuous reduction of the requirement of the high-speed development of the IC process on the CD, the wafer size is larger and larger, the circuit structure is more complex, for the developing technology in the photoetching process, a developing nozzle device needs to be utilized to spray developing solution on the surface of a photoresist on the wafer, the existing mainstream developing process is rotary spraying and linear scanning, the rotary spraying is to spray and coat the developing solution on the rotating wafer through the developing nozzle above the wafer, and can realize better spraying and covering effects through nozzle scanning, the linear scanning is to spray and coat the developing solution on a fixed wafer through the developing nozzle with a diameter slightly larger than the diameter of the wafer along linear motion above the wafer, and the complete covering of the developing solution on the wafer is realized through one-time scanning.
When current automatic coating system of surface treatment development sprays the coating to the wafer surface, after spraying the coating, remaining liquid flows out along with the tip of action of gravity from the nozzle easily in the nozzle, drips the wafer on the surface, leads to the developer on wafer surface to distribute unevenly, and then causes the influence to the formation of wafer surface pattern to lead to the product yield to reduce, improved the economic loss of enterprise, need carry out certain improvement.
Disclosure of Invention
The invention aims to: in order to solve the problem that when the existing surface treatment development automatic coating system sprays and coats the surface of a wafer, after the spraying and coating are finished, residual liquid in a nozzle flows out from the tip of the nozzle easily along with the action of gravity, and drips on the surface of the wafer, so that the distribution of the developing solution on the surface of the wafer is uneven, and further the formation of patterns on the surface of the wafer is influenced, the yield of products is reduced, and the economic loss of enterprises is improved, the surface treatment development automatic coating system is provided.
In order to achieve the purpose, the invention adopts the following technical scheme:
a surface treatment development automatic coating system comprises a base, wherein the top of the base is fixedly connected with a box body, the top side inside the box body is fixedly connected with an X-axis module, the bottom of the X-axis module is provided with a Y-axis module, a connecting plate is arranged below the Y-axis module, the bottom of the connecting plate is provided with an electric push rod, the bottom end of the electric push rod is provided with an adjusting assembly, a linear adjusting assembly is arranged below the adjusting assembly, one side of the linear adjusting assembly is provided with a plurality of anti-leakage assemblies, and the bottom of the anti-leakage assemblies is provided with a coating nozzle;
the antiseep subassembly includes the casing, the equal fixedly connected with fixing base in inside both sides of casing, the fixing base rotates through the round pin axle and is connected with the second baffle, the first shrink gasbag of top fixedly connected with of second baffle, the bottom fixedly connected with arc elastic airbag of second baffle, the opposite side of first shrink gasbag and arc elastic airbag all with the inside wall fixed connection of casing, one side intercommunication of arc elastic airbag has the second connecting pipe, be provided with the installation cover behind the first through-hole that the casing was seted up is passed to the other end of second connecting pipe, be provided with the ooff valve on the second connecting pipe.
As a further description of the above technical solution:
the installation cavity has all been seted up to the bottom both sides of installation cover, and inside one side fixedly connected with second shrink gasbag of installation cavity, the opposite side fixedly connected with sliding block of second shrink gasbag, the first baffle of one side fixedly connected with of sliding block.
As a further description of the above technical solution:
one side of the sliding block is fixedly connected with a sliding block, the other side of the sliding block is connected with a sliding rail in a sliding mode, and the other side of the sliding rail is fixedly connected with the inner side wall of the installation sleeve.
As a further description of the above technical solution:
one side of the first shrinkage air bag is communicated with an air delivery pipe, and the other end of the air delivery pipe sequentially penetrates through second through holes formed in the shell and the mounting sleeve and then is communicated with the second shrinkage air bag.
As a further description of the above technical solution:
the mounting sleeve is characterized in that a second inner cavity is formed in the mounting sleeve, one side of the second inner cavity is communicated with a liquid pumping pipe, one side of the second inner cavity is communicated with a liquid discharging pipe, the other side of the liquid discharging pipe is communicated with an external collecting device, and one-way valves are arranged on the liquid pumping pipe and the liquid discharging pipe.
