CN115287659A - Etching liquid medicine regeneration device and regeneration process - Google Patents
Etching liquid medicine regeneration device and regeneration process Download PDFInfo
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- CN115287659A CN115287659A CN202210932867.5A CN202210932867A CN115287659A CN 115287659 A CN115287659 A CN 115287659A CN 202210932867 A CN202210932867 A CN 202210932867A CN 115287659 A CN115287659 A CN 115287659A
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- liquid medicine
- etching
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- 238000005530 etching Methods 0.000 title claims abstract description 86
- 239000007788 liquid Substances 0.000 title claims abstract description 77
- 239000003814 drug Substances 0.000 title claims abstract description 65
- 238000000034 method Methods 0.000 title claims abstract description 26
- 230000008929 regeneration Effects 0.000 title claims abstract description 24
- 238000011069 regeneration method Methods 0.000 title claims abstract description 24
- 238000005507 spraying Methods 0.000 claims abstract description 5
- 238000001914 filtration Methods 0.000 claims abstract description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 12
- 230000001172 regenerating effect Effects 0.000 claims description 5
- 230000010405 clearance mechanism Effects 0.000 claims description 4
- 238000005520 cutting process Methods 0.000 claims description 4
- 239000012535 impurity Substances 0.000 claims description 4
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 abstract description 17
- 229910001431 copper ion Inorganic materials 0.000 abstract description 17
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract description 8
- 239000001301 oxygen Substances 0.000 abstract description 8
- 229910052760 oxygen Inorganic materials 0.000 abstract description 8
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 abstract description 6
- 238000004140 cleaning Methods 0.000 description 12
- 239000007800 oxidant agent Substances 0.000 description 7
- 230000003647 oxidation Effects 0.000 description 7
- 238000007254 oxidation reaction Methods 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- 238000009792 diffusion process Methods 0.000 description 5
- 239000007789 gas Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 230000001590 oxidative effect Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 238000009423 ventilation Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 1
- PTVDYARBVCBHSL-UHFFFAOYSA-N copper;hydrate Chemical compound O.[Cu] PTVDYARBVCBHSL-UHFFFAOYSA-N 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/46—Regeneration of etching compositions
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- ing And Chemical Polishing (AREA)
Abstract
The application relates to an etching liquid medicine regeneration device and a regeneration process, which comprise a box body, a plurality of conveying rollers arranged in the box body and used for conveying a circuit board, a plurality of nozzles used for spraying liquid medicine and a first pump body driving the liquid medicine to flow to the nozzles, wherein the nozzles are respectively arranged on the upper side and the lower side of the conveying rollers, a liquid inlet of the first pump body is communicated with an inner cavity of the box body, and a liquid outlet of the first pump body is respectively communicated with the nozzles; the box body is also provided with an air conveying mechanism for inputting air, the air conveying mechanism comprises an air pump and an air filter for filtering air, an air outlet of the air pump is connected with the air filter, and the other end of the air filter is communicated with the inner cavity of the box body and is lower than the surface of the liquid medicine. Air is filtered and then is introduced into etching liquid medicine, and oxygen in the air is utilized to oxidize the cupric dichloride, so that positive divalent copper ions are formed, and the etching liquid medicine has the capability of etching continuously.
Description
Technical Field
The application relates to the technical field of circuit board processing, in particular to an etching liquid medicine regeneration device and a regeneration process.
Background
The etching liquid is a medicament for etching the surface of the circuit board in the manufacturing process of the printed circuit board so as to form a circuit on the surface of the circuit board. However, after the circuit board is etched by the etching solution, copper ions are mixed into the etching solution, so that the etching solution mixed with a large amount of copper ions cannot be used,
At present, in order to save cost, a large amount of oxidizing agent is generally introduced into used etching liquid medicine, and the oxidizing agent is utilized to convert univalent negative copper ions into bivalent positive copper ions, so that the etching liquid medicine has the etching capacity again.
However, in the process of adding the oxidizing agent, the concentration of the oxidizing agent to be added is high, so that safety accidents are likely to occur in the process of operation.
Therefore, a new technical solution is needed to solve the above problems.
Disclosure of Invention
In order to reduce the adding concentration of an oxidant in the process of recycling the etching liquid medicine, thereby reducing the probability of safety accidents, the application provides an etching liquid medicine regeneration device and a regeneration process.
