CN115236948A

CN115236948A - Drying device of wafer photoetching machine

Info

Publication number: CN115236948A
Application number: CN202210924501.3A
Authority: CN
Inventors: 陈炳寺
Original assignee: Jiangsu Jingjie Photoelectric Technology Co ltd
Current assignee: Jiangsu Jingjie Photoelectric Technology Co ltd
Priority date: 2022-08-02
Filing date: 2022-08-02
Publication date: 2022-10-25
Anticipated expiration: 2042-08-02
Also published as: CN115236948B

Abstract

The invention relates to a drying device of a wafer photoetching machine, which comprises: photoetching machine is equipped with the cartridge filter on the photoetching machine, installs in the cartridge filter and carries out filterable filter assembly to the air, and the round hole has been seted up to the bottom of cartridge filter, and last fixed mounting of photoetching machine has the retaining subassembly that extends to the round hole, stores the water that filter assembly produced through the retaining subassembly, and the round hole that is the circumference and distributes is seted up to the one end of cartridge filter, and the other end fixed mounting of cartridge filter has the suction tube. The invention has novel design, the arranged air enters the filter cartridge, the moist air is filtered in the first step by the installed adsorption sponge, the adsorption sponge absorbs a large amount of moisture in the air, the air is filtered in the second step by the installed activated carbon layer, the hot air is blown into the drying tube by the air outlet pipe, the hot air entering the drying tube dries the photoetching machine, the humidity in the air is greatly reduced by the filter assembly in the filter cartridge, and the drying effect of the drying device is improved.

Description

Drying device of wafer photoetching machine

Technical Field

The invention relates to the field of production of photoetching machines, in particular to a drying device of a wafer photoetching machine.

Background

Photoetching is the most important process in an integrated circuit, a photoetching machine is the core equipment for manufacturing a chip, and in the manufacturing of the chip, the photoetching technology is required to be used for implementing almost every process, so to speak, the photoetching machine is an obvious bead in the semiconductor field;

the method comprises the following steps that light emitted by a photoetching machine is used for exposing a slice coated with photoresist through a photomask with patterns, the photoresist is changed in property after encountering light, the patterns obtained on the photomask are copied on the slice, then the slice has the effect of an electronic circuit diagram, and the simple point is that the photoetching machine is like a single reflection, and the integrated circuit pattern designed on the photomask is printed on a light-sensitive material through the exposure of the light to form the pattern;

the lithography machine drying device who commonly uses adopts the mode of heated air to dry, and the humidity in the air has great range variation in different environment and different weather, if when heating the stoving to the great air of humidity, the higher hot-air greatly reduced drying device's of humidity drying effect.

Disclosure of Invention

The present invention is directed to a drying device of a wafer lithography machine to solve the above problems.

In order to achieve the purpose, the invention provides the following technical scheme:

a drying apparatus of a wafer lithography machine, comprising:

the photoetching machine is provided with a filter cartridge, a filter assembly for filtering air is installed in the filter cartridge, a round hole is formed in the bottom of the filter cartridge, a water storage assembly extending into the round hole is fixedly installed on the photoetching machine, water generated by the filter assembly is stored through the water storage assembly, the round hole distributed circumferentially is formed in one end of the filter cartridge, an air pumping cylinder is fixedly installed at the other end of the filter cartridge, a supporting block for supporting the air pumping cylinder is fixedly installed at the bottom of the air pumping cylinder, the supporting block is fixedly installed on the photoetching machine, a piston block is connected in the air pumping cylinder in a sliding mode, and a driving assembly connected with the piston block is installed on the photoetching machine;

drive assembly and filter assembly are connected, and drive assembly drive filter assembly extrudees during with the leading-in retaining subassembly of moisture, and the heating element rather than the intercommunication is installed to one side of aspirating tube, makes the inside drier of lithography machine through heating element with air heating.

As a further scheme of the invention: the filter component comprises two filter plates arranged in the filter cylinder, an adsorption sponge fixedly arranged with one of the filter plates is arranged between the two filter plates, one of the filter plates is fixedly arranged with the filter cylinder, the other filter plate is connected in the filter cylinder in a sliding way, and an activated carbon layer is fixedly arranged in the filter cylinder.

As a still further scheme of the invention: the water storage component comprises a short pipe fixedly installed on the round hole, a water storage tank communicated with the short pipe is fixedly installed on one side, away from the filter cartridge, of the short pipe, the water storage tank is fixedly installed on the upper portion of the short pipe, a water outlet pipe communicated with the water storage tank is fixedly installed on one side of the water storage tank, and an electromagnetic valve for controlling the water storage tank to open and close is fixedly installed on the water outlet pipe.