As a further description of the above technical solution:
the coating nozzle is characterized in that clamping grooves are formed in two sides of the bottom of the coating nozzle, an annular elastic part is fixedly connected to the bottom side of the interior of each clamping groove, a spherical rod is arranged inside each annular elastic part, and the bottom end of each spherical rod is fixedly connected with the mounting sleeve.
As a further description of the above technical solution:
the adjusting component comprises an installation block, a first inner cavity is formed in the top side of the interior of the installation block, the bottom of the first inner cavity is communicated with a plurality of circular through holes, the bottom of each circular through hole is communicated with a first connecting pipe, and the other end of each first connecting pipe is communicated with the shell.
As a further description of the above technical solution:
the anti-corrosion spring is characterized in that a fixing block is fixedly connected to the inside of the circular through hole, a conical hole is formed in the fixing block, an anti-corrosion spring is fixedly connected to the bottom side of the inside of the conical hole, a spherical stop block is fixedly connected to the top of the anti-corrosion spring, and the spherical stop block is connected to the inside of the conical hole in a sliding mode.
As a further description of the above technical solution:
the linear adjusting assembly comprises a U-shaped plate, the top of the U-shaped plate is fixedly connected with the mounting block, one side of the outside of the U-shaped plate is fixedly connected with a driving motor, an output shaft of the driving motor is fixedly connected with a lead screw, and the lead screw is rotatably connected inside the U-shaped plate.
As a further description of the above technical solution:
the lead screw is provided with a plurality of thread sleeves in threaded connection, the bottom of each thread sleeve is provided with a connecting rod structure through a pin shaft, first through holes are formed in two sides of each thread sleeve, a polished rod is connected to the inside of each first through hole in a sliding mode, and two ends of each polished rod are fixedly connected with the inner side wall of the U-shaped plate respectively.
As a further description of the above technical solution:
the top of the electric push rod is fixedly sleeved with a fixing frame, and the top of the fixing frame is fixedly connected with the bottom of the connecting plate through a screw.
As a further description of the above technical solution:
the improved vacuum pump is characterized in that a liquid storage tank is fixedly connected to one side of the top of the box body, a liquid pump is arranged on one side of the liquid storage tank, the bottom of the liquid pump is fixedly connected to the top of the box body through a supporting block, one end of the liquid pump is communicated with a liquid inlet pipe, the other end of the liquid inlet pipe is communicated with the liquid storage tank, the other end of the liquid pump is communicated with a liquid outlet pipe, the other end of the liquid outlet pipe is communicated with a first inner cavity after passing through a third through hole formed in the box body, a rotation driving device is fixedly connected to the bottom side of the inside of the box body, and a vacuum bearing platform is arranged at the top of the rotation driving device.
In summary, due to the adoption of the technical scheme, the invention has the beneficial effects that:
1. according to the invention, the second baffle plate can stretch the first shrinkage air bag by the developing solution in the shell under the action of gravity, the first shrinkage air bag can extract gas in the second shrinkage air bag through the air delivery pipe, at the moment, the shrinkage characteristic of the second shrinkage air bag can drive the sliding block and the first baffle plate to move, the developing solution can be sprayed out through the coating nozzle to coat the surface of the wafer, after the coating is finished, the switch valve on the first connecting pipe is closed, the second baffle plate is reset by the acting force of the arc-shaped elastic air bag and the first shrinkage air bag, at the moment, the second baffle plate can convey the gas in the first shrinkage air bag to the inside of the second shrinkage air bag to drive the sliding block and the first baffle plate to move, the bottom of the mounting sleeve is blocked, further, the phenomenon that residual liquid drops easily existing in the coating nozzle can drop on the surface of the wafer along with the action of gravity is prevented, further, the influence on the pattern formation on the surface of the wafer is prevented, and the product yield is improved.
2. According to the invention, the arc-shaped elastic airbag is stretched while the second baffle extrudes the first shrinkage airbag, the arc-shaped elastic airbag exhausts the interior of the second inner cavity through the second connecting pipe, and at the moment, the residual liquid drops at the tip of the coating nozzle are extracted through the liquid extracting pipe, so that the phenomenon that the liquid drops on the surface of a wafer when the next wafer is coated is prevented, the coating on the surface of the wafer is not uniform, and the yield of products during coating is further ensured.
3. According to the invention, the developing solution in the first inner cavity is simultaneously output through the arranged corrosion-resistant spring and the spherical stop block, so that the phenomenon that the liquid output amount of a plurality of coating nozzles is inconsistent due to the fact that the developing solution is directly output through the first connecting pipe is prevented, the surface of the wafer is coated unevenly, the subsequent developing quality is affected, the rejection rate of the wafer during developing is reduced, and the economic loss of enterprises is further caused.
Drawings
FIG. 1 is a schematic overall perspective view of a surface treatment development automatic coating system according to the present invention;
FIG. 2 is a schematic perspective view of a housing of an automatic coating system for surface treatment and development according to the present invention;
FIG. 3 is a schematic perspective view of a Y-axis module of an automatic coating system for surface treatment and development according to the present invention;
FIG. 4 is a schematic perspective view of a linear adjustment assembly of an automatic coating system for surface treatment and development according to the present invention;
FIG. 5 is a schematic view of a disassembled structure of a linear adjusting assembly in an automatic coating system for surface treatment and development according to the present invention;
FIG. 6 is a schematic diagram of the internal structure of a conditioning assembly in an automatic coating system for surface treatment and development according to the present invention;
FIG. 7 is a schematic view of the internal structure of a leakage-proof assembly in the automatic coating system for surface treatment and development according to the present invention;
FIG. 8 is an enlarged view of a portion of FIG. 7 of an automatic coating system for surface treatment and development according to the present invention.
Illustration of the drawings:
1. a base; 2. a box body; 3. a Y-axis module; 4. a connecting plate; 5. an electric push rod; 6. an adjustment assembly; 601. mounting blocks; 602. a first lumen; 603. a circular through hole; 604. a fixed block; 605. a corrosion resistant spring; 606. a spherical stopper; 607. a first connecting pipe; 608. a tapered hole; 7. a linear adjustment assembly; 701. a U-shaped plate; 702. a drive motor; 703. a screw rod; 704. a threaded sleeve; 705. a polish rod; 706. a connecting rod structure; 8. a leakage prevention assembly; 801. a housing; 802. a first baffle plate; 803. a fixed seat; 804. a second baffle; 805. a first deflated bladder; 806. an arc-shaped elastic air bag; 807. a second connection pipe; 808. installing a sleeve; 809. a second lumen; 810. an annular elastic member; 811. a spherical rod; 812. a second deflated bladder; 813. a slider; 9. a coating nozzle; 10. a fixed mount; 11. a liquid storage tank; 12. a liquid pump; 13. a liquid inlet pipe; 14. a liquid outlet pipe.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Referring to fig. 1-8, the present invention provides a technical solution: a surface treatment development automatic coating system comprises a base 1, wherein the top of the base 1 is fixedly connected with a box body 2, the top side inside the box body 2 is fixedly connected with an X-axis module, the bottom of the X-axis module is provided with a Y-axis module 3, a connecting plate 4 is arranged below the Y-axis module 3, the bottom of the connecting plate 4 is provided with an electric push rod 5, the bottom end of the electric push rod 5 is provided with an adjusting component 6, a linear adjusting component 7 is arranged below the adjusting component 6, one side of the linear adjusting component 7 is provided with a plurality of anti-leakage components 8, and the bottom of the anti-leakage components 8 is provided with a coating nozzle 9;
The implementation mode is specifically as follows: the developing solution entering the inside of the housing 801 rotates the second baffle 804 under the action of gravity, at this time, the second baffle 804 extrudes the arc-shaped elastic airbag 806, the second baffle 804 rotates and stretches the first contracted airbag 805, the first contracted airbag 805 extracts the gas inside the second contracted airbag 812 through the air duct, meanwhile, the contraction characteristic of the second contracted airbag 812 drives the sliding block 813 to slide inside the mounting cavity, the first baffle 802 moves by utilizing the linkage effect between the sliding block 813 and the first baffle 802, the developing solution can be sprayed out through the coating nozzle 9 to coat the surface of the wafer, and meanwhile, the rotation driving device drives the vacuum bearing platform and the wafer to rotate slowly, coating the developing solution on whole wafer, after the coating, close the ooff valve on the first connecting pipe 607, under arc elasticity gasbag 806 and first shrink gasbag 805's effect, make second baffle 804 reset, second baffle 804 can extrude first shrink gasbag 805 this moment, carry its inside gas to the inside of second shrink gasbag 812 through the defeated tuber pipe, make it produce the inflation, it removes to drive sliding block 813 and first baffle 802, block the bottom of installation cover 808, and then prevent that coating nozzle 9 from having the residual liquid drop easily, can drip on the surface of wafer along with the action of gravity, and then cause the influence to the pattern formation on wafer surface, thereby lead to the product yield to reduce.
The installation cavity has all been seted up to the bottom both sides of installation cover 808, inside one side fixedly connected with second shrink gasbag 812 of installation cavity, the opposite side fixedly connected with sliding block 813 of second shrink gasbag 812, the first baffle 802 of one side fixedly connected with of sliding block 813, one side fixedly connected with slider of sliding block 813, the opposite side sliding connection of slider has the slide rail, the opposite side of slide rail and the inside wall fixed connection of installation cover 808, one side intercommunication of first shrink gasbag 805 has the air delivery pipe, the other end of air delivery pipe is linked together with second shrink gasbag 812 after passing the second through-hole that casing 801 and installation cover 808 were seted up in proper order, second inner chamber 809 has been seted up to the inside of installation cover 808, one side intercommunication of second inner chamber 809 has the liquid suction pipe, one side intercommunication of second inner chamber 809 has the fluid-discharge tube, the opposite side and the outside collection device of fluid-discharge tube are linked together, all be provided with the check valve on liquid suction pipe and the fluid-discharge tube, draw-in groove has all been seted up to the bottom side of coating nozzle 9, the inside fixedly connected with annular elastic component 810 of draw-in groove 808, the inside of annular elastic component 810 is provided with spherical pole 811, the bottom and the installation cover 811 of spherical pole 811, the bottom of spherical pole 811 is fixedly connected with the installation cover 808.
The implementation mode is specifically as follows: second baffle 804 can stretch arc elasticity gasbag 806 when carrying out the extrusion to first shrink gasbag 805, arc elasticity gasbag 806 is bled the inside of second inner chamber 809 through second connecting pipe 807, make its inside negative pressure state that is, extract the remaining liquid drop of coating nozzle 9 pointed end through the liquid suction pipe again this moment, prevent to carry out coating work to next wafer on the wafer surface of drippage, it is inhomogeneous to lead to wafer surface coating, the yield of product when coating has further been guaranteed.
The adjusting assembly 6 comprises an installation block 601, a first inner cavity 602 is formed in the top side of the interior of the installation block 601, the bottom of the first inner cavity 602 is communicated with a plurality of circular through holes 603, the bottom of the circular through holes 603 is communicated with a first connecting pipe 607, the other end of the first connecting pipe 607 is communicated with the shell 801, a fixed block 604 is fixedly connected to the interior of the circular through holes 603, a tapered hole 608 is formed in the fixed block 604, a corrosion-resistant spring 605 is fixedly connected to the bottom side of the interior of the tapered hole 608, a spherical stop 606 is fixedly connected to the top of the corrosion-resistant spring 605, the spherical stop 606 is slidably connected to the interior of the tapered hole 608, the linear adjusting assembly 7 comprises a U-shaped plate 701, the top of the U-shaped plate 701 is fixedly connected with the installation block 601, a driving motor 702 is fixedly connected to one side of the exterior of the U-shaped plate 701, a screw rod 703 is fixedly connected to an output shaft of the driving motor 702, and the screw rod 703 is rotatably connected to the interior of the U-shaped plate 701, a plurality of thread sleeves 704 are connected to the screw rod 703 in a threaded manner, a connecting rod structure 706 is arranged at the bottom of each thread sleeve 704 through a pin shaft, first through holes are formed in two sides of each thread sleeve 704, a polish rod 705 is connected to the inside of each first through hole in a sliding manner, two ends of each polish rod 705 are respectively fixedly connected with the inner side wall of the U-shaped plate 701, a fixing frame 10 is fixedly sleeved at the top of the electric push rod 5, the top of each fixing frame 10 is fixedly connected with the bottom of the connecting plate 4 through a screw, a liquid storage tank 11 is fixedly connected to one side of the top of the box body 2, a liquid suction pump 12 is arranged on one side of the liquid storage tank 11, the bottom of the liquid suction pump 12 is fixedly connected to the top of the box body 2 through a supporting block, one end of the liquid suction pump 12 is communicated with a liquid inlet pipe 13, the other end of the liquid inlet pipe 13 is communicated with the liquid storage tank 11, the other end of the liquid suction pump 12 is communicated with a liquid outlet pipe 14, the other end of the liquid outlet pipe 14 is communicated with the first inner cavity 602 after passing through a third through hole formed in the box body 2, the bottom side of the interior of the box body 2 is fixedly connected with a rotation driving device, and the top of the rotation driving device is provided with a vacuum bearing platform.
