TWI736137B - A single-layer design touch display panel and manufacturing method thereof - Google Patents

Abstract

A single-layer design touch display panel and manufacturing method thereof, by changing the current manufacturing process, an attached transparent conductive film is used to prevent the silver nanowires from contacting the etching solution, and it can improve Success rate of overlap of metal layers in the manufacturing process. In this creation, the stacking structure of the conventional single-layer design touch display will require the height of two transparent conductive layers when the metal layers are overlapped, it is converted into the height of one transparent conductive layer when the metal layers are overlapped, and to improve the success rate of overlap.

Description

Single-layer design touch display panel and manufacturing method thereof

This creation is related to a touch display panel structure, especially a single-layer design touch display panel and its manufacturing method that can increase the success rate of metal layer overlap.

Please refer to FIG. 1. In the conventional technology, the attached transparent conductive film process is used to prevent the nanowire from contacting the etching solution.

The manufacturing process is to bond the first transparent conductive photoresist layer 101 on the substrate 100, then bond the second transparent conductive photoresist layer 102, then stack the transparent insulating layer 103, and finally lap the metal layer 104 . When the metal layer 104 is overlapped, it is necessary to perform a highly stacked overlap of two transparent conductive layers, the height of which is between 6 micrometers (um) and 10 micrometers (um).

In addition, in practice, the overlap of the metal layer may be due to the fact that when the thickness of the transparent insulating layer 103 is large, and the outer edge of the transparent insulating layer 103 has a large slope with respect to the surface of the substrate 100, the electrodes on the transparent insulating layer 103 are When the metal leads of the touch area are overlapped, it is easy to cause wire breakage and other bonding failures, resulting in a low success rate and further affecting the operation of the touch panel.

Therefore, in order to reduce the above shortcomings and make related products have high market value, it is necessary to make further structural improvements and propose related solutions.

In view of the above-mentioned conventional problems, one of the purposes of this creation is to provide a single-layer design touch display panel stack structure and its manufacturing method to solve the difficulties encountered by metal and nanowires in the selection of etching solutions and improve The problem of the success rate when the metal layer is overlapped.

A single-layer design touch display panel, which includes a substrate, a first transparent conductive photoresist layer, a transparent insulating layer, a plurality of first traces, a plurality of second traces, and a second transparent conductive photoresist layer .

The substrate has a peripheral area and a visible area surrounded by the peripheral area.

The first transparent conductive photoresist layer is located on the substrate, and the first transparent conductive photoresist layer includes a first conductive layer and has a plurality of first electrodes.

The second transparent conductive photoresist layer is adjacent to the first transparent conductive photoresist layer, and the second transparent conductive photoresist layer includes a second conductive layer and has a plurality of second electrodes.

The transparent insulating layer is sandwiched between the first transparent conductive photoresist layer and the second transparent conductive photoresist layer, and the transparent insulating layer exposes a part of the first electrode and a part of the first electrode in the peripheral area, respectively Two electrodes.

A plurality of the first wires are located on the substrate and electrically connected to the exposed portion of the first electrode; a plurality of the second wires are located on the substrate and are electrically connected to the exposed portion of the second electrode.

Further, the first transparent conductive photoresist layer and the second transparent conductive photoresist layer are respectively made of transparent photoresist materials.

Further, the outer edge of the exposed portion of the first trace is separated from the outer edge of the visible area along a first direction by a first distance, and the outer edge of the first transparent conductive photoresist layer is connected to the outer edge of the visible area along the first direction. The periphery of the visible area is separated by a second distance, and the first distance is not less than the second distance; the exposed part of the periphery of the second trace is a third distance from the periphery of the periphery of the visible area in a second direction A fourth distance between the periphery of the second transparent conductive photoresist layer and the periphery of the visible area along the second direction, and the third distance is not less than the fourth distance.

Further, the first transparent conductive photoresist layer further includes a first transparent photosensitive resin layer, the first transparent photosensitive resin layer is disposed under the first conductive layer, and the second transparent conductive photoresist layer further includes a second A transparent photosensitive resin layer, and the second transparent photosensitive resin layer is disposed on the second conductive layer.

Furthermore, the first direction is perpendicular to the second direction.

