CN114721089A - Phased array radar system based on phase change material photoswitch - Google Patents

Phased array radar system based on phase change material photoswitch Download PDF

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CN114721089A
CN114721089A CN202210637947.8A CN202210637947A CN114721089A CN 114721089 A CN114721089 A CN 114721089A CN 202210637947 A CN202210637947 A CN 202210637947A CN 114721089 A CN114721089 A CN 114721089A
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waveguide
layer
gst layer
gst
interference region
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闫培光
商镇远
陈浩
朱刚毅
杨俊波
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Shenzhen University
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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01SRADIO DIRECTION-FINDING; RADIO NAVIGATION; DETERMINING DISTANCE OR VELOCITY BY USE OF RADIO WAVES; LOCATING OR PRESENCE-DETECTING BY USE OF THE REFLECTION OR RERADIATION OF RADIO WAVES; ANALOGOUS ARRANGEMENTS USING OTHER WAVES
    • G01S17/00Systems using the reflection or reradiation of electromagnetic waves other than radio waves, e.g. lidar systems
    • G01S17/02Systems using the reflection of electromagnetic waves other than radio waves
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01SRADIO DIRECTION-FINDING; RADIO NAVIGATION; DETERMINING DISTANCE OR VELOCITY BY USE OF RADIO WAVES; LOCATING OR PRESENCE-DETECTING BY USE OF THE REFLECTION OR RERADIATION OF RADIO WAVES; ANALOGOUS ARRANGEMENTS USING OTHER WAVES
    • G01S7/00Details of systems according to groups G01S13/00, G01S15/00, G01S17/00
    • G01S7/48Details of systems according to groups G01S13/00, G01S15/00, G01S17/00 of systems according to group G01S17/00
    • G01S7/481Constructional features, e.g. arrangements of optical elements
    • G01S7/4817Constructional features, e.g. arrangements of optical elements relating to scanning
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/0126Opto-optical modulation, i.e. control of one light beam by another light beam, not otherwise provided for in this subclass
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B2006/12083Constructional arrangements
    • G02B2006/12121Laser

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Radar, Positioning & Navigation (AREA)
  • Remote Sensing (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Variable-Direction Aerials And Aerial Arrays (AREA)
  • Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)

Abstract

The invention discloses a phased array radar system based on a phase change material optical switch, which relates to the technical field of microwave photonics and comprises a silicon substrate, a silicon dioxide buried oxide layer and a silicon nitride layer; the silicon nitride layer comprises a first waveguide, a second waveguide, a third waveguide, a fourth waveguide, a fifth waveguide, a sixth waveguide, a seventh waveguide, an eighth waveguide, a ninth waveguide, a tenth waveguide, an eleventh waveguide, a twelfth waveguide, a thirteenth waveguide, a fourteenth waveguide and a fifteenth waveguide; the silicon nitride layer further includes: the multimode interference device comprises a first multimode interference region, a second multimode interference region, a third multimode interference region, a fourth multimode interference region, a fifth multimode interference region, a sixth multimode interference region and a seventh multimode interference region. When the GST layer is heated by the short laser pulse and is converted from the amorphous state to the crystalline state, the specific waveguide cannot transmit light, the position of the overall emergent light of the chip can be changed, and the spatial scanning of the output light beam can be realized by regularly controlling the GST optical switch of the specific waveguide.

Description

Phased array radar system based on phase change material photoswitch
Technical Field
The invention relates to the technical field of microwave photonics, in particular to a phased array radar system based on a phase-change material optical switch.
Background
In recent years, optical phased arrays have attracted considerable attention as an alternative to conventional mechanical scanning and MEMS beam steering techniques. It has no inertia, and can still realize random pointing with high directional gain under high-speed scanning. The optical phased array utilizes various micro-structure waveguides to control light beams, and emitted light interferes in a far field to form an interference pattern with specific directional gain by adjusting the phase relation among transmitting array elements. In an optical phased array system, an optical phase shifter can control the shape and direction of a wavefront by controlling the phase of light passing through a waveguide, thereby realizing beam deflection.
