CN114327118A - Transparent conductive film, method for manufacturing transparent conductive film, and touch panel - Google Patents
Transparent conductive film, method for manufacturing transparent conductive film, and touch panel Download PDFInfo
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- CN114327118A CN114327118A CN202011075202.4A CN202011075202A CN114327118A CN 114327118 A CN114327118 A CN 114327118A CN 202011075202 A CN202011075202 A CN 202011075202A CN 114327118 A CN114327118 A CN 114327118A
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- film
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- substrate
- conductive grid
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
- G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
- G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
- G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
- G06F2203/04112—Electrode mesh in capacitive digitiser: electrode for touch sensing is formed of a mesh of very fine, normally metallic, interconnected lines that are almost invisible to see. This provides a quite large but transparent electrode surface, without need for ITO or similar transparent conductive material
Abstract
A transparent conductive film, a method for manufacturing the same and a touch panel are provided. The transparent conductive film includes: a substrate and a conductive mesh film. The substrate has a first surface. The conductive grid film is formed on the first surface of the substrate and mainly comprises a plurality of silver nanowires, wherein the conductive grid film comprises a plurality of grids, each grid comprises a plurality of wires and a plurality of blank areas, the surface resistance of the conductive grid film is 5 omega/sq-30 omega/sq, the width of each wire is 1 micrometer-10 micrometers, and the penetration rate of the conductive grid film is greater than 85%.
Description
Technical Field
The present invention relates to a transparent conductive film, and more particularly, to a transparent conductive film for manufacturing a touch panel and a method for manufacturing the transparent conductive film.
Background
The application range of the touch panel is more and more extensive, and many electronic products provide a touch interface to provide a user to directly operate or issue an instruction, so that the electronic products are more humanized. In the current manufacturing process of touch panels, the conventional metal mesh is made of thin film metal to achieve good penetrability, however, the metal mesh made of thin film metal has poor flexibility and is easy to break due to bending. Furthermore, in general, the metal mesh made of thin film metal requires additional metal wires to connect with the peripheral circuit, which results in higher impedance and thus signal loss and distortion. Therefore, the structure and manufacturing steps of the touch panel need to be further improved.
Disclosure of Invention
In view of the above, the present invention provides a novel touch panel and a method for manufacturing a transparent conductive film, so as to achieve the purposes of simplifying the process steps, reducing the manufacturing cost and protecting the environment.
The transparent conductive film of the present invention comprises: a substrate and a conductive mesh film. The substrate has a first surface. The conductive grid film is formed on the first surface of the substrate and mainly comprises a plurality of silver nanowires, wherein the conductive grid film comprises a plurality of grids, each grid comprises a plurality of wires and a plurality of blank areas, the surface resistance of the conductive grid film is 5 omega/sq-30 omega/sq, the width of each wire is 1 micrometer-10 micrometers, and the penetration rate of the conductive grid film is greater than 85%.
In one embodiment, the substrate has a display area and a peripheral area, the conductive grid film in the display area has a grid, the conductive grid film in the peripheral area has a plurality of wires, and the wires are electrically connected with the traces respectively.
In one embodiment, the wires are mainly made of silver nanowires, and the surface resistance of each wire and each wire is 0.1 Ω/sq-1 Ω/sq.
In one embodiment, each grid has an area of 100 square microns to 200 square microns.
In one embodiment, the method further comprises: the coating layer is formed on the conductive grid film and used for protecting the conductive grid film, and the thickness of the coating layer is 40 nanometers.
In one embodiment, the ratio of the sum of the areas of the white spaces to the area of the silver nanowire layer is 0.9-0.999.
