CN114812111A - Substrate drying device, cleaning system and drying method - Google Patents
Substrate drying device, cleaning system and drying method Download PDFInfo
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- CN114812111A CN114812111A CN202210431469.5A CN202210431469A CN114812111A CN 114812111 A CN114812111 A CN 114812111A CN 202210431469 A CN202210431469 A CN 202210431469A CN 114812111 A CN114812111 A CN 114812111A
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- 238000001035 drying Methods 0.000 title claims abstract description 135
- 239000000758 substrate Substances 0.000 title claims abstract description 134
- 238000004140 cleaning Methods 0.000 title claims abstract description 59
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 88
- 230000007246 mechanism Effects 0.000 claims abstract description 24
- 238000001514 detection method Methods 0.000 claims abstract description 19
- 239000007921 spray Substances 0.000 claims abstract description 10
- 238000005507 spraying Methods 0.000 claims abstract description 8
- 238000000034 method Methods 0.000 claims description 12
- 230000001105 regulatory effect Effects 0.000 claims description 4
- 230000008569 process Effects 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 230000009471 action Effects 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- 238000005530 etching Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 238000013519 translation Methods 0.000 description 2
- 230000002159 abnormal effect Effects 0.000 description 1
- 238000004134 energy conservation Methods 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
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Classifications
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B9/00—Machines or apparatus for drying solid materials or objects at rest or with only local agitation; Domestic airing cupboards
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B21/00—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
- F26B21/001—Drying-air generating units, e.g. movable, independent of drying enclosure
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B21/00—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
- F26B21/004—Nozzle assemblies; Air knives; Air distributors; Blow boxes
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B21/00—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
- F26B21/06—Controlling, e.g. regulating, parameters of gas supply
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B25/00—Details of general application not covered by group F26B21/00 or F26B23/00
- F26B25/02—Applications of driving mechanisms, not covered by another subclass
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B25/00—Details of general application not covered by group F26B21/00 or F26B23/00
- F26B25/22—Controlling the drying process in dependence on liquid content of solid materials or objects
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B3/00—Drying solid materials or objects by processes involving the application of heat
- F26B3/02—Drying solid materials or objects by processes involving the application of heat by convection, i.e. heat being conveyed from a heat source to the materials or objects to be dried by a gas or vapour, e.g. air
- F26B3/04—Drying solid materials or objects by processes involving the application of heat by convection, i.e. heat being conveyed from a heat source to the materials or objects to be dried by a gas or vapour, e.g. air the gas or vapour circulating over or surrounding the materials or objects to be dried
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Microbiology (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
The present disclosure relates to a substrate drying device, a cleaning system, and a drying method, the substrate drying device including: the base is provided with a mounting position of the substrate; the drying component is suspended above the mounting position, and one side of the drying component facing the mounting position is provided with a plurality of spray headers for spraying high-temperature gas to dry water residues on the substrate; the sliding assembly comprises a guide rail fixed on the base and a sliding block in sliding connection with the guide rail, and the sliding block is fixedly connected with the drying part and used for driving the drying part to move along the guide rail; and the driving mechanism is connected with the sliding block and used for driving the sliding block to move. The substrate drying device can improve the performance of the cleaning equipment comprising the substrate drying device, ensure the yield of substrate products, and improve the utilization rate and the product first pass rate of the detection equipment positioned at the downstream of the substrate drying device.
Description
Technical Field
The disclosure relates to the technical field of substrate cleaning, in particular to a substrate drying device, a cleaning system and a drying method.
Background
In the TFT-LCD industry, a plurality of processes use wet cleaning equipment (such as a developing machine, an etching machine, a film stripping machine, and a cleaning machine) to clean an oled glass substrate, when the substrate is at a drying station of the wet cleaning equipment, due to poor installation accuracy of a drying section Air Knife (Air Knife), damage of a substrate bearing Roller (Roller), blockage of the Air Knife and the like, water drops remain on the substrate, such abnormal products may cause reduction of the downstream inspection device utilization rate and the product first pass rate, reduction of the substrate product yield, and influence on the performance of the wet cleaning equipment.
Disclosure of Invention
The embodiment of the present disclosure provides a substrate drying device, which can solve the above problems in the prior art.