The application provides an etching solution regenerating unit and regeneration process adopts following technical scheme:
an etching liquid medicine regeneration device and a regeneration process comprise a box body, a plurality of conveying rollers arranged in the box body and used for conveying a circuit board, a plurality of nozzles used for spraying liquid medicine and a first pump body driving the liquid medicine to flow to the nozzles, wherein the nozzles are respectively arranged on the upper side and the lower side of the conveying rollers, a liquid inlet of the first pump body is communicated with an inner cavity of the box body, and a liquid outlet of the first pump body is respectively communicated with the nozzles;
the box body is also provided with an air conveying mechanism for inputting air, the air conveying mechanism comprises an air pump and an air filter for filtering air, an air outlet of the air pump is connected with the air filter, and the other end of the air filter is communicated with the inner cavity of the box body and is lower than the surface of the liquid medicine.
By adopting the technical scheme, air is filtered and then is introduced into the etching liquid medicine, and the cupric dichloride is oxidized by oxygen in the air, so that bivalent and positive copper ions are formed, and the etching liquid medicine continuously has the etching capacity.
Optionally: be provided with the air outlet mechanism who increases air and liquid area of contact in the box, air outlet mechanism rotates a pivoted driving piece including rotating the rotation piece and the drive that set up in box inner chamber, it is the cavity setting to rotate the piece, rotate an outer wall and set up a plurality of air vents rather than the inner chamber intercommunication, air cleaner's gas outlet and rotation piece inner chamber intercommunication.
Through adopting above-mentioned technical scheme, let in the rotation piece at the air and after forming the bubble in etching liquid medicine, the bubble passes in the venthole under the drive of air then, makes the volume of bubble diminish to increase the area of contact of bubble and etching liquid medicine under the certain circumstances of gaseous volume, accelerate the oxidation of the interior negative one valence copper ion of etching liquid medicine.
Optionally: the fixing piece is coaxially arranged in the rotating piece and used for dividing bubbles, the fixing piece is fixed to the box body, a plurality of dividing grooves are formed in the circumferential direction of the outer wall of the fixing piece, the outer wall of the fixing piece is abutted to the inner wall of the rotating piece, and the air outlet of the air filter is communicated with the inner cavity of the fixing piece.
Through adopting above-mentioned technical scheme, when the bubble passes through in cutting apart groove and the air vent, thereby cut apart groove and air vent and cut the volume that reduces single bubble simultaneously to the volume that lets in the air in the etching liquid medicine keeps certain circumstances, increases the area of contact of air and etching liquid medicine, makes the oxidation efficiency of the univalent copper ion of burden in the etching liquid medicine higher.
Optionally: a plurality of guide pipes are arranged on the outer wall of the rotating part in the circumferential direction and communicated with a plurality of vent holes.
Through adopting above-mentioned technical scheme, utilize the stand pipe to keep away from the direction guide of rotation piece with the bubble orientation of smashing to make the diffusion velocity of bubble in the etching liquid medicine faster, improve the oxidation efficiency of the oxygen in the air and the univalent copper ion of burden in the etching liquid medicine.
Optionally: one end of the guide tube, which is far away from the rotating piece, inclines towards the rotating direction which is far away from the rotating piece.
Through adopting above-mentioned technical scheme, at the stand pipe pivoted in-process, etching liquid medicine is difficult to keep away from the opening direction inflow stand pipe that rotates the piece from the stand pipe to make the process that the bubble flows out from the stand pipe be difficult for receiving the influence, make the diffusion of bubble in etching liquid medicine be difficult for receiving the influence.
Optionally: the utility model discloses a water inlet guide device, including stand pipe, guide plate, inlet opening, guide plate, the stand pipe upper end is provided with a plurality of guide plates, the one end that the guide plate was kept away from the guide pipe is faced the direction of rotation slope of guide pipe, the inlet opening has been seted up to the guide pipe upper end, the guide plate is located one side that the inlet opening deviates from the direction of rotation of guide pipe.
Through adopting above-mentioned technical scheme, in the guide inflow guide tube of guide tube pivoted in-process etching liquid medicine process guide plate, the bubble that drives in the guide tube after that keeps away from the one end opening that rotates the piece from the guide tube and keeps away from, makes the bubble in the guide tube change and spreads to etching liquid medicine in, increases the efficiency of oxidation.
