CN115121097A - Low-temperature plasma waste gas treatment and purification control method and control system - Google Patents

Low-temperature plasma waste gas treatment and purification control method and control system Download PDF

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CN115121097A
CN115121097A CN202211039344.4A CN202211039344A CN115121097A CN 115121097 A CN115121097 A CN 115121097A CN 202211039344 A CN202211039344 A CN 202211039344A CN 115121097 A CN115121097 A CN 115121097A
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safety
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许会学
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Jiangsu Meikemeisi Automation Technology Co ltd
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/32Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34Chemical or biological purification of waste gases
    • B01D53/346Controlling the process
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2257/00Components to be removed
    • B01D2257/70Organic compounds not provided for in groups B01D2257/00 - B01D2257/602
    • B01D2257/708Volatile organic compounds V.O.C.'s
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2259/00Type of treatment
    • B01D2259/80Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
    • B01D2259/818Employing electrical discharges or the generation of a plasma

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Abstract

The invention relates to the field of waste gas separation treatment, in particular to a low-temperature plasma waste gas treatment and purification control method and a control system, wherein an embedded controller controls a collection device on purification equipment to collect the humidity of waste gas; judging whether the humidity of the waste gas meets a set condition, and controlling a collecting device on the purifying equipment to collect the temperature and the flow rate of the waste gas if the humidity of the waste gas meets the set condition; determining a current second safety and stability coefficient and a current third safety and stability coefficient; judging the current second safety and stability coefficient and the safety threshold, and if the current second safety and stability coefficient and the safety threshold are smaller than the safety threshold, controlling the size of the flow rate valve and adjusting the purifying equipment to a safe state; and calculating a stability evaluation value of the exhaust gas flow according to the exhaust gas flow in the current time period, and controlling at least two purification devices to work cooperatively when the stability evaluation value is greater than an evaluation threshold value and the current third safety and stability coefficient is smaller than a set stability value. The scheme of the invention can realize effective control of the low-temperature plasma waste gas purification equipment and ensure the safety of the purification equipment.

Description

Low-temperature plasma waste gas treatment and purification control method and control system
Technical Field
The invention relates to the field of waste gas separation treatment, in particular to a low-temperature plasma waste gas treatment and purification control method and a control system.
Background
The low-temperature plasma technology is an effective Volatile Organic Compounds (VOCs) degradation technology developed in recent years, high-energy electrons and active free radicals (O, OH, O3 and the like) generated in the plasma discharge process can effectively react with pollutant molecules, and the pollutant molecules are decomposed in a very short time to form short-chain byproducts or pollution-free water and CO2, and particularly has a good effect on malodorous pollutants with short molecular chains, such as mercaptan, thioether and the like. Therefore, the low-temperature plasma technology has the characteristics of simple operation and maintenance and low energy consumption, and has wide popularization and application prospects.
However, the VOCs mainly contain benzene compounds, alkanes, alkenes, and the like. Benzene series in the waste gas is carcinogenic substances, the peculiar smell is obvious, alkane, olefin and the like belong to inflammable substances, the low-temperature plasma technology belongs to high-voltage discharge, VOCs substances with certain concentration can be ignited or detonated under certain conditions, and the danger of fire and explosion exists, so that how to control the safe operation of the low-temperature plasma waste gas purification device is particularly important.
Disclosure of Invention
In order to solve the above technical problems, the present invention provides a control method and a control system for low-temperature plasma exhaust gas treatment and purification, and the adopted technical scheme is as follows:
the technical scheme of the low-temperature plasma waste gas treatment and purification control method provided by the invention comprises the following steps of:
the embedded controller controls a collecting device on the purifying equipment to collect the humidity of the waste gas;
judging whether the exhaust gas humidity meets a set condition, and controlling a collecting device on the purifying equipment to collect the exhaust gas temperature and the exhaust gas flow if the exhaust gas humidity meets the set condition;
determining a current second safety and stability coefficient according to the temperature and a set temperature threshold; determining a current third safety and stability coefficient according to the exhaust gas flow and a set flow threshold;
judging the current second safety stability coefficient and the safety threshold, and when the current second safety stability coefficient and the safety threshold are smaller than the safety threshold, controlling the size of a flow rate valve to realize flow rate control and adjust the purifying equipment to a safe state;
and calculating a stability evaluation value of the exhaust gas flow according to the exhaust gas flow in the current time period, and controlling at least two purification devices to work cooperatively when the stability evaluation value is greater than an evaluation threshold value and the current third safety and stability coefficient is smaller than a set stability value.
