CN115338806A - Subregion vacuum adsorption device - Google Patents

Subregion vacuum adsorption device Download PDF

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Publication number
CN115338806A
CN115338806A CN202211283031.3A CN202211283031A CN115338806A CN 115338806 A CN115338806 A CN 115338806A CN 202211283031 A CN202211283031 A CN 202211283031A CN 115338806 A CN115338806 A CN 115338806A
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CN
China
Prior art keywords
switching plate
hole
platform
vacuum
adsorption
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Pending
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CN202211283031.3A
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Chinese (zh)
Inventor
陈则立
黄阳
罗帅
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Suzhou Keyun Laser Technology Co Ltd
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Suzhou Keyun Laser Technology Co Ltd
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Priority to CN202211283031.3A priority Critical patent/CN115338806A/en
Publication of CN115338806A publication Critical patent/CN115338806A/en
Pending legal-status Critical Current

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B25HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25BTOOLS OR BENCH DEVICES NOT OTHERWISE PROVIDED FOR, FOR FASTENING, CONNECTING, DISENGAGING OR HOLDING
    • B25B11/00Work holders not covered by any preceding group in the subclass, e.g. magnetic work holders, vacuum work holders
    • B25B11/005Vacuum work holders

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Hooks, Suction Cups, And Attachment By Adhesive Means (AREA)

Abstract

The invention discloses a partitioned vacuum adsorption device, and relates to the technical field of product production auxiliary devices. The partition vacuum adsorption device comprises: the platform is provided with a plurality of first through holes which are arranged according to a first preset rule; the vacuum mechanism is communicated with the first through hole; the switching plate is arranged above the platform, a plurality of groups of second through holes which are arranged according to a second preset rule are formed in the switching plate, the switching plate can move relative to the platform to enable the second through holes of different groups to be communicated with the corresponding first through holes to form different adsorption areas, and the different adsorption areas are used for adsorbing products of different models. The invention can achieve the purpose of adsorbing different products through simple switching operation so as to adapt to upgrading iteration of the products.

