CN115165512A - Integrated device for sample wafer stable limiting and accurate temperature control - Google Patents
Integrated device for sample wafer stable limiting and accurate temperature control Download PDFInfo
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- CN115165512A CN115165512A CN202210646279.5A CN202210646279A CN115165512A CN 115165512 A CN115165512 A CN 115165512A CN 202210646279 A CN202210646279 A CN 202210646279A CN 115165512 A CN115165512 A CN 115165512A
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N1/00—Sampling; Preparing specimens for investigation
- G01N1/28—Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
- G01N1/30—Staining; Impregnating ; Fixation; Dehydration; Multistep processes for preparing samples of tissue, cell or nucleic acid material and the like for analysis
- G01N1/31—Apparatus therefor
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N1/00—Sampling; Preparing specimens for investigation
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Abstract
The invention belongs to the field of immunohistochemical staining of pathological sections and discloses an integrated device for sample wafer stable limiting and accurate temperature control, which comprises a sample wafer temperature control reaction cavity, a sample wafer taking assembly and a sample wafer limiting assembly, wherein the sample wafer taking assembly comprises a sample wafer pre-tightening spring; the sample wafer limiting assembly comprises a pre-tightening stepped guide sleeve; when the pre-tightening stepped guide sleeve is pressed, the pre-tightening pressing block can be pushed to move downwards to press the sample wafer, and the state of pressing the sample wafer is maintained; when the unlocking hook ring is pressed, the unlocking hook ring can be moved out from the middle step of the pre-tightening step guide sleeve, the pre-tightening pressing block is further driven to be away from the sample wafer, and the sealing sheet tilts the sample wafer under the action of the sample wafer pre-tightening spring, so that the sample wafer is convenient to take. According to the invention, the detailed structure of each component, the arrangement mode of each component and the like are improved, so that the sample wafer can be ensured to be tightly attached to the sample wafer temperature control reaction cavity, the full reaction with the reagent at the accurate temperature is realized, the immunohistochemical experiment is completed, and the sample wafer can be easily taken down after the reaction is completed.
Description
Technical Field
The invention belongs to the field of immunohistochemical staining of pathological sections, and particularly relates to an integrated device for sample wafer stable limiting and accurate temperature control.
Background
The immunohistochemical staining instrument can replace experimenters to carry out immunohistochemical experiments to finish the automatic staining process of pathological sections fixed on a sample, is an instrument for automatically finishing immunohistochemical staining operation, and needs to realize accurate control of parameters such as reaction temperature, reaction reagent amount, reaction time and the like of the sample. Sample wafer heating reaction unit is the core part of immunohistochemical staining appearance, and traditional immunohistochemical staining appearance is provided with solitary hot plate and sample wafer holding frame, and sample wafer holding frame front end sets up the sample wafer stopper, and the hot plate top generally be with the same rectangle chamber of sample wafer size, and the sample wafer holding frame is bottom hollow out construction, and is the plastic products in order to reduce calorific loss.
When an experiment is carried out, a sample wafer attached with pathological sections is placed in a sample wafer clamping frame, the longitudinal position of the sample wafer is limited by a sample wafer limiting block, but the distance between the limiting end face of the sample wafer limiting block and the sample wafer is larger, and the actual sample wafer can be lifted up in the vertical direction when acted by a suction disc in the experiment process, and can fall down again to fall onto the sample wafer clamping frame, so that the experiment can not be carried out normally; after the experiment is finished, the experimenter needs to lift up the sample wafer clamping frame and jack up the sample wafer from the hollow bottom of the sample wafer clamping frame so as to finish taking the sample wafer, and the operation is very inconvenient; in addition, the clamping frame bottom hollow structure enables the sample wafer to be in contact with the hot plate to achieve temperature control, but actually the sample wafer is not tightly attached to the hot plate, the actual temperature of the sample wafer is greatly different from the set temperature, and the material of the sample wafer is usually silicate glass with extremely poor heat conductivity, so that the temperature difference of the surface of the same sample wafer is also very large, and the consistency of the immunohistochemical experiment results is extremely poor; because sample wafer holding frame bottom hollow out construction, the experiment adds reagent and only keeps there being thin one deck on the sample wafer surface, a large amount of reagent all reveals the loss, there is the extravagant and then the unable problem of fully reacting of obvious reagent, and bottom confined holding frame is because need be connected with the hot plate, there is the installation clearance, sample wafer actual temperature is great with the given temperature difference, and holding frame thickness dimension is too big, sample wafer temperature variation is slow, the reaction time is long, and the deviation of reaction process and theoretical design process is very big, can't guarantee the uniformity of experimental result.