The invention further provides a method for manufacturing the transparent conductive film, which comprises the following steps: coating a silver nanowire layer on the first surface of the substrate, wherein the silver nanowire layer mainly consists of a plurality of silver nanowires; patterning the silver nanowire layer to form a conductive grid film, wherein the conductive grid film comprises a plurality of grids, and each grid consists of a plurality of wires and a plurality of blank areas; and forming a transparent conductive film. The surface resistance value of the conductive grid film is 5-30 omega/sq, the width of each wire is 2-3 micrometers, and the penetration rate of the conductive grid film is greater than 85%.
In one embodiment, the surface resistance of each silver wire is 0.1ops to 1 ops.
In one embodiment, each grid has an area of 100 square microns to 200 square microns.
In one embodiment, the substrate has a display area and a peripheral area, the conductive grid film in the display area has a grid, the conductive grid film in the peripheral area has a plurality of wires, and the wires are electrically connected with the traces respectively.
In one embodiment, the wires are mainly made of silver nanowires, and the surface resistance of each wire and each wire is 0.1 Ω/sq-1 Ω/sq.
In one embodiment, the area of each blank area is 100 square microns to 200 square microns.
In one embodiment, the method further comprises: and coating a coating layer on the conductive grid film, wherein the thickness of the coating layer is 40 nanometers.
In one embodiment, the ratio of the area of the void to the area of the silver nanowire layer is 0.9-0.999.
The present invention further provides a touch panel having a display area and a peripheral area, the touch panel comprising: the first substrate, the first conductive grid film and the second conductive grid film. The first substrate is provided with a first surface and a second surface opposite to the first surface, and the first conductive grid film is formed on the first surface of the first substrate. And the second conductive grid film is formed on the first conductive grid film, wherein the first conductive grid film and the second conductive grid film are composed of a plurality of silver nanowires. The first conductive grid film and the second conductive grid film comprise a plurality of grids, each grid is composed of a plurality of wires and a plurality of blank areas, the surface resistance values of the first conductive grid film and the second conductive grid film are 5-30 omega/sq, the width of each wire is 1-10 micrometers, and the penetration rate of the first conductive grid film and the second conductive grid film is greater than 85%.
In one embodiment, the display device further comprises an adhesion layer formed between the first conductive mesh film and the second conductive mesh film.
In one embodiment, the display device further includes a second substrate having a third surface and a fourth surface opposite to the third surface, the second conductive mesh film is formed on the third surface of the second substrate, and an adhesive layer is formed between the first conductive mesh film and the fourth surface.
The present invention further provides a touch panel having a display area and a peripheral area, the touch panel comprising: the first substrate, the first conductive grid film and the second conductive grid film. The first substrate is provided with a first surface and a second surface opposite to the first surface, and the first conductive grid film is formed on the first surface of the first substrate. And the second conductive grid film is formed on the second surface of the first substrate, wherein the first conductive grid film and the second conductive grid film are composed of a plurality of silver nanowires. The first conductive grid film and the second conductive grid film comprise a plurality of grids, each grid is composed of a plurality of wires and a plurality of blank areas, the surface resistance values of the first conductive grid film and the second conductive grid film are 5-30 omega/sq, the width of each wire is 1-10 micrometers, and the penetration rate of the first conductive grid film and the second conductive grid film is greater than 85%.
The invention provides a transparent conductive film, a manufacturing method of the transparent conductive film and a touch panel, and provides a silver nano grid film formed by silver nanowires, which has an ultra-low surface resistance value, can maintain good penetration rate, and has good bending resistance. Moreover, the metal wire in the peripheral area can be replaced by the wire consisting of the silver nanowires, so that the problem of contact impedance generated when the metal wire and the silver nano grid are connected in the prior art is solved, and the effects of reducing signal loss and distortion can be achieved.
Drawings
FIG. 1 is a top view of a transparent conductive film according to some embodiments of the present invention;
FIG. 2 is a cross-sectional view of a transparent conductive film according to some embodiments of the invention;
FIG. 3 is a flow chart of a method of fabricating a transparent conductive film according to some embodiments of the invention;
FIG. 4 is a schematic cross-sectional view of a transparent conductive film according to some embodiments of the invention;
FIG. 5 is a schematic cross-sectional view of a transparent conductive film according to some embodiments of the invention;
fig. 6 is a schematic cross-sectional view of a touch panel according to some embodiments of the invention;
fig. 7 is a schematic cross-sectional view of a touch panel according to some embodiments of the invention;
fig. 8 is a schematic cross-sectional view of a touch panel according to some embodiments of the invention.
Description of reference numerals:
100: transparent conductive film
110. 610, 710, 720, 810: substrate
111. 112, 611, 612, 711, 712, 721, 722, 811, 812: surface of
120. 620, 630, 730, 740, 820, 830: conductive mesh film
121: grid mesh
122: blank area
123. 621, 631, 731, 741, 821, 831: wiring
130. 622, 632, 732, 742, 831, 832: conducting wire
140: silver nanowire layer
150: coating layer
640. 750: adhesive layer
AA: display area
PA: peripheral zone
300: method for manufacturing transparent conductive film
S310 to S340: step (ii) of
600. 700: touch panel
Detailed Description
In order that the objects, technical solutions and advantages of the present invention will become more apparent, the present invention will be further described in detail with reference to the accompanying drawings in conjunction with the following specific embodiments.
The following disclosure provides many different embodiments, or examples, for implementing different features of the invention. The components and configurations of the specific examples are used in the following discussion to simplify the present disclosure. Any examples discussed are intended for illustrative purposes only and do not limit the scope or meaning of the invention or its illustrations in any way. Moreover, the present disclosure may repeat reference numerals and/or letters in the various examples, which are for purposes of simplicity and clarity, and do not in themselves dictate a relationship between the various embodiments and/or configurations discussed below.
As used herein, coupled or connected means that two or more elements are in direct physical or electrical contact with each other or in indirect physical or electrical contact with each other, and coupled or connected means that two or more elements are in operation or act with each other.
The term "on" is merely used to indicate relative positions, for example, a first element disposed on a second element may include the first element directly contacting the second element, or may include other additional elements between the first element and the second element, such that there is no direct contact between the first element and the second element.
It will be understood that the terms first, second, third, etc. may be used herein to describe various elements, components, regions, layers and/or sections. These elements, components, regions, layers, and/or blocks should not be limited by these terms. These terms are only used to distinguish one element, component, region, layer or section from another. Thus, a first element, component, region, layer or section discussed below could be termed a second element, component, region, layer or section without departing from the teachings of the present invention. As used herein, the term "and/or" includes any combination of one or more of the associated listed items. References to "and/or" in this document refer to any one, all, or any combination of at least one of the listed elements.
Please refer to fig. 1 and fig. 2. Fig. 1 is a top view of a transparent conductive film 100 according to some embodiments of the invention, and fig. 2 is a cross-sectional view of the transparent conductive film 100 according to some embodiments of the invention. As shown in fig. 1, the transparent conductive film 100 includes a substrate 110, a conductive mesh film 120, and a plurality of conductive lines 130. The substrate 110 has a display area AA and a non-display area PA, the conductive mesh film 120 is formed on the display area AA, and the conductive wires 130 are formed on the non-display area PA. In this embodiment, the substrate 110 is a transparent material commonly used in the art as a substrate for providing mechanical support or protection for the conductive mesh film 120, but a flexible material is preferred, such as polyvinyl chloride (PVC), polypropylene (PP), polyethylene terephthalate (PET), cyclo-olefin polymer (COP), polyethylene naphthalate (PEN), triacetyl cellulose (TAC), Polycarbonate (PC), Polystyrene (PS), Polyimide (Polyimide), etc.
As described above, as shown in fig. 1 and 2, the substrate 110 has a surface 111 and a surface 112 opposite to the surface 111, and the conductive mesh thin film 120 is formed on the surface 111 of the substrate 110. In this embodiment, the conductive mesh film 120 mainly comprises a plurality of Silver Nanowires (SNW), the conductive mesh film 120 includes a plurality of meshes 121, and the meshes 121 comprise a plurality of blank areas 122 and a plurality of traces 123. It is noted that the trace 123 is electrically connected to the conductive line 130 located in the peripheral region PA.
Please refer to fig. 3 and fig. 4. Fig. 3 is a flowchart illustrating a method 300 for manufacturing a transparent conductive film according to an embodiment of the invention, and fig. 4 is a schematic cross-sectional view illustrating the transparent conductive film 100 according to some embodiments of the invention. In the present embodiment, according to the steps shown in fig. 3 to prepare the transparent conductive film 100 shown in fig. 1 and 2, the method 300 for manufacturing a transparent conductive film first performs step S310 to coat the silver nanowire layer 140 on the surface 111 of the substrate 110, and then performs step S320 to coat the coating layer 150 on the silver nanowire layer 140. In this embodiment, the silver nanowire layer 140 is mainly composed of a plurality of silver nanowires. A coating layer 150(overcoat) is formed on the silver nanowire layer 140 to provide a protective effect to improve durability of the silver nanowires. Notably, the thickness of the coating layer 150 is about 40 nanometers.
As mentioned above, the method 300 for manufacturing the transparent conductive film then performs the step S330 of patterning the silver nanowire layer 140 and the coating layer 150 to form the conductive mesh film 120, and the step S340 of forming the transparent conductive film 100. Referring to fig. 5, fig. 5 is a cross-sectional view of a transparent conductive film 100 according to some embodiments of the invention. In the present embodiment, the silver nanowire layer 140 is patterned by an exposure and development process through the photoresist, the conductive mesh film 120 is formed in the display area AA, and the conductive wires 130 are formed in the peripheral area PA, so as to complete the transparent electric film 100.
As mentioned above, it should be noted that the wires 130 are mainly made of silver nanowires and are made of the same material as the conductive grid film 120, so that the wires in the display area AA and the wires in the peripheral area PA can be manufactured synchronously, thereby reducing the signal loss and distortion problem when the wires in the display area AA and the wires in the peripheral area PA are connected.
As mentioned above, in this embodiment, the transmittance of the conductive mesh film 120 is greater than 85%, the area resistance of the conductive mesh film 120 is 5 Ω/sq (ohm per square) -30 Ω/sq, the width of each trace 122 is 1 μm-10 μm, preferably 2 μm-3 μm, the area resistance of each trace 122 and each conductive wire 130 is 0.1 Ω/sq-1 Ω/sq, and the area of each blank area 123 is 100 μm to 200 μm. Notably, the ratio of the area of the blank area 123 to the area of the silver nanowire layer 140 is 0.9-0.999.
As mentioned above, the conventional metal grid is a continuous metal grid formed by using bulk metal and a photolithography etching process, however, the continuous metal grid formed by using bulk metal has poor flexibility, and as shown in table one below, the experimental comparison 3 examples include silver nanowires, silver nanowire combination coating (overcoat), and copper wires. The resistance value (ohm) of the continuous metal mesh formed by the copper wires is not measured after the continuous bending of the continuous metal mesh exceeds 38000 times, and the resistance value (ohm) of the silver nanowires which are not coated with the coating layer is not measured after the continuous bending of the silver nanowires exceeds 160000 times. However, the silver nanowires coated with the overcoat layer may be bent about 250000 times, and the resistance value (ohm) of the wire may still be measured. The measurement results are shown in table one:
watch 1
The result of the above test example 1 shows that the touch panel provided by the present invention has good bending characteristics, can be continuously bent for 250000 times, and the wire resistance change rate of the silver nanowires after bending is less than 1%.
In another embodiment, please refer to fig. 6. Fig. 6 is a schematic cross-sectional view of a touch panel 600 according to some embodiments of the invention. As shown in fig. 6, the touch panel 600 includes a substrate 610, conductive mesh films 620 and 630, and an adhesive layer 640, and the touch panel 600 has a display area AA and a non-display area PA. The substrate 610 has a surface 611 and a surface 612 opposite to the surface 611, the conductive mesh film 620 is formed on the surface 611 of the substrate 610, the conductive mesh film 630 is formed on the conductive mesh film 620, the adhesive layer 640 is formed between the conductive mesh film 620 and the conductive mesh film 630, and the conductive mesh film 630 is attached to the conductive mesh film 620 through the adhesive layer 640. It is noted that the traces 621 and 631 are formed on the display area AA, and the conductive traces 622 and 632 are formed on the non-display area PA.
As mentioned above, the conductive mesh films 620 and 630 in this embodiment are similar to the conductive mesh film 120, and the conductive mesh films 620 and 630 both have a plurality of meshes and a plurality of conductive wires, but the description of the same is not repeated.
In another embodiment, please refer to fig. 7. Fig. 7 is a cross-sectional view of a touch panel 700 according to some embodiments of the invention. As shown in fig. 7, the touch panel 700 includes substrates 710 and 720, conductive mesh films 730 and 740, and an adhesive layer 750, and the touch panel 700 has a display area AA and a non-display area PA. Substrate 710 has a surface 711 and a surface 712 opposite surface 711, and substrate 720 has a surface 721 and a surface 722 opposite surface 721. A conductive mesh film 730 is formed on the surface 711 of the substrate 710 and a conductive mesh film 740 is formed on the surface 721 of the substrate 720. The adhesive layer 750 is formed between the conductive mesh film 730 and the surface 722 of the substrate 720, and the substrate 720 is attached to the conductive mesh film 730 through the adhesive layer 750. It is noted that the traces 731 and 741 are formed on the display area AA, and the wires 732 and 742 are formed on the non-display area PA.
As mentioned above, the conductive mesh films 730 and 740 in the present embodiment are similar to the conductive mesh film 120, and the conductive mesh films 730 and 740 both have a plurality of meshes and a plurality of conductive wires, but the description of the same is not repeated.
In another embodiment, please refer to fig. 8. Fig. 8 is a cross-sectional view of a touch panel 800 according to some embodiments of the invention. As shown in fig. 8, the touch panel 800 includes a substrate 810 and conductive mesh films 820 and 830, and the touch panel 800 has a display area AA and a non-display area PA. The substrate 810 has a surface 811 and a surface 812 opposite the surface 811, a conductive mesh film 820 is formed on the surface 811 of the substrate 810, and a conductive mesh film 830 is formed on the surface 812 of the substrate 810. The traces 821 and 831 are formed on the display area AA, and the conductive lines 822 and 832 are formed on the non-display area PA. It is noted that in this embodiment, an adhesive layer (not shown in fig. 8) may be further included for attaching the conductive mesh films 820 and 830 to a display panel to complete a touch display panel.
As mentioned above, the conductive mesh thin films 820 and 830 in this embodiment are similar to the conductive mesh thin film 120, and the conductive mesh thin films 820 and 830 have a plurality of meshes and a plurality of conductive wires, which are not described herein again.
As can be seen from the foregoing embodiments, the transparent conductive film, the method for manufacturing the transparent conductive film, and the touch panel of the present invention provide a silver nano-grid film formed by silver nanowires, which has an ultra-low surface resistance value and can maintain a good transmittance, and the silver nano-grid film also has a good bending resistance. Moreover, the silver nano grid can be used for replacing the metal conducting wire in the peripheral area, the problem of contact impedance generated when the metal conducting wire and the silver nano grid are connected in the past is solved, and the effects of reducing signal loss and distortion can be achieved.
The above-mentioned embodiments are intended to illustrate the objects, technical solutions and advantages of the present invention in further detail, and it should be understood that the above-mentioned embodiments are only exemplary embodiments of the present invention and are not intended to limit the present invention, and any modifications, equivalents, improvements and the like made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (16)
1. A transparent conductive film comprising:
a substrate having a first surface; and
a conductive grid film formed on the first surface of the substrate, the conductive grid film mainly comprising a plurality of silver nanowires;
the conductive grid film comprises a plurality of grids, the grids are composed of a plurality of wires and a plurality of blank areas, the surface resistance value of the conductive grid film is 5 omega/sq-30 omega/sq, the width of each wire is 1 micrometer-10 micrometers, and the penetration rate of the conductive grid film is more than 85%.
2. The transparent conductive film as claimed in claim 1, wherein the substrate has a display area and a peripheral area, the conductive mesh film in the display area has the plurality of meshes, the conductive mesh film in the peripheral area has a plurality of wires, and the wires are electrically connected to the traces respectively.
3. The transparent conductive film as claimed in claim 2, wherein the conductive lines are mainly composed of the silver nanowires, and a surface resistance of each of the traces and each of the conductive lines is 0.1 Ω/sq-1 Ω/sq.
4. The transparent conductive film according to claim 1, wherein the area of each of the blank regions is 100-200 μm.
5. The transparent conductive film of claim 1, further comprising:
and a coating layer formed on the conductive grid film for protecting the conductive grid film, wherein the thickness of the coating layer is 40 nm.
6. The transparent conductive film of claim 1, wherein the ratio of the sum of the areas of the blank areas to the area of the silver nanowire layer is 0.9-0.999.
7. A method of manufacturing a transparent conductive film, comprising:
coating a silver nanowire layer on a first surface of a substrate, wherein the silver nanowire layer mainly comprises a plurality of silver nanowires;
patterning the silver nanowire layer to form a conductive grid film, wherein the conductive grid film comprises a plurality of grids, and the grids are composed of a plurality of wires and a plurality of blank areas; and
forming a transparent conductive film;
the surface resistance value of the conductive grid film is 5-30 omega/sq, the width of each wire is 1-10 micrometers, and the penetration rate of the conductive grid film is more than 85%.
8. The method according to claim 7, wherein the substrate has a display area and a peripheral area, the conductive mesh film in the display area has the plurality of meshes, the conductive mesh film in the peripheral area has a plurality of wires, and the wires are electrically connected to the traces respectively.
9. The method according to claim 8, wherein the conductive wires are mainly formed of the silver nanowires, and a surface resistance of each of the traces and each of the conductive wires is 0.1 Ω/sq-1 Ω/sq.
10. The method according to claim 7, wherein the area of each of the blank regions is 100-200 μm.
11. The method of manufacturing a transparent conductive film according to claim 7, further comprising:
coating a coating layer on the silver nanowire layer, wherein the thickness of the coating layer is 40 nm.
12. The method of claim 8, wherein the ratio of the area of the blank regions to the area of the silver nanowire layer is 0.9-0.999.
13. A touch panel having a display area and a peripheral area, the touch panel comprising:
a first substrate having a first surface and a second surface opposite to the first surface;
a first conductive mesh film formed on the first surface of the first substrate; and
a second conductive mesh film formed on the first conductive mesh film, wherein the first conductive mesh film and the second conductive mesh film are composed of a plurality of silver nanowires;
the first conductive grid film and the second conductive grid film comprise a plurality of grids, the grids are composed of a plurality of wires and a plurality of blank areas, the surface resistance values of the first conductive grid film and the second conductive grid film are 5 omega/sq-30 omega/sq, the width of each wire is 1 micrometer-10 micrometers, and the penetration rate of the first conductive grid film and the second conductive grid film is greater than 85%.
14. The touch panel of claim 13, further comprising an adhesive layer formed between the first conductive mesh film and the second conductive mesh film.
15. The touch panel of claim 13, further comprising a second substrate having a third surface and a fourth surface opposite to the third surface, and an adhesive layer formed between the first conductive mesh film and the fourth surface.
16. A touch panel having a display area and a peripheral area, the touch panel comprising:
a first substrate having a first surface and a second surface opposite to the first surface;
a first conductive mesh film formed on the first surface of the first substrate; and
a second conductive mesh film formed on the second surface of the first substrate, wherein the first conductive mesh film and the second conductive mesh film are composed of a plurality of silver nanowires;
the first conductive grid film and the second conductive grid film comprise a plurality of grids, the grids are composed of a plurality of wires and a plurality of blank areas, the surface resistance values of the first conductive grid film and the second conductive grid film are 5 omega/sq-30 omega/sq, the width of each wire is 1 micrometer-10 micrometers, and the penetration rate of the first conductive grid film and the second conductive grid film is greater than 85%.
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011075202.4A CN114327118A (en) | 2020-10-09 | 2020-10-09 | Transparent conductive film, method for manufacturing transparent conductive film, and touch panel |
| JP2021038466A JP2022063203A (en) | 2020-10-09 | 2021-03-10 | Transparent conductive film, method for manufacturing transparent conductive film, and touch panel |
| KR1020210031895A KR20220047500A (en) | 2020-10-09 | 2021-03-11 | Transparent conductive film, manufacturing method of a transparent conductive film and touch panel |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011075202.4A CN114327118A (en) | 2020-10-09 | 2020-10-09 | Transparent conductive film, method for manufacturing transparent conductive film, and touch panel |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN114327118A true CN114327118A (en) | 2022-04-12 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202011075202.4A Withdrawn CN114327118A (en) | 2020-10-09 | 2020-10-09 | Transparent conductive film, method for manufacturing transparent conductive film, and touch panel |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP2022063203A (en) |
| KR (1) | KR20220047500A (en) |
| CN (1) | CN114327118A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116631676A (en) * | 2023-05-25 | 2023-08-22 | 江苏纳美达光电科技有限公司 | Conductive film, preparation method thereof and touch functional sheet |
| CN116959783A (en) * | 2023-05-25 | 2023-10-27 | 江苏纳美达光电科技有限公司 | Conductive film, touch electrode and preparation method of conductive film |
| CN116631676B (en) * | 2023-05-25 | 2024-04-26 | 江苏纳美达光电科技有限公司 | Conductive film, preparation method thereof and touch functional sheet |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6092516B2 (en) * | 2011-01-18 | 2017-03-08 | 富士フイルム株式会社 | Conductive film and display device having the same |
| JP5829647B2 (en) * | 2012-05-08 | 2015-12-09 | 富士フイルム株式会社 | Conductive film |
| CN103176680B (en) * | 2013-03-08 | 2015-05-13 | 南昌欧菲光科技有限公司 | Touch panel and manufacturing method of touch panel |
| JP5850967B2 (en) * | 2014-03-17 | 2016-02-03 | 富士フイルム株式会社 | Conductive sheet for touch panel and touch panel |
-
2020
- 2020-10-09 CN CN202011075202.4A patent/CN114327118A/en not_active Withdrawn
-
2021
- 2021-03-10 JP JP2021038466A patent/JP2022063203A/en active Pending
- 2021-03-11 KR KR1020210031895A patent/KR20220047500A/en not_active Application Discontinuation
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116631676A (en) * | 2023-05-25 | 2023-08-22 | 江苏纳美达光电科技有限公司 | Conductive film, preparation method thereof and touch functional sheet |
| CN116959783A (en) * | 2023-05-25 | 2023-10-27 | 江苏纳美达光电科技有限公司 | Conductive film, touch electrode and preparation method of conductive film |
| CN116631676B (en) * | 2023-05-25 | 2024-04-26 | 江苏纳美达光电科技有限公司 | Conductive film, preparation method thereof and touch functional sheet |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2022063203A (en) | 2022-04-21 |
| KR20220047500A (en) | 2022-04-18 |
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