CN115228805B

CN115228805B - Automatic cleaning equipment and cleaning method suitable for conducting ring

Info

Publication number: CN115228805B
Application number: CN202211161274.XA
Authority: CN
Inventors: 孙文杰; 孙雪峰; 肖凌峰
Original assignee: Shengying Semiconductor Equipment Jiangsu Co ltd
Current assignee: Shengying Semiconductor Equipment Jiangsu Co ltd
Priority date: 2022-09-23
Filing date: 2022-09-23
Publication date: 2023-03-24
Anticipated expiration: 2042-09-23
Also published as: CN115228805A

Abstract

The invention discloses automatic cleaning equipment and a cleaning method suitable for a conducting ring, wherein the automatic cleaning equipment comprises: a cleaning tank formed with a cleaning chamber, wherein the cleaning chamber has a carriage insertion opening and a waste discharge opening; a cleaning member supply unit including a supply passage communicating with the cleaning chamber, a cleaning member; the cleaning unit comprises a connecting channel which is positioned in the cleaning cavity and communicated with the supply channel, a waste discharge channel communicated with the waste discharge port, a cleaning arm which is provided with a taking and placing end part and rotates around the horizontal direction, and a driving part. On one hand, the automatic feeding of cleaning pieces, the automatic cleaning of the conducting rings and the automatic discharging after the cleaning are realized, and the degree of automation is high; on the other hand drives the cleaning piece by the cleaning arm and accomplishes the multichannel cleanness to the conducting ring, and easy operation effectively reduces workman's intensity of labour, and clean efficiently, can guarantee simultaneously that the conducting ring atress is stable in clean process, effectively avoids the conducting ring to damage, extension part life reduces disability rate and manufacturing cost.

Description

Automatic cleaning equipment and cleaning method suitable for conducting ring

Technical Field

The invention relates in particular to an automatic cleaning device suitable for conducting rings, the automatic cleaning method suitable for the conducting ring is also related.

Background

Wafer refers to a silicon wafer used for making silicon semiconductor circuits, the starting material of which is silicon. And dissolving the high-purity polycrystalline silicon, doping the dissolved high-purity polycrystalline silicon into silicon crystal seed crystals, and slowly pulling out the silicon crystal seed crystals to form cylindrical monocrystalline silicon. The silicon crystal bar is ground, polished and sliced to form a silicon wafer. Further, a conductive metal layer is plated on the wafer, and the conductive metal layer is processed to form a conductive circuit.

Currently, wafer electroplating equipment can be roughly divided into two types: one is a DIP method in which the wafer is vertically placed in an electroplating bath, and the other is a CUP method in which the wafer is horizontally (laterally) placed in an electroplating bath. In the DIP method, the wafer is adsorbed on the wafer carrier by the bernoulli principle, and then the wafer carrier is vertically placed in the plating bath by the robot arm for plating. A Conductive Ring (CRS) is usually disposed on the wafer carrier, and the conductive Ring can fix the wafer on the wafer carrier and ensure the sealing property, and has a high-density and multi-point electrical probe contacting with the wafer, so that the wafer on the wafer carrier can be connected to an external power source during the electroplating process, and a desired plating layer can be formed on the surface of the wafer carrier through decomposition of the electroplating solution.

However, in the actual electroplating process, since the conductive ring is repeatedly used, impurities are easily attached to the surface of the conductive ring, which affects the conductivity, and thus, the electroplating of each region on the surface of the wafer is not uniform, the conductive ring needs to be periodically cleaned, but the conventional cleaning of the conductive ring mainly depends on manual cleaning, and the following problems exist:

1. when the cleaning tool is used for cleaning manually, the cleaning pressure applied to the surface of the conductive ring by a worker holding the cleaning part is unstable, the conductive ring is an annular thin-wall part, so that the conductive ring is easy to deform or even damage during cleaning, the rejection rate of the part is high, and the replacement cost is high;

2. when single-pass cleaning is carried out on the annular end face of the conducting ring, the manual handheld cleaning piece is required to rotate a circle, and when multi-pass cleaning is carried out, the manual handheld cleaning piece is required to rotate a plurality of circles, so that the workload is large, the labor intensity is high, and the cleaning efficiency is low.

Disclosure of Invention

The invention aims to overcome the defects of the prior art and provide brand-new automatic cleaning equipment suitable for conducting rings.

Meanwhile, the invention also relates to an automatic cleaning method suitable for the conducting ring.