Therefore, an integrated device for sample wafer stable limiting and accurate temperature control needs to be designed, the problems are solved, accurate control of immunohistochemical experiments is achieved, excellent experiment results are obtained, and convenience is brought to experimenters to take sample wafers.
Disclosure of Invention
Aiming at the defects or improvement requirements of the prior art, the invention aims to provide an integrated device for sample wafer stable limiting and accurate temperature control, wherein the detailed structure and the arrangement mode of each component are improved, particularly, a sample wafer taking assembly and a sample wafer limiting assembly with specific structures are designed, the sample wafer taking assembly can pop out a sample wafer to complete the taking of the sample wafer after the immunohistochemical dyeing is completed by utilizing the matching effect of the sample wafer taking assembly and the sample wafer limiting assembly, and the sample wafer limiting assembly can enable the sample wafer to be tightly attached to a sample wafer temperature control reaction cavity in the immunohistochemical dyeing process, so that the accurate control of the temperature in the reaction process is realized. When the device is applied, the sample wafer can be tightly attached to the sample wafer temperature control reaction cavity, the sample wafer can fully react with the reagent at a precise temperature, the immunohistochemical experiment is completed, and the sample wafer can be easily taken down after the reaction is completed.
In order to achieve the above object, according to one aspect of the present invention, there is provided an integrated device for sample wafer stable limiting and precise temperature control, which is characterized by comprising a sample wafer temperature control reaction chamber, a sample wafer taking assembly and a sample wafer limiting assembly, wherein:
the sample temperature control reaction cavity adopts a cavity with a preset shape and is used for placing a sample and accommodating a reagent reacting with the sample; the bottom of the cavity is pressed and embedded with a heating component and a temperature sensor, so that no gap exists between the cavity and the heating component and between the cavity and the temperature sensor, and an integrated structure is formed;
the sample taking assembly is arranged at the bottom of the chamber and comprises a sample pre-tightening spring, a sealing sheet and a sealing ring, wherein one end of the sample pre-tightening spring is connected with a blind hole formed in the bottom of the chamber, and the other end of the sample pre-tightening spring is connected with the sealing sheet; the sealing ring is arranged on the hole edge of the blind hole; the sealing sheet can be contacted with the sealing ring when the sample pre-tightening spring is compressed, so that the blind hole is tightly sealed; when the sealing sheet seals the blind hole, the bottom surface of the cavity is completely sealed, so that reagent leakage can be avoided;
the sample wafer limiting assembly comprises a sample wafer limiting moving base and a pre-tightening stepped guide sleeve vertically arranged in the sample wafer limiting moving base; the pre-tightening stepped guide sleeve is designed in a stepped mode with large outer diameters at two ends and small outer diameter at the middle part, is arranged in a guide hole of the sample wafer limiting movement base and can axially move along the hole wall of the guide hole; the upper end surface of the pre-tightening stepped guide sleeve is an outer edge end surface and is always positioned on the upper surface of the sample wafer limiting movement base; a longitudinal unlocking compression spring is arranged between the upper end surface of the pre-tightening stepped guide sleeve and the upper surface of the sample wafer limiting movement base; the longitudinal unlocking compression spring can provide elasticity, so that the pre-tightening stepped guide sleeve moves upwards along the hole wall of the guide hole to realize longitudinal reset;
an unlocking shackle is further transversely arranged in the sample wafer limiting movement base, and the pre-tightening stepped guide sleeve penetrates through the unlocking shackle; the pre-pressing end face of the unlocking shackle is connected with the sample wafer limiting motion base through a transverse unlocking compression spring; the unlocking shackle can be limited at the middle step position of the pre-tightening step guide sleeve, so that the longitudinal position of the pre-tightening step guide sleeve is kept fixed, and the limitation can be removed and the longitudinal reset can be triggered by transversely unlocking the compression spring;
the lower part of the pre-tightening stepped guide sleeve is also connected with a pre-tightening guide pillar and a pre-tightening pressing block; the interior of the pre-tightening stepped guide sleeve is provided with a stepped hole, and a pre-tightening guide pillar is nested in the stepped hole of the pre-tightening stepped guide sleeve, extends out of the lower end face of the pre-tightening stepped guide sleeve and is connected with a pre-tightening pressing block; the bottom end face of the pre-tightening pressing block is used for contacting with a sample wafer; a pre-tightening compression spring is further installed in the stepped hole of the pre-tightening stepped guide sleeve; the upper end of the pre-tightening guide pillar is kept in a relatively fixed position with the upper end face of the pre-tightening stepped guide sleeve through the pre-tightening compression spring;
the top of the inner hole of the pre-tightening stepped guide sleeve is provided with an internal thread, the top is also provided with a pre-tightening compression spring limiting shaft, and the pre-tightening force of the pre-tightening compression spring can be regulated and controlled by regulating the mounting height of the pre-tightening compression spring limiting shaft in the inner hole of the pre-tightening stepped guide sleeve;
the sample wafer limiting assembly is used for matching with the sample wafer taking assembly to work; when the pre-tightening stepped guide sleeve is pressed, the pre-tightening guide pillar can be pushed to drive the pre-tightening pressing block to move downwards and press the sample wafer, and meanwhile, the unlocking hook ring is clamped at the middle step of the pre-tightening stepped guide sleeve to realize axial limiting, so that the pre-tightening pressing block can maintain the state of pressing the sample wafer; when pressing the unblock shackle can make the unblock shackle is followed the middle part ladder department of pretension ladder guide pin bushing shifts out, and then makes pretension ladder guide pin bushing drive under vertical unblock compression spring's the pretension briquetting is kept away from the sample piece, the gasket is in with the sample piece perk under the effect of sample piece pretension spring to be convenient for take of sample piece.