According to an aspect of the present disclosure, there is provided a substrate drying apparatus including:
the base is provided with a mounting position of the substrate;
the drying component is suspended above the mounting position, and one side of the drying component facing the mounting position is provided with a plurality of spray heads for spraying high-temperature gas to dry water residues on the substrate;
the sliding assembly comprises a guide rail fixed on the base and a sliding block in sliding connection with the guide rail, and the sliding block is fixedly connected with the drying part and used for driving the drying part to move along the guide rail;
and the driving mechanism is connected with the sliding block and used for driving the sliding block to move.
In some embodiments, the driving mechanism includes a servo motor and a ball screw connected to the servo motor, the ball screw is disposed on one side of the guide rail and is disposed opposite to and parallel to the guide rail, and the ball screw is connected to the slider.
In some embodiments, a plurality of positioning gratings are arranged on the guide rail and are uniformly distributed along the guide rail.
In some embodiments, the substrate drying apparatus further includes a gas line connected to the drying part to supply a high temperature gas to the drying part.
In some embodiments, a heater is disposed on the gas line.
In some embodiments, a control valve is mounted on the gas line, the control valve including at least one of an on-off valve, a pressure regulating valve, or a throttle valve.
In some embodiments, a flow meter and/or pressure gauge is mounted on the gas line.
According to an aspect of the present disclosure, there is also provided a substrate cleaning system including:
a cleaning apparatus comprising the substrate drying device described above;
and the residual water detection device is arranged at the downstream of the cleaning equipment and is connected with the driving mechanism of the substrate drying device so as to convey the substrate to the substrate drying device when the residual water on the substrate is detected, and the drying part is moved to a residual water position to dry the residual water through the operation of the driving mechanism.
In some embodiments, the substrate cleaning system further comprises a detection mechanism for detecting whether the substrate is placed in the cleaning apparatus, so as to provide gas into a gas pipeline of the substrate drying device and preheat the gas when the substrate is placed in the cleaning apparatus.
According to an aspect of the present disclosure, there is also provided a substrate drying method applied to the substrate cleaning system, the method including:
detecting whether water residue exists on the substrate by the water residue detection device;
if so, acquiring the position coordinates of the water residues;
conveying the substrate to a mounting position of the substrate drying device;
moving a drying part of the substrate drying device to the position coordinates of the water residue by the operation of a driving mechanism of the substrate drying device;
and drying the water residue by high-temperature gas sprayed out of the spray header of the drying component.
In some embodiments, the method further comprises:
acquiring the position coordinates of the water residues;
acquiring a maximum position coordinate and a minimum position coordinate in each position coordinate;
calculating the average value of the maximum position coordinate and the minimum position coordinate to determine the average position coordinate of each water residue;
determining the average position coordinate as a drying position of the water residue.
According to the substrate drying device, the substrate cleaning system and the substrate drying method provided by various embodiments of the disclosure, the sliding assembly composed of the guide rail and the sliding block drives the drying component to translate along the guide rail, so that the position of water residue can be quickly and accurately positioned, the water residue on the substrate is timely dried through the corresponding spray header, the performance of the cleaning equipment comprising the substrate drying device is improved, the yield of substrate products is ensured, and the utilization rate and the product first pass rate of the detection equipment positioned at the downstream of the substrate drying device are improved; meanwhile, the spraying type drying component consisting of the plurality of spraying heads can increase the processing time of water residues and enhance the drying effect of the substrate.
Drawings
Fig. 1 shows a schematic configuration diagram of a substrate drying apparatus of an embodiment of the present disclosure;
fig. 2 is a schematic view illustrating an operational structure of a substrate drying apparatus according to an embodiment of the present disclosure;
FIG. 3 illustrates a schematic structural diagram of a substrate cleaning system according to an embodiment of the disclosure;
fig. 4 shows another schematic structural diagram of a substrate cleaning system according to an embodiment of the disclosure.
Reference numerals:
10-a substrate drying device; 20-cleaning equipment; 30-a water residue detection device; 40-a control unit; 100-a substrate; 200-water droplets;
1-base, 11-mounting position; 2-drying part, 21-spray head; 31-guide rail, 32-slide block; 41-servo motor, 42-ball screw; 5-positioning the grating; 6-gas line.
Detailed Description
Various aspects and features of the disclosure are described herein with reference to the drawings.
