CN114779589B - Light source system of exposure machine - Google Patents
Light source system of exposure machine Download PDFInfo
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- CN114779589B CN114779589B CN202210611178.4A CN202210611178A CN114779589B CN 114779589 B CN114779589 B CN 114779589B CN 202210611178 A CN202210611178 A CN 202210611178A CN 114779589 B CN114779589 B CN 114779589B
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
- G03F7/70175—Lamphouse reflector arrangements or collector mirrors, i.e. collecting light from solid angle upstream of the light source
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
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Abstract
The invention provides a light source system of an exposure machine, which relates to the field of exposure machines and comprises a light source component, a rotary blocking component and a cleaning component; the light source component comprises a laser, and the laser is provided with an exit port; the cleaning assembly comprises a cleaning cavity; the rotary blocking assembly comprises a rotary part and baffle groups, the rotary part rotates along a preset track, each baffle group comprises a plurality of reflecting parts, the reflecting parts are fixedly connected to the preset positions on the outer sides of the rotary part, and the reflecting parts are provided with reflecting surfaces; in the rotating process of the rotating member, the reflecting members pass through the working area and the cleaning area, and the reflecting members in the same group of baffle groups can be positioned on the working area at the same time; when the reflecting pieces in one group of the baffle groups are simultaneously positioned in the working area, the reflecting surfaces of all the reflecting pieces in the baffle groups are positioned on a preset concave curved surface. According to the exposure machine light source system, the dynamically moving rotary blocking component is used for replacing a static reflector, the combustion residues are cleaned in time through the cleaning component, and the function of cleaning the combustion residues in time can be realized.
Description
Technical Field
The invention relates to the field of exposure machines, in particular to a light source system of an exposure machine.
Background
The exposure machine is a machine device which emits laser by starting lamplight and transfers image information on a film or other transparent bodies to the surface coated with photosensitive materials, and the exposure machine is generally applied to the high-precision processing field, such as the chip processing field, and a chip circuit is required to be transferred to a wafer by using the exposure machine. Due to the blockade of foreign technologies, china is in a lagging status in the field of processing and manufacturing of exposure machines, and the processing and manufacturing of the exposure machines mainly involve various problems, such as manufacturing of laser sources, vibration elimination and the like. Aiming at the technical problems, the prior art provides more solutions. For example, in the aspect of manufacturing a laser source, a document with application publication No. CN111610697A discloses an LED optical system of a DI lithography machine, which solves the problems of insufficient power of a semiconductor laser in certain wave bands; the application publication No. CN110376851A discloses a light source of an exposure machine, which uses a spiral manner to modify the light path of an LED, so as to obtain a light source with a pure light beam and no stray light.
The exposure machine with the highest processing precision in the manufacturing industry at present is an EUV extreme ultraviolet exposure machine produced by ASML company, a laser source of the exposure machine impacts tin drops through laser, tin explodes and burns at the temperature of about 500,000k to generate plasma emitting EUV light, combustion residues of tin flow to a front laser source and a rear reflector group along with the explosion and burning of tin, and the front laser source and the rear reflector group need to be cleaned regularly. Accordingly, similar problems can exist with laser sources produced in a similar manner. As time increases, the more difficult the cleaning of the combustion residues, the longer the cleaning takes and the more difficult the maintenance increases.
Disclosure of Invention
In order to reduce the maintenance difficulty, the invention provides a light source system of an exposure machine, which replaces a static reflector with a dynamically moving rotary blocking component and cleans combustion residues in time through a cleaning component so as to achieve the purpose of cleaning the combustion residues in time.
Correspondingly, the invention provides a light source system of an exposure machine, which comprises a light source component, a rotary blocking component and a cleaning component, wherein the rotary blocking component is arranged on the light source component;
the light source assembly comprises a laser, the laser is provided with an emergent port, and the position away from the emergent port by a preset distance is a striking position by taking the pointing direction of the emergent port as a reference;
the cleaning assembly comprises a cleaning cavity;
the rotary blocking assembly comprises a rotary part and baffle groups, the rotary part rotates along a preset track, each baffle group comprises a plurality of reflecting parts, each reflecting part is fixedly connected to a preset position on the outer side of the rotary part, and each reflecting part is provided with a reflecting surface with a preset structure;
dividing based on spatial position, wherein the rotary member is provided with a working area and a cleaning area; the working area is positioned between the striking position and the emergent port, and the cleaning area is positioned in the cleaning cavity;
in the rotating process of the rotating member, each reflecting member passes through the working area and the cleaning area, and all reflecting members in the same group of baffle groups can be positioned on the working area at the same time;
when all the reflectors in the baffle group are simultaneously positioned in the working area, the reflecting surfaces of all the reflectors in the baffle group are positioned on a preset concave curved surface, the preset curved surface has a unique focus, and the baffle group is provided with a light-transmitting structure at the position where a connecting line of the emergent port and the striking position passes through.