As a further preferable mode of the present invention, when the sample wafer limiting assembly compresses the sample wafer, the guide hole is in a vertical state and coaxial with the blind hole.
As a further preferred aspect of the present invention, the pre-tightening compression spring limiting shaft is provided with a mounting groove of a preset shape so as to adjust the mounting height of the pre-tightening compression spring limiting shaft in the inner hole of the pre-tightening stepped guide sleeve; more preferably, the mounting groove of the preset shape is a straight groove or an inner hexagonal groove.
As a further preferable mode of the invention, the bottom of the pre-tightening pressing block is provided with an end face with a diameter larger than that of the guide hole, so that the longitudinal position of the pre-tightening pressing block is limited to realize longitudinal reset, and the pre-tightening stepped guide sleeve is prevented from directly popping out of the guide hole in the vertical direction.
As a further optimization of the invention, the end face of the pre-tightening pressing block is a circular face with the diameter of 5-8mm, so that the pre-tightening pressing block is tightly attached to the sample wafer and the sample wafer taking assembly is ensured not to overturn in a compression state.
As a further preferable mode of the present invention, the unlocking shackle is provided with a semicircular locking hook which can be locked on the pre-tightening stepped guide sleeve to limit axial movement of the pre-tightening stepped guide sleeve.
As a further preferred aspect of the present invention, for the sample wafer limiting assembly, the sample wafer limiting movement base has 2 arms extending outward, and the 2 arms are provided with concentric shafts, and are installed on the sample wafer temperature-controlling reaction chamber in a matching manner, so that the sample wafer limiting movement base can rotate, and thus the position of the sample wafer limiting movement base can be switched.
As a further preferable mode of the invention, a transition fillet or a chamfer is further arranged above the middle step of the pre-tightening step guide sleeve.
As a further preferred aspect of the present invention, the chamber of the sample wafer temperature-control reaction chamber is rectangular, and mounting holes are formed around the chamber; three edges of the four edges of the sample wafer temperature control reaction cavity corresponding to the rectangle are provided with baffles as side walls, and the fourth edge is provided with a circular arc inclined plane with the height of 3 mm; the height of the arc inclined plane is not higher than that of the baffle plate, and the arc inclined plane can be used as a reagent blow-out port.
As a further preference of the invention, the thickness of the bottom of the chamber is not more than 8mm.
Through the technical scheme, compared with the prior art, the sample wafer taking assembly and the sample wafer limiting assembly which are designed by a specific structure are utilized, wherein the sample wafer taking assembly is provided with a sample wafer pre-tightening spring (the sample wafer pre-tightening spring is arranged in a blind hole at the bottom of a sample wafer temperature control reaction cavity and can be bounced to tilt the sample wafer); when the sample wafer limiting assembly is vertically placed, the sample wafer limiting assembly is positioned above the sample wafer taking assembly, and the sample wafer can be tightly pressed through the pre-tightening guide pillar and the pre-tightening pressing block to limit a reaction position; the sample wafer limiting assembly is provided with a pre-tightening stepped guide sleeve arranged in the sample wafer limiting movement base, and is matched with a longitudinal unlocking compression spring and a transversely arranged unlocking shackle, so that the unlocking shackle can be limited at the middle stepped position of the pre-tightening stepped guide sleeve, and can be released to realize longitudinal reset; and the sample wafer taking assembly and the sample wafer limiting assembly are matched, so that the sample wafer can be effectively controlled to be tightly pressed and attached to the bottom surface of the cavity for reaction or tilted so as to be conveniently taken (such as manually taken).