In the existing phased array beam regulation and control technology, a thermo-optic phase shifter is generally prepared on a waveguide, and the phase of an optical antenna is regulated and controlled by using a thermo-optic effect; or a wavelength-tunable light source scheme is adopted, so as to control the light beam steering. But the wavelength tunable laser has a large size and is not easy to realize chip-level integration; the method for regulating and controlling the phase of the optical antenna by utilizing thermal regulation needs to rely on an external control circuit, has high process requirement, high phase regulation energy consumption, complex control circuit and generally smaller light beam scanning range.
Accordingly, the present invention is directed to a phased array radar system based on phase change material optical switches to solve the above-mentioned problems.
Disclosure of Invention
The invention aims to provide a phased array radar system based on a phase change material photoswitch, which aims to solve the problem of a phase modulation mode of a phased array (taking a one-dimensional phased array as an example) in the prior art.
The technical purpose of the invention is realized by the following technical scheme: a phased array radar system based on a phase change material optical switch comprises three-layer structure components and a miniature short pulse laser positioned above the three-layer structure components, wherein the three-layer structure components comprise a silicon substrate, a silicon dioxide buried oxide layer and a silicon nitride layer which are sequentially arranged from bottom to top;
the silicon nitride layer includes: the waveguide comprises a first waveguide, a second waveguide, a third waveguide, a fourth waveguide, a fifth waveguide, a sixth waveguide, a seventh waveguide, an eighth waveguide, a ninth waveguide, a tenth waveguide, an eleventh waveguide, a twelfth waveguide, a thirteenth waveguide, a fourteenth waveguide and a fifteenth waveguide which are arranged in sequence;
the silicon nitride layer further includes: a first multimode interference region, a second multimode interference region, a third multimode interference region, a fourth multimode interference region, a fifth multimode interference region, a sixth multimode interference region and a seventh multimode interference region, the first waveguide being connected to a second waveguide and a third waveguide by a first multimode interference region, the second waveguide being connected to a fourth waveguide and a fifth waveguide by a second multimode interference region, the third waveguide is connected to a sixth waveguide and a seventh waveguide through a third multimode interference region, the fourth waveguide is connected to an eighth waveguide and a ninth waveguide through a fourth multimode interference region, the fifth waveguide is connected to the tenth waveguide and the eleventh waveguide through a fifth multimode interference region, the sixth waveguide is connected to the twelfth waveguide and the thirteenth waveguide through a sixth multimode interference region, the seventh waveguide is connected to the fourteenth waveguide and the fifteenth waveguide through a seventh multimode interference region;
and a first GST layer, a second GST layer, a third GST layer, a fourth GST layer, a fifth GST layer, a sixth GST layer, a seventh GST layer and an eighth GST layer are respectively deposited on the upper surfaces of the eighth waveguide, the ninth waveguide, the tenth waveguide, the eleventh waveguide, the twelfth waveguide, the thirteenth waveguide, the fourteenth waveguide and the fifteenth waveguide.
Further, the first waveguide, the second waveguide, the third waveguide, the fourth waveguide, the fifth waveguide, the sixth waveguide, the seventh waveguide, the eighth waveguide, the ninth waveguide, the tenth waveguide, the eleventh waveguide, the twelfth waveguide, the thirteenth waveguide, the fourteenth waveguide and the fifteenth waveguide have a width of 1-2 μm.
Further, the first GST layer, the second GST layer, the third GST layer, the fourth GST layer, the fifth GST layer, the sixth GST layer, the seventh GST layer and the eighth GST layer are deposited in an evaporation mode, and the thicknesses of the first GST layer, the second GST layer, the third GST layer, the fourth GST layer, the fifth GST layer, the sixth GST layer, the seventh GST layer and the eighth GST layer are 50-800 nm.
Further, the micro short pulse laser is precisely positioned to the first GST layer, the second GST layer, the third GST layer, the fourth GST layer, the fifth GST layer, the sixth GST layer, the seventh GST layer, and the eighth GST layer by emitting a short pulse laser beam.
Further, the height of the silicon substrate is greater than that of the silicon dioxide oxygen burying layer, and the height of the silicon dioxide oxygen burying layer is greater than that of the silicon nitride layer.
Further, the height ranges of the first waveguide, the second waveguide, the third waveguide, the fourth waveguide, the fifth waveguide, the sixth waveguide, the seventh waveguide, the eighth waveguide, the ninth waveguide, the tenth waveguide, the eleventh waveguide, the twelfth waveguide, the thirteenth waveguide, the fourteenth waveguide, the fifteenth waveguide, the first multimode interference region, the second multimode interference region, the third multimode interference region, the fourth multimode interference region, the fifth multimode interference region, the sixth multimode interference region, the seventh multimode interference region, the first GST layer, the second GST layer, the third GST layer, the fourth GST layer, the fifth GST layer, the sixth GST layer, the seventh GST layer and the eighth GST layer are 0.3-1.5 μm.
Further, the height of the silicon substrate is 300-600 μm.
Further, the height of the silicon dioxide oxygen burying layer is 2-3 μm.
In the invention, the system inputs light into the first waveguide, the light is split by the multi-level multi-mode interference region, and finally the light is emitted to the free space by the eighth waveguide, the ninth waveguide, the tenth waveguide, the eleventh waveguide, the twelfth waveguide, the thirteenth waveguide, the fourteenth waveguide and the fifteenth waveguide. In the present invention, the GST material is deposited on the eighth, ninth, tenth, eleventh, twelfth, thirteenth, fourteenth, and fifteenth waveguides, that is, the first, second, third, fourth, fifth, sixth, seventh, and eighth GST layers by evaporation. Compared with other phase change materials, the GST series alloy is the most mature phase change material, and has the advantages of high crystallization rate, large resistance and refractive index change of amorphous and crystalline states, good reversibility between the amorphous and crystalline states and the like. Moreover, the crystallization temperature of the GST material is about 168 ℃, and the crystallization time can reach nanosecond level, so that the GST material is suitable for the application of an ultrafast optical switch. Because the difference between the crystalline state and the amorphous state refractive index of the GST material is 1.4, when the GST layer is heated from the amorphous state to the crystalline state through the short pulse laser, the total reflection condition of the waveguide can be changed due to the change of the refractive index of the GST layer, so that the specific waveguide cannot pass light, the position of the whole emergent light of the chip is changed, and the spatial scanning of the output light beam can be realized by regularly controlling the switch of the specific waveguide.
In the present invention, if a single short laser pulse heats the GST layer to near the melting point, it rapidly cools and becomes amorphous thereafter; if a series of short pulses are applied to the micro short pulse laser, the micro short pulse laser is slower in cooling speed and is stabilized to be in a crystalline state, so that regular beam steering can be realized by controlling the pulse type emitted by the micro short pulse laser and the waveguide position where laser is incident, namely the system can realize a beam scanning system with higher speed, higher efficiency and higher stability.
In conclusion, the invention has the following beneficial effects:
1. according to the system, light is input into a first waveguide, split is carried out through a multi-level multi-mode interference region, and finally the light is emitted to a free space through an eighth waveguide, a ninth waveguide, a tenth waveguide, an eleventh waveguide, a twelfth waveguide, a thirteenth waveguide, a fourteenth waveguide and a fifteenth waveguide, and due to the fact that the refractive index difference between GST crystalline state and amorphous state is 1.4, when a GST layer in the invention is heated through short laser pulse and converted from an amorphous state to a crystalline state, the total reflection condition of the waveguide can be changed through the change of the refractive index of the GST layer, so that a specific waveguide cannot be light-conducted, and the position of integral emergent light of a chip can be changed, therefore, the spatial scanning of an output light beam can be realized through regularly controlling a GST optical switch of a specific waveguide;
2. the system of the invention can realize a light beam scanning system with high speed, high efficiency and strong stability.
Drawings
Fig. 1 is a schematic perspective view of a phased array radar system based on a phase change material optical switch according to an embodiment of the present invention.