Furthermore, the first transparent conductive photoresist layer has a first thickness, the second transparent conductive photoresist layer has a second thickness, and the first thickness and the second thickness are respectively 1.5 micrometers (um) to 20 microns. Between micrometers (um).

Further, the first conductive layer has a third thickness, the second conductive layer has a fourth thickness, and the third thickness and the fourth thickness are respectively 20 nanometers (nm) to 500 nanometers (nm) between.

Furthermore, a portion of the first electrode and a portion of the second electrode that are exposed are made of metal or metal alloy, and have a fifth thickness and a sixth thickness, respectively, and the third thickness and the fourth thickness are 20 nanometers. Between meters (nm) and 10 microns (um).

Furthermore, the transparent insulating layer has a seventh thickness, and the seventh thickness is between 3 micrometers (um) and 10 micrometers (um).

In addition, this invention creates a manufacturing method of a single-layer design touch display panel, which includes the following steps:

Step S1: Provide a substrate with a peripheral area and a visible area surrounded by the peripheral area.

Step S2: A first transparent conductive photoresist layer is attached to the substrate, and the outer edge of the first transparent conductive photoresist layer is located in the peripheral area.

Step S3: forming a first conductive layer on the first transparent conductive photoresist layer, the first conductive layer having a plurality of first electrode rows arranged along a second direction, and each first electrode row is along a first direction A plurality of first electrodes are arranged.

Step S4: forming a transparent insulating layer on the first transparent conductive photoresist layer.

Step S5: forming a metal layer on the substrate;

Step S6: The metal layer is formed into a plurality of first traces and a plurality of second traces. The plurality of first traces are arranged along the second direction and respectively correspond to a plurality of first electrodes. The first trace is attached to the side surface of the first transparent conductive photoresist layer and the side surface of the transparent insulating layer; a plurality of second traces are arranged along the first direction and respectively correspond to a plurality of second electrodes. The second wire is attached to the side of the transparent insulating layer.

Step S7: bonding a second transparent conductive photoresist layer on the transparent insulating layer;

Step S8: forming a second conductive layer on the second transparent conductive photoresist layer, the second conductive layer having a plurality of second electrode rows arranged along a first direction, and each second electrode row is arranged along the second direction There are a plurality of second electrodes; and one end of each second electrode row is connected with the second wiring.

Further, the transparent insulating layer is respectively connected to the first transparent conductive photoresist layer and the second transparent conductive photoresist layer in a coating manner or a bonding manner.

Further, the first conductive layer is fabricated on the first transparent conductive photoresist layer by a hot pressing process.

Further, the second conductive layer is fabricated on the second transparent conductive photoresist layer by a hot pressing process.

In this creation, the second transparent conductive photoresist layer is reversely pasted by changing the manufacturing process, so that the two transparent conductive photoresist layers are made in opposite directions, and the first trace and the first transparent conductive photoresist layer are directly overlapped , And the second transparent conductive photoresist layer is overlapped with the second trace, so as to prevent the first conductive layer and the second conductive layer from contacting the etching solution and improve the success rate of stacking and bonding the metal layer.

1: Single-layer design touch display panel

100, 2: substrate

21: Surrounding area

22: Viewing area

101, 3: The first transparent conductive photoresist layer

31: The first conductive layer

311: first electrode

32: The first transparent photosensitive resin layer

102, 4: The second transparent conductive photoresist layer

41: second conductive layer

411: second electrode

42: The second transparent photosensitive resin layer

103, 5: Transparent insulating layer

104: Metal layer

6: The first line

7: Second trace

91: first direction

92: second direction

h1: first thickness

h2: second thickness

h3: third thickness

h4: fourth thickness

h5: fifth thickness

h6: sixth thickness

h7: seventh thickness

D1: first distance

D2: second distance

D3: third distance

D4: Fourth distance

FIG. 1 is a simplified schematic diagram of a conventional transparent conductive film manufacturing process stack structure.

Figure 2 is a partial top view of the creative single-layer design touch display panel.

Fig. 3 is a schematic cross-sectional view taken along the section line A-A of Fig. 2.

Fig. 4 is a schematic cross-sectional view taken along the line B-B of Fig. 2.

Figure 5 is a step diagram of the manufacturing method for creating a single-layer design touch display panel.

Please refer to FIGS. 2 to 4 at the same time, which are a partial top view of this creative single-layer design touch display panel, a schematic cross-sectional view along the cross-sectional line A-A of FIG. 2 and a cross-sectional schematic view along the cross-sectional line B-B of FIG. 2. This creation provides a single-layer design touch display panel 1, which includes a substrate 2, a first transparent conductive photoresist layer 3, a second transparent conductive photoresist layer 4, a transparent insulating layer 5, and a plurality of first traces. Line 6 and multiple second traces 7.

The substrate 2 has a peripheral area 21 and a visible area 22 surrounded by the peripheral area 21.

The first transparent conductive photoresist layer 3 is located on the substrate 2, and the first transparent conductive photoresist layer 3 includes a first conductive layer 31 with a plurality of first electrodes 311. The first transparent conductive photoresist layer 3 has a first thickness h1, and the first thickness h1 is between 1.5 micrometers (um) and 20 micrometers (um). The first conductive layer 31 has a third thickness h3, and the third thickness h3 is between 20 nanometers (nm) and 500 nanometers (nm).

The second transparent conductive photoresist layer 4 is adjacent to the first transparent conductive photoresist layer 3, and the second transparent conductive photoresist layer 4 includes a second conductive layer 41 with a plurality of second electrodes 411. The second transparent conductive photoresist layer 4 has a second thickness h2, and the second thickness h2 is between 1.5 micrometers (um) and 20 micrometers (um). The second conductive layer 41 has a fourth thickness h4, and the fourth thickness h4 is between 20 nanometers (nm) and 500 nanometers (nm).

In the above, the first electrode 311 and the second electrode 411 can be made of nano metal wire, conductive polymer, or metal mesh. The material of the first conductive layer 31 and the second conductive layer 41 can be nanowire, conductive polymer, carbon nanotube, graphene, or metal mesh.

The transparent insulating layer 5 is sandwiched between the first transparent conductive photoresist layer 3 and the second transparent conductive photoresist layer 4, and the transparent insulating layer 5 exposes a portion of the first electrode in the peripheral area 21, respectively 311 and part of the second electrode 411. The transparent insulating layer 5 has a seventh thickness h7, and the seventh thickness h5 is between 3 micrometers (um) and 10 micrometers (um).

In this creation, the exposed part of the periphery of the first trace 6 is separated from the periphery of the visible area 22 by a first distance D1 along a first direction 91, and the periphery of the periphery of the first transparent conductive photoresist layer 3 The first direction 91 is separated from the periphery of the viewing area 22 by a second distance D2, and the first distance D1 is not less than the second distance D2.

In addition, the exposed portion of the periphery of the second trace 7 is separated from the periphery of the visible area 22 by a third distance D3 along a second direction 92, and the periphery of the second transparent conductive photoresist layer 4 is along the periphery of the The two directions 92 are separated from the periphery of the viewing area 22 by a fourth distance D4, and the third distance D3 is not less than the fourth distance D4.

In the above, the first direction 91 and the second direction 92 are perpendicular to each other.

In addition, a portion of the first electrode 311 and a portion of the second electrode 411 that are exposed are made of metal or metal alloy, and respectively have a fifth thickness h5 and a sixth thickness h6, the fifth thickness h5 and the sixth thickness h6 is between 20 nanometers (nm) and 10 microns (um).

A plurality of the first wires 6 are located on the substrate 2 and are electrically connected to the exposed portion of the first electrode 311, and a plurality of the second wires 7 are located on the substrate 2 and are connected to the exposed portion of the second electrode 411 electrical connection.

In addition, the first transparent conductive photoresist layer 3 further includes a first transparent photosensitive resin layer 32, the first transparent photosensitive resin layer 32 is disposed under the first conductive layer 31, and the second transparent conductive light The resist layer 4 further includes a second transparent photosensitive resin layer 42, and the second transparent photosensitive resin layer 42 is disposed on the second conductive layer 41.

Based on the above, in this creation, the first transparent conductive photoresist layer 3 and the second transparent conductive photoresist layer 4 are fabricated in opposite directions in structure.