In general, the invention can achieve the following beneficial effects:
1. the sample wafer limiting assembly achieves stable limiting on the sample wafer by pressing the pre-tightening stepped guide sleeve, release of the pressed pre-tightening guide sleeve can be achieved by pressing the unlocking hook ring, and operation is extremely simple.
2. After pressing the unblock shackle, under the elasticity effect of taking assembly pretension spring and gasket through the sample piece, directly bounce the sample piece, the experimenter can easily will take out the sample piece.
3. Through adopting pressfitting technology embedding heating element and temperature sensor at sample piece reaction chamber cavity bottom, form the integral structure, guarantee that there is not the clearance between cavity and heating element and the hot plate, realize sample piece and hot plate zero clearance direct contact, ensure the reaction chamber temperature and set up the uniformity of temperature, realize the accurate accuse temperature to the hot plate.
4. Through making sample reaction chamber and hot plate into integral structure to set up reaction chamber bottom as enclosed construction (except the sample take the blind hole that the assembly corresponds, do not have other pore structures or hollow out construction), the sample is directly placed in the reaction intracavity, compares in the reaction chamber of bottom fretwork, thoroughly solves the reagent and reveals the problem. Taking a sample accommodating piece (the size of a glass slide is 25mm multiplied by 75mm multiplied by 1 mm) as an example, only a small amount of reagent (0.5 ml of reagent needs to be added at least; in addition, as another example, in order to ensure that the experimental process is more stable and consistent, 1.5ml of reagent can be added, and 3ml is needed for 2 times of addition) is needed to immerse the sample, so that the sample can be ensured to be fully reacted, and compared with a reaction cavity with a hollow structure at the bottom (1.5 ml of reagent needs to be added, 15ml is needed for 10 times of addition), the reagent using amount can be obviously saved, and the experimental cost is greatly reduced.
5. In addition, the thickness of the bottom of the reaction chamber can be preferably not more than 8mm, so that adverse effects such as slow temperature change of the chamber, poor temperature control precision and the like when the thickness is too large can be avoided, and accurate temperature control is performed on sample wafer reaction. In addition, can prefer to be provided with the high circular arc inclined plane of 3mm at the sample reaction chamber front end (the height of other lateral walls in reaction chamber is not less than this circular arc inclined plane), through the mode of nozzle gas blowing, can easily blow off intracavity reaction reagent from the inclined plane, thoroughly solve reagent and remain the problem. The height of the arc inclined plane is preferably 3mm, so that the reagent is convenient to blow out, the heating is also considered to accelerate the volatilization of the reagent when the immunohistochemical staining reaction of the pathological section is carried out under the heating condition, and if the height is too low, the amount of the reagent contained in the chamber is less, which is not favorable for the stable reaction; if the height is too high, the amount of reagent that can be contained in the chamber is large, and inevitably, more reagent will be wasted.
Drawings
FIG. 1 is a schematic structural diagram of a reaction in which a sample wafer is placed in a sample wafer temperature-controlled reaction chamber.
FIG. 2 is a schematic diagram of a sample wafer according to the present invention after reaction.
FIG. 3 is a schematic view of the sample temperature-controlled reaction chamber and the taking assembly of the present invention.
Fig. 4 is an exploded view of a sample wafer restraint assembly of the present invention.
Figure 5 is a cross-sectional view of a sample wafer restraint assembly of the present invention in a compressed state.
FIG. 6 is a cross-sectional view of a coupon limiting assembly of the present invention in an unlocked state.
The meanings of the reference symbols in the figures are as follows:
100-sample temperature-controlled reaction chamber, 101-chamber (i.e. sample temperature-controlled reaction chamber), 102-blind hole (i.e. sample temperature-controlled reaction chamber blind hole); 200-sample taking assembly, 21-sample pre-tightening spring, 22-sealing sheet and 23-sealing ring; 300-a sample limiting assembly, 31-a sample limiting motion base, 32-a pre-tightening stepped guide sleeve, 33-a pre-tightening compression spring limiting shaft, 34-a pre-tightening compression spring, 35-a pre-tightening guide pillar, 36-a pre-tightening pressing block, 37-a longitudinal unlocking compression spring, 38-an unlocking hook ring, 39-a transverse unlocking compression spring, 311-a concentric shaft, 312-a guide hole and 381-a semi-annular locking hook; 400-sample.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention is described in further detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention. In addition, the technical features involved in the embodiments of the present invention described below may be combined with each other as long as they do not conflict with each other.