Description

Subregion vacuum adsorption device
Technical Field
The invention relates to the technical field of auxiliary devices for product production, in particular to a partitioned vacuum adsorption device.
Background
In the production process of PCB, semiconductor, etc., it is generally necessary to fix the product to the operation platform or the transfer platform by vacuum adsorption, etc. to avoid the product from shaking during the operation or movement process. In order to meet the requirements of clients, products are frequently upgraded and iterated, and the styles are various. The existing adsorption device can only be used for a product with a specific specification, and different adsorption devices are required to be used for products with different specifications.
Therefore, how to provide a new adsorption device is a technical problem that needs to be solved by those skilled in the art.
Disclosure of Invention
The invention provides a partitioned vacuum adsorption device, which can achieve the purpose of adsorbing different products through simple switching operation so as to adapt to upgrading iteration of the products.
The invention provides the following scheme:
a zoned vacuum adsorption apparatus comprising:
the platform is provided with a plurality of first through holes which are arranged according to a first preset rule;
the vacuum mechanism is communicated with the first through hole;
the switching plate is arranged above the platform, a plurality of groups of second through holes which are arranged according to a second preset rule are formed in the switching plate, the switching plate can move relative to the platform to enable the second through holes of different groups to be communicated with the corresponding first through holes to form different adsorption areas, and the different adsorption areas are used for adsorbing products of different models.
Optionally, the switching plate is configured to form different adsorption areas which are crossed or not crossed after moving; or the like, or, alternatively,
the switching plate is configured to form different adsorption areas with or without inclusion relationship after moving.
Optionally, the first through holes are uniformly distributed on the platform;
the switching plate is provided with a first adsorption region to an Nth adsorption region with gradually reduced areas;
n groups of second through holes are formed in the switching plate;
the Xth adsorption area comprises X +1 th to Nth adsorption areas, wherein N is a positive integer, and N is not less than 2,X and is any one of 1 to N.
Optionally, the N =4.
Optionally, the partitioned vacuum adsorption device further comprises at least one pressing block, each pressing block is connected with the edge of the platform and arranged above the edge of the switching plate, and a third through hole is formed in at least one pressing block;
the edge of switching the plate outwards extends and forms first journal stirrup, first journal stirrup be located be provided with the third through-hole the below of briquetting, just be provided with the position sign that instructs different adsorption zone on the first journal stirrup, it makes one of them position sign be located after being configured into it by the switching plate then when being removed the adsorption zone that the position sign corresponds forms current work area.
Optionally, at least one said press block is provided on each side edge of said switching plate.
Optionally, a preset distance is provided between the pressing block and the switching plate.
Optionally, the edge of the switching plate extends outwards to form a second support lug, a limiting hole is formed in the second support lug, a limiting pin is arranged on the platform corresponding to the position of the limiting hole, and the limiting pin is arranged in the limiting hole to limit the switching plate to move within a preset range.
Optionally, the vacuum mechanism comprises a mounting plate, a vacuum pipe and a vacuum generator;
the mounting plate is positioned below the platform;
the bottom of the platform is sunken inwards to form a groove, all the first through holes are formed in the groove, the top of the mounting plate extends outwards to form a boss matched with the groove, and at least one fourth through hole is formed in the boss;
one end of the vacuum pipeline is connected with the fourth through hole, and the other end of the vacuum pipeline is connected with the vacuum generator.
Optionally, the vacuum partition adsorption device further comprises an electromagnetic valve disposed on the vacuum pipeline.
Optionally, a fifth through hole is further formed in the platform, a mounting hole is formed in the mounting plate, and the fifth through hole and the mounting hole are used for connecting the platform with the mounting plate after a bolt is inserted in the mounting hole.
Optionally, the edge of the platform is provided with a recessed structure, and a bayonet is arranged at a position on the switching plate corresponding to the recessed structure.
According to the specific embodiment provided by the invention, the invention discloses the following technical effects:
according to the partitioned vacuum adsorption device, the first through holes are formed in the platform, the second through holes are formed in the switching plate, the multiple groups of second through holes are skillfully formed, the arrangement of the second through holes is related to the movement and adsorption areas of the switching plate, and the purpose that the adsorption device adsorbs different products can be achieved through simple switching operation, so that upgrading iteration of the products is adapted.
Further, compared with the prior art, the partition switching can be realized only by using one electromagnetic valve, the cost is saved, the structure is simple, the electromagnetic valve does not need to be closed when switching, only the switching plate needs to be moved, the vacuum leakage does not occur, the adsorption force is improved, the phenomenon that the adsorption force is insufficient to generate and shake when the product is switched is avoided, the operation is simple and convenient, and the efficiency is higher.
Of course, embodiments of the invention need not achieve all of the above-described advantages at the same time.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings needed in the embodiments will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art to obtain other drawings without creative efforts.
FIG. 1 is a schematic structural diagram of a zoned vacuum adsorption apparatus provided in one embodiment of the present invention;
FIG. 2 is a schematic structural diagram of a switching plate of the vacuum partition adsorption apparatus according to an embodiment of the present invention;
FIG. 3 is a schematic view of a first partial structure of a zoned vacuum adsorption apparatus provided in accordance with an embodiment of the present invention;
FIG. 4 is a schematic view of a first partial structure of a switching plate of a vacuum partition adsorption apparatus according to an embodiment of the present invention;
FIG. 5 is a schematic view of a second partial structure of a switching plate of the vacuum partition adsorption apparatus according to one embodiment of the present invention;
FIG. 6 is a schematic view of a partial structure of a stage of a zone vacuum adsorption apparatus according to an embodiment of the present invention;
