JPH0735963A - Position adjusting device for optical device - Google Patents

Position adjusting device for optical device

Info

Publication number
JPH0735963A
JPH0735963A JP5179551A JP17955193A JPH0735963A JP H0735963 A JPH0735963 A JP H0735963A JP 5179551 A JP5179551 A JP 5179551A JP 17955193 A JP17955193 A JP 17955193A JP H0735963 A JPH0735963 A JP H0735963A
Authority
JP
Japan
Prior art keywords
holding member
reference plane
optical element
movable member
state
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5179551A
Other languages
Japanese (ja)
Other versions
JP3427428B2 (en
Inventor
Masatoshi Ikeda
正俊 池田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP17955193A priority Critical patent/JP3427428B2/en
Publication of JPH0735963A publication Critical patent/JPH0735963A/en
Application granted granted Critical
Publication of JP3427428B2 publication Critical patent/JP3427428B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691Handling of masks or workpieces

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Details Of Measuring And Other Instruments (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To dispense with the exchange of a washer and to perform the adjustment of three axes easily and in a short time in the position adjustment of an optical device which comprises an optical system. CONSTITUTION:A holding member 3 which holds the optical device M is arranged on a movable member 2 provided with a placing plane 2A inclined to a prescribed reference plane. Also, fixing members (4a-4d, 5a-5d) can be switched to a first state where the movable member 2 and the holding member 3 are fixed integrally and a second state where they can be moved relatively. First driving means(6, 23c) drive the movable member 2 in a prescribed direction within the reference plane when the second state is set, and second driving means (7, 8, 23a, 23b) drive the holding member 3 in the prescribed direction within the reference plane when the first state is set, and also, supply a prescribed pressing force to the holding member 3 so as to move the holding member 3 only in a direction perpendicular to the reference plane when the first driving means (6, 23c) drive the movable member 2 in the prescribed direction.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は光学素子(例えばレンズ
やミラー等)の位置を調整する装置、特に投影露光装置
における投影光学系中の光学素子の位置を投影光学系の
光軸に対して移動させる位置調整装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a device for adjusting the position of an optical element (for example, a lens, a mirror, etc.), and more particularly to the position of the optical element in a projection optical system in a projection exposure apparatus with respect to the optical axis of the projection optical system. The present invention relates to a position adjusting device that moves.

【0002】[0002]

【従来の技術】半導体素子を製造する投影露光装置にお
いて、マスクパターンの透過光束は投影光学系を介して
ステージ上の感光基板(ウェハ)上に結像する。投影光
学系には屈折系、反射系、又は両者を組み合わせた反射
屈折系等があり、複数の光学素子(レンズ、ミラー、凹
面鏡等)で構成されている。この種の投影光学系は微細
なパターンを高解像度でウェハに投影結像する必要があ
るため、その製造において個々の光学素子は非常に高精
度で組立、調整されており、高度な収差補正もなされて
いる。しかし、光学素子の製造精度、組立精度等によっ
て、各種の収差(例えば像面湾曲、コマ収差、非点収差
等)が大きく残存し得る。
2. Description of the Related Art In a projection exposure apparatus for manufacturing a semiconductor element, a transmitted light flux of a mask pattern is imaged on a photosensitive substrate (wafer) on a stage via a projection optical system. The projection optical system includes a refraction system, a reflection system, or a catadioptric system that is a combination of both, and is composed of a plurality of optical elements (lens, mirror, concave mirror, etc.). Since this type of projection optical system needs to project and image a fine pattern on a wafer with high resolution, individual optical elements are assembled and adjusted with extremely high precision in the manufacturing thereof, and sophisticated aberration correction is also performed. Has been done. However, various aberrations (for example, field curvature, coma aberration, astigmatism, etc.) may largely remain due to the manufacturing accuracy, assembly accuracy, and the like of the optical element.

【0003】例えば像面湾曲が残存する投影光学系にお
いては、ウェハ上の1つのショット領域の全面を投影光
学系の結像面と一致させる、ないしはその焦点深度内に
設定することが難しくなり、解像不良が生じることにな
る。しかし投影光学系の各種収差は、投影光学系を構成
する1つ又は複数の光学素子の位置を微調整することに
よって、その発生をある程度抑えることが可能である。
従って投影光学系中の光学素子、特に収差毎にその発生
を抑える効果が最も大きな場所(位置)にある光学素子
には、その位置を微調整する機構が設けられている。
For example, in a projection optical system in which field curvature remains, it becomes difficult to make the entire surface of one shot area on the wafer coincide with the image plane of the projection optical system, or to set it within the depth of focus. Poor resolution will occur. However, various aberrations of the projection optical system can be suppressed to some extent by finely adjusting the positions of one or a plurality of optical elements that form the projection optical system.
Therefore, a mechanism for finely adjusting the position is provided for the optical element in the projection optical system, particularly for the optical element at the position (position) where the effect of suppressing the occurrence of each aberration is greatest.

【0004】従来では、投影光学系の光軸に対する光学
素子の位置を調整するために、光学素子を保持する保持
部材とベース(例えば投影光学系の鏡筒の一部)との間
に間隔調整板(ワッシャー)を配置し、投影光学系に生
じる収差の種類やその大きさに応じて厚さの異なるワッ
シャーに交換していた。また、ワッシャーの代わりにピ
エゾ素子等の駆動素子を用いることもある。これは光学
素子を保持する保持部材とベースとの間の少なくとも3
カ所に駆動素子を配置する。そして夫々の駆動素子に与
える電圧を変化させることによって各駆動素子を伸縮さ
せ、光学素子の位置や傾きを調整していた。
Conventionally, in order to adjust the position of the optical element with respect to the optical axis of the projection optical system, a gap is adjusted between a holding member for holding the optical element and a base (for example, a part of a lens barrel of the projection optical system). A plate (washer) was placed, and the washer was replaced with a washer having a different thickness depending on the type and magnitude of aberration occurring in the projection optical system. A driving element such as a piezo element may be used instead of the washer. This is at least 3 between the holding member holding the optical element and the base.
A drive element is arranged at some place. Then, each drive element is expanded / contracted by changing the voltage applied to each drive element to adjust the position and inclination of the optical element.

【0005】[0005]

【発明が解決しようとする課題】しかしながら上記の如
き従来技術においては、厚さの異なる複数のワッシャー
を準備するか、1つのワッシャーを加工して厚さを変え
ながら光学素子の位置を調整しなければならない。複数
のワッシャーを準備するとコストが大幅にかかることに
なり、また加工しながらの調整は時間が大幅にかかる。
さらに、要求されるワッシャーの加工精度は非常に厳し
いため、ワッシャーを加工するための熟練した技術も必
要となる。
However, in the prior art as described above, a plurality of washers having different thicknesses must be prepared, or one washer must be processed to adjust the position of the optical element while changing the thickness. I have to. If multiple washers are prepared, the cost will be significantly high, and the adjustment during processing will be time-consuming.
Furthermore, since the required processing accuracy of the washer is extremely severe, a skilled technique for processing the washer is also required.

【0006】また上述したワッシャーや駆動素子による
位置調整はZ軸方向のみが対象となり、Z軸にほぼ垂直
な方向(XY方向)の調整を行なうことができない。従
って1光学素子を3軸(X、Y、Z)調整するためには
XY方向への調整機構を備えなければならず、装置が複
雑化、大型化してしまう。本発明は上記の如き問題に鑑
みてなされたもので、投影光学系中の光学素子の位置調
整において、ワッシャーの交換を不要とし、かつ3軸の
調整を簡単に、かつ短時間に行うことができる位置調整
装置を提供することを目的とする。
Further, the above-mentioned position adjustment by the washer and the drive element is targeted only in the Z-axis direction, and the adjustment in the directions substantially perpendicular to the Z-axis (XY directions) cannot be performed. Therefore, in order to adjust one optical element in three axes (X, Y, Z), an adjustment mechanism in the XY directions must be provided, and the device becomes complicated and large. The present invention has been made in view of the above problems, and in the position adjustment of the optical element in the projection optical system, it is not necessary to replace the washer, and the triaxial adjustment can be easily performed in a short time. An object of the present invention is to provide a position adjusting device that can be used.

【0007】[0007]

【課題を解決するための手段】ここでは本発明を分かり
やすくするために一実施例である図1に対応づけて説明
する。かかる問題点を解決するため本発明では、光学系
を構成する光学素子(M)を微動して、当該光学系の光
軸(AX)に対する光学素子(M)の位置を調整する装
置において、所定の基準平面内で2次元移動するととも
に、当該基準平面に対して傾いた載置面(2A)を有す
る可動部材(2)と、当該可動部材(2)上に配置さ
れ、光学素子(M)を保持して載置面(2A)に沿って
移動可能な保持部材(3)と、可動部材(2)と保持部
材(3)との少なくとも一方に設けられ、可動部材
(2)と保持部材(3)とを一体に固定する第1状態と
相対的に移動可能とする第2状態とに切り換える固定部
材(5a〜5d)とを備える。
In order to make the present invention easier to understand, the present invention will be described with reference to FIG. 1 which is an embodiment. In order to solve such a problem, according to the present invention, an optical element (M) that constitutes an optical system is finely moved to adjust the position of the optical element (M) with respect to the optical axis (AX) of the optical system. Of the movable member (2), which has a mounting surface (2A) tilted with respect to the reference plane and is movable on the movable member (2) while moving two-dimensionally within the reference plane of the optical element (M). Is provided on at least one of the movable member (2) and the holding member (3) that holds the substrate and is movable along the mounting surface (2A), and the movable member (2) and the holding member. (3) and a fixing member (5a to 5d) for switching between a first state in which they are integrally fixed and a second state in which they are relatively movable.

【0008】さらに、前述した第2状態のときに可動部
材(2)を所定方向(Y方向)に駆動する第1駆動手段
(6、23c)と、前述した第1状態のときに保持部材
(3)を基準平面内の所定方向(XY方向)に駆動する
とともに、第1駆動手段(6、23c)が可動部材
(2)を所定方向(Y方向)に駆動するとき、保持部材
(3)が基準平面と垂直な方向(Z方向)のみに移動す
るように、保持部材(3)の基準平面方向への移動を制
限する第2駆動手段(7、8、23a、23b)とを備
えた。
Further, a first driving means (6, 23c) for driving the movable member (2) in a predetermined direction (Y direction) in the above-mentioned second state, and a holding member (in the above-mentioned first state). 3) is driven in a predetermined direction (XY direction) within the reference plane, and when the first driving means (6, 23c) drives the movable member (2) in a predetermined direction (Y direction), the holding member (3). So as to move only in the direction (Z direction) perpendicular to the reference plane, the second drive means (7, 8, 23a, 23b) for restricting the movement of the holding member (3) in the reference plane direction. .

【0009】[0009]

【作用】投影光学系中の光学素子の位置を所定の基準平
面内で2次元移動させる場合、まず固定部材によって可
動部材と保持部材とを一体に固定する。そして第2駆動
手段によって保持部材を基準平面内の所定の方向に移動
させる。保持部材と可動部材とは固定されているため、
双方ともに基準平面内で2次元移動する。従って光学素
子も基準平面内を2次元移動する。
When the position of the optical element in the projection optical system is two-dimensionally moved within a predetermined reference plane, first, the movable member and the holding member are integrally fixed by the fixed member. Then, the holding member is moved in the predetermined direction within the reference plane by the second driving means. Since the holding member and the movable member are fixed,
Both move two-dimensionally within the reference plane. Therefore, the optical element also moves two-dimensionally within the reference plane.

【0010】また、光学素子の位置を基準平面にほぼ垂
直な方向に移動する場合、固定部材は可動部材と保持部
材とが相対的に移動可能な状態に切り換える。そして第
1駆動手段によって可動部材を基準平面内の所定の方向
に移動する。ここで可動部材の載置面の基準平面に対す
る傾斜角をθとし、第1駆動手段によって可動部材を移
動する方向は、可動部材の載置面が基準平面に対して角
度θを成す方向とする。
Further, when the position of the optical element is moved in a direction substantially perpendicular to the reference plane, the fixed member switches to a state in which the movable member and the holding member are relatively movable. Then, the first driving means moves the movable member in a predetermined direction within the reference plane. Here, the inclination angle of the mounting surface of the movable member with respect to the reference plane is θ, and the direction in which the movable member is moved by the first driving means is a direction in which the mounting surface of the movable member forms an angle θ with respect to the reference plane. .

【0011】例えば、可動部材を上述の方向に距離xだ
け移動させるとする。第2駆動手段は保持部材の基準平
面方向への移動を制限するため、保持部材は基準平面と
垂直な方向のみに移動する。従って上述の如く可動部材
が距離xだけ移動すると、保持部材は可動部材の傾斜面
上に沿って、基準平面に垂直な方向に距離xtanθだ
け移動する。
For example, assume that the movable member is moved by the distance x in the above-mentioned direction. Since the second driving means limits the movement of the holding member in the reference plane direction, the holding member moves only in the direction perpendicular to the reference plane. Therefore, when the movable member moves by the distance x as described above, the holding member moves by the distance xtan θ along the inclined surface of the movable member in the direction perpendicular to the reference plane.

【0012】このように位置調整装置を動作させること
によって、投影光学系中の光学素子を基準平面方向、及
び基準平面に垂直な方向に調整することが可能となる。
By operating the position adjusting device in this manner, it becomes possible to adjust the optical element in the projection optical system in the reference plane direction and in the direction perpendicular to the reference plane.

【0013】[0013]

【実施例】図1は本発明の実施例による位置調整装置の
概略的な構成を示す図である。本実施例では投影露光装
置に好適な投影光学系、例えば特開平3−282527
号公報に開示された反射屈折縮小投影光学系を構成する
複数の光学素子のうち、特に凹面鏡に本発明を適用した
ものである。以下図1を用いて説明を行う。
1 is a diagram showing a schematic configuration of a position adjusting device according to an embodiment of the present invention. In this embodiment, a projection optical system suitable for a projection exposure apparatus, for example, Japanese Patent Laid-Open No. 3-285272.
The present invention is applied to a concave mirror among a plurality of optical elements constituting the catadioptric reduction projection optical system disclosed in Japanese Patent Laid-Open Publication No. A description will be given below with reference to FIG.

【0014】凹面ミラーMは投影光学系中の1つの光学
素子であり、ミラーM以外の光学素子の図示は省略し
た。また図1(a)は本装置を上方(ミラーM側)から
見たときの上面図であり、図1(b)は本装置を側面か
ら見たときの側面図である。図1(b)に示すように、
本装置の投影光学系の光軸AXはXYZ座標系における
Z軸方向とほぼ平行である。また、光軸AXにほぼ垂直
な平面をXY平面(基準平面)とする。
The concave mirror M is one optical element in the projection optical system, and illustration of optical elements other than the mirror M is omitted. Further, FIG. 1A is a top view of the apparatus when viewed from above (the mirror M side), and FIG. 1B is a side view of the apparatus when viewed from the side. As shown in FIG. 1 (b),
The optical axis AX of the projection optical system of this apparatus is substantially parallel to the Z-axis direction in the XYZ coordinate system. A plane substantially perpendicular to the optical axis AX is defined as an XY plane (reference plane).

【0015】ベース1は基準平面にほぼ平行な基準面1
Aを有し、この基準面1A上に可動部材(間隔調整環)
2が載置されている。この間隔調整環2は上面(載置
面)2Aが下面2Bに対して所定の傾斜角θを持つよう
なくさび形状をしており、本実施例においてはこの傾斜
角θを10%(約5.7度)とする。そして図1(b)
に示すように、Y方向に傾斜が最大となるようにベース
1上に配置されている。間隔調整環2上には凹面ミラー
Mを保持する保持部材3が載置されている。保持部材3
の底面3AはミラーMの光軸MXにほぼ垂直な平面であ
る。従ってミラーMの光軸MXは投影光学系の光軸AX
に対して上述した間隔調整環2の傾斜角θと同様10%
傾いている。
The base 1 is a reference plane 1 substantially parallel to the reference plane.
A, and a movable member (spacing adjustment ring) on this reference plane 1A
2 is placed. The spacing adjusting ring 2 has a wedge shape so that the upper surface (mounting surface) 2A has a predetermined inclination angle θ with respect to the lower surface 2B. In this embodiment, the inclination angle θ is 10% (about 5%). 7 degrees). And FIG. 1 (b)
As shown in FIG. 5, the base 1 is arranged so that the inclination in the Y direction is maximized. A holding member 3 that holds the concave mirror M is placed on the space adjusting ring 2. Holding member 3
3A is a plane substantially perpendicular to the optical axis MX of the mirror M. Therefore, the optical axis MX of the mirror M is the optical axis AX of the projection optical system.
In contrast to the inclination angle θ of the interval adjusting ring 2 described above, 10%
Leaning.

【0016】間隔調整環2及び保持部材3は夫々円筒状
であり、図1(b)に示すように夫々の部材の下部の円
筒の径(直径)は上部の径よりも大きく、断面はL字形
になっている。この間隔調整環2の下部とベース1とは
ボルト4a〜4dによって結合されている。図1(a)
に示すように、ボルト4a〜4dは夫々90°ずつ回転
した位置に配置されており、X軸及びY軸に対して夫々
45°傾いている。同様に保持部材3の下部と間隔調整
環2とはボルト5a〜5dによって結合されており、ボ
ルト5a〜5dは夫々90°ずつ回転した位置に配置さ
れ、X軸及びY軸に対して夫々45°傾いている。
The interval adjusting ring 2 and the holding member 3 are each cylindrical, and as shown in FIG. 1B, the diameter (diameter) of the lower cylinder of each member is larger than the diameter of the upper cylinder, and the cross section is L. It has a glyph. The lower portion of the gap adjusting ring 2 and the base 1 are connected by bolts 4a to 4d. Figure 1 (a)
As shown in FIG. 5, the bolts 4a to 4d are arranged at positions rotated by 90 ° each, and are inclined by 45 ° with respect to the X axis and the Y axis. Similarly, the lower portion of the holding member 3 and the gap adjusting ring 2 are connected by bolts 5a to 5d, and the bolts 5a to 5d are arranged at positions rotated by 90 ° each, and the bolts 5a to 5d are rotated 45 ° with respect to the X axis and the Y axis, respectively. ° tilted.

【0017】また図1(b)に示すように、露光光はミ
ラーMに対して下側(ベース1側)から照射されるた
め、ベース1、間隔調整環2、保持部材3の夫々の部材
には露光光の照射領域を遮断しない大きさ(直径)の円
形開口1H、2H、3Hが設けられている。ベース1に
は駆動部材(アクチュエータ)6が固設されており、ま
た、ベース1に固定された支持部材9、10には夫々ア
クチュエータ7、8が保持されている。アクチュエータ
6の先端部6Aは間隔調整環2の外周部に接しており、
夫々弾性部材(ばね)23cによって連結されている。
また、アクチュエータ7、8の先端部7A、8Aも同様
に保持部材の外周部に接しており、ばね23a、23b
によって夫々連結されている。そしてアクチュエータ6
は調整つまみ部6Bを回転させると、アクチュエータ6
の先端部6AがY方向に移動するような機構になってお
り、間隔調整環2をY方向に移動させることができる。
同様にアクチュエータ7、8も先端部7B、8Bを回転
させると、先端部7A、8Aが夫々Y方向、X方向に移
動するような機構になっており、保持部材3をXY方向
に移動させることができる。これらの詳細な構成につい
て以下図2を用いて説明する。
Further, as shown in FIG. 1B, since the exposure light is applied to the mirror M from the lower side (base 1 side), each of the base 1, the gap adjusting ring 2 and the holding member 3 is exposed. Are provided with circular openings 1H, 2H, 3H having a size (diameter) that does not block the exposure light irradiation area. A drive member (actuator) 6 is fixed to the base 1, and actuators 7 and 8 are held by support members 9 and 10 fixed to the base 1, respectively. The tip portion 6A of the actuator 6 is in contact with the outer peripheral portion of the space adjusting ring 2,
Each is connected by an elastic member (spring) 23c.
Similarly, the tip portions 7A and 8A of the actuators 7 and 8 are also in contact with the outer peripheral portion of the holding member, and the springs 23a and 23b.
Are connected by each. And actuator 6
When the adjusting knob portion 6B is rotated, the actuator 6
6A has a mechanism such that the tip end portion 6A thereof moves in the Y direction, and the interval adjusting ring 2 can be moved in the Y direction.
Similarly, the actuators 7 and 8 also have such a mechanism that when the tips 7B and 8B are rotated, the tips 7A and 8A move in the Y and X directions, respectively, and the holding member 3 is moved in the XY directions. You can These detailed configurations will be described below with reference to FIG.

【0018】図2はアクチュエータ7と保持部材3とが
接する部分の概略的な構成を示す部分断面図であり、ア
クチュエータ6と間隔調整環2、及びアクチュエータ8
と保持部材3とが接する部分も同様の構成である。ま
た、この図2では保持部材3と間隔調整環2とを結合す
るボルトの結合部分を断面図で示している。以下図1及
び図2を用いて間隔調整環2及び保持部材3の駆動機構
について説明する。また図2において図1と同一の部材
には同じ符号を付してある。
FIG. 2 is a partial sectional view showing a schematic structure of a portion where the actuator 7 and the holding member 3 are in contact with each other. The actuator 6, the gap adjusting ring 2 and the actuator 8 are shown.
The portion where the holding member 3 contacts with the holding member 3 has the same configuration. Further, in FIG. 2, a connecting portion of a bolt connecting the holding member 3 and the gap adjusting ring 2 is shown in a sectional view. The drive mechanism for the gap adjusting ring 2 and the holding member 3 will be described below with reference to FIGS. 1 and 2. In FIG. 2, the same members as those in FIG. 1 are designated by the same reference numerals.

【0019】ボルト5dの雄ねじは間隔調整環2に設け
られた雌ねじ25と螺合されており、保持部材3にはボ
ルト5dの雄ねじの直径より大きな直径の円形開口26
が設けられている。間隔調整環2と保持部材3とを結合
する他のボルト5a〜5cの結合部分も同様の構成であ
り、さらに間隔調整環2とベース1とを結合するボルト
4a〜4dの結合部分も同様の構成である。従って、ボ
ルト5a〜5dの雄ねじを間隔調整環2に設けられた4
つの雌ねじから完全にはずさなくても、保持部材3をボ
ルト5a〜5dの頭部で間隔調整環2に押さえつける力
がなくなる程度に緩めることによって、保持部材3と間
隔調整環2とは相対的に微小量(保持部材3に設けられ
た円形開口の直径とボルト5a〜5dの雄ねじの直径と
の差の範囲内)移動することができる。同様にボルト4
a〜4dの雄ねじを少し緩めることによって、間隔調整
環2とベース1とは相対的に微小量移動することができ
る。
The male screw of the bolt 5d is screwed with the female screw 25 provided on the gap adjusting ring 2, and the holding member 3 has a circular opening 26 having a diameter larger than that of the male screw of the bolt 5d.
Is provided. The other bolts 5a to 5c connecting the space adjusting ring 2 and the holding member 3 have the same structure, and the bolts 4a to 4d connecting the space adjusting ring 2 to the base 1 also have the same structure. It is a composition. Therefore, the male screws of the bolts 5a to 5d are attached to the space adjusting ring 2 by 4
Even if the holding members 3 are not completely removed from the two female screws, the holding members 3 and the distance adjusting rings 2 are relatively moved by loosening the holding members 3 by the heads of the bolts 5a to 5d to such an extent that there is no force to press them against the distance adjusting rings 2. A small amount (within the range of the difference between the diameter of the circular opening provided on the holding member 3 and the diameter of the male screw of the bolts 5a to 5d) can be moved. Bolt 4 as well
By slightly loosening the male screws a to 4d, the gap adjusting ring 2 and the base 1 can be moved by a relatively small amount.

【0020】さて、アクチュエータ7の先端部7Aには
止め具21が固設されており、保持部材3にも同様に止
め具22が固設されている。そして夫々の止め具21、
22は弾性部材(ばね)23aによって連結されてい
る。また保持部材3の端面にはあて駒24が設けられて
おり、あて駒24の先端は半球形状をしている。このあ
て駒24の先端部とアクチュエータ7の先端部7Aの端
面とは接しており、ばね23aによって夫々互いに引き
つけ合う力が働いている。アクチュエータ7は図1に示
す調整つまみ7Bを回転することによって先端部7Aを
Y方向に移動させることができる。ここで、調整つまみ
7Bによって先端部7Aを図2の右方向(保持部材3
側)に移動させると、あて駒24を介して保持部材3を
同方向に移動させることができる。また調整つまみ7B
によって先端部7Aを図2の左方向(支持部材9側)に
移動させると、ばね23aの伸縮力により保持部材3を
同方向に移動させることができる。先端部7Aは調整つ
まみ7Bを回転しなければ移動しないため、先端部7A
に対してY方向に何らかの外力がかかっても、その外力
によって先端部7AがY方向に移動することはない。ま
たばね23aは高い伸縮力によってあて駒24の先端部
とアクチュエータ7の先端部7Aとを接触させている。
従って、間隔調整環2をY方向に移動させて保持部材3
をZ方向に微動するとき、保持部材3はアクチュエータ
7及びばね23aによって常に間隔調整環2の移動方向
と反対方向に所定の付勢力が与えられため、保持部材は
Y方向にシフトすることはない。このことはX方向につ
いても同様である。
A stopper 21 is fixed to the tip portion 7A of the actuator 7, and a stopper 22 is fixed to the holding member 3 as well. And each stop 21,
22 are connected by an elastic member (spring) 23a. An address piece 24 is provided on the end surface of the holding member 3, and the tip of the address piece 24 has a hemispherical shape. The tip end of the contact piece 24 and the end face of the tip end 7A of the actuator 7 are in contact with each other, and the springs 23a exert a force to attract each other. The actuator 7 can move the tip portion 7A in the Y direction by rotating the adjusting knob 7B shown in FIG. Here, the tip portion 7A is moved to the right in FIG. 2 (the holding member 3 by the adjusting knob 7B).
When it is moved to the side), the holding member 3 can be moved in the same direction via the address piece 24. Adjustment knob 7B
When the tip portion 7A is moved leftward in FIG. 2 (on the side of the support member 9) by means of, the holding member 3 can be moved in the same direction by the elastic force of the spring 23a. Since the tip portion 7A does not move unless the adjusting knob 7B is rotated, the tip portion 7A
On the other hand, even if some external force is applied in the Y direction, the tip portion 7A does not move in the Y direction by the external force. Further, the spring 23a brings the tip end portion of the contact piece 24 and the tip end portion 7A of the actuator 7 into contact with each other by a high expansion and contraction force.
Therefore, the space adjusting ring 2 is moved in the Y direction to move the holding member 3
When slightly moving in the Z direction, the holding member 3 is always given a predetermined urging force in the direction opposite to the moving direction of the distance adjusting ring 2 by the actuator 7 and the spring 23a, so that the holding member does not shift in the Y direction. . This also applies to the X direction.

【0021】次に保持部材3をX方向、及びY方向(基
準平面内)に移動させる動作、即ちミラーMの位置をX
方向及びY方向に調整するための動作について説明す
る。まず間隔調整環2がベース1上を移動できる程度に
ボルト4a〜4dを緩め、ボルト5a〜5dによって保
持部材3と間隔調整環2とを結合し、両者が一体となっ
て移動可能な状態(第1状態)にする。そしてアクチュ
エータ7、8によって保持部材3を移動させる。保持部
材3と間隔調整環2とはボルトによって結合されている
ため、双方が一体となってベース1上を移動することに
なる。ベース1の基準面1Aは基準平面(XY平面)と
ほぼ平行であるため、以上の動作によってミラーMの位
置をXY平面、即ち投影光学系の光軸AXとほぼ垂直な
方向に移動させることができる。
Next, the operation of moving the holding member 3 in the X direction and the Y direction (within the reference plane), that is, the position of the mirror M is changed to the X direction.
The operation for adjusting the direction and the Y direction will be described. First, the bolts 4a to 4d are loosened to such an extent that the distance adjusting ring 2 can move on the base 1, and the holding member 3 and the distance adjusting ring 2 are coupled by the bolts 5a to 5d, so that both can move integrally ( 1st state). Then, the holding member 3 is moved by the actuators 7 and 8. Since the holding member 3 and the gap adjusting ring 2 are connected by the bolts, both of them move integrally on the base 1. Since the reference plane 1A of the base 1 is substantially parallel to the reference plane (XY plane), the position of the mirror M can be moved in the XY plane, that is, the direction substantially perpendicular to the optical axis AX of the projection optical system by the above operation. it can.

【0022】このとき、アクチュエータ6は間隔調整環
2のY方向への移動を抑えてしまうので、ミラーMの位
置をXY方向へ調整する前にアクチュエータ6をベース
1からとりはずす。また、先端部6Aに加わる外力(間
隔調整環2のY方向への移動によって先端部6Aに加わ
る力)に従って先端部6AがY方向に移動できるように
切り換えられるような機構を設けてもよい。
At this time, since the actuator 6 suppresses the movement of the gap adjusting ring 2 in the Y direction, the actuator 6 is detached from the base 1 before adjusting the position of the mirror M in the XY directions. Further, a mechanism may be provided so that the tip portion 6A can be switched so as to be movable in the Y direction according to an external force applied to the tip portion 6A (a force applied to the tip portion 6A by the movement of the interval adjusting ring 2 in the Y direction).

【0023】次に保持部材3をZ方向に移動させる動
作、即ちミラーMの位置をZ方向に調整するための動作
について説明する。まず、ボルト4a〜4d及び5a〜
5dをすべて緩め、ベース1と間隔調整環2、間隔調整
環2と保持部材3とが夫々相対的に移動できるような状
態(第2状態)にする。そしてアクチュエータ6によっ
て間隔調整環2をベース1上で微少量移動させる。この
とき保持部材3はアクチュエータ7及びばね23の夫々
によってY方向には移動しないようになっており、X方
向も同様に移動しないようになっている。従って、保持
部材3は間隔調整環2の載置面2A上を沿って、Z軸方
向に移動する。以上の動作によってミラーMをZ軸方
向、即ち投影光学系の光軸にほぼ平行な方向に移動させ
ることができる。載置面2Aの基準平面に対する傾斜角
は10%であるので、間隔調整環2の移動量を1とする
とミラーMのZ軸方向への移動量は1/10に減少され
る。つまり間隔調整環2をY軸方向に0.1mm移動さ
せるとミラーMはZ軸方向に10μm移動する。
Next, the operation for moving the holding member 3 in the Z direction, that is, the operation for adjusting the position of the mirror M in the Z direction will be described. First, the bolts 4a to 4d and 5a to
All of 5d are loosened so that the base 1 and the gap adjusting ring 2, and the gap adjusting ring 2 and the holding member 3 can move relative to each other (second state). Then, the actuator 6 moves the distance adjusting ring 2 on the base 1 by a small amount. At this time, the holding member 3 is prevented from moving in the Y direction by each of the actuator 7 and the spring 23, and is also prevented from moving in the X direction. Therefore, the holding member 3 moves in the Z-axis direction along the mounting surface 2A of the gap adjusting ring 2. With the above operation, the mirror M can be moved in the Z-axis direction, that is, in the direction substantially parallel to the optical axis of the projection optical system. Since the inclination angle of the mounting surface 2A with respect to the reference plane is 10%, the movement amount of the mirror M in the Z-axis direction is reduced to 1/10 when the movement amount of the interval adjusting ring 2 is 1. That is, when the distance adjusting ring 2 is moved 0.1 mm in the Y-axis direction, the mirror M is moved 10 μm in the Z-axis direction.

【0024】本実施例においては先ずミラーMをXY方
向に移動してからZ方向へ移動したが、どちらを先に調
整しても構わない。また、固定部材はボルトに限らず、
真空吸着等によって保持部材3と間隔調整環2(または
間隔調整環2とベース1)とを一体に固定するような機
構でもよい。また、図1(b)において照明光は図の下
側(ベース1側)からミラーMに向けて照射されるよう
な構成であるが、ミラーMの反射面を逆(図1(b)の
上側)に向け、照明光が図1(b)の上側から照射され
るような構成にしても良い。このとき間隔調整環2、保
持部材3夫々は円筒状ではなく、開口のない円柱状でよ
い。
In this embodiment, the mirror M is first moved in the XY directions and then moved in the Z direction, but either one may be adjusted first. Further, the fixing member is not limited to the bolt,
A mechanism may be used in which the holding member 3 and the gap adjusting ring 2 (or the gap adjusting ring 2 and the base 1) are integrally fixed by vacuum suction or the like. Further, in FIG. 1B, the illumination light is radiated toward the mirror M from the lower side (base 1 side) of the figure, but the reflection surface of the mirror M is reversed (see FIG. 1B). The illumination light may be emitted from the upper side of FIG. 1B toward the upper side). At this time, each of the space adjusting ring 2 and the holding member 3 may have a cylindrical shape without an opening, instead of a cylindrical shape.

【0025】さらに保持部材3のZ方向における位置を
調整するとき、アクチュエータ6は間隔調整環2を図1
におけるY方向(傾斜面2Aと底面2Bとの傾斜角が1
0%を成す方向)に移動させるが、移動させる方向はこ
れに限らない。ただし、間隔調整環2をX方向に移動さ
せても保持部材3はZ方向に移動しないため、それ以外
の方向に移動させる必要がある。また、間隔調整環2の
移動方向に応じて間隔調整環2の移動量とミラーMのZ
方向への移動量との関係が変化する。従って、予めその
関係を求めておけばミラーMを所望の位置に調整するこ
とができる。
Further, when adjusting the position of the holding member 3 in the Z direction, the actuator 6 moves the gap adjusting ring 2 to the position shown in FIG.
In the Y direction (the inclination angle between the inclined surface 2A and the bottom surface 2B is 1
However, the moving direction is not limited to this. However, since the holding member 3 does not move in the Z direction even if the space adjusting ring 2 is moved in the X direction, it is necessary to move it in the other direction. In addition, the amount of movement of the gap adjusting ring 2 and the Z of the mirror M depending on the moving direction of the gap adjusting ring 2.
The relationship with the amount of movement in the direction changes. Therefore, if the relationship is obtained in advance, the mirror M can be adjusted to a desired position.

【0026】[0026]

【発明の効果】以上のように本発明によれば、固定手段
によって調整部材と保持部材とを一体に固定する状態
と、相対的に移動可能となる状態とを適宜選択すること
により、第1駆動手段によって光学素子の位置をZ軸方
向に、第2駆動手段によって光学素子の位置をXY方向
に調整することができる。したがってワッシャーを交換
することなく短時間に、しかも簡単に光学素子の3軸の
位置調整が可能となる。また、第2駆動部材は保持部材
を基準平面内の所定の方向に駆動する機能と、保持部材
を基準平面に垂直な方向に移動するときに保持部材の基
準平面方向への移動を制限する機能を兼ねているため、
装置を比較的簡単に構成することができる。さらに光学
素子をXY方向へ移動する際にZ方向へも移動してしま
うことがなく、逆にZ方向へ移動する際もXY方向に移
動するようなことがない。
As described above, according to the present invention, by appropriately selecting a state in which the adjusting member and the holding member are integrally fixed by the fixing means and a state in which the adjusting member and the holding member are relatively movable, the first The position of the optical element can be adjusted in the Z-axis direction by the driving means, and the position of the optical element can be adjusted in the XY directions by the second driving means. Therefore, the triaxial position adjustment of the optical element can be easily performed in a short time without replacing the washer. The second driving member has a function of driving the holding member in a predetermined direction within the reference plane and a function of limiting the movement of the holding member in the reference plane direction when the holding member is moved in a direction perpendicular to the reference plane. Because it doubles as
The device can be constructed relatively easily. Furthermore, when the optical element is moved in the XY directions, it does not move in the Z direction, and conversely, when it moves in the Z direction, it does not move in the XY directions.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の1実施例である調整装置の概略的な構
成を示す図で、図1(a)は上面図、図1(b)は装置
を側面から見た側面図である。
1A and 1B are views showing a schematic configuration of an adjusting device according to an embodiment of the present invention, FIG. 1A is a top view, and FIG. 1B is a side view of the device seen from a side.

【図2】アクチュエータ7と保持部材3とが接する部分
の概略的な構成を示す部分断面図である。
FIG. 2 is a partial cross-sectional view showing a schematic configuration of a portion where an actuator 7 and a holding member 3 are in contact with each other.

【符号の説明】[Explanation of symbols]

M・・・ミラー 1・・・ベース 2・・・間隔調整環 3・・・保持部材 4a〜4d、5a〜5d・・・ボルト 6、7、8・・・アクチュエータ 21、22・・・とめ具 23a、23b、23c・・・ばね M ... Mirror 1 ... Base 2 ... Interval adjustment ring 3 ... Holding member 4a-4d, 5a-5d ... Bolt 6, 7, 8 ... Actuator 21, 22 ... Stopper Tools 23a, 23b, 23c ... springs

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 光学系を構成する光学素子を微動して、
前記光学系の光軸に対する前記光学素子の位置を調整す
る装置において、 所定の基準平面内で2次元移動するとともに、該基準平
面に対して傾いた載置面を有する可動部材と、 該可動部材上に配置され、前記光学素子を保持して前記
載置面に沿って移動可能な保持部材と、 前記可動部材と前記保持部材との少なくとも一方に設け
られ、前記可動部材と前記保持部材とを一体に固定する
第1状態と相対的に移動可能とする第2状態とに切り換
える固定部材と、 前記光学素子を前記基準平面にほぼ垂直な方向に移動す
るために、前記第2状態のときに前記可動部材を所定方
向に駆動する第1駆動手段と、 前記第1状態のときに前記保持部材を前記基準平面内の
所定の方向に駆動するとともに、前記第1駆動手段が前
記可動部材を所定方向に駆動するとき、前記保持部材が
前記基準平面と垂直な方向のみに移動するように、前記
保持部材の前記基準平面方向への移動を制限する第2駆
動手段とを備えたことを特徴とする光学素子の位置調整
装置。
1. An optical element that constitutes an optical system is finely moved,
In a device for adjusting the position of the optical element with respect to the optical axis of the optical system, a movable member that moves two-dimensionally within a predetermined reference plane and has a mounting surface inclined with respect to the reference plane, and the movable member. A holding member that is disposed above and that holds the optical element and is movable along the mounting surface, and is provided on at least one of the movable member and the holding member, and includes the movable member and the holding member. A fixing member that switches between a first state in which the optical element is fixed integrally and a second state in which the optical element is relatively movable; and a moving member in the second state in order to move the optical element in a direction substantially perpendicular to the reference plane. First driving means for driving the movable member in a predetermined direction; driving the holding member in a predetermined direction within the reference plane in the first state; and the first driving means for moving the movable member in a predetermined direction. Drive in the direction In this case, the optical element is provided with a second drive means for restricting movement of the holding member in the reference plane direction so that the holding member moves only in a direction perpendicular to the reference plane. Position adjustment device.
JP17955193A 1993-07-21 1993-07-21 Optical element position adjusting device and projection exposure device Expired - Fee Related JP3427428B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17955193A JP3427428B2 (en) 1993-07-21 1993-07-21 Optical element position adjusting device and projection exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17955193A JP3427428B2 (en) 1993-07-21 1993-07-21 Optical element position adjusting device and projection exposure device

Publications (2)

Publication Number Publication Date
JPH0735963A true JPH0735963A (en) 1995-02-07
JP3427428B2 JP3427428B2 (en) 2003-07-14

Family

ID=16067727

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17955193A Expired - Fee Related JP3427428B2 (en) 1993-07-21 1993-07-21 Optical element position adjusting device and projection exposure device

Country Status (1)

Country Link
JP (1) JP3427428B2 (en)

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