As a still further scheme of the invention: the drive assembly comprises a disc which is rotatably connected to the drive assembly, a servo motor for driving the drive assembly to rotate is arranged on the photoetching machine, a support seat for supporting the servo motor is fixedly arranged on the servo motor, the support seat is fixedly arranged on the photoetching machine, and a transmission belt for transmission is arranged between an output shaft of the servo motor and a disc rotating shaft.

As a still further scheme of the invention: seted up on the disc and run through the spout, run through the spout internal rotation and be connected with the threaded rod, threaded rod threaded connection has the removal slider of sliding connection in running through the spout, one side fixed mounting of piston piece has the piston rod, one side that the piston piece was kept away from to the piston rod extends to the air exhaust section of thick bamboo outer and fixed mounting has articulated seat, articulated on the articulated seat have the catch bar, one side that articulated seat was kept away from to the catch bar is rotated and is connected with the cylinder with removal slider fixed mounting.

As a still further scheme of the invention: fixed mounting has the catch bar on the piston rod, and the one end that the piston rod was kept away from to the catch bar extends to the cartridge filter in, sets up on the cartridge filter and supplies the gliding spout that runs through of catch bar, extends to the filter fixed mounting of the catch bar in the cartridge filter and sliding connection in the cartridge filter, sliding connection has the movable plate with catch bar fixed mounting on the cartridge filter.

As a still further scheme of the invention: heating element includes fixed mounting and has a cartridge heater on the lithography machine, and fixed mounting has the pipe between one side of cartridge heater and the pump bowl, and fixed mounting has the check valve on pump bowl and cartridge filter junction and the pipe, and the installation opposite direction of two check valves, and fixed mounting has the stoving pipe of drying to carrying out in it on the lithography machine, and fixed mounting has the outlet duct between the one end of cartridge heater and the stoving pipe, installs a plurality of heating members that carry out the heating to the air in the cartridge heater.

As a still further scheme of the invention: the heating element comprises a plurality of mounting plates fixedly mounted in the heating cylinder, and a heating wire for heating air in the heating cylinder is fixedly mounted between the two mounting plates.

Compared with the prior art, the invention has the beneficial effects that: the invention has novel design, the arranged air enters the filter cylinder, the moist air is filtered in a first step by the installed adsorption sponge, the adsorption sponge absorbs a large amount of moisture in the air, the air is filtered in a second step by the installed activated carbon layer, the moisture in the air is thoroughly filtered by the activated carbon layer, the air is pushed into the heating cylinder by the air exhaust cylinder, the air entering the heating cylinder is heated by the heating element, finally, the hot air is blown into the drying cylinder by the air outlet pipe, the hot air entering the drying cylinder dries the photoetching machine, the humidity in the air is greatly reduced by the filter component in the filter cylinder, and the drying effect of the drying device is improved.

Drawings

FIG. 1 is a schematic perspective view of a drying apparatus of a wafer lithography machine according to an embodiment.

FIG. 2 is an enlarged schematic view of an embodiment of a pump cylinder of a drying apparatus of a wafer lithography machine.

FIG. 3 is a schematic diagram of the internal structure of a filter cartridge in an embodiment of a drying apparatus of a wafer lithography machine.

FIG. 4 is an enlarged view of a disk in an embodiment of a drying apparatus of a wafer aligner.

FIG. 5 is an enlarged structural view of a heating cylinder in an embodiment of a drying device of a wafer lithography machine.

FIG. 6 is a schematic diagram of the internal structure of a heating cylinder in an embodiment of a drying apparatus of a wafer lithography machine.

FIG. 7 is a bottom view of a support base in an embodiment of a drying apparatus for a wafer aligner.

In the figure: 1. a lithography machine; 2. a drying duct; 3. a filter cartridge; 4. an air pumping cylinder; 5. a heating cylinder; 6. a servo motor; 7. a water storage tank; 8. a water outlet pipe; 9. a push rod; 10. moving the plate; 11. a support block; 12. a piston rod; 13. a disc; 14. a supporting seat; 15. an air outlet pipe; 16. a transmission belt; 17. a filter plate; 18. adsorbing the sponge; 19. an activated carbon layer; 20. a one-way valve; 21. a hinged seat; 22. a push rod; 23. a threaded rod; 24. moving the slide block; 25. mounting a plate; 26. an electric heating wire.

Detailed Description

The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.

In addition, an element of the present invention may be said to be "fixed" or "disposed" to another element, either directly on the other element or with intervening elements present. When an element is referred to as being "connected" to another element, it can be directly connected to the other element or intervening elements may also be present. The terms "vertical," "horizontal," "left," "right," and the like as used herein are for illustrative purposes only and do not denote a single embodiment.

Referring to fig. 1, fig. 2, and fig. 3, in an embodiment of the present invention, a drying device of a wafer lithography machine includes:

photoetching machine 1, be equipped with cartridge filter 3 on photoetching machine 1, it is right to install in cartridge filter 3 the air carries out filterable filtering component.

The filter assembly comprises two filter plates 17 arranged in the filter cylinder 3, an adsorption sponge 18 fixedly mounted with one of the filter plates 17 is arranged between the two filter plates 17, one of the filter plates 17 is fixedly mounted with the filter cylinder 3, the other filter plate 17 is connected in the filter cylinder 3 in a sliding manner, and an activated carbon layer 19 is fixedly mounted in the filter cylinder 3.

In the air admission cartridge filter 3 of setting, carry out first step filtration to moist air through the absorption sponge 18 of installation, absorption sponge 18 takes away a large amount of moisture in the air, and the active carbon layer 19 of rethread installation carries out the secondary filter to the air, thoroughly filters totally through the moisture in the active carbon layer 19 with the air.

The photoetching machine 1 is fixedly provided with a water storage component extending into the round hole, and water generated by the filtering component is stored by the water storage component.

Referring to fig. 1, 2 and 3, the water storage assembly includes a short pipe fixedly mounted on the circular hole, a water storage tank 7 is fixedly mounted on one side of the short pipe away from the filter cartridge 3 and communicated with the short pipe, the water storage tank 7 is fixedly mounted on the short pipe, a water outlet pipe 8 is fixedly mounted on one side of the water storage tank 7 and communicated with the water storage tank, and an electromagnetic valve is fixedly mounted on the water outlet pipe 8 and used for controlling the water storage tank to open and close.

Specifically, the filter component in the filter cartridge 3 can produce a large amount of water drops when filtering, and the water drops enter the water storage tank 7 below through the fixed short pipe, and are stored through the water storage tank 7, so that the electromagnetic valve on one side is opened after the water drops are fully stored, and the liquid is discharged through the water outlet pipe 8 fixed on one side.

The other end of the filter cylinder 3 is fixedly provided with an air pumping cylinder 4, the bottom of the air pumping cylinder 4 is fixedly provided with a supporting block 11 for supporting the air pumping cylinder 4, the supporting block 11 is fixedly arranged on the photoetching machine 1, a piston block is slidably connected in the air pumping cylinder 4, and the photoetching machine 1 is provided with a driving component connected with the piston block.

Referring to fig. 1, 2, 4, and 7, the driving assembly includes a disk 13 rotatably connected to the driving assembly, a servo motor 6 for driving the driving assembly to operate is disposed on the lithography machine 1, the servo motor 6 is fixedly mounted with a supporting seat 14 for supporting the servo motor, the supporting seat 14 is fixedly mounted on the lithography machine 1, and a transmission belt 16 for transmission is disposed between an output shaft of the servo motor 6 and a rotating shaft of the disk 13.

Specifically, the servo motor 6 is operated, the servo motor 6 rotates the disk 13 on one side by the belt 16 attached thereto, and the belt 16 is driven to operate more stably by the support base 14 when the servo motor 6 is operated at a high speed.

Referring to fig. 1, 2, 4, and 7, a through sliding groove is formed in the disc 13, a threaded rod 23 is rotatably connected in the through sliding groove, the threaded rod 23 is in threaded connection with a moving slider 24 slidably connected in the through sliding groove, a piston rod 12 is fixedly mounted on one side of the piston block, one side of the piston rod 12 away from the piston block extends out of the air extraction cylinder 4 and is fixedly mounted with a hinge seat 21, a push rod 22 is hinged on the hinge seat 21, and one side of the push rod 22 away from the hinge seat 21 is rotatably connected with a cylinder fixedly mounted with the moving slider 24.

