CN114956599B - Energy-saving coated glass - Google Patents
Energy-saving coated glass Download PDFInfo
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- CN114956599B CN114956599B CN202210538738.8A CN202210538738A CN114956599B CN 114956599 B CN114956599 B CN 114956599B CN 202210538738 A CN202210538738 A CN 202210538738A CN 114956599 B CN114956599 B CN 114956599B
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- 239000011521 glass Substances 0.000 title claims abstract description 75
- 230000004888 barrier function Effects 0.000 claims abstract description 80
- 239000000758 substrate Substances 0.000 claims abstract description 17
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 198
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 115
- 239000001301 oxygen Substances 0.000 claims description 112
- 229910052760 oxygen Inorganic materials 0.000 claims description 112
- 229910052786 argon Inorganic materials 0.000 claims description 99
- 238000004544 sputter deposition Methods 0.000 claims description 87
- 238000000034 method Methods 0.000 claims description 63
- 238000002360 preparation method Methods 0.000 claims description 63
- 230000008569 process Effects 0.000 claims description 56
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 55
- 239000007789 gas Substances 0.000 claims description 50
- 238000002834 transmittance Methods 0.000 claims description 30
- 238000012546 transfer Methods 0.000 claims description 26
- 239000013077 target material Substances 0.000 claims description 16
- 239000000463 material Substances 0.000 claims description 5
- 230000001954 sterilising effect Effects 0.000 claims description 3
- 230000003139 buffering effect Effects 0.000 claims 2
- 229910052581 Si3N4 Inorganic materials 0.000 abstract description 38
- 239000010410 layer Substances 0.000 description 385
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 58
- 239000011787 zinc oxide Substances 0.000 description 29
- 230000000052 comparative effect Effects 0.000 description 15
- 238000012360 testing method Methods 0.000 description 13
- 230000008859 change Effects 0.000 description 12
- 239000005344 low-emissivity glass Substances 0.000 description 12
- 230000000694 effects Effects 0.000 description 7
- 229910052709 silver Inorganic materials 0.000 description 7
- 239000004332 silver Substances 0.000 description 7
- 239000000126 substance Substances 0.000 description 6
- 239000011701 zinc Substances 0.000 description 6
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 5
- 230000006866 deterioration Effects 0.000 description 5
- 239000003086 colorant Substances 0.000 description 4
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 4
- NDVLTYZPCACLMA-UHFFFAOYSA-N silver oxide Chemical compound [O-2].[Ag+].[Ag+] NDVLTYZPCACLMA-UHFFFAOYSA-N 0.000 description 4
- 238000001816 cooling Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000009413 insulation Methods 0.000 description 3
- 239000002346 layers by function Substances 0.000 description 3
- 238000012827 research and development Methods 0.000 description 3
- 230000000903 blocking effect Effects 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 229910001923 silver oxide Inorganic materials 0.000 description 2
- 238000004088 simulation Methods 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 238000011179 visual inspection Methods 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910006852 SnOy Inorganic materials 0.000 description 1
- 229910003087 TiOx Inorganic materials 0.000 description 1
- 230000006750 UV protection Effects 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000004566 building material Substances 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
- 238000009614 chemical analysis method Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000004925 denaturation Methods 0.000 description 1
- 230000036425 denaturation Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 238000004134 energy conservation Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000005329 float glass Substances 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910001120 nichrome Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000004224 protection Effects 0.000 description 1
- 238000005546 reactive sputtering Methods 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- HLLICFJUWSZHRJ-UHFFFAOYSA-N tioxidazole Chemical compound CCCOC1=CC=C2N=C(NC(=O)OC)SC2=C1 HLLICFJUWSZHRJ-UHFFFAOYSA-N 0.000 description 1
- 239000005341 toughened glass Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3644—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the metal being silver
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3626—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer one layer at least containing a nitride, oxynitride, boronitride or carbonitride
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
- C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering
Abstract
The invention discloses energy-saving coated glass, which comprises the following layers from inside to outside in sequence: a glass substrate layer,A first Si3N4 layer, a first buffer barrier layer, a first Ag layer, a second buffer barrier layer, a second Ag layer, a third buffer barrier layer, and a second Si3N4 layer. The first buffer barrier layer is provided with the following layers from inside to outside in sequence: agO (AgO) x Layer and AgO y And a layer, wherein the thickness of the first buffer barrier layer is less than 15nm. The second buffer barrier layer is provided with the following layers from inside to outside in sequence: agO (AgO) a Layer, agO b The thickness of the second buffer barrier layer is smaller than 30nm. The third buffer barrier layer is provided with the following layers from inside to outside in sequence: agO (AgO) m Layer and AgO n And a layer, wherein the thickness of the third buffer barrier layer is less than 15nm.
Description
Technical Field
The invention relates to the technical field of energy-saving glass, in particular to energy-saving coated glass.
Background
Along with the concept of energy conservation and environmental protection, most office buildings constructed in the current city select low-emissivity glass as a glass curtain wall material.
The prior art CN110092593a discloses a double-silver coated glass, which comprises a glass substrate layer, a first dielectric layer, a first silver layer, a second dielectric layer, a second silver layer and a third dielectric layer in sequence from one side to the other side; each dielectric layer of the coated glass is respectively selected from at least two of a Si3N4 layer, a TiOx layer, a SnOy layer, a ZnOz layer, a ZnSnOa+b layer and an AZO layer; each barrier layer of the coated glass is selected from one or more of a Ni layer, a Cr layer, a NiCr layer and a NiCrOc layer. According to research and development groups, the weather resistance of the coated glass is poor, and through simulation calculation based on a time-temperature equivalent principle, if the glass is used in a well-known area in the north of China, the coated glass in the prior art can have the problems of color change, light transmittance reduction and heat transfer coefficient deterioration after being used for 1-2 years. The color change of the glass will cause the problem that the building appearance has different colors, the light transmittance is reduced, the indoor lighting effect is possibly reduced, the indoor lighting cost is increased, and the heat transfer coefficient is deteriorated, so that the indoor heating or cooling cost is increased. In order to solve the technical problems, the invention provides energy-saving coated glass with a novel structure.
Disclosure of Invention
The invention aims to provide energy-saving coated glass with high weather resistance.
In order to achieve the purpose, the invention provides energy-saving coated glass, which comprises the following layers from inside to outside in sequence:
the glass substrate layer, the first Si3N4 layer, the first buffer barrier layer, the first Ag layer, the second buffer barrier layer, the second Ag layer, the third buffer barrier layer and the second Si3N4 layer.
In a preferred embodiment, the first buffer barrier layer has the following layers in order from inside to outside: agO (AgO) x Layer and AgO y And a layer, wherein the thickness of the first buffer barrier layer is less than 15nm.
In a preferred embodiment, the second buffer barrier layer has the following layers in order from inside to outside: agO (AgO) a Layer, agO b The thickness of the second buffer barrier layer is smaller than 30nm.
In a preferred embodiment, the third buffer barrier layer has the following layers in order from inside to outside: agO (AgO) m Layer and AgO n And a layer, wherein the thickness of the third buffer barrier layer is less than 15nm.
In a preferred embodiment, agO x The thickness of the layer is 5-8nm, wherein AgO x The layer is prepared by the following process: preparation of AgO using radio frequency magnetron sputtering x The layer is made of pure Ag, the sputtering power is 300-500W, the power voltage is 300-500V, the sputtering atmosphere is the combined gas of argon and oxygen, wherein the flow rate of the argon is 30-50sccm, and the flow rate of the oxygen is 300-500sccm.
In a preferred embodiment, agO y The thickness of the layer is 5-8nm, wherein AgO y The layer is prepared by the following process: preparation of AgO using radio frequency magnetron sputtering y The layer is made of pure Ag, the sputtering power is 200-250W, the power voltage is 200-250V, the sputtering atmosphere is the combined gas of argon and oxygen, wherein the flow rate of the argon is 30-50sccm, and the flow rate of the oxygen is 800-1200sccm.
In a preferred embodiment, agO a The thickness of the layer is 5-8nm, wherein AgO a The layer is prepared by the following process: preparation of AgO using radio frequency magnetron sputtering a The layer is made of pure Ag, the sputtering power is 200-250W, the power voltage is 200-250V, the sputtering atmosphere is the combined gas of argon and oxygen, wherein the flow rate of the argon is 30-50sccm, and the flow rate of the oxygen is 800-1200sccm.
In a preferred embodiment, agO b The thickness of the layer is 5-8nm, wherein AgO b The layer is prepared by the following process: preparation of AgO using radio frequency magnetron sputtering b The layer is made of pure Ag, the sputtering power is 300-500W, the power voltage is 300-500V, the sputtering atmosphere is the combined gas of argon and oxygen, wherein the flow rate of the argon is 30-50sccm, and the flow rate of the oxygen is 300-500sccm.
In a preferred embodiment, agO m The thickness of the layer is 5-8nm, wherein AgO m The layer is prepared by the following process: preparation of AgO using radio frequency magnetron sputtering m The layer is made of pure Ag, the sputtering power is 200-250W, the power voltage is 200-250V, the sputtering atmosphere is the combined gas of argon and oxygen, wherein the flow rate of the argon is 30-50sccm, and the flow rate of the oxygen is 800-1200sccm.
In a preferred embodiment, agO n The thickness of the layer is 5-8nm, wherein AgO n The layer is prepared by the following process: preparation of AgO using radio frequency magnetron sputtering n The layer is made of pure Ag, the sputtering power is 600-800W, the power voltage is 300-500V, the sputtering atmosphere is the combined gas of argon and oxygen, wherein the flow rate of the argon is 30-50sccm, and the flow rate of the oxygen is 600-750sccm.
Compared with the prior art, the invention has the following advantages:
the prior coated glass has poor weather resistance, and through the simulation calculation based on the time-temperature equivalent principle, if the glass is used in the northern four seasons clear region of China, the prior coated glass can have the problems of color change, light transmittance reduction and heat transfer coefficient deterioration after being used for 1-2 years. The color change of the glass will cause the problem that the building appearance has different colors, the light transmittance is reduced, the indoor lighting effect is possibly reduced, the indoor lighting cost is increased, and the heat transfer coefficient is deteriorated, so that the indoor heating or cooling cost is increased. In order to solve the technical problems, the invention provides energy-saving coated glass with a novel structure.
Drawings
Fig. 1 is a schematic view of a film structure according to an embodiment of the present invention.
Fig. 2 is a schematic view of a film structure according to an embodiment of the present invention.
Fig. 3 is a schematic view of a film structure according to an embodiment of the present invention.
Fig. 4 is a cross-sectional view of a TEM according to an embodiment of the present invention.
Fig. 5 is a cross-sectional view of a TEM according to an embodiment of the present invention.
Detailed Description
The following detailed description of embodiments of the invention is, therefore, to be taken in conjunction with the accompanying drawings, and it is to be understood that the scope of the invention is not limited to the specific embodiments.
Throughout the specification and claims, unless explicitly stated otherwise, the term "comprise" or variations thereof such as "comprises" or "comprising", etc. will be understood to include the stated element or component without excluding other elements or components.
As described in the background art, the existing coated glass may suffer from discoloration, reduced light transmittance and deteriorated heat transfer coefficient after 1-2 years of use. Because the color change of the glass is caused by oxidation, lattice structure change and other physical and chemical reactions, the color change of the glass is uneven, which leads to the problem of different colors of the building appearance, if the glass curtain wall of some high-rise high-grade office buildings is observed at ordinary times, the glass curtain wall generally has the problem of different colors of the outer wall, and the problem is not caused by the fact that the glass curtain wall is not wiped cleanly, but is often caused by the material denaturation of the curtain wall. In addition, the reduced light transmittance may lead to reduced indoor lighting effects, for example if the light transmittance is reduced by 10-20%, the indoor illumination power needs to be correspondingly increased, or at least a supplementary light source is needed to supplement the lack of brightness. And the deterioration of the heat transfer coefficient will cause an increase in the cost of indoor heating or cooling. Through research of my research and development team, the insufficient weather resistance of the current low-emissivity glass may be caused by unreasonable film layer structure, specifically, the film layer of the current low-emissivity glass is generally composed of a barrier layer, a dielectric layer and a functional layer, the barrier layer is theoretically used for blocking oxygen molecules or oxygen groups from penetrating into the inner layer, so that the inner layer lattice structure is prevented from being changed or chemical components are changed, and the dielectric layer theoretically has a dimming effect and has a certain blocking effect, because the dielectric layer is generally composed of oxide. However, due to the gaps between atoms, oxygen groups and even oxygen molecules still possibly penetrate into the functional layer through the barrier layer and the dielectric layer, especially in the environment of ultraviolet rays, high temperature and high humidity, the oxygen molecules and other elements form various groups more easily due to the effect of high energy, so that the oxygen molecules penetrate into the glass film layer under the effect of high energy. In addition, most of the barrier layers of the low-emissivity glass at present use a silicon nitride layer, and the silicon nitride layer does not contain oxygen element at all, which itself causes the chemical potential of the oxygen element to incline towards the silicon nitride layer, and the oxygen element naturally has a tendency to diffuse towards the silicon nitride layer, which may further promote poor weather resistance performance of the current low-emissivity glass. The above technical problems may need to be solved by designing a novel film structure.
Fig. 1 is a schematic view of a film structure according to an embodiment of the present invention. As shown in the figure, the energy-saving coated glass is provided with the following layers from inside to outside in sequence: a glass substrate layer 11, a first Si3N4 layer 12, a first buffer barrier layer 13, a first Ag layer 14, a second buffer barrier layer 15, a second Ag layer 16, a third buffer barrier layer 17, and a second Si3N4 layer 18.
FIG. 2 is a film junction according to one embodiment of the inventionSchematic diagram. Fig. 2 schematically illustrates a film layer structure in the vicinity of the first buffer barrier layer 13. As shown in the figure, the film layer structure near the first buffer barrier layer 13 is a first Si3N4 layer 12, agO x Layer 21, agO y Layer 22, and first Ag layer 14.
Fig. 3 is a schematic view of a film structure according to an embodiment of the present invention. Fig. 3 schematically illustrates the film layer structure in the vicinity of the second buffer barrier layer 15. The film layer structure near the second buffer barrier layer 15 is a first Ag layer 14, agO a Layer 31, agO b Layer 32, AZO layer 33 and second Ag layer 16. The structure of the third buffer barrier layer 17 is similar to the two buffer barrier layer structures described above, and those skilled in the art will be able to understand the structure of the third buffer barrier layer 17 based on the illustrations of fig. 1-3 described above, and the present invention will not be repeated.
The invention provides energy-saving coated glass, which comprises the following layers from inside to outside in sequence:
the glass substrate layer, the first Si3N4 layer, the first buffer barrier layer, the first Ag layer, the second buffer barrier layer, the second Ag layer, the third buffer barrier layer and the second Si3N4 layer. In one embodiment, the glass substrate may be any type of well known glass for glass curtain walls, such as float glass, quartz glass, tempered glass, and the like; in one embodiment, the first Si3N4 layer has a thickness of 30-50nm, it being understood that the Si3N4 layer thickness is a well known parameter in the low emissivity glass art, typically the Si3N4 layer thickness in low emissivity glass is in the range of 30-50nm, the thickness variation of the Si3N4 layer does not substantially affect the performance of the present invention (the thicker Si3N4 layer may only have a very slight effect on light transmittance), in order to ensure the comparability of the results of the present invention and the comparative example, the first Si3N4 layer thickness of the present invention embodiment is 40nm; in one embodiment, the magnetron sputtering method for preparing the Si3N4 layer is already known in the art, and its process parameters are also common knowledge, it should be understood that the specific preparation method of the Si3N4 layer does not substantially affect the performance of the present invention, and in the present invention, in order to ensure the comparability of the results, the preparation method of the first Si3N4 layer is as follows: sputtering by using a Si3N4 target as a target material and using a radio frequency magnetron sputtering method, wherein the power supply is 500W, the power supply voltage is 500V, the sputtering gas is argon, the gas flow is 100-150sccm, and the substrate temperature is set to be 100 ℃; the thickness and preparation process of the second Si3N4 layer are the same as those of the first Si3N4 layer, and will not be described again.
In one embodiment, the first Ag layer has a thickness of 10-15nm, it should be understood that the Ag layer thickness is a well-known parameter in the low emissivity glass field, and the thickness of the Ag layer must affect the thermal insulation performance of the glass (when the Ag layer is thicker, the glass transmittance decreases dramatically, but the thermal insulation performance increases, whereas when the Ag layer is reduced, the glass transmittance may improve to some extent, but the thermal insulation performance will suffer a larger loss), but in the low emissivity glass of the dual silver field, the Ag layer thickness is typically 10-15nm, and the core of the present invention is not in the design of the Ag layer thickness. To ensure comparability of the results of the examples of the present invention and the comparative examples, the first Ag layer thickness of the examples of the present invention was 12nm; in one embodiment, the preparation of the Ag layer by magnetron sputtering is already known in the art, and the process parameters are also common knowledge, and it should be understood that the specific preparation method of the Ag layer does not substantially affect the performance of the present invention, and in the present invention, in order to ensure the comparability of the results, the preparation method of the first Ag layer is as follows: pure silver is used as a target material, and the direct-current magnetron sputtering method is used for preparation, wherein specific parameters refer to CN112366107B, bias current is 0.05A, and bias voltage is 50V. The thickness and preparation process of the second Ag layer are the same as those of the first Ag layer, and will not be described again.
In one embodiment, the thickness of AZO is 5-15nm, it being understood that the thickness of AZO is a well-known parameter in the low emissivity glass field, in order to ensure comparability of the results of the inventive and comparative examples, the thickness of AZO of the inventive examples is 10nm; in one embodiment, the preparation of the AZO layer by magnetron sputtering is already known in the art, and the process parameters are also common knowledge, and it should be understood that the specific preparation method of the AZO layer does not substantially affect the performance of the present invention, and in the present invention, in order to ensure the comparability of the results, the preparation method of the AZO layer is as follows: the method is characterized in that zinc oxide with aluminum adhered to the surface is used as a target material, the preparation is carried out by using a radio frequency magnetron sputtering method, the power supply is 500W, the power supply voltage is 500V, the sputtering gas is argon, the gas flow is 100-150sccm, the substrate temperature is set to be 100 ℃ (in the preparation process of each film layer, the substrate temperature can be 100 ℃).
In a preferred embodiment, the first buffer barrier layer has the following layers in order from inside to outside: agO (AgO) x Layer and AgO y And a layer, wherein the thickness of the first buffer barrier layer is less than 15nm. It will be appreciated by those skilled in the art that, due to the reactive sputtering method, the Ag element and the oxygen element are included in the AgO layer as much as possible, but the compound is a non-stoichiometric compound whose specific proportions cannot be accurately determined (numerical errors measured using energy spectra may be above 30%, energy spectra readings have no reference value for determining specific components; and chemical analysis methods have been more difficult to determine chemical components of film layers only a few nm thick, and in fact, the chemical components of the various layers of most nanomembrane materials up to now have been defined and named in a nominal composition rather than an actual composition, the fundamental reason being that the actual cost determination has a difficult to overcome), but although the specific values are difficult to know, the oxygen element content in each silver oxide layer must be determined by the specific process (especially oxygen flow rate) for preparing the layer based on the substance conservation law. For this reason, the present invention uses the "x/y/a/b/m/n" approach to replace the specific oxygen values.
The following description of specific examples and comparative examples of the present invention will be given so that those skilled in the art will be better able to understand the procedures described herein.
Example 1
The energy-saving coated glass is provided with the following layers from inside to outside in sequence: the glass substrate layer, the first Si3N4 layer, the first buffer barrier layer, the first Ag layer, the second buffer barrier layer, the second Ag layer, the third buffer barrier layer and the second Si3N4 layer. The first buffer barrier layer is provided with the following layers from inside to outside in sequence: agO (AgO) x Layer and AgO y A layer. The second buffer barrier layer is provided with the following layers from inside to outside in sequence: agO (AgO) a Layer, agO b A layer and an AZO layer. The third buffer barrier layer is provided with the following layers from inside to outside in sequence: agO (AgO) m Layer and AgO n A layer.
AgO x The thickness of the layer is 5nm, wherein AgO x The layer is prepared by the following process: preparation of AgO using radio frequency magnetron sputtering x The layer, the target is pure Ag (the AgO layer is prepared below and the target is pure Ag, and is not described in detail), the power of a sputtering power supply is 300W, the power supply voltage is 300V, the sputtering atmosphere is a combined gas of argon and oxygen, wherein the flow of the argon is 30sccm, and the flow of the oxygen is 300sccm.
AgO y The thickness of the layer is 5nm, wherein AgO y The layer is prepared by the following process: preparation of AgO using radio frequency magnetron sputtering y The layer was sputtered at a power of 250W and a power voltage of 250V in a combined atmosphere of argon and oxygen at a flow rate of 50sccm and at a flow rate of 800sccm.
AgO a The thickness of the layer is 5nm, wherein AgO a The layer is prepared by the following process: preparation of AgO using radio frequency magnetron sputtering a The layer is sputtered with power of 200W, power voltage of 200V, sputtering atmosphere is combined gas of argon and oxygen, wherein the flow rate of the argon is 30sccm, and the flow rate of the oxygen is 800sccm.
AgO b The thickness of the layer is 5nm, wherein AgO b The layer is prepared by the following process: preparation of AgO using radio frequency magnetron sputtering b The layer was sputtered at 300W and 300V power supply, the sputtering atmosphere was a combination of argon and oxygen, wherein the argon flow was 30sccm and the oxygen flow was 300sccm.
AgO m The thickness of the layer is 5nm, wherein AgO m The layer is prepared by the following process: preparation of AgO using radio frequency magnetron sputtering m The layer is sputtered with power of 200W, power voltage of 200V, sputtering atmosphere is combined gas of argon and oxygen, wherein the flow rate of the argon is 30sccm, and the flow rate of the oxygen is 800sccm.
AgO n The thickness of the layer is 5nm, wherein AgO n The layer is prepared by the following process: preparation of AgO using radio frequency magnetron sputtering n Layer, sputtering power of 6The power supply voltage is 300V, the sputtering atmosphere is a combined gas of argon and oxygen, wherein the flow rate of the argon is 30sccm, and the flow rate of the oxygen is 600sccm.
Fig. 4 is a cross-sectional view of a TEM according to an embodiment of the present invention. FIG. 4 shows AgO of coated glass prepared according to example 1 b A cross-sectional view between layers and AZO layers. The transmittance 1 and the heat transfer coefficient 1 after the preparation of example 1 were first tested, then the glass prepared in example 1 was left to stand for 100 days under an air atmosphere at a temperature of 65 ℃ and a humidity of 85% under the condition that a Philips UV-C ultraviolet linear sterilizing lamp was directly irradiated with rated power, and then the transmittance 2 and the heat transfer coefficient 2 after the treatment were tested; the parameter definition is a known definition, wherein the transmittance is measured under visible light; the heat transfer coefficient U value is the heat transferred per unit time through the unit area under the condition of stable heat transfer, wherein the temperature difference of air at two sides of the glass is 1 degree (K), and the unit is W/(square meter & degree) (W/. Multidot.K). Before and after the test, the glass surface was visually inspected for no observable color change, and the results are shown in table 1:
TABLE 1
| Transmittance 1 | Heat transfer coefficient 1 | Transmittance 2 | Heat transfer coefficient 2 |
| 72％ | 1.6 | 68％ | 1.55 |
Example 2
The energy-saving coated glass is provided with the following layers from inside to outside in sequence: the glass substrate layer, the first Si3N4 layer, the first buffer barrier layer, the first Ag layer, the second buffer barrier layer, the second Ag layer, the third buffer barrier layer and the second Si3N4 layer. The first buffer barrier layer is provided with the following layers from inside to outside in sequence: agO (AgO) x Layer and AgO y A layer. The second buffer barrier layer is provided with the following layers from inside to outside in sequence: agO (AgO) a Layer, agO b A layer and an AZO layer. The third buffer barrier layer is provided with the following layers from inside to outside in sequence: agO (AgO) m Layer and AgO n A layer.
AgO x The thickness of the layer is 8nm, wherein AgO x The layer is prepared by the following process: preparation of AgO using radio frequency magnetron sputtering x The layer is sputtered with power of 500W, power voltage of 500V, sputtering atmosphere is combined gas of argon and oxygen, wherein the flow rate of the argon is 50sccm, and the flow rate of the oxygen is 500sccm.
AgO y The thickness of the layer is 6nm, wherein AgO y The layer is prepared by the following process: preparation of AgO using radio frequency magnetron sputtering y The layer is sputtered with power of 250W, power voltage of 250V, sputtering atmosphere of combined gas of argon and oxygen, wherein the flow rate of the argon is 50sccm, and the flow rate of the oxygen is 1200sccm.
AgO a The thickness of the layer is 8nm, wherein AgO a The layer is prepared by the following process: preparation of AgO using radio frequency magnetron sputtering a The layer is sputtered with power of 250W, power voltage of 250V, sputtering atmosphere of combined gas of argon and oxygen, wherein the flow rate of the argon is 50sccm, and the flow rate of the oxygen is 1200sccm.
AgO b The thickness of the layer is 8nm, wherein AgO b The layer is prepared by the following process: preparation of AgO using radio frequency magnetron sputtering b The layer is sputtered with power of 500W, power voltage of 500V, sputtering atmosphere is combined gas of argon and oxygen, wherein the flow rate of the argon is 50sccm, and the flow rate of the oxygen is 500sccm.
AgO m The thickness of the layer is 8nm, wherein AgO m The layer is prepared by the following process: preparation of AgO using radio frequency magnetron sputtering m The layer is sputtered with power of 250W, power voltage of 250V, sputtering atmosphere of combined gas of argon and oxygen, wherein the flow rate of the argon is 50sccm, and the flow rate of the oxygen is 1200sccm.
AgO n The thickness of the layer is 6nm, wherein AgO n The layer is prepared by the following process: preparation of AgO using radio frequency magnetron sputtering n The layer was sputtered at a power of 800W and a power voltage of 500V, the sputtering atmosphere was a combination of argon and oxygen, wherein the argon flow was 50sccm and the oxygen flow was 750sccm. Fig. 5 is a cross-sectional view of a TEM according to an embodiment of the present invention. FIG. 5 shows AgO of coated glass prepared according to example 1 m A cross-sectional view of the layer. Before and after the test, the glass surface was visually inspected for no observable color change, and other test results are shown in table 2, with reference to example 1 for parameter definition.
TABLE 2
| Transmittance 1 | Heat transfer coefficient 1 | Transmittance 2 | Heat transfer coefficient 2 |
| 66％ | 1.67 | 65％ | 1.63 |
Example 3
The energy-saving coated glass is provided with the following layers from inside to outside in sequence: a glass substrate layer, a first Si3N4 layer, a first buffer barrier layer, a first Ag layer, a second buffer barrier layerA second Ag layer, a third buffer barrier layer and a second Si3N4 layer. The first buffer barrier layer is provided with the following layers from inside to outside in sequence: agO (AgO) x Layer and AgO y A layer. The second buffer barrier layer is provided with the following layers from inside to outside in sequence: agO (AgO) a Layer, agO b A layer and an AZO layer. The third buffer barrier layer is provided with the following layers from inside to outside in sequence: agO (AgO) m Layer and AgO n A layer.
AgO x The thickness of the layer is 6nm, wherein AgO x The layer is prepared by the following process: preparation of AgO using radio frequency magnetron sputtering x The layer is made of pure Ag, the sputtering power is 400W, the power voltage is 400V, the sputtering atmosphere is a combined gas of argon and oxygen, wherein the flow of the argon is 40sccm, and the flow of the oxygen is 400sccm.
AgO y The thickness of the layer is 6nm, wherein AgO y The layer is prepared by the following process: preparation of AgO using radio frequency magnetron sputtering y The layer is made of pure Ag, the sputtering power is 230W, the power voltage is 230V, the sputtering atmosphere is a combined gas of argon and oxygen, wherein the flow of the argon is 40sccm, and the flow of the oxygen is 1000sccm.
AgO a The thickness of the layer is 6nm, wherein AgO a The layer is prepared by the following process: preparation of AgO using radio frequency magnetron sputtering a The layer is made of pure Ag, the sputtering power is 230W, the power voltage is 230V, the sputtering atmosphere is a combined gas of argon and oxygen, wherein the flow of the argon is 40sccm, and the flow of the oxygen is 1000sccm.
AgO b The thickness of the layer is 6nm, wherein AgO b The layer is prepared by the following process: preparation of AgO using radio frequency magnetron sputtering b The layer is made of pure Ag, the sputtering power is 400W, the power voltage is 400V, the sputtering atmosphere is a combined gas of argon and oxygen, wherein the flow of the argon is 40sccm, and the flow of the oxygen is 400sccm.
AgO m The thickness of the layer is 6nm, wherein AgO m The layer is prepared by the following process: preparation of AgO using radio frequency magnetron sputtering m The layer, the target material is pure Ag, the sputtering power is 230W, the power voltage is 230V, the sputtering atmosphere is the combined gas of argon and oxygen, wherein,the argon flow was 40sccm and the oxygen flow was 1000sccm.
AgO n The thickness of the layer is 6nm, wherein AgO n The layer is prepared by the following process: preparation of AgO using radio frequency magnetron sputtering n The layer is made of pure Ag, the sputtering power is 700W, the power supply voltage is 400V, the sputtering atmosphere is a combined gas of argon and oxygen, wherein the flow of the argon is 40sccm, and the flow of the oxygen is 700sccm. Before and after the test, the glass surface was visually inspected for no observable color change, and other test results are shown in table 3, with reference to example 1 for parameter definition.
TABLE 3 Table 3
| Transmittance 1 | Heat transfer coefficient 1 | Transmittance 2 | Heat transfer coefficient 2 |
| 69％ | 1.62 | 67％ | 1.58 |
Comparative example 1
Double silver low emissivity glass is purchased from China building material International engineering group Co. According to the sales person propaganda introduction, the purchased double-silver low-emissivity glass was manufactured according to an embodiment in CN110092593 a. Slight color changes were observed by visual inspection of the glass surface represented by comparative example 1 after and before the my test, and the test results of other comparative example 1 are shown in table 4, with test methods and parameter definitions being shown in example 1.
TABLE 4 Table 4
| Transmittance 1 | Heat transfer coefficient 1 | Transmittance 2 | Heat transfer coefficient 2 |
| 75％ | 1.62 | 62％ | 1.42 |
The reason for the rapid deterioration of the performance of comparative example 1 under high temperature, high humidity and ultraviolet environments has been described in the background of the invention and the previous section. The reason why the high temperature, high humidity and ultraviolet ray properties of examples 1 to 3 were remarkably improved may be that: the first buffer-barrier layer itself is an oxide component and it is not a stoichiometric standard oxide, and various oxygen groups in various valence states and forms may be present inside the AgO layer of the invention, which increases the chemical potential of the buffer-barrier layer itself and reduces the ability of oxygen elements to diffuse through the AgO layer interior as the functional layer; the lattice structure of the second AgO layer itself may have some ability to prevent diffusion of oxygen element through the layer; the third AgO layer and the Ag layer have better interface morphology, and the tightly connected interface prevents oxygen from diffusing from the interface. It should be understood by those skilled in the art that, due to the lack of related characterization means, the cause of the rapid deterioration of performance is only reasonable inferences made by the research and development team of my department based on the expertise and experimental results, and the actual microscopic mechanism needs to be studied by a special scientific research institution, and the exploration of such microscopic mechanism is not what should be responsible for the institution that is facing the production.
Comparative example 2
The energy-saving coated glass is provided with the following layers from inside to outside in sequence: a glass substrate layer, a first Si3N4 layer, a first oxide layer, a first Ag layer, a second oxide layer, a second Ag layer, a third oxide layer, and a second Si3N4 layer. The first oxide layer has the following layers from inside to outside in sequence: znO (zinc oxide) x Layer and ZnO y A layer. The second oxide layer is provided with the following layers from inside to outside in sequence: znO (zinc oxide) a Layer, znO b A layer and an AZO layer. The third oxide layer is provided with the following layers from inside to outside in sequence: znO (zinc oxide) m Layer and ZnO n A layer.
ZnO x The thickness of the layer is 6nm, wherein ZnO x The layer is prepared by the following process: preparation of ZnO by radio frequency magnetron sputtering x The layer is made of pure Zn as a target, the power of a sputtering power supply is 400W, the power voltage is 400V, the sputtering atmosphere is a combined gas of argon and oxygen, wherein the flow rate of the argon is 40sccm, and the flow rate of the oxygen is 400sccm.
ZnO y The thickness of the layer is 6nm, wherein ZnO y The layer is prepared by the following process: preparation of ZnO by radio frequency magnetron sputtering y The layer is made of pure Zn as a target, the sputtering power is 230W, the power supply voltage is 230V, the sputtering atmosphere is a combined gas of argon and oxygen, wherein the flow rate of the argon is 40sccm, and the flow rate of the oxygen is 1000sccm.
ZnO a The thickness of the layer is 6nm, wherein ZnO a The layer is prepared by the following process: preparation of ZnO by radio frequency magnetron sputtering a The layer is made of pure Zn as a target, the sputtering power is 230W, the power supply voltage is 230V, the sputtering atmosphere is a combined gas of argon and oxygen, wherein the flow rate of the argon is 40sccm, and the flow rate of the oxygen is 1000sccm.
ZnO b The thickness of the layer is 6nm, wherein ZnO b The layer is prepared by the following process: preparation of ZnO by radio frequency magnetron sputtering b The layer, the target material is pure Zn, the power of the sputtering power supply is 400W, the power supply voltage is 400V, the sputtering atmosphere is the combined gas of argon and oxygen, wherein, the flow rate of the argon is 40sccm, oxygen flow was 400sccm.
ZnO m The thickness of the layer is 6nm, wherein ZnO m The layer is prepared by the following process: preparation of ZnO by radio frequency magnetron sputtering m The layer is made of pure Zn as a target, the sputtering power is 230W, the power supply voltage is 230V, the sputtering atmosphere is a combined gas of argon and oxygen, wherein the flow rate of the argon is 40sccm, and the flow rate of the oxygen is 1000sccm.
ZnO n The thickness of the layer is 6nm, wherein ZnO n The layer is prepared by the following process: preparation of ZnO by radio frequency magnetron sputtering n The layer is made of pure Zn as a target, the power of a sputtering power supply is 700W, the power voltage is 400V, the sputtering atmosphere is a combined gas of argon and oxygen, wherein the flow rate of the argon is 40sccm, and the flow rate of the oxygen is 700sccm. Before and after the test, the glass surface represented by comparative example 2 was visually observed for no observable color change, and other test results are shown in table 5, with reference to example 1 for parameter definition.
TABLE 5
| Transmittance 1 | Heat transfer coefficient 1 | Transmittance 2 | Heat transfer coefficient 2 |
| 77％ | 1.63 | 69％ | 1.51 |
As is clear from comparison of examples with comparative example 2, if zinc oxide is used instead of silver oxide, the resistance to high temperature, high humidity and ultraviolet rays is reduced.
Comparative example 3
The energy-saving coated glass is provided with the following layers from inside to outside in sequence: the glass substrate layer, the first Si3N4 layer, the first buffer barrier layer, the first Ag layer, the second buffer barrier layer, the second Ag layer, the third buffer barrier layer and the second Si3N4 layer. The first buffer barrier layer is provided with the following layers from inside to outside in sequence: agO (AgO) x A layer. The second buffer barrier layer is provided with the following layers from inside to outside in sequence: agO (AgO) a And (3) an AZO layer. The third buffer barrier layer is provided with the following layers from inside to outside in sequence: agO (AgO) m A layer.
AgO x The thickness of the layer is 15nm, wherein AgO x The layer is prepared by the following process: preparation of AgO using radio frequency magnetron sputtering x The layer is sputtered with power of 500W, power voltage of 500V, sputtering atmosphere is combined gas of argon and oxygen, wherein the flow rate of the argon is 50sccm, and the flow rate of the oxygen is 500sccm.
AgO a The thickness of the layer is 15nm, wherein AgO a The layer is prepared by the following process: preparation of AgO using radio frequency magnetron sputtering a The layer is sputtered with power of 250W, power voltage of 250V, sputtering atmosphere of combined gas of argon and oxygen, wherein the flow rate of the argon is 50sccm, and the flow rate of the oxygen is 1200sccm.
AgO m The thickness of the layer is 15nm, wherein AgO m The layer is prepared by the following process: preparation of AgO using radio frequency magnetron sputtering m The layer is sputtered with power of 250W, power voltage of 250V, sputtering atmosphere of combined gas of argon and oxygen, wherein the flow rate of the argon is 50sccm, and the flow rate of the oxygen is 1200sccm. Before and after the test, the glass surface represented by comparative example 3 was visually observed for no observable color change, and other test results are shown in table 6, with reference to example 1 for parameter definition.
TABLE 6
| Transmittance 1 | Heat transfer coefficient 1 | Transmittance 2 | Heat transfer coefficient 2 |
| 73％ | 1.64 | 67％ | 1.54 |
Therefore, the gradient composite structure of the AgO is beneficial to improving the high temperature resistance, the high humidity resistance and the ultraviolet resistance of the glass.
Comparative example 4
The energy-saving coated glass is provided with the following layers from inside to outside in sequence: the glass substrate layer, the first Si3N4 layer, the first buffer barrier layer, the first Ag layer, the second buffer barrier layer, the second Ag layer, the third buffer barrier layer and the second Si3N4 layer. The first buffer barrier layer is provided with the following layers from inside to outside in sequence: agO (AgO) x Layer and AgO y A layer. The second buffer barrier layer is provided with the following layers from inside to outside in sequence: agO (AgO) a Layer, agO b A layer and an AZO layer. The third buffer barrier layer is provided with the following layers from inside to outside in sequence: agO (AgO) m Layer and AgO n A layer.
AgO x The thickness of the layer is 6nm, wherein AgO x The layer is prepared by the following process: preparation of AgO using radio frequency magnetron sputtering x The layer is made of pure Ag, the sputtering power is 1000W, the power supply voltage is 1000V, the sputtering atmosphere is a combined gas of argon and oxygen, wherein the flow of the argon is 40sccm, and the flow of the oxygen is 800sccm.
AgO y The thickness of the layer is 6nm, wherein AgO y The layer is prepared by the following process: preparation of AgO using radio frequency magnetron sputtering y The layer, the target material is pure Ag, the sputtering power is 800W, and the power voltage is 800And V, sputtering atmosphere is a combined gas of argon and oxygen, wherein the flow rate of the argon is 40sccm, and the flow rate of the oxygen is 2000sccm.
AgO a The thickness of the layer is 6nm, wherein AgO a The layer is prepared by the following process: preparation of AgO using radio frequency magnetron sputtering a The layer is made of pure Ag, the sputtering power is 800W, the power voltage is 800V, the sputtering atmosphere is a combined gas of argon and oxygen, wherein the flow rate of the argon is 40sccm, and the flow rate of the oxygen is 2000sccm.
AgO b The thickness of the layer is 6nm, wherein AgO b The layer is prepared by the following process: preparation of AgO using radio frequency magnetron sputtering b The layer is made of pure Ag, the sputtering power is 1000W, the power supply voltage is 100V, the sputtering atmosphere is a combined gas of argon and oxygen, wherein the flow of the argon is 40sccm, and the flow of the oxygen is 1000sccm. The remaining parameters were the same as in example 3. Slight color changes were observed by visual inspection of the glass surface represented by comparative example 4 before and after the test, and other test results are shown in Table 7, for parameter definition, see example 1.
TABLE 7
| Transmittance 1 | Heat transfer coefficient 1 | Transmittance 2 | Heat transfer coefficient 2 |
| 65％ | 1.61 | 50％ | 1.37 |
The reason for the performance degradation may be that defects between film layers are increased, even microscopic cracks occur, which leads to an increase in the passage of oxygen elements, and thus the high temperature, high humidity, ultraviolet ray resistance is significantly reduced, and scattering and refraction experienced during light propagation are increased due to the increase of defects, which in turn leads to a decrease in light transmittance.
It should be understood that, in various embodiments of the present invention, the written order of the processes described above does not mean that the processes are performed sequentially, and the order in which the processes are performed should be determined by their functions and inherent logic, and should not constitute any limitation on the implementation of the embodiments of the present invention.
It is to be understood that the above-described embodiments of the present invention are merely illustrative of or explanation of the principles of the present invention and are in no way limiting of the invention. Accordingly, any modification, equivalent replacement, improvement, etc. made without departing from the spirit and scope of the present invention should be included in the scope of the present invention. Furthermore, the appended claims are intended to cover all such changes and modifications that fall within the scope and boundary of the appended claims, or equivalents of such scope and boundary.
Claims (2)
1. The energy-saving coated glass comprises the following layers from inside to outside: glass substrate layer, first Si 3 N 4 Layer, first buffer barrier layer, first Ag layer, second buffer barrier layer, second Ag layer, third buffer barrier layer, and second Si 3 N 4 The layer, the first buffering barrier layer has the following layer from inside to outside in proper order: agO (AgO) x Layer and AgO y The layer, the second buffer barrier layer has the following layers from inside to outside in proper order: agO (AgO) a Layer, agO b The third buffer barrier layer is provided with the following layers from inside to outside: agO (AgO) m Layer and AgO n The layer of the material is formed from a layer,
AgO x the thickness of the layer is 5nm, wherein AgO x The layer is prepared by the following process: preparation of AgO using radio frequency magnetron sputtering x The layer, the target material is pure Ag, the sputtering power is 300W,the power supply voltage is 300V, the sputtering atmosphere is the combined gas of argon and oxygen, wherein the flow rate of the argon is 30sccm, the flow rate of the oxygen is 300sccm,
AgO y the thickness of the layer is 5nm, wherein AgO y The layer is prepared by the following process: preparation of AgO using radio frequency magnetron sputtering y The layer, the target material is pure Ag, the sputtering power is 250W, the power voltage is 250V, the sputtering atmosphere is the combined gas of argon and oxygen, wherein, the flow rate of the argon is 50sccm, the flow rate of the oxygen is 800sccm,
AgO a the thickness of the layer is 5nm, wherein AgO a The layer is prepared by the following process: preparation of AgO using radio frequency magnetron sputtering a The layer, the target material is pure Ag, the sputtering power is 200W, the power voltage is 200V, the sputtering atmosphere is the combined gas of argon and oxygen, wherein, the flow rate of the argon is 30sccm, the flow rate of the oxygen is 800sccm,
AgO b the thickness of the layer is 5nm, wherein AgO b The layer is prepared by the following process: preparation of AgO using radio frequency magnetron sputtering b The layer, the target material is pure Ag, the sputtering power is 300W, the power voltage is 300V, the sputtering atmosphere is the combined gas of argon and oxygen, wherein, the flow rate of the argon is 30sccm, the flow rate of the oxygen is 300sccm,
AgO m the thickness of the layer is 5nm, wherein AgO m The layer is prepared by the following process: preparation of AgO using radio frequency magnetron sputtering m The layer, the target material is pure Ag, the sputtering power is 200W, the power voltage is 200V, the sputtering atmosphere is the combined gas of argon and oxygen, wherein, the flow rate of the argon is 30sccm, the flow rate of the oxygen is 800sccm,
AgO n the thickness of the layer is 5nm, wherein AgO n The layer is prepared by the following process: preparation of AgO using radio frequency magnetron sputtering n The energy-saving coated glass has the advantages that the layer is made of pure Ag, the sputtering power is 600W, the power supply voltage is 300V, the sputtering atmosphere is the combined gas of argon and oxygen, wherein the argon flow is 30sccm, the oxygen flow is 600sccm, and after the energy-saving coated glass is placed for 100 days under the conditions that the temperature is 65 ℃ and the humidity is 85% and the Philips UV-C ultraviolet linear sterilizing lamp is directly irradiated with rated power in the air atmosphere, the transmittance of the energy-saving coated glass is 68%, and the heat transfer coefficient is 1.55.
2. The energy-saving coated glass comprises the following layers from inside to outside: glass substrate layer, first S i3 N 4 Layer, first buffer barrier layer, first Ag layer, second buffer barrier layer, second Ag layer, third buffer barrier layer, and second Si 3 N 4 The layer, the first buffering barrier layer has the following layer from inside to outside in proper order: agO (AgO) x Layer and AgO y The layer, the second buffer barrier layer has the following layers from inside to outside in proper order: agO (AgO) a Layer, agO b The third buffer barrier layer is provided with the following layers from inside to outside: agO (AgO) m Layer and AgO n The layer of the material is formed from a layer,
AgO x the thickness of the layer is 8nm, wherein AgO x The layer is prepared by the following process: preparation of AgO using radio frequency magnetron sputtering x The layer, the target material is pure Ag, the sputtering power is 500W, the power voltage is 500V, the sputtering atmosphere is the combined gas of argon and oxygen, wherein, the flow rate of the argon is 50sccm, the flow rate of the oxygen is 500sccm,
AgO y the thickness of the layer is 6nm, wherein AgO y The layer is prepared by the following process: preparation of AgO using radio frequency magnetron sputtering y The layer, the target material is pure Ag, the sputtering power is 250W, the power voltage is 250V, the sputtering atmosphere is the combined gas of argon and oxygen, wherein, the flow rate of the argon is 50sccm, the flow rate of the oxygen is 1200sccm,
AgO a the thickness of the layer is 8nm, wherein AgO a The layer is prepared by the following process: preparation of AgO using radio frequency magnetron sputtering a The layer, the target material is pure Ag, the sputtering power is 250W, the power voltage is 250V, the sputtering atmosphere is the combined gas of argon and oxygen, wherein, the flow rate of the argon is 50sccm, the flow rate of the oxygen is 1200sccm,
AgO b the thickness of the layer is 8nm, wherein AgO b The layer is prepared by the following process: preparation of AgO using radio frequency magnetron sputtering b The layer is made of pure Ag as target material, the sputtering power is 500W, the power voltage is 500V, the sputtering atmosphere is a combined gas of argon and oxygen, wherein the argon flow is 50sccm, and the oxygen flow is 50sccmThe amount was 500sccm,
AgO m the thickness of the layer is 8nm, wherein AgO m The layer is prepared by the following process: preparation of AgO using radio frequency magnetron sputtering m The layer, the target material is pure Ag, the sputtering power is 250W, the power voltage is 250V, the sputtering atmosphere is the combined gas of argon and oxygen, wherein, the flow rate of the argon is 50sccm, the flow rate of the oxygen is 1200sccm,
AgO n the thickness of the layer is 6nm, wherein AgO n The layer is prepared by the following process: preparation of AgO using radio frequency magnetron sputtering n The energy-saving coated glass has the advantages that the layer is made of pure Ag, the sputtering power is 800W, the power supply voltage is 500V, the sputtering atmosphere is the combined gas of argon and oxygen, wherein the argon flow is 50sccm, the oxygen flow is 750sccm, and after the energy-saving coated glass is placed for 100 days under the conditions that the temperature is 65 ℃ and the humidity is 85% and the Philips UV-C ultraviolet linear sterilizing lamp is directly irradiated with rated power in the air atmosphere, the transmittance of the energy-saving coated glass is 65%, and the heat transfer coefficient is 1.63.
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| WO2008152675A2 (en) * | 2007-06-15 | 2008-12-18 | Nantech Srl | Method for depositing ag on glass supports or the like |
| CN103144379A (en) * | 2011-12-06 | 2013-06-12 | 天津南玻节能玻璃有限公司 | Low-emissivity coated glass and manufacturing method thereof |
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| CN108582927A (en) * | 2018-05-02 | 2018-09-28 | 咸宁南玻节能玻璃有限公司 | Laminated glass and preparation method thereof after a kind of double silver low radiation elder generations plated film |
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| EP1829835A1 (en) * | 2006-03-03 | 2007-09-05 | Applied Materials GmbH & Co. KG | Infrared radiation reflecting coating system and method of its production |
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| WO2008152675A2 (en) * | 2007-06-15 | 2008-12-18 | Nantech Srl | Method for depositing ag on glass supports or the like |
| CN103144379A (en) * | 2011-12-06 | 2013-06-12 | 天津南玻节能玻璃有限公司 | Low-emissivity coated glass and manufacturing method thereof |
| CN103358619A (en) * | 2013-07-25 | 2013-10-23 | 林嘉佑 | High transparency type toughened double-silver low-e coated glass and preparation method thereof |
| CN108582927A (en) * | 2018-05-02 | 2018-09-28 | 咸宁南玻节能玻璃有限公司 | Laminated glass and preparation method thereof after a kind of double silver low radiation elder generations plated film |
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