As shown in fig. 1, the integrated device for sample stabilization, position limitation and accurate temperature control in the present invention includes a sample temperature control reaction chamber 100, a sample taking assembly 200 and a sample position limitation assembly 300, specifically:
as shown in fig. 3, the sample temperature-controlled reaction chamber 100 employs a chamber 101 having a preset shape for placing a sample and containing a reagent (e.g., a reagent capable of reacting with a pathological section on the surface of the sample, etc.) reacting with the sample. The sample wafer temperature control reaction chamber 100 is made of aluminum alloy, copper alloy, stainless steel and other materials with good thermal conductivity. The bottom of the cavity 100 is embedded with the heating component and the temperature sensor by adopting processes such as pressing and the like, so that no gap exists between the cavity and the heating component and between the cavity and the hot plate, an integrated structure is formed, and the thickness of the bottom of the cavity is not more than 8mm, so that the heat productivity of the heating component can be rapidly transferred to a sample wafer; even in the case of adding enough reaction reagent (taking the example of accommodating reagent amount of 3.5ml at most), the temperature can be raised from room temperature to 100 ℃ within 150s, and the fluctuation error of the reaction temperature is controlled to be not more than 1 ℃, so that the temperature can be accurately controlled in the sample reaction process.
In this embodiment, as shown in fig. 2 and 3, since the sample wafer 400 is rectangular (the size of the general sample wafer is 25mm × 75mm × 1 mm), the sample wafer temperature-controlled reaction chamber 101 is rectangular (the size is 25mm × 75mm × 1 mm)
) 2.5ml of reaction reagent can be accommodated at most, and the reagent can be completely kept in the chamber to react with the sample wafer because the bottom of the chamber 101 is sealed; the front end of the chamber is provided with a 3mm high circular arc bevel 103 to facilitate blowing off the reaction through a nozzle using an immunohistochemical staining instrumentA residual reagent; a blind hole 102 is arranged in the sample temperature control reaction chamber for installing a pre-tightening spring 21; in order to install the integrated device for stably limiting the sample wafer and accurately controlling the temperature on the table top of the immunohistochemical staining instrument, mounting holes are arranged around the integrated device.
As shown in fig. 3, the taking assembly 200 includes a sample preloading spring 21, a sealing piece 22, and a packing 23. The bottom of the sample pre-tightening spring 21 is connected with a blind hole 102 arranged in the sample temperature control reaction cavity 100, the top of the sample pre-tightening spring is connected with a sealing sheet 22, the sealing sheet 22 is in contact with a sealing ring 23 when the sample pre-tightening spring 21 is compressed, and the sealing ring 23 is installed in a groove at the periphery of the blind hole 102 of the sample temperature control reaction cavity to be fixed, so that the blind hole 102 is sealed when the sample is reacted, and no reagent is left.
As shown in fig. 4, 5, and 6, the specimen limit assembly 300 includes a specimen limit moving base 31, a pre-tightening stepped guide sleeve 32, a pre-tightening compression spring limit shaft 33, a pre-tightening compression spring 34, a pre-tightening guide post 35, a pre-tightening pressing block 36, a longitudinal unlocking compression spring 37, an unlocking shackle 38, and a transverse unlocking compression spring 39. The two ends of the sample wafer limiting motion base 31 are provided with concentric shafts 311 for being mounted on the sample wafer temperature control reaction chamber 100 to realize the rotation of the sample wafer limiting assembly 300, the sample wafer limiting motion base 31 is provided with guide holes 312 to realize the directional motion of the pre-tightening stepped guide sleeve 32, the top of an inner hole of the pre-tightening stepped guide sleeve is provided with internal threads for mounting the pre-tightening compression spring limiting shaft 33 and adjusting the height position of the pre-tightening compression spring limiting shaft, the pre-tightening compression spring limiting shaft 33 is contacted with the top of the pre-tightening compression spring 34, the bottom of the pre-tightening compression spring 34 is welded with the pre-tightening guide pillar 35 together, the bottom of the pre-tightening guide pillar 35 is provided with threads and matched with the pre-tightening press block 36, the bottom end face of the pre-tightening press block 36 is contacted with the sample wafer 400 to press the sample wafer 400, the top of the pre-tightening stepped guide sleeve 32 is provided with an outer edge end face which is welded with the longitudinal unlocking compression spring 37 or connected with an embedded mode and the like to realize the longitudinal recovery to a natural state after unlocking, the middle of the pre-tightening stepped guide sleeve is provided with a step and an unlocking shackle 38, the unlocking pre-pressing end face which is fixedly connected with the transverse unlocking compression spring 39 in a glued mode, and the sample wafer limiting motion base 31 together.
