CN114656158A - Device, method and transfer device for polishing AG glass - Google Patents
Device, method and transfer device for polishing AG glass Download PDFInfo
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- CN114656158A CN114656158A CN202210450204.XA CN202210450204A CN114656158A CN 114656158 A CN114656158 A CN 114656158A CN 202210450204 A CN202210450204 A CN 202210450204A CN 114656158 A CN114656158 A CN 114656158A
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- hydrofluoric acid
- floating
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- polishing solution
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- 238000005498 polishing Methods 0.000 title claims abstract description 135
- 239000011521 glass Substances 0.000 title claims abstract description 104
- 238000000034 method Methods 0.000 title claims abstract description 15
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims abstract description 230
- 238000007667 floating Methods 0.000 claims abstract description 178
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 99
- 239000007788 liquid Substances 0.000 claims abstract description 72
- 238000004140 cleaning Methods 0.000 claims description 15
- 230000007797 corrosion Effects 0.000 claims description 12
- 238000005260 corrosion Methods 0.000 claims description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 8
- 239000000463 material Substances 0.000 claims description 7
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 6
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 6
- -1 polytetrafluoroethylene Polymers 0.000 claims description 6
- 239000004743 Polypropylene Substances 0.000 claims description 3
- 238000007664 blowing Methods 0.000 claims description 3
- 229910000420 cerium oxide Inorganic materials 0.000 claims description 3
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 claims description 3
- 238000007517 polishing process Methods 0.000 claims description 3
- 229920001155 polypropylene Polymers 0.000 claims description 3
- 238000003860 storage Methods 0.000 claims description 3
- 239000007769 metal material Substances 0.000 claims description 2
- 229920001343 polytetrafluoroethylene Polymers 0.000 claims description 2
- 239000004810 polytetrafluoroethylene Substances 0.000 claims description 2
- 238000007654 immersion Methods 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 abstract description 9
- 230000000694 effects Effects 0.000 abstract description 7
- 238000004134 energy conservation Methods 0.000 abstract description 2
- 230000007613 environmental effect Effects 0.000 abstract description 2
- 239000000243 solution Substances 0.000 description 117
- 239000011229 interlayer Substances 0.000 description 11
- 239000010410 layer Substances 0.000 description 9
- 238000003486 chemical etching Methods 0.000 description 5
- 239000002253 acid Substances 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 239000003595 mist Substances 0.000 description 3
- 230000002378 acidificating effect Effects 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000005484 gravity Effects 0.000 description 2
- 238000011068 loading method Methods 0.000 description 2
- 230000000717 retained effect Effects 0.000 description 2
- 239000013589 supplement Substances 0.000 description 2
- 229910001018 Cast iron Inorganic materials 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 238000004887 air purification Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 239000011152 fibreglass Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002052 molecular layer Substances 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000011550 stock solution Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K13/00—Etching, surface-brightening or pickling compositions
- C09K13/04—Etching, surface-brightening or pickling compositions containing an inorganic acid
- C09K13/08—Etching, surface-brightening or pickling compositions containing an inorganic acid containing a fluorine compound
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
The device, the polishing method and the transferring device for polishing the AG glass comprise floating bodies, a hydrofluoric acid polishing solution and a magnet, wherein the floating bodies are stored in the hydrofluoric acid polishing solution and suspended on the liquid surface of the hydrofluoric acid polishing solution, at least 90% of the liquid surface area of the hydrofluoric acid polishing solution is covered, each floating body is internally provided with the magnet, each floating body comprises the first floating ball and the second floating ball, the diameter of each first floating ball is smaller than that of each second floating ball, the floating bodies covered on the liquid surface provide shielding for the hydrofluoric acid polishing solution, volatilization of the hydrofluoric acid polishing solution is reduced, cost input is reduced, production efficiency is improved, the magnets are arranged, the floating bodies are convenient to attract and adhere to each other, the covering effect is good, volatilization of the hydrofluoric acid polishing solution is reduced, the adding usage amount is further reduced, pollution of the volatilization of the hydrofluoric acid polishing solution to the environment is reduced, and the effects of energy conservation and environmental protection are achieved.
Description
Technical Field
The invention relates to the technical field of glass production, in particular to a device, a polishing method and a transferring device for polishing AG glass.
Background
The AG glass which is popular in the market at present is produced by a main flow process of chemical etching, the process is to soak the AG glass in a chemical preparation for a certain time to realize the chemical etching, the existing chemical preparation is generally an acidic substance and has strong volatility, the volatilized acid mist causes great harm to workers and the environment, and a preparation tank cannot be sealed by the chemical etching process, so that the chemical etching process can only be additionally provided with an air purification device in the prior art to realize the treatment of the acid mist, but cannot effectively prevent the volatilization of the acid mist, the large volatilization of the chemical preparation not only causes the increase of the cost, but also prolongs the glass processing time and reduces the production efficiency.
The conventional AG glass soaking and polishing process has no special loading tool, and only can soak and take out the AG glass one by one, so that the production efficiency is low, and the labor intensity is high.
Disclosure of Invention
Based on the technical defects, the invention provides a device and a method for polishing AG glass and a device for transferring AG glass, which solve the technical defects in the technical problems.
The invention relates to a device for polishing AG glass, which comprises a solution tank, a polishing device and a polishing device, wherein hydrofluoric acid polishing solution is stored in the solution tank; the floating bodies are suspended on the liquid level of the hydrofluoric acid polishing solution and at least cover 90% of the area of the liquid level of the hydrofluoric acid polishing solution; the height of the floating body above the liquid level of the hydrofluoric acid polishing solution is H1, the height of the floating body below the liquid level of the hydrofluoric acid polishing solution is H2, wherein H1: H2 is 2:1-1:2, and the hydrofluoric acid polishing solution consists of 3 parts of 60% hydrofluoric acid, 5 parts of water and 1 part of 90% sulfuric acid; or 30 percent of hydrofluoric acid, 60 percent of hydrochloric acid, 0.3 to 0.8 percent of cerium oxide and the balance of water; the solution tank includes outer wall and inner wall, it holds the intermediate layer to form one between outer wall and the inner wall, the inner wall upper end is opened have and is held the communicating bleeder port of intermediate layer, it is equipped with a guide plate in the intermediate layer to hold, and this guide plate will hold the intermediate layer and divide into upper portion and lower part, the guide plate is by holding the intermediate layer middle part to both sides slope, the opening of the lowest portion of guide plate has the weeping mouth, the guide plate is located bleeder port below, it communicates with each other with the solution tank to hold the intermediate layer lower part, it has the filter screen to cover on the bleeder port, the solution tank still has a feed liquor pipe, the feed liquor pipe passes the outer wall stretches into and holds the intermediate layer lower part.
Further, a magnet is arranged in each floating body, two adjacent floating bodies are mutually attracted and attached through the magnets, the floating bodies are made of polytetrafluoroethylene or polypropylene, and the outer surfaces of the floating bodies are uniformly coated with corrosion-resistant nano layers.
Further, the floating body comprises a first floating ball and a second floating ball, the diameter of the first floating ball is smaller than that of the second floating ball, a first magnet is arranged in the first floating ball, a second magnet is arranged in the second floating ball, the first floating ball is supposed to be provided with a first central line perpendicular to the liquid surface of the hydrofluoric acid polishing solution, the second floating ball is supposed to be provided with a second central line perpendicular to the liquid surface of the hydrofluoric acid polishing solution, the second magnets are distributed around the second central line, and the first central line passes through the first magnet.
Furthermore, in the direction parallel to the liquid level, any section of the second floating ball is circular, and a central section is formed on the second floating ball; the second floating ball comprises a first ball body and a second ball body, and the first ball body and the second ball body are symmetrical with the central section; the diameter of the central section is smaller than that of the ball in which the first sphere or the second sphere is located.
Further, the diameter of the ball where the first ball body or the second ball body is located is 15-50mm, and the central section of the second floating ball is 5-15 mm.
Further, when the floating body is spherical, the diameter of the floating body is 5-20mm, the interior of the floating body is of a hollow structure, a weight rod is arranged on the floating body, the weight rod and the floating ball are welded or bonded through ultrasonic waves, the diameter of the weight rod is 2-6mm, the length of the weight rod is 5-15mm, and the weight rod is made of metal materials or rubber materials.
A method of polishing AG glass comprising the steps of: immersing a plurality of pieces of AG glass in the solution tank through a mechanical device, wherein the floating body floats up to the liquid level of the hydrofluoric acid polishing solution again from the bottom of the AG glass; a plurality of air pipes penetrate through the mechanical device, air outlets of the air pipes are positioned at the bottom of the bracket and face the hydrofluoric acid polishing solution, when the bracket is immersed in the hydrofluoric acid polishing solution, the air pipes are used for ventilating, gas is discharged from the air outlets, the hydrofluoric acid polishing solution at the bottom of the bracket is disturbed, a floating body staying at the bottom of the bracket is moved and further separated from the bottom of the bracket, and the floating body floats to the liquid level of the hydrofluoric acid polishing solution again; the gas changing pipe is internally provided with a one-way valve, the one-way valve prevents hydrofluoric acid polishing solution from entering the gas pipe, and the gas pipe and the one-way valve are made of corrosion-resistant materials; immersing the AG glass for 10-20 minutes, taking the AG glass out of the solution tank, and moving the AG glass into a cleaning tank for cleaning, wherein the cleaning tank is filled with cleaning solution; after cleaning, the glass is moved to an air blowing port, and the surface of the AG glass is air-dried and then taken out by a bracket for storage.
The utility model provides a AG glass moves and carries device, includes bracket and arm, the bracket is installed in the arm below, the bracket includes a rectangular frame, rectangular frame top-down is equipped with multiunit supporting beam in proper order, and each group's supporting beam includes two relative first supporting beams and the second supporting beam that sets up, be equipped with the supporting shoe on first supporting beam and the second supporting beam lateral wall respectively, this supporting shoe is equipped with two at least.
Furthermore, a supporting groove is formed in the middle of each supporting block, a cushion is attached to the inner wall of the supporting groove and made of corrosion-resistant rubber, the AG glass is arranged in the supporting groove, the supporting beams are provided with 2-6 groups, a gap is formed between each group of supporting beams, and a connecting beam connected with the mechanical arm is arranged on the upper portion of the rectangular frame.
Further, the bracket further comprises a vertical frame, a cover plate is arranged at the top of the vertical frame, a plurality of rectangular grooves are formed in the side face of the cover plate, a plurality of supporting rods are arranged at the bottom of the vertical frame side by side and correspond to the rectangular grooves in a one-to-one mode, the supporting rods are arranged under the rectangular grooves, at least two supporting blocks are arranged on the upper end face of each supporting rod, supporting grooves are formed in the middle positions of the supporting blocks, openings of the supporting grooves face upwards, and the mechanical arm is connected with the upper end face of the cover plate.
Compared with the prior art, the invention has the following remarkable effects:
(1) the device for polishing the AG glass is provided with the solution tank for storing the hydrofluoric acid polishing solution, the plurality of floating bodies cover the liquid surface of the hydrofluoric acid polishing solution, the covering area of the floating bodies is not less than 90% of the total area of the liquid surface, the floating bodies cover the liquid surface, shielding is provided for the hydrofluoric acid polishing solution, volatilization of the hydrofluoric acid polishing solution is reduced, cost input is reduced, production efficiency is improved, the adding usage amount is further reduced, pollution of volatilization of the hydrofluoric acid polishing solution to the environment is reduced, and the effects of energy conservation and environmental protection are achieved.
(2) According to the device for polishing AG glass, the magnet is arranged in each floating body, the magnets are arranged to enable the floating bodies suspended on the liquid level to generate mutual attraction and to be close to each other for bonding, so that the floating bodies are not excessively dispersed or excessively concentrated, the covering effect is good, and volatilization of hydrofluoric acid polishing solution is reduced.
(3) The AG glass polishing device comprises at least two floating bodies, wherein the first floating ball with the larger diameter has larger volume, so that the contact surface is larger, the second floating ball with the smaller diameter surrounds the first floating ball and is attached to the surface of the first floating ball conveniently, and the attaching principle of the AG glass polishing device lies in the arrangement combination between the first magnet and the second magnet, so that the first floating ball and the second floating ball generate magnetic fields which are mutually attracted.
(4) According to the device for polishing AG glass, the first floating ball and the second floating ball are partially immersed in the hydrofluoric acid polishing solution, and the floating bodies with various shapes and different shapes are suitable for various polishing scenes, so that various choices are provided.
(5) According to the method for polishing the AG glass, after the AG glass is immersed in the hydrofluoric acid polishing solution, a part of floating bodies are synchronously brought to the depth of the hydrofluoric acid polishing solution by the AG glass, after the AG glass stops moving, the floating bodies are re-floated to the liquid surface of the hydrofluoric acid polishing solution from the bottom of the AG glass and automatically arranged on the liquid surface of the hydrofluoric acid polishing solution, the liquid surface of the hydrofluoric acid polishing solution is re-covered, the coverage rate of the liquid surface of the hydrofluoric acid polishing solution to the maximum degree is realized, and the hydrofluoric acid polishing solution is placed for volatilization.
(6) According to the AG glass transfer device, the plurality of AG glasses are simultaneously placed in the brackets developed for the AG glass transfer device, and the AG glasses are transferred by the mechanical arm, so that the chemical etching process is simultaneously and synchronously performed on the plurality of AG glasses, the production efficiency is greatly improved, the personnel investment is reduced, and the labor intensity is reduced.
Drawings
FIG. 1 is a structural view of a polishing apparatus according to an embodiment of the present invention;
FIG. 2 is a view of the floating body structure of the embodiment of the present invention;
FIG. 3 is a schematic view of the spherical float connection according to an embodiment of the present invention;
FIG. 4 is a schematic view of the connection between the first floating ball and the second floating ball according to the embodiment of the present invention;
FIG. 5 is a schematic diagram of the magnetic field of the floating body according to an embodiment of the present invention;
FIG. 6 is a schematic view of a magnet structure according to an embodiment of the present invention;
FIG. 7 is a schematic view of a first magnet according to an embodiment of the present invention;
FIG. 8 is a schematic view of a second magnet according to an embodiment of the present invention;
FIG. 9 is a diagram of a bracket structure according to an embodiment of the present invention;
FIG. 10 is a vertical frame structure of an embodiment of the present invention;
FIG. 11 is a cross beam structure of an embodiment of the present invention;
FIG. 12 is a schematic view of a solution tank according to an embodiment of the present invention.
In the figure: 1. a solution tank; 11. a liquid level; 12. an inner wall; 13. an outer wall; 14. a containment sandwich; 15. a bleed port; 16. a baffle; 17. a liquid leakage port; 2. a float; 21. a first floating ball; 22. a second floating ball; 23. a weight lever; 3. a rectangular frame; 31. a first cross member; 32. a second cross member; 33. a first support block; 34. a second support block; 52. a third support block; 331. a support groove; 4. AG glass; 5. a vertical frame; 51. a support bar; 53. a cover plate; 6. a magnet; 61. a first magnet; 62. a second magnet.
Detailed Description
The invention will be further described with reference to the accompanying drawings.
In which the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout, and the embodiments described in the drawings are exemplary only, and are not to be construed as limiting the present invention.
In the description of the present invention, it is to be understood that the terms "center", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "axial", and the like indicate orientations or positional relationships based on those shown in the drawings, and are used merely for convenience of description and for simplicity of description, and do not indicate or imply that the referenced device or element must have a particular orientation, be constructed and operated in a particular orientation, and thus, are not to be construed as limiting the present invention. In addition, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature, and in the description of the invention, "plurality" means two or more unless otherwise indicated.
According to the figure 1, the device for polishing AG glass comprises a solution tank 1 for storing hydrofluoric acid polishing solution, after a certain amount of stored hydrofluoric acid polishing solution is contained in the solution tank 1, a plurality of floating bodies 2 capable of suspending on a liquid surface 11 are placed in the solution tank 1, the placed floating bodies 2 at least cover 90% of the area of the liquid surface 11 of the hydrofluoric acid polishing solution, and a tight covering object is formed on the liquid surface 11 of the floating bodies 2 through the floating bodies 2, so that the hydrofluoric acid polishing solution is reduced in direct contact with air, volatilization of the hydrofluoric acid polishing solution is reduced, the supplement times and supplement amount of the hydrofluoric acid polishing solution are reduced, the purposes of reducing cost input and labor amount are achieved, and the harm of the hydrofluoric acid polishing solution to human health is reduced due to the fact that the number of times of contacting the hydrofluoric acid polishing solution is reduced.
Since the hydrofluoric acid polishing solution is volatile, and the liquid level in the solution tank 1 is lower and lower after volatilization, when a plurality of pieces of AG glass 4 are immersed in the hydrofluoric acid polishing solution, the AG glass 4 on the upper layer may not contact the hydrofluoric acid polishing solution, thereby affecting the production efficiency of the AG glass 4; after the hydrofluoric acid polishing solution volatilizes, in order to guarantee production efficiency, workers need to stay aside for observation, when the liquid level of the hydrofluoric acid polishing solution is reduced to a certain value, the hydrofluoric acid polishing solution is filled manually, the body health of the workers is seriously affected, the acidic hydrofluoric acid polishing solution also seriously pollutes the environment after being volatilized, on the basis, a stacked state is achieved by placing the multilayer floating bodies 2, the liquid level 11 of the hydrofluoric acid polishing solution is completely covered, the effect of reducing volatilization of the hydrofluoric acid polishing solution is achieved, the frequency of adding liquid to the hydrofluoric acid polishing solution is further reduced, the production efficiency is improved, the stay time of the workers is reduced, the body health of the workers is protected, the volatilization is reduced, and the pollution to the environment is reduced.
Specifically, by changing the weight of the floating body 2, the suspension height of the floating body 2 on the liquid surface 11 of the hydrofluoric acid polishing solution is as follows: the height above the liquid level 11 of the hydrofluoric acid polishing solution is H1, the height of the floating body 2 below the liquid level 11 of the hydrofluoric acid polishing solution is H2, wherein H1: H2 are 2:1, the weight of the floating body 2 is light, and the upper part of the floating body is exposed to the larger part of the liquid level 11; h1, H2 is 1:2, the floating body 2 has heavier mass, the upper part of the floating body is exposed out of a smaller part on the liquid surface 11 and is immersed into a larger part in hydrofluoric acid polishing solution; h1: H2 is 1:1, the floating body 2 is symmetrical by taking the liquid surface 11 as a central line, and the part exposed out of the liquid surface 11 is equal to the part immersed in the hydrofluoric acid polishing solution.
Wherein the hydrofluoric acid polishing solution consists of 3 parts of 60% hydrofluoric acid, 5 parts of water and 1 part of 90% sulfuric acid; or 30 percent of hydrofluoric acid, 60 percent of hydrochloric acid, 0.3 to 0.8 percent of cerium oxide and the balance of water.
As shown in fig. 2, the floating body 2 includes a first floating ball 21 and a second floating ball 22, the diameter of the first floating ball 21 is smaller than that of the second floating ball 22, the first floating ball 21 and the second floating ball 22 with different diameters can cover the liquid level 11 more tightly, the first floating ball 21 with smaller diameter surrounds the second floating ball 22 with larger diameter, the second floating ball 22 with larger diameter plays a role in limiting and positioning, specifically, the buoyancy with larger diameter is larger, when the first floating ball 21 and the second floating ball 22 are mixed and placed in the solution tank 1, the first floating ball 21 and the second floating ball 22 can be squeezed with each other, at this time, the first floating ball 21 is pushed to the periphery of the second floating ball 22 automatically due to small size and light weight, the floating body 2 is made of teflon or polypropylene, and the outer surface of the floating body 2 is coated with a uniform corrosion-resistant nano layer.
As shown in fig. 3, when the floating bodies 2 are spherical, the diameter of each floating body 2 is 5-20mm, each floating body 2 has a magnet 6 therein, two adjacent floating bodies 2 are attracted to each other by the magnets 6, specifically, two or more other floating bodies 2 are attracted together by the magnetic attraction force to form a large coverage area.
As shown in fig. 4, when the floating body 2 includes a first floating ball 21 and a second floating ball 22, the diameter of the ball where the first ball or the second ball is located is 15-50mm, the central section of the second floating ball 22 is 5-15mm, and the diameter of the first floating ball 21 is smaller than that of the second floating ball 22, the first floating ball 21 with the smaller diameter surrounds the second floating ball 22 with the larger diameter, and the included angle positions of the arc surfaces around the second floating ball 22 are filled up, so that the condition that the floating balls are in a large neutral position after being tightly attached is reduced.
As shown in fig. 5, the floating bodies 2 are hollow round balls or hollow oval balls made of corrosion-resistant materials, each floating body 2 is provided with a magnet 6, the magnets 6 are used for enabling suction force to be generated between the floating balls, so that the floating balls are attached more tightly, the floating balls are made of polyethylene materials, the floating balls are uniformly suspended on the liquid level 11, the magnets 6 are spherical magnets or rectangular magnets, the spherical magnets or the rectangular magnets are arranged in the floating balls, the weight of the spherical magnets or the rectangular magnets is smaller than the buoyancy of hydrofluoric acid polishing liquid, the magnets 6 are annular magnetic stripes, the annular magnetic stripes are adhered to the middle positions of the outer surfaces of the floating balls, and corrosion-resistant coatings are respectively coated on the outer surfaces of the annular magnetic stripes and the joints of the side edges of the annular magnetic stripes and the floating balls.
Specifically, the floating body 2 is provided with the magnet 6 to realize the fast attraction and adhesion between the floating bodies 2, when the work is not needed, the floating body 2 is suspended on the liquid level 11 of hydrofluoric acid polishing solution, the magnetic fields mutually attracted between the magnets 6 enable the floating bodies 2 to be tightly adhered together to form a covering surface, the volatilization of the hydrofluoric acid polishing solution is reduced, when AG glass 4 is transplanted by a mechanical device and soaked into the hydrofluoric acid polishing solution, the floating body 2 on the liquid level 11 of the hydrofluoric acid polishing solution is scattered by pressure, as the AG glass 4 descends to the bottom of the solution tank 1, a part of the floating body 2 descends along with the AG glass 4 passively, when the AG glass 4 descends deeply to the hydrofluoric acid polishing solution, the floating force generated by the liquid on the floating body 2 and the pressure generated when the AG glass 4 descends to force the driven floating body 2 to move to one side and separate from the lower part of the AG glass 4, the floating body 2 floats to the liquid level 11 again in the hydrofluoric acid polishing solution, and is attracted to and attached to the other floating bodies 2 again.
As shown in fig. 12, in another embodiment, a weight rod 23 is disposed on the floating body 2, the weight rod 23 is ultrasonically welded or bonded to the floating body 2, the diameter of the weight rod 23 is 2-6mm, the length of the weight rod 23 is 5-15mm, the weight rod 23 is made of metal or rubber, when the floating body 2 is not equipped with a magnet, the weight rod 23 is disposed to stabilize the position of the floating body 2 on the liquid level 11 of the hydrofluoric acid polishing solution, and when the floating body 2 floats upwards, the weight rod 23 is heavy, so that the weight rod 23 is located at the bottom of the floating body 2 and perpendicular to the liquid level, and further pulls the floating body 2 to be perpendicular to the liquid level, the buoyancy generated by the floating body 2 is greater than the gravity of the weight rod 23, the floating body 2 floats upwards to the liquid level, and the gravity of the weight rod 23 provides a certain pulling force to the floating body 2, so that the floating body 2 does not float arbitrarily, and the floating bodies 2 are tightly attached to the liquid level, And the liquid is hermetically arranged on the liquid surface 11 of the hydrofluoric acid polishing solution.
As shown in fig. 6-8, the floating bodies 2 generate mutually attracting magnetic fields through the magnetic bodies 6, the magnetic bodies 6 include a first magnet 61 and a second magnet 62, the plurality of floating bodies 2 filled with the hydrofluoric acid polishing solution are tightly attached to each other under the intervention of the magnetic fields, so that the floating bodies are tightly connected and cannot be scattered, gaps between the floating bodies 2 are small, the floating bodies effectively cover the liquid surface 11 of the hydrofluoric acid polishing solution, and the volatilization reduction effect is realized, wherein the first magnet 61 is arranged in the first floating ball 21, and the second magnet 62 is arranged in the second floating ball 22.
The solution tank 1 comprises an outer wall 13 and an inner wall 12, a containing interlayer 14 is formed between the outer wall 13 and the inner wall 12, the upper end of the inner wall 12 is provided with a drainage port 15 communicated with the containing interlayer 14, a guide plate 16 is arranged in the containing interlayer 14, the baffle 16 divides the containing interlayer 14 into an upper part and a lower part, the baffle 16 inclines from the middle part of the containing interlayer 14 to two sides, the lowest part of the guide plate 16 is provided with a liquid leakage port 17, the guide plate 16 is positioned below the discharge port 15, the lower part of the containing interlayer 14 is communicated with the solution tank, the discharge port 15 is covered with a filter screen, the solution tank 1 is also provided with a liquid inlet pipe which passes through the outer wall 13 and extends into the lower part of the containing interlayer 14, the solution tank 1 is rectangular or cylindrical, when the solution tank 1 is rectangular, the four surfaces of the solution tank are respectively provided with the containing interlayers 14 with communicated lower parts.
As shown in fig. 12, the hydrofluoric acid polishing solution is filled in a solution tank 1, the solution tank 1 is made of one of glass fiber reinforced plastic, corrosion-resistant stainless steel and acid-resistant cast iron, the inner wall 12 of the solution tank 1 is further coated with a corrosion-resistant coating, the hydrofluoric acid polishing solution is prepared by adding 55% hydrofluoric acid stock solution into water, the concentration of the prepared hydrofluoric acid polishing solution is 5% -10%, and the concentration of the hydrofluoric acid polishing solution refers to the concentration of hydrofluoric acid in water.
In particular, because the volume of the solution tank 1 is larger, when the hydrofluoric acid polishing solution is manually filled into the solution tank during use, the liquid level can not be observed in time, the hydrofluoric acid polishing solution stored in the AG glass is