Optionally: the lateral wall that the guide plate faced its rotation direction all is provided with the curb plate, the curb plate is kept away from each other and all is fixed with the stand pipe upper end.
Through adopting above-mentioned technical scheme, at the guide plate along steering member pivoted in-process, utilize the curb plate further to guide etching liquid medicine, make etching liquid medicine change and flow in the guide pipe through the inlet opening.
Optionally: still be provided with the clearance mechanism of cleaing away the impurity in the venthole on the mounting, clearance mechanism sets up sliding piece in the mounting, sets up cleaning member on sliding piece, promotes the elastic component that cleaning member inserted the venthole and promotes the driving ring that cleaning member kept away from the venthole, sliding member sets up and cleaning member along sliding member's length direction setting in a parallel with the axis that rotates the piece, sliding member is on a parallel with the diametral slip that rotates the piece, the driving ring coaxial be fixed in rotate on the piece, the inner wall circumference of driving ring is fixed with a plurality of drive blocks, the drive block can remove with sliding member butt and promotion sliding member in proper order.
Through adopting above-mentioned technical scheme, constantly insert and provide downthehole the passing through of air feed at the in-process clearance piece that turns to a pivoted to strike off the copper ion of deposit in the venthole, make the copper ion be difficult for blockking up the air vent inner chamber, thereby make the process that the air passes through from the venthole be difficult for receiving the influence.
An etching solution regeneration process comprises the following steps:
s1, introducing air into etching liquid medicine;
s2, dispersing air bubbles formed by air introduced into the etching liquid medicine;
and S3, introducing hydrochloric acid into the etching liquid medicine injected with air.
By adopting the technical scheme, the oxygen in the air is utilized to oxidize the univalent copper ions, so that the use of high oxidants such as hydrochloric acid is reduced, and the probability of safety accidents in the process of regeneration treatment of etching liquid medicine is reduced.
In summary, the present application includes at least one of the following beneficial technical effects:
1. the filtered air is introduced into the etching liquid medicine, and the oxygen contained in the air is used for oxidizing the univalent negative copper ions in the etching liquid medicine, so that the use of high oxidant in the regeneration treatment of the etching liquid medicine is reduced, and the probability of safety accidents is reduced;
2. after the air lets in the etching liquid medicine and forms the bubble, thereby cut apart the great bubble of volume into the less bubble of volume through cutting the crisscross each other of groove and air vent to the volume at the air has kept the area of contact of air with the etching liquid medicine under certain circumstances, has increased the oxidation efficiency of the monovalent copper ion of burden in the etching liquid medicine.
Drawings
FIG. 1 is a schematic structural diagram of an embodiment of the present application;
FIG. 2 is a schematic view for showing an internal structure of a box according to an embodiment of the present application;
FIG. 3 is a schematic view of the embodiment of the present application showing the engagement relationship between the fixed member and the rotating member;
FIG. 4 is an enlarged view of portion A of FIG. 3;
fig. 5 is a schematic view for showing a structure of a guide tube according to an embodiment of the present application.
In the figure, 1, a box body; 11. a conveying roller; 12. a nozzle; 13. a first pump body; 14. a material through hole; 15. a fixing member; 151. dividing the groove; 2. an air delivery mechanism; 21. an air pump; 22. an air filter; 3. an air outlet mechanism; 31. a rotating member; 311. a vent hole; 32. a drive member; 321. a first gear; 322. a second gear; 33. a guide tube; 331. a water inlet hole; 34. a baffle; 35. a side plate; 4. a cleaning mechanism; 41. a sliding member; 42. cleaning the workpiece; 43. an elastic member; 44. a drive ring; 441. a drive block; 45. a guide rod; 46. a butting block.
Detailed Description
The present application is described in further detail below with reference to the attached drawings.