And further, judging whether the humidity of the waste gas meets a set condition, if not, controlling the electromagnetic valve to change the flow direction of the current waste gas, introducing the waste gas into the humidity converter for dehumidification treatment until the humidity exceeds a second set value, closing the electromagnetic valve, and introducing the waste gas into the purifying equipment.
Further, the setting condition is whether the current first safety stability coefficient is smaller than a setting stability coefficient;
the current first safety and stability coefficient obtaining process comprises the following steps: constructing a humidity scale scoring function, and determining a humidity scale and a humidity trend risk degree of the current time period according to the humidity scale of the current time period; and determining a current first safety and stability coefficient based on the humidity score and the humidity trend risk degree.
Further, the control strategy for implementing flow rate control is:
Figure DEST_PATH_IMAGE001
wherein the content of the first and second substances,
Figure 687908DEST_PATH_IMAGE002
in order to adjust the flow rate of the gas,
Figure 401786DEST_PATH_IMAGE003
in order to adjust the flow rate of the gas before adjustment,
Figure 915944DEST_PATH_IMAGE004
is the current second safety and stability coefficient, t is a time variable, is the time lasting after the distance regulation method starts, and has the unit of second, tanh () is a hyperbolic tangent function, log is a logarithmic function,
Figure 606426DEST_PATH_IMAGE005
the coefficients are modified as a function.
Further, the specific process of controlling at least two purification devices to work cooperatively is as follows:
the method comprises the steps of obtaining a current second safety and stability coefficient and a current third safety and stability coefficient of each purifying device during purification work, calculating a side weight function value between any two purifying devices, carrying out K-M pairing based on the side weight function values to obtain a purifying device pairing group, and distributing current airflow to another purifying device in the pairing group to balance the current purifying device processing pressure.
Further, the current second safety and stability factor is:
Figure 951957DEST_PATH_IMAGE006
wherein the content of the first and second substances,
Figure DEST_PATH_IMAGE007
for the current first safety and stability factor,
Figure 305578DEST_PATH_IMAGE008
in order to be able to read the temperature data,
Figure 307032DEST_PATH_IMAGE009
in order to set the temperature threshold value,
Figure 37091DEST_PATH_IMAGE010
to correct the coefficients, the Time () function is a custom statistical duration function.
Further, the current third safety and stability factor is:
Figure 502707DEST_PATH_IMAGE011
wherein the content of the first and second substances,
Figure 230492DEST_PATH_IMAGE012
for the exhaust gas flow corresponding to the x-th group,
Figure DEST_PATH_IMAGE013
in order to set the flow rate threshold value,
Figure 312717DEST_PATH_IMAGE010
is a correction factor.
Further, the humidity detection device is a humidity sensor or a dew point meter.
The invention also provides a low-temperature plasma waste gas treatment and purification control system which comprises a processor and a memory, wherein the processor executes the technical scheme which is stored in the memory and is used for realizing the low-temperature plasma waste gas treatment and purification control method.
The invention has the beneficial effects that:
according to the scheme, the temperature, the exhaust gas humidity and the exhaust gas flow in the purifying equipment are collected, the collected data of the purifying equipment are processed, analyzed and controlled by the embedded controller, corresponding safety and stability coefficients are respectively determined, whether the purifying equipment is adjusted or not is determined according to the comparison between the safety and stability coefficients and corresponding set values, and the purifying equipment is adjusted to a safe and healthy state; the invention is sent from the three parameter angles, can monitor the safety of the purifying equipment in real time, and can adjust in time, thereby effectively ensuring the safety of the purifying equipment while ensuring the full and efficient treatment of the waste gas.
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In order to more clearly illustrate the embodiments of the present invention or the technical solutions and advantages of the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only some embodiments of the present invention, and other drawings can be obtained by those skilled in the art without creative efforts.
Fig. 1 is a flow chart of a method of controlling purification of low-temperature plasma waste gas treatment according to the present invention.