The threaded rod 23 that sets up is rotatory, rotatory threaded rod 23 drives threaded connection's removal slider 24 and takes place to remove on it, when threaded rod 23 forward rotation, rotatory threaded rod 23 area threaded connection's removal slider 24 is close to the centre of a circle of disc 13, removal slider 24 makes the amplitude of oscillation of catch bar 22 littleer, let the depth of promotion of piston rod 12 shallower, make drying equipment's the speed of giving vent to anger reduce, and when threaded rod 23 reverse rotation, rotatory threaded rod 23 area threaded connection's removal slider 24 moves to the outside of disc 13, removal slider 24 makes the amplitude of oscillation of catch bar 22 bigger, let the depth of promotion of piston rod 12 darker, make drying equipment's the speed of giving vent to anger faster.

The driving component is connected with the filtering component, and drives the filtering component to extrude to guide the water into the water storage component.

Referring to fig. 1, 3, and 5, a push rod 9 is fixedly mounted on the piston rod 12, one end of the push rod 9, which is far away from the piston rod 12, extends into the filter cartridge 3, a through chute for the push rod 9 to slide is formed in the filter cartridge 3, the push rod 9 extending into the filter cartridge 3 is fixedly mounted on the filter plate 17 which is slidably connected in the filter cartridge 3, and a moving plate 10 fixedly mounted on the push rod 9 is slidably connected to the filter cartridge 3.

Specifically, the piston rod 12 moving back and forth drives the connected push rod 9 to move, the moved push rod 9 pushes the connected filter plate 17 to move, the moved filter plate 17 extrudes the adsorption sponge 18, and water generated by filtration on the adsorption sponge 18 is extruded out, so that the adsorption sponge 18 can be filtered for a long time.

And a heating assembly communicated with the air pumping cylinder 4 is installed on one side of the air pumping cylinder, and the air is heated by the heating assembly to dry the interior of the photoetching machine.

Referring to fig. 1, 5 and 6, the heating assembly includes a heating cylinder 5 fixedly mounted on the lithography machine 1, a circular tube is fixedly mounted between one side of the heating cylinder 5 and the air exhaust cylinder 4, a one-way valve 20 is fixedly mounted on a joint of the air exhaust cylinder 4 and the filter cylinder 3 and the circular tube, mounting directions of the two one-way valves 20 are opposite, a drying tube 2 for drying the interior of the lithography machine 1 is fixedly mounted on the lithography machine 1, an air outlet tube 15 is fixedly mounted between one end of the heating cylinder 5 and the drying tube 2, and a plurality of heating members for heating air in the heating cylinder 5 are mounted in the heating cylinder 5.

In detail, the air can be pushed into the heating cylinder 5 by the air pumping cylinder 4, the air entering the heating cylinder 5 is heated by the heating element, and finally the hot air is blown into the drying tube 2 through the air outlet tube 15, the hot air entering the drying tube 2 dries the lithography machine 1, of course, the air pumping cylinder 4 can only pump the air through the filter cartridge 3 through the installed one-way valve 20, and the air pumping cylinder 4 can only discharge the air into the heating cylinder 5 through the installed one-way valve 20.

Referring to fig. 1, 5 and 6, the heating element includes a plurality of mounting plates 25 fixedly mounted in the heating cylinder 5, and a heating wire 26 for heating air in the heating cylinder 5 is fixedly mounted between the two mounting plates 25.

The plurality of heating wires 26 provided in the heating cylinder 5 are energized, and the energized heating wires 26 generate heat, and the passing air continuously takes away the heat.

It will be evident to those skilled in the art that the invention is not limited to the details of the foregoing illustrative embodiments, and that the present invention may be embodied in other specific forms without departing from the spirit or essential attributes thereof. The present embodiments are therefore to be considered in all respects as illustrative and not restrictive, the scope of the invention being indicated by the appended claims rather than by the foregoing description, and all changes which come within the meaning and range of equivalency of the claims are therefore intended to be embraced therein. Any reference sign in a claim should not be construed as limiting the claim concerned.

Furthermore, it should be understood that although the present description refers to embodiments, not every embodiment may contain only a single embodiment, and such description is for clarity only, and those skilled in the art should integrate the description, and the embodiments may be combined as appropriate to form other embodiments understood by those skilled in the art.