The application discloses etching liquid medicine regenerating unit, as shown in fig. 1 and 2, including being rectangle and hollow box 1, set up in box 1 a plurality of conveying rollers 11 of carrying the circuit board, a plurality of nozzles 12 that are used for spraying the liquid medicine and drive the first pump body 13 of liquid medicine flow direction nozzle 12. All set up the material through-hole 14 rather than the inner chamber intercommunication on two vertical lateral walls that box 1 kept away from each other, conveying roller 11 rotates and sets up in box 1, and arranges along the line of two material through-holes 14. The conveyor rollers 11 are arranged in two rows, one above the other, the circuit board is arranged to move between the two rows of conveyor rollers 11, and the two rows of conveyor rollers 11 rotate in different directions. The adjacent conveying rollers 11 in the same row are connected through a chain, so that the conveying rollers 11 in the same row can synchronously rotate, two motors which respectively drive the two rows of conveying rollers 11 to rotate are arranged outside the box body 1, and output shafts of the motors are respectively connected with the conveying rollers 11 in different rows through gearboxes. The first pump body 13 is fixed outside the box body 1 by using bolts, a liquid inlet of the first pump body is communicated with an inner cavity of the box body 1 through a pipeline, a liquid outlet of the first pump body is respectively connected with the nozzles 12 through pipelines, the nozzles 12 are respectively arranged on the upper side and the lower side of two rows of conveying rollers 11, and a liquid outlet end of each nozzle 12 faces between the adjacent conveying rollers 11 in the same row.
As shown in fig. 2, the box 1 is further provided with an air delivery mechanism 2 for inputting air into the inner cavity of the box 1, the air delivery mechanism 2 includes an air pump 21 and an air filter 22 for filtering air, the air pump 21 is fixed outside the box 1 by bolts, an air outlet of the air pump is connected with the air filter 22 by a pipeline, an air outlet of the air filter 22 is connected with the box 1 by a pipeline, and a connection position of the air filter 22 and the box 1 is lower than a liquid level of the liquid medicine.
As shown in fig. 2 and 3, when air is introduced into the etching solution, large bubbles are generated in the etching solution, which affects the contact area between the etching solution and air, and affects the reaction efficiency between oxygen and the dicopper dichloride in the etching solution. Therefore, the gas outlet mechanism 3 for scattering bubbles is further arranged in the box body 1, the gas outlet mechanism 3 comprises a rotating part 31 which is rotatably connected to the bottom surface of the inner cavity of the box body 1 and a driving part 32 which drives the rotating part 31 to rotate, the rotating part 31 is arranged in a hollow manner, and a plurality of vent holes 311 communicated with the inner cavity of the rotating part are circumferentially arranged on the side wall of the rotating part 31. In this embodiment, the driving member 32 is a servo motor fixed on the bottom surface of the box 1 by bolts, an output shaft of the servo motor penetrates through the bottom surface of the box 1 and is coaxially fixed with a first gear 321, a lower end of the rotating member 31 is coaxially fixed with a second gear 322, the first gear 321 is engaged with the second gear 322, and an oil seal for reducing leakage is disposed between the output shaft of the servo motor and the box 1.
As shown in fig. 3 and 4, the bottom wall of the inner cavity of the box 1 is further fixed with a hollow fixing member 15 by bolts, the fixing member 15 is provided with an upper opening, the rotating member 31 is sleeved outside the fixing member 15, and bearings are arranged between the inner wall of the rotating member 31 and the fixing member 15 and are respectively arranged at the upper end and the lower end of the fixing member 15. The outer wall of the fixed member 15 is circumferentially provided with a plurality of dividing grooves 151, and the dividing grooves 151 are parallel to the axis of the rotating member 31. The air outlet end of the air filter 22 is communicated with the inner cavity of the fixed member 15 through a pipeline, so that air is mixed with the etching solution to form air bubbles when the air enters the fixed member 15, then the air bubbles continuously flow into the fixed member 15 to flow out of the rotating member 31 along the air vent holes 311 and the dividing grooves 151, the air bubbles are divided when the air bubbles pass through the dividing grooves 151 and the air vent holes 311 so as to reduce the volume, and then the contact area between the etching solution and the air is increased when the air bubbles enter the etching solution, so that the oxidation of the cupric dichloride in the etching solution is accelerated.
