CN115356263A - Device for efficiently detecting damage of quartz glass processing subsurface - Google Patents
Device for efficiently detecting damage of quartz glass processing subsurface Download PDFInfo
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- CN115356263A CN115356263A CN202210968908.6A CN202210968908A CN115356263A CN 115356263 A CN115356263 A CN 115356263A CN 202210968908 A CN202210968908 A CN 202210968908A CN 115356263 A CN115356263 A CN 115356263A
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 67
- 238000012545 processing Methods 0.000 title claims abstract description 29
- 238000001514 detection method Methods 0.000 claims abstract description 59
- 238000006073 displacement reaction Methods 0.000 claims abstract description 26
- 238000003384 imaging method Methods 0.000 claims abstract description 23
- 230000031700 light absorption Effects 0.000 claims abstract description 14
- 230000010287 polarization Effects 0.000 claims description 15
- 238000000034 method Methods 0.000 claims description 8
- 230000026676 system process Effects 0.000 claims description 3
- 238000006243 chemical reaction Methods 0.000 claims 1
- 238000010521 absorption reaction Methods 0.000 abstract 1
- 230000003287 optical effect Effects 0.000 abstract 1
- 230000000149 penetrating effect Effects 0.000 abstract 1
- 230000001066 destructive effect Effects 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 3
- 238000009659 non-destructive testing Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 230000028161 membrane depolarization Effects 0.000 description 1
- 238000012014 optical coherence tomography Methods 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 238000000790 scattering method Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000000204 total internal reflection microscopy Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/958—Inspecting transparent materials or objects, e.g. windscreens
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- General Physics & Mathematics (AREA)
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- Investigating Or Analysing Materials By Optical Means (AREA)
Abstract
The invention discloses a device for efficiently detecting quartz glass processing subsurface damage, which comprises a laser, a beam expander, a polaroid, a polarizing beam splitter, an optical absorption sheet, a displacement platform, an imaging lens, a photoelectric detector, a dark field box and a signal processing system, wherein the beam expander is arranged on the laser; the beam expander is arranged between the laser and the polaroid, and the dark field box covers the laser, the beam expander, the polaroid, the polarizing beam splitter, the displacement platform, the imaging lens and the photoelectric detector; the light absorption piece is placed on the displacement platform and located below the quartz glass, and absorbs detection light penetrating through the quartz glass. According to the invention, the beam expander is used for expanding the light spot of the detection light beam, so that the detection efficiency is greatly improved, and the efficient detection of the damage of the sub-surface of the quartz glass processing is realized. The invention uses the light absorption sheet to avoid the detection light beam from transmitting through the quartz glass and scattering with the lower direction displacement platform to influence the detection result, thereby reducing the detection error.
Description
Technical Field
The invention relates to the field of nondestructive detection of quartz glass processing subsurface damage, in particular to a device for efficiently detecting quartz glass processing subsurface damage.
Background
The quartz glass has excellent physical and chemical properties, and is widely applied to high-energy lasers, semiconductors, optical fibers, chemical industries, special light sources, photovoltaic industries and the like. Grinding is an important step in the processing of quartz glass. However, due to the hard and brittle nature of quartz glass, machined sub-surface damage can occur to the ground workpiece. The detection of the damage of the machined subsurface is very important for optimizing the machining process.
The current method for detecting the damage of the machined subsurface of the quartz glass is mainly divided into destructive detection and nondestructive detection. The destructive detection technology is to partially or completely destroy the material, so that the subsurface damage information is exposed and then the microscopic observation is carried out, thereby obtaining the subsurface damage information. The destructive detection method is greatly influenced by experimental conditions and experience of operators, and the in-situ detection integration is difficult to realize due to the lack of standards or specifications of destructive detection modes of quartz glass at home and abroad at present, so that the overall production efficiency is reduced.
The nondestructive testing technology does not damage the testing sample, and realizes the sub-surface damage testing by means of scientific principles such as optics, electricity and the like. The quartz glass subsurface damage nondestructive testing can realize on-site testing, has high efficiency, can provide guidance for the optimization of the processing technology, and can greatly reduce the whole production cycle and improve the productivity and the benefit, so the nondestructive testing is the future development direction of the quartz glass processing subsurface damage testing. The prior quartz glass subsurface nondestructive detection method mainly comprises a polarized laser scattering method, an optical coherence tomography method, a laser scattering confocal method, a total internal reflection microscopy, a scanning ultrasonic detection method SAM and the like. The polarized laser detection method effectively eliminates the influence of the roughness of the processed surface by utilizing the characteristics that the polarization state of surface scattered light is consistent with that of incident laser and the polarization state of sub-surface damage scattered light is different from that of incident light. Therefore, the polarized laser scattering detection method has wide application prospect in the detection of the quartz glass subsurface damage.