In an alternative embodiment, the path of the rotating member in the working area is a straight line;
in a group of baffle group, each reflection part is fixedly connected to the outer side preset position of the rotation part through a corresponding connecting part, and the length of the connecting part is gradually reduced from the edge of the baffle group to the middle of the baffle group.
In an alternative embodiment, the path of the rotating member in the cleaning zone is a curved path that is convex in a direction away from the laser.
In an alternative embodiment, the trajectory of the rotating member in the working area is an arc trajectory that is concave towards the exit port;
in one group of the baffle groups, each reflecting piece is fixedly connected to the outer preset position of the rotating piece through a corresponding connecting piece, and the lengths of all the connecting pieces are the same.
In an alternative embodiment, the path of the rotating element in the washing zone is linear.
In an optional embodiment, the cleaning assembly comprises an ultrasonic oscillation module, and the ultrasonic oscillation module is located in the cleaning cavity;
the action object of the ultrasonic oscillation module is a reflecting piece.
In an optional embodiment, each reflecting member is fixedly connected to a preset position on the outer side of the rotating member through a connecting unit;
the connecting unit has a loosening state and a fixing state, and the connecting unit can be repeatedly switched between the loosening state and the fixing state;
when the connecting unit is in the fixed state, the reflecting piece is rigidly connected with the connecting unit, and when the connecting unit is in the loose state, the reflecting piece is separated from the rigid connection with the connecting unit;
when the reflecting piece is positioned in the working area, the connecting unit corresponding to the reflecting piece is in a fixed state;
when the reflecting piece is positioned in the cleaning area, the connecting unit corresponding to the reflecting piece is in a loose state.
In an alternative embodiment, the loose state and the fixed state of the connection unit are switched by a physical switch or an electronic switch.
In an optional embodiment, the connecting unit comprises a fixed block, a movable rod and a control piece;
the root of the movable rod is a soft rod, the end part of the movable rod is a hard rod, and the reflecting piece corresponding to the connecting unit is fixedly connected with the hard rod;
the fixed block is provided with a blind hole matched with the movable rod, and the movable rod is matched in the blind hole;
the control piece is used for controlling the distance between the root of the movable rod and the bottom of the blind hole.
In an optional embodiment, the control member includes a limiting member, a force-receiving magnet, a permanent magnet, and an electromagnet;
the limiting piece is used for preventing the movable rod from being pulled out of the blind hole;
the permanent magnet and the electromagnet are embedded on the bottom of the blind hole;
when the electromagnet is in standby, the permanent magnet attracts the movable rod, the distance between the bottom of the movable rod and the bottom of the blind hole is at the minimum value, and at least part of hard rods on the movable rod are matched in the blind hole;
when the electromagnet acts, the electromagnet repels the movable rod, the distance between the bottom of the movable rod and the bottom of the blind hole is at the maximum value, and the hard rod on the movable rod is separated from the blind hole.
In summary, the present invention provides an exposure machine light source system, compared with the prior art, the exposure machine light source system changes the reflector for gathering photons from static state to dynamic state, on one hand, the combustion residues can be blocked from entering the laser source, on the other hand, the reflector can be cleaned in time, so as to avoid the accumulation of the combustion residues and influence on the gathering of photons; the posture change of the reflecting piece in the working area and the cleaning area can be realized by changing the rotating track of the rotating piece and combining the change of the connecting structure, so that the required working function and cleaning function are realized; the cleaning assembly adopts an ultrasonic oscillation module, takes out combustion residues on the reflecting piece in an oscillation mode, can be implemented in a vacuum environment and has a wide application range; in order to reduce the transmission of vibration, the vibration transmission of the ultrasonic vibration module can be avoided through the connecting unit with a changeable state, so that the posture stability of the reflecting piece in the working area is prevented from being influenced; due to the special structural design of the connecting unit, the state of the connecting unit can be switched well.
Drawings
Fig. 1 is a schematic three-dimensional structure diagram of a baffle group located in a working area according to a first embodiment of the present invention.
Fig. 2 is a schematic structural diagram of a light source system of an exposure machine according to a first embodiment of the invention.
FIG. 3 is a schematic view of a light source system of an exposure machine according to a second embodiment of the present invention.
Fig. 4 is a schematic cross-sectional structure diagram of a connection module according to an embodiment of the invention.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
In order to explain the principle of the exposure machine according to the embodiment of the present invention, a part of the schematic diagram is illustrated in the form of a schematic diagram, and a part of the schematic diagram, which is necessary to explain the configuration of the part, is illustrated in the form of a model schematic diagram.
The first embodiment is as follows:
fig. 1 shows a schematic three-dimensional structure of a baffle group 1 located in a working area 9 according to an embodiment of the invention, and fig. 2 shows a schematic structural diagram of a light source system of an exposure machine according to an embodiment of the invention.
Specifically, the embodiment of the invention provides a light source system of an exposure machine, which comprises a light source assembly, a rotary blocking assembly and a cleaning assembly.
In the present embodiment, the light source assembly refers to a light source device and apparatus for emitting energetic light rays to impact the droplet 10; the rotary blocking assembly comprises a rotary structure and reflecting pieces 4 fixedly connected to the rotary structure, and the reflecting pieces 4 can be combined in a specific area to form a structure similar to a concave reflecting mirror, so that photons are converged on one hand, and combustion residues are blocked on the other hand; the cleaning assembly is used for cleaning the reflecting member 4 in time.
Specifically, in the embodiment of the present invention, the light source assembly includes a laser 8, the laser 8 has an exit port, and a position away from the exit port by a preset distance is a striking position with reference to a pointing direction of the exit port; referring to fig. 2 of the drawings, when the droplet 10 is dropped from the outside to the position where the exit of the laser 8 is directed, the laser light emitted from the laser 8 impacts the droplet 10 to charge the droplet 10 for explosive combustion.
The cleaning assembly comprises a cleaning cavity, and the cleaning cavity can be of a solid cavity structure and can also be of a self-defined spatial position.
The rotation blocking assembly comprises a rotation member 7 and a baffle plate group 1.
Specifically, the rotating member 7 rotates along a preset track, and the preset track needs to be confirmed according to conditions such as the actual spatial layout of the device and the structure of the baffle plate group 1.
Specifically, each group of baffle groups 1 comprises a plurality of reflecting members 4, each reflecting member 4 is fixedly connected to a preset position on the outer side of the rotating member 7, and each reflecting member 4 is provided with a reflecting surface 2 with a preset structure; since the reflecting surface 2 of the reflecting member 4 in the baffle group 1 of the embodiment of the invention needs to form a specific combined cambered surface structure in the working area 9, the structure of the reflecting surface 2 needs to be designed in consideration of the whole structure of the baffle group 1.
Specifically, the division is performed based on the spatial position, and the rotating member 7 has a working area 9 and a cleaning area 5; the working area 9 is located between the striking position and the exit port, and the cleaning area 5 is located in the cleaning cavity.
Specifically, in the process of rotating the rotating member 7, each reflecting member 4 passes through the working area 9 and the cleaning area 5, and all reflecting members 4 in the same group of baffle groups 1 can be located on the working area 9 at the same time; when all the reflectors 4 in one set of the baffle group 1 are located in the working area 9 at the same time, the reflecting surfaces 2 of all the reflectors 4 in the baffle group 1 are located on a preset concave curved surface 11, the preset curved surface has a unique focus, and a light-transmitting structure 3 is arranged at a position where a connecting line between the exit port and the striking position passes through the baffle group 1.
It should be noted that the limiting conditions of the baffle group 1 in the working area 9 of the embodiment of the present invention are as follows: the reflecting surfaces 2 of all the reflecting members 4 in the baffle group 1 are located on a preset concave curved surface 11, which does not mean that the reflecting surfaces 2 of all the reflecting members 4 in the baffle group 1 can form a complete preset concave curved surface 11, and the limitation can be relaxed in specific implementation in consideration of the problems of splicing gaps, position interference and the like of a solid structure, so that the scheme can be implemented.
Specifically, in the optical processing system of the exposure machine provided by the embodiment of the invention, in actual operation, the rotating member 7 circularly and hermetically moves along a preset track and drives the reflecting member 4 thereon to move; a plurality of adjacent reflecting pieces 4 are used as a baffle group 1, when the reflecting pieces 4 in the baffle group 1 all move to a working area 9, the reflecting surfaces 2 on the reflecting pieces 4 in the baffle group 1 are all positioned on a preset concave curved surface 11, and at the moment, synchronously, the laser 8 emits laser to hit dropped liquid drops 10, so that the liquid drops 10 are exploded and combusted to generate photons; the scattered photons are converged by the reflecting pieces 4 of the baffle group 1 in the working area 9 to form a specific photon flow; residues generated by explosion and combustion of the liquid drops 10 can overflow, wherein the residues on the side facing the laser 8 can be blocked by the reflecting member 4 of the baffle group 1 and partially remain on the reflecting member 4; the reflecting member 4 moves to the cleaning area 5 along with the rotating member 7 and falls into the cleaning cavity, so that the cleaning module in the cleaning assembly can be cleaned, and residues on the reflecting member 4 can be taken out in time.
Specifically, in order to satisfy the combination structure of the baffle group 1 with respect to the shape of the locus of the rotary 7 in the working area 9 and the cleaning area 5, it is necessary to design the connection structure between the reflection member 4 and the rotary 7.
With reference to fig. 2 of the drawings, the trajectory of said rotary member 7 in the working area 9 is a straight line; in a group of baffle group 1, each reflecting piece 4 is fixedly connected to the outer side preset position of the rotating piece 7 through a corresponding connecting piece 6, and the length of the connecting piece 6 is gradually reduced from the edge of the baffle group 1 to the middle of the baffle group 1.
It should be noted that the connecting member 6 according to the embodiment of the present invention merely represents a structure having a connecting function, and does not refer to a specific component.
Referring to fig. 2 of the drawings, taking the structure of the reflector 4 as an arc reflector as an example, due to the limitation of the structure of the reflector 4, the reflector 4 needs to be combined with other reflectors 4 in the working area 9 to form an integral structure, in order to ensure the formation of the structure, when the track of the rotating member 7 in the working area 9 is a straight line, in order to ensure the formation of the integral structure, the length of the connecting member 6 needs to be designed correspondingly, and specifically, the length of the connecting member 6 corresponding to the reflector 4 is gradually reduced from the edge of the baffle group 1 to the middle of the baffle group 1.
Conversely, each reflecting member 4 should remain relatively independent in the cleaning zone 5 for cleaning, and therefore, in an alternative embodiment, the trajectory of the rotating member 7 in the cleaning zone 5 is a curved trajectory that is convex in a direction away from the laser 8. By this embodiment, the reflecting member 4 in the flap set 1 can be spread out for cleaning due to the arcuate configuration of the rotating member 7 in the cleaning zone 5.
Example two:
fig. 3 is a schematic diagram of the light source system of the exposure machine according to the embodiment of the invention.
Based on the aforementioned requirements of the set of baffles 1 in the working area 9 and in the cleaning, in particular, in the present embodiment, the trajectory of said revolving member 7 in the working area 9 is an arc trajectory concave towards said exit opening; in one group of the baffle group 1, each reflecting member 4 is fixedly connected to a preset position on the outer side of the rotating member 7 through a corresponding connecting member 6, and the lengths of all the connecting members 6 are the same. Alternatively, the path of the rotating member 7 in the washing zone 5 is rectilinear.
On the basis of the first embodiment and the second embodiment, further, the cleaning assembly includes an ultrasonic oscillation module 21, and the ultrasonic oscillation module 21 is located in the cleaning cavity; the action object of the ultrasonic oscillation module 21 is the reflector 4. Specifically, for the type of the cleaning module, cleaning modules in different cleaning forms such as a blowing cleaning module and an ultrasonic oscillation module 21 may be adopted, and since the setting environment of the exposure machine processing system includes a vacuum environment, the blowing cleaning module is not applicable under this limiting condition, and is preferably the ultrasonic oscillation module 21. The cleaning principle of the ultrasonic oscillation module 21 is to drive the reflector 4 to perform high-frequency oscillation, so that the combustion residue is separated from the reflector 4.
In addition, research shows that during the explosive combustion of the liquid droplets 10, a small amount of oxygen is mixed, which is beneficial to reducing the amount of combustion residues, so if a blowing cleaning module is adopted, the gas used by the blowing cleaning module can be pure oxygen, the explosive combustion of the liquid droplets 10 is performed through the amount of the oxygen in the part, and meanwhile, a molecular-level vacuum pump is required to be added for discharging oxygen molecules one by one, so as to realize the control of the oxygen content.
Specifically, since the ultrasonic oscillation module 21 may vibrate the reflection member 4, the vibration may be transmitted through the rotation member 7, and the posture stability of the reflection member 4 is affected, so that, in the cleaning region 5, an implementation structure for reducing or preventing the transmission of the vibration (force) between the reflection member 4 and the rotation member 7 should be provided.
Specifically, in the embodiment of the present invention, each reflecting member 4 is fixedly attached to a predetermined position outside the rotating member 7 through a connecting unit; the connecting unit has a loosening state and a fixing state, and the connecting unit can be repeatedly switched between the loosening state and the fixing state; when the connecting unit is in the fixed state, the reflecting piece 4 is rigidly connected with the connecting unit, and when the connecting unit is in the loose state, the reflecting piece 4 is separated from the rigid connection with the connecting unit; when the reflecting piece 4 is positioned in the working area 9, the connecting unit corresponding to the reflecting piece 4 is in a fixed state; when the reflecting piece 4 is positioned in the cleaning area 5, the connecting unit corresponding to the reflecting piece 4 is in a loose state.
Specifically, the connection unit is responsible for controlling the connection state between the reflection member 4 and the rotation member 7, and in the embodiment of the present invention, the connection unit needs at least two states; when the connecting unit is in a fixed state, the corresponding fixing positions of the reflecting member 4 and the rotating member 7 are relatively static; in the loose state of the coupling unit, the reflecting member 4 has a certain freedom of movement with respect to the corresponding anchoring position on said revolving member 7. It should be noted that, since the connection unit needs to be switched between the fixed state and the loose state, in the loose state of the connection unit, the reflection member 4 cannot have too large freedom of movement, which affects the state switching speed of the connection unit on one hand, and on the other hand, if the reflection member 4 has too large freedom of movement, collision interference may occur between each other; specifically, a certain degree of freedom of motion described in the embodiments of the present invention needs to be designed according to actual implementation conditions and performance requirements of the system.
In particular, the state change of the connection unit relates to switch switching control, and in particular, the loose state and the fixed state of the connection unit are switched by a physical switch or an electronic switch.
Specifically, the definition of the physical switch refers to a switch controlled by an entity trigger control mode, such as an entity button, an entity dial plate and other structures; in actual operation, due to the cyclic motion of the rotating member 7, correspondingly, the rotating member 7 passes through a specific position when entering the working area 9 and the cleaning area 5, and the physical switch is arranged at the corresponding position, so that the switch state is controlled by touching the physical switch when the specific position of the rotating member 7 passes through. However, in actual implementation, the physical switch has a problem that vibration interference factors are introduced due to collision contact with the rotating member 7, and the service life of the physical switch is too short, so that the physical switch needs to be used as appropriate in specific implementation.
Specifically, the electronic switch is defined as a switch which is controlled in a non-contact manner and a switch which is controlled in a remote control manner, and similarly, when a specific position of the rotating member 7 passes through the electronic switch, the state switching of the switch is triggered in the former case, and when the rotating member 7 moves to the specific position, the state switching of the switch is performed in the remote control manner in the latter case, so that the state switching function of the switch is realized, and the function of changing the state of the connection unit is realized by the switch.
Specifically, in terms of the arrangement form of the connection unit, in addition to the implementation according to the function of the connection unit and referring to the connection unit structure in the prior art, the embodiment of the present invention provides a reference implementation.
Fig. 4 is a schematic cross-sectional view of a connection module according to an embodiment of the present invention. Specifically, the connection unit of the embodiment of the present invention includes a fixed block 20, a movable bar 12, and a control member, with respect to a state switching function basically required for the connection module.
Specifically, the fixed block 20 is fixedly connected to the rotating member 7.
Specifically, the root of the movable rod 12 is a soft rod 15, the end of the movable rod 12 is a hard rod 13, and the reflecting piece 4 corresponding to the connecting unit is fixedly connected with the hard rod 13; the fixed block 20 is provided with a blind hole 19 matched with the movable rod 12, and the movable rod 12 is matched in the blind hole 19; the control member is used for controlling the distance between the root of the movable rod 12 and the bottom of the blind hole 19.
It should be noted that the flexibility (elasticity) of the soft rod 15 is selected according to the implementation, and the control member controls the distance between the root of the movable rod 12 and the bottom of the blind hole 19, as shown in fig. 4.
Specifically, when the hard rod 13 is completely exposed, the matching structure between the movable rod 12 and the blind hole 19 of the fixed block 20 is the soft rod 15, and the soft rod 15 has certain flexibility, in this state, the reflecting member 4 is not rigidly connected with the fixed block 20.
Specifically, when the hard rod 13 is retracted into the blind hole 19, the matching structure between the movable rod 12 and the blind hole 19 of the fixed block 20 is mainly the hard rod 13, when the soft rod 15 is tensioned, the matching between the hard rod 13 and the blind hole 19 is rigid, and the reflecting element 4 can be well kept relatively fixed with the hard rod 13.
In particular, the invention also provides an embodiment with reference to the implementation structure of the control element, and in particular,
the control member comprises a limiting member 14, a stressed magnet 16, a permanent magnet 17 and an electromagnet 18;
the limiting piece 14 is used for preventing the movable rod 12 from being pulled out of the blind hole 19; referring to fig. 4, schematically, in the embodiment of the present invention, the position-limiting member 14 is a protruding structure 14 fixed on the soft rod 15 and a step structure disposed in the blind hole 19 for matching. It should be noted that the soft rod 15 of the embodiment of the present invention has a certain strength, and in practical applications, the limiting member 14 cannot be removed from the blind hole 19 within a certain range of acting force.
The stressed magnet 16 is arranged at the root of the movable rod 12 and is used for providing a magnetic force action position for the movable rod 12.
Specifically, the permanent magnet 17 and the electromagnet 18 are embedded on the bottom of the blind hole 19.
When the electromagnet 18 is in standby, the permanent magnet 17 attracts the movable rod 12, the distance between the bottom of the movable rod 12 and the bottom of the blind hole 19 is at a minimum, and at least part of the hard rod 13 on the movable rod 12 is matched in the blind hole 19; it should be noted that, here, the distance between the bottom of the movable rod 12 and the bottom of the blind hole 19 is at a minimum, wherein the state of the soft rod 15 is a stretching deformation state.
When the electromagnet 18 acts, the electromagnet 18 repels the movable rod 12, the repulsion force provided by the electromagnet 18 is greater than the attraction force of the permanent magnet 17, the movable rod 12 is pushed out of the blind hole 19, the distance between the bottom of the movable rod 12 and the bottom of the blind hole 19 is at the maximum, and the hard rod 13 on the movable rod 12 is disengaged from the blind hole 19.
Referring to fig. 4 of the drawings, for the implementation structure of the connection module, an ultrasonic oscillation module 21 may be disposed at a corresponding position outside the rotation member 7, and when the reflection member 4 and the connection module move downward integrally in this state, an oscillation head of the ultrasonic oscillation module 21 contacts with a back surface of the reflection member 4 to provide an oscillation acting force, and the oscillation acting force is not completely transmitted to the fixing block 20 due to the existence of the soft rod 15.
In addition to the description of the embodiment of the present invention, the implementation structure, the control structure of the electromagnet 18, and the like of the rotating member 7 can be implemented with reference to the prior art, and the embodiment of the present invention is not additionally described.
Specifically, the working flow of the light source system of the exposure machine in the embodiment of the invention is as follows: for one group of baffle groups 1, when the reflecting pieces 4 in the baffle groups 1 all run to the working area 9, the reflecting pieces 4 are combined to form an integral structure, and the reflecting surface 2 of the integral structure is positioned on a curved surface with a preset focus; at this moment, the laser is emitted and impacts the falling liquid drop 10, so that the liquid drop 10 is exploded and combusted and photons are released; both photons and combustion residues escape outwards from the explosion point, wherein photons directed towards the laser source are focused to form photon streams, and part of the combustion residues collide and remain on the reflector; the reflecting piece 4 in the baffle group 1 moves to the cleaning area 5 along with the rotating piece 7, and when the cleaning area 5 is accessed, the state of the connecting module is switched through a switch, so that the connecting module is switched to the structure shown in the attached figure 4; when the rotating member 7 drives the reflecting member 4 to move, the reflecting member 4 is contacted with the ultrasonic oscillation module 21, and the vibration force enables the combustion residues to be separated from the reflecting member 4; when the reflecting member 4 leaves the cleaning zone 5 or enters the working zone 9, the switch keeps the rotating member 7 and the fixed block 20 relatively fixed by switching the state of the connection module.
In summary, the embodiment of the present invention provides an exposure machine light source system, which changes a reflector for converging photons from static state to dynamic state, on one hand, can block combustion residues from entering a laser source, and on the other hand, can clean the reflector in time, so as to avoid accumulation of the combustion residues and influence on convergence of the photons; the posture change of the reflecting member 4 in the working area 9 and the cleaning area 5 can be realized by changing the rotating track of the rotating member 7 and combining the change of the connecting structure, thereby realizing the required working function and cleaning function; the cleaning component adopts the ultrasonic oscillation module 21, takes out the combustion residues on the reflecting piece 4 in an oscillation mode, can be implemented in a vacuum environment, and has a wide application range; in order to reduce the transmission of vibration, the vibration transmission of the ultrasonic vibration module 21 can be avoided to influence the posture stability of the reflector 4 in the working area 9 through the connecting unit with a changeable state; due to the special structural design of the connecting unit, the state of the connecting unit can be switched well.
The above detailed description is provided for the light source system of the exposure machine provided by the embodiment of the present invention, and the principle and the embodiment of the present invention are explained by applying a specific example herein, and the description of the above embodiment is only used to help understanding the method and the core idea of the present invention; meanwhile, for a person skilled in the art, according to the idea of the present invention, there may be variations in the specific embodiments and the application scope, and in summary, the content of the present specification should not be construed as a limitation to the present invention.
Claims (8)
1. A light source system of an exposure machine is characterized by comprising a light source component, a rotary blocking component and a cleaning component;
the light source assembly comprises a laser, the laser is provided with an emergent port, and the position away from the emergent port by a preset distance is a striking position by taking the pointing direction of the emergent port as a reference;
the cleaning assembly comprises a cleaning cavity;
the rotary blocking assembly comprises a rotary part and a baffle group, the rotary part rotates along a preset track, each baffle group comprises a plurality of reflecting parts, each reflecting part is fixedly connected to a preset position on the outer side of the rotary part, and each reflecting part is provided with a reflecting surface with a preset structure;
dividing based on spatial position, wherein the rotary member is provided with a working area and a cleaning area; the working area is positioned between the striking position and the emergent port, and the cleaning area is positioned in the cleaning cavity;
in the rotation process of the rotating member, each reflecting member passes through the working area and the cleaning area, and all the reflecting members in the same group of baffle groups can be positioned on the working area at the same time;
when all the reflecting pieces in one group of the baffle group are positioned in the working area at the same time, the reflecting surfaces of all the reflecting pieces in the baffle group are positioned on a preset concave curved surface, the preset curved surface has a unique focus, and the baffle group is provided with a light-transmitting structure at the position where the connecting line of the emergent port and the striking position passes through;
the cleaning assembly comprises an ultrasonic oscillation module, and the ultrasonic oscillation module is positioned in the cleaning cavity;
the action object of the ultrasonic oscillation module is a reflecting piece;
each reflecting piece is fixedly connected to a preset position on the outer side of the rotating piece through a connecting unit;
the connecting unit has a loosening state and a fixing state, and the connecting unit can be repeatedly switched between the loosening state and the fixing state;
when the connecting unit is in the fixed state, the reflecting piece is rigidly connected with the connecting unit, and when the connecting unit is in the loose state, the reflecting piece is separated from the rigid connection with the connecting unit;
when the reflecting piece is positioned in the working area, the connecting unit corresponding to the reflecting piece is in a fixed state;
when the reflecting piece is positioned in the cleaning area, the connecting unit corresponding to the reflecting piece is in a loose state.
2. Exposure machine light source system according to claim 1, wherein the path of the revolving member in the working area is a straight line;
in a group of the baffle groups, the length of the connecting unit is gradually reduced from the edge of the baffle group to the middle of the baffle group.
3. Exposure machine light source system according to claim 2, wherein the path of the revolving member in the cleaning zone is a curved path which is convex in the direction away from the laser.
4. Exposure machine light source system according to claim 1, wherein the trajectory of the revolving member in the working area is an arc trajectory concave towards the exit opening;
in one set of the baffle groups, all the connecting units are the same in length.
5. Exposure machine light source system according to claim 4, wherein the path of the revolving member in the cleaning zone is rectilinear.
6. The light source system of claim 1, wherein the loose state and the fixed state of the connection unit are switched by a physical switch or an electronic switch.
7. The light source system of claim 1, wherein the connection unit comprises a fixed block, a movable bar, and a control member;
the root of the movable rod is a soft rod, the end part of the movable rod is a hard rod, and the reflecting piece corresponding to the connecting unit is fixedly connected with the hard rod;
the fixed block is provided with a blind hole matched with the movable rod, and the movable rod is matched in the blind hole;
the control piece is used for controlling the distance between the root of the movable rod and the bottom of the blind hole.
8. The light source system of claim 7, wherein the control member comprises a position-limiting member, a force-receiving magnet, a permanent magnet and an electromagnet;
the limiting piece is used for preventing the movable rod from being pulled out of the blind hole;
the permanent magnet and the electromagnet are embedded on the bottom of the blind hole;
when the electromagnet is in standby, the permanent magnet attracts the movable rod, the distance between the bottom of the movable rod and the bottom of the blind hole is at the minimum value, and at least part of hard rods on the movable rod are matched in the blind hole;
when the electromagnet acts, the electromagnet repels the movable rod, the distance between the bottom of the movable rod and the bottom of the blind hole is at the maximum value, and the hard rod on the movable rod is separated from the blind hole.
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| Application Number | Priority Date | Filing Date | Title |
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| CN202210611178.4A CN114779589B (en) | 2022-06-01 | 2022-06-01 | Light source system of exposure machine |
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| Application Number | Priority Date | Filing Date | Title |
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| CN202210611178.4A CN114779589B (en) | 2022-06-01 | 2022-06-01 | Light source system of exposure machine |
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| CN114779589A CN114779589A (en) | 2022-07-22 |
| CN114779589B true CN114779589B (en) | 2022-11-01 |
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Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104345569A (en) * | 2013-07-24 | 2015-02-11 | 中芯国际集成电路制造(上海)有限公司 | Extreme ultraviolet lithography machine light source system and extreme ultraviolet exposure method |
| CN110780542A (en) * | 2018-07-31 | 2020-02-11 | 台湾积体电路制造股份有限公司 | Extreme ultraviolet guide cavity for extreme ultraviolet radiation source device |
| CN111712765A (en) * | 2018-02-13 | 2020-09-25 | Asml荷兰有限公司 | Cleaning a structure surface in an EUV chamber |
| CN215940664U (en) * | 2021-09-26 | 2022-03-04 | 杭州海康机器人技术有限公司 | Bar code detection device and bar code detection system |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9429858B2 (en) * | 2013-09-24 | 2016-08-30 | Taiwan Semiconductor Manufacturing Co., Ltd. | Rotary EUV collector |
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- 2022-06-01 CN CN202210611178.4A patent/CN114779589B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104345569A (en) * | 2013-07-24 | 2015-02-11 | 中芯国际集成电路制造(上海)有限公司 | Extreme ultraviolet lithography machine light source system and extreme ultraviolet exposure method |
| CN111712765A (en) * | 2018-02-13 | 2020-09-25 | Asml荷兰有限公司 | Cleaning a structure surface in an EUV chamber |
| CN110780542A (en) * | 2018-07-31 | 2020-02-11 | 台湾积体电路制造股份有限公司 | Extreme ultraviolet guide cavity for extreme ultraviolet radiation source device |
| CN215940664U (en) * | 2021-09-26 | 2022-03-04 | 杭州海康机器人技术有限公司 | Bar code detection device and bar code detection system |
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| CN114779589A (en) | 2022-07-22 |
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