As shown in fig. 5, in order to make the diffusion range of the bubbles wider, a plurality of guide pipes 33 horizontally arranged are circumferentially arranged on the outer wall of the rotating member 31, one end of each guide pipe 33 is fixed to the outer wall of the rotating frame member, the vent holes 311 are respectively located in the openings of the guide pipes 33, one end of each guide pipe 33 far away from the rotating member 31 deviates from the rotating direction of the rotating member 31, so that the bubbles can move towards the axis direction far away from the rotating member 31 in the rotating process of the rotating member 31, and the bubbles can be diffused more rapidly in the etching solution.
As shown in fig. 5, to further increase the diffusion efficiency of the bubbles, the upper ends of the guide tubes 33 are provided with guide plates 34 for guiding the flow of the etching solution, the upper ends of the guide tubes 33 are provided with water inlet holes 331 communicated with the inner cavities thereof, and the guide plates 34 are disposed on the sides of the water inlet holes 331 away from the rotation direction. The end of the deflector 34 remote from the guide tube 33 is inclined toward the direction of rotation of the guide tube 33. The two side walls of the guide plate 34 parallel to the rotation direction are fixed with side plates 35, and the two side walls are far away from each other and fixed with the upper end surface of the guide pipe 33. Thereby when rotating piece 31 and driving stand pipe 33 and rotate, guide plate 34 drives etching liquid medicine and gets into in the stand pipe 33, and the etching liquid medicine that gets into in the stand pipe 33 drives the bubble and flows along the direction of rotating piece 31 is kept away from to stand pipe 33 after that to make the bubble be liable to etching liquid medicine internal diffusion.
As shown in fig. 4, since copper ions are deposited to affect the flow of the etching solution from the air outlet, the fixing element 15 is further provided with a cleaning mechanism 4 for removing impurities in the air outlet, the cleaning mechanism 4 includes a sliding element 41 slidably disposed in the fixing element 15, a plurality of cleaning elements 42 disposed on the sliding element 41, an elastic element 43 for pushing the cleaning element 42 to be inserted into the air outlet, and a driving ring 44 for pushing the cleaning element 42 to be away from the air outlet. The fixing part 15 inner chamber is fixed with two and is the both ends that the guide rod 45 of level setting is close to fixing part 15 respectively, thereby two guide rods 45 wear to locate the slip of the both ends guide sliding part 41 of sliding part 41 respectively. The guide rod 45 is screwed with the abutting block 46 at one end close to the rotation axis of the rotating member 31, the elastic member 43 is a spring in this embodiment, the spring is sleeved on the guide rod 45, one end of the spring abuts against the side wall of the sliding member 41 far away from the ventilation hole 311, the other end of the spring abuts against one end of the abutting block 46 close to the sliding member 41, and therefore the sliding member 41 is pushed to move towards the ventilation hole 311. Clearance piece 42 sets up in the one side that slide 41 is close to air vent 311, the upper and lower both ends of clearance piece 42 respectively with the upper and lower both sides wall butt of air vent 311, and clearance piece 42 is and leaves the clearance between the inner wall in two vertical lateral walls and clearance hole, and a plurality of clearance pieces 42 can insert simultaneously in the air vent 311 to the messenger clears away sedimentary copper ion. The driving ring 44 is coaxially fixed in the inner cavity of the rotating member, a plurality of driving blocks 441 are circumferentially fixed on the inner wall of the driving ring 44, and the driving blocks 441 and the vent holes 311 are arranged in a staggered manner. The two side walls of the driving block 441 facing to and away from the rotation direction are both obliquely arranged, one ends of the two oblique side walls close to the axis of the driving ring 44 are close to each other, and the driving block 441 can be sequentially abutted against the end part of the sliding rod. Therefore, the cleaning piece 42 is inserted into the vent hole 311 in sequence in the rotating process of the rotating piece, so that the copper ion deposition in the vent hole 311 is cleaned, and the process that air bubbles pass through the vent hole 311 is not influenced easily.
The implementation principle of the embodiment is as follows: the air pump 21 introduces the filtered air into the fixed member 15 to form bubbles in the fixed member 15, then the bubbles pass through the vent holes 311 and the dividing grooves 151 under the pushing of the air, the bubbles are reduced through the dividing grooves 151 and the vent holes 311, the etching liquid medicine enters the water guide pipe under the guiding of the guide plate 34 in the rotating process of the rotating member 31, so that the bubbles are driven to move towards the direction far away from the rotating member 31 along one end of the water guide pipe far away from the rotating member 31, the bubbles are diffused in the etching liquid medicine, and then the oxidation of the cupric dichloride is accelerated by the oxygen in the air.