The implementation mode specifically comprises the following steps: the method comprises the steps of placing a wafer to be coated on a vacuum bearing table, fixing the wafer to be coated, moving a coating nozzle 9 to the center of the wafer or moving the wafer to the center of the wafer in a reciprocating mode from the edge of the wafer through an X-axis module, a Y-axis module 3 and an electric push rod 5, extracting a developing solution in a liquid storage tank 11 through a liquid inlet pipe 13 by a liquid extracting pump 12, conveying the developing solution to the inside of an installation block 601 through a liquid outlet pipe 14, filling the developing solution into a first inner cavity 602 at the moment, continuously outputting the developing solution in the first inner cavity 602 after the filling of the inside of the first inner cavity 602 is finished, enabling the liquid pressure in the first inner cavity 602 to be larger than the elastic force of a corrosion-resistant spring 605 at the moment, extruding a spherical block 605 and the corrosion-resistant spring 605, enabling the developing solution to flow into the bottom side of a circular through a conical hole 608, conveying the developing solution into a shell 801 through a first connecting pipe 607, driving a screw rod 703 to drive the rotation of a driving motor 702, enabling a plurality of thread sleeves 704 to enable the liquid outlet to move under the limitation of a connecting rod structure 706, facilitating adjustment of economic positions among a plurality of coating nozzles 9, improving flexibility of a coating device, and further preventing the influence of the quality of the developing solution on the wafer by the phenomenon that the quality of the developing solution is not uniform outlet of the developing solution, and preventing the wafer from being influenced by the phenomenon that the quality of the developing solution output of the first inner cavity 606.
The working principle is as follows: when the device is used, a wafer to be coated is placed on a vacuum bearing table and fixed, then the coating nozzles 9 are moved to the center of the wafer or move back and forth from the edge of the wafer to the center of the wafer through the X-axis module, the Y-axis module 3 and the electric push rod 5, at the moment, the liquid pump 12 pumps the developing solution in the liquid storage tank 11 through the liquid inlet pipe 13 and conveys the developing solution to the inside of the mounting block 601 through the liquid outlet pipe 14, at the moment, the developing solution fills the inside of the first inner cavity 602 firstly, after the inside of the first inner cavity 602 is filled, the developing solution in the inside of the liquid outlet pipe 14 is continuously output, at the moment, the liquid pressure in the inside of the first inner cavity 602 is larger than the elastic force of the corrosion-resistant spring 605, the spherical stopper 606 and the corrosion-resistant spring 605 are extruded, the developing solution flows into the bottom side of the circular through hole 603 through the tapered hole 608 and then is conveyed to the inside of the shell 801 through the first connecting pipe 607, the driving motor 702 drives the screw rod 703 to rotate, under the limitation of the connecting rod structure 706, the plurality of the thread sleeves 704 are moved equidistantly, the positions between the plurality of the coating nozzles 9 are convenient to adjust, and the flexibility of the device is improved;
the developing solution entering the inside of the housing 801 rotates the second baffle 804 under the action of gravity, at this time, the second baffle 804 extrudes the arc-shaped elastic airbag 806, the second baffle 804 rotates and simultaneously stretches the first contracted airbag 805, the first contracted airbag 805 extracts the gas inside the second contracted airbag 812 through the air delivery pipe, meanwhile, the contraction characteristic of the second contracted airbag 812 drives the sliding block 813 to slide inside the mounting cavity, the first baffle 802 moves by utilizing the linkage effect between the sliding block 813 and the first baffle 802, the developing solution can be sprayed out through the coating nozzle 9 to coat the surface of the wafer, simultaneously, the rotation driving device drives the vacuum bearing platform and the wafer to slowly rotate, the developing solution is coated on the whole wafer, after the coating is finished, the switch valve on the first connecting pipe 607 is closed, the second baffle 804 is reset under the action of the arc-shaped elastic airbag 806 and the first contracted airbag 805, the gas in the second contracted airbag is conveyed to the second contracted airbag through the air delivery pipe, the second contracted airbag 812 and the first contracted airbag 805 drive the second baffle 804 to expand, the second baffle 804 can easily generate a liquid drop on the surface of the wafer, and the wafer, the wafer is prevented from being easily dropped on the bottom of the coating nozzle 808, and the wafer by the coating nozzle 808, and the bottom of the wafer;
the arc-shaped elastic air bag 806 can be stretched while the second baffle 804 extrudes the first contraction air bag 805, the arc-shaped elastic air bag 806 exhausts the inside of the second inner cavity 809 through the second connecting pipe 807, so that the inside of the second inner cavity 809 is in a negative pressure state, the residual liquid drops at the tip of the coating nozzle 9 are extracted through the liquid extracting pipe at the moment, and the phenomenon that the liquid drops on the surface of the wafer when the next wafer is coated is avoided, so that the use is convenient.
The above description is only for the preferred embodiment of the present invention, but the scope of the present invention is not limited thereto, and any person skilled in the art should be considered to be within the technical scope of the present invention, and the technical solutions and the inventive concepts thereof according to the present invention should be equivalent or changed within the scope of the present invention.
Claims (10)
1. The surface treatment development automatic coating system comprises a base (1) and is characterized in that a box body (2) is fixedly connected to the top of the base (1), an X-axis module is fixedly connected to the top side of the inside of the box body (2), a Y-axis module (3) is arranged at the bottom of the X-axis module, a connecting plate (4) is arranged below the Y-axis module (3), an electric push rod (5) is arranged at the bottom of the connecting plate (4), an adjusting assembly (6) is arranged at the bottom end of the electric push rod (5), a linear adjusting assembly (7) is arranged below the adjusting assembly (6), a plurality of anti-leakage assemblies (8) are arranged on one side of the linear adjusting assembly (7), and a coating nozzle (9) is arranged at the bottom of the anti-leakage assemblies (8);
antiseep subassembly (8) include casing (801), the equal fixedly connected with fixing base (803) in inside both sides of casing (801), fixing base (803) are connected with second baffle (804) through the round pin axle rotation, the first shrink gasbag (805) of top fixedly connected with of second baffle (804), the bottom fixedly connected with arc elasticity gasbag (806) of second baffle (804), the opposite side of first shrink gasbag (805) and arc elasticity gasbag (806) all with the inside wall fixed connection of casing (801), one side intercommunication of arc elasticity gasbag (806) has second connecting pipe (807), be provided with installation cover (808) after the other end of second connecting pipe (807) passes the first through-hole that casing (801) seted up.
2. The automatic coating system for surface treatment and development as claimed in claim 1, wherein mounting cavities are formed in both sides of the bottom of the mounting sleeve (808), a second shrinkage air bag (812) is fixedly connected to one side of the inside of each mounting cavity, a sliding block (813) is fixedly connected to the other side of the second shrinkage air bag (812), and a first baffle (802) is fixedly connected to one side of the sliding block (813).
3. The automatic coating system for surface treatment and development as claimed in claim 1, wherein one side of the first shrinkage air bag (805) is communicated with an air duct, and the other end of the air duct is communicated with the second shrinkage air bag (812) after sequentially passing through a second through hole formed in the shell (801) and the mounting sleeve (808).
4. The automatic coating system for surface treatment and development as claimed in claim 2, wherein a second inner cavity (809) is formed in the mounting sleeve (808), a liquid suction pipe is communicated with one side of the second inner cavity (809), and a liquid discharge pipe is communicated with one side of the second inner cavity (809).
5. The automatic coating system for surface treatment and development according to claim 1, wherein two sides of the bottom of the coating nozzle (9) are provided with clamping grooves, the bottom sides of the clamping grooves are fixedly connected with annular elastic members (810), the annular elastic members (810) are internally provided with spherical rods (811), and the bottom ends of the spherical rods (811) are fixedly connected with mounting sleeves (808).