Claims

1. A drying device of a wafer photoetching machine is characterized by comprising

The air purifier comprises a photoetching machine (1), wherein a filter cylinder (3) is arranged on the photoetching machine (1), a filter component for filtering air is arranged in the filter cylinder (3), a round hole is formed in the bottom of the filter cylinder (3), a water storage component extending into the round hole is fixedly arranged on the photoetching machine (1), water generated by the filter component is stored through the water storage component, one end of the filter cylinder (3) is provided with the round hole distributed in the circumferential direction, an air suction cylinder (4) is fixedly arranged at the other end of the filter cylinder (3), a supporting block (11) for supporting the air suction cylinder (4) is fixedly arranged at the bottom of the air suction cylinder (4), the supporting block (11) is fixedly arranged on the photoetching machine (1), a piston block is connected with the air suction cylinder (4) in a sliding manner, and a driving component connected with the piston block is arranged on the photoetching machine (1);

the drive assembly with the filtering component is connected, the drive assembly drive the filtering component extrudes and imports the water with the moisture, the heating element rather than the intercommunication is installed to one side of aspiration cylinder (4), through the heating element makes photoetching machine inside drier with air heating.

2. A drying apparatus for a wafer lithography machine according to claim 1, characterized in that said filter assembly comprises two filter plates (17) arranged in said filter cartridge (3), between two of said filter plates (17) is arranged an adsorption sponge (18) fixedly mounted with one of said filter plates (17), one of said filter plates (17) being fixedly mounted with said filter cartridge (3) and the other of said filter plates (17) being slidably connected in said filter cartridge (3), said filter cartridge (3) having fixedly mounted therein an activated carbon layer (19).

3. The drying device of a wafer lithography machine according to claim 1, wherein the water storage component comprises a short pipe fixedly installed on the circular hole, a water storage tank (7) communicated with the short pipe is fixedly installed on one side of the short pipe far away from the filter cartridge (3), the water storage tank (7) is fixedly installed on the short pipe, a water outlet pipe (8) communicated with the water storage tank is fixedly installed on one side of the water storage tank (7), and an electromagnetic valve for controlling the opening and closing of the water outlet pipe (8) is fixedly installed on the water outlet pipe.

4. The drying device of a wafer lithography machine according to claim 1, wherein the driving assembly comprises a disc (13) rotatably connected to the drive unit, a servo motor (6) for driving the drive unit is provided on the lithography machine (1), the servo motor (6) is fixedly provided with a support base (14) for supporting the servo motor, the support base (14) is fixedly provided on the lithography machine (1), and a transmission belt (16) for transmission is provided between an output shaft of the servo motor (6) and a rotating shaft of the disc (13).

5. The drying device of the wafer lithography machine according to claim 4, wherein a through sliding groove is formed in the disc (13), a threaded rod (23) is rotationally connected in the through sliding groove, the threaded rod (23) is in threaded connection with a movable sliding block (24) which is slidably connected in the through sliding groove, a piston rod (12) is fixedly mounted on one side of the piston block, one side of the piston rod (12) far away from the piston block extends to the outside of the air suction tube (4) and is fixedly mounted with a hinged seat (21), a push rod (22) is hinged on the hinged seat (21), and one side of the push rod (22) far away from the hinged seat (21) is rotationally connected with a cylinder fixedly mounted with the movable sliding block (24).

6. The drying device of a wafer lithography machine according to claim 5, characterized in that a pushing rod (9) is fixedly mounted on the piston rod (12), one end of the pushing rod (9) far away from the piston rod (12) extends into the filter cartridge (3), a through chute for the pushing rod (9) to slide is formed on the filter cartridge (3), the pushing rod (9) extending into the filter cartridge (3) and the filter plate (17) slidably connected in the filter cartridge (3) are fixedly mounted, and a moving plate (10) fixedly mounted with the pushing rod (9) is slidably connected on the filter cartridge (3).

7. The drying device of the wafer lithography machine according to claim 1, wherein the heating assembly comprises a heating cylinder (5) fixedly mounted on the lithography machine (1), a circular tube is fixedly mounted between one side of the heating cylinder (5) and the air suction cylinder (4), a one-way valve (20) is fixedly mounted at the joint of the air suction cylinder (4) and the filter cylinder (3) and on the circular tube, the two one-way valves (20) are mounted in opposite directions, a drying tube (2) for drying the inside of the drying tube is fixedly mounted on the lithography machine (1), an air outlet tube (15) is fixedly mounted between one end of the heating cylinder (5) and the drying tube (2), and a plurality of heating elements for heating the air in the heating cylinder (5) are mounted in the heating cylinder (5).

8. Drying device for a wafer lithography machine according to claim 2, characterized in that said heating element comprises a plurality of mounting plates (25) fixedly mounted inside said heating cartridge (5), between two of said mounting plates (25) there being fixedly mounted a heating wire (26) for heating the air inside said heating cartridge (5).