Please refer to FIG. 5, which is a step diagram of the manufacturing method of the single-layer design touch display panel for this creative creation. The production process of this creation is that a first transparent conductive photoresist layer 3 is attached to the substrate 2, and after processing, a transparent insulating layer 5 is formed on the first transparent conductive photoresist layer 3. The metal layer is processed to form a plurality of first wirings 6 and a plurality of second wirings 7 on the substrate 2, and finally a second transparent conductive photoresist layer 4 is attached to the transparent insulating layer 5.

The steps are as follows:

Step S1: Provide a substrate with a peripheral area and a visible area surrounded by the peripheral area.

Step S2: A first transparent conductive photoresist layer is attached to the substrate, and the outer edge of the first transparent conductive photoresist layer is located in the peripheral area.

Step S3: forming a first conductive layer on the first transparent conductive photoresist layer, the first conductive layer having a plurality of first electrode rows arranged along a second direction, and each first electrode row is along a first direction A plurality of first electrodes are arranged.

Step S4: forming a transparent insulating layer on the first transparent conductive photoresist layer;

Step S5: forming a metal layer on the substrate;

Step S6: The metal layer is formed into a plurality of first traces and a plurality of second traces. The plurality of first traces are arranged along the second direction and respectively correspond to a plurality of first electrodes. The first trace is attached to the side surface of the first transparent conductive photoresist layer and the side surface of the transparent insulating layer; a plurality of second traces are arranged along the first direction and respectively correspond to a plurality of second electrodes. The second wire is attached to the side of the transparent insulating layer.

Step S7: A second transparent conductive photoresist layer is attached to the transparent insulating layer.

Step S8: forming a second conductive layer on the second transparent conductive photoresist layer, the second conductive layer having a plurality of second electrode rows arranged along a first direction, and each second electrode row is arranged along the second direction There are a plurality of second electrodes; and one end of each second electrode row is connected with the second wiring.

In the above steps, the transparent insulating layer 5 is respectively connected to the first transparent conductive photoresist layer 3 and the second transparent conductive photoresist layer 4 by coating or bonding.

The aforementioned first conductive layer 31 is fabricated on the first transparent conductive photoresist layer 3 by a hot pressing process. And the second conductive layer 41 is fabricated on the second transparent conductive photoresist layer 4 by a hot pressing process.

In summary, the advantages of this creation are:

1. The first transparent conductive photoresist layer and the second transparent conductive photoresist layer are made in opposite directions, so that both the first conductive layer and the second conductive layer are connected to the transparent insulating layer to avoid contact with the etching solution.

2. By overlapping the first trace and the first transparent conductive photoresist layer, and the second trace and the second transparent conductive photoresist layer, so that both of them only need to be overlapped. The thickness of one layer of transparent conductive photoresist layer can be solved to solve the problem of stacking two transparent conductive photoresist layers when lapped metal layers, and eliminate the problem of poor lap joints such as wire breakage during lap joints, and low success rate Problems, and increase the success rate of overlap.

The above are only preferred embodiments of this creation, and are not used to limit the scope of implementation of this creation. Without departing from the spirit and essence of this creation, those skilled in the art can make various corresponding actions based on this creation. Changes and deformations, but these corresponding changes and deformations should belong to the protection scope of the claims attached to this creation.

1: Single-layer design touch display panel

2: substrate

21: Surrounding area

22: Viewing area

311: first electrode

411: second electrode

5: Transparent insulating layer

6: The first line

7: Second trace

91: first direction

92: second direction

Claims (9)

A single-layer design touch display panel, which includes: a substrate with a peripheral area and a visible area surrounded by the peripheral area; a first transparent conductive photoresist layer on the substrate, the first transparent conductive The photoresist layer includes a first conductive layer and a first transparent photosensitive resin layer, the first transparent photosensitive resin layer is disposed under the first conductive layer, the first conductive layer has a plurality of first electrodes; a second transparent The conductive photoresist layer is adjacent to the first transparent conductive photoresist layer. The second transparent conductive photoresist layer includes a second conductive layer and a second transparent photosensitive resin layer. The second transparent photosensitive resin layer is disposed on the On the second conductive layer, the second conductive layer has a plurality of second electrodes; a transparent insulating layer is sandwiched between the first transparent conductive photoresist layer and the second transparent conductive photoresist layer, and the transparent The insulating layer respectively exposes a part of the first electrode and a part of the second electrode in the peripheral area; a plurality of first traces located on the substrate and electrically connected to the exposed part of the first electrode; and a plurality of second The trace is located on the substrate and is electrically connected to the exposed portion of the second electrode; wherein, the outer edge of the exposed portion of the first trace is a first distance away from the periphery of the visible area along a first direction , The outer edge of the first transparent conductive photoresist layer is separated from the outer edge of the visible area along the first direction by a second distance, and the first distance is not less than the second distance; a portion of the outside of the second trace is exposed The periphery of the edge is separated from the periphery of the viewing area along a second direction by a third distance, and the periphery of the second transparent conductive photoresist layer is separated from the periphery of the viewing area along the second direction by a fourth distance. The third distance is not less than the fourth distance; the first conductive layer has a third thickness, the second conductive layer has a fourth thickness, and the third thickness and the fourth thickness are respectively 20 nanometers (nm) to Between 500 nanometers (nm). For the single-layer design touch display panel described in claim 1, wherein the first direction is perpendicular to the second direction. According to the single-layer design touch display panel of claim 1, wherein the first transparent conductive photoresist layer has a first thickness, the second transparent conductive photoresist layer has a second thickness, and the first transparent conductive photoresist layer has a second thickness. The first thickness and the second thickness are respectively between 1.5 micrometers (um) and 20 micrometers (um). For example, the single-layer design touch display panel described in claim 1 of the scope of patent application, wherein the exposed part of the first electrode and part of the second electrode are made of metal or metal alloy, and each has a fifth thickness and a The sixth thickness, the fifth thickness and the sixth thickness are between 20 nanometers (nm) and 10 micrometers (um). According to the single-layer design touch display panel described in claim 1, wherein the transparent insulating layer has a seventh thickness, and the seventh thickness is between 3 micrometers (um) and 10 micrometers (um). A manufacturing method of a single-layer design touch display panel includes the following steps: Step S1: Provide a substrate with a peripheral area and a visible area surrounded by the peripheral area; Step S2: Bond a substrate on the substrate The first transparent conductive photoresist layer, the outer edge of the first transparent conductive photoresist layer is located in the peripheral area; Step S3: a first conductive layer is formed on the first transparent conductive photoresist layer, and the first conductive layer is along a A plurality of first electrode rows arranged in a second direction, and each first electrode row has a plurality of first electrodes arranged along a first direction; step S4: forming a transparent insulating layer on the first transparent conductive photoresist layer; Step S5: forming a metal layer on the substrate; Step S6: forming a plurality of first traces and a plurality of second traces on the metal layer, and the plurality of first traces are arranged along the second direction and respectively Corresponding to a plurality of first electrodes, each of the first traces abuts on the side surface of the first transparent conductive photoresist layer and the side surface of the transparent insulating layer; a plurality of second traces are arranged along the first direction, and are respectively connected to A plurality of second electrodes correspond to each other, and each of the second traces is attached to the side surface of the transparent insulating layer; Step S7: A second transparent conductive photoresist layer is attached to the transparent insulating layer; Step S8: A second conductive layer is formed on the second transparent conductive photoresist layer, the second conductive layers are arranged along a first direction There are a plurality of second electrode rows, and each second electrode row is arranged with a plurality of second electrodes along the second direction; and one end of each second electrode row is connected with the second wiring. According to the manufacturing method of the single-layer design touch display panel described in claim 9 of the scope of patent application, the transparent insulating layer is coated or laminated with the first transparent conductive photoresist layer and the second transparent The conductive photoresist layer is connected. According to the manufacturing method of the single-layer design touch display panel described in claim 9 of the scope of patent application, the first conductive layer is manufactured on the first transparent conductive photoresist layer by a hot pressing process. According to the manufacturing method of the single-layer design touch display panel described in claim 9 of the scope of patent application, the second conductive layer is manufactured on the second transparent conductive photoresist layer by a hot pressing process.

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