The prior polarization laser detection device can realize the subsurface damage detection of semiconductor materials such as silicon wafers and the like. However, since the transmittance of the silica glass is high, it is difficult to use the conventional polarization laser detection device for the detection of the damage to the sub-surface of the silica glass processing. Meanwhile, the existing polarized laser detection device scans the subsurface damage by using a focused light beam, has long detection time and is difficult to realize the high-efficiency detection of the quartz glass processing subsurface damage.
Disclosure of Invention
In order to solve the problems in the prior art, the invention aims to design a device for efficiently detecting the damage of the sub-surface of the quartz glass processing, which can realize detection by adopting polarized laser and quick scanning.
In order to achieve the purpose, the technical scheme of the invention is as follows: a device for efficiently detecting quartz glass processing sub-surface damage comprises a laser, a beam expander, a polarizing film, a polarizing beam splitter, a light absorbing film, a displacement platform, an imaging lens, a photoelectric detector, a dark field box and a signal processing system;
the laser provides detection light;
the beam expander is placed in front of the laser to expand emergent light beams of the laser into expanded light beams;
the polaroid is placed in front of the beam expander, so that emergent light of the beam expander is changed into linearly polarized light, namely detection light beams;
the polarization spectroscope is arranged in front of the polaroid and reflects the detection light beam to the surface of the quartz glass to be detected; meanwhile, linearly polarized light which is scattered by the quartz glass subsurface damage and changes the original polarization state, namely emergent linearly polarized light, is separated;
the imaging lens is positioned above the polarizing beam splitter; converging the emergent linearly polarized light;
the photoelectric detector is positioned above the imaging lens and receives an emergent linearly polarized light signal;
the dark field box covers the laser, the beam expander, the polaroid, the polarization spectroscope, the displacement platform, the imaging lens and the photoelectric detector;
the signal processing system processes the photoelectric signal to obtain quartz glass subsurface damage information, and comprises a data acquisition card, a computer and a motion controller;
the data acquisition card receives an output signal of the photoelectric detector;
the computer analyzes and processes the signals acquired by the data acquisition card;
the motion controller receives the instruction of the computer and controls the motion of the displacement platform;
the light absorption sheet is arranged on the displacement platform and positioned below the quartz glass, and is used for absorbing the detection light which penetrates through the quartz glass;
the displacement platform drives the quartz glass and the light absorption sheet to change positions.
Furthermore, the laser, the beam expander, the polaroid, the polarizing beam splitter, the imaging lens and the photoelectric detector are all fixed on the support.
Furthermore, the centers of the laser, the beam expander, the polaroid and the polarizing beam splitter are all positioned on the same horizontal line; the centers of the imaging lens and the polarizing beam splitter are both positioned on the same vertical line.
Compared with the prior art, the invention has the following beneficial effects:
1. according to the invention, the beam expander is used, the light spot of the detection light beam is enlarged, the detection efficiency is greatly improved, and the efficient detection of the quartz glass subsurface damage is realized.
2. The invention uses the light absorption sheet to avoid the detection light beam from transmitting through the quartz glass and scattering with the lower direction displacement platform to influence the detection result, thereby reducing the detection error.
Drawings
Fig. 1 shows a schematic structural view of the present invention.
FIG. 2 is a graph showing scattering signals of sub-surface damage in quartz glass processing.
FIG. 3 is a schematic diagram of a scanning inspection path according to the present invention.
In the figure: 1. the device comprises a laser, 2, emergent light, 3, a beam expander, 4, a beam-expanded light beam, 5, a polaroid, 6, a detection light beam, 7, a polarization beam splitter, 8, emergent linear polarized light, 9, an imaging lens, 10, a photoelectric detector, 11, a data acquisition card, 12, a computer, 13, a motion controller, 14, quartz glass, 15, a light absorption sheet, 16, a displacement platform, 17, a dark field box, 18, quartz glass subsurface damage, 19 and a detection path.