6. The automatic coating system for surface treatment, development and automatic coating of claim 1, wherein the adjusting assembly (6) comprises a mounting block (601), a first inner cavity (602) is formed in the top side of the interior of the mounting block (601), a plurality of circular through holes (603) are communicated with the bottom of the first inner cavity (602), a first connecting pipe (607) is communicated with the bottom of the circular through holes (603), and the other end of the first connecting pipe (607) is communicated with the shell (801).
7. The automatic coating system for surface treatment and development according to claim 6, wherein a fixing block (604) is fixedly connected to the inside of the circular through hole (603), a tapered hole (608) is formed in the fixing block (604), a corrosion resistant spring (605) is fixedly connected to the bottom side of the inside of the tapered hole (608), a ball block (606) is fixedly connected to the top of the corrosion resistant spring (605), and the ball block (606) is slidably connected to the inside of the tapered hole (608).
8. The automatic coating system for surface treatment and development of claim 1, wherein the linear adjusting assembly (7) comprises a U-shaped plate (701), the top of the U-shaped plate (701) is fixedly connected with a mounting block (601), a driving motor (702) is fixedly connected to one side of the outer part of the U-shaped plate (701), a screw rod (703) is fixedly connected to an output shaft of the driving motor (702), and the screw rod (703) is rotatably connected to the inner part of the U-shaped plate (701).
9. The automatic coating system for surface treatment and development according to claim 8, wherein a plurality of thread sleeves (704) are connected to the screw rod (703) in a threaded manner, a connecting rod structure (706) is arranged at the bottom of each thread sleeve (704) through a pin shaft, first through holes are formed in both sides of each thread sleeve (704), a polish rod (705) is connected to the inside of each first through hole in a sliding manner, and both ends of each polish rod (705) are fixedly connected to the inner side wall of the U-shaped plate (701).
10. The automatic coating system for surface treatment and development according to claim 1, wherein a fixing frame (10) is fixedly sleeved on the top of the electric push rod (5), the top of the fixing frame (10) is fixedly connected with the bottom of the connecting plate (4) through a screw, a liquid storage tank (11) is fixedly connected to one side of the top of the box body (2), an infusion pump (12) is arranged on one side of the liquid storage tank (11), one end of the infusion pump (12) is communicated with a liquid inlet pipe (13), the other end of the liquid inlet pipe (13) is communicated with the liquid storage tank (11), the other end of the infusion pump (12) is communicated with a liquid outlet pipe (14), and the other end of the liquid outlet pipe (14) is communicated with the first inner cavity (602) after passing through a third through hole formed in the box body (2).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210977931.1A CN115365023A (en) | 2022-08-15 | 2022-08-15 | Automatic coating system for surface treatment and development |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210977931.1A CN115365023A (en) | 2022-08-15 | 2022-08-15 | Automatic coating system for surface treatment and development |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN115365023A true CN115365023A (en) | 2022-11-22 |
Family
ID=84066577
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202210977931.1A Pending CN115365023A (en) | 2022-08-15 | 2022-08-15 | Automatic coating system for surface treatment and development |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN115365023A (en) |
Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1582202A (en) * | 2001-12-11 | 2005-02-16 | 住友精密工业株式会社 | Nozzle device and substrate treating apparatus having using the device |
| KR20180007193A (en) * | 2016-07-12 | 2018-01-22 | 두산중공업 주식회사 | Heat transfer tube for condensor coating system |
| CN108514973A (en) * | 2018-05-15 | 2018-09-11 | 苏州默声熙达设备科技有限公司 | A kind of novel spraying device |
| CN210377027U (en) * | 2019-07-24 | 2020-04-21 | 黄山博蓝特半导体科技有限公司 | Nozzle structure of developing machine |