In this embodiment, the sample piece position limiting movement base 31 can be made of a component with high rigidity, such as aluminum alloy, and can be prevented from being pushed away due to deformation in a pre-tightening state. As shown in fig. 1, the guide hole 312 of the sample limiting motion base is coaxial with the blind hole 102 in the sample temperature-controlled reaction chamber in the vertical state, so as to ensure that the sample limiting assembly 300 can be maintained in the vertical state without overturning when the sample 400 is in the pre-tightening state.
As shown in fig. 4, the upper part of the pre-tightening stepped guide sleeve should be provided with a transition fillet or chamfer, when the pre-tightening stepped guide sleeve 32 is pressed, the pre-tightening stepped guide sleeve can smoothly move longitudinally and downwards without being limited by the unlocking shackle 38, otherwise, the unlocking shackle 38 will be damaged. In addition, the thickness of the unlocking shackle 38 may be set to 2-3mm.
In this embodiment, as shown in fig. 5 and 6, the pre-tightening compression spring limiting shaft 33 is provided with a mounting groove (e.g., a straight groove or an inner hexagonal groove) with a certain shape, and the height of the mounting groove can be directly adjusted, so as to control the original compression length of the pre-tightening compression spring 34, thereby realizing the control of the pre-tightening force of the sample wafer and preventing the sample wafer from being longitudinally lifted in the immunohistochemical experiment process.
In this embodiment, as shown in fig. 5 and 6, the pre-tightening guide pillar 35 and the pre-tightening pressing block 36 may be made of metal or other materials that do not react with the reagents used in the experiment; as shown in fig. 3, the pre-tightening pressing block 36 is fixed on the pre-tightening guide post 35 through internal threads or interference fit, and the bottom of the pre-tightening pressing block is provided with an end surface with a diameter larger than that of the sample wafer limit motion base guide hole 31, after the unlocking shackle 38 is separated from the pre-tightening stepped guide sleeve 32, the pre-tightening stepped guide sleeve 32 drives the pre-tightening pressing block 36 to move longitudinally under the action of the longitudinal unlocking compression spring 37 until the end surface of the pre-tightening pressing block contacts the sample wafer limit motion base 31 to a reset state, so as to prevent the pre-tightening stepped guide sleeve 32 from directly popping out of the sample wafer limit motion base guide hole 312 in the vertical direction.
The end face of the pre-tightening pressing block 36 is a circular face with the diameter of 5-8mm, and is tightly attached to the sample wafer 400 under the pressure action of the pre-tightening compression spring 34, so that the sample wafer taking assembly 200 cannot be bounced off in the experimental process.
In this embodiment, as shown in fig. 4, the unlocking shackle 38 is provided with a semi-annular locking hook 381 clamped on the pre-tightening stepped guide sleeve 32 to limit the axial movement of the pre-tightening stepped guide sleeve 32. Plastics such as PEEK that have certain toughness can be selected to the unblock shackle for can not blocked by the unblock shackle when pretension ladder guide pin bushing longitudinal motion.
The use of the integrated temperature control device of the present invention will be described with reference to fig. 1, 2, 5 and 6. When an immunohistochemical experiment needs to be carried out, a sample wafer 400 attached with a pathological section is placed in the sample wafer temperature control reaction cavity 101, the sample wafer limiting movement base 31 is turned to be in a vertical state, the pre-tightening stepped guide sleeve 32 is pressed to hear a click sound, namely, the unlocking shackle 38 slides into a pre-tightening stepped guide sleeve step from the bottom of the pre-tightening stepped guide sleeve step, the pre-tightening stepped guide sleeve step is pressed under the pressure action of the transverse unlocking compression spring 39, the pre-tightening pressing block 36 presses the sample wafer 400 at the moment, the pre-tightening pressing block 36 keeps in a pressing state under the pre-tightening pressure action of the pre-tightening compression spring 34, the pre-tightening compression spring 34 is continuously pressed, the pre-tightening compression spring 34 can be further compressed and even can slide out of the pre-tightening stepped guide sleeve step, and after loosening, the unlocking shackle 38 can immediately slide into the pre-tightening stepped guide sleeve step and restore to a normal pressing state. When the experiment is finished and the sample needs to be taken, residual reagent in the sample temperature control reaction cavity is blown away by an air nozzle carried by the immunohistochemical staining instrument, the unlocking shackle 38 is pressed to be separated from the pre-tightening stepped guide sleeve in a stepped mode, the pre-tightening stepped guide sleeve 32 is vertically upwards ejected along the guide hole 312 of the sample position limiting movement base under the action of the longitudinal unlocking compression spring 37, the pre-tightening pressing block 36 is driven to be far away from the sample 400, the end face of the pre-tightening pressing block 36 is attached to the end face of the sample position limiting movement base, namely, the initial position is recovered, the sample position limiting movement base is rotated out of the sample temperature control reaction cavity 101, the sealing sheet 22 is ejected under the action of the pre-tightening spring 21, the sample 400 is tilted, and the sample 400 is taken manually.