It will be understood that various modifications may be made to the embodiments of the present application. Accordingly, the foregoing description should not be construed as limiting, but merely as exemplifications of embodiments. Other modifications will occur to those skilled in the art within the scope and spirit of the disclosure.
The accompanying drawings, which are incorporated in and constitute a part of the specification, illustrate embodiments of the disclosure and, together with a general description of the disclosure given above, and the detailed description of the embodiments given below, serve to explain the principles of the disclosure.
These and other characteristics of the present disclosure will become apparent from the following description of preferred forms of embodiment, given as non-limiting examples, with reference to the attached drawings.
It is also to be understood that although the present disclosure has been described with reference to certain specific examples, those skilled in the art will be able to ascertain many other equivalents to the present disclosure.
The above and other aspects, features and advantages of the present disclosure will become more apparent in view of the following detailed description when taken in conjunction with the accompanying drawings.
Specific embodiments of the present disclosure are described hereinafter with reference to the accompanying drawings; however, it is to be understood that the disclosed embodiments are merely exemplary of the disclosure that may be embodied in various forms. Well-known and/or repeated functions and structures have not been described in detail so as not to obscure the present disclosure with unnecessary or unnecessary detail. Therefore, specific structural and functional details disclosed herein are not to be interpreted as limiting, but merely as a basis for the claims and as a representative basis for teaching one skilled in the art to variously employ the present disclosure in virtually any appropriately detailed structure.
Fig. 1 and 2 show a schematic structural view of a substrate drying apparatus according to an embodiment of the present disclosure. As shown in fig. 1 and 2, an embodiment of the present disclosure provides a substrate drying apparatus 10 including:
a base 1, wherein the base 1 is provided with a mounting position 11 of a substrate 100;
a drying member 2 suspended above the mounting position 11, the drying member 2 having a plurality of shower heads 21 on a side facing the mounting position 11 for spraying high-temperature gas to dry the water residue (residual water droplets 200) on the substrate 100;
the sliding assembly comprises a guide rail 31 fixed on the base 1 and a sliding block 32 in sliding connection with the guide rail 31, wherein the sliding block 32 is fixedly connected with the drying part 2 and is used for driving the drying part 2 to move along the guide rail 31;
and the driving mechanism is connected with the slide block 32 and is used for driving the slide block 32 to move.
The substrate drying device 10 provided by the embodiment of the present disclosure drives the drying component 2 to translate along the guide rail 31 through the sliding assembly composed of the guide rail 31 and the slider 32, can quickly and accurately position the water residue position, and timely dries the water residue on the substrate 100 through the corresponding spray header 21, thereby improving the performance of the cleaning equipment including the substrate drying device 10, ensuring the performance of the substrate 100 product, and improving the utilization rate and the product straight-through rate of the detection equipment (for example, the water residue detection device) located at the downstream of the substrate drying device 10; meanwhile, the spraying type drying component 2 consisting of the plurality of spraying heads 21 is adopted, so that the processing time of water residues can be prolonged, the drying effect of the substrate is enhanced, and the performance of the cleaning equipment is further improved.
Wherein, the utilization rate refers to the ratio of the actual production quantity of one machine equipment to the possible production quantity; product throughput rate ═ 100% number of incoming processes (number of rework + return) per number of processes, throughput rate being used to describe a certain condition of production quality, work quality or test quality. The specific meaning is that the process passes all the tested good product quantity for the first time when 100 sets of materials are put into the production line. The substrate 100 is preferably an oled glass substrate.
Specifically, as shown in fig. 1 and 2, the drying unit 2 is a strip-shaped member, and is disposed between two guide rails 31 disposed opposite to each other, and the conveying direction of the substrate 100 is perpendicular to the translation direction of the drying unit 2. The residual water treatment time T is L/V, where L is the effective length of the shower head 21 and V is the substrate transfer speed, and the residual water treatment time can be increased by the strip-shaped drying member 2 and the plurality of shower heads 21 provided on the drying member 2, thereby improving the drying effect. The substrate 100 is transported to the mounting site 11 or taken out from the mounting site 11 by a dedicated transport apparatus. In specific implementation, when the substrate 100 is completely placed in the mounting position 11, the corresponding shower heads 21 may be turned on for drying, or during the transportation process of the substrate 100, the corresponding shower heads 21 may be sequentially turned on for drying.
In some embodiments, the driving mechanism includes a servo motor 41 and a ball screw 42 connected to the servo motor 41, the ball screw 42 is disposed on one side of the guide rail 31 and is disposed opposite to and parallel to the guide rail 31, and the ball screw 42 is connected to the slider 32.
The ball screw 42 comprises a screw rod and a nut sleeved on the screw rod, the nut is fixedly connected with the sliding block 32, the servo motor 41 is connected with the screw rod, and the servo motor 41 can drive the nut to move along the screw rod when working, so that the sliding block 32 is driven to move along the guide rail 31, and the drying part 2 is driven to move to a residual water position along the guide rail 31.
In this embodiment, the drying component 2 is suspended above the mounting position 11, and the sliding assembly composed of the guide rail 31 and the sliding block 32 drives the drying component 2 to move, so that foreign matters on the mounting position 11 caused by friction can be reduced, and the substrate 100 is prevented from being damaged; meanwhile, compared with a substrate bearing roller, the sliding assembly is better in stability and reliability.
In some embodiments, the guide rail 31 is provided with a plurality of positioning gratings 5, and the plurality of positioning gratings 5 are uniformly distributed along the guide rail 31 to accurately determine the position of the water residue.
In some embodiments, the substrate drying apparatus 10 further includes a gas line 6 connected to the drying part 2 to supply a high temperature gas to the drying part 2. The high temperature gas is preferably high temperature compressed air.
Further, a heater is arranged on the gas pipeline 6 and used for heating high-temperature gas in the gas pipeline 6 so as to improve drying efficiency and drying effect.
In some embodiments, the gas line 6 has a control valve mounted thereon, the control valve including at least one of an on-off valve, a pressure regulating valve, or a throttle valve. The control valve is preferably an electromagnetic valve, and is accurate and convenient to control.
The opening and closing of the gas pipeline 6 can be automatically controlled through the switch valve; the pressure in the gas pipeline 6 can be controlled through a pressure regulating valve; the throttle valve can control the gas flow in the gas pipeline 6, and the precise control of high-temperature gas is realized.
Preferably, a flow meter and/or a pressure meter is further installed on the gas pipeline 6 to monitor the gas flow rate and the gas pressure in real time.
Fig. 3 and 4 are schematic structural diagrams of a substrate cleaning system according to an embodiment of the present disclosure (a direction of an arrow in fig. 4 is a process flow direction of a substrate), and as shown in fig. 3 and 4, an embodiment of the present disclosure further provides a substrate cleaning system including:
a cleaning apparatus 20, the cleaning apparatus 20 including the substrate drying device 10;
the residual water detection device 30 is provided downstream of the cleaning device 20, and is connected to a driving mechanism of the substrate drying device 10, so that when the residual water on the substrate 100 is detected, the substrate 100 is conveyed to the substrate drying device 10, and the drying member 2 is moved to a residual water position by the operation of the driving mechanism, thereby drying the residual water.
The cleaning device 20 may be a wet cleaning device such as a developing machine, an etching machine, a film stripping machine, a cleaning machine, and the like.
The substrate cleaning system further includes a control unit 40, in this embodiment, the control unit 40 is preferably a Computer Integrated Manufacturing (CIM) control unit, and can be used as an engineering product management system of the entire substrate cleaning system to control the operations of the cleaning apparatus 20 and the residual water detection device 30.
The position coordinates of the water residue may be expressed as (X, Y), where X is the same coordinate in the same direction as the conveyance direction of the substrate 100, and Y is the same coordinate in the same direction as the movement direction of the drying member 2. That is, a rectangular coordinate system is established with the transport direction of the substrate 100 as the X direction and the moving direction of the drying member 2 as the Y direction, respectively, and the position coordinates of the water residue are determined.
Table 1 shows information on the position of the water remaining detected by the water remaining detection device 30, and as shown in table 1, the water remaining detection device 30 can write the position coordinates of the water remaining into a common address bit, and the cleaning apparatus 20 (e.g., a developing machine) collects the position coordinates of the water remaining based on the common address bit and controls the drive mechanism to perform corresponding operations. The shared address bit comprises a water residue detection device address, a CIM address and a developing machine address, so that a user can accurately extract corresponding water residue position coordinates.