An etching solution regeneration process comprises the following steps:
s1, introducing air into etching liquid medicine;
wherein impurities such as dust in the air are filtered through the air filter 22 before the air is introduced into the etching chemical.
S2, dispersing air bubbles formed by air introduced into the etching liquid medicine;
wherein, after the filtered air is introduced into the fixing member 15, bubbles are formed in the etching solution, and then the bubbles pass through the vent holes 311 and the cutting grooves under the driving of the subsequently introduced air and are scattered;
s3, introducing hydrochloric acid into the etching liquid medicine injected with air;
wherein, after the hydrochloric acid is introduced into the etching liquid medicine, the hydrochloric acid, the oxygen and the cupric dichloride react to generate copper chloride and water, so that the etching liquid medicine has the etching effect continuously.
The embodiments of the present invention are preferred embodiments of the present application, and the scope of protection of the present application is not limited by the embodiments, so: equivalent changes in structure, shape and principle of the present application shall be covered by the protection scope of the present application.
Claims (9)
1. An etching liquid medicine regenerating unit which is characterized in that: the automatic spraying device comprises a box body (1), a plurality of conveying rollers (11) arranged in the box body (1) and used for conveying a circuit board, a plurality of nozzles (12) used for spraying liquid medicine and a first pump body (13) driving the liquid medicine to flow to the nozzles (12), wherein the nozzles (12) are respectively arranged on the upper side and the lower side of the conveying rollers (11), a liquid inlet of the first pump body (13) is communicated with an inner cavity of the box body (1), and a liquid outlet of the first pump body (13) is respectively communicated with the nozzles (12);
the air filter is characterized in that an air conveying mechanism (2) for inputting air is further arranged on the box body (1), the air conveying mechanism (2) comprises an air pump (21) and an air filter (22) for filtering air, an air outlet of the air pump (21) is connected with the air filter (22), and the other end of the air filter (22) is communicated with an inner cavity of the box body (1) and is lower than the surface of the liquid medicine.
2. The etching solution regeneration device according to claim 1, wherein: be provided with in box (1) and increase air and liquid area of contact's air outlet mechanism (3), air outlet mechanism (3) are including rotating rotation piece (31) and the drive rotation piece (31) pivoted driving piece (32) that sets up in box (1) inner chamber, it is the cavity setting to rotate piece (31), rotate piece (31) outer wall and offer a plurality of air vents (311) rather than the inner chamber intercommunication, the gas outlet and the rotation piece (31) inner chamber intercommunication of air cleaner (22).
3. The etching solution regeneration device according to claim 2, wherein: the utility model discloses an air filter, including rotate piece (31), fixing piece (15) of cutting apart the bubble are provided with to the axle in the piece (31), fixing piece (15) and box (1) fixing piece (15), fixing piece (15) outer wall circumference is provided with a plurality of cut apart grooves (151), the outer wall of fixing piece (15) and the inner wall butt of rotating piece (31), the gas outlet and the fixing piece (15) inner chamber intercommunication of air cleaner (22).
4. The etching solution regeneration device according to claim 2, wherein: a plurality of guide pipes (33) are arranged on the outer wall of the rotating piece (31) in the circumferential direction, and the guide pipes (33) are communicated with the plurality of vent holes (31).
5. The etching solution regeneration device according to claim 4, wherein: one end of the guide tube (33) far away from the rotating piece (31) inclines towards the rotating direction far away from the rotating piece (31).
6. The etching solution regeneration device according to claim 4, wherein: the utility model discloses a guide pipe, including stand pipe (33), guide pipe (33) upper end is provided with a plurality of guide plates (34), the one end that guide plate (34) kept away from guide pipe (33) is met to the direction of rotation slope of guide pipe (33), inlet opening (331) have been seted up to guide pipe (33) upper end, guide plate (34) are located one side that inlet opening (331) deviate from the direction of rotation of guide pipe (33).
7. The etching solution regeneration device according to claim 6, wherein: guide plate (34) meet all are provided with curb plate (35) to its direction of rotation's lateral wall, curb plate (35) keep away from each other and all are fixed with stand pipe (33) upper end.
