CN114672783B - Continuous vacuum coating system, functional unit and operation method thereof - Google Patents
Continuous vacuum coating system, functional unit and operation method thereof Download PDFInfo
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- CN114672783B CN114672783B CN202210260999.8A CN202210260999A CN114672783B CN 114672783 B CN114672783 B CN 114672783B CN 202210260999 A CN202210260999 A CN 202210260999A CN 114672783 B CN114672783 B CN 114672783B
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- 238000001771 vacuum deposition Methods 0.000 title claims abstract description 49
- 238000000034 method Methods 0.000 title claims abstract description 34
- 230000007704 transition Effects 0.000 claims abstract description 223
- 238000007599 discharging Methods 0.000 claims abstract description 27
- 239000011248 coating agent Substances 0.000 claims description 131
- 238000000576 coating method Methods 0.000 claims description 131
- 238000004140 cleaning Methods 0.000 claims description 48
- 238000012545 processing Methods 0.000 claims description 19
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 12
- 238000001816 cooling Methods 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 abstract description 19
- 238000011282 treatment Methods 0.000 abstract description 16
- 230000000694 effects Effects 0.000 abstract description 6
- 238000007747 plating Methods 0.000 description 32
- 238000002955 isolation Methods 0.000 description 26
- 239000010408 film Substances 0.000 description 16
- 238000007789 sealing Methods 0.000 description 13
- 239000000446 fuel Substances 0.000 description 8
- 230000008569 process Effects 0.000 description 8
- 230000007797 corrosion Effects 0.000 description 6
- 238000005260 corrosion Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 5
- 229910052799 carbon Inorganic materials 0.000 description 4
- 230000007547 defect Effects 0.000 description 3
- 238000007733 ion plating Methods 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 238000004891 communication Methods 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 230000006978 adaptation Effects 0.000 description 1
- 229910003481 amorphous carbon Inorganic materials 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000005289 physical deposition Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000012958 reprocessing Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/568—Transferring the substrates through a series of coating stations
Abstract
The invention discloses a continuous vacuum coating system, a functional unit and an operation method thereof. The continuous vacuum coating system comprises: a feeding chamber and a discharging chamber; and each functional unit comprises a first transition chamber, a functional chamber and a second transition chamber which are sequentially connected, wherein the feeding chamber, the functional units and the discharging chamber are sequentially connected, the feeding chamber is connected with the adjacent first transition chamber of the functional unit, the discharging chamber is connected with the adjacent second transition chamber of the functional unit, and the second transition chamber of one of the two adjacent functional units is connected with the first transition chamber of the other of the two adjacent functional units. The continuous vacuum coating system provided by the embodiment of the invention has the advantages of high treatment efficiency and treatment amount, good treatment effect, low manufacturing cost and difficulty, low running cost and the like.
Description
Technical Field
The invention relates to the technical field of plating, in particular to a continuous vacuum coating system, a functional unit and an operation method thereof.
Background
In order to improve the corrosion resistance of a workpiece (e.g., a metal bipolar plate of a fuel cell), a thin film or coating may be applied to the surface of the workpiece by means of vacuum plating. Vacuum coating is a technique for forming a thin film material in which atoms or molecules of the coating material are separated from the surface and hit on the surface of an object to be coated in a vacuum chamber. Vacuum coating generally refers to physical deposition of thin films, and mainly includes evaporation coating, ion plating and sputtering coating.
Disclosure of Invention
The present invention aims to solve at least one of the technical problems in the related art to some extent. To this end, embodiments of the present invention provide a continuous vacuum coating system, and functional units and methods of operation thereof.
The continuous vacuum coating system according to the embodiment of the invention comprises: a feeding chamber and a discharging chamber; and each functional unit comprises a first transition chamber, a functional chamber and a second transition chamber which are sequentially connected, wherein the feeding chamber, the functional units and the discharging chamber are sequentially connected, the feeding chamber is connected with the adjacent first transition chamber of the functional unit, the discharging chamber is connected with the adjacent second transition chamber of the functional unit, and the second transition chamber of one of the two adjacent functional units is connected with the first transition chamber of the other of the two adjacent functional units.
The continuous vacuum coating system provided by the embodiment of the invention has the advantages of high treatment efficiency and treatment amount, good treatment effect, low manufacturing cost and difficulty and low operation cost.
Optionally, the plurality of functional units include: the cleaning unit comprises a first transition chamber, a cleaning chamber and a second transition chamber which are sequentially connected, and the first transition chamber of the cleaning unit is connected with the feeding chamber; the first coating unit comprises a first transition chamber, a first coating chamber and a second transition chamber which are sequentially connected, and the first transition chamber of the first coating unit is connected with the second transition chamber of the cleaning unit; the second coating unit comprises a first transition chamber, a second coating chamber and a second transition chamber which are sequentially connected, the first transition chamber of the second coating unit is connected with the second transition chamber of the first coating unit, and the second transition chamber of the second coating unit is connected with the blanking chamber.
Optionally, a first target is arranged in the first coating chamber, a second target is arranged in the second coating chamber, the number of each of the first target and the second target is smaller than or equal to a first preset value, optionally, two first targets are arranged in the first coating chamber, the two first targets are oppositely arranged in the width direction of the first coating chamber, two second targets are arranged in the second coating chamber, and the two second targets are oppositely arranged in the width direction of the second coating chamber.
Optionally, the first coating chamber is a magnetron sputtering coating chamber, and the second coating chamber is a magnetron sputtering coating chamber or an arc ion coating chamber.
Optionally, the continuous vacuum coating system further comprises a cooling chamber, wherein the cooling chamber is arranged between the second transition chamber and the blanking chamber of the second coating unit, and the cooling chamber is connected with each of the second transition chamber and the blanking chamber of the second coating unit.
Optionally, the feeding chamber is detachably connected with the first transition chamber of the adjacent functional unit; and/or the blanking chamber is detachably connected with the second transition chamber of the adjacent functional unit; and/or the second transition chamber of one of the two adjacent functional units is detachably connected to the first transition chamber of the other of the two adjacent functional units.
Optionally, the functional compartment is detachably connected to each of the first transition compartment and the second transition compartment.
Optionally, each of the feeding chamber, the discharging chamber and the functional unit is movably disposed along a preset direction.
Optionally, the width of the first transition chamber is smaller than the width of at least one of the feeding chamber, the discharging chamber and the functional chamber; and/or the width of the second transition chamber is smaller than the width of at least one of the feeding chamber, the discharging chamber and the functional chamber.
The functional unit for the continuous vacuum coating system comprises a first transition chamber, a functional chamber and a second transition chamber which are sequentially connected, wherein the functional chamber is a cleaning chamber or a coating chamber.
By utilizing the functional unit according to the embodiment of the invention, the processing efficiency, the processing amount and the processing effect of the continuous vacuum coating system can be improved, and the manufacturing cost, the manufacturing difficulty and the running cost of the continuous vacuum coating system are reduced.
Optionally, the coating chamber is a magnetron sputtering coating chamber or an arc ion coating chamber, targets are arranged in the coating chamber, the number of the targets is smaller than or equal to a first preset value, and optionally, two targets are arranged in the coating chamber and are oppositely arranged in the width direction of the coating chamber.
Optionally, the functional chamber is detachably connected to each of the first transition chamber and the second transition chamber, and each of the functional chamber, the first transition chamber, and the second transition chamber is movably disposed along a preset direction.
Optionally, the width of the first transition chamber is smaller than the width of the functional chamber and/or the width of the second transition chamber is smaller than the width of the functional chamber.
The operation method of the continuous vacuum coating system according to the embodiment of the invention comprises the following steps:
the workpiece enters the functional unit through the feeding chamber;
processing the workpiece in the functional units, and processing the workpiece in at least one functional unit for a plurality of times, wherein after the workpiece is processed once, the workpiece enters a corresponding first transition chamber or a corresponding second transition chamber, and then enters the corresponding functional chamber again so as to be processed again; and
and outputting the processed workpiece through a discharging chamber.
By utilizing the operation method of the continuous vacuum coating system, the treatment efficiency, the treatment capacity and the treatment effect of the continuous vacuum coating system can be improved, and the operation cost of the continuous vacuum coating system is reduced.
Drawings
Fig. 1 is a schematic structural view of a continuous vacuum coating system according to an embodiment of the present invention.
Fig. 2 is a schematic structural view of functional units of the continuous vacuum coating system according to an embodiment of the present invention.
Detailed Description
Reference will now be made in detail to embodiments of the present invention, examples of which are illustrated in the accompanying drawings. The embodiments described below by referring to the drawings are illustrative and intended to explain the present invention and should not be construed as limiting the invention.
As shown in fig. 1 and 2, a continuous vacuum coating system 100 according to an embodiment of the present invention includes a loading chamber 2, a unloading chamber 3, and a plurality of functional units 1. Each functional unit 1 comprises a first transition chamber 11, a functional chamber 12 and a second transition chamber 13, which are connected in sequence, i.e. the functional chamber 12 is located between the first transition chamber 11 and the second transition chamber 13. The feeding chamber 2, the plurality of functional units 1 and the discharging chamber 3 are connected in sequence, that is, the feeding chamber 2, the functional units 1, the first and second functional units 1 and 3 are arranged in sequence.
The feeding chamber 2 is connected with the first transition chamber 11 of the adjacent functional unit 1, and the discharging chamber 3 is connected with the second transition chamber 13 of the adjacent functional unit 1. In other words, the feeding chamber 2 is connected to the first transition chamber 11 of the adjacent one of the plurality of functional units 1, and the discharging chamber 3 is connected to the second transition chamber 13 of the adjacent one of the plurality of functional units 1. The second transition chamber 13 of one of the two adjacent functional units 1 is connected to the first transition chamber 11 of the other of the two adjacent functional units 1, i.e. there are at least two transition chambers between the functional chambers 12 of the two adjacent functional units 1.
The work pieces from the loading chamber 2 or the preceding (upstream) functional unit 1 enter into the first transition chamber 11 of the present functional unit 1 and further into the functional chamber 12 for corresponding processing. If the workpiece is to be processed only once, the processed workpiece can enter the second transition chamber 13 of the functional unit 1 and further into the subsequent (downstream) functional unit 1 or the blanking chamber 3.
If multiple treatments are required, the treated workpiece may be introduced into the second transition chamber 13 and returned to the functional chamber 12 for further treatment. This is repeated until the complete processing of the workpiece in the functional unit 1 is completed. Since the multiple processing of the workpiece only needs to occupy the functional chamber 12 and the second transition chamber 13, the workpiece of the loading chamber 2 or the previous functional unit 1 can enter the first transition chamber 11 of the present functional unit 1 while the multiple processing of the workpiece is performed. Therefore, the workpiece is prevented from being remained in the feeding chamber 2 or the previous functional unit 1, so that the feeding of the subsequent workpiece is not influenced, and the processing of the subsequent workpiece by the previous functional unit 1 is not influenced.
If no subsequent work pieces enter the first transition chamber 11 of the present functional unit 1, the work pieces can also return from the functional chamber 12 into the first transition chamber 11 and then enter the functional chamber 12 again for the purpose of reprocessing the work pieces.
The continuous vacuum coating system 100 according to the embodiment of the present invention can implement multiple processes on a workpiece without affecting the entry of a subsequent workpiece into the functional unit 1 by including each functional unit 1 with the functional chamber 12 and the first transition chamber 11 and the second transition chamber 13 located at both sides of the functional chamber 12. Thereby, not only the processing efficiency and throughput of the continuous vacuum plating system 100 can be improved, but also the processing effect of the workpiece can be improved.
In the related art, in order to process a workpiece a plurality of times, a plurality of processing apparatuses each of which processes the workpiece once need to be provided in a functional chamber. Since the workpiece can be moved back and forth (moved back and forth) between the functional compartment 12 and the second transition compartment 13 (the first transition compartment 11) of the present application, it is only necessary to provide a small number of processing devices, even one, in the functional compartment 12 to process the workpiece a plurality of times. Thereby not only simplifying the structure of the functional unit 1 and the continuous vacuum coating system 100 and reducing the manufacturing cost and manufacturing difficulty of the functional unit 1 and the continuous vacuum coating system 100, but also reducing the space occupied by the functional unit 1 and the continuous vacuum coating system 100 and reducing the cost of maintaining the vacuum degree of the functional unit 1.
In addition, when the functional unit 1 and the blanking chamber 3 are temporarily unusable due to a failure or the like, the work piece subjected to the corresponding processing may be temporarily stored in the second transition chamber 13 of the preceding functional unit 1. At this time, the previous functional unit 1 can process the subsequent workpiece by using the first transition chamber 11 and the functional chamber 12, so as to avoid the stop of the whole continuous vacuum coating system 100 caused by the temporary non-use of the functional unit 1 and the blanking chamber 3, so as to further improve the processing efficiency and the processing capacity of the continuous vacuum coating system 100.
Therefore, the continuous vacuum coating system 100 according to the embodiment of the invention has the advantages of high treatment efficiency and treatment amount, good treatment effect, low manufacturing cost and difficulty, low operation cost and the like.
As shown in fig. 1 and 2, a continuous vacuum coating system 100 according to an embodiment of the present invention includes a loading chamber 2, a unloading chamber 3, and a plurality of functional units 1. The plurality of functional units 1 may include a cleaning unit 1a, a first plating unit 1b, and a second plating unit 1c. The vacuum generating device with high power can be used for vacuumizing the feeding chamber 2 and the discharging chamber 3 so as to ensure that the vacuum degree of the feeding chamber 2 and the discharging chamber 3 can quickly reach the requirement.
Optionally, the feeding chamber 2, the plurality of functional units 1 and the discharging chamber 3 are sequentially connected along a preset direction. For example, the loading chamber 2, the cleaning unit 1a, the first plating unit 1b, the second plating unit 1c, and the unloading chamber 3 are sequentially connected in a preset direction.
As shown in fig. 1, the cleaning unit 1a includes a first transition chamber 11a, a cleaning chamber 12a and a second transition chamber 13a which are sequentially connected, and the first transition chamber 11a of the cleaning unit 1a is connected to the loading chamber 2. Optionally, an isolation sealing door or an isolation valve is arranged between the first transition chamber 11a of the cleaning unit 1a and the loading chamber 2.
The first coating unit 1b comprises a first transition chamber 11b, a first coating chamber 12b and a second transition chamber 13b which are connected in sequence, and the first transition chamber 11b of the first coating unit 1b is connected with the second transition chamber 13a of the cleaning unit 1 a. Optionally, an isolation sealing door or an isolation valve is provided between the first transition chamber 11b of the first coating unit 1b and the second transition chamber 13a of the cleaning unit 1 a.
The second coating unit 1c comprises a first transition chamber 11c, a second coating chamber 12c and a second transition chamber 13c which are sequentially connected, the first transition chamber 11c of the second coating unit 1c is connected with the second transition chamber 13b of the first coating unit 1b, and the second transition chamber 13c of the second coating unit 1c is connected with the blanking chamber 3. Optionally, an isolation sealing door or an isolation valve is arranged between the first transition chamber 11c of the second coating unit 1c and the second transition chamber 13b of the first coating unit 1b, and an isolation sealing door or an isolation valve is arranged between the second transition chamber 13c of the second coating unit 1c and the blanking chamber 3.
Alternatively, the first coating chamber 12b may be a magnetron sputtering coating chamber, and the second coating chamber 12c may be a magnetron sputtering coating chamber or an arc ion coating chamber.
When the carbon layer is deposited by utilizing a magnetron sputtering method, the defects of low coating growth rate, small productivity, low film density and poor combination with a base material exist. In addition, the magnetron sputtering method utilizes glow discharge plasma to bombard the target, the energy density of the glow discharge plasma is relatively low, and for high-melting-point materials such as graphite, the ionization rate of the target is relatively low, so that the bonding capacity of atoms in the coating is reduced, and the defects in the coating are relatively many.
If a carbon layer (amorphous carbon coating) is deposited on a metallic bipolar plate of a fuel cell by a magnetron sputtering method, the carbon layer has poor corrosion resistance under the working condition of the fuel cell. After the fuel cell is used for a period of time, punctiform corrosion can occur at the defect position of the carbon layer of the metal bipolar plate, so that metal ions are separated out, and the performance of a membrane electrode of the fuel cell is further reduced.
Compared with the magnetron sputtering method, the coating prepared by utilizing the arc ion plating has the advantages of high deposition rate, high film density, good binding force with a substrate, better corrosion resistance and the like. Under the working environment of the metal bipolar plate of the fuel cell (80 ℃, PH=3), even under the condition of high potential (1.2V vs. SHE), the protective effect can be very good. Because the arc ion plating technology has high deposition rate, the production efficiency can be greatly improved, the production cost of the coating can be rapidly reduced, and the large-scale industrialized popularization of the fuel cell is facilitated.
Alternatively, the width of each of the first transition chamber 11a, the second transition chamber 13a, the first transition chamber 11b, the second transition chamber 13b, the first transition chamber 11c, and the second transition chamber 13c may be smaller than the width of at least one of the loading chamber 2, the cleaning chamber 12a, the first plating chamber 12b, the second plating chamber 12c, and the unloading chamber 3. The workpiece may be moved in the length direction (e.g., the preset direction) of each of the first transition chamber 11a, the second transition chamber 13a, the first transition chamber 11b, the second transition chamber 13b, the first transition chamber 11c, and the second transition chamber 13 c. The width direction of each of the first transition chamber 11a, the second transition chamber 13a, the first transition chamber 11b, the second transition chamber 13b, the first transition chamber 11c, and the second transition chamber 13c may be perpendicular to the vertical direction and their length direction.
The space of each of the first transition chamber 11a, the second transition chamber 13a, the first transition chamber 11b, the second transition chamber 13b, the first transition chamber 11c, and the second transition chamber 13c can thereby be reduced, so that the vacuum degree of each of the first transition chamber 11a, the second transition chamber 13a, the first transition chamber 11b, the second transition chamber 13b, the first transition chamber 11c, and the second transition chamber 13c can be maintained by using only a vacuum generating device (e.g., a vacuum pump) of a smaller power, so that the manufacturing cost and the running cost of the continuous vacuum plating system 100 can be further reduced.
Optionally, the feeding chamber 2, the first transition chamber 11a, the cleaning chamber 12a, the second transition chamber 13a, the first transition chamber 11b, the first coating chamber 12b, the second transition chamber 13b, the first transition chamber 11c, the second coating chamber 12c, the second transition chamber 13c and the discharging chamber 3 are sequentially connected along a preset direction. For example, the preset direction may be a horizontal direction.
The operation of the continuous vacuum coating system 100 is described in detail below with reference to fig. 1 and 2.
First, the feed door of the loading chamber 2 is opened so that the workpiece to be processed is entered into the loading chamber 2. Closing the feed gate of the loading chamber 2, closing the isolation sealing gate or isolation valve between the loading chamber 2 and the first transition chamber 11a of the cleaning unit 1a, and then evacuating the loading chamber 2. Optionally, the vacuum generating device 41 with higher power (for example, the power is greater than or equal to the second preset value) is used to vacuumize the feeding chamber 2, so as to quickly reach the requirement on the vacuum degree of the feeding chamber 2, and then the vacuum degree of the feeding chamber 2 can be maintained by the vacuum generating device 42 with lower power (for example, the power is less than or equal to the third preset value).
After the vacuum degree in the loading chamber 2 reaches the requirement, an isolation sealing door or an isolation valve between the loading chamber 2 and the first transition chamber 11a of the cleaning unit 1a is opened so as to allow the workpiece to enter into the first transition chamber 11a of the cleaning unit 1a, and then the isolation sealing door or the isolation valve between the loading chamber 2 and the first transition chamber 11a of the cleaning unit 1a and the isolation sealing door or the isolation valve between the second transition chamber 13a of the cleaning unit 1a and the first transition chamber 11b of the first plating unit 1b are closed. The air pressure of the loading chamber 2 is restored and then the feed gate of the loading chamber 2 is opened so that the next batch of workpieces to be processed is introduced into the loading chamber 2.
The work piece in the first transition chamber 11a of the cleaning unit 1a enters into the cleaning chamber 12a, and the work piece can be cleaned in the cleaning chamber 12a to remove residual impurities, oxide layers, and the like on the surface of the work piece. Wherein the workpiece may be a metallic bipolar plate of a fuel cell. When a workpiece is present in the cleaning unit 1a (particularly, when the workpiece in the cleaning chamber 12a is cleaned), the vacuum degree of the cleaning unit 1a is maintained by the vacuum generating device 43 having a small power (for example, a power of a third preset value or less). Optionally, the third preset value is smaller than the second preset value. The number of vacuum generating means 43 may be two, one vacuum generating means 43 being connected to the first transition chamber 11a and the other vacuum generating means 43 being connected to the second transition chamber 13 a.
The cleaned workpiece may enter the second transition chamber 13a of the cleaning unit 1 a. If the cleaning of the workpiece is not satisfactory, the workpiece in the second transition chamber 13a may also be returned to the cleaning chamber 12a for a further cleaning of the workpiece. The workpiece after the cleaning again can also return to the second transition chamber 13a, and the process is repeated until the cleaning of the workpiece reaches the requirement.
Since the work can be washed a plurality of times, the number of washing devices in the washing chamber 12a can be greatly reduced. Thereby, not only the manufacturing difficulty and the manufacturing cost of the cleaning unit 1a and the continuous vacuum coating system 100 can be further reduced, but also the space of the cleaning chamber 12a can be reduced, and the vacuum degree of the cleaning chamber 12a can be maintained by using a vacuum generating device with smaller power, so that the manufacturing cost and the running cost of the continuous vacuum coating system 100 can be further reduced.
Moreover, the first transition chamber 11a of the cleaning unit 1a is not required to be occupied for cleaning the workpiece, so that the workpiece in the feeding chamber 2 is not influenced by the workpiece entering the first transition chamber 11a of the cleaning unit 1a, and the workpiece to be processed subsequently enters the feeding chamber 2.
After the work is cleaned, the isolation sealing door or valve between the second transition chamber 13a of the cleaning unit 1a and the first transition chamber 11b of the first film plating unit 1b is opened so that the work enters into the first transition chamber 11b of the first film plating unit 1b, and then the isolation sealing door or valve between the second transition chamber 13a and the first transition chamber 11b and the isolation sealing door or valve between the second transition chamber 13b of the first film plating unit 1b and the first transition chamber 11c of the second film plating unit 1c are closed.
The workpiece in the first transition chamber 11b of the first coating unit 1b enters the first coating chamber 12b, and the workpiece can be coated (e.g., primed) in the first coating chamber 12 b. When a workpiece is present in the first plating unit 1b (particularly, when a workpiece in the first plating chamber 12b is plated), the vacuum degree of the first plating unit 1b is maintained by the vacuum generating device 44 having a smaller power (for example, a power equal to or smaller than a third preset value). The number of vacuum generating means 44 may be two, one vacuum generating means 44 being connected to the first transition chamber 11b and the other vacuum generating means 44 being connected to the second transition chamber 13 b.
The workpiece after the first coating can enter the second transition chamber 13b of the first coating unit 1 b. The workpiece in the second transition chamber 13b can be returned to the first coating chamber 12b for re-coating the workpiece. The workpiece after being coated again can also return to the second transition chamber 13b, and the process is repeated until the coating is finished. The coating of the workpiece does not occupy the first transition chamber 11b of the first coating unit 1b, and thus does not affect the entry of the workpiece in the cleaning unit 1a into the first transition chamber 11a of the first coating unit 1 b.
Moreover, the thickness of the film layer of each film plating can be greatly reduced by carrying out film plating on the workpiece for multiple times, so that the internal stress of the film layer can be effectively reduced, and the corrosion resistance of the film layer can be further improved.
Optionally, a first target is disposed in the first coating chamber 12b, where the number of the first targets is less than or equal to a first preset value. For example, two first targets are provided in the first plating chamber 12b, and the two first targets are disposed opposite to each other in the width direction of the first plating chamber 12 b. Whereby the workpiece may pass between two of the first targets for coating two opposite surfaces of the workpiece at the same time.
Targets in a coating chamber in the related art are arranged along the moving direction of a workpiece, and the workpiece sequentially passes through a plurality of targets so as to coat the workpiece for a plurality of times.
Since the workpiece can be coated a plurality of times, the number of the first targets in the first coating chamber 12b can be greatly reduced, so that the number of the first targets is smaller than or equal to a first preset value. Thereby, not only the number of devices for mounting the first target can be greatly reduced so as to further reduce the manufacturing difficulty and manufacturing cost of the first coating unit 1b and the continuous vacuum coating system 100, but also the space of the first coating chamber 12b can be reduced, and the vacuum degree of the first coating chamber 12b can be maintained only by using a vacuum generating device with smaller power so as to further reduce the manufacturing cost and the running cost of the continuous vacuum coating system 100.
After the work piece is coated (e.g., primed) in the first coating unit 1b, the isolation seal door or valve between the second transition chamber 13b of the first coating unit 1b and the first transition chamber 11c of the second coating unit 1c is opened to allow the work piece to enter into the first transition chamber 11c of the second coating unit 1c, and then the isolation seal door or valve between the second transition chamber 13b and the first transition chamber 11c is closed, and the isolation seal door or valve between the second transition chamber 13c of the second coating unit 1c and the blanking chamber 3 is closed.
The workpiece in the first transition chamber 11c of the second coating unit 1c enters the second coating chamber 12c, and the workpiece can be coated in the second coating chamber 12 c. When a workpiece is present in the second coating unit 1c (particularly, when a workpiece in the second coating chamber 12c is coated), the vacuum degree of the second coating unit 1c is maintained by the vacuum generating device 45 having a smaller power (for example, a power equal to or smaller than a third preset value). The number of vacuum generating means 45 may be two, one vacuum generating means 45 being connected to the first transition chamber 11c and the other vacuum generating means 45 being connected to the second transition chamber 13 c.
The workpiece after the first coating can enter the second transition chamber 13c of the second coating unit 1c. The workpiece in the second transition chamber 13c can be returned to the second coating unit 1c for coating the workpiece again. The workpiece after being coated again can also return to the second transition chamber 13c, and the process is repeated until the coating is finished. The coating of the workpiece does not occupy the first transition chamber 11c of the second coating unit 1c, so that the workpiece in the first coating unit 1b is not influenced to enter the first transition chamber 11c of the second coating unit 1c.
Moreover, the thickness of the film layer of each film plating can be greatly reduced by carrying out film plating on the workpiece for multiple times, so that the internal stress of the film layer can be effectively reduced, and the corrosion resistance of the film layer can be further improved.
Optionally, a second target is disposed in the second coating chamber 12c, where the number of the second targets is less than or equal to the first preset value. For example, two second targets are provided in the second plating chamber 12c, and the two second targets are disposed opposite to each other in the width direction of the second plating chamber 12 c. Whereby the workpiece may pass between two of the second targets for coating two opposite surfaces of the workpiece simultaneously.
Since the workpiece can be coated a plurality of times, the number of the second targets in the second coating chamber 12c can be greatly reduced, so that the number of the second targets is smaller than or equal to the first preset value. Thereby, not only the number of devices for mounting the second target can be greatly reduced so as to further reduce the manufacturing difficulty and manufacturing cost of the second coating unit 1c and the continuous vacuum coating system 100, but also the space of the second coating chamber 12c can be reduced, and the vacuum degree of the second coating chamber 12c can be maintained only by using a vacuum generating device with smaller power so as to further reduce the manufacturing cost and the running cost of the continuous vacuum coating system 100.
After the workpiece is coated in the second coating unit 1c, opening an isolation sealing door or an isolation valve between the second transition chamber 13c of the second coating unit 1c and the blanking chamber 3 so as to enable the workpiece to enter the blanking chamber 3, and then closing the isolation sealing door or the isolation valve between the second transition chamber 13c of the second coating unit 1c and the blanking chamber 3. The air pressure of the blanking chamber 3 is restored, and then the discharge door of the blanking chamber 3 is opened so that the processed workpiece is separated from the blanking chamber 3.
Then, the discharge door of the blanking chamber 3 is closed and the blanking chamber 3 is vacuumized, so that the vacuum degree in the blanking chamber 3 reaches the requirement, and the blanking chamber 3 is in a state capable of receiving the workpiece. Optionally, the vacuum generating device 46 with higher power (for example, the power is greater than or equal to the second preset value) is used to vacuumize the blanking chamber 3, so as to quickly reach the requirement on the vacuum degree of the blanking chamber 3, and then the vacuum degree of the blanking chamber 3 can be maintained by the vacuum generating device 47 with lower power (for example, the power is less than or equal to the third preset value).
In some embodiments of the invention, the feeding chamber 2 is detachably connected to the first transition chamber 11 of the adjacent functional unit 1, the second transition chamber 13 of one of the adjacent two functional units 1 is detachably connected to the first transition chamber 11 of the other of the adjacent two functional units 1, and the discharging chamber 3 is detachably connected to the second transition chamber 13 of the adjacent functional unit 1. Thereby, at least one of the feeding chamber 2, the functional unit 1 and the discharging chamber 3 can be replaced as required, so that the continuous vacuum coating system 100 can perform different treatments on different workpieces, and the application range of the continuous vacuum coating system 100 can be enlarged.
For example, the loading chamber 2, the cleaning unit 1a, the first plating unit 1b, the second plating unit 1c, and the unloading chamber 3 are detachably connected in this order.
Optionally, a functional chamber 12 is detachably connected to each of the first transition chamber 11 and the second transition chamber 13. The functional compartments 12 can thus be replaced as needed, so that the continuous vacuum coating system 100 can perform different treatments on different workpieces with reduced replacement effort, so as to expand the application range of the continuous vacuum coating system 100.
In one embodiment of the present invention, the feeding chamber 2, the first transition chamber 11a, the cleaning chamber 12a, the second transition chamber 13a, the first transition chamber 11b, the first plating chamber 12b, the second transition chamber 13b, the first transition chamber 11c, the second plating chamber 12c, the second transition chamber 13c, and the discharging chamber 3 are detachably connected in this order. Whereby the corresponding parts can be replaced as needed, thereby increasing the flexibility of use of the continuous vacuum coating system 100.
Each of the loading chamber 2, the unloading chamber 3, and the functional unit 1 is movably provided in a preset direction. It is thereby possible to replace the loading chamber 2, the unloading chamber 3 and the functional unit 1 of corresponding dimensions according to the yield that is to be achieved, and to match the newly replaced portions by moving the non-replaced portions in a preset direction.
Optionally, each of the feeding chamber 2, the first transition chamber 11a, the cleaning chamber 12a, the second transition chamber 13a, the first transition chamber 11b, the first plating chamber 12b, the second transition chamber 13b, the first transition chamber 11c, the second plating chamber 12c, the second transition chamber 13c, and the discharging chamber 3 is movably disposed in a preset direction. This allows for a better and easier adaptation to the newly replaced part.
In the description of the present invention, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential", etc. indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings are merely for convenience in describing the present invention and simplifying the description, and do not indicate or imply that the device or element being referred to must have a specific orientation, be configured and operated in a specific orientation, and therefore should not be construed as limiting the present invention.
Furthermore, the terms "first," "second," and the like, are used for descriptive purposes only and are not to be construed as indicating or implying a relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defining "a first" or "a second" may explicitly or implicitly include at least one such feature. In the description of the present invention, the meaning of "plurality" means at least two, for example, two, three, etc., unless specifically defined otherwise.
In the present invention, unless explicitly specified and limited otherwise, the terms "mounted," "connected," "secured," and the like are to be construed broadly, and may be, for example, fixedly connected, detachably connected, or integrally formed; may be mechanically connected, may be electrically connected or may be in communication with each other; either directly or indirectly, through intermediaries, or both, may be in communication with each other or in interaction with each other, unless expressly defined otherwise. The specific meaning of the above terms in the present invention can be understood by those of ordinary skill in the art according to the specific circumstances.
In the present invention, unless expressly stated or limited otherwise, a first feature "up" or "down" a second feature may be the first and second features in direct contact, or the first and second features in indirect contact via an intervening medium. Moreover, a first feature being "above," "over" and "on" a second feature may be a first feature being directly above or obliquely above the second feature, or simply indicating that the first feature is level higher than the second feature. The first feature being "under", "below" and "beneath" the second feature may be the first feature being directly under or obliquely below the second feature, or simply indicating that the first feature is less level than the second feature.
For purposes of this disclosure, the terms "one embodiment," "some embodiments," "example," "a particular example," or "some examples," etc., mean that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the invention. In this specification, schematic representations of the above terms are not necessarily directed to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples. Furthermore, the different embodiments or examples described in this specification and the features of the different embodiments or examples may be combined and combined by those skilled in the art without contradiction.
While embodiments of the present invention have been shown and described above, it will be understood that the above embodiments are illustrative and not to be construed as limiting the invention, and that variations, modifications, alternatives and variations may be made to the above embodiments by one of ordinary skill in the art within the scope of the invention.
Claims (13)
1. A method of operating a continuous vacuum coating system, the continuous vacuum coating system comprising:
a feeding chamber and a discharging chamber; and
each functional unit comprises a first transition chamber, a functional chamber and a second transition chamber which are sequentially connected, and the feeding chamber, the functional units and the discharging chamber are sequentially connected, wherein the feeding chamber is connected with the first transition chamber of the adjacent functional unit, the discharging chamber is connected with the second transition chamber of the adjacent functional unit, and the second transition chamber of one of the adjacent two functional units is connected with the first transition chamber of the other of the adjacent two functional units;
the operation method of the continuous vacuum coating system comprises the following steps:
the workpiece enters the functional unit through the feeding chamber;
processing the workpiece in the functional units, and processing the workpiece in at least one functional unit for a plurality of times, wherein after the workpiece is processed once, the workpiece enters a corresponding first transition chamber or a corresponding second transition chamber, and then enters the corresponding functional chamber again so as to be processed again; and
and outputting the processed workpiece through a discharging chamber.
2. The method of claim 1, wherein the plurality of functional units comprises:
the cleaning unit comprises a first transition chamber, a cleaning chamber and a second transition chamber which are sequentially connected, and the first transition chamber of the cleaning unit is connected with the feeding chamber;
the first coating unit comprises a first transition chamber, a first coating chamber and a second transition chamber which are sequentially connected, and the first transition chamber of the first coating unit is connected with the second transition chamber of the cleaning unit; and
the second coating unit comprises a first transition chamber, a second coating chamber and a second transition chamber which are sequentially connected, wherein the first transition chamber of the second coating unit is connected with the second transition chamber of the first coating unit, and the second transition chamber of the second coating unit is connected with the blanking chamber.
3. The operation method of a continuous vacuum coating system according to claim 2, wherein a first target is disposed in the first coating chamber, a second target is disposed in the second coating chamber, and the number of each of the first target and the second target is equal to or less than a first preset value, optionally, two first targets are disposed in the first coating chamber, the two first targets are disposed opposite to each other in the width direction of the first coating chamber, and two second targets are disposed opposite to each other in the width direction of the second coating chamber.
4. The method of claim 2, wherein the first coating chamber is a magnetron sputtering coating chamber and the second coating chamber is a magnetron sputtering coating chamber or an arc ion coating chamber.
5. The method of claim 2, further comprising a cooling chamber disposed between the second transition chamber and the blanking chamber of the second coating unit, the cooling chamber being connected to each of the second transition chamber and the blanking chamber of the second coating unit.
6. A method of operating a continuous vacuum coating system according to claim 1, wherein,
the feeding chamber is detachably connected with the first transition chamber of the adjacent functional unit; and/or
The blanking chamber is detachably connected with the second transition chamber of the adjacent functional unit; and/or
The second transition chamber of one of the two adjacent functional units is detachably connected to the first transition chamber of the other of the two adjacent functional units.
7. The method of claim 1, wherein the functional compartment is removably connected to each of the first transition compartment and the second transition compartment.
8. The method of operating a continuous vacuum coating system according to claim 6 or 7, wherein each of the loading chamber, the unloading chamber, and the functional unit is movably disposed in a preset direction.
9. A method of operating a continuous vacuum coating system according to claim 1, wherein,
the width of the first transition chamber is smaller than the width of at least one of the feeding chamber, the discharging chamber and the functional chamber; and/or
The width of the second transition chamber is smaller than the width of at least one of the feeding chamber, the discharging chamber and the functional chamber.
10. The method of claim 1, wherein the functional unit comprises a first transition chamber, a functional chamber, and a second transition chamber connected in sequence, the functional chamber being a cleaning chamber or a coating chamber.
11. The method according to claim 10, wherein the coating chamber is a magnetron sputtering coating chamber or an arc ion coating chamber, targets are disposed in the coating chamber, the number of targets is less than or equal to a first preset value, and optionally, two targets are disposed in the coating chamber, and the two targets are disposed opposite to each other in the width direction of the coating chamber.
12. The method of claim 10, wherein the functional compartment is removably coupled to each of the first transition compartment and the second transition compartment, each of the functional compartment, the first transition compartment, and the second transition compartment being movably disposed in a predetermined direction.
13. The method of claim 10, wherein the width of the first transition chamber is less than the width of the functional chamber and/or the width of the second transition chamber is less than the width of the functional chamber.
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Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN201343569Y (en) * | 2009-02-13 | 2009-11-11 | 江苏津通先锋光电显示技术有限公司 | Continuous plane magnetron sputtering filming device |
| CN201648512U (en) * | 2010-03-24 | 2010-11-24 | 深圳森丰真空镀膜有限公司 | Continuous vacuum coating device |
| CN212713743U (en) * | 2020-06-03 | 2021-03-16 | 苏州锐世讯光学科技有限公司 | Sputtering coating production system |
| CN112899635A (en) * | 2021-01-14 | 2021-06-04 | 东莞市一粒米薄膜科技有限公司 | Horizontal optical continuous magnetron sputtering coating equipment |
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2022
- 2022-03-16 CN CN202210260999.8A patent/CN114672783B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN201343569Y (en) * | 2009-02-13 | 2009-11-11 | 江苏津通先锋光电显示技术有限公司 | Continuous plane magnetron sputtering filming device |
| CN201648512U (en) * | 2010-03-24 | 2010-11-24 | 深圳森丰真空镀膜有限公司 | Continuous vacuum coating device |
| CN212713743U (en) * | 2020-06-03 | 2021-03-16 | 苏州锐世讯光学科技有限公司 | Sputtering coating production system |
| CN112899635A (en) * | 2021-01-14 | 2021-06-04 | 东莞市一粒米薄膜科技有限公司 | Horizontal optical continuous magnetron sputtering coating equipment |
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