It will be understood by those skilled in the art that the foregoing is only a preferred embodiment of the present invention, and is not intended to limit the invention, and that any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the scope of the present invention.
Claims (10)
1. The utility model provides an integrated device of spacing and accurate accuse temperature is stabilized to sample, its characterized in that, includes sample accuse temperature reaction chamber (100), sample assembly (200) and the spacing assembly of sample (300), wherein:
the sample temperature control reaction cavity (100) adopts a cavity (101) with a preset shape and is used for placing a sample and accommodating a reagent reacting with the sample; the heating assembly and the temperature sensor are pressed and embedded in the bottom of the cavity (101), so that gaps do not exist between the cavity (101) and the heating assembly and between the cavity (101) and the temperature sensor, and an integrated structure is formed;
the sample taking assembly (200) is arranged at the bottom of the chamber (101) and comprises a sample pre-tightening spring (21), a sealing piece (22) and a sealing ring (23), wherein one end of the sample pre-tightening spring (21) is connected with a blind hole (102) formed in the bottom of the chamber (101), and the other end of the sample pre-tightening spring is connected with the sealing piece (22); the sealing ring (23) is arranged at the hole edge of the blind hole (102); the sealing sheet (22) can be in contact with the sealing ring (23) when the sample pre-tightening spring (21) is compressed, so that the blind hole (102) is tightly closed; when the sealing sheet (22) closes the blind hole (102), the bottom surface of the cavity (101) is completely closed, so that the leakage of a reagent can be avoided;
the sample limiting assembly (300) comprises a sample limiting moving base (31) and a pre-tightening stepped guide sleeve (32) vertically arranged in the sample limiting moving base (31); the pre-tightening stepped guide sleeve (32) adopts a stepped design with large outer diameters at two ends and small outer diameter at the middle part, and the pre-tightening stepped guide sleeve (32) is arranged in a guide hole (312) of the sample wafer limiting movement base (31) and can realize axial movement along the hole wall of the guide hole (312); moreover, the upper end surface of the pre-tightening stepped guide sleeve (32) is an outer edge end surface and is always positioned on the upper surface of the sample wafer limiting movement base (31); a longitudinal unlocking compression spring (37) is arranged between the upper end surface of the pre-tightening stepped guide sleeve (32) and the upper surface of the sample wafer limiting movement base (31); the longitudinal unlocking compression spring (37) can provide elasticity, so that the pre-tightening stepped guide sleeve (32) moves upwards along the hole wall of the guide hole (312) to realize longitudinal reset;
an unlocking shackle (38) is further transversely arranged in the sample wafer limiting movement base (31), and the pre-tightening stepped guide sleeve (32) penetrates through the unlocking shackle (38); the unlocking shackle pre-pressing end face is connected with the sample wafer limiting movement base (31) through a transverse unlocking compression spring (39); the unlocking shackle (38) can be limited at the middle step position of the pre-tightening step guide sleeve (32), so that the longitudinal position of the pre-tightening step guide sleeve (32) is kept fixed, and the limitation can be removed and the longitudinal reset can be triggered by a transverse unlocking compression spring (39);
the lower part of the pre-tightening stepped guide sleeve (32) is also connected with a pre-tightening guide post (35) and a pre-tightening pressing block (36); a step-shaped hole is formed in the pre-tightening stepped guide sleeve (32), and a pre-tightening guide post (35) is nested in the step-shaped hole of the pre-tightening stepped guide sleeve (32), extends out of the lower end face of the pre-tightening stepped guide sleeve (32), and is connected with a pre-tightening pressing block (36); the bottom end face of the pre-tightening pressing block (36) is used for being in contact with a sample wafer; a pre-tightening compression spring (34) is also arranged in the stepped hole of the pre-tightening stepped guide sleeve (32); the upper end of the pre-tightening guide post (35) and the upper end surface of the pre-tightening stepped guide sleeve (32) keep a relatively fixed position through the pre-tightening compression spring (34);
moreover, the top of the inner hole of the pre-tightening stepped guide sleeve is provided with an internal thread, the top is also provided with a pre-tightening compression spring limiting shaft (33), and the pre-tightening force of the pre-tightening compression spring (34) can be regulated and controlled by adjusting the installation height of the pre-tightening compression spring limiting shaft (33) in the inner hole of the pre-tightening stepped guide sleeve;
the sample limiting assembly (300) is used for matching with the sample taking assembly (200) to work; when the pre-tightening stepped guide sleeve (32) is pressed, the pre-tightening guide post (35) can be pushed to drive the pre-tightening pressing block (36) to move downwards and press the sample wafer, meanwhile, the unlocking hook ring (38) is clamped at the middle step of the pre-tightening stepped guide sleeve (32) to realize axial limiting, and the pre-tightening pressing block (36) can maintain the state of pressing the sample wafer; when the unlocking hook ring (38) is pressed, the unlocking hook ring (38) can be moved out from the middle step of the pre-tightening step guide sleeve (32), so that the pre-tightening step guide sleeve (32) drives the pre-tightening pressing block (36) to be away from the sample wafer under the action of the longitudinal unlocking compression spring (38), and the sealing sheet (22) tilts the sample wafer under the action of the sample wafer pre-tightening spring (21), so that the sample wafer is convenient to take.
2. The integrated device for sample stabilization and limiting and precise temperature control according to claim 1, wherein the guide hole (312) is in a vertical state and coaxial with the blind hole (102) when the sample limiting assembly (300) compresses the sample (400).
3. The integrated device for sample wafer stable limit and precise temperature control according to claim 1, wherein the pre-tightening compression spring limit shaft (33) is provided with a mounting groove with a preset shape so as to adjust the mounting height of the pre-tightening compression spring limit shaft (33) in the inner hole of the pre-tightening stepped guide sleeve; more preferably, the mounting groove with the preset shape is a straight groove or an inner hexagonal groove.
4. The integrated device for sample wafer stable limit and precise temperature control according to claim 1, wherein the bottom of the pre-tightening pressing block (36) is provided with an end face with a diameter larger than that of the guide hole (312) so as to limit the longitudinal position of the pre-tightening pressing block (36) to realize longitudinal reset and prevent the pre-tightening stepped guide sleeve (32) from directly popping out of the guide hole (312) in the vertical direction.
5. The integrated device for sample wafer stable limit and accurate temperature control according to claim 1, wherein the end face of the pre-tightening pressing block (36) is a circular face with a diameter of 5-8mm, so as to realize tight fit with the sample wafer (400) and ensure that the sample wafer taking assembly (200) does not overturn in a compressed state.
6. The integrated device for sample wafer stable limit and precise temperature control according to claim 1, wherein the unlocking shackle (38) is provided with a semi-annular locking hook (381) which can be clamped on the pre-tightening stepped guide sleeve (32) to limit the axial movement of the pre-tightening stepped guide sleeve (32).
7. The integrated device for sample stability limitation and precise temperature control according to claim 1, wherein for the sample limitation assembly (300), the sample limitation motion base (31) has 2 arms extending outwards, and the 2 arms are provided with concentric shafts (311) and are installed on the sample temperature control reaction chamber (200) in a matching manner, so that the sample limitation motion base (31) can rotate to switch the position.
8. The integrated device for sample wafer stable limit and precise temperature control according to claim 1, wherein a transition fillet or chamfer is further provided above the middle step of the pre-tightening step guide sleeve (32).
9. The integrated device for sample stabilization and position limitation and precise temperature control according to claim 1, wherein the chamber (101) of the sample temperature control reaction chamber is rectangular, and mounting holes are formed in the periphery of the chamber; baffles are arranged on three sides of the four sides corresponding to the rectangle of the sample wafer temperature control reaction cavity (100) as side walls, and an arc inclined plane (103) with the height of 3mm is arranged on the fourth side; the height of the arc inclined plane (103) is not higher than the baffle plate, and the arc inclined plane can be used as a reagent blow-out port.
10. The integrated apparatus for sample stability and temperature control as claimed in claim 1, wherein the thickness of the bottom of the chamber (101) is not more than 8mm.
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| CN202210646279.5A CN115165512B (en) | 2022-06-08 | 2022-06-08 | Integrated device for stabilizing, limiting and accurately controlling temperature of sample wafer |
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| CN115165512B (en) | 2024-04-16 |
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