Detailed Description
To further explain the technical means and effects of the present invention adopted to achieve the predetermined objects, the embodiments, structures, features and effects thereof according to the present invention will be described in detail below with reference to the accompanying drawings and preferred embodiments. In the following description, different "one embodiment" or "another embodiment" refers to not necessarily the same embodiment. Furthermore, the particular features, structures, or characteristics may be combined in any suitable manner in one or more embodiments.
Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs.
The invention aims at the safety control of the purifying equipment, namely, relevant data are controlled and collected by arranging an embedded controller and a collecting device, and the relevant data are used for judging the working state of the purifying equipment and regulating and controlling the working state.
The embedded controller adopts an ESP32 series single chip microcomputer, is connected with and reads related sensor return data in the acquisition device through an IIC bus, and the sensor real-time data is stored in a memory of the embedded controller so as to complete related signal processing and floating point calculation; when the control is executed, the solenoid valve is controlled to be switched by the GPIO port, and the opening of the flow rate valve is controlled by a PWM (pulse width modulation) signal or a DAC (digital-to-analog converter) mode.
It should be noted that the above collecting device includes a temperature detecting device, which is arranged at the inlet and outlet of the purifying device and used for detecting the temperature of the inlet and outlet exhaust gas; the humidity detection device is arranged on the main waste gas conveying pipeline and is used for collecting the humidity of the waste gas; and the air flow detection device is arranged on the main waste gas conveying pipeline and is used for collecting the flow of waste gas.
Based on the control system of the purification equipment, the invention provides a low-temperature plasma waste gas treatment and purification control method, as shown in fig. 1, comprising the following steps:
step 1, an embedded controller controls a collecting device on purifying equipment to collect the humidity of waste gas;
and judging whether the exhaust gas humidity meets the set conditions, and if so, controlling a collecting device on the purifying equipment to collect the exhaust gas temperature and the exhaust gas flow.
In the embodiment, a temperature sensor is adopted to acquire the temperature of the low-temperature plasma device; wherein, the monitoring frequency of the temperature is 1Hz, namely, data is collected once per second, the sliding window is adopted for processing, the window size is 1 minute, namely, the temperature difference is formed finallySmall change data set
Figure 784150DEST_PATH_IMAGE014
Every second, the first data is removed and a new data is added.
The temperature sensor is directly connected with the embedded controller by using a data bus, and transmits temperature information; the embedded controller performs difference processing on the obtained temperature information to obtain the current temperature difference
Figure 104273DEST_PATH_IMAGE008
It should be noted that, in the plasma gas degradation process, heat generation is accompanied by inevitable conditions during the reaction, and therefore, the temperature of the gas discharged from the apparatus is different from the temperature at the time of entry. Normally, this temperature difference is relatively small, and if an unexpected situation occurs, such as the above-mentioned gas humidity being too high, the reaction is accelerated, a combustion phenomenon occurs, and the temperature of the discharged gas is significantly different from the normal situation, which is an abnormal state. Thus, it is necessary to detect the temperature difference between the inlet and outlet gases. The reason why the temperature sensor is not placed inside the plasma purifier is that the energy generated inside the plasma purifier is large, the sensor can be disabled or subjected to ionization interference, and the measurement is inaccurate.
Wherein, the humidity detection device for collecting the humidity of the waste gas can adopt a humidity sensor or a dew point instrument; specifically, in the present embodiment, a dew point meter is used for measurement to obtain the humidity of the air currently entering the equipment
Figure 268538DEST_PATH_IMAGE015
(ii) a And determining and analyzing the obtained humidity data to form a data set, wherein the data sampling frequency is 1Hz, namely the data is acquired once per second, and the data is sampled once per minute. Since the measurement of humidity in a gas using a dew point meter is a well known technique, the details are not overly elaborated.
The dew point meter is directly connected to the embedded controller in a communication bus form, acquires information of the current gas humidity of all the gas inlet pipelines, and collects the information to the embedded controller in a unified manner. Meanwhile, in the embodiment, a three-way electromagnetic valve is added behind the dew-point instrument and used for controlling the current flow direction of the introduced gas, the control of the electromagnetic valve is directly controlled by an embedded controller, and the flow direction of the waste gas is determined by judging the current humidity.
It should be noted that, in the degradation process of the VOCs waste gas, if a certain amount of moisture exists in the gas, the degradation rate can be improved to a certain extent, but the humidity also has an upper limit, and if the humidity is too high, the current reaction is severe, so that combustion and explosion are caused, and therefore, the current waste gas entering the purification equipment needs to be monitored, and the current humidity of the waste gas is determined, so as to ensure the operation safety of the purification rate or the plasma equipment.
Wherein, the airflow detection device is that a flowmeter is added in an air supply pipeline to determine the current airflow magnitude
Figure 808366DEST_PATH_IMAGE016
(ii) a Flow monitoring is performed at a sampling frequency of 5Hz, i.e. 1 acquisition every 0.2 seconds, and every 15 seconds forming a set of analyzable data sets, i.e.
Figure 614648DEST_PATH_IMAGE017
Thereby, the current flow rate of the inflow gas is determined.
The set condition is that whether the current first safety stability coefficient is smaller than the set stability coefficient, and when the current first safety stability coefficient is smaller than the set stability coefficient, the temperature and the waste gas flow are collected; otherwise, the electromagnetic valve is controlled to change the current flow direction of the waste gas, the waste gas is introduced into the humidity converter for dehumidification treatment until the flow direction exceeds a second set value, the electromagnetic valve is closed, and the waste gas is introduced into the purifying equipment.
The current first safety and stability factor in the above is:
Figure 992540DEST_PATH_IMAGE018
wherein, in the step (A),
Figure 124444DEST_PATH_IMAGE019
the current humidity scale score is shown, and the more suitable the humidity scale is, the higher the score is;
Figure 384524DEST_PATH_IMAGE020
the current trend danger degree is shown and used for describing the current humidity change situation, the potential danger of the current humidity change situation is higher when the current humidity change situation is more trend, and the safety is negatively related to the current humidity change situation, so that the current humidity change situation is negative.
The humidity scale in the above is:
Figure 197759DEST_PATH_IMAGE021
where tanh () is a hyperbolic tangent function used for normalization of data, where evaluation of the humidity level will make it approach 1 within a suitable value,
Figure 695736DEST_PATH_IMAGE022
indicating the average humidity level in the currently acquired data set, 0.2 and 0.6 are measurement parameters,
Figure 264121DEST_PATH_IMAGE023
the formula correction factor is taken as 10.
Therefore, the fraction corresponding to the current humidity is determined based on the current humidity of the gas; the function of the scoring function is that when higher humidity of the gas occurs, the corresponding score will be controlled at a lower level, while under the conditions of normal and lower humidity, the corresponding score will be at a higher level; thus, the humidity of the gas is evaluated when the gas is currently input.
The trending risk levels in the above are:
Figure 949180DEST_PATH_IMAGE024
the exp () function is an exponential function with e as a base, and the Range () function is an extreme difference function, which is used for counting the magnitude of the extreme difference of the humidity data in the current data set. Therefore, comparison in numerical ordering is introduced, the find () function is used for determining the position of data in the extreme value, the sequence number of occurrence is subjected to difference processing, the maximum value number minus the minimum value number of occurrence is used, if the value is a positive value, the current trend is increased and has certain potential danger, otherwise, the risk is weakened and is weak.
Sign is an output sign function and is used for judging the size of the internal function, if the value of the sign is greater than or equal to 0, 1 is output, and if not, minus 1 is output; the Count () function is a counting function for counting the number of elements in the current data set.
After calculation, if the humidity of the subsequent gas is larger than that of the previous gas, outputting an effective value 1, adding all the items, making a ratio with the data lump number, and determining the increase proportion of the current data; if the ratio is higher, the current trend of increasing the humidity of the gas is obvious, and potential danger exists.
Of course, as other embodiments, the present invention may also compare the humidity data with the standard humidity, and if the humidity data is greater than the standard humidity, the dehumidification is required, otherwise, the exhaust gas may be directly introduced into the purification apparatus.
Specifically, humidity loop control is performed for humidity:
if it is
Figure 362844DEST_PATH_IMAGE007
If the current humidity is lower than the first set value of 0.5, the current humidity is obviously higher or obvious humidification sign exists, dehumidification is needed, at the moment, the embedded controller directly controls the electromagnetic valve to change the current flow direction of the waste gas, and the waste gas is introduced into the humidity converter to be dehumidified.
Continuously monitoring the humidity of the entering gas if
Figure 512066DEST_PATH_IMAGE007
The value rises back and above 0.7 the solenoid valve will be closed and the exhaust gas will be led into the purification device.
One minute after re-opening, observe
Figure 189035DEST_PATH_IMAGE007
Size of (2), is marked as
Figure 158128DEST_PATH_IMAGE025
. Thus, the safety of the current reactant conditions is ensured.
In this embodiment, the value of the first set value is 0.5; the second set point value is 0.7.
Step 2, determining a current second safety and stability coefficient according to the temperature and a set temperature threshold; and determining a current third safety and stability coefficient according to the exhaust gas flow and a set flow threshold value.
Wherein the current second safety and stability factor is:
Figure 874017DEST_PATH_IMAGE006
wherein the content of the first and second substances,
Figure 81008DEST_PATH_IMAGE007
for the current first safety and stability factor,
Figure 991195DEST_PATH_IMAGE008
in order to be able to read the temperature data,
Figure 650847DEST_PATH_IMAGE009
in order to set the temperature threshold value,
Figure 406313DEST_PATH_IMAGE010
for the correction coefficient, set to 0.2; the Time () function is a custom statistical duration function, and the Max () function is a function that takes both large.
Wherein, the Time () function is a self-defined statistical duration function, and the first parameter of the function is a data set
Figure 264548DEST_PATH_IMAGE008
The second term is the magnitude of the temperature difference to be compared, and here, 1.2 times of the magnitude of the temperature difference obtained after the normal operation of the equipment is determined according to the experience of use as the judgment standard. And when the data in the data set is larger than the data in the data set, timing according to the sampling frequency, and determining the time length for which the temperature difference in the data set is always continuous.
The above introduction is made when calculating the current second safety and stability factor
Figure 283319DEST_PATH_IMAGE007
The purpose of the method is that the humidity of the gas can influence the reaction rate, the reaction speed is more severe when the humidity is higher, and the temperature is higher, and the safety and stability score of the humidity is poorer at the moment, and the factor is introduced to avoid the influence of the humidity on the temperature. The maximum function is introduced here to correct possible influences, i.e. to eliminate the possibility of violent reaction and temperature change caused by excessive humidity.
It should be noted that, in the following description,
Figure 492584DEST_PATH_IMAGE009
the temperature is selected to be lower than a standard safe temperature value, namely, the temperature is judged in advance and adjusted in advance in the invention, so that the temperature of the waste gas treated by the purifying equipment is not higher than the standard temperature (the standard temperature is the safe temperature of the equipment when the equipment leaves the factory), and the safety of the purifying equipment is ensured.
Wherein the current third safety and stability coefficient is:
Figure 51741DEST_PATH_IMAGE026
the formula is similar to the temperature measurement, but takes one minute data and verifies the current value by multiple groupsStability and size relationship of the gas flow; if the current airflow magnitude exceeds the current set threshold
Figure 967744DEST_PATH_IMAGE013
And the longer the duration is, the lower the corresponding third safety and stability factor will be, which undoubtedly will cause damage to the current equipment.
Because the current industrial waste gas generally has large gas flow and unstable gas flow, the reaction speed is uncontrollable, or the reaction is insufficient, more resources are wasted, the current gas flow state is monitored and evaluated, and the third safety and stability coefficient of the current equipment is determined
Figure 954155DEST_PATH_IMAGE027
Step 3, judging the current second safety and stability coefficient and the safety threshold, and when the current second safety and stability coefficient is smaller than the safety threshold, controlling the size of a flow rate valve to realize flow rate control and adjusting the purifying equipment to a safe state;
and calculating a stability evaluation value of the exhaust gas flow according to the exhaust gas flow in the current time period, and controlling at least two purification devices to work cooperatively when the stability evaluation value is greater than an evaluation threshold and the current third safety and stability coefficient is smaller than a set stability value.
Specifically, the above process for implementing flow rate control includes:
according to the current
Figure 385136DEST_PATH_IMAGE004
The size of the flow rate is controlled, and the specific flow control size function is
Figure 685668DEST_PATH_IMAGE028
Wherein the content of the first and second substances,
Figure 285538DEST_PATH_IMAGE002
in order to adjust the flow rate of the gas,
Figure 177271DEST_PATH_IMAGE003
in order to adjust the flow rate of the gas before adjustment,
Figure 298811DEST_PATH_IMAGE004
the current second safety and stability coefficient is t, a time variable is a time variable and is the time lasting after the distance regulation and control method starts, and the unit is second; tanh () is a hyperbolic tangent function, used for the normalization process, and log is a logarithmic function,
Figure 465350DEST_PATH_IMAGE005
the correction factor for the function is set to 60.
Here, the first and second liquid crystal display panels are,
Figure 90366DEST_PATH_IMAGE004
the lower the index is, the more severe the current reaction environment is, the larger the correction size is, the lower the index is
Figure 684159DEST_PATH_IMAGE004
The flow rate entering the equipment is controlled by the index, so that the current reaction speed can be relieved to a certain extent; and a time variable is introduced, so that the flow velocity changes along with the time change, the flow velocity flows into the equipment at a minimum speed in the early stage, and the longer the regulation and control time is, the closer the flow velocity is to the original velocity. The flow rate can be controlled by controlling the size of the valve, so that the flow rate of the gas is limited.
After current limiting, after one minute of observation
Figure 27415DEST_PATH_IMAGE004
The value at which the flow rate is about 30% of the original rate (
Figure 732066DEST_PATH_IMAGE004
At 0.4), is recorded as
Figure 539485DEST_PATH_IMAGE029
. If it is not
Figure 241862DEST_PATH_IMAGE029
Compared with
Figure 869152DEST_PATH_IMAGE004
If the change is not large, namely the difference is less than 0.1, directly stopping the machine for processing, and avoiding subsequent damage; if the difference is more than 0.1, the current regulation mode is kept, the current gas flow rate is continuously and stably increased, and the current gas flow rate is updated every minute
Figure 377494DEST_PATH_IMAGE004
And (4) correcting the flow rate according to the safety value until a correction term (tanh () function) is larger than 0.95, stopping regulation and recovering the recovery speed.
If the threshold early warning is still triggered in the regulation and control process, the regulation and control time t is recalculated; if more than 5 times of resetting occurs in the regulation and control process, stopping operation is executed, and equipment is checked, so that the safety of the reaction process is ensured. It should be noted that the threshold value early warning in this embodiment is a pre-warning, that is, when the threshold value is actually 90% of the safety standard value, an alarm is given to remind a worker in advance.
Control of exhaust gas flow:
first, the stability evaluation value is calculated as:
Figure 977103DEST_PATH_IMAGE030
and if the fluctuation condition of the current airflow is large, the treatment efficiency of the equipment is not high enough, the no-load condition possibly exists, and certain influence is generated on the service life of the equipment.
Then making a judgment if
Figure 422952DEST_PATH_IMAGE027
The value is small but the air flow is stable (namely Fl value is more than 0.8), or after the upper-section temperature flow limitation, the whole treatment efficiency needs to be ensured, if more than one existsThe similar plasma purification equipment conducts airflow diversion and distributes the airflow diversion to other purification equipment; and if only one device is available, the current work is stopped, the waste gas which needs to be treated at present is collected, and then one device is used for treatment.
If there are multiple machines, the machine is corresponded according to
Figure 740800DEST_PATH_IMAGE027
Index sum
Figure 521675DEST_PATH_IMAGE004
Index, by K-M pairing, the gas flow distribution.
Wherein the edge weight function of K-M is
Figure 303686DEST_PATH_IMAGE031
The subscript a represents the current plasma purification equipment needing diversion, and the subscript b represents the target-matched plasma purification equipment;
Figure 347865DEST_PATH_IMAGE032
for the current third safety and stability factor of the current plasma purifying equipment needing diversion,
Figure DEST_PATH_IMAGE033
the current third safety and stability coefficient of the plasma purification equipment matched with the standard is set; introduction of
Figure 746486DEST_PATH_IMAGE004
The purpose of the method is to avoid the abnormal condition of the temperature of the equipment with matched targets when in operation,
Figure 534313DEST_PATH_IMAGE034
the time scale for the start of the conditioning of the target-matched purification device.
At the same time, the regulation time size of the matched object is determined
Figure 170831DEST_PATH_IMAGE034
If no regulation is performed, the regulation time is 0; if the object is in a regulation state, the object is not suitable for gas flow rate up-regulation, 100 is a function correction parameter, and the effect of non-regulation is amplified.
It should be further noted that, each time the traffic volume is 5% of the current traffic volume of the target device, if the upper limit is exceeded, the K-M pairing is continued to seek the next target device.
After multiple matching, distributing the current airflow to other purification equipment to balance the processing pressure of the current purification equipment; after the K-M pairing, the current flow rate cannot be redistributed, and the total exhaust gas flow rate is controlled.
Further, since the airflow is distributed in an excess mode after the pairing, the matched object cannot be overloaded for a long time, otherwise, the reaction speed is too high, the temperature is increased, more equipment enters a temperature flow limiting stage, and finally the purification efficiency of the whole equipment is reduced, so that the flow is re-evaluated and distributed within a period of time after the pairing.
The matching objects are given weight values when matched again, and the weight values are observed after 10 minutes from the matching
Figure 385911DEST_PATH_IMAGE004
The value (second safety coefficient, temperature dependent) and the size before pairing, determine whether it continues to participate in the matching:
firstly, establishing a weight function:
Figure 475090DEST_PATH_IMAGE035
wherein the data in this case are all values of the matched object, the subscript c represents the data size after the pairing,
Figure 66608DEST_PATH_IMAGE008
representing the temperature difference of the gas, with the data set within one minute before pairingAnd the average value is processed to obtain the current data, and similarly,
Figure 292053DEST_PATH_IMAGE036
the data after pairing.
Second, when the matching is performed again, the edge weight function is combined
Figure 976238DEST_PATH_IMAGE037
And
Figure 818292DEST_PATH_IMAGE038
re-determining the matching relationship in the current matching process according to the value; if the condition that the gas flow is unstable exists, stopping the operation, and collecting and then stably releasing the gas.
Similarly, after conditioning, one minute of observation
Figure 947922DEST_PATH_IMAGE027
Size of (2), is marked as
Figure 293453DEST_PATH_IMAGE039
Thereby ensuring the current purification efficiency and simultaneously ensuring the processing safety of the current equipment.
The invention also provides a low-temperature plasma waste gas treatment and purification control system which comprises a processor and a memory, wherein the processor executes a program stored in the memory and used for realizing the low-temperature plasma waste gas treatment and purification control method. The specific implementation of the above-mentioned purification control method for low-temperature plasma waste gas treatment has been described specifically, and is not described herein again.
The above-mentioned embodiments are only used for illustrating the technical solutions of the present application, and not for limiting the same; although the present application has been described in detail with reference to the foregoing embodiments, it should be understood by those of ordinary skill in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some technical features may be equivalently replaced; such modifications and substitutions do not substantially depart from the spirit and scope of the embodiments of the present application and are intended to be included within the scope of the present application.

Claims (9)

1. A low-temperature plasma waste gas treatment and purification control method is characterized by comprising the following steps:
the embedded controller controls a collecting device on the purifying equipment to collect the humidity of the waste gas;
judging whether the exhaust gas humidity meets a set condition, and controlling a collecting device on the purifying equipment to collect the exhaust gas temperature and the exhaust gas flow if the exhaust gas humidity meets the set condition;
determining a current second safety and stability coefficient according to the temperature and a set temperature threshold; determining a current third safety and stability coefficient according to the exhaust gas flow and a set flow threshold;
judging the current second safety and stability coefficient and the safety threshold, and when the current second safety and stability coefficient and the safety threshold are smaller than the safety threshold, controlling the size of a flow rate valve to realize flow rate control and adjust the purification equipment to a safe state;
and calculating a stability evaluation value of the exhaust gas flow according to the exhaust gas flow in the current time period, and controlling at least two purification devices to work cooperatively when the stability evaluation value is greater than an evaluation threshold and the current third safety and stability coefficient is smaller than a set stability value.
2. The method as claimed in claim 1, wherein the exhaust gas humidity is determined to meet a predetermined condition, and if not, the solenoid valve is controlled to change the current exhaust gas flow direction, the exhaust gas is introduced into the humidity converter for dehumidification until a second predetermined value is exceeded, and the solenoid valve is closed to introduce the exhaust gas into the purification equipment.
3. The low-temperature plasma exhaust gas treatment purification control method as claimed in claim 1, wherein the set condition is whether the current first safety stability factor is smaller than a set stability factor;
the current first safety and stability coefficient obtaining process comprises the following steps: constructing a humidity scale scoring function, and determining a humidity scale and a humidity trend risk degree of the current time period according to the humidity scale of the current time period; and determining a current first safety and stability coefficient based on the humidity score and the humidity trend risk degree.
4. The low-temperature plasma exhaust treatment purification control method as claimed in claim 1, wherein the control strategy for realizing flow rate control is as follows:
Figure 64343DEST_PATH_IMAGE001
wherein the content of the first and second substances,
Figure 778221DEST_PATH_IMAGE002
in order to adjust the flow rate of the gas,
Figure 89116DEST_PATH_IMAGE003
in order to adjust the flow rate of the gas before adjustment,
Figure 218746DEST_PATH_IMAGE004
is the current second safety and stability coefficient, t is a time variable, is the time lasting after the distance regulation method starts, and has the unit of second, tanh () is a hyperbolic tangent function, log is a logarithmic function,
Figure 829856DEST_PATH_IMAGE005
the coefficients are modified as a function.
5. The method for controlling the purification of the low-temperature plasma waste gas treatment according to claim 1, wherein the specific process of controlling at least two purification devices to work cooperatively comprises the following steps:
the method comprises the steps of obtaining a current second safety and stability coefficient and a current third safety and stability coefficient of each purifying device during purification work, calculating a side weight function value between any two purifying devices, carrying out K-M pairing based on the side weight function values to obtain a purifying device pairing group, and distributing current airflow to another purifying device in the pairing group to balance the current purifying device processing pressure.
6. The method as claimed in claim 1, wherein the current second safety and stability factor is:
Figure 386740DEST_PATH_IMAGE006
wherein the content of the first and second substances,
Figure 450511DEST_PATH_IMAGE007
is the current first safety and stability factor,
Figure 180569DEST_PATH_IMAGE008
in order to be able to read the temperature data,
Figure 583869DEST_PATH_IMAGE009
in order to set the temperature threshold value,
Figure 373970DEST_PATH_IMAGE010
to correct the coefficients, the Time () function is a custom statistical duration function.
7. The method as claimed in claim 1, wherein the current third safety stability factor is:
Figure 862720DEST_PATH_IMAGE011
wherein the content of the first and second substances,
Figure 641145DEST_PATH_IMAGE012
for the exhaust gas flow corresponding to the x-th group,
Figure 961267DEST_PATH_IMAGE013
in order to set the flow rate threshold value,
Figure 125533DEST_PATH_IMAGE010
is a correction factor.
8. The method as claimed in claim 1, wherein the humidity detection device is a humidity sensor or a dew point meter.
9. A low temperature plasma exhaust gas treatment purification control system comprising a processor and a memory, characterized in that the processor executes a program stored in the memory for implementing a low temperature plasma exhaust gas treatment purification control method according to any one of claims 1 to 8.
CN202211039344.4A 2022-08-29 2022-08-29 Low-temperature plasma waste gas treatment and purification control method and control system Pending CN115121097A (en)

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Publication number Priority date Publication date Assignee Title
CN104460367A (en) * 2014-11-04 2015-03-25 中国石油化工股份有限公司 Safety protection control method for degrading organic waste gas through low-temperature plasma
CN105233640A (en) * 2015-09-28 2016-01-13 重庆科蓝环保实业有限公司 System for purifying volatile organic compounds exhaust gas through plasma synergistic biological technology
CN109308082A (en) * 2017-11-16 2019-02-05 中国石油化工股份有限公司 Low Temperature Plasma Treating sewage collecting, storage, processing links release gas in VOCs method of controlling security
CN111467885A (en) * 2020-03-09 2020-07-31 浙江工业大学 VOCs adsorption-plasma catalytic regeneration device, treatment system and process

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104460367A (en) * 2014-11-04 2015-03-25 中国石油化工股份有限公司 Safety protection control method for degrading organic waste gas through low-temperature plasma
CN105233640A (en) * 2015-09-28 2016-01-13 重庆科蓝环保实业有限公司 System for purifying volatile organic compounds exhaust gas through plasma synergistic biological technology
CN109308082A (en) * 2017-11-16 2019-02-05 中国石油化工股份有限公司 Low Temperature Plasma Treating sewage collecting, storage, processing links release gas in VOCs method of controlling security
CN111467885A (en) * 2020-03-09 2020-07-31 浙江工业大学 VOCs adsorption-plasma catalytic regeneration device, treatment system and process

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