CN115121536A - Imprint template cleaning and recycling method and device - Google Patents
Imprint template cleaning and recycling method and device Download PDFInfo
- Publication number
- CN115121536A CN115121536A CN202210728653.6A CN202210728653A CN115121536A CN 115121536 A CN115121536 A CN 115121536A CN 202210728653 A CN202210728653 A CN 202210728653A CN 115121536 A CN115121536 A CN 115121536A
- Authority
- CN
- China
- Prior art keywords
- template
- cleaning
- imprinting
- imprint
- imprint template
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 88
- 238000000034 method Methods 0.000 title claims abstract description 53
- 238000004064 recycling Methods 0.000 title claims abstract description 25
- 239000007788 liquid Substances 0.000 claims abstract description 41
- 238000010438 heat treatment Methods 0.000 claims abstract description 14
- 238000002791 soaking Methods 0.000 claims abstract description 11
- 238000001816 cooling Methods 0.000 claims abstract description 10
- 230000001680 brushing effect Effects 0.000 claims abstract description 6
- 238000007654 immersion Methods 0.000 claims description 10
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 claims description 9
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 claims description 9
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 9
- 238000011084 recovery Methods 0.000 claims description 7
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 claims description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 6
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 claims description 6
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 5
- 229910052731 fluorine Inorganic materials 0.000 claims description 5
- 239000011737 fluorine Substances 0.000 claims description 5
- 238000005470 impregnation Methods 0.000 claims description 4
- 230000000181 anti-adherent effect Effects 0.000 claims description 2
- 238000005406 washing Methods 0.000 claims 1
- 238000004049 embossing Methods 0.000 abstract description 4
- 238000004519 manufacturing process Methods 0.000 abstract description 3
- 239000003292 glue Substances 0.000 description 20
- 229910052594 sapphire Inorganic materials 0.000 description 7
- 239000010980 sapphire Substances 0.000 description 7
- 239000000758 substrate Substances 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 3
- 239000012530 fluid Substances 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000009616 inductively coupled plasma Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000002411 adverse Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- CTIKAHQFRQTTAY-UHFFFAOYSA-N fluoro(trimethyl)silane Chemical compound C[Si](C)(C)F CTIKAHQFRQTTAY-UHFFFAOYSA-N 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000013519 translation Methods 0.000 description 1
- AKIOHULKHAVIMI-UHFFFAOYSA-N trichloro(1,1,2,2,3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,11,11,12,12,12-pentacosafluorododecyl)silane Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)[Si](Cl)(Cl)Cl AKIOHULKHAVIMI-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
-
- B08B1/12—
-
- B08B1/20—
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
- B08B7/0064—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by temperature changes
Abstract
The invention relates to the technical field of micro-nano device manufacturing, and particularly discloses a method and a device for cleaning and recovering an imprint template. The imprint template cleaning and recycling method comprises the following steps: s1, performing heat treatment of firstly heating and then cooling the imprinting template to enable the residues on the imprinting template to generate a gap with the imprinting template; s2, soaking the imprinting template in the impregnating solution to dissolve residues on the imprinting template; s3, placing the imprinting template in a groove body, and sucking the imprinting template through a sucking mechanism; brushing the stamping template through a cleaning mechanism to separate the stamping template from residues; and dripping the cleaning solution through a liquid pipeline to soak the imprinting template. The method for cleaning and recovering the embossing template is simple and convenient to use, so that the embossing template can be recovered, the embossing template can be reused, and the rejection cost is reduced. Meanwhile, after the imprinting template is cleaned, the stability and consistency of the product are better.
Description
Technical Field
The invention relates to the technical field of micro-nano device manufacturing, in particular to a method and a device for cleaning and recovering an imprint template.
Background
At present, the imprinting technology is a technology for transferring micro-nano patterns on a substrate to a sapphire plain film by a physical contact method. Firstly, preparing a required pattern on a template, coating mixed hardened glue on the template to prepare an imprinting soft film, then coating the imprinting soft film on the surface of a sapphire plain film to be processed, pressing the imprinting soft film on the surface of the imprinting soft film, and then directly transferring the pattern to a photoresist film formed by the imprinting soft film in a pressurizing mode, wherein the imprinting soft film has no optical limitation, the exposure and development processes are omitted, and finally, the sapphire is etched by using an ICP (inductively coupled plasma) etching technology to finally obtain a high-precision sapphire substrate.
However, in mass production, the variation of the pattern of the imprinting soft film is caused by the residue of the hybrid hardened glue on the top of the template pattern, so that the compliance of glue columns on the sapphire flat sheet is reduced, and finally, the etching pattern is adversely affected. Therefore, in general, when the pattern on the template is distorted, the template can only be discarded, which further increases the cost.
Disclosure of Invention
The invention aims to provide a method and a device for cleaning and recovering an imprint template, which aim to solve the problem that in the prior art, when a pattern on the template is distorted, the template can only be scrapped, so that the cost is increased.
In order to achieve the purpose, the invention adopts the following technical scheme:
in one aspect, the present invention provides an imprint template cleaning and recovering method, including the steps of:
s1, performing heat treatment of firstly heating and then cooling the imprinting template to enable the residues on the imprinting template to generate a gap with the imprinting template;
s2, soaking the imprinting template in an impregnating solution to dissolve the residues on the imprinting template;
s3, placing the imprinting template in a groove body, and sucking the imprinting template through a suction mechanism; brushing the stamping template through a cleaning mechanism to separate the stamping template from the residues; wherein, a cleaning solution is dripped through the liquid pipeline to soak the imprinting template.
As an alternative of the method for cleaning and recovering the imprint template, in step S1, the temperature range of the imprint template after being heated is 150-180 ℃, the time consumed by the heating process is less than 5min, and the imprint template is kept warm for 5-10 min; the temperature range of the imprinting template after cooling is 10-15 ℃, and the time of the cooling process is 8-10 min.
As an alternative to the imprint template cleaning and recovering method, in step S1, the heat treatment process of the imprint template, in which the temperature is raised first and then lowered, is performed in a cycle, and the number of cycles is greater than 3.
As an alternative of the imprint template cleaning and recovering method, the time for immersing the imprint template in the immersion liquid is longer than 15 min.
As an alternative to the above-described imprint template cleaning and recovery method, after step S3, the method further includes the steps of:
and S4, soaking the imprinting template in an anti-sticking solution, and baking the soaked imprinting template to enable the imprinting template to be subjected to anti-sticking treatment.
As an alternative of the method for cleaning and recovering the stamping template, the immersion time of the stamping template in the anti-mucus is more than 20 min; the baking temperature range of the stamping template after soaking is 60-80 ℃, and the baking time range is 50-70 min.
As an alternative of the method for cleaning and recovering the imprint template, the anti-adhesive liquid is a fluorine-containing organic molecule solution.
As an alternative of the method for cleaning and recovering the imprint template, the impregnation solution is a benzene solution, a toluene solution, an ether solution, a chloroform solution, a dichloromethane solution or a carbon tetrachloride solution.
In another aspect, the present invention provides a cleaning and recovering apparatus for cleaning and recovering the imprint template, the cleaning and recovering apparatus being used in the imprint template cleaning and recovering method, the cleaning and recovering apparatus including the tank body and:
the suction mechanism is arranged in the groove body and is used for sucking the imprinting template;
the cleaning mechanism is arranged above the stamping template at intervals; the cleaning mechanism comprises a first supporting arm, the liquid pipeline, a first rotating motor and a brush, wherein the first rotating motor is arranged on the first supporting arm; the driving end of the first rotating motor is connected with the brush and is used for driving the brush to rotate so as to brush the embossing template; the opening of the liquid pipeline is arranged in the hairbrush and used for dripping the cleaning liquid.
As an alternative of the above cleaning and recovering device, the suction mechanism includes a second support arm, a second rotating electric machine, and a vacuum chuck, and the second rotating electric machine is provided on the second support arm; the driving end of the second rotating motor is connected with the vacuum chuck and is used for driving the vacuum chuck to rotate; the vacuum chuck is used for sucking the imprinting template.
The beneficial effects of the invention are as follows:
the imprint template cleaning and recycling method is simple and convenient to use, firstly heats the imprint template, then cools the imprint template, and after the imprint template is soaked in the impregnating solution, the imprint template can be placed in the groove body, and after the imprint template is sucked by the suction mechanism, the imprint template is brushed by the cleaning mechanism, so that the imprint template can be automatically cleaned, and further the imprint template can be recycled, so that the imprint template can be reused, and the scrapped cost can be reduced. Meanwhile, after the imprinting template is cleaned, the stability and consistency of the product are better.
The cleaning and recycling device of the invention is used in the method for cleaning and recycling the imprint template, and comprises a groove body, a suction mechanism and a cleaning mechanism. The suction mechanism is arranged in the groove body and used for sucking the imprinting template so as to ensure the stability of the imprinting template on the cleaning mechanism and avoid the imprinting template from shaking in the cleaning process. The cleaning mechanism is arranged above the stamping template at intervals so as to clean the stamping template conveniently. Wherein, cleaning mechanism includes first support arm, liquid pipeline, first rotating electrical machines and brush, and first rotating electrical machines locates on the first support arm, and the brush is connected to first rotating electrical machines's drive end for it is rotatory to drive the brush, in order to scrub the platen, thereby washes away the residue on the platen, realizes the cleanness to the platen. Meanwhile, the opening of the liquid pipeline is arranged in the hairbrush and used for dripping out cleaning liquid, so that the stamping template is infiltrated through the cleaning liquid, the gap between the stamping template and the residues can be enlarged, the brushing effect of the hairbrush on the stamping template is enhanced, the condition that the stamping template can only be scrapped is avoided, and the scrapping cost is reduced.
Drawings
FIG. 1 is a schematic flow chart of a cleaning and recycling method according to an embodiment of the present invention;
FIG. 2 is a schematic flow chart of another cleaning and recycling method according to an embodiment of the present invention;
FIG. 3 is an SEM test chart of the glue column distortion caused by the contamination of the imprint template provided by the embodiment of the invention;
FIG. 4 is an SEM test chart of the gel column compliance after the imprint template is cleaned according to the embodiment of the invention;
FIG. 5 is a schematic structural diagram of an imprint template cleaning and recycling device according to an embodiment of the present invention.
In the figure:
1. a trough body; 11. a liquid discharge port; 2. a suction mechanism; 21. a second support arm; 22. a second rotating electrical machine; 23. a vacuum chuck; 3. a cleaning mechanism; 31. a first support arm; 32. a first rotating electrical machine; 33. a brush; 4. and (4) imprinting the template.
Detailed Description
The technical solutions of the present invention will be described clearly and completely with reference to the accompanying drawings, and it should be understood that the described embodiments are some, but not all embodiments of the present invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
In the description of the present invention, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", etc., indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, and are only for convenience of description and simplicity of description, but do not indicate or imply that the device or element being referred to must have a particular orientation, be constructed and operated in a particular orientation, and thus, should not be construed as limiting the present invention. Furthermore, the terms "first," "second," and the like are used for descriptive purposes only and are not to be construed as indicating or implying relative importance. Where the terms "first position" and "second position" are two different positions, and where a first feature is "over", "above" and "on" a second feature, the first feature is directly over and obliquely above the second feature, or simply means that the first feature is at a higher level than the second feature. A first feature being "under," "below," and "beneath" a second feature includes the first feature being directly under and obliquely below the second feature, or simply meaning that the first feature is at a lesser elevation than the second feature.
In the description of the present invention, it should be noted that, unless otherwise explicitly specified or limited, the terms "mounted," "connected," and "connected" are to be construed broadly and may be, for example, fixedly connected, detachably connected, or integrally connected; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meanings of the above terms in the present invention can be understood in a specific case to those of ordinary skill in the art.
Reference will now be made in detail to embodiments of the present invention, examples of which are illustrated in the accompanying drawings, wherein like or similar reference numerals refer to the same or similar elements or elements having the same or similar function throughout. The embodiments described below with reference to the accompanying drawings are illustrative only for the purpose of explaining the present invention, and are not to be construed as limiting the present invention.
The embodiment provides an imprint template cleaning and recycling method, which is used for cleaning and recycling an imprint template, and as shown in fig. 1, the imprint template cleaning and recycling method comprises the following steps:
s1, performing heat treatment of firstly heating and then cooling the imprinting template 4 to enable the residues on the imprinting template 4 to generate a gap with the imprinting template 4;
s2, soaking the imprinting template 4 in the impregnating solution to dissolve residues on the imprinting template 4;
s3, placing the imprinting template 4 in the groove body 1, and sucking the imprinting template 4 through the sucking mechanism 2; brushing the imprinting template 4 through the cleaning mechanism 3 to separate the imprinting template 4 from residues; wherein a cleaning fluid is dripped through the fluid line to wet the imprint template 4.
The cleaning and recycling method provided by the embodiment is simple and convenient to use, firstly heats the imprinting template 4, then cools the imprinting template, and the imprinting template 4 is soaked in the soaking solution, so that the imprinting template 4 can be placed in the groove body 1, after the imprinting template 4 is sucked by the suction mechanism 2, the imprinting template 4 is brushed by the cleaning mechanism 3, the imprinting template 4 is automatically cleaned, the imprinting template 4 can be recycled, the imprinting template 4 can be reused, and the scrapping cost is reduced. Meanwhile, after the imprinting template 4 is cleaned, the stability and consistency of the product are better.
The gap between the imprint template 4 and the residue can be enlarged by wetting the imprint template 4 with the cleaning solution. Optionally, the cleaning fluid is plasma water. Specifically, the residues are mixed hardened glue, and the method for cleaning and recovering the imprint substrate can clean the residual mixed hardened glue on the inherent pattern of the imprint template 4. Of course, the residue may be other types of residue to be removed, and this embodiment is not particularly limited. Further optionally, the impregnation liquid is a benzene solution, a toluene solution, an ether solution, a chloroform solution, a dichloromethane solution, or a carbon tetrachloride solution, and then the impregnation liquid can enter the interior of the structure of the hybrid hardened glue, so that the hybrid hardened glue expands, and the hybrid hardened glue is further separated from the imprinting template 4.
In step S1, the temperature range of the heated imprint template 4 is 150-180 ℃, the time consumed in the heating process is less than 5min, and the imprint template 4 is kept warm for 5-10 min, so that the mixed hardened glue on the imprint template can soften and expand in the process, and a gap is formed between the imprint template and the mixed hardened glue. Further, the temperature range of the platen 4 after cooling is 10-15 ℃, and the cooling process takes 8-10 min, so that the mixed hardened glue can retract in the process, and the platen 4 is prevented from being broken in the process of expansion with heat and contraction with cold. Optionally, in step S1, the heat treatment process of the imprint template 4 that is performed by first heating and then cooling is performed in a cycle, and the cycle number is greater than 3 times, so that the process of generating the gap between the imprint template 4 and the hybrid hardened glue is more sufficient, and when the cycle number is less than or equal to 3 times, no gap or a small gap is generated between the imprint template 4 and the hybrid hardened glue.
Meanwhile, in step S2, the hybrid hardened glue can be dissolved away by immersing the imprint template 4 in the immersion liquid, and the gap between the hybrid hardened glue and the imprint template 4 can be increased, so that the hybrid hardened glue can be more easily detached from the imprint template 4. Optionally, the immersion time of the imprinting template 4 in the immersion liquid is longer than 15min, so that the mixed hardened glue on the imprinting template 4 is more fully contacted with the immersion liquid.
The present embodiment further provides another cleaning and recycling method, as shown in fig. 2, after step S3, the method further includes the following steps:
and S4, soaking the imprinting template 4 in the anti-sticking liquid, and baking the soaked imprinting template 4 to enable the imprinting template 4 to be subjected to anti-sticking treatment.
In step S4, the imprint template 4 is subjected to the anti-sticking process, so that another residue can be prevented from sticking to the imprint template 4 again. Optionally, the immersion time of the imprinting stamp 4 in the anti-sticking liquid is longer than 20min, so that the surface of the imprinting stamp 4 is in sufficient contact with the anti-sticking liquid to avoid that partial areas on the imprinting stamp 4 are not coated with the anti-sticking liquid when the imprinting stamp 4 is removed from the anti-sticking liquid. Meanwhile, the baking temperature range of the immersed imprinting template 4 is 60-80 ℃, and the baking time range is 50-70 min, so that the imprinting template 4 is ensured to be dried, the anti-sticking treatment of the imprinting template 4 is realized, and the influence on the subsequent use of the imprinting template 4 is avoided. Specifically, the anti-sticking liquid is a fluorine-containing organic molecule solution, the imprint template 4 from which the mixed hardened glue is removed is placed in a container containing the fluorine-containing organic molecule solution for soaking, then the imprint template 4 is taken out of the container and placed on a hot plate for baking, and then anti-sticking treatment on the imprint template 4 is achieved. Optionally, the fluorine-containing organic molecule solution is a trimethyl fluoro silane solution or a perfluoro dodecyl trichlorosilane solution.
Further, after the anti-sticking treatment of the imprint template 4, the functionality of the imprint template 4 is verified to ensure that the imprint template 4 can be used normally. Specifically, as shown in fig. 3 to 4, in the process of transferring the micro-nano pattern on the recovered imprinting substrate 4 onto the sapphire substrate, a Scanning Electron Microscope (SEM) is used to test the compliance of the glue column on the sapphire substrate, and then whether the pattern on the imprinting template 4 is distorted is determined, so as to ensure that the imprinting template 4 can be normally used.
The embodiment also provides a cleaning and recycling device which is used for cleaning and recycling the imprint template so as to recycle the imprint template.
As shown in fig. 5, the cleaning and recovering device includes a tank body 1, a suction mechanism 2, and a cleaning mechanism 3. The suction mechanism 2 is arranged in the groove body 1 and used for sucking the imprinting template 4, so that the stability of the imprinting template 4 on the cleaning mechanism 3 is ensured, and the imprinting template 4 is prevented from shaking in the cleaning process. The cleaning mechanism 3 is arranged above the imprinting template 4 at intervals so as to conveniently clean the imprinting template 4.
The cleaning mechanism 3 comprises a first support arm 31, a liquid pipeline, a first rotating motor 32 and a brush 33, the first rotating motor 32 is arranged on the first support arm 31, the driving end of the first rotating motor 32 is connected with the brush 33 and used for driving the brush 33 to rotate so as to brush the imprinting template 4, and therefore residues on the imprinting template 4 are brushed away, and the imprinting template 4 is cleaned. Meanwhile, the opening of the liquid pipeline is arranged in the hairbrush 33 and used for dripping out cleaning liquid, so that the imprinting template 4 is infiltrated through the cleaning liquid, the gap between the imprinting template 4 and the residues can be enlarged, the brushing effect of the hairbrush 33 on the imprinting template 4 is enhanced, the condition that the imprinting template 4 can only be scrapped is avoided, and the scrapping cost is reduced. Meanwhile, a liquid discharge port 11 is formed in the tank body 1, and the cleaning liquid can flow into the tank body 1 and flow out of the liquid discharge port 11.
Optionally, the distance between the brush 33 and the imprint template 4 is smaller than the distance between the opening of the liquid conduit and the imprint template 4, so as to ensure that the opening of the liquid conduit does not contact the imprint template 4 when the brush 33 contacts the imprint template 4, thereby avoiding the liquid conduit from being worn away after contacting the imprint template 4.
Further, the suction mechanism 2 includes a second support arm 21, a second rotating motor 22, and a vacuum chuck 23, and the second rotating motor 22 is provided on the second support arm 21. Vacuum chuck 23 is connected to the drive end of second rotating electrical machines 22 for it is rotatory to drive vacuum chuck 23, and vacuum chuck 23 is used for absorbing imprint template 4, thereby can make things convenient for imprint template 4's material loading and unloading through vacuum chuck 23, in order to avoid producing the time loss when using fixed establishment fixed imprint template 4, and then improve imprint template 4's work efficiency, simultaneously, can drive imprint template 4 through vacuum chuck 23 and rotate, in order to make things convenient for clean mechanism 3 to clean imprint template 4. Wherein, the brush 33 is arranged opposite to the rotation direction of the vacuum chuck 23, so that when the vacuum chuck 23 drives the imprinting template 4 to rotate, the cleaning capability of the brush 33 on the imprinting template 4 can be enhanced, and the cleaning effect on the imprinting template 4 can be further enhanced.
Furthermore, the cleaning and recycling device further comprises an XYZ driving mechanism, wherein a driving end of the XYZ driving mechanism is connected with the first supporting arm 31 and used for adjusting the spatial position of the first supporting arm 31 so as to adjust the spatial position of the hairbrush 33, and the hairbrush 33 brushes a specific area with residues on the imprinting template 4, so that the cleaning efficiency is improved. Optionally, the XYZ drive mechanism is an XYZ translation stage.
It should be understood that the above-described embodiments of the present invention are merely examples for clearly illustrating the present invention, and are not intended to limit the embodiments of the present invention. Other variations and modifications will be apparent to persons skilled in the art in light of the above description. And are neither required nor exhaustive of all embodiments. Any modification, equivalent replacement, and improvement made within the spirit and principle of the present invention should be included in the protection scope of the claims of the present invention.
Claims (10)
1. An imprint template cleaning and recycling method is characterized by comprising the following steps:
s1, performing heat treatment of firstly heating and then cooling the imprinting template (4) to enable the residues on the imprinting template (4) to generate a gap with the imprinting template (4);
s2, soaking the imprinting template (4) in an impregnating solution to dissolve the residues on the imprinting template (4);
s3, placing the imprinting template (4) in a groove body (1), and sucking the imprinting template (4) through a sucking mechanism (2); brushing the stamping template (4) through a cleaning mechanism (3) so as to separate the stamping template (4) from the residues; wherein a cleaning liquid is dripped through a liquid pipeline to soak the imprinting template (4).
2. The imprint template cleaning and recycling method according to claim 1, wherein in step S1, the temperature range of the imprint template (4) after temperature rise is 150-180 ℃, the time of the temperature rise process is less than 5min, and the temperature of the imprint template (4) is kept for 5-10 min; the temperature range of the imprinting template (4) after being cooled is 10-15 ℃, and the time of the cooling process is 8-10 min.
3. The imprint template cleaning and recovery method according to claim 1, wherein in step S1, the imprint template (4) is cycled through a heat treatment process of first temperature rise and then temperature fall, and the number of cycles is greater than 3.
4. The imprint template cleaning and recovery method according to claim 1, wherein the immersion time of the imprint template (4) in the immersion liquid is more than 15 min.
5. The imprint template cleaning and recovery method according to claim 1, further comprising, after step S3, the steps of:
s4, soaking the imprinting template (4) in anti-sticking liquid, and baking the soaked imprinting template (4) to enable the imprinting template (4) to be subjected to anti-sticking treatment.
6. The imprint template cleaning and recovery method according to claim 5, wherein the immersion time of the imprint template (4) in the anti-mucus is more than 20 min; the baking temperature range of the stamping template (4) after soaking is 60-80 ℃, and the baking time range is 50-70 min.
7. The imprint template cleaning and recovery method according to claim 5, wherein the anti-adhesive liquid is a fluorine-containing organic molecule solution.
8. The imprint template cleaning and recycling method according to claim 1, wherein the impregnation solution is a benzene solution, a toluene solution, an ether solution, a chloroform solution, a dichloromethane solution or a carbon tetrachloride solution.
9. A cleaning and recycling device for cleaning and recycling the imprint template (4), the cleaning and recycling device being used in the imprint template cleaning and recycling method according to any one of claims 1 to 8, the cleaning and recycling device including the tank (1) and:
the absorbing mechanism (2) is arranged in the groove body (1) and is used for absorbing the imprinting template (4);
the cleaning mechanism (3), the cleaning mechanism (3) is arranged above the stamping template (4) at intervals; the cleaning mechanism (3) comprises a first supporting arm (31), the liquid pipeline, a first rotating motor (32) and a brush (33), wherein the first rotating motor (32) is arranged on the first supporting arm (31); the driving end of the first rotating motor (32) is connected with the hairbrush (33) and is used for driving the hairbrush (33) to rotate so as to brush the stamping template (4); the opening of the liquid pipeline is arranged in the hairbrush (33) and used for dripping the cleaning liquid.
10. The washing and recovery device according to claim 9, characterized in that said suction means (2) comprise a second supporting arm (21), a second rotating electric machine (22) and a vacuum suction cup (23), said second rotating electric machine (22) being provided on said second supporting arm (21); the driving end of the second rotating motor (22) is connected with the vacuum sucker (23) and is used for driving the vacuum sucker (23) to rotate; the vacuum chuck (23) is used for sucking the imprinting template (4).
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202210728653.6A CN115121536A (en) | 2022-06-24 | 2022-06-24 | Imprint template cleaning and recycling method and device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202210728653.6A CN115121536A (en) | 2022-06-24 | 2022-06-24 | Imprint template cleaning and recycling method and device |
Publications (1)
Publication Number | Publication Date |
---|---|
CN115121536A true CN115121536A (en) | 2022-09-30 |
Family
ID=83380164
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202210728653.6A Pending CN115121536A (en) | 2022-06-24 | 2022-06-24 | Imprint template cleaning and recycling method and device |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN115121536A (en) |
Citations (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5846335A (en) * | 1994-06-28 | 1998-12-08 | Ebara Corporation | Method for cleaning workpiece |
CN1493464A (en) * | 2003-05-23 | 2004-05-05 | 中国科学院长春应用化学研究所 | Microtransfer pattern processing method |
CN101770188A (en) * | 2009-01-06 | 2010-07-07 | 上海市纳米科技与产业发展促进中心 | Method for removing cold-embossing residual adhesive layer |
US7846266B1 (en) * | 2006-02-17 | 2010-12-07 | Kla-Tencor Technologies Corporation | Environment friendly methods and systems for template cleaning and reclaiming in imprint lithography technology |
CN103157628A (en) * | 2011-12-16 | 2013-06-19 | 宸鸿科技(厦门)有限公司 | Cleaning device and cleaning method of inorganic element |
CN108311434A (en) * | 2018-01-31 | 2018-07-24 | 京东方科技集团股份有限公司 | The method that glue material is removed for the system of stripping glue material from substrate and from substrate |
CN108803261A (en) * | 2018-06-08 | 2018-11-13 | 大连芯冠科技有限公司 | The metallic pattern processing method for facilitating single layer positive photoresist to remove |
US10170343B1 (en) * | 2017-06-30 | 2019-01-01 | Taiwan Semiconductor Manufacturing Co., Ltd. | Post-CMP cleaning apparatus and method with brush self-cleaning function |
CN109941961A (en) * | 2019-03-26 | 2019-06-28 | 桂林电子科技大学 | A kind of multi-function membrane preparation method with micro nano structure |
CN111261553A (en) * | 2020-01-19 | 2020-06-09 | 北京北方华创微电子装备有限公司 | Wafer cleaning device |
CN111755319A (en) * | 2019-03-29 | 2020-10-09 | 中芯集成电路(宁波)有限公司 | Wafer cleaning method and photoresist patterning method |
US20210005446A1 (en) * | 2019-07-05 | 2021-01-07 | Canon Kabushiki Kaisha | System and Method of Cleaning Mesa Sidewalls of a Template |
CN112222062A (en) * | 2020-09-21 | 2021-01-15 | 南通大学 | Rotary corrosion cleaning equipment for substrate and cleaning method thereof |
CN113770079A (en) * | 2021-08-27 | 2021-12-10 | 武汉理工大学 | Wafer cleaning device |
CN114351153A (en) * | 2021-12-27 | 2022-04-15 | 广东粤港澳大湾区国家纳米科技创新研究院 | Template cleaning agent and preparation method and application thereof |
CN114378031A (en) * | 2021-12-31 | 2022-04-22 | 江苏启微半导体设备有限公司 | Single wafer type wafer cleaning device |
-
2022
- 2022-06-24 CN CN202210728653.6A patent/CN115121536A/en active Pending
Patent Citations (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5846335A (en) * | 1994-06-28 | 1998-12-08 | Ebara Corporation | Method for cleaning workpiece |
CN1493464A (en) * | 2003-05-23 | 2004-05-05 | 中国科学院长春应用化学研究所 | Microtransfer pattern processing method |
US7846266B1 (en) * | 2006-02-17 | 2010-12-07 | Kla-Tencor Technologies Corporation | Environment friendly methods and systems for template cleaning and reclaiming in imprint lithography technology |
CN101770188A (en) * | 2009-01-06 | 2010-07-07 | 上海市纳米科技与产业发展促进中心 | Method for removing cold-embossing residual adhesive layer |
CN103157628A (en) * | 2011-12-16 | 2013-06-19 | 宸鸿科技(厦门)有限公司 | Cleaning device and cleaning method of inorganic element |
US10170343B1 (en) * | 2017-06-30 | 2019-01-01 | Taiwan Semiconductor Manufacturing Co., Ltd. | Post-CMP cleaning apparatus and method with brush self-cleaning function |
CN108311434A (en) * | 2018-01-31 | 2018-07-24 | 京东方科技集团股份有限公司 | The method that glue material is removed for the system of stripping glue material from substrate and from substrate |
CN108803261A (en) * | 2018-06-08 | 2018-11-13 | 大连芯冠科技有限公司 | The metallic pattern processing method for facilitating single layer positive photoresist to remove |
CN109941961A (en) * | 2019-03-26 | 2019-06-28 | 桂林电子科技大学 | A kind of multi-function membrane preparation method with micro nano structure |
CN111755319A (en) * | 2019-03-29 | 2020-10-09 | 中芯集成电路(宁波)有限公司 | Wafer cleaning method and photoresist patterning method |
US20210005446A1 (en) * | 2019-07-05 | 2021-01-07 | Canon Kabushiki Kaisha | System and Method of Cleaning Mesa Sidewalls of a Template |
CN111261553A (en) * | 2020-01-19 | 2020-06-09 | 北京北方华创微电子装备有限公司 | Wafer cleaning device |
CN112222062A (en) * | 2020-09-21 | 2021-01-15 | 南通大学 | Rotary corrosion cleaning equipment for substrate and cleaning method thereof |
CN113770079A (en) * | 2021-08-27 | 2021-12-10 | 武汉理工大学 | Wafer cleaning device |
CN114351153A (en) * | 2021-12-27 | 2022-04-15 | 广东粤港澳大湾区国家纳米科技创新研究院 | Template cleaning agent and preparation method and application thereof |
CN114378031A (en) * | 2021-12-31 | 2022-04-22 | 江苏启微半导体设备有限公司 | Single wafer type wafer cleaning device |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI373378B (en) | Substrate cleaning device, substrate cleaning method and manufacturing method of substrate | |
KR100659415B1 (en) | Scrub washing method, scrub washing device, lens forming die drying method, lens forming die drying device, and plastic lens manufacturing method | |
KR20130014055A (en) | Method and apparatus for washing mold for imprinting applications, and process for producing mold for imprinting applications | |
CN115121536A (en) | Imprint template cleaning and recycling method and device | |
KR20160107893A (en) | Manufacturing method and apparatus of transparent flexible electrode using a conductive paste | |
JP2010280088A (en) | Cleaning device for screen printing mask and screen printing machine | |
CN208437283U (en) | Substrate cleaning apparatus | |
CN108140557A (en) | The template manufacturing device and template manufacture of coining | |
KR101390389B1 (en) | Nano-imprint lithography systm for large scale | |
KR101419573B1 (en) | offset printer and printing method of the same | |
JPH0582493A (en) | Wafer bonding device and method of bonding wafer using the device | |
KR20130101328A (en) | Cleaning apparatus for printing plate and printing apparatus including the same | |
JPH10282322A (en) | Correcting method and device for partial defect of substrate as well as manufacture of color filter and device thereof | |
JP5152216B2 (en) | Pattern forming apparatus and pattern forming method | |
CN111278231B (en) | Flexible transfer printing method of laser-induced carbon-based electronic element | |
JP3583552B2 (en) | Processing device and processing method | |
JP2008073638A (en) | Coating needle cleaning method, coating needle cleaning device, and pattern correction apparatus equipped therewith | |
CN215142838U (en) | Cleaning device for graphene heat-conducting film coating substrate | |
CN107278174B (en) | Stamper article for contacting a substrate during a wet chemical process using a peripheral surface having a friction enhancing pattern | |
CN111744891B (en) | Method for cleaning surface of adsorption table of grinding machine | |
CN217830595U (en) | Glue film applied to removal of wafer fat edge | |
CN215679035U (en) | Large-breadth micro-structure array automatic production line equipment | |
CN220387312U (en) | Substrate cleaning apparatus | |
JP2015204313A (en) | Imprint device, plate, and article manufacturing method | |
CN210999545U (en) | Pressurized rubber kneading device |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination |