CN114860098A - Three-dimensional sensing device and manufacturing method thereof - Google Patents
Three-dimensional sensing device and manufacturing method thereof Download PDFInfo
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- CN114860098A CN114860098A CN202110156325.9A CN202110156325A CN114860098A CN 114860098 A CN114860098 A CN 114860098A CN 202110156325 A CN202110156325 A CN 202110156325A CN 114860098 A CN114860098 A CN 114860098A
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 20
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims abstract description 30
- 239000000758 substrate Substances 0.000 claims abstract description 29
- 239000000463 material Substances 0.000 claims abstract description 13
- 238000000034 method Methods 0.000 claims description 75
- 230000008569 process Effects 0.000 claims description 55
- 238000000059 patterning Methods 0.000 claims description 39
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- 230000001070 adhesive effect Effects 0.000 claims description 11
- 239000002042 Silver nanowire Substances 0.000 claims description 9
- 239000002033 PVDF binder Substances 0.000 claims description 7
- 229920002981 polyvinylidene fluoride Polymers 0.000 claims description 7
- 239000011248 coating agent Substances 0.000 claims description 4
- 238000000576 coating method Methods 0.000 claims description 4
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 claims description 4
- 238000010329 laser etching Methods 0.000 claims description 4
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- 238000005530 etching Methods 0.000 description 6
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- 238000005299 abrasion Methods 0.000 description 1
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/0412—Digitisers structurally integrated in a display
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/0414—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means using force sensing means to determine a position
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/0416—Control or interface arrangements specially adapted for digitisers
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
- G06F3/0445—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using two or more layers of sensing electrodes, e.g. using two layers of electrodes separated by a dielectric layer
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/126—Shielding, e.g. light-blocking means over the TFTs
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/40—OLEDs integrated with touch screens
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- G—PHYSICS
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- G06F—ELECTRIC DIGITAL DATA PROCESSING
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- G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
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- G—PHYSICS
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- G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
- G06F2203/04112—Electrode mesh in capacitive digitiser: electrode for touch sensing is formed of a mesh of very fine, normally metallic, interconnected lines that are almost invisible to see. This provides a quite large but transparent electrode surface, without need for ITO or similar transparent conductive material
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Abstract
A three-dimensional sensing device and a manufacturing method thereof are provided. The pressure sensing film includes a substrate and a polarized pressure sensing layer. The pressure sensing layer is disposed on and in contact with the first side of the substrate. The nano silver electrode is arranged on the other side of the pressure sensing layer opposite to the substrate. The first touch sensing electrode layer is disposed on and in contact with the second side of the substrate and includes a patterned electrode having a burr etch. The patterned electrode includes a plurality of first axial electrodes. Two adjacent ones of the first axial electrodes have a spacing between 20 microns and 35 microns. The second touch sensing electrode layer is arranged on the other side, opposite to the pressure sensing layer, of the first touch sensing electrode layer. Therefore, the piezoelectric property of the polarized piezoelectric material in the pressure sensing film is not affected by temperature to be degraded or lost.
Description
Technical Field
The invention relates to a three-dimensional sensing device and a manufacturing method thereof.
Background
As the demand for touch pressure sensing applications is greatly increased, related integration applications are correspondingly generated. In response to the portable requirement, the product has attracted attention when it is loaded with applications with touch, pressure and display functions.
Currently, some prior art methods employ a method of manufacturing a pressure sensing module and a touch sensing module simultaneously, wherein the piezoelectric material of the pressure sensing module needs to be polarized in advance, and the touch sensing module or other module components are often manufactured by a high temperature process (e.g. above 100 ℃), such as the high temperature heat treatment process mentioned in the CN108227978A of the prior art. However, this high temperature process may degrade or lose the piezoelectric properties of the polarized piezoelectric material.
Therefore, how to provide a three-dimensional sensing device and a method for manufacturing the same that can solve the above problems is one of the problems that the industry needs to invest in research and development resources to solve.
Disclosure of Invention
It is therefore an objective of the claimed invention to provide a three-dimensional sensing device and a method for manufacturing the same that can solve the above-mentioned problems.
In order to achieve the above objects, according to one embodiment of the present invention, a three-dimensional sensing device includes a pressure sensing film, a nano-silver electrode, a first touch sensing electrode layer, and a second touch sensing electrode layer. The pressure sensing film includes a substrate and a polarized pressure sensing layer. The pressure sensing layer is disposed on and in contact with the first side of the substrate. The nano silver electrode is arranged on the other side of the pressure sensing layer opposite to the substrate. The first touch sensing electrode layer is disposed on and in contact with the second side of the substrate and includes a patterned electrode having a burr etch. The patterned electrode includes a plurality of first axial electrodes. Two adjacent ones of the first axial electrodes have a spacing between 20 microns and 35 microns. The second touch sensing electrode layer is arranged on the other side, opposite to the pressure sensing layer, of the first touch sensing electrode layer.
In one or more embodiments of the present invention, the first touch sensing electrode layer is a silver nanowire electrode layer.
In one or more embodiments of the present invention, the three-dimensional sensing device further includes a bonding adhesive. The adhesive is adhered between the first touch sensing electrode layer and the second touch sensing electrode layer.
In one or more embodiments of the present invention, the first touch sensing electrode layer includes an active electrode region and an inactive electrode region. The active electrode regions are separated from the inactive electrode regions. The first axial electrode is located within the active electrode region.
In one or more embodiments of the present invention, the edge of each first axial electrode includes a plurality of arc-shaped profiles.
In one or more embodiments of the present invention, the second touch sensing electrode layer is a nano-silver wire electrode layer or an indium tin oxide electrode layer.
In one or more embodiments of the present invention, the pressure sensing layer is a polarized polyvinylidene fluoride layer.
To achieve the above object, according to one embodiment of the present invention, a method for manufacturing a three-dimensional sensing device includes: providing a pressure sensing film, wherein the pressure sensing film comprises a substrate and a pressure sensing layer, and the pressure sensing layer is arranged on and contacted with the first side of the substrate; forming a conductive layer on the second side of the substrate; patterning the conductive layer by using a laser patterning process so that the conductive layer becomes a first touch sensing electrode layer with a burr-etched patterned electrode; and forming a second touch sensing electrode layer on the other side of the first touch sensing electrode layer opposite to the pressure sensing layer.
In one or more embodiments of the present invention, the patterned electrode includes a plurality of first axial electrodes. Two adjacent ones of the first axial electrodes have a spacing between 20 microns and 35 microns.
In one or more embodiments of the present invention, the laser patterning process uses an infrared laser.
In one or more embodiments of the present invention, the method for manufacturing a three-dimensional sensing device further includes: and coating a nano silver electrode on the other side of the pressure sensing layer opposite to the substrate.
In one or more embodiments of the present invention, the step of forming the second touch sensing electrode layer includes: and bonding the second touch sensing electrode layer and the first touch sensing electrode layer by using a bonding adhesive.
In one or more embodiments of the present invention, the step of forming the second touch sensing electrode layer includes: and patterning the other conductive layer to make the other conductive layer become a second touch sensing electrode layer.
In one or more embodiments of the present invention, the step of patterning the another conductive layer includes: patterning the other conductive layer by using a laser patterning process so that the other conductive layer becomes a second touch sensing electrode layer with a burr-etched other patterned electrode.
In one or more embodiments of the present invention, the pressure sensing layer is a polarized polyvinylidene fluoride layer.
In one or more embodiments of the present invention, the laser patterning process is a low temperature laser etching process.
In one or more embodiments of the present invention, the process temperature of the laser patterning process is less than 100 ℃.
In summary, in the method for manufacturing a three-dimensional sensing device of the present invention, the first touch sensing electrode layer formed on the pressure sensing film is patterned by using a low-temperature laser patterning process to obtain a patterned electrode with burr etching, so that the piezoelectric property of the polarized piezoelectric material in the pressure sensing film is not deteriorated or lost due to the influence of temperature. In addition, since the second touch sensing electrode layer is bonded to the first touch sensing electrode layer by the adhesive after the patterned electrode is formed, the patterned electrode on the second touch sensing electrode layer can be flexibly formed by a high temperature process (e.g., a photolithography process) or a low temperature patterning process, thereby increasing process flexibility.
The foregoing is merely illustrative of the problems to be solved, solutions to problems, and effects produced by the present invention, and specific details thereof are set forth in the following description and the related drawings.
Drawings
In order to make the aforementioned and other objects, features, and advantages of the invention, as well as others which will become apparent, reference is made to the following description taken in conjunction with the accompanying drawings in which:
FIG. 1 is a schematic view illustrating a three-dimensional sensing device according to an embodiment of the invention;
FIG. 2 is a top view of the first touch sensing electrode layer and the second touch sensing electrode layer shown in FIG. 1;
FIG. 3 is a schematic diagram illustrating a laser patterning process forming a pattern on the first touch sensing electrode layer;
FIG. 4 is a partial enlarged view of the first touch sensing electrode layer shown in FIG. 3;
FIG. 5 is a flow chart showing a method of fabricating a three-dimensional sensing device.
[ notation ] to show
100 three-dimensional sensing device
110 pressure sensing film
110a base material
110b pressure sensing layer
120 first touch sensing electrode layer
121 first axial electrode
130 nano silver electrode
140 second touch sensing electrode layer
141 second axial electrode
150,160 routing
170 adhesive
180: covering layer
AA effective electrode area
DA ineffective electrode area
G is the distance between
S101 to S107 step
Detailed Description
In the following description, for purposes of explanation, numerous implementation details are set forth in order to provide a thorough understanding of the various embodiments of the present invention. It should be understood, however, that these implementation details are not to be interpreted as limiting the invention. That is, in some embodiments of the invention, such implementation details are not necessary. In addition, for the sake of simplicity, some conventional structures and elements are shown in the drawings in a simple schematic manner.
Referring to fig. 1, a schematic diagram of a three-dimensional sensing device 100 according to an embodiment of the invention is shown. As shown in fig. 1, the three-dimensional sensing device 100 includes a pressure sensing film 110, a first touch sensing electrode layer 120, a nano-silver electrode 130, a second touch sensing electrode layer 140, traces 150 and 160, and a bonding adhesive 170. Pressure-sensing membrane 110 includes a substrate 110a and a polarized pressure-sensing layer 110 b. The pressure sensing layer 110b is disposed on and in contact with the first side 110a1 of the substrate 110 a. The nano silver electrode 130 is disposed on the other side of the pressure sensing layer 110b opposite to the substrate 110 a. The first touch sensing electrode layer 120 is disposed on and in contact with the second side 110a2 of the substrate 110 a. The trace 150 is disposed on the first touch sensing electrode layer 120 and electrically connected to the first touch sensing electrode layer 120. The second touch sensing electrode layer 140 is disposed on the other side of the first touch sensing electrode layer 120 opposite to the pressure sensing layer 110 b. The trace 160 is disposed on the second touch sensing electrode layer 140 and electrically connected to the second touch sensing electrode layer 140. The adhesive 170 is adhered between the first touch sensing electrode layer 120 and the second touch sensing electrode layer 140, and includes a dielectric material, so that the first touch sensing electrode layer 120 and the second touch sensing electrode layer 140 are electrically insulated. Thereby, the touch signal (e.g. mutual capacitance sensing signal) between the first touch sensing electrode layer 120 and the second touch sensing electrode layer 140 can be extracted through the traces 150 and 160.
In some embodiments, as shown in fig. 1, the three-dimensional sensing device 100 may further include a cover layer 180. The covering layer 180 covers a side of the second touch sensing electrode layer 140 away from the first touch sensing electrode layer 120.
Fig. 2 is a top view of the first touch sensing electrode layer 120 and the second touch sensing electrode layer 140 in fig. 1. As shown in fig. 2, the first touch sensing electrode layer 120 includes a plurality of first axial electrodes 121 spaced apart from each other. The second touch sensing electrode layer 140 includes a plurality of second axial electrodes 141 spaced apart from each other and crossing the first axial electrodes 121. The "first axis" and the "second axis" are, for example, two axes (for example, an X axis and a Y axis) perpendicular to each other. In other words, the first axial electrodes 121 are conductive traces extending along the first axis and are arranged at intervals. The second axial electrodes 141 are conductive traces extending along the second axis and are arranged at intervals.
In some embodiments, the first axial electrode 121 of the first touch sensing electrode layer 120 is a patterned electrode obtained by a laser patterning process. In the process of manufacturing the first touch sensing electrode layer 120, a conductive layer may be coated on the second side 110a2 of the substrate 110a, and then the conductive layer is patterned by using a laser patterning process, so that the conductive layer becomes the first touch sensing electrode layer 120 having a patterned electrode with burr etching. Therefore, the piezoelectric properties of the polarized piezoelectric material in the pressure sensing film 110 are not degraded or lost by the process temperature during the fabrication of the first touch sensing electrode layer 120.
In some embodiments, the laser patterning process is a low temperature laser etching process, but the invention is not limited thereto. In some embodiments, the process temperature of the laser patterning process is less than 100 ℃.
Referring to fig. 2 and 3 together, fig. 3 is a schematic diagram illustrating a laser patterning process forming a pattern on the first touch sensing electrode layer 120. In the embodiment where the patterned electrode of the first touch sensing electrode layer 120 is fabricated by a low temperature laser etching process, the conductive layer coated on the second side 110a2 of the substrate 110a can be patterned by a low temperature laser according to the pattern shown in fig. 3 (which can also be regarded as the traveling path of the low temperature laser) to obtain the first axial electrode 121.
Specifically, the first touch sensing electrode layer 120 includes an active electrode region AA and an inactive electrode region DA. The active electrode region AA is separated from the inactive electrode region DA. The first axial electrode 121 is located within the effective electrode area AA. It should be noted that the inactive area of the conventional touch sensing electrode layer can be directly washed away (e.g., by a photolithography process). However, for the first touch sensing electrode layer 120 adopting the laser patterning process, only the laser can be used to scan off the inner portions of the inactive electrode area DA to form the dummy electrode pattern areas (dummy pattern areas), and it should be noted that the inactive electrode area DA is not completely removed to form the electrically separated dummy electrode pattern areas, which brings a beneficial effect of effectively avoiding the electrostatic damage (i.e., effectively resisting ESD).
Referring to fig. 4, a partial enlarged view of the first touch sensing electrode layer 120 in fig. 3 is shown. As shown in fig. 4, the edge of each first axial electrode 121 includes a plurality of arc-shaped profiles. For example, the laser beam used in the laser patterning process is spirally etched on the first touch sensing electrode layer 120, so that the edge of the first axial electrode 121 includes a plurality of sequentially connected arc-shaped contours. The foregoing "flash etching" refers to these arcuate profiles.
In some embodiments, two adjacent first axial electrodes 121 have a gap G between 20 to 35 microns. The aforementioned range is equal to or slightly larger than the diameter of the laser beam used in the laser patterning process, and the laser sintering energy can make the gap G slightly larger than the diameter of the laser beam.
In some embodiments, the pressure sensing layer 110b is a layer of polarized polyvinylidene fluoride (PVDF). That is, the material of the pressure sensing layer 110b includes polyvinylidene fluoride. In other words, the pressure sensing layer 110b is a lattice piezoelectric material. When a stress is applied to the material in a certain direction to cause deformation, the size and direction of the dipole change, and the amount of charge changes, thereby generating a voltage.
In some embodiments, the first touch sensing electrode layer 120 is a Silver Nanowire (SNW) electrode layer. In detail, the first touch sensing electrode layer 120 includes a matrix and a nano silver wire doped therein. The nano silver wires are mutually lapped in the matrix to form a conductive network. The matrix is non-nano silver wire substance formed by coating, heating, drying and other processes of the solution containing nano silver wires. The silver nanowires are dispersed or embedded in the matrix and partially protrude from the matrix. The matrix can protect the nano silver wires from the influence of external environments such as corrosion, abrasion and the like. In some embodiments, the matrix is compressible.
In some embodiments, the silver nanowires have a wire length of about 10 μm to about 300 μm. In some embodiments, the wire diameter (or line width) of the silver nanowires is less than about 500 nm. In some embodiments, the aspect ratio (ratio of wire length to wire diameter) of the silver nanowires is greater than 10. In some embodiments, the nano silver wire may be a deformed form of other conductive metal nanowire surface or non-conductive nanowire surface silver-plated substance. The nano silver wire electrode layer formed by the nano silver wire has the following advantages: compared with ITO, the ITO film has the advantages of low price, simple process, good flexibility, capability of resisting bending … and the like.
In some embodiments, the second touch sensing electrode layer 140 is a nano-silver wire electrode layer that is the same as or similar to the first touch sensing electrode layer 120. The second axial electrode 141 of the second touch sensing electrode layer 140 may be a patterned electrode obtained by a laser patterning process. In the process of manufacturing the second touch sensing electrode layer 140, a laser patterning process may be used to pattern another conductive layer, so that the another conductive layer becomes the second touch sensing electrode layer 140 having a patterned electrode (i.e., the second axial electrode 141) with burr etching. In practical applications, the second axial electrode 141 can be obtained by patterning the further conductive layer according to a further pattern (not shown) similar to the pattern shown in fig. 3 using a low temperature laser.
In some embodiments, the second touch sensing electrode layer 140 is an Indium Tin Oxide (ITO) electrode layer. In the process of manufacturing the second touch sensing electrode layer 140, a yellow light process is used to pattern another conductive layer made of Indium Tin Oxide (ITO) as a material, so that the another conductive layer becomes the second touch sensing electrode layer 140 having a plurality of second axial electrodes 141, and since the another conductive layer is manufactured separately and then attached to the second touch sensing electrode layer, the piezoelectric property of the polarized piezoelectric material in the pressure sensing film 110 is not affected even if the second touch sensing electrode layer 140 is made of ITO and then attached to the first touch sensing electrode layer 120 after a high temperature process is used.
Referring to fig. 5, a flow chart of a method for manufacturing a three-dimensional sensing device is shown. As shown in fig. 5, the method for manufacturing a three-dimensional sensing device includes steps S101 to S106.
Step S101: providing a pressure sensing film, wherein the pressure sensing film comprises a substrate and a pressure sensing layer, and the pressure sensing layer is arranged and contacted with the first side of the substrate.
Step S102: a conductive layer is formed on the second side of the substrate.
Step S103: the conductive layer is patterned by a laser patterning process to form a first touch sensing electrode layer including a burr-etched patterned electrode.
Step S104: and coating a nano silver electrode on the other side of the pressure sensing layer opposite to the substrate.
Step S105: and patterning the other conductive layer to make the other conductive layer become a second touch sensing electrode layer.
Step S106: and bonding the second touch sensing electrode layer and the first touch sensing electrode layer by using a bonding adhesive.
In some embodiments, the laser patterning process is performed by using an infrared laser, but the disclosure is not limited thereto.
In some embodiments, steps S102 and S103 may be performed before step S105. In some embodiments, steps S102 and S103 may be performed later than step S105.
In some embodiments, in step S105, the other conductive layer may also be patterned by using the laser patterning process adopted in step S103, so that the other conductive layer becomes the second touch sensing electrode layer having the other patterned electrode with burr etching.
In some embodiments, the method for manufacturing a three-dimensional sensing device may further include step S107.
Step S107: and forming a covering layer on one side of the second touch sensing electrode layer far away from the first touch sensing electrode layer.
In some embodiments, the process temperature of the low temperature patterning process is less than 100 ℃.
As is apparent from the above description of the embodiments of the invention, in the method for manufacturing a three-dimensional sensor device according to the invention, the first touch sensing electrode layer formed on the pressure sensing film is patterned by using a low-temperature laser patterning process to obtain a patterned electrode with burr etching, so that the piezoelectric property of the polarized piezoelectric material in the pressure sensing film is not deteriorated or lost due to the influence of temperature. In addition, since the second touch sensing electrode layer is bonded to the first touch sensing electrode layer by the adhesive after the patterned electrode is formed, the patterned electrode on the second touch sensing electrode layer can be flexibly formed by a high temperature process (e.g., a photolithography process) or a low temperature patterning process, thereby increasing process flexibility.
Although the present invention has been described with reference to the above embodiments, it should be understood that various changes and modifications can be made therein by those skilled in the art without departing from the spirit and scope of the invention as defined in the appended claims.
Claims (18)
1. A three-dimensional sensing device, comprising:
a pressure sensing membrane, comprising:
a substrate; and
a polarized pressure sensing layer disposed and contacting a first side of the substrate;
the nano silver electrode is arranged on the other side of the pressure sensing layer relative to the base material;
a first touch sensing electrode layer disposed and in contact with a second side of the substrate and comprising a patterned electrode having a flash etch, the patterned electrode comprising a plurality of first axial electrodes, wherein two adjacent ones of the plurality of first axial electrodes have a spacing between 20 microns and 35 microns; and
and the second touch sensing electrode layer is arranged on the other side of the first touch sensing electrode layer relative to the pressure sensing layer.
2. The three-dimensional sensing device according to claim 1, wherein the first touch sensing electrode layer is a silver nanowire electrode layer.
3. The three-dimensional sensing device according to claim 1, further comprising a bonding adhesive bonded between the first touch sensing electrode layer and the second touch sensing electrode layer.
4. The three-dimensional sensing device according to claim 1, wherein the first touch sensing electrode layer comprises an active electrode region and an inactive electrode region, the active electrode region is separated from the inactive electrode region, and the plurality of first axial electrodes are located within the active electrode region.
5. The three-dimensional sensing device according to claim 1, wherein an edge of each of the first axial electrodes comprises a plurality of arcuate profiles.
6. The three-dimensional sensing device according to claim 1, wherein the second touch sensing electrode layer is a nano-silver wire electrode layer or an indium tin oxide electrode layer.
7. The three-dimensional sensing device according to claim 1, wherein the pressure sensing layer is a polarized polyvinylidene fluoride layer.
8. A method for fabricating a three-dimensional sensing device, comprising:
providing a pressure sensing film, wherein the pressure sensing film comprises a substrate and a pressure sensing layer, and the pressure sensing layer is arranged on and contacted with a first side of the substrate;
forming a conductive layer on a second side of the substrate;
patterning the conductive layer by using a laser patterning process to enable the conductive layer to become a first touch sensing electrode layer with a patterned electrode etched by burrs; and
and forming a second touch sensing electrode layer on the other side of the first touch sensing electrode layer opposite to the pressure sensing layer.
9. The method of claim 8, wherein the patterned electrode comprises a plurality of first axial electrodes, and two adjacent first axial electrodes have a spacing of 20 to 35 μm.
10. The method of claim 8, wherein the laser patterning process is performed using an infrared laser.
11. The method of manufacturing a three-dimensional sensing device according to claim 8, further comprising:
and coating a nano silver electrode on the other side of the pressure sensing layer opposite to the substrate.
12. The method as claimed in claim 8, wherein the step of forming the second touch sensing electrode layer comprises:
the second touch sensing electrode layer and the first touch sensing electrode layer are bonded by using a bonding adhesive.
13. The method as claimed in claim 8, wherein the step of forming the second touch sensing electrode layer comprises:
patterning another conductive layer to make the another conductive layer become the second touch sensing electrode layer.
14. The method of claim 13, wherein the patterning the another conductive layer comprises:
patterning the other conductive layer by using the laser patterning process to make the other conductive layer become the second touch sensing electrode layer with a burr-etched other patterned electrode.
15. The method of claim 8, wherein the pressure sensing layer is a polarized polyvinylidene fluoride layer.
16. The method of claim 8, wherein the laser patterning process is a low temperature laser etching process.
17. The method of claim 8, wherein a process temperature of the laser patterning process is less than 100 ℃.
18. The method of claim 8, wherein the first touch sensing electrode layer is a silver nanowire electrode layer.
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| CN202110156325.9A CN114860098A (en) | 2021-02-04 | 2021-02-04 | Three-dimensional sensing device and manufacturing method thereof |
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| CN105094425A (en) * | 2015-07-17 | 2015-11-25 | 苏州诺菲纳米科技有限公司 | Touch sensor, preparation method thereof and display device provided with touch sensor |
| CN105302357A (en) * | 2014-06-02 | 2016-02-03 | Lg伊诺特有限公司 | Touch panel |
| CN105320328A (en) * | 2014-07-25 | 2016-02-10 | 南京瀚宇彩欣科技有限责任公司 | Touch display panel |
| CN106339132A (en) * | 2016-10-20 | 2017-01-18 | 友达光电（昆山）有限公司 | Touch panel |
| CN106933398A (en) * | 2015-12-31 | 2017-07-07 | 瀚宇彩晶股份有限公司 | Contact panel and electronic installation |
| TWM607063U (en) * | 2020-07-28 | 2021-02-01 | 大陸商宸美（廈門）光電有限公司 | Three-dimensional sensing panel and electronic apparatus |
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| CN105302357A (en) * | 2014-06-02 | 2016-02-03 | Lg伊诺特有限公司 | Touch panel |
| CN105320328A (en) * | 2014-07-25 | 2016-02-10 | 南京瀚宇彩欣科技有限责任公司 | Touch display panel |
| CN105094425A (en) * | 2015-07-17 | 2015-11-25 | 苏州诺菲纳米科技有限公司 | Touch sensor, preparation method thereof and display device provided with touch sensor |
| CN106933398A (en) * | 2015-12-31 | 2017-07-07 | 瀚宇彩晶股份有限公司 | Contact panel and electronic installation |
| CN106339132A (en) * | 2016-10-20 | 2017-01-18 | 友达光电（昆山）有限公司 | Touch panel |
| TWM607063U (en) * | 2020-07-28 | 2021-02-01 | 大陸商宸美（廈門）光電有限公司 | Three-dimensional sensing panel and electronic apparatus |
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