CN114685058A - Preparation method of glass cover plate, glass cover plate and mobile terminal - Google Patents
Preparation method of glass cover plate, glass cover plate and mobile terminal Download PDFInfo
- Publication number
- CN114685058A CN114685058A CN202210459531.1A CN202210459531A CN114685058A CN 114685058 A CN114685058 A CN 114685058A CN 202210459531 A CN202210459531 A CN 202210459531A CN 114685058 A CN114685058 A CN 114685058A
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- Prior art keywords
- glass substrate
- cover plate
- glass
- coating
- glass cover
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- 239000011521 glass Substances 0.000 title claims abstract description 266
- 238000002360 preparation method Methods 0.000 title abstract description 13
- 239000000758 substrate Substances 0.000 claims abstract description 164
- 238000000576 coating method Methods 0.000 claims abstract description 103
- 239000011248 coating agent Substances 0.000 claims abstract description 102
- 239000000463 material Substances 0.000 claims abstract description 99
- 238000005520 cutting process Methods 0.000 claims abstract description 47
- 239000007888 film coating Substances 0.000 claims abstract description 37
- 238000009501 film coating Methods 0.000 claims abstract description 37
- 238000000034 method Methods 0.000 claims abstract description 21
- 239000000126 substance Substances 0.000 claims abstract description 19
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 56
- 239000010432 diamond Substances 0.000 claims description 40
- 229910003460 diamond Inorganic materials 0.000 claims description 40
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 39
- 238000001816 cooling Methods 0.000 claims description 36
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims description 33
- 239000000377 silicon dioxide Substances 0.000 claims description 28
- 235000012239 silicon dioxide Nutrition 0.000 claims description 28
- 239000000110 cooling liquid Substances 0.000 claims description 26
- FPGGTKZVZWFYPV-UHFFFAOYSA-M tetrabutylammonium fluoride Chemical compound [F-].CCCC[N+](CCCC)(CCCC)CCCC FPGGTKZVZWFYPV-UHFFFAOYSA-M 0.000 claims description 26
- 230000001681 protective effect Effects 0.000 claims description 25
- 239000002904 solvent Substances 0.000 claims description 25
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 claims description 24
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 22
- 238000005530 etching Methods 0.000 claims description 21
- 239000003795 chemical substances by application Substances 0.000 claims description 20
- 239000012752 auxiliary agent Substances 0.000 claims description 17
- 239000004372 Polyvinyl alcohol Substances 0.000 claims description 13
- 229920002451 polyvinyl alcohol Polymers 0.000 claims description 13
- 239000007822 coupling agent Substances 0.000 claims description 11
- MGFYIUFZLHCRTH-UHFFFAOYSA-N nitrilotriacetic acid Chemical compound OC(=O)CN(CC(O)=O)CC(O)=O MGFYIUFZLHCRTH-UHFFFAOYSA-N 0.000 claims description 11
- 238000005507 spraying Methods 0.000 claims description 11
- 238000004519 manufacturing process Methods 0.000 claims description 10
- 229920003217 poly(methylsilsesquioxane) Polymers 0.000 claims description 10
- 239000003153 chemical reaction reagent Substances 0.000 claims description 9
- 239000000498 cooling water Substances 0.000 claims description 9
- 235000006408 oxalic acid Nutrition 0.000 claims description 8
- 239000003223 protective agent Substances 0.000 claims description 7
- 229920001225 polyester resin Polymers 0.000 claims description 5
- 239000004645 polyester resin Substances 0.000 claims description 5
- 239000003921 oil Substances 0.000 claims description 3
- 239000002173 cutting fluid Substances 0.000 claims description 2
- 230000032683 aging Effects 0.000 abstract description 5
- 238000004880 explosion Methods 0.000 abstract description 2
- 238000004140 cleaning Methods 0.000 description 65
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 60
- 229910052786 argon Inorganic materials 0.000 description 30
- 238000000151 deposition Methods 0.000 description 24
- 238000001771 vacuum deposition Methods 0.000 description 24
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 21
- 238000002156 mixing Methods 0.000 description 21
- 230000008021 deposition Effects 0.000 description 18
- 239000000203 mixture Substances 0.000 description 16
- 238000003698 laser cutting Methods 0.000 description 15
- 239000012459 cleaning agent Substances 0.000 description 13
- 239000013078 crystal Substances 0.000 description 12
- 238000012360 testing method Methods 0.000 description 9
- 238000005452 bending Methods 0.000 description 8
- 229920000180 alkyd Polymers 0.000 description 7
- 239000002518 antifoaming agent Substances 0.000 description 7
- 230000007547 defect Effects 0.000 description 7
- 150000002148 esters Chemical class 0.000 description 7
- 239000007788 liquid Substances 0.000 description 7
- 230000008569 process Effects 0.000 description 7
- 238000005260 corrosion Methods 0.000 description 6
- 238000007639 printing Methods 0.000 description 6
- 239000002893 slag Substances 0.000 description 6
- 238000009504 vacuum film coating Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- 239000006227 byproduct Substances 0.000 description 4
- 230000035882 stress Effects 0.000 description 3
- 238000002834 transmittance Methods 0.000 description 3
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 230000003139 buffering effect Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 150000007522 mineralic acids Chemical class 0.000 description 2
- 150000007524 organic acids Chemical class 0.000 description 2
- 229920000620 organic polymer Polymers 0.000 description 2
- 230000036632 reaction speed Effects 0.000 description 2
- 238000006748 scratching Methods 0.000 description 2
- 230000002393 scratching effect Effects 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 150000005846 sugar alcohols Polymers 0.000 description 2
- 241000251468 Actinopterygii Species 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical group [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- 239000012190 activator Substances 0.000 description 1
- 239000013543 active substance Substances 0.000 description 1
- -1 alcohol fatty acid amine Chemical class 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 239000013556 antirust agent Substances 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 239000012761 high-performance material Substances 0.000 description 1
- 238000009863 impact test Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 229940051841 polyoxyethylene ether Drugs 0.000 description 1
- 229920000056 polyoxyethylene ether Polymers 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- 230000003678 scratch resistant effect Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 239000001509 sodium citrate Substances 0.000 description 1
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 238000005496 tempering Methods 0.000 description 1
- NKLYMYLJOXIVFB-UHFFFAOYSA-N triethoxymethylsilane Chemical compound CCOC([SiH3])(OCC)OCC NKLYMYLJOXIVFB-UHFFFAOYSA-N 0.000 description 1
- 238000004383 yellowing Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3441—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising carbon, a carbide or oxycarbide
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K13/00—Etching, surface-brightening or pickling compositions
- C09K13/04—Etching, surface-brightening or pickling compositions containing an inorganic acid
- C09K13/06—Etching, surface-brightening or pickling compositions containing an inorganic acid with organic material
Abstract
The invention belongs to the technical field of electronic devices, and particularly relates to a preparation method of a glass cover plate, the glass cover plate and a mobile terminal, wherein the method comprises the following steps: cutting the glass substrate to obtain a cut glass substrate; carrying out chemical thinning treatment on the cut glass base material to obtain a thinned glass base material; performing film coating treatment on the thinned glass substrate to obtain a film-coated glass substrate; and coating the coated glass substrate to obtain the glass cover plate. The method can prepare the arbitrarily-folded ultrathin flexible glass cover plate product with high toughness, explosion resistance, scratch resistance, aging resistance, high hardness and no crease, and the glass cover plate prepared by the method can be matched with folding screen mobile phones of various manufacturers for application, thereby having wide market prospect.
Description
Technical Field
The invention belongs to the technical field of electronic devices, and particularly relates to a preparation method of a glass cover plate, the glass cover plate and a mobile terminal.
Background
The screen protection apron of present folding screen cell-phone is mostly organic polymer CPI material rather than glass, has very serious defect in the CPI material uses: 1. the screen has low hardness, and the screen sensitivity is poor due to the fact that T% transmittance of the CPI material is attenuated when the scratch is very easy to occur along with the change of the use period; 2. the CPI organic polymer material is easy to crease and even crack after being repeatedly folded for many times during use, so that the screen cannot be used. Therefore, a high-performance material capable of replacing a CPI material is urgently needed to be developed, and although the conventional common glass cover plate has the characteristics of high strength, difficulty in scratching, no mechanical fatigue and screen splash and the like, the conventional glass cover plate has the characteristics of high brittleness and thickness and incapability of realizing random folding at all.
Disclosure of Invention
The invention aims to overcome the defects in the prior art and provides a preparation method of a glass cover plate, the glass cover plate and a mobile terminal.
In order to achieve the purpose, the invention adopts the following technical scheme:
in a first aspect, the present invention provides a method for manufacturing a glass cover plate, comprising:
cutting the glass substrate to obtain a cut glass substrate;
carrying out chemical thinning treatment on the cut glass base material to obtain a thinned glass base material;
performing film coating treatment on the thinned glass substrate to obtain a film-coated glass substrate;
and coating the coated glass substrate to obtain the glass cover plate.
In one embodiment, the cutting the glass substrate to obtain a cut glass substrate includes:
spraying a protective reagent on the glass substrate;
and placing the glass substrate sprayed with the protective reagent in a cooling solution for cutting to obtain the cut glass substrate.
In one embodiment, the protective agent comprises an ultraviolet light protective oil;
and/or the cooling solution consists of cooling liquid and water, wherein the cooling liquid is cutting fluid.
In one embodiment, the chemically thinning the cut glass substrate to obtain a thinned glass substrate includes:
putting the cut glass base material into a thinning machine, and chemically thinning the cut glass base material by adopting a thinning etching agent;
and when the thickness of the cut glass substrate reaches the target glass thickness, finishing the chemical thinning treatment to obtain the thinned glass substrate.
In one embodiment, the thinning etchant is prepared from tetrabutylammonium fluoride, citric acid, sulfuric acid, oxalic acid, nitrilotriacetic acid, polyvinyl alcohol and water according to the mass ratio of 16-28:6-18:6-18:3-9:0.5-3.5:1-2: 30.5-58.5;
and/or, the target glass thickness comprises 25um ± 5 um.
In one embodiment, the coating treatment of the thinned glass substrate to obtain a coated glass substrate includes:
carrying out first film coating treatment on the thinned glass base material by adopting a first film coating material, and finishing the first film coating treatment after the thickness of a first film layer is reached;
and carrying out second coating treatment on the glass substrate subjected to the first coating treatment by using a second coating material, and finishing the second coating treatment after the thickness of a second film layer is reached to obtain the coated glass substrate.
In one embodiment, the first coating material comprises diamond;
and/or the second coating material comprises silicon dioxide;
and/or the first film layer thickness comprises 300 ± 30 nm;
and/or the second film layer thickness comprises 200 ± 20 nm.
In one embodiment, the coating treatment of the coated glass substrate to obtain the glass cover plate includes:
uniformly coating the coated glass substrate by using a coating material, and finishing the coating treatment after the thickness of a coating film layer is reached to obtain the glass cover plate;
wherein, the thickness of the coating film layer comprises 3-5um, and the coating material is prepared from polyester resin, a coupling agent, a solvent, an auxiliary agent and macromolecular glass resin according to the weight ratio of 13-17:0.3-0.7:25-35: 1-4: 60-65 in mass ratio.
In a second aspect, the present invention provides a glass cover plate, which is prepared by the above-mentioned preparation method.
In a third aspect, the present invention provides a mobile terminal comprising the glass cover plate described above.
Compared with the prior art, the invention has the advantages that:
1. according to the invention, the glass substrate is subjected to cutting, chemical thinning treatment, coating treatment and coating treatment, so that the arbitrarily-folded ultrathin flexible glass cover plate with high toughness, explosion resistance, scratch resistance, ageing resistance, high hardness and no crease can be prepared, wherein the Ultraviolet (UV) resistance and ageing resistance of the glass cover plate are realized by spraying the glass substrate with a protective reagent; the flexible folding function of the glass cover plate is realized by adopting a chemical thinning technology; the glass substrate is coated with diamond and silicon dioxide, so that the glass cover plate is explosion-proof, scratch-resistant and high in hardness; the high toughness and the crease resistance of the glass cover plate are realized through coating treatment.
2. According to the invention, the glass substrate sprayed with the protective reagent is placed in the cooling solution for cutting, so that the secondary damage of the glass substrate can be prevented.
3. The thinning etchant is prepared from tetrabutylammonium fluoride, citric acid, sulfuric acid, nitrilotriacetic acid, polyvinyl alcohol and pure water according to a corresponding weight ratio. The glass can be ionized to form F in water-Simultaneously provide H+The organic acid and the inorganic acid of (2) make it have an etching effect; the tetrabutylammonium fluoride is not completely ionized, and is continuously ionized along with the reaction, so that the buffering effect is achieved, the etching rate temperature and the safe and reliable manufacturing process are ensured, meanwhile, the solvent belongs to weak acid, the reaction speed can be reduced, the etching and thinning requirements can be met, and the influence on the performance of the glass substrate due to the overhigh etching speed can be avoided; the polyvinyl alcohol activator can solve the problem that the prepared by-product is difficult to dissolve, avoid the by-product from attaching to the surface of the glass substrate,therefore, the thinning etching agent prepared by the invention can improve the thinning effect of products.
4. The glass cover plate prepared by the invention can be perfectly embodied on the electronic cover plate, so that the glass cover plate can be matched with the folding screen mobile phones of various manufacturers for application, and has wide market prospect.
Detailed Description
In order to make the technical problems, technical solutions and advantageous effects to be solved by the present invention more clearly apparent, the present invention is further described in detail below with reference to the following embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention.
In one aspect, the present invention provides a method for manufacturing a glass cover plate, comprising:
step S10, cutting the glass substrate to obtain a cut glass substrate;
step S20, carrying out chemical thinning treatment on the cut glass base material to obtain a thinned glass base material;
step S30, performing film coating treatment on the thinned glass substrate to obtain a film-coated glass substrate;
and step S40, coating the coated glass substrate to obtain the glass cover plate.
Further, in step S10, the specification of the glass substrate includes L × W × T = (800-.
Further, step S10 includes spraying the glass substrate with a protective agent; and placing the glass substrate sprayed with the protective reagent in a cooling solution for cutting to obtain the cut glass substrate. Specifically, the protective agent may be sprayed on the surface to be cut of the glass substrate, or may be sprayed on all surfaces of the glass substrate. The glass substrate can be prevented from secondary scratching in the processing of the glass substrate by spraying the protective agent. The protective agent includes, but is not limited to, an Ultraviolet (UV) protective oil, such as a UV lamp curable protective ink.
Further, step S20 is to cut the glass substrate sprayed with the protective agent in a cooling solution, and includes: placing the glass substrate sprayed with the protective reagent in a laser cutting machine with a cooling solution tank, performing water-cooling laser cutting on the glass substrate sprayed with the protective reagent by using a cooling solution, specifically, cutting the glass substrate into the specification of 160.40 × 72.16mm or 320.80 × 144.32mm, and stopping cutting, wherein the cooling solution consists of cooling liquid and water, the concentration ratio of the cooling liquid to the water is 2% -6%, for example, 2%, 3%, 4%, 5%, and the like, specifically, the cooling liquid can be cutting liquid, and the cooling liquid can also be a mixture obtained by mixing polyhydric alcohol, polyoxyethylene ether, an antirust agent, high-molecular nano alcohol fatty acid amine and water according to the mass ratio of 10:6.4:15:13:55, wherein the polyhydric alcohol can play a role in wrapping and precipitating cut impurities; more specifically, the rust inhibitors were phosphoric acid and sodium citrate in accordance with 230: 60 mass ratio of the mixture. The purpose of cutting the glass substrate in the laser cutting machine with the cooling solution tank is to ensure that the secondary damage of the glass substrate is reduced to be free of defects, specifically, edge breakage zero defect, scratch zero defect, edge burning zero defect and microcrack zero defect.
Further, the chemical thinning treatment is performed on the cut glass base material to obtain a thinned glass base material, and the chemical thinning treatment comprises the following steps: putting the cut glass base material into a thinning machine, and chemically thinning the cut glass base material by adopting a thinning etching agent; and when the thickness of the cut glass substrate reaches the target glass thickness, finishing the chemical thinning treatment to obtain the thinned glass substrate. Specifically, will glass substrate after the cutting is put into the attenuate machine to adopt the attenuate etchant to right glass substrate after the cutting carries out chemical thinning processing and includes: the cut glass substrate is placed into a thinning machine for thinning treatment, wherein each thinning treatment comprises the steps of firstly thinning by using a thinning etching agent, carrying out primary cleaning by using pure water after thinning, carrying out secondary cleaning by using a cleaning agent after the primary cleaning, and carrying out cleaning by using the pure water after the secondary cleaning; the target glass thickness includes 25um + -5um, which may be 25um, 24um, 26um, 28um, etc., for example.
Further, it is characterized byThe thinning etchant is prepared from tetrabutylammonium fluoride, citric acid, sulfuric acid, nitrilotriacetic acid, polyvinyl alcohol and pure water according to the mass ratio of 16-28:6-18:6-18:3-9:0.5-3.5:1-2:30.5-58.5, wherein the mass ratio of tetrabutylammonium fluoride, citric acid, sulfuric acid, nitrilotriacetic acid, polyvinyl alcohol and pure water in the thinning etchant comprises 22:12:12:6:2:1.5: 44.5. The glass can be ionized to form F in water-Simultaneously provide H+The organic acid and the inorganic acid make the etching effect; the tetrabutylammonium fluoride is not completely ionized, and is continuously ionized along with the reaction, so that the buffering effect is achieved, the etching rate temperature and the safe and reliable manufacturing process are ensured, meanwhile, the solvent belongs to weak acid, the reaction speed can be reduced, the etching and thinning requirements can be met, and the influence on the performance of the glass substrate due to the overhigh etching speed can be avoided; the polyvinyl alcohol active agent can solve the problem that the prepared by-product is difficult to dissolve, and the by-product is prevented from being attached to the surface of the glass substrate, so that the thinning effect of the product can be improved by the thinning etching agent prepared by the invention.
Further, step S30 is to perform a plating process on the thinned glass substrate to obtain a plated glass substrate, including: carrying out first film coating treatment on the thinned glass base material by adopting a first film coating material, and finishing the first film coating treatment after the thickness of a first film layer is reached; adopt the second coating material to carry out the second coating film to the glass substrate after first coating film is handled, reach second rete thickness after, accomplish the second coating film is handled, obtains the glass substrate after the coating film, and coating film back glass substrate hardness can reach more than 8H, and has explosion-proof and highly resistance fish tail's characteristic, still satisfies wear-resisting characteristic simultaneously, adopts German rubber pressure 1KG, 60 rings/min, and the stroke 40mm makes a round trip to rub 3000 times and does not have unusually, has better wear resistance.
Further, the first coating material comprises diamond;
further, the first coating material includes silicon dioxide;
further, the first film thickness includes 300 ± 10nm, for example, 290nm, 300nm, 310nm, etc.;
the second film layer may have a thickness of 200 ± 5nm, such as 195nm, 200nm, 205nm, and the like.
Further, the mass purity of both the first coating material and the second coating material is equal to or greater than 99%, and may be, for example, 99.1%, 99.5%, 99.99%, 99.991%, 99.993%, 99.994%, and the like.
Further, step S40 is to perform a coating process on the coated glass substrate to obtain the glass cover plate, including: uniformly coating the coated glass substrate by using a coating material, and finishing the coating treatment after the thickness of a coating film layer is reached to obtain the glass cover plate; wherein, the thickness of the coating film layer comprises 3-5um, such as 3um, 4um, 5um, etc.; the coating material is prepared from polyester resin, a coupling agent, a solvent, an auxiliary agent and high-molecular glass resin according to the weight ratio of 13-17:0.3-0.7:25-35: 1-4: 60-65, preferably, the coating material can be polyester resin, coupling agent, solvent, auxiliary agent and macromolecular glass resin according to a mass ratio of 15:0.5:30: 2: 62.5, and more specifically, the polyester resin is oil-free alkyd resin which has better hardness and toughness; the coupling agent is a silane surfactant, such as vinyltrimethoxysilane and triethoxymethylsilane; the solvent is a mixture obtained by mixing benzene and ester according to the mass ratio of 65: 35; the auxiliary agent is a mixture obtained by mixing a leveling agent and a defoaming agent according to a mass ratio of 75:25, and the glass cover plate obtained by uniformly coating the coated glass substrate with the coating material has high bending, high toughness and high anti-mark performance.
In another aspect, the invention further provides a glass cover plate, and the glass cover plate is prepared by the preparation method.
In another aspect, the invention further provides a mobile terminal, which comprises the glass cover plate.
The glass cover plate prepared by the method has the following performance parameters (all tested by adopting a conventional performance testing method):
1. transmittance (T%): the visible light transmittance at 550nm is more than 93 percent; 2. practical characteristics: high hardness (Mohs hardness of more than 8H), scratch resistance (pencil test of more than 9H), no crease, high toughness (90-degree bending cycle test of 20 ten thousand times) and UV aging resistance (UV ring test of 1 week without yellowing); 3. performance characteristics: ultrathin, random bending, UV aging resistance and high wear resistance; 4. bending property: the bending property is good, the folding is arbitrary, and the bending is carried out at 90 degrees; 5. touch feeling: the hand feeling is smooth; 6. the environment test performance is as follows: (1) the appearance is not abnormal and has chemical resistance after 3 days of high temperature and high humidity; (2) the toughening performance is as follows: the tempering strength, the surface stress CS is more than or equal to 750-850MPa, the stress depth DOL is 6-12um, the central stress value/key rupture parameter CT is less than or equal to 35MPa, and the glass product is smooth in self position; (3) reliability: the photoelastic coefficient is 27.2 nm/cm/Mpa; (4) a refractive index of 1.52; (5) steel ball impact test: the 65g steel ball falls freely at the height of 15cm, and the glass product is evenly impacted at 9 positions of the grid for 3 times without breaking; (6) the Mohs hardness test requirement is more than or equal to 8H/750 g; 7. bending times: testing parameters: testing at 90 degrees for 20 ten thousand times according to 2 seconds per bending cycle; 8. product life: 5-6 years; 9. thickness: 35um + -5 um.
The invention is described in further detail with reference to a part of the test results, which are described in detail below with reference to specific examples.
Example 1
A preparation method of a glass cover plate comprises the following steps:
selecting a glass substrate with the specification of L W T = 800W 800 0.06mm, wherein the surface of the glass substrate is clean and has no finger print, no glass slag and no dirt; the appearance is not scratched, is not broken at the edge and is not cracked;
step two, spraying UV lamp curing type protective printing ink on two sides of the glass substrate;
cutting the glass substrate sprayed with the UV lamp curing type protective ink in a laser cutting machine with a cooling solution tank, cutting the glass substrate into 160.40 × 72.16mm specifications, and stopping cutting, wherein the cooling solution tank is filled with a cooling solution, the cooling solution consists of cooling liquid and water, the concentration ratio of the cooling liquid to the water is 2%, and the cooling liquid is cutting liquid;
step four, sequentially adding tetrabutylammonium fluoride, citric acid, sulfuric acid, oxalic acid, nitrilotriacetic acid, polyvinyl alcohol and pure water into a chemical solvent barrel according to the weight ratio of 22:12:12:6:2:1.5:44.5, and uniformly mixing to prepare the thinning etchant;
step five, cleaning the glass substrate subjected to laser cutting by using an automatic cleaning machine after being inserted into an anti-corrosion cleaning frame, after cleaning, putting the glass substrate into a full-automatic ultrasonic thinning machine for thinning treatment, keeping the temperature at 23 ℃ in the whole thinning treatment process, thinning by using a thinning etching agent for 8min and then cleaning by using pure water for 5min during thinning treatment, cleaning by using a cleaning agent for 3min after cleaning by using the pure water, cleaning by using the cleaning agent for 5min after cleaning by using the pure water, circulating the thinning treatment step, and stopping thinning treatment when the thickness of the glass substrate subjected to cutting is 25 mu m;
step six, the thinned glass substrate is placed on an umbrella of a vacuum coating machine in order, vacuumizing is carried out after a cavity door is closed, when the pressure in a cavity of the vacuum coating machine reaches 5.0 x 100000, argon is introduced into the cavity of the vacuum coating machine after the temperature of the cavity of the vacuum coating machine is kept at 135 ℃, the flow of argon is controlled to be 400S/ccm, a pulse direct-current power supply is started, the power of the pulse direct-current power supply is controlled to be 4.5KW, argon plasma is generated, the surface of the thinned glass substrate is cleaned for 5min by the argon plasma, after cleaning is finished, a diamond film material and a silicon dioxide crystal film material are adopted for coating, the purities of the diamond film material and the silicon dioxide crystal film material are both 99.99%, the original vacuum is required to be kept during deposition coating, the coating temperature is kept at 160 ℃, a crucible emission power supply is started during deposition coating, the pulse direct-current with the power supply of 4.5 is started, the diamond film material is firstly emitted, and the diamond film material is generated, and the plasma is generated on the surface of the thinned glass substrate for surface deposition When the thickness of the diamond film layer is 300nm, finishing a first film coating treatment, emitting a silicon dioxide film material to generate film material plasma to continue depositing on the surface of the diamond film layer after the first film coating treatment is finished, finishing a second film coating treatment when the thickness of the silicon dioxide film layer is 200nm, closing a crucible emission power supply and stopping introducing argon after the second film coating treatment is finished, closing a vacuum valve when the temperature in the cavity of the vacuum film coating machine is reduced to 60 ℃, opening a cavity door, and taking out the coated glass substrate;
and seventhly, coating the coated glass substrate by using a full-automatic coating machine, wherein the coating material is oil-free alkyd resin, a coupling agent, a solvent, an auxiliary agent and high-molecular glass resin according to a ratio of 15:0.5:30: 2: and 62.5, wherein the solvent is a mixture obtained by mixing benzene and ester according to a mass ratio of 65:35, the auxiliary agent is a mixture obtained by mixing a leveling agent and an antifoaming agent according to a mass ratio of 75:25, and when the thickness of the film layer is 5um, the coating is stopped to obtain a finished glass cover plate.
Example 2
A preparation method of a glass cover plate comprises the following steps:
selecting a glass substrate with the specification of L W T = 1300W 0.08mm, wherein the surface of the glass substrate is clean and has no finger print, glass slag and dirt; the appearance is not scratched, is not broken at the edge and is not cracked;
step two, spraying UV lamp curing type protective printing ink on the two sides of the glass substrate;
cutting the glass substrate sprayed with the UV lamp curing type protective ink in a laser cutting machine with a cooling solution tank, cutting the glass substrate into 160.40 × 72.16mm specifications, and stopping cutting, wherein the cooling solution tank is filled with a cooling solution, the cooling solution consists of cooling liquid and water, the concentration ratio of the cooling liquid to the water is 6%, and the cooling liquid is cutting liquid;
step four, sequentially adding tetrabutylammonium fluoride, citric acid, sulfuric acid, oxalic acid, nitrilotriacetic acid, polyvinyl alcohol and pure water into a chemical solvent barrel according to the weight ratio of 22.25:12.12:12:5.99:1.98:1.5:44.9, and uniformly mixing to prepare the thinning etchant;
step five, cleaning the glass substrate subjected to laser cutting by using an automatic cleaning machine after being inserted into an anti-corrosion cleaning frame, after cleaning, putting the glass substrate into a full-automatic ultrasonic thinning machine for thinning treatment, keeping the temperature at 23 ℃ in the whole thinning treatment process, thinning by using a thinning etching agent for 8min and then cleaning by using pure water for 5min during thinning treatment, cleaning by using a cleaning agent for 3min after cleaning by using the pure water, cleaning by using the cleaning agent for 5min after cleaning by using the pure water, circulating the thinning treatment step, and stopping thinning treatment when the thickness of the glass substrate subjected to cutting is 25 mu m;
step six, the thinned glass substrate is placed on an umbrella of a vacuum coating machine in order, vacuumizing is carried out after a cavity door is closed, when the pressure in a cavity of the vacuum coating machine reaches 5.0 x 100000, argon is introduced into the cavity of the vacuum coating machine after the temperature of the cavity of the vacuum coating machine is kept at 135 ℃, the flow of argon is controlled to be 400S/ccm, a pulse direct-current power supply is started, the power of the pulse direct-current power supply is controlled to be 4.5KW, argon plasma is generated, the surface of the thinned glass substrate is cleaned for 5min by the argon plasma, after cleaning is finished, a diamond film material and a silicon dioxide crystal film material are adopted for coating, the purities of the diamond film material and the silicon dioxide crystal film material are both 99.99%, the original vacuum is required to be kept during deposition coating, the coating temperature is kept at 160 ℃, a crucible emission power supply is started during deposition coating, the pulse direct-current with the power supply of 4.5 is started, the diamond film material is firstly emitted, and the diamond film material is generated, and the plasma is generated on the surface of the thinned glass substrate for surface deposition When the thickness of the diamond film layer is 310nm, finishing a first film coating treatment, emitting a silicon dioxide film material to generate film material plasma to continue depositing on the surface of the diamond film layer after the first film coating treatment is finished, finishing a second film coating treatment when the thickness of the silicon dioxide film layer is 205nm, closing a crucible emission power supply and stopping introducing argon after the second film coating treatment is finished, closing a vacuum valve when the temperature in the cavity of the vacuum film coating machine is reduced to 60 ℃, opening a cavity door, and taking out the coated glass substrate;
and seventhly, coating the coated glass substrate by using a full-automatic coating machine, wherein the coating material is oil-free alkyd resin, a coupling agent, a solvent, an auxiliary agent and high-molecular glass resin according to a ratio of 15:0.5:30: 2: and 62.5, wherein the solvent is a mixture obtained by mixing benzene and ester according to a mass ratio of 65:35, the auxiliary agent is a mixture obtained by mixing a leveling agent and an antifoaming agent according to a mass ratio of 75:25, and when the thickness of the film layer is 5um, the coating is stopped to obtain a finished glass cover plate.
Example 3
A preparation method of a glass cover plate comprises the following steps:
selecting a glass substrate with the specification of L W T = 1000T 900 0.07mm, wherein the surface of the glass substrate is clean and has no finger print, no glass slag and no dirt; the appearance is not scratched, is not broken at the edge and is not cracked;
step two, spraying UV lamp curing type protective printing ink on two sides of the glass substrate;
cutting the glass substrate of the UV lamp curing type protective ink in a laser cutting machine with a cooling solution tank, cutting the glass substrate into 320.80 × 144.32mm specifications, and stopping cutting, wherein the cooling solution tank is filled with a cooling solution, the cooling solution consists of cooling liquid and water, the concentration ratio of the cooling liquid to the water is 4%, and the cooling liquid is cutting liquid;
step four, sequentially adding tetrabutylammonium fluoride, citric acid, sulfuric acid, oxalic acid, nitrilotriacetic acid, polyvinyl alcohol and pure water into a chemical solvent barrel according to the weight ratio of 22.22:12.11:11.89:6.05:2.01:1.5:45.02, and uniformly mixing to prepare the thinning etchant;
step five, cleaning the glass substrate subjected to laser cutting by using an automatic cleaning machine after being inserted into an anti-corrosion cleaning frame, after cleaning, putting the glass substrate into a full-automatic ultrasonic thinning machine for thinning treatment, keeping the temperature at 23 ℃ in the whole thinning treatment process, thinning by using a thinning etching agent for 8min and then cleaning by using pure water for 5min during thinning treatment, cleaning by using a cleaning agent for 3min after cleaning by using the pure water, cleaning by using the cleaning agent for 5min after cleaning by using the pure water, circulating the thinning treatment step, and stopping thinning treatment when the thickness of the glass substrate subjected to cutting is 25 mu m;
step six, the thinned glass substrate is placed on an umbrella of a vacuum coating machine in order, vacuumizing is carried out after a cavity door is closed, when the pressure in a cavity of the vacuum coating machine reaches 5.0 x 100000, argon is introduced into the cavity of the vacuum coating machine after the temperature of the cavity of the vacuum coating machine is kept at 135 ℃, the flow of argon is controlled to be 400S/ccm, a pulse direct-current power supply is started, the power of the pulse direct-current power supply is controlled to be 4.5KW, argon plasma is generated, the surface of the thinned glass substrate is cleaned for 5min by the argon plasma, after cleaning is finished, a diamond film material and a silicon dioxide crystal film material are adopted for coating, the purities of the diamond film material and the silicon dioxide crystal film material are both 99.99%, the original vacuum is required to be kept during deposition coating, the coating temperature is kept at 160 ℃, a crucible emission power supply is started during deposition coating, the pulse direct-current with the power supply of 4.5 is started, the diamond film material is firstly emitted, and the diamond film material is generated, and the plasma is generated on the surface of the thinned glass substrate for surface deposition When the thickness of the diamond film layer is 290nm, finishing a first film coating treatment, then emitting a silicon dioxide film material to generate film material plasma to continue depositing on the surface of the diamond film layer after the first film coating treatment is finished, finishing a second film coating treatment when the thickness of the silicon dioxide film layer is 195nm, closing a crucible emission power supply and stopping introducing argon after the second film coating treatment is finished, closing a vacuum valve when the temperature in the cavity of the vacuum film coating machine is reduced to 60 ℃, opening a cavity door, and then taking out the coated glass substrate;
and seventhly, coating the coated glass substrate by using a full-automatic coating machine, wherein the coating material is oil-free alkyd resin, a coupling agent, a solvent, an auxiliary agent and high-molecular glass resin according to a ratio of 15:0.5:30: 2: and 62.5, wherein the solvent is a mixture obtained by mixing benzene and ester according to a mass ratio of 65:35, the auxiliary agent is a mixture obtained by mixing a leveling agent and an antifoaming agent according to a mass ratio of 75:25, and when the thickness of the film layer is 3um, the coating is stopped to obtain a finished glass cover plate.
Example 4
A preparation method of a glass cover plate comprises the following steps:
selecting a glass substrate with the specification of L W T = 1200T 1000 0.07mm, wherein the surface of the glass substrate is clean and has no finger print, no glass slag and no dirt; the appearance is not scratched, is not broken at the edge and is not cracked;
step two, spraying UV lamp curing type protective printing ink on two sides of the glass substrate;
cutting the glass substrate of the UV lamp curing type protective ink in a laser cutting machine with a cooling solution tank, cutting the glass substrate into 160.40 × 72.16mm specifications, and stopping cutting, wherein the cooling solution tank is filled with a cooling solution, the cooling solution consists of cooling liquid and water, the concentration ratio of the cooling liquid to the water is 2%, and the cooling liquid is cutting liquid;
step four, sequentially adding tetrabutylammonium fluoride, citric acid, sulfuric acid, oxalic acid, nitrilotriacetic acid, polyvinyl alcohol and pure water into a chemical solvent barrel according to the weight ratio of 21.81:11.92:11.96:6.06:2:1.51:44.87, and uniformly mixing to prepare a thinning etching agent;
step five, cleaning the glass substrate subjected to laser cutting by using an automatic cleaning machine after being inserted into an anti-corrosion cleaning frame, after cleaning, putting the glass substrate into a full-automatic ultrasonic thinning machine for thinning treatment, keeping the temperature at 23 ℃ in the whole thinning treatment process, thinning by using a thinning etching agent for 8min and then cleaning by using pure water for 5min during thinning treatment, cleaning by using a cleaning agent for 3min after cleaning by using the pure water, cleaning by using the cleaning agent for 5min after cleaning by using the pure water, circulating the thinning treatment step, and stopping thinning treatment when the thickness of the glass substrate subjected to cutting is 25 mu m;
step six, the thinned glass substrate is placed on an umbrella of a vacuum coating machine in order, vacuumizing is carried out after a cavity door is closed, when the pressure in a cavity of the vacuum coating machine reaches 5.0 x 100000, argon is introduced into the cavity of the vacuum coating machine after the temperature of the cavity of the vacuum coating machine is kept at 135 ℃, the flow of argon is controlled to be 400S/ccm, a pulse direct-current power supply is started, the power of the pulse direct-current power supply is controlled to be 4.5KW, argon plasma is generated, the surface of the thinned glass substrate is cleaned for 5min by the argon plasma, after cleaning is finished, a diamond film material and a silicon dioxide crystal film material are adopted for coating, the purities of the diamond film material and the silicon dioxide crystal film material are both 99.99%, the original vacuum is required to be kept during deposition coating, the coating temperature is kept at 160 ℃, a crucible emission power supply is started during deposition coating, the pulse direct-current with the power supply of 4.5 is started, the diamond film material is firstly emitted, and the diamond film material is generated, and the plasma is generated on the surface of the thinned glass substrate for surface deposition When the thickness of the diamond film layer is 305nm, finishing a first film coating treatment, then emitting a silicon dioxide film material to generate film material plasma to continue depositing on the surface of the diamond film layer after the first film coating treatment is finished, finishing a second film coating treatment when the thickness of the silicon dioxide film layer is 201nm, closing a crucible emission power supply and stopping introducing argon after the second film coating treatment is finished, closing a vacuum valve when the temperature in the cavity of the vacuum film coating machine is reduced to 50 ℃, opening a cavity door, and then taking out the coated glass substrate;
and seventhly, coating the coated glass substrate by using a full-automatic coating machine, wherein the coating material is oil-free alkyd resin, a coupling agent, a solvent, an auxiliary agent and high-molecular glass resin according to a ratio of 15:0.5:30: 2: and 62.5, wherein the solvent is a mixture obtained by mixing benzene and ester according to a mass ratio of 65:35, the auxiliary agent is a mixture obtained by mixing a leveling agent and an antifoaming agent according to a mass ratio of 75:25, and when the thickness of the film layer is 4 microns, the coating is stopped to obtain a finished glass cover plate.
Example 5
A preparation method of a glass cover plate comprises the following steps:
selecting a glass substrate with the specification of L W T = 800W 800 0.06mm, wherein the surface of the glass substrate is clean and has no finger print, no glass slag and no dirt; the appearance is not scratched, is not broken at the edge and is not cracked;
step two, spraying UV lamp curing type protective printing ink on two sides of the glass substrate;
cutting the glass substrate sprayed with the UV lamp curing type protective ink in a laser cutting machine with a cooling solution tank, cutting the glass substrate into 320.80 × 144.32mm specifications, and stopping cutting, wherein the cooling solution tank is filled with a cooling solution, the cooling solution consists of cooling liquid and water, the concentration ratio of the cooling liquid to the water is 2%, and the cooling liquid is cutting liquid;
step four, sequentially adding tetrabutylammonium fluoride, citric acid, sulfuric acid, oxalic acid, nitrilotriacetic acid, polyvinyl alcohol and pure water into a chemical solvent barrel according to the weight ratio of 22.12:12.04:12.11:5.98:1.99:1.49:44.56, and uniformly mixing to prepare the thinning etchant;
step five, cleaning the glass substrate subjected to laser cutting by using an automatic cleaning machine after being inserted into an anti-corrosion cleaning frame, after cleaning, putting the glass substrate into a full-automatic ultrasonic thinning machine for thinning treatment, keeping the temperature at 23 ℃ in the whole thinning treatment process, thinning by using a thinning etching agent for 8min and then cleaning by using pure water for 5min during thinning treatment, cleaning by using a cleaning agent for 3min after cleaning by using the pure water, cleaning by using the cleaning agent for 5min after cleaning by using the pure water, circulating the thinning treatment step, and stopping thinning treatment when the thickness of the glass substrate subjected to cutting is 25 mu m;
step six, the thinned glass substrate is placed on an umbrella of a vacuum coating machine in order, vacuumizing is carried out after a cavity door is closed, when the pressure in a cavity of the vacuum coating machine reaches 5.0 x 100000, argon is introduced into the cavity of the vacuum coating machine after the temperature of the cavity of the vacuum coating machine is kept at 135 ℃, the flow of argon is controlled to be 400S/ccm, a pulse direct-current power supply is started, the power of the pulse direct-current power supply is controlled to be 4.5KW, argon plasma is generated, the surface of the thinned glass substrate is cleaned for 5min by the argon plasma, after cleaning is finished, a diamond film material and a silicon dioxide crystal film material are adopted for coating, the purities of the diamond film material and the silicon dioxide crystal film material are both 99.99%, the original vacuum is required to be kept during deposition coating, the coating temperature is kept at 160 ℃, a crucible emission power supply is started during deposition coating, the pulse direct-current with the power supply of 4.5 is started, the diamond film material is firstly emitted, and the diamond film material is generated, and the plasma is generated on the surface of the thinned glass substrate for surface deposition When the thickness of the diamond film layer is 295nm, finishing a first film coating treatment, then emitting a silicon dioxide film material to generate film material plasma to continue depositing on the surface of the diamond film layer after the first film coating treatment is finished, finishing a second film coating treatment when the thickness of the silicon dioxide film layer is 200nm, closing a crucible emission power supply and stopping introducing argon after the second film coating treatment is finished, closing a vacuum valve when the temperature in the cavity of the vacuum film coating machine is reduced to 50 ℃, opening a cavity door, and taking out the coated glass substrate;
and seventhly, coating the coated glass substrate by using a full-automatic coating machine, wherein the coating material is oil-free alkyd resin, a coupling agent, a solvent, an auxiliary agent and high-molecular glass resin according to a ratio of 15:0.5:30: 2: and 62.5, wherein the solvent is a mixture obtained by mixing benzene and ester according to a mass ratio of 65:35, the auxiliary agent is a mixture obtained by mixing a leveling agent and an antifoaming agent according to a mass ratio of 75:25, and when the thickness of the film layer is 5um, the coating is stopped to obtain a finished glass cover plate.
Example 6
A preparation method of a glass cover plate comprises the following steps:
selecting a glass substrate with the specification of L W T = 800W 1000 0.08mm, wherein the surface of the glass substrate is clean and has no finger print, glass slag and dirt; the appearance is not scratched, is not broken at the edge and is not cracked;
step two, spraying UV lamp curing type protective printing ink on two sides of the glass substrate;
cutting the glass substrate sprayed with the UV lamp curing type protective ink in a laser cutting machine with a cooling solution tank, cutting the glass substrate into 160.40 × 72.16mm specifications, and stopping cutting, wherein the cooling solution tank is filled with a cooling solution, the cooling solution consists of cooling liquid and water, the concentration ratio of the cooling liquid to the water is 2%, and the cooling liquid is cutting liquid;
step four, sequentially adding tetrabutylammonium fluoride, citric acid, sulfuric acid, oxalic acid, nitrilotriacetic acid, polyvinyl alcohol and pure water into a chemical solvent barrel according to the weight ratio of 21.95:11.87:12.14:6:2.01:1.51:44.99, and uniformly mixing to prepare the thinning etchant;
step five, cleaning the glass substrate subjected to laser cutting by using an automatic cleaning machine after being inserted into an anti-corrosion cleaning frame, after cleaning, putting the glass substrate into a full-automatic ultrasonic thinning machine for thinning treatment, keeping the temperature at 23 ℃ in the whole thinning treatment process, thinning by using a thinning etching agent for 8min and then cleaning by using pure water for 5min during thinning treatment, cleaning by using a cleaning agent for 3min after cleaning by using the pure water, cleaning by using the pure water for 5min after cleaning by using the cleaning agent, and circulating the thinning treatment step, and stopping thinning treatment when the thickness of the glass substrate subjected to cutting is 25 mu m;
step six, the thinned glass substrate is placed on an umbrella of a vacuum coating machine in order, vacuumizing is carried out after a cavity door is closed, when the pressure in a cavity of the vacuum coating machine reaches 5.0 x 100000, argon is introduced into the cavity of the vacuum coating machine after the temperature of the cavity of the vacuum coating machine is kept at 135 ℃, the flow of argon is controlled to be 400S/ccm, a pulse direct-current power supply is started, the power of the pulse direct-current power supply is controlled to be 4.5KW, argon plasma is generated, the surface of the thinned glass substrate is cleaned for 5min by the argon plasma, after cleaning is finished, a diamond film material and a silicon dioxide crystal film material are adopted for coating, the purities of the diamond film material and the silicon dioxide crystal film material are both 99.99%, the original vacuum is required to be kept during deposition coating, the coating temperature is kept at 160 ℃, a crucible emission power supply is started during deposition coating, the pulse direct-current with the power supply of 4.5 is started, the diamond film material is firstly emitted, and the diamond film material is generated, and the plasma is generated on the surface of the thinned glass substrate for surface deposition When the thickness of the diamond film layer is 300nm, finishing a first film coating treatment, emitting a silicon dioxide film material to generate film material plasma to continue depositing on the surface of the diamond film layer after the first film coating treatment is finished, finishing a second film coating treatment when the thickness of the silicon dioxide film layer is 200nm, closing a crucible emission power supply and stopping introducing argon after the second film coating treatment is finished, closing a vacuum valve when the temperature in the cavity of the vacuum film coating machine is reduced to 60 ℃, opening a cavity door, and taking out the coated glass substrate;
and seventhly, coating the coated glass substrate by using a full-automatic coating machine, wherein the coating material is oil-free alkyd resin, a coupling agent, a solvent, an auxiliary agent and high-molecular glass resin according to a ratio of 15:0.5:30: 2: and 62.5, wherein the solvent is a mixture obtained by mixing benzene and ester according to a mass ratio of 65:35, the auxiliary agent is a mixture obtained by mixing a leveling agent and an antifoaming agent according to a mass ratio of 75:25, and when the thickness of the film layer is 3um, the coating is stopped to obtain a finished glass cover plate.
Example 7
This example provides a glass cover plate prepared using the method of the previous example.
Example 8
The embodiment provides a mobile terminal, and the mobile terminal in the embodiment comprises the glass cover plate prepared in the previous embodiment.
The above description is only for the purpose of illustrating the preferred embodiments of the present invention and is not to be construed as limiting the invention, and any modifications, equivalents and improvements made within the spirit and principle of the present invention are intended to be included within the scope of the present invention.
Claims (10)
1. A method for preparing a glass cover plate is characterized by comprising the following steps:
cutting the glass substrate to obtain a cut glass substrate;
carrying out chemical thinning treatment on the cut glass base material to obtain a thinned glass base material;
performing film coating treatment on the thinned glass substrate to obtain a film-coated glass substrate;
and coating the coated glass substrate to obtain the glass cover plate.
2. The method for manufacturing a glass cover plate according to claim 1, wherein the cutting the glass substrate to obtain a cut glass substrate comprises:
spraying a protective reagent on the glass substrate;
and placing the glass substrate sprayed with the protective reagent in a cooling solution for cutting to obtain the cut glass substrate.
3. The method for producing a glass cover plate according to claim 1,
the protective agent comprises ultraviolet light protective oil;
and/or the cooling solution consists of cooling liquid and water, wherein the cooling liquid is cutting fluid.
4. The method for manufacturing a glass cover plate according to claim 1, wherein the step of chemically thinning the cut glass substrate to obtain a thinned glass substrate comprises:
putting the cut glass base material into a thinning machine, and chemically thinning the cut glass base material by adopting a thinning etching agent;
and when the thickness of the cut glass substrate reaches the target glass thickness, finishing the chemical thinning treatment to obtain the thinned glass substrate.
5. The method for manufacturing a glass cover plate according to claim 4, wherein the thinning etchant is prepared from tetrabutylammonium fluoride, citric acid, sulfuric acid, oxalic acid, nitrilotriacetic acid, polyvinyl alcohol and water according to a mass ratio of 16-28:6-18:6-18:3-9:0.5-3.5:1-2: 30.5-58.5;
and/or, the target glass thickness comprises 25um ± 5 um.
6. The method for preparing a glass cover plate according to claim 1, wherein the step of coating the thinned glass substrate to obtain a coated glass substrate comprises:
carrying out first film coating treatment on the thinned glass base material by adopting a first film coating material, and finishing the first film coating treatment after the thickness of a first film layer is reached;
and carrying out second coating treatment on the glass substrate subjected to the first coating treatment by using a second coating material, and finishing the second coating treatment after the thickness of a second film layer is reached to obtain the coated glass substrate.
7. The method for producing a glass cover plate according to claim 6,
the first coating material comprises diamond;
and/or the second coating material comprises silicon dioxide;
and/or, the first film layer thickness comprises 300 ± 30 nm;
and/or the second film layer thickness comprises 200 ± 20 nm.
8. The method for manufacturing a glass cover plate according to claim 1, wherein the coating treatment of the coated glass substrate to obtain the glass cover plate comprises:
uniformly coating the coated glass substrate by using a coating material, and finishing the coating treatment after the thickness of a coating film layer is reached to obtain the glass cover plate;
wherein, the thickness of the coating film layer comprises 3-5um, and the coating material is prepared from polyester resin, a coupling agent, a solvent, an auxiliary agent and macromolecular glass resin according to the weight ratio of 13-17:0.3-0.7:25-35: 1-4: 60-65 in mass ratio.
9. A glass cover plate, characterized in that the glass cover plate is prepared by the method for preparing a glass cover plate according to any one of claims 1 to 8.
10. A mobile terminal, comprising:
the glass cover plate of claim 9.
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| JP2007313686A (en) * | 2006-04-25 | 2007-12-06 | Matsushita Electric Works Ltd | Mirror finish building material |
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| CN107000382A (en) * | 2014-07-22 | 2017-08-01 | 因特瓦克公司 | The coating for glass with improved scratch-resistant/wearability and oleophobic properties |
| CN106280688A (en) * | 2016-08-08 | 2017-01-04 | 惠州市至上新材料有限公司 | UV coating of alkali soluble a kind of of 3C Product glass screen cutting processing and preparation method thereof |
| CN108033686A (en) * | 2017-12-14 | 2018-05-15 | 天津美泰真空技术有限公司 | A kind of etching liquid for thinning glass substrate |
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