In the figure: 31. a silicon substrate; 32. a silicon dioxide buried oxide layer; 33. a miniature short pulse laser; 1. a first waveguide; 2. a first multimode interference region; 3. a second waveguide; 4. a third waveguide; 5. a second multimode interference region; 6. a third multimode interference region; 7. a fourth waveguide; 8. a fifth waveguide; 9. a sixth waveguide; 10. a seventh waveguide; 11. a fourth multimode interference region; 12. a fifth multimode interference region; 13. a sixth multimode interference region; 14. a seventh multimode interference region; 15. an eighth waveguide; 16. a ninth waveguide; 17. a tenth waveguide; 18. an eleventh waveguide; 19. a twelfth waveguide; 20. a thirteenth waveguide; 21. a fourteenth waveguide; 22. a fifteenth waveguide; 23. a first GST layer; 24. a second GST layer; 25. a third GST layer; 26. a fourth GST layer; 27. a fifth GST layer; 28. a sixth GST layer; 29. a seventh GST layer; 30. and an eighth GST layer.
Detailed Description
In order to make the technical solutions of the present invention better understood, the technical solutions of the present invention will be described in further detail below with reference to the embodiments of the present invention and the accompanying drawings. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
It should be noted that the embodiments and features of the embodiments may be combined with each other without conflict. The present invention will be described in detail with reference to examples.
Example (b):
as shown in fig. 1, a phase-basedThe phased array radar system of the variable material optical switch comprises a miniature short pulse laser 33 and three-layer structure components which are n from bottom to top in sequence3Layer n2Layer n1A layer of which n3The layer being a silicon substrate 31, n2The layer is a silicon dioxide buried oxide layer 32, n1The layer is a silicon nitride layer, the height of the silicon substrate 31 is greater than that of the silicon dioxide buried oxide layer 32, and the height of the silicon dioxide buried oxide layer 32 is greater than that of the silicon nitride layer.
The structure of the silicon nitride layer mainly comprises silicon nitride waveguides (comprising a first waveguide 1, a second waveguide 3, a third waveguide 4, a fourth waveguide 7, a fifth waveguide 8, a sixth waveguide 9, a seventh waveguide 10, an eighth waveguide 15, a ninth waveguide 16, a tenth waveguide 17, an eleventh waveguide 18, a twelfth waveguide 19, a thirteenth waveguide 20, a fourteenth waveguide 21 and a fifteenth waveguide 22), multi-mode interference regions (comprising a first multi-mode interference region 2, a second multi-mode interference region 5, a third multi-mode interference region 6, a fourth multi-mode interference region 11, a fifth multi-mode interference region 12, a sixth multi-mode interference region 13 and a seventh multi-mode interference region 14). Wherein, the concrete position relation among each part in the silicon nitride layer is:
the first waveguide 1 is connected to the second waveguide 3 and the third waveguide 4 by a first multimode interference region 2, the second waveguide 3 is connected to the fourth waveguide 7 and the fifth waveguide 8 by a second multimode interference region 5, the third waveguide 4 is connected to the sixth waveguide 9 and the seventh waveguide 10 by a third multimode interference region 6, the fourth waveguide 7 is connected to the eighth waveguide 15 and the ninth waveguide 16 by a fourth multimode interference region 11, the fifth waveguide 8 is connected to the tenth waveguide 17 and the eleventh waveguide 18 by a fifth multimode interference region 12, the sixth waveguide 9 is connected to the twelfth waveguide 19 and the thirteenth waveguide 20 by a sixth multimode interference region 13, and the seventh waveguide 10 is connected to the fourteenth waveguide 21 and the fifteenth waveguide 22 by a seventh multimode interference region 14.
GST layers (a first GST layer 23, a second GST layer 24, a third GST layer 25, a fourth GST layer 26, a fifth GST layer 27, a sixth GST layer 28, a seventh GST layer 29, and an eighth GST layer 30, respectively) are deposited on the upper surfaces of the eighth waveguide 15, the ninth waveguide 16, the tenth waveguide 17, the eleventh waveguide 18, the twelfth waveguide 19, the thirteenth waveguide 20, the fourteenth waveguide 21, and the fifteenth waveguide 22 by evaporation.
In this embodiment, the light source used in the phased array radar system of the present invention is a narrow-line-width tunable laser with a set output center wavelength, which may be visible light (mainly 500 nm), near infrared light (mainly 1550 nm), or mid-infrared light (mainly 2800 nm).
The working principle is as follows: the system of the present invention splits light by inputting light into the first waveguide 1, passing through a multi-stage multi-mode interference region, and finally emits the light to a free space by passing through the eighth waveguide 15, the ninth waveguide 16, the tenth waveguide 17, the eleventh waveguide 18, the twelfth waveguide 19, the thirteenth waveguide 20, the fourteenth waveguide 21, and the fifteenth waveguide 22. GST materials are deposited on the upper surfaces of the eighth, ninth, tenth, eleventh, twelfth, thirteenth, fourteenth, and fifteenth waveguides 15, 16, 17, 18, 19, 20, 21, 22, that is, the first, second, third, fourth, fifth, sixth, seventh, and eighth GST layers 23, 24, 25, 26, 27, 28, 29, and 30, by evaporation. Compared with other phase change materials, the GST series alloy is the most mature phase change material, and has the advantages of high crystallization rate, large resistance and refractive index change of amorphous and crystalline states, good reversibility between the amorphous and crystalline states and the like. The crystallization temperature of the GST material is about 168 ℃, the crystallization time can reach nanosecond level, and the GST material is suitable for being applied to an ultrafast optical switch. Because the difference between the crystalline state and the amorphous state refractive index of the GST material is 1.4, when the GST layer is heated and converted from the amorphous state to the crystalline state through the short laser pulse of the micro short pulse laser 33, the total reflection condition of the waveguide can be broken through due to the change of the refractive index of the GST layer, so that the specific waveguide cannot pass light, the position of the whole emergent light of the chip is changed, and the space scanning function of the output light beam can be realized by regularly controlling the switch of the specific waveguide.
In the above embodiments of the present invention, compared to the existing phased array beam adjusting and controlling technology in which the thermally tuned phase shifter is fabricated on the waveguide, the system of the present invention utilizes the thermo-optic effect to adjust and control the phase of the optical antenna, and does not need to rely on an external control circuit, thereby further reducing the size; compared with the scheme of adopting the wavelength-adjustable light source, the invention can use a single light source for adjustment, thereby being optimized in terms of economy and size; meanwhile, the GST material has the advantages of high crystallization rate, large variation of amorphous and crystalline resistances and refractive indexes, good reversibility between the amorphous and crystalline states and the like; in addition, in the system, all-optical switching directly processes optical signals in an optical domain without optical-electrical-optical conversion, so that the system is not limited by an electronic bottleneck and has the advantages of high speed, broadband, transparency, low power consumption, potential low cost and the like.
The present embodiment is only for explaining the present invention, and it is not limited to the present invention, and those skilled in the art can make modifications of the present embodiment without inventive contribution as needed after reading the present specification, but all of them are protected by patent law within the scope of the claims of the present invention.

Claims (8)

1. A phased array radar system based on a phase change material optical switch is characterized in that: the three-layer structure element comprises a silicon substrate (31), a silicon dioxide buried oxide layer (32) and a silicon nitride layer which are sequentially arranged from bottom to top;
the silicon nitride layer includes: the waveguide comprises a first waveguide (1), a second waveguide (3), a third waveguide (4), a fourth waveguide (7), a fifth waveguide (8), a sixth waveguide (9), a seventh waveguide (10), an eighth waveguide (15), a ninth waveguide (16), a tenth waveguide (17), an eleventh waveguide (18), a twelfth waveguide (19), a thirteenth waveguide (20), a fourteenth waveguide (21) and a fifteenth waveguide (22) which are arranged in sequence;
the silicon nitride layer further includes: a first (2), a second (5), a third (6), a fourth (11), a fifth (12), a sixth (13) and a seventh (14) multimode interference region, the first waveguide (1) being connected to the second (3) and third (4) waveguides by the first multimode interference region (2), the second waveguide (3) being connected to the fourth (7) and fifth (8) waveguides by the second multimode interference region (5), the third waveguide (4) being connected to the sixth (9) and seventh (10) waveguides by the third multimode interference region (6), the fourth waveguide (7) being connected to the eighth (15) and ninth (16) waveguides by the fourth multimode interference region (11), the fifth waveguide (8) being connected to the tenth (17) and eleventh (18) waveguides by the fifth multimode interference region (12) -said sixth waveguide (9) is connected to a twelfth waveguide (19) and to a thirteenth waveguide (20) by means of a sixth multimode interference region (13), -said seventh waveguide (10) is connected to a fourteenth waveguide (21) and to a fifteenth waveguide (22) by means of a seventh multimode interference region (14);
and a first GST layer (23), a second GST layer (24), a third GST layer (25), a fourth GST layer (26), a fifth GST layer (27), a sixth GST layer (28), a seventh GST layer (29) and an eighth GST layer (30) are respectively deposited on the upper surfaces of the eighth waveguide (15), the ninth waveguide (16), the tenth waveguide (17), the eleventh waveguide (18), the twelfth waveguide (19), the thirteenth waveguide (20), the fourteenth waveguide (21) and the fifteenth waveguide (22).
2. The phased array radar system based on phase change material optical switches of claim 1, wherein: the widths of the first waveguide (1), the second waveguide (3), the third waveguide (4), the fourth waveguide (7), the fifth waveguide (8), the sixth waveguide (9), the seventh waveguide (10), the eighth waveguide (15), the ninth waveguide (16), the tenth waveguide (17), the eleventh waveguide (18), the twelfth waveguide (19), the thirteenth waveguide (20), the fourteenth waveguide (21) and the fifteenth waveguide (22) are 1-2 μm.
3. The phased array radar system based on phase change material optical switches of claim 1, wherein: the first GST layer (23), the second GST layer (24), the third GST layer (25), the fourth GST layer (26), the fifth GST layer (27), the sixth GST layer (28), the seventh GST layer (29) and the eighth GST layer (30) are deposited in an evaporation mode, and the first GST layer (23), the second GST layer (24), the third GST layer (25), the fourth GST layer (26), the fifth GST layer (27), the sixth GST layer (28), the seventh GST layer (29) and the eighth GST layer (30) are 50-800nm in thickness.
4. The phased array radar system based on phase change material optical switches of claim 1, wherein: the micro short pulse laser (33) is precisely positioned to a first GST layer (23), a second GST layer (24), a third GST layer (25), a fourth GST layer (26), a fifth GST layer (27), a sixth GST layer (28), a seventh GST layer (29), and an eighth GST layer (30) by emitting a short pulse laser beam.
5. The phased array radar system based on phase change material optical switches of claim 1, wherein: the height of the silicon substrate (31) is larger than that of the silicon dioxide buried oxide layer (32), and the height of the silicon dioxide buried oxide layer (32) is larger than that of the silicon nitride layer.
6. A phase change material optical switch based phased array radar system according to claim 1 or 2 or 3 or 4 or 5, wherein: the waveguide structure comprises a first waveguide (1), a second waveguide (3), a third waveguide (4), a fourth waveguide (7), a fifth waveguide (8), a sixth waveguide (9), a seventh waveguide (10), an eighth waveguide (15), a ninth waveguide (16), a tenth waveguide (17), an eleventh waveguide (18), a twelfth waveguide (19), a thirteenth waveguide (20), a fourteenth waveguide (21), a fifteenth waveguide (22), a first multimode interference region (2), a second multimode interference region (5), a third multimode interference region (6), a fourth multimode interference region (11), a fifth multimode interference region (12), a sixth multimode interference region (13), a seventh multimode interference region (14), a first GST layer (23), a second GST layer (24), a third GST layer (25), a fourth GST layer (26), a fifth GST layer (27), a sixth GST layer (28), The height of the seventh GST layer (29) and the eighth GST layer (30) is in the range of 0.3-1.5 μm.
7. The phased array radar system based on phase change material optical switches of claim 1 or 5, wherein: the height of the silicon substrate (31) is 300-600 μm.
8. The phased array radar system based on phase change material optical switches of claim 1 or 5, wherein: the height of the silicon dioxide oxygen burying layer (32) is 2-3 mu m.
CN202210637947.8A 2022-06-08 2022-06-08 Phased array radar system based on phase change material photoswitch Pending CN114721089A (en)

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