FIG. 7 is a schematic view of a partial structure of a vacuum mechanism of a zone separation vacuum adsorption apparatus according to an embodiment of the present invention;
FIG. 8 is a schematic structural diagram of a stage of a zone vacuum adsorption apparatus according to an embodiment of the present invention;
fig. 9 is a schematic diagram of a second partial structure of a vacuum suction apparatus with zones according to an embodiment of the present invention.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments that can be derived by one of ordinary skill in the art from the embodiments given herein are intended to be within the scope of the present invention.
It should be noted that the descriptions of the present invention with respect to the directions of "left", "right", "upper", "lower", "top", "bottom", etc. are defined based on the relationship of the orientation or position shown in the drawings, and are only for convenience of describing the present invention and simplifying the description, but do not indicate or imply that the structure described must be constructed and operated in a specific orientation, and therefore, should not be construed as limiting the present invention. In the description of the present invention, "a plurality" means two or more unless specifically defined otherwise.
In the description of the present invention, unless otherwise expressly specified or limited, the terms "mounted," "connected," and "connected" are to be construed broadly, e.g., as meaning a fixed connection, a removable connection, or an integral connection; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meanings of the above terms in the present invention can be understood in specific cases to those skilled in the art.
In view of the above-mentioned technical problems in the background art, the present application provides a partitioned vacuum adsorption device. As shown in fig. 1, with simultaneous reference to fig. 2, the zoned vacuum adsorption apparatus provided herein generally includes a platform 100, a vacuum mechanism, and a switching plate 200. The platform 100 is provided with a plurality of first through holes 110 arranged according to a first preset rule, the shape and size of the first through holes 110 are not limited in the present application, the first through holes 110 can be set according to actual needs, and the first through holes 110 are circular holes only as an example. The vacuum mechanism is in communication with the first through hole 110, and the vacuum mechanism may be an existing mechanism capable of providing a vacuum environment. The switching plate 200 is disposed above the platform 100, a plurality of groups of second through holes 210 arranged according to a second preset rule are disposed on the switching plate 200, and the switching plate 200 is configured to be movable relative to the platform 100 so as to enable the second through holes 210 of different groups to be communicated with the corresponding first through holes 110 to form different adsorption areas, wherein the different adsorption areas are used for adsorbing products of different models, and the sizes of the products of different models are different. The shape and size of the second through hole 210 are not limited in the present application, and may be set according to actual needs, and for example only, the second through hole 210 is a circular hole, and preferably, the shape and size of the second through hole 210 are the same as those of the first through hole 110. The switching plate 200 can move freely on the platform 100, and the moving mode can be manual movement or electric movement by means of other devices, and when the switching plate moves electrically, a moving path corresponding to a product model can be preset, and one-key switching is performed when the switching plate needs to move.
It should be noted that, multiple sets of the second through holes 210 may be independent of each other or may intersect each other.
Above-mentioned subregion vacuum adsorption device sets up first through-hole 110 on platform 100, set up second through-hole 210 on switching plate 200, set up multiunit second through-hole 210 ingeniously, arrange it and switch the removal and the adsorption zone of plate 200 and be correlated with, reach and switch certain group or several groups of second through-hole 210 and first through-hole 110 intercommunication after plate 200 removes, thereby form different adsorption zones, and then can adsorb the product of different models, consequently, can reach the purpose that makes adsorption device adsorb different products through simple switching operation, in order to adapt to the upgrading iteration of product.
Alternatively, in one example of the present application, the switching plate 200 is configured to intersect or not intersect between different suction areas formed after the movement.
Alternatively, in an example of the present application, the switching plate 200 is configured to have a inclusive relationship or a non-inclusive relationship between different adsorption regions formed after the movement.
Specifically, in an example of the present application, the first through holes 110 are uniformly distributed on the platform 100, the switching plate 200 has first to nth absorption regions with gradually decreasing areas, the switching plate 200 has N sets of the second through holes 210, the xth absorption region includes X +1 to nth absorption regions, where N is a positive integer, and N ≧ 2,X is any positive integer from 1 to N. Taking four adsorption areas as an example, the first adsorption area includes second to fourth adsorption areas, the second adsorption area includes third to fourth adsorption areas, and the third adsorption area includes a fourth adsorption area.
Optionally, in one example of the present application, the N =4. The fourth adsorption areas 220 to 250 may gradually diffuse outward from a certain corner, a certain edge, or a center of the switching plate 200. For example only, the fourth adsorption areas 220 to 250 are diffused upward and rightward from the lower left corner of the switching plate 200.
Optionally, in an example of the present application, the number of the four sets of second through holes 210 gradually decreases. To facilitate movement, one set of second vias 210 may be located at the same position as another set of second vias 210 in the containment area.
Taking N =4 as an example, the first suction region 250 is provided with a first group of second through holes 210, the second suction region 240 is provided with a second group of second through holes 210, the third suction region 230 is provided with a third group of second through holes 210, and the fourth suction region 220 is provided with a fourth group of second through holes 210. For example only, in the second adsorption area 240, each of the second set of second through holes 210 is correspondingly located at the right side of one of the first set of second through holes 210; in the third adsorption area 230, each of the third group of second through holes 210 is located on the upper side of one first group of second through holes 210, respectively; in the fourth adsorption area 220, each of the fourth group of second through holes 210 is located at the right side of one third group of second through holes 210 and at the upper side of one second group of second through holes 210, respectively. It is understood that, in this embodiment, the first adsorption area 250 contains all of the first group of second through holes 210, the second adsorption area 240 contains part of the first group of second through holes 210 and all of the second group of second through holes 210, the third adsorption area 230 contains part of the first group of second through holes 210, part of the second group of second through holes 210 and all of the third group of second through holes 210, and the fourth adsorption area 220 contains part of the first group of second through holes 210, part of the second group of second through holes 210, part of the third group of second through holes 210 and all of the fourth group of second through holes 210, so that it is advantageous to form adsorption areas of different sizes.
Preferably, as shown in fig. 3 and 4, in an example of the present application, the partitioned vacuum adsorption device further includes at least one pressing block 300, each pressing block 300 is connected to an edge of the platform 100 and is disposed above an edge of the switching plate 200, and the switching plate 200 is prevented from falling off the platform 100 by the pressing blocks 300 and the switching plate 200 is also prevented from warping.
Further, in order to achieve targeted switching and effective switching, a third through hole 310 is provided on at least one of the pressing blocks 300, and an edge of the switching plate 200 extends outward to form a first lug 260, the first lug 260 is located below the pressing block 300 provided with the third through hole 310, a position mark 261 indicating different adsorption areas is provided on the first lug 260, and the switching plate 200 is configured such that when one of the position marks is located in the third through hole 310 after being moved, the adsorption area corresponding to the position mark forms a current working area. Wherein, the position indicator 261 may be a roman numeral, taking N =4 as an example, the position indicators 261 are 1, 2, 3, and 4, respectively, when 1 is located in the third through hole 310, one group of the second through holes 210 corresponding to the first adsorption area 250 on the switching plate 200 is conducted with the corresponding first through hole 110, and none of the second through holes 210 of the remaining groups is conducted with the first through hole 110, so that the first adsorption area 250 forms a current working area; when the switching plate 200 is moved to position the switching plate 2 in the third through hole 310, one group of second through holes 210 corresponding to the second adsorption area 240 is communicated with the corresponding first through hole 110, and the other groups of second through holes 210 are not communicated with the first through hole 110, so that the second adsorption area 240 forms a current working area; and so on.
Preferably, in one example of the present application, each side edge of the switching plate 200 is provided with at least one pressing piece 300. Further, a press block 300 on one side may be movably connected to the platform 100, so as to facilitate separation of the switching plate 200 from the platform 100 when necessary.
In order to facilitate the movement of the switching plate 200, in a preferred example of the present application, a preset distance is provided between the pressing block 300 and the switching plate 200, where the preset distance may be set according to actual needs, and is only taken as an example, and the preset distance is any one of 0.1 to 10 mm.
Preferably, as shown in fig. 5 and 6, in an example of the present application, an edge of the switching plate 200 extends outward to form a second lug 270, a limiting hole 271 is disposed on the second lug 270, a limiting pin 120 is disposed on the platform 100 at a position corresponding to the limiting hole 271, and the limiting pin 120 is disposed in the limiting hole 271 to limit the switching plate 200 to move within a preset range, so that the switching plate 200 is prevented from shifting greatly in a switching area, and the switching efficiency can be improved to a certain extent.
By way of example only, as shown in fig. 7 and 8, the vacuum mechanism includes a mounting plate 410, a vacuum conduit, and a vacuum generator, the mounting plate 410 being located below the platform 100. The bottom of the platform 100 is recessed inwards to form a groove 140, all the first through holes 110 are formed in the groove 140, the top of the mounting plate 410 extends outwards to form a boss 411 matched with the groove 140, and at least one fourth through hole is formed in the boss 411. One end of the vacuum pipeline is connected with the fourth through hole, and the other end of the vacuum pipeline is connected with the vacuum generator. The tightness between the installation plate 410 and the platform 100 can be ensured by the clamping of the bosses 411 and the grooves 140, so that the vacuum degree can be provided, the adsorption capacity can be improved, and the product is prevented from shaking on the switching plate 200.
Preferably, in an example of the present application, the vacuum partition adsorption apparatus further includes a solenoid valve disposed on the vacuum pipe. Some adsorption equipment that have now adopt a plurality of solenoid valves to control an adsorption zone respectively, when needs switch the product, need open different solenoid valves, this leads to, and solenoid valve is more in quantity on the one hand, and the cost is higher, and control and structure are all comparatively complicated, and on the other hand leaks the vacuum easily when the product switches to lead to the adsorption affinity weak, cause the product to rock. And this application only needs to use a solenoid valve can realize the subregion and switches, practices thrift the cost, and simple structure when switching, need not to close the solenoid valve, only need remove switch plate 200 can, can not leak the vacuum, improved the adsorption affinity, the insufficient production of adsorption affinity rocks when avoiding the product to switch, easy and simple to handle, efficiency is higher.
Optionally, as shown in fig. 9, in an example of the present application, a fifth through hole 150 is further formed in the platform 100, a mounting hole 412 is formed in the mounting plate 410, and the fifth through hole 150 and the mounting hole 412 are used for connecting the platform 100 and the mounting plate 410 after a bolt is inserted through the mounting hole. Of course, it will be appreciated that other means of connecting platform 100 to mounting plate 410, such as a snap fit, may be used.
Preferably, in an example of the present application, a recess 130 is provided at an edge of the platform 100, and a bayonet 280 is provided at a position of the switching plate 200 corresponding to the recess 130. The provision of recessed feature 130 and bayonet 280 facilitates the removal of products from switching plate 200 and also facilitates the placement of products in place.
The technical solutions provided by the present invention are described in detail above, and specific examples are applied in this document to explain the structure and the implementation of the present invention, and the descriptions of the above examples are only used to help understanding the method and the core ideas of the present invention; meanwhile, for a person skilled in the art, according to the idea of the present invention, the specific embodiments and the application range may be changed. In view of the above, the present disclosure should not be construed as limiting the invention.

Claims (12)

1. A zoned vacuum adsorption apparatus, comprising:
the platform is provided with a plurality of first through holes which are arranged according to a first preset rule;
the vacuum mechanism is communicated with the first through hole;
the switching plate is arranged above the platform, a plurality of groups of second through holes which are arranged according to a second preset rule are formed in the switching plate, the switching plate can move relative to the platform to enable the second through holes of different groups to be communicated with the corresponding first through holes to form different adsorption areas, and the different adsorption areas are used for adsorbing products of different models.
2. The zoned vacuum adsorption device of claim 1, wherein the switching plate is configured to intersect or not intersect between different adsorption zones formed after movement; or the like, or a combination thereof,
the switching plate is configured to form different adsorption areas with or without inclusion relationship after moving.
3. The zoned vacuum adsorption device of claim 2, wherein the first through holes are evenly distributed on the platform;
the switching plate is provided with a first adsorption region to an Nth adsorption region with gradually reduced areas;
n groups of second through holes are formed in the switching plate;
the Xth adsorption area comprises X +1 th to Nth adsorption areas, wherein N is a positive integer, and N is not less than 2,X and is any one of 1 to N.
4. The zoned vacuum adsorption device of claim 3, wherein N =4.
5. The zoned vacuum adsorption device of claim 1, further comprising at least one pressing block, wherein each pressing block is connected with the edge of the platform and is arranged above the edge of the switching plate, and a third through hole is formed in at least one pressing block;
the edge of the switching plate extends outwards to form a first supporting lug, the first supporting lug is located and is provided with the third through hole, a position mark indicating different adsorption areas is arranged on the first supporting lug, the switching plate is configured to enable one of the position marks to be located in the third through hole when the switching plate is moved, and the adsorption area corresponding to the position mark forms the current working area.
6. The zoned vacuum adsorption device of claim 5, wherein at least one of the compacts is disposed on each side edge of the switching plate.
7. The zoned vacuum adsorption device of claim 5, wherein the pressure block is a predetermined distance from the switching plate.
8. The apparatus according to claim 1, wherein an edge of the switching plate extends outward to form a second lug, the second lug is provided with a limiting hole, the platform is provided with a limiting pin corresponding to the limiting hole, and the limiting pin is disposed in the limiting hole to limit the switching plate to move within a predetermined range.
9. The zoned vacuum adsorption device of claim 1, wherein the vacuum mechanism comprises a mounting plate, a vacuum conduit, and a vacuum generator;
the mounting plate is positioned below the platform;
the bottom of the platform is sunken inwards to form a groove, all the first through holes are formed in the groove, the top of the mounting plate extends outwards to form a boss matched with the groove, and at least one fourth through hole is formed in the boss;
one end of the vacuum pipeline is connected with the fourth through hole, and the other end of the vacuum pipeline is connected with the vacuum generator.
10. The zoned vacuum adsorption device of claim 9, further comprising a solenoid valve disposed on the vacuum conduit.
11. The zoned vacuum adsorption device of claim 9, wherein the platform further comprises a fifth through hole, the mounting plate comprises a mounting hole, and the fifth through hole and the mounting hole are used for connecting the platform and the mounting plate after a bolt is inserted through the fifth through hole and the mounting hole.
12. The zoned vacuum adsorption device of claim 1, wherein a recessed structure is disposed on an edge of the platform, and a bayonet is disposed on the switching plate at a position corresponding to the recessed structure.
CN202211283031.3A 2022-10-20 2022-10-20 Subregion vacuum adsorption device Pending CN115338806A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202211283031.3A CN115338806A (en) 2022-10-20 2022-10-20 Subregion vacuum adsorption device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202211283031.3A CN115338806A (en) 2022-10-20 2022-10-20 Subregion vacuum adsorption device

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CN112518791A (en) * 2020-10-26 2021-03-19 深圳市腾盛精密装备股份有限公司 Regional adjustment mechanism of vacuum adsorption
CN216830474U (en) * 2021-12-29 2022-06-28 深圳思谋信息科技有限公司 Vacuum jig and testing device
CN115229715A (en) * 2022-09-26 2022-10-25 长春光华微电子设备工程中心有限公司 Thin wafer adsorption disc and adsorption system
CN217687294U (en) * 2022-04-29 2022-10-28 北京兆维科技开发有限公司 Vacuum adsorption carrying platform for visual detection
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Publication number Priority date Publication date Assignee Title
DE29513348U1 (en) * 1995-08-19 1995-10-26 Göckel, Karl, 69254 Malsch Workpiece support table with a vacuum suction device for workpiece fixation
CN101795950A (en) * 2007-09-04 2010-08-04 Nec液晶技术株式会社 Vacuum adsorption control mechanism device, film pasting device, method of pasting film, and display device
US20120018938A1 (en) * 2010-06-25 2012-01-26 Cone Michael Multi-purpose vacuum clamp table
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CN107671440A (en) * 2017-10-18 2018-02-09 青岛理工大学 It is a kind of to automatically adjust absorption platform suitable for the processing of sizes laser light guide plate
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CN115229715A (en) * 2022-09-26 2022-10-25 长春光华微电子设备工程中心有限公司 Thin wafer adsorption disc and adsorption system

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