In order to solve the technical problems, the technical scheme adopted by the invention is as follows:

an automatic cleaning apparatus adapted for use with a conductive loop that is an annular part and is secured to a carrier, the automatic cleaning apparatus comprising:

the cleaning groove is formed with a cleaning cavity matched with the carrier, wherein the cleaning cavity is provided with a carrier inserting opening and a waste discharging opening;

the cleaning piece supply unit comprises a supply channel communicated with the cleaning cavity and cleaning pieces, wherein the supply channel can feed the cleaning pieces into the cleaning cavity one by one;

the cleaning unit comprises a linking channel which is positioned in the cleaning cavity and is communicated with the supply channel, a waste discharge channel which is communicated with the waste discharge port, a cleaning arm which is provided with a picking and placing end part and rotates around the horizontal direction, and a driving part, wherein the picking and placing end parts are at least two, each picking and placing end part can be matched with the linking channel or the waste discharge channel to automatically take out or unload a cleaning piece, when in cleaning, the conducting ring is inserted into the cleaning cavity along with the carrier, the cleaning piece is kept positioned at the picking and placing end part, the cleaning arm rotates to enable the cleaning piece to move around the rotation center of the cleaning arm in an annular shape, the movement track of the cleaning piece cleans and covers the annular end surface of the conducting ring, and a plurality of cleaning pieces which are synchronously cleaned are matched with the waste discharge channel in a linking mode through the picking and placing end parts and the waste discharge channel and are discharged from the waste discharge port one by one.

Preferably, the centre of rotation of the cleaning arm is aligned with the centre of the conductive ring located in the cleaning chamber. By the arrangement, the movement locus of the cleaning piece on each picking and placing end part can accurately cover the annular end face of the conducting ring.

Preferably, the cleaning piece comprises a cleaning seat and a flexible cleaning sheet, wherein the cleaning seat is matched with the pick-and-place end part to fix or separate the pick-and-place end part, and the flexible cleaning sheet can be attached to the annular end face of the conductive ring.

Preferably, the cleaning arm is pivotally disposed on a side wall of the cleaning groove, and the cleaning arm is capable of adjusting deformation of the flexible cleaning sheet along a length direction of the pivot shaft to change a frictional force formed between the flexible cleaning sheet and the annular end surface of the conductive ring.

Specifically, clean groove is including the first groove panel and the second groove panel that are located both sides, the die block that is located the bottom, the end mould that is located the die block both ends, wherein first groove panel and second groove panel, die block, end mould constitute clean chamber, and wherein clean arm is installed in the inner wall of first groove panel, and first groove panel is drawn close relatively or is kept away from with the deformation of adjusting flexible cleaning sheet to the second groove panel.

Preferably, the cleaning unit further comprises a dust removing part communicated with the cleaning cavity, wherein when the conductive ring is cleaned, the cleaning cavity is in a negative pressure state. The arrangement ensures the cleanness of the cleaning cavity in the cleaning process and avoids secondary pollution.

Specifically, the dust removal part comprises a non-return cavity formed on the bottom die and communicated with the cleaning cavity, a negative pressure pipeline communicated with the non-return cavity and a fan. When the fan works, negative pressure is formed in the cleaning cavity and the non-return cavity, and airflow is discharged from the negative pressure pipeline after sequentially passing through the cleaning cavity and the non-return cavity. Effectively preventing the sucked impurities from flowing back to cause secondary pollution to the conducting ring.

Preferably, a guide wheel assembly is installed on the inner wall of the end mold, wherein the carriage is fitted on the wheel surface of the guide wheel assembly from opposite sides and inserted into the cleaning tank to move up and down. Set up like this, guarantee that the carrier is got and is put stably, avoid rocking to strike the damage that clean groove caused equipment.

Preferably, the outlet of the connecting channel and the inlet of the waste discharge channel are respectively provided with a joint part, wherein the joint part is in contraposition fit with the picking and placing end part, and the cleaning piece is fixed at the picking and placing end part or is discharged from the waste discharge port under the self weight.

Preferably, there are two pick-and-place end portions correspondingly disposed at two ends of the cleaning arm, wherein distances from the two pick-and-place end portions to a rotation center of the cleaning arm are equal.

Preferably, the supply channel is serpentine from top to bottom, and a blocking member is further provided between the outlet of the supply channel and the inlet of the joining channel, the cleaning elements being stacked in the supply channel, the blocking member forming a supply valve, and the blocking member releasing the cleaning elements one by one and moving under its own weight to the pick-and-place end when the pick-and-place end is aligned with the outlet of the joining channel.

Preferably, the waste discharge port is obliquely arranged from top to bottom, the connecting channel and the waste discharge port are positioned on the same side of the cleaning groove, and the extension directions of the connecting channel and the waste discharge port are intersected. Set up like this, when getting of cleaning arm put tip and the butt joint of waste discharge passageway, the cleaning member can get into waste discharge passageway smoothly under the inertia effect and pass the waste discharge mouth and discharge.

Furthermore, an auxiliary channel is arranged at the bottom of the waste discharge port, wherein the auxiliary channel comprises a first section extending obliquely downwards from the waste discharge port, a second section extending vertically downwards from the lower end of the first section, and a third section extending horizontally from the lower end of the second section, and the joint between every two adjacent sections of the first section, the second section, and the third section is arc-shaped. By the arrangement, when waste is discharged, the used cleaning piece can be ensured to quickly fall in the first two sections to avoid accumulation, and can smoothly roll out in the last section to reduce impact; meanwhile, the impact deformation phenomenon of the cleaning piece in the falling process can be reduced.

Preferably, the cleaning member supply unit and the cleaning unit constitute a cleaning group, and the automatic cleaning apparatus includes two cleaning groups, and the two cleaning groups are symmetrically disposed about the cleaning chamber.

Specifically, a first loading area and a second loading area which are symmetrically arranged are formed on two sides of the carrier, the two conducting rings are respectively installed in the first loading area and the second loading area, and the two conducting rings are respectively cleaned on the annular end face through corresponding cleaning groups.

Furthermore, the driving piece comprises a driving wheel, a power wheel and a synchronous belt which are synchronously connected with the cleaning arm, wherein the power wheels of the two cleaning groups are distributed in a staggered manner in the thickness direction of the cleaning groove. Set up like this, in the assembly process, guarantee that the side of clean groove can keep leveling to realize whole clean groove and flatten, reduce self-cleaning equipment's volume.

Another technical solution of the present invention is an automatic cleaning method for a conductive ring, the cleaning method using the above automatic cleaning apparatus, and comprising the steps of:

s1, conveying a cleaning piece from a supply channel to a connecting channel, and simultaneously, automatically supplementing the cleaning piece in the supply channel downwards;

s2, inserting the carrier frame loaded with the conducting ring into the cleaning cavity from the insertion opening of the carrier frame, wherein the center of the conducting ring is aligned with the rotation center of the cleaning arm;

s3, driving the cleaning arm to rotate around the rotation center, so that the picking and placing end part can be matched with the connecting channel, and picking out the cleaning piece, wherein at the moment, a cleaning surface formed by the cleaning piece is attached to the annular end face of the conducting ring, and the cleaning piece is rotated by the cleaning arm to form an annular motion track and perform covering cleaning on the annular end face of the conducting ring;

and S4, after cleaning is completed, the end part of the picking and placing part is matched with the waste discharge channel, and the cleaning piece is unloaded, and at the moment, the cleaning piece is unloaded from the waste discharge channel and the waste discharge port in sequence under the dead weight.

In addition, in S3, there are a plurality of pick-and-place ends, wherein the distance from each pick-and-place end to the rotation center of the cleaning arm is a rotation radius, and the annular end surface of the conductive ring is cleaned in multiple passes under the forward rotation or/and the backward rotation of the cleaning arm.

Due to the implementation of the technical scheme, compared with the prior art, the invention has the following advantages:

on one hand, the automatic feeding, the automatic cleaning and the automatic discharging of the cleaning pieces after the cleaning are finished are realized through the matching of the picking and placing end part of the cleaning arm with the connecting channel and the waste discharging channel, and the degree of automation is high; on the other hand drives the cleaning member by the rotation of cleaning arm and accomplishes the multichannel cleanness to the conducting ring, and easy operation effectively reduces workman's intensity of labour, and clean efficiently, can guarantee simultaneously that the conducting ring atress is stable in clean process, effectively avoids the conducting ring to damage, extension part life reduces disability rate and manufacturing cost.

Drawings

FIG. 1 is a schematic perspective view of an automatic cleaning apparatus suitable for use with a conductive ring according to the present invention;

FIG. 2 is a schematic front view of FIG. 1 (without the housing shown);

FIG. 3 is a rear view of FIG. 2;

FIG. 4 is a left side schematic view of FIG. 2;

FIG. 5 isbase:Sub>A schematic sectional view taken along line A-A in FIG. 4;

FIG. 6 is a schematic sectional view taken along line B-B in FIG. 4;

FIG. 7 is a schematic view of the carrier and conductive ring assembly of the present invention;

FIG. 8 is a schematic view of the construction of a cleaning element of the present invention;

wherein: J. a carrier; H. conducting rings;

1. cleaning the tank; 11. a first slot panel; 12. a second slot panel; g. a telescopic cylinder; 13. bottom die; 14. end die; d. a guide wheel; 15. a housing; q, cleaning the cavity; k1, inserting an opening of the carrier; k2, a waste discharge port; t, an auxiliary channel; t1, a first section; t2, a second section; t3, a third section;

2. a cleaning member supply unit; 20. a supply channel; z, a barrier member; 21. a cleaning member; 210. cleaning the seat; 211. a flexible cleaning sheet;

3. a cleaning unit; 30. an engagement channel; 31. a waste discharge channel; a. a joint portion; 32. a cleaning arm; b. taking and placing the end part; 33. a drive member; 330. a drive wheel; 331. a power wheel; 332. a synchronous belt; 333. a tension adjuster; 34. a dust removal component; 340. a non-return cavity; 341. a negative pressure pipeline.

Detailed Description

In order to make the aforementioned objects, features and advantages of the present application more comprehensible, embodiments accompanying figures are described in detail below. In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present application. This application is capable of embodiments in many different forms than those described herein and that modifications may be made by one skilled in the art without departing from the spirit and scope of the application and it is therefore not intended to be limited to the specific embodiments disclosed below.

In the description of the present application, it is to be understood that the terms "center," "longitudinal," "lateral," "length," "width," "thickness," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," "clockwise," "counterclockwise," "axial," "radial," "circumferential," and the like are used in the orientations and positional relationships indicated in the drawings for convenience in describing the present application and for simplicity in description, and are not intended to indicate or imply that the referenced devices or elements must have a particular orientation, be constructed and operated in a particular orientation, and are therefore not to be considered limiting of the present application.

Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or to implicitly indicate the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one such feature. In the description of the present application, "plurality" means at least two, e.g., two, three, etc., unless specifically limited otherwise.

In this application, unless expressly stated or limited otherwise, the terms "mounted," "connected," "secured," and the like are to be construed broadly and can include, for example, fixed connections, removable connections, or integral parts; can be mechanically or electrically connected; they may be directly connected or indirectly connected through intervening media, or they may be connected internally or in any other suitable relationship, unless expressly stated otherwise. The specific meaning of the above terms in the present application can be understood by those of ordinary skill in the art as appropriate.

In this application, unless expressly stated or limited otherwise, the first feature "on" or "under" the second feature may be directly contacting the first and second features or indirectly contacting the first and second features through intervening media. Also, a first feature "on," "over," and "above" a second feature may be directly or diagonally above the second feature, or may simply indicate that the first feature is at a higher level than the second feature. A first feature being "under," "below," and "beneath" a second feature may be directly under or obliquely under the first feature, or may simply mean that the first feature is at a lesser elevation than the second feature.

It will be understood that when an element is referred to as being "secured to" or "disposed on" another element, it can be directly on the other element or intervening elements may also be present. When an element is referred to as being "connected" to another element, it can be directly connected to the other element or intervening elements may also be present. The terms "vertical," "horizontal," "upper," "lower," "left," "right," and the like as used herein are for illustrative purposes only and do not denote a unique embodiment.

As shown in fig. 1 to 8, the first loading area and the second loading area are symmetrically formed on two sides of the carrier J of the embodiment, the conductive rings H are annular thin-walled parts, and the two conductive rings H are respectively installed in the first loading area and the second loading area.

Specifically, the automatic cleaning apparatus includes a cleaning tank 1, a cleaning member supply unit 2, and a cleaning unit 3.

In this example, the cleaning tank 1 includes a first tank panel 11 and a second tank panel 12 on both sides, a bottom mold 13 on the bottom, end molds 14 on both ends of the bottom mold 13, and a housing 15, wherein a cleaning chamber q matching with the carrier J is formed among the first tank panel 11, the second tank panel 12, the bottom mold 13, and the end molds 14, the cleaning chamber q has a carrier insertion opening k1 on the top and a waste discharge opening k2 on the bottom and inclined from top to bottom, and the carrier J is placed into the cleaning chamber q from top to bottom or taken out from bottom to top by a robot.

Specifically, be equipped with a plurality of telescopic cylinder g between first groove panel 11 and the second groove panel 12, realize that first groove panel 11 relatively draws close or keeps away from the motion relatively second groove panel 12 through telescopic motion of telescopic cylinder g.

Specifically, in order to facilitate the movement of the carriage J into and out of the cleaning chamber q, guide wheel assemblies are respectively mounted on the inner walls of the two side end dies 14, wherein the carriage J is attached to the wheel faces of the guide wheel assemblies from opposite sides and is inserted into the cleaning tank 1 so as to move up and down. The guide wheel assembly comprises a plurality of guide wheels d which are distributed downwards from the insertion opening k1 of the carriage at intervals, and when the carriage is inserted, the guide wheels d on two sides roll along the corresponding side edges of the carriage J. Set up like this, guarantee that the carrier is got and is put stably, avoid rocking to strike the damage that clean groove caused equipment.

Specifically, the housing 15 surrounds the first and

second tank panels

11 and 12, the bottom mold 13, and the end mold 14.

In this example, an auxiliary channel t is further disposed at the bottom of the waste discharge port k2, wherein the auxiliary channel t includes a first section t1 extending obliquely downward from the waste discharge port, a second section t2 extending vertically downward from the lower end of the first section t1, and a third section t3 extending horizontally from the lower end of the second section t2, and a joint between each two adjacent sections of the first section t1, the second section t2, and the third section t3 is arc-shaped. By the arrangement, when waste is discharged, the used cleaning piece can be ensured to quickly fall in the first two sections to avoid accumulation, and can smoothly roll out in the last section to reduce impact; meanwhile, the impact deformation phenomenon caused by the falling process of the cleaning piece can be reduced.

In this example, the cleaning member supply unit 2 and the cleaning unit 3 constitute a cleaning group, and the automatic cleaning apparatus of this example includes two cleaning groups symmetrically arranged about the cleaning chamber q, and the two conductive rings H are respectively cleaned on the annular end surfaces by the corresponding cleaning groups.

Next, description will be made taking one of the cleaning groups as an example, and the structure of the other cleaning group will be clear.

In this example, the cleaning element supply unit 2 comprises a supply channel 20, which communicates with the cleaning chamber q, cleaning elements 21, wherein the supply channel 20 is capable of feeding the cleaning elements 21 one by one into the cleaning chamber q; the cleaning unit 3 comprises an engaging channel 30 located in the cleaning cavity q and communicated with the supply channel 20, a waste discharge channel 31 communicated with the waste discharge port k2, a cleaning arm 32 having two picking and placing end parts b and rotating around the horizontal direction, and a driving part 33, wherein the picking and placing end parts b are two, each picking and placing end part b can be matched with the engaging channel 30 or the waste discharge channel 31 to automatically pick out or unload the cleaning piece 21, when cleaning, the conductive ring H is inserted into the cleaning cavity q along with the carrier J, the cleaning piece 21 is kept positioned at the picking and placing end part b, the cleaning arm 32 rotates to enable the cleaning piece 21 to circularly move around the rotating center of the cleaning arm 32, the moving track of the cleaning piece 21 covers the circular end face of the conductive ring H in a cleaning mode, and the cleaning pieces 21 synchronously completing multiple cleaning processes are engaged with the waste discharge channel 31 through the picking and are discharged from the waste discharge port one by one.

Specifically, the supply channel 20 is serpentine from top to bottom, and a blocking member z is further provided between the outlet of the supply channel 20 and the inlet of the joining channel 30, the cleaning members 21 are stacked in the supply channel 20, the blocking member z forms a supply valve, and when the pick-and-place end b is aligned and matched with the outlet of the joining channel 30, the blocking member z releases the cleaning members 21 one by one and moves to the pick-and-place end b under its own weight. In some specific embodiments, the blocking component z adopts two cylinder pieces which are arranged at intervals up and down, and blocking or releasing of the cleaning piece is realized through telescopic matching of output shafts of the two cylinder pieces.

The cleaning member 21 includes a cleaning base 210 and a flexible cleaning sheet 211, wherein the cleaning base 210 is engaged with the pick-and-place end b to fix or separate the pick-and-place end b, and the flexible cleaning sheet 211 can fit the annular end surface of the conductive ring H. In some embodiments, the flexible cleaning sheet 211 is a sponge.

The waste discharge port k2 is obliquely arranged from top to bottom, the connecting channel 30 and the waste discharge port k2 are positioned on the same side of the cleaning groove 1, and the extension directions of the connecting channel and the waste discharge port k2 are intersected. Set up like this, when getting of cleaning arm put tip and the butt joint of waste discharge passageway, the cleaning member can get into waste discharge passageway smoothly under the inertia effect and pass the waste discharge mouth and discharge.