| CN112427194A (en) * | 2020-11-18 | 2021-03-02 | 王庭宣 | Metal tube spraying device based on reciprocating turnover mechanism |
| CN112445085A (en) * | 2019-08-29 | 2021-03-05 | 长鑫存储技术有限公司 | Developing nozzle device, developing apparatus and cleaning method of developing solution nozzle |
| CN213612056U (en) * | 2020-07-23 | 2021-07-06 | 重庆长安汽车股份有限公司 | Self-flow-proof washer nozzle |
| CN114211599A (en) * | 2021-12-22 | 2022-03-22 | 绍兴高新技术产业开发区迪荡新城投资发展有限公司 | High accuracy aerated concrete stripping and slicing apparatus for producing |
| CN114779583A (en) * | 2022-03-09 | 2022-07-22 | 扬州思普尔科技有限公司 | High-efficient location semiconductor wafer processing is with developing device |
| CN114769043A (en) * | 2022-05-06 | 2022-07-22 | 深圳市鑫诺诚科技有限公司 | Hot melt adhesive machine |
-
2022
- 2022-08-15 CN CN202210977931.1A patent/CN115365023A/en active Pending
Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1582202A (en) * | 2001-12-11 | 2005-02-16 | 住友精密工业株式会社 | Nozzle device and substrate treating apparatus having using the device |
| KR20180007193A (en) * | 2016-07-12 | 2018-01-22 | 두산중공업 주식회사 | Heat transfer tube for condensor coating system |
| CN108514973A (en) * | 2018-05-15 | 2018-09-11 | 苏州默声熙达设备科技有限公司 | A kind of novel spraying device |
| CN210377027U (en) * | 2019-07-24 | 2020-04-21 | 黄山博蓝特半导体科技有限公司 | Nozzle structure of developing machine |
| CN112445085A (en) * | 2019-08-29 | 2021-03-05 | 长鑫存储技术有限公司 | Developing nozzle device, developing apparatus and cleaning method of developing solution nozzle |
| CN213612056U (en) * | 2020-07-23 | 2021-07-06 | 重庆长安汽车股份有限公司 | Self-flow-proof washer nozzle |
| CN112427194A (en) * | 2020-11-18 | 2021-03-02 | 王庭宣 | Metal tube spraying device based on reciprocating turnover mechanism |
| CN114211599A (en) * | 2021-12-22 | 2022-03-22 | 绍兴高新技术产业开发区迪荡新城投资发展有限公司 | High accuracy aerated concrete stripping and slicing apparatus for producing |
| CN114779583A (en) * | 2022-03-09 | 2022-07-22 | 扬州思普尔科技有限公司 | High-efficient location semiconductor wafer processing is with developing device |
| CN114769043A (en) * | 2022-05-06 | 2022-07-22 | 深圳市鑫诺诚科技有限公司 | Hot melt adhesive machine |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN209045505U (en) | Wet processing apparatus | |
| CN208563904U (en) | A kind of spraying apparatus for construction coating | |
| CN115365023A (en) | Automatic coating system for surface treatment and development | |
| CN107728430B (en) | High purity dispensing unit | |
| CN116099684A (en) | Energy-saving spraying equipment and spraying method thereof | |
| JP2004068773A (en) | Coating supply syringe pump | |
| CN107471400A (en) | A kind of terrine handicraft machine table with positioning and cleaning function | |
| CN111719261B (en) | Chemical fiber cotton static-removing device | |
| CN107899895A (en) | Glue evacuation and centrifugal degassing device is used in electronics processing | |
| CN108843627A (en) | A kind of blower fan apparatus that can be cleaned automatically | |
| KR20190024669A (en) | Pumping device, treatment liquid supply device and substrate treating device | |
| CN209027244U (en) | Bottle water removal device | |
| CN107299401A (en) | Film spinning equipment and micro Nano material preparation method | |
| CN218742655U (en) | Quantitative oil coating and mistake proofing device for finished bearing | |
| CN113031311A (en) | Cleaning instrument for orthokeratology mirror | |
| CN208554685U (en) | A kind of conveying-type mist of oil automatic spraying machine | |
| CN112191416A (en) | Spraying device for automobile parts and application method thereof | |
| CN109332036A (en) | A kind of automatic wet-type coating machine | |
| CN116092986B (en) | High-precision wafer chemical liquid etching device | |
| CN214234568U (en) | Integrated circuit surface coating device | |
| CN204637607U (en) | Flexible spray gun and comprise the spray drying tower of this flexible spray gun | |
| CN115401620B (en) | Inner wall rust removing equipment for circular inner cavity mechanical parts | |
| CN113634142B (en) | Production device and production process of crystal silicon surface texturing agent | |
| CN115415096A (en) | Glue spreading developing machine with smooth glue spreading function | |
| CN217188594U (en) | Plastic spraying air circulation device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination |