CN114716153B - Anti-reflection anti-dazzle coated glass - Google Patents
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- CN114716153B CN114716153B CN202210394247.0A CN202210394247A CN114716153B CN 114716153 B CN114716153 B CN 114716153B CN 202210394247 A CN202210394247 A CN 202210394247A CN 114716153 B CN114716153 B CN 114716153B
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- C03—GLASS; MINERAL OR SLAG WOOL
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- C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
- C03C17/007—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character containing a dispersed phase, e.g. particles, fibres or flakes, in a continuous phase
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
- C03C17/008—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character comprising a mixture of materials covered by two or more of the groups C03C17/02, C03C17/06, C03C17/22 and C03C17/28
- C03C17/009—Mixtures of organic and inorganic materials, e.g. ormosils and ormocers
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
- C23C18/1208—Oxides, e.g. ceramics
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1229—Composition of the substrate
- C23C18/1245—Inorganic substrates other than metallic
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1254—Sol or sol-gel processing
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/52—PV systems with concentrators
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Abstract
The invention relates to anti-reflection anti-dazzle coated glass, which comprises a coating layer on a glass substrate, wherein the coating layer also comprises uniformly dispersed inorganic nano particles, and the inorganic nano particles are composed of large-particle nano silicon dioxide particles and small-particle nano silicon dioxide particles and are uniformly dispersed in the coating layer; the average particle size of the large-particle nano-silica particles is larger than 100nm, and the average particle size of the small-particle nano-silica particles is smaller than 10nm; the large-particle nano silicon dioxide particles have a hollow-mesoporous pore structure; the film thickness of the film coating layer is smaller than the average particle diameter of the large-particle nano silicon dioxide particles. The glass can obtain high light transmission and reflection preventing effects, anti-glare and reflection preventing effects at the same time by only plating a layer of film.
Description
Technical Field
The invention relates to the technical field of glass coating, in particular to anti-reflection anti-dazzle coated glass.
Background
Among light rays entering human eyes, blue light and ultraviolet light are largely damaged, and are one of the main causes of glare, so anti-glare (AG) glass has been produced. AG glass is a glass that can reduce light pollution, and it is mainly used to reduce or eliminate the influence of flare, halation, etc. caused by specular reflection of glass by changing the structure of the glass, but at the same time, it is required to ensure high transmittance of the glass. In particular, in the photovoltaic field, in order to maximize the output power of a photovoltaic module, it is necessary to maximize the light transmittance of cover glass and to reduce the light reflectance of the glass surface as much as possible.
Compared with conventional glass, AG glass has no anti-reflection effect, higher haze and lower light transmittance, so that in the display field, the photovoltaic field and the like with higher requirements on light transmittance, conventional operation is to plate an anti-reflection film (AR coating) on the basis of anti-dazzle to ensure the light transmittance so as to meet the product specification requirement, and conventional operation not only increases the technological process but also increases the material cost.
Disclosure of Invention
In order to solve the technical problems of no anti-reflection effect or low light transmittance of the existing anti-dazzle glass, the anti-reflection anti-dazzle coated glass is provided. The glass can obtain high light transmission and reflection preventing effects, anti-glare and reflection preventing effects at the same time by only plating a layer of film.
In order to achieve the above effects, the invention is realized by the following technical scheme:
an anti-reflection anti-dazzle coated glass comprises a coating layer on a glass substrate, wherein the coating layer also comprises uniformly dispersed inorganic nano particles, and the inorganic nano particles are composed of large-particle nano silica particles and small-particle nano silica particles and are uniformly dispersed in the coating layer;
the average particle size of the large-particle nano-silica particles is larger than 100nm, and the average particle size of the small-particle nano-silica particles is smaller than 10nm;
the large-particle nano silicon dioxide particles have a hollow-mesoporous pore structure;
the film thickness of the film coating layer is smaller than the average particle diameter of the large-particle nano silicon dioxide particles.
Further, the refractive index of the coating layer is smaller than 1.5; the average film thickness of the coating layer is 120-140nm; preferably, the large particle nano-silica particles have an average particle diameter of 150 to 180nm.
Still further, the ratio of the large particle nano silicon dioxide particles in the coating layer is 10-30wt%, and the ratio of the small particle nano silicon dioxide particles in the coating layer is 70-90wt%; the large particle nano-silica particles have a porosity of at least 30%.
Still further, the method for forming the coating layer comprises the following steps:
(1) Obtaining a nanoparticle precursor having a mesoporous structure: preparing a nanoparticle precursor with a shell-core structure, wherein a shell layer of the nanoparticle precursor is a nano silicon dioxide coating layer, a core is a hollow pore-forming agent layer, a mesoporous pore-forming agent layer is further arranged on the surface of the core, and the nanoparticle precursor is washed for a plurality of times to remove the mesoporous pore-forming agent so as to obtain the nanoparticle precursor with a mesoporous structure;
(2) And then uniformly dispersing the nanoparticle precursor with the mesoporous structure in a silicon sol solution to form a coating solution, coating the surface of a glass substrate with the coating solution, and curing at a high temperature of 350-500 ℃ to release the space of the core in the nanoparticle precursor, thereby finally obtaining the nanoparticle with the hollow-mesoporous pores and forming a coating layer. In the high temperature curing process, the core of the nanoparticle precursor is thermally degraded, and the internal hollow structure is released to form a hollow-mesoporous pore structure.
Still further, the step (1) further comprises a step of ultrasonic oscillation in the water washing process to accelerate the dissolution speed of the mesoporous agent and rapidly remove the mesoporous agent; the pH value of the coating liquid is 3-5, and the coating liquid needs to be used within 48 hours after being prepared.
Further, the total mass of the inorganic nano particles in the coating liquid in the step (2) accounts for 5-15wt%, and preferably the total mass of the inorganic nano particles accounts for 10wt% of the coating liquid; the content of the nanoparticle precursor with the mesoporous structure in the coating solution is 1-3wt%. Namely, the coating liquid consists of a liquid part and a solid part: the solid part is inorganic nano particles, and comprises nano particle precursors with mesoporous structures (large particle nano silicon dioxide is formed later) and small particle nano silicon dioxide in silica sol, wherein the solution part accounts for 85-95%, the inorganic nano particles account for 5-15wt% in total, and the large particle nano silicon dioxide accounts for 1-3wt% in the inorganic nano particles. The silica with small particles in the coating liquid plays a role of a bonding agent, so that the coating layer has certain rigidity and hardness.
Further, the preparation process of the silicon sol solution comprises the following steps: hydrolysis of tetraethyl orthosilicate takes place in an acid-alcohol system to give a silica sol with an average particle size of 5nm, wherein the mass percent is 100 wt.%: 0.1 to 0.2 weight percent of hydrochloric acid, 3 to 8 weight percent of water, 10 to 30 weight percent of tetraethoxysilane and the balance of absolute ethyl alcohol. The hydrochloric acid used was 36% by weight concentrated hydrochloric acid.
Still further, the preparation of the nanoparticle precursor with a core-shell structure comprises the steps of:
dissolving a water-soluble polymer serving as a hollow pore-forming agent in an ammonia water solution to form a hollow pore-forming agent solution; dropwise adding the hollow pore-forming agent solution into an alcohol solvent under stirring to form a mixed solution with spherical cores, adding a quaternary ammonium salt surfactant into the mixed solution to serve as a mesoporous pore-forming agent, and uniformly stirring and dispersing to form spherical cores with the surface adhered with the quaternary ammonium salt surfactant, thereby forming cores with mesoporous pore-forming agent layers on the surfaces;
then adding tetraethoxysilane into a plurality of batches for hydrolysis reaction, and forming a nano silicon dioxide coating layer on the periphery of the core, thereby obtaining the nano particle precursor with a shell-core structure.
Still further, the water-soluble polymer in step (1) is polyacrylic acid or polymethacrylic acid; the alcohol solvent is absolute ethyl alcohol; the quaternary ammonium salt surfactant is quaternary ammonium salt with carbon chain length of C8-C16, preferably one of cetyl trimethyl ammonium bromide, tetradecyl trimethyl ammonium bromide and dodecyl trimethyl ammonium bromide;
the material accounts for 100 wt%: 0.3 to 0.5 weight percent of water-soluble polymer, 0.5 to 1 weight percent of ammonia water, 0.01 to 0.3 weight percent of quaternary ammonium salt surfactant, 5 to 10 weight percent of tetraethoxysilane and the balance of absolute ethyl alcohol. The ammonia water is concentrated ammonia water with 20-25 wt%.
The beneficial technical effects are as follows: according to the invention, a single inorganic oxide coating layer with uniformly dispersed hollow-mesoporous pore structure nano silicon dioxide particles is coated on the surface of a glass substrate, and the thickness of the coating layer is smaller than or equal to the particle size of the hollow-mesoporous pore structure nano silicon dioxide particles, so that the coated glass has anti-glare and high light transmission and anti-reflection effects; the single-layer coated glass can simultaneously realize the double effects of AG+AR double coatings, and has simple preparation process and lower cost.
Drawings
FIG. 1 is a schematic structural diagram of an anti-reflection and anti-glare coated glass according to the present invention. Wherein 1 is a glass substrate, 2 is large-particle nano silicon dioxide particles, 3 is small-particle nano silicon dioxide particles, and 4-coating layer (the coating layer is formed by 3-small-particle nano silicon dioxide and 2-large-particle nano silicon dioxide together).
Detailed Description
The following description of the embodiments of the present invention will be made clearly and fully with reference to the accompanying drawings, in which it is evident that the embodiments described are only some, but not all embodiments of the invention. The following description of at least one exemplary embodiment is merely exemplary in nature and is in no way intended to limit the invention, its application, or uses. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
The numerical values set forth in these examples do not limit the scope of the present invention unless specifically stated otherwise. Techniques, methods known to those of ordinary skill in the relevant art may not be discussed in detail, but should be considered part of the specification where appropriate. In all examples shown and discussed herein, any specific values should be construed as merely illustrative, and not a limitation. Thus, other examples of the exemplary embodiments may have different values.
Example 1
Preparation of a nanosilica particle precursor having a core-shell structure: polyacrylic acid (PAA, the material ratio of the reaction system is 0.3-0.5 wt%) with relative molecular mass of 3000-5000 is taken as a hollow pore-forming agent to be dissolved in ammonia water solution (25 wt% of concentrated ammonia water, the material ratio of the reaction system is 0.5-1 wt%) to form a hollow pore-forming agent solution; dropwise adding the hollow pore-forming agent solution into absolute ethyl alcohol under stirring, at the moment, enabling PAA molecules to quickly agglomerate into spherical cores when meeting the absolute ethyl alcohol, controlling the particle size of the spherical cores to be smaller than 150nm (adjusting the dosage proportion of PAA and ammonia water solution and controlling the stirring speed through an optimization test), continuously stirring for 5-10min after the hollow pore-forming agent solution is completely dripped to form a mixed solution with spherical cores, adding cetyl trimethyl ammonium bromide (CTAB, the material ratio in a reaction system is 0.1-05 wt%) into the mixed solution to serve as a mesoporous pore-forming agent, stirring for 10min, and uniformly dispersing to form spherical cores with mesoporous pore-forming agent layers adhered on the surfaces, thereby forming core cores with mesoporous pore-forming agent layers on the surfaces; then adding tetraethoxysilane (TEOS, the material content in the reaction system is 5-10wt%) into 3-5 batches for hydrolysis reaction, the TEOS feeding interval time is 30min, stirring is carried out for 12-15h after the TEOS is completely added, and a nano silicon dioxide coating layer can be formed on the periphery of the core (the coating layer thickness is controlled by optimizing experiment to adjust the batch adding amount and stirring speed of the TEOS) so as to obtain the nano particle precursor with a shell-core structure, and the average particle size is 150-180nm.
The silica sol liquid (used as a coating liquid base liquid) is prepared by catalyzing TEOS hydrolysis with hydrochloric acid: firstly mixing hydrochloric acid aqueous solution into absolute ethyl alcohol, fully stirring, mixing with TEOS (the material in the reaction system is calculated according to 100wt% and the concentrated hydrochloric acid with the concentration of 36wt% accounts for 0.1-0.2wt%, the water accounts for 3-8wt%, the TEOS accounts for 10-30wt% and the rest is the absolute ethyl alcohol) for one time, and stirring for 10 hours to obtain silica sol solution with the average particle size of 5nm, namely the average particle size of nano silicon dioxide in the silica sol is 5nm, so that the small-particle nano silicon dioxide is formed.
Example 2
An anti-reflection anti-glare coated glass has a structure shown in figure 1, and comprises a coated layer 4 on a glass substrate 1, wherein the coated layer 4 comprises uniformly dispersed inorganic nano particles, and the inorganic nano particles consist of large-particle nano silica particles 2 and small-particle nano silica particles 3 and are uniformly dispersed in the coated layer 4;
the average particle size of the large-particle nano silicon dioxide particles 2 is 150-180nm, and the average particle size of the small-particle nano silicon dioxide particles is 5nm;
the large-particle nano silicon dioxide particles 2 have a hollow-mesoporous pore structure;
the large-particle nano-silica particles 2 account for 20wt% of the coating layer, and the small-particle nano-silica particles account for 80wt% of the coating layer.
The preparation method of the coating layer 4 comprises the following steps:
(1) Obtaining a nano silicon dioxide particle precursor with a mesoporous structure: the nanoparticle precursor with the shell-core structure obtained in the embodiment 1 is washed and centrifuged for 4-6 times by a high-speed centrifuge, purified water is used for dilution and redispersion after each centrifugal washing, meanwhile, ultrasonic vibration (the vibration temperature is controlled to be not more than 5 ℃ in the ultrasonic vibration process to prevent nanoparticle agglomeration) is matched for accelerating the dispersion and accelerating the dissolution speed of CTAB, the step can remove a water-soluble mesoporous pore-forming agent CTAB, and the mesoporous silica particle precursor with the mesoporous structure is obtained after the CTAB is washed and removed;
(2) And then uniformly dispersing the nano silicon dioxide particle precursor with the mesoporous structure in the silica sol solution in the embodiment 1 to form a coating solution, wherein the mass percentage of the nano silicon dioxide particle precursor with the mesoporous structure and the silica sol solution in the coating solution is 2 percent to 98 percent, spraying the coating solution on the surface of a glass substrate, curing for 2 hours at 450 ℃, thermally degrading the core PAA in the high-temperature curing process so that the space of the core is released to obtain a hollow structure, and finally forming a coating layer on the surface of the glass substrate while obtaining the large-particle nano silicon dioxide particles with hollow-mesoporous pores.
The average film thickness of the plating layer 4 formed above was 130nm.
Comparative example 1
The comparative example uses a conventional AG coating solution (ZL-816, a product of Dongguan blue boat environmental protection technology Co., ltd.) and forms an AG coating with a thickness of 230nm after spray curing.
Comparative example 2
In the comparative example, an AG coating is formed in comparative example 1, and then an AR coating solution (see an anti-reflection coating solution prepared in example 1 of Chinese patent 202111286680.4, a preparation method of high-quality high-bending-strength double-sided coated glass) is coated, wherein the AG coating layer has a thickness of 150-200nm and the AR coating layer has a thickness of 100-115nm, and the optimal film system design value is selected.
The coated glass obtained above was subjected to tests for optical properties and mechanical properties of the coating, and the results are shown in Table 1.
TABLE 1 optical Properties of the coated glasses of comparative examples 1-3 and examples 2-4 and pencil hardness of the coating
Note that: transmittance is measured in the visible wavelength range, and data for specific transmittance is an average value in the visible range.
As can be seen from table 1, the single-layer coated glass of example 1 has a light transmittance improved by 3% or more than that of the blank glass, and an antiglare effect (haze, glossiness) equivalent to that of the single-layer AG coated glass of comparative example 1, but the single-layer AG coating of comparative example 1 does not have an antireflection effect; the antireflective effect (light transmittance) of example 1 of the present invention can achieve the ag+ar double coating effect of comparative example 2, and both pencil hardness is 3H. The single-layer coated glass can realize AG+AR double effects at the same time, and has simple process and lower cost.
The foregoing is only a preferred embodiment of the present invention, but the scope of the present invention is not limited thereto, and any person skilled in the art, who is within the scope of the present invention, should make equivalent substitutions or modifications according to the technical scheme of the present invention and the inventive concept thereof, and should be covered by the scope of the present invention.
Claims (9)
1. The anti-reflection anti-dazzle coated glass is characterized by comprising a coating layer on a glass substrate, wherein the coating layer also comprises uniformly dispersed inorganic nano particles, and the inorganic nano particles are composed of large-particle nano silica particles and small-particle nano silica particles and are uniformly dispersed in the coating layer;
the average particle size of the large-particle nano-silica particles is larger than 100nm, and the average particle size of the small-particle nano-silica particles is smaller than 10nm;
the large-particle nano silicon dioxide particles have a hollow-mesoporous pore structure;
the film thickness of the film coating layer is smaller than the average particle diameter of the large-particle nano silicon dioxide particles.
2. The anti-reflection and anti-glare coated glass according to claim 1, wherein the refractive index of the coating layer is less than 1.5; the average film thickness of the coating layer is 120-140nm; the average particle size of the large-particle nano silicon dioxide particles is 150-180nm.
3. An antireflective anti-glare coated glass according to claim 1, wherein the large particle nano silica particles are present in the coating in an amount of 10-30wt% and the small particle nano silica particles are present in the coating in an amount of 70-90wt%; the large particle nano-silica particles have a porosity of at least 30%.
4. An anti-reflection and anti-glare coated glass according to any one of claims 1 to 3, wherein the method of forming the coating layer comprises:
(1) Obtaining a nanoparticle precursor having a mesoporous structure: preparing a nanoparticle precursor with a shell-core structure, wherein a shell layer of the nanoparticle precursor is a nano silicon dioxide coating layer, a core is a hollow pore-forming agent layer, a mesoporous pore-forming agent layer is further arranged on the surface of the core, and the nanoparticle precursor is washed for a plurality of times to remove the mesoporous pore-forming agent so as to obtain the nanoparticle precursor with a mesoporous structure;
(2) And then uniformly dispersing the nanoparticle precursor with the mesoporous structure in a silicon sol solution to form a coating solution, coating the surface of a glass substrate with the coating solution, and curing at 350-500 ℃ to release the space of a core in the nanoparticle precursor, thereby finally obtaining the nanoparticle with hollow-mesoporous pores and forming a coating layer.
5. The anti-reflection anti-dazzle coated glass according to claim 4, wherein the step (1) further comprises the step of performing ultrasonic vibration during the water washing process to accelerate the dissolution speed of the mesoporous agent and rapidly remove the mesoporous agent; the pH value of the coating liquid is 3-5, and the coating liquid needs to be used within 48 hours after being prepared.
6. The anti-reflection anti-dazzle coated glass according to claim 4, wherein the total mass ratio of the inorganic nano particles in the coating liquid in the step (2) is 5-15wt%; the content of the nanoparticle precursor with the mesoporous structure in the coating solution is 1-3wt%.
7. The anti-reflection and anti-glare coated glass according to claim 4, wherein the preparation process of the silica sol solution is as follows: hydrolysis of tetraethyl orthosilicate takes place in an acid-alcohol system to give a silica sol with an average particle size of 5nm, wherein the mass percent is 100 wt.%: 0.1 to 0.2 weight percent of hydrochloric acid, 3 to 8 weight percent of water, 10 to 30 weight percent of tetraethoxysilane and the balance of absolute ethyl alcohol.
8. The anti-reflection and anti-glare coated glass according to claim 4, wherein the preparation of the nanoparticle precursor having a core-shell structure comprises the steps of:
dissolving a water-soluble polymer serving as a hollow pore-forming agent in an ammonia water solution to form a hollow pore-forming agent solution; dropwise adding the hollow pore-forming agent solution into an alcohol solvent under stirring to form a mixed solution with spherical cores, adding a quaternary ammonium salt surfactant into the mixed solution to serve as a mesoporous pore-forming agent, and uniformly stirring and dispersing to form spherical cores with the surface adhered with the quaternary ammonium salt surfactant, thereby forming cores with mesoporous pore-forming agent layers on the surfaces;
then adding tetraethoxysilane into a plurality of batches for hydrolysis reaction, and forming a nano silicon dioxide coating layer on the periphery of the core, thereby obtaining the nano particle precursor with a shell-core structure.
9. The anti-reflection and anti-glare coated glass according to claim 8, wherein the water-soluble polymer is polyacrylic acid or polymethacrylic acid; the alcohol solvent is absolute ethyl alcohol; the quaternary ammonium salt surfactant is a C chain length 8 -C 16 Quaternary ammonium salts of (a);
the material accounts for 100 wt%: 0.3 to 0.5 weight percent of water-soluble polymer, 0.5 to 1 weight percent of ammonia water, 0.01 to 0.3 weight percent of quaternary ammonium salt surfactant, 5 to 10 weight percent of tetraethoxysilane and the balance of absolute ethyl alcohol.
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