For further convenience, the outlet of the joining channel 30 and the inlet of the waste discharge channel 31 are respectively provided with a joint part a, wherein the joint part a is aligned and matched with the picking and placing end part b, and the cleaning piece 21 is fixed at the picking and placing end part b or is discharged from the waste discharge port k2 under the self-weight. In some embodiments, the picking and placing end b picks up and fixes the cleaning piece 21 by elastic clamping, the joint part a is a cylinder part, when the picking and placing end b is butted with the outlet of the connecting channel 30, the corresponding joint part a pushes and opens the picking and placing end b, the cleaning piece 21 falls on the picking and placing end b, then the corresponding joint part a resets, and the picking and placing end b automatically clamps and fixes the cleaning piece 21; when the taking and placing end part b is butted with the inlet of the waste discharge channel 31, the corresponding joint part a opens the taking and placing end part b, and the cleaning piece 21 rolls down under the action of self weight.

The cleaning arm 32 is a long straight arm, and the cleaning arm 32 is pivotally disposed on the inner wall of the first tank panel 11 from the middle, wherein the center of rotation of the cleaning arm 32 is aligned with the center of the conductive ring H positioned in the cleaning chamber; the two taking and placing end parts b are correspondingly arranged at two ends of the cleaning arm 32, wherein the distances from the two taking and placing end parts b to the rotating center of the cleaning arm 32 are both rotating radiuses, and the rotating radiuses of the two taking and placing end parts b are equal. By the arrangement, the movement locus of the cleaning piece on each picking and placing end part can accurately cover the annular end face of the conducting ring.

That is, during the relative movement of the first tank panel 11 toward and away from the second tank panel 12, the cleaning arms 32 move synchronously to adjust the deformation of the flexible cleaning sheet 211 in the direction of the length of the pivot shaft by pressing the conductive ring H, thereby changing the frictional force formed between the flexible cleaning sheet 211 and the annular end surface of the conductive ring H.

The driving member 33 includes a driving wheel 330 synchronously connected with the cleaning arm 32, a power wheel 331, a timing belt 332, and a tension adjuster 333 for adjusting the surface tension of the timing belt 332, wherein the power wheels 331 of the two cleaning groups are distributed in a staggered manner in the thickness direction of the cleaning tank 1. By the arrangement, the side face of the cleaning groove can be kept flat in the assembling process, so that the whole cleaning groove is flattened, and the volume of the automatic cleaning equipment is reduced.

Meanwhile, a pointer for identification is further provided on the surface of the wheel disc of the driving wheel 330. The arrangement is convenient for indicating that the driving wheel is in a normal working state.

In addition, the cleaning unit 3 further includes a dust removing part 34 communicating with the cleaning chamber q, wherein the cleaning chamber q is in a negative pressure state when the conductive ring H is cleaned. The arrangement ensures the cleanness of the cleaning cavity in the cleaning process and avoids secondary pollution.

Specifically, the dust removing unit 34 includes a non-return chamber 340 formed on the bottom mold 13 and communicating with the cleaning chamber q, a negative pressure line 341 communicating with the non-return chamber 340, and a blower (not shown, but not shown) connected to an external end of the negative pressure line 341. When the fan works, negative pressure is formed in the cleaning cavity and the non-return cavity, and airflow is discharged from the negative pressure pipeline after sequentially passing through the cleaning cavity and the non-return cavity. Effectively preventing the sucked impurities from flowing back to cause secondary pollution to the conducting ring.

It should be noted that the two cleaning groups share one dust removing member 34.

In summary, the automatic cleaning method of the present embodiment includes the following steps:

s1, conveying the cleaning pieces 21 from the supply channel 20 to the connecting channel 30, and simultaneously, automatically supplementing the cleaning pieces 21 in the supply channel 20 downwards;

s2, inserting the carrier J loaded with the conductive ring H into the cleaning cavity q from the carrier inserting opening k1, wherein the center of the conductive ring H is aligned with the rotating center of the cleaning arm 32;

s3, driving the cleaning arm 32 to rotate around the rotation center, so that the picking and placing end part b can be matched with the connecting channel 30, and picking out the cleaning piece 21, wherein at the moment, a cleaning surface formed by the cleaning piece 21 is attached to the annular end surface of the conducting ring H, and the cleaning piece 21 forms an annular motion track by the rotation of the cleaning arm 32, wherein the cleaning piece 21 grabbed on each picking and placing end part b rotates clockwise for 1 circle around the conducting ring H from the current position in the circumferential direction and rotates anticlockwise for 0.5 circle, so that the annular end surface of the conducting ring H is cleaned in a covering manner;

and S4, after cleaning is finished, matching the picking and placing end part b with the waste discharge channel 31, unloading the cleaning piece 21, and unloading the cleaning piece 21 from the waste discharge channel 31 and the waste discharge port k2 in sequence under the dead weight of the cleaning piece 21.

In summary, the present embodiment has the following advantages:

1. through the matching of the picking and placing end part of the cleaning arm with the linking channel and the waste discharge channel, the automatic feeding of cleaning pieces, the automatic cleaning of the conducting ring and the automatic discharge after cleaning are realized, and the automation degree is high;

2. the cleaning piece is driven by the rotation of the cleaning arm to complete the multi-path cleaning of the conducting ring, the operation is simple, the labor intensity of workers is effectively reduced, and the cleaning efficiency is high;

3. the conducting ring can be stably stressed in the cleaning process, the conducting ring is effectively prevented from being damaged, the service life of parts is prolonged, and the rejection rate and the production cost are reduced;

4. when waste is discharged, the used cleaning piece can be ensured to rapidly fall in the first two sections to avoid accumulation, and can smoothly roll out in the last section, so that the impact is reduced, and the impact deformation phenomenon caused in the falling process of the cleaning piece can be reduced;

5. by arranging the dust removal component, the cleanness of the cleaning cavity is ensured, impurities are not generated, and secondary pollution to the conducting ring caused by backflow of the sucked impurities is effectively prevented;

6. can be according to actual demand, through being close to each other or keeping away from between two blocks of groove panels, adjust the cleaning pressure of cleaning member to the conducting ring surface in a flexible way.

The present invention has been described in detail for the purpose of illustration and description, and it will be apparent to those skilled in the art that the invention can be practiced without limitation to such detail, and all changes and modifications that come within the spirit of the invention are desired to be protected.

Claims

1. An automatic cleaning apparatus adapted for use with a conductive loop that is an annular part and is secured to a carrier, the automatic cleaning apparatus comprising:

a cleaning tank formed with a cleaning cavity that mates with the carrier, wherein the cleaning cavity has a carrier insertion opening and a waste discharge opening;

a cleaning member supply unit which comprises a supply channel communicated with the cleaning cavity and cleaning members, wherein the supply channel can feed the cleaning members into the cleaning cavity one by one;

cleaning unit, it is including being located clean intracavity and with supply channel linked together link up the passageway, with the waste discharge passageway that the mouth is linked together of wasting discharge, have get put the tip and round horizontal direction pivoted clean arm, driving piece, wherein it has at least two to get to put the tip, and every get put the tip all can with link up the passageway or waste discharge passageway cooperation is in order to take out automatically or uninstall the cleaning piece, during the cleanness, the conducting ring is along with the carrier cartridge extremely clean chamber, the cleaning piece keeps being fixed a position get put the tip, clean arm rotates so that the cleaning piece winds the center of rotation annular motion of cleaning arm, just cleaning piece motion track will the clean cover of annular end face of conducting ring, accomplish multichannel cleanness in step the cleaning piece by get put the tip with waste discharge passageway links up the cooperation, and one by one the mouth of wasting discharge unloads out.

2. The automatic cleaning apparatus suitable for conductive loops according to claim 1, wherein: the center of rotation of the cleaning arm is aligned with the center of the conductive ring positioned in the cleaning chamber.

3. The automated cleaning apparatus suitable for conductive loops according to claim 1, wherein: the cleaning piece comprises a cleaning seat and a flexible cleaning sheet, wherein the cleaning seat is matched with the picking and placing end part to fix or separate from the picking and placing end part, and the flexible cleaning sheet can be attached to the annular end face of the conducting ring.

4. The automatic cleaning apparatus suitable for conductive loops according to claim 3, wherein: the cleaning arm is rotatably arranged on the side wall of the cleaning groove through a pivot, and the cleaning arm can adjust the deformation of the flexible cleaning sheet along the length direction of the pivot so as to change the friction force formed between the flexible cleaning sheet and the annular end surface of the conductive ring.

5. The automated cleaning apparatus suitable for conductive loops according to claim 4, wherein: clean groove including first groove panel and the second groove panel that is located both sides, be located the die block of bottom, be located the end mould at die block both ends, wherein first groove panel and second groove panel, die block, end mould constitute clean chamber, wherein clean arm install in the inner wall of first groove panel, just first groove panel is relative the second groove panel is relatively drawn close or is kept away from in order to adjust the deformation of flexible clean piece.

6. The automatic cleaning apparatus suitable for conductive loops according to claim 5, wherein: the cleaning unit further comprises a dust removal component communicated with the cleaning cavity, and when the conducting ring is cleaned, the cleaning cavity is in a negative pressure state.