Detailed Description
The invention is further described below with reference to the accompanying drawings. As shown in fig. 1-3, a device for efficiently detecting quartz glass processing subsurface damage,
a device for efficiently detecting quartz glass processing subsurface damage comprises a laser 1, a beam expander 3, a polaroid 5, a polarizing beam splitter 7, a light absorption plate 15, a displacement platform 16, an imaging lens 9, a photoelectric detector 10, a dark field box 17 and a signal processing system;
the laser 1 provides a detection light source;
the beam expander 3 is arranged in front of the laser 1 and expands the light beam of the emergent light 2 of the laser 1 into a post-expanded light beam 4;
the polaroid 5 is placed in front of the beam expander 3, so that emergent light 2 of the beam expander 3 is changed into linearly polarized light, namely a detection light beam 6;
the polarizing beam splitter 7 is arranged in front of the polarizing film 5; the device is used for reflecting the detection light beam 6 to the surface of the quartz glass 14 to be detected, and separating linearly polarized light which is scattered by the quartz glass subsurface damage 18 and changes the original polarization state, namely emergent linearly polarized light 8;
the imaging lens 9 is positioned above the polarizing beam splitter 7; linearly polarized light 8 is converged;
the photoelectric detector 10 is positioned above the imaging lens 9 and receives an emergent linearly polarized light 8 signal;
the dark field box 17 covers the laser 1, the beam expander 3, the polaroid 5, the polarizing beam splitter 7, the displacement platform 16, the imaging lens 9 and the photoelectric detector 10;
the signal processing system processes the photoelectric signal to obtain the position information of the quartz glass subsurface damage 18, and comprises a data acquisition card 11, a computer 12 and a motion controller 13;
the data acquisition card 11 receives the output signal of the photoelectric detector 10;
the computer 12 analyzes and processes the signals acquired by the data acquisition card 11;
the motion controller 13 receives the instruction of the computer 12 and controls the motion of the displacement platform 16;
the light absorption sheet 15 is placed on the displacement platform 16 and positioned below the quartz glass 14, and absorbs detection light passing through the quartz glass 14;
the displacement platform 16 drives the quartz glass 14 and the light absorption sheet 15 to change positions.
Furthermore, the laser 1, the beam expander 3, the polarizer 5, the polarization beam splitter 7, the imaging lens 9 and the photoelectric detector 10 are all fixed on the support.
Furthermore, the centers of the laser 1, the beam expander 3, the polarizer 5 and the polarization beam splitter 7 are all located on the same horizontal line; the centers of the imaging lens 9 and the polarizing beam splitter 7 are both positioned on the same vertical line.
The working principle of the invention is as follows:
the invention uses parallel polarized laser beams to detect the damage of the quartz glass processing sub-surface. During detection, emergent light 2 of the laser 1 expands light beams into expanded light beams 4 through the beam expander 3, the expanded light beams are changed into linearly polarized detection light beams 6 through the polaroid 5, the linearly polarized detection light beams are reflected to the quartz glass 14 to be detected through the polarization beam splitter 7, and the detection light beams 6 generate sub-surface damage scattering and transmission on the surface of the quartz glass. Due to scattering depolarization of the quartz glass subsurface damage 18, the polarization state of the outgoing linearly polarized light 8 is changed, and the outgoing linearly polarized light is transmitted when passing through the polarizing beam splitter 5, focused by the imaging lens 9 and received by the photoelectric detector 10. The transmitted light is absorbed by the light absorption sheet 15, so as to prevent the detection light beam 6 from transmitting through the quartz glass 14 and the lower displacement platform 16 to generate scattering to affect the detection signal. The data acquisition card 11 acquires signals of the photoelectric detector 10 and sends the signals to the computer 12 for analysis and processing. The computer 12 controls the displacement platform 16 to move along the X axis and the Y axis in the space through the motion controller 13, so that the detection light beam 6 detects different positions of the quartz glass 14, thereby obtaining the processing subsurface damage position information of the quartz glass 14.