TABLE 1 table of information on the position of water remaining detected by the water remaining detecting device
In some embodiments, the substrate cleaning system further includes a detection mechanism for detecting whether the substrate 100 is placed in the cleaning apparatus 20, so as to supply gas into the gas pipe 6 of the substrate drying device 10 and preheat the gas when the substrate 100 is placed in the cleaning apparatus 20.
Specifically, when the detection mechanism detects that the substrate 100 is placed in the cleaning device 20, it can be determined that the cleaning device 20 is to be cleaned, at this time, the control valve on the gas pipeline 6 can be controlled to open, gas is filled into the gas pipeline 6, the gas is preheated by the heater, high-temperature gas can be provided, after the substrate 100 is cleaned by the cleaning device 20, the substrate 100 is conveyed to the mounting position 11 of the substrate drying device 10, and the water residue on the substrate 10 is dried by the preheated high-temperature gas, so that the working time of the whole substrate cleaning system can be shortened, and energy conservation and consumption reduction can be realized.
The embodiment of the present disclosure further provides a substrate drying method applied to the substrate cleaning system, where the method includes:
s101: detecting whether water residue exists on the substrate 100 by the water residue detection device 30;
s102: if so, acquiring the position coordinates of each water residue;
s103: conveying the substrate 100 to the mounting position 11 of the substrate drying apparatus 10;
s104: moving the drying member 2 of the substrate drying apparatus 10 to the position coordinates of the water residue by the operation of the driving mechanism of the substrate drying apparatus 10;
s105: the water residue is dried by the high-temperature gas ejected from the shower head 21 of the drying means 2.
Specifically, when the residual water detecting device 30 detects that residual water exists on the substrate 100, the position coordinates (X, Y) of the residual water are sent to the CIM control unit, the CIM control unit sends the position coordinates (X, Y) to the cleaning device 20, the driving mechanism of the substrate drying device 10 of the cleaning device 20 operates to drive the slider 32 to move along the guide rail 31, so as to drive the drying component 2 to move to the position coordinates for positioning, and then the drying component 2 sprays high-temperature gas under the action of the control valve to dry the residual water.
In some embodiments, as shown in fig. 3, the method further comprises:
s201: acquiring the position coordinates of the water residues;
s202: acquiring a maximum position coordinate and a minimum position coordinate in each position coordinate;
s203: calculating the average value of the maximum position coordinate and the minimum position coordinate to determine the average position coordinate of each water residue;
s204: determining the average position coordinate as a drying position of the water residue.
When the number of the water residues is multiple, the CIM control unit sends the position coordinates of the water residues to the cleaning equipment 20, the PLC of the cleaning equipment 20 compares the position coordinates to obtain the maximum position coordinate and the minimum position coordinate, then the average value of the absolute value of the maximum position coordinate and the absolute value of the minimum position coordinate is obtained, the absolute value of the maximum position coordinate and the average value of the absolute value of the minimum position coordinate are determined as the drying position (drying range) of the water residues, the drying part 2 moves to the position under the action of the driving mechanism, the corresponding spray head 21 is started to dry the water residues, the water residues are not required to be dried respectively according to the position coordinates of the water residues, and the drying efficiency and the drying effect can be effectively improved.
In particular, in the present embodiment, since the drying member 2 moves in the Y direction, when the position coordinates of the water residues are determined, only the Y coordinates of the water residues are acquired and compared, and Y can be selected max And Y min The dry position of the water residue S (| Y) was obtained by calculation max |+|Y min |)/2。
In the above embodiment, the drying position of the water residue is automatically determined by the CIM control unit, and in specific implementation, the user may manually determine the drying position of the water residue.
In an implementation, the cleaning apparatus 20 may simultaneously clean a plurality of substrates 100, and therefore, the cleaning apparatus 20 may compare the position coordinates of the water residues of the plurality of substrates 100 to determine the water residue drying positions of the plurality of substrates 100.
The above embodiments are merely exemplary embodiments of the present disclosure, which is not intended to limit the present disclosure, and the scope of the present disclosure is defined by the claims. Various modifications and equivalents of the disclosure may occur to those skilled in the art within the spirit and scope of the disclosure, and such modifications and equivalents are considered to be within the scope of the disclosure.
Claims (11)
1. A substrate drying apparatus comprising:
the base is provided with a mounting position of the substrate;
the drying component is suspended above the mounting position, and one side of the drying component facing the mounting position is provided with a plurality of spray heads for spraying high-temperature gas to dry water residues on the substrate;
the sliding assembly comprises a guide rail fixed on the base and a sliding block in sliding connection with the guide rail, and the sliding block is fixedly connected with the drying part and used for driving the drying part to move along the guide rail;
and the driving mechanism is connected with the sliding block and used for driving the sliding block to move.
2. The substrate drying apparatus of claim 1, wherein the driving mechanism comprises a servo motor and a ball screw connected to the servo motor, the ball screw being provided at one side of the guide rail and being disposed opposite to and parallel to the guide rail, the ball screw being connected to the slider.
3. The substrate drying apparatus according to claim 1, wherein a plurality of positioning gratings are provided on the guide rail, and the plurality of positioning gratings are uniformly distributed along the guide rail.
4. The substrate drying apparatus according to claim 1, further comprising a gas line connected to the drying part to supply a high temperature gas to the drying part.
5. The substrate drying apparatus according to claim 4, wherein a heater is provided on the gas pipe.
6. The substrate drying apparatus of claim 4, wherein a control valve is installed on the gas pipe, the control valve including at least one of an on-off valve, a pressure regulating valve, or a throttle valve.
7. The substrate drying apparatus according to claim 4, wherein a flow meter and/or a pressure meter is mounted on the gas pipe.
8. A substrate cleaning system, comprising:
a cleaning apparatus including the substrate drying device according to any one of claims 1 to 7;
and the residual water detection device is arranged at the downstream of the cleaning equipment and is connected with the driving mechanism of the substrate drying device so as to convey the substrate to the substrate drying device when the residual water on the substrate is detected, and the drying part is moved to a residual water position to dry the residual water through the operation of the driving mechanism.
9. The substrate cleaning system according to claim 8, further comprising a detecting mechanism for detecting whether the substrate is placed in the cleaning apparatus, to supply a gas into a gas line of the substrate drying device and to preheat the gas when the substrate is placed in the cleaning apparatus.
10. A substrate drying method applied to the substrate cleaning system according to claim 8 or 9, the method comprising:
detecting whether water residue exists on the substrate by the water residue detection device;
if so, acquiring the position coordinates of the water residues;
conveying the substrate to a mounting position of the substrate drying device;
moving a drying part of the substrate drying device to the position coordinates of the water residue by the operation of a driving mechanism of the substrate drying device;
and drying the water residue by high-temperature gas sprayed out of the spray header of the drying component.
11. The substrate drying method of claim 10, wherein the method further comprises:
acquiring the position coordinates of the water residues;
acquiring a maximum position coordinate and a minimum position coordinate in each position coordinate;
calculating the average value of the maximum position coordinate and the minimum position coordinate to determine the average position coordinate of each water residue;
determining the average position coordinate as a drying position of the water residue.
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| CN202210431469.5A CN114812111B (en) | 2022-04-22 | 2022-04-22 | Substrate drying device, cleaning system and drying method |
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| CN105605909A (en) * | 2016-01-15 | 2016-05-25 | 武汉华星光电技术有限公司 | Substrate cleaning method |
| CN109226010A (en) * | 2018-09-28 | 2019-01-18 | 昆山市和博电子科技有限公司 | A kind of substrate cleaning machine and basal plate cleaning system |
| CN113113334A (en) * | 2021-04-08 | 2021-07-13 | 杨智仁 | Wet process cleaning equipment and wet process cleaning method |
| CN113670052A (en) * | 2021-09-08 | 2021-11-19 | 蚌埠凯盛工程技术有限公司 | Reciprocating circulation type air knife drying system and using method thereof |
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Country or region after: China Address after: 100015 No. 10, Jiuxianqiao Road, Beijing, Chaoyang District Applicant after: BOE TECHNOLOGY GROUP Co.,Ltd. Applicant after: Chengdu BOE Display Technology Co.,Ltd. Address before: 100015 No. 10, Jiuxianqiao Road, Beijing, Chaoyang District Applicant before: BOE TECHNOLOGY GROUP Co.,Ltd. Country or region before: China Applicant before: CHENGDU ZHONGDIAN PANDA DISPLAY TECHNOLOGY Co.,Ltd. |
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