7. The automated cleaning apparatus suitable for conductive loops according to claim 6, wherein: the dust removal part comprises a non-return cavity formed on the bottom die and communicated with the cleaning cavity, a negative pressure pipeline communicated with the non-return cavity and a fan.

8. The automatic cleaning apparatus suitable for conductive loops according to claim 5, wherein: and a guide wheel assembly is arranged on the inner wall of the end die, wherein the carrier is attached to the wheel surface of the guide wheel assembly from two opposite sides and is inserted into the cleaning groove in a vertically moving manner.

9. The automated cleaning apparatus suitable for conductive loops according to claim 1, wherein: the outlet of the joining channel and the inlet of the waste discharge channel are respectively provided with a joint part, wherein the joint part is in contraposition fit with the picking and placing end part, and the cleaning piece is fixed on the picking and placing end part or is unloaded from the waste discharge port under the self weight.

10. The automated cleaning apparatus suitable for conductive loops according to claim 9, wherein: the two picking and placing end parts are correspondingly arranged at two ends of the cleaning arm, and the distances from the two picking and placing end parts to the rotation center of the cleaning arm are equal.

11. The automatic cleaning apparatus suitable for conductive loops according to claim 1, wherein: the supply channel is in a serpentine shape from top to bottom, a blocking component is further arranged between an outlet of the supply channel and an inlet of the connecting channel, the cleaning pieces are stacked in the supply channel, the blocking component forms a supply valve, and when the picking and placing end portion is aligned and matched with the outlet of the connecting channel, the blocking component releases the cleaning pieces one by one and moves to the picking and placing end portion under self weight.

12. The automatic cleaning apparatus suitable for conductive loops according to claim 1, wherein: the waste discharge port is obliquely arranged from top to bottom, the linking channel and the waste discharge port are positioned on the same side of the cleaning groove, and the extension directions of the linking channel and the waste discharge port are intersected.

13. The automatic cleaning apparatus suitable for conductive loops according to claim 6, wherein: an auxiliary channel is further arranged at the bottom of the waste discharge port, wherein the auxiliary channel comprises a first section extending obliquely downwards from the waste discharge port, a second section extending vertically downwards from the lower end of the first section, and a third section extending horizontally from the lower end of the second section, and the joint between every two adjacent sections of the first section, the second section, and the third section is arc-shaped.

14. The automatic cleaning apparatus for conductive loops according to any one of claims 1 to 13, wherein: the cleaning member supply unit and the cleaning unit constitute a cleaning group, and the automatic cleaning apparatus includes two cleaning groups symmetrically arranged with respect to the cleaning chamber.

15. The automated cleaning apparatus suitable for conductive loops according to claim 14, wherein: and a first loading area and a second loading area which are symmetrically arranged are formed on two sides of the carrier, the two conducting rings are respectively arranged in the first loading area and the second loading area, and the two conducting rings are respectively cleaned on the annular end surface by the corresponding cleaning groups.

16. The automatic cleaning apparatus suitable for conductive loops as claimed in claim 15, wherein: the driving piece comprises a driving wheel, a power wheel and a synchronous belt which are synchronously connected with the cleaning arm, wherein the power wheels of the cleaning group are distributed in the thickness direction of the cleaning groove in a staggered manner.

17. A method for automatically cleaning a conductive ring is characterized in that: the cleaning method employs the automatic cleaning apparatus of any one of claims 1 to 16, and includes the steps of:

s1, conveying a cleaning piece from a supply channel to a connection channel, and automatically supplementing the cleaning piece in the supply channel downwards;

s3, driving the cleaning arm to rotate around the rotation center, so that the picking and placing end part can be matched with the connecting channel, and picking out the cleaning piece, wherein at the moment, a cleaning surface formed by the cleaning piece is attached to the annular end face of the conducting ring, and the cleaning piece is rotated by the cleaning arm, forms an annular motion track, and performs covering cleaning on the annular end face of the conducting ring;

and S4, after cleaning is finished, the picking and placing end part is matched with the waste discharge channel, the cleaning piece is unloaded, and at the moment, the cleaning piece is sequentially unloaded from the waste discharge channel and the waste discharge port under the dead weight.

18. The automated method for cleaning conductive loops as recited in claim 17, wherein: in S3, there are a plurality of pick-and-place ends, where a distance from each of the pick-and-place ends to a rotation center of the cleaning arm is a rotation radius, and multiple cleaning of the annular end surface of the conductive ring is performed under forward rotation or/and reverse rotation of the cleaning arm.