The working method of the invention comprises the following steps:
A. placing the light absorption sheet 15 on a displacement platform 16;
B. placing the quartz glass 14 to be detected on the light absorption sheet 15;
C. starting a laser 1 to emit laser with the wavelength of 300-500nm, namely emergent light 2, changing the laser into a beam-expanded light beam 4 through a beam expander 3, changing the beam into linearly polarized laser, namely a detection light beam 6 through a polaroid, and reflecting the linearly polarized laser to the surface of quartz glass 14 to be detected through a polarization spectroscope 7, wherein the light transmitting the quartz glass 14 is absorbed by a light absorption sheet 15;
D. the emergent linearly polarized light 8 scattered and depolarized by the quartz glass subsurface damage 18 is focused by the polarizing beam splitter 7 and the imaging lens 10 and then received by the photoelectric detector 10;
E. controlling a displacement platform 13 by using a computer 12 to enable linearly polarized laser to irradiate the surface of the quartz glass 14 to be measured; controlling the displacement platform to scan and detect along the X axis and the Y axis according to an S-shaped detection path 19 to complete the detection of the quartz glass 14 to be detected;
F. the computer 12 analyzes and processes the signals detected by the photoelectric detector 10 to obtain the position information of the quartz glass subsurface damage 18.
The present invention is not limited to the embodiment, and any equivalent idea or change within the technical scope of the present disclosure is to be regarded as the protection scope of the present invention.
Claims (3)
1. The utility model provides a device of high-efficient detection quartz glass processing subsurface damage which characterized in that: the device comprises a laser (1), a beam expander (3), a polaroid (5), a polarizing beam splitter (7), a light absorption plate (15), a displacement platform (16), an imaging lens (9), a photoelectric detector (10), a dark field box (17) and a signal processing system;
the laser (1) provides a detection light source;
the beam expander (3) is placed in front of the laser (1) to expand the light beam of the emergent light (2) of the laser (1) into a beam (4) after beam expansion;
the polaroid (5) is placed in front of the beam expander (3) to enable emergent light (2) of the beam expander (3) to be changed into linearly polarized light, namely a detection light beam (6);
the polarizing beam splitter (7) is arranged in front of the polaroid (5); the device is used for reflecting the detection light beam 6 to the surface of quartz glass (14) to be detected, and simultaneously separating linearly polarized light which is scattered by quartz glass subsurface damage (18) and changes the original polarization state, namely emergent linearly polarized light (8);
the imaging lens (9) is positioned above the polarizing beam splitter (7); linearly polarized light 8 is converged;
the photoelectric detector (10) is positioned above the imaging lens (9) and receives an emergent linear polarized light 8 signal;
the dark field box (17) covers the laser (1), the beam expander (3), the polaroid (5), the polarizing beam splitter (7), the displacement platform (16), the imaging lens (9) and the photoelectric detector (10);
the signal processing system processes the photoelectric signal to obtain the position information of the quartz glass subsurface damage (18), and comprises a data acquisition card (11), a computer (12) and a motion controller (13);
the data acquisition card (11) receives an output signal of the photoelectric detector (10);
the computer (12) analyzes and processes the signals acquired by the data acquisition card (11);
the motion controller (13) receives an instruction of the computer (12) and controls the motion of the displacement platform (16);
the light absorbing sheet (15) is arranged on the displacement platform (16) and is positioned below the quartz glass (14) to absorb the detection light transmitted through the quartz glass (14);
the displacement platform (16) drives the quartz glass (14) and the light absorbing sheet (15) to carry out position conversion.
2. The apparatus for efficiently detecting quartz glass processing subsurface damage according to claim 1, wherein: the laser (1), the beam expander (3), the polaroid (5), the polarizing beam splitter (7), the imaging lens (9) and the photoelectric detector (10) are all fixed on the support.
3. The apparatus for efficiently detecting damage to a quartz glass processing subsurface as claimed in claim 1, wherein: the centers of the laser (1), the beam expander (3), the polaroid (5) and the polarizing beam splitter (7) are all positioned on the same horizontal line; the centers of the imaging lens (9) and the polarizing beam splitter (7) are both positioned on the same vertical line.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN202210968908.6A CN115356263A (en) | 2022-08-12 | 2022-08-12 | Device for efficiently detecting damage of quartz glass processing subsurface |
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| Application Number | Priority Date | Filing Date | Title |
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| CN202210968908.6A CN115356263A (en) | 2022-08-12 | 2022-08-12 | Device for efficiently detecting damage of quartz glass processing subsurface |
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| CN115356263A true CN115356263A (en) | 2022-11-18 |
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| CN202210968908.6A Pending CN115356263A (en) | 2022-08-12 | 2022-08-12 | Device for efficiently detecting damage of quartz glass processing subsurface |
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|---|---|---|---|---|
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2022
- 2022-08-12 CN CN202210968908.6A patent/CN115356263A/en active Pending
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