8. The etching solution regeneration device according to claim 3, wherein: still be provided with clearance mechanism (4) of cleaing away the impurity in the venthole on mounting (15), clearance mechanism (4) including slide set up slide (41) in mounting (15), set up clearance piece (42) on slide (41), promote elastic component (43) that clearance piece (42) inserted the venthole and promote driving ring (44) that clearance piece (42) kept away from the venthole, slide (41) are on a parallel with the axis setting of rotating piece (31) and clearance piece (42) set up along the length direction of slide (41), slide (41) are on a parallel with the radial slide of rotating piece (31), driving ring (44) coaxial be fixed in on rotating piece (31), the inner wall circumference of driving ring (44) is fixed with a plurality of drive blocks (441), drive block (441) can in proper order with slide (41) butt and promote slide (41) and remove.
9. A process for regenerating an etching solution, using the apparatus for regenerating an etching solution according to any one of claims 1 to 8, wherein: the method comprises the following steps:
s1, introducing air into etching liquid medicine;
s2, dispersing air bubbles formed by air introduced into the etching liquid medicine;
and S3, introducing hydrochloric acid into the etching liquid medicine injected with air.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210932867.5A CN115287659B (en) | 2022-08-04 | 2022-08-04 | Etching liquid regeneration device and regeneration process |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210932867.5A CN115287659B (en) | 2022-08-04 | 2022-08-04 | Etching liquid regeneration device and regeneration process |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN115287659A true CN115287659A (en) | 2022-11-04 |
| CN115287659B CN115287659B (en) | 2024-03-29 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202210932867.5A Active CN115287659B (en) | 2022-08-04 | 2022-08-04 | Etching liquid regeneration device and regeneration process |
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|---|---|---|---|---|
| GB964665A (en) * | 1963-07-10 | 1964-07-22 | Siemens Ag | Method of continuously regenerating etching solutions containing copper |
| US4388276A (en) * | 1980-09-23 | 1983-06-14 | Siemens Aktiengesellschaft | Device for regenerating hydrochloric copper chloride etching solutions |
| JP3928998B2 (en) * | 1998-04-08 | 2007-06-13 | エム・エフエスアイ株式会社 | Etching solution regeneration processing apparatus and etching apparatus using the same |
| CN104947111A (en) * | 2015-07-02 | 2015-09-30 | 深圳市洁驰科技有限公司 | Oxidation device of cuprous ions in acid etching liquid for printed circuit board |
| US20170022616A1 (en) * | 2014-04-01 | 2017-01-26 | Sigma Engineering Ab | Oxidation of copper in a copper etching solution by the use of oxygen and/or air as an oxidizing agent |
| CN208701212U (en) * | 2018-03-29 | 2019-04-05 | 东莞太星机械有限公司 | Etch system |
| CN113637976A (en) * | 2021-08-20 | 2021-11-12 | 深圳天华机器设备有限公司 | Sulphuric acid wash tank liquid medicine regeneration system |
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|---|---|---|---|---|
| JP3109430B2 (en) * | 1996-01-26 | 2000-11-13 | 住友金属工業株式会社 | Method of regenerating etching solution and method of using the regenerating solution |
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| GB964665A (en) * | 1963-07-10 | 1964-07-22 | Siemens Ag | Method of continuously regenerating etching solutions containing copper |
| US4388276A (en) * | 1980-09-23 | 1983-06-14 | Siemens Aktiengesellschaft | Device for regenerating hydrochloric copper chloride etching solutions |
| JP3928998B2 (en) * | 1998-04-08 | 2007-06-13 | エム・エフエスアイ株式会社 | Etching solution regeneration processing apparatus and etching apparatus using the same |
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| CN104947111A (en) * | 2015-07-02 | 2015-09-30 | 深圳市洁驰科技有限公司 | Oxidation device of cuprous ions in acid etching liquid for printed circuit board |
| CN208701212U (en) * | 2018-03-29 | 2019-04-05 | 东莞太星机械有限公司 | Etch system |
| CN113637976A (en) * | 2021-08-20 | 2021-11-12 | 深圳天华机器设备有限公司 | Sulphuric acid wash tank liquid medicine regeneration system |
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| CN115287659B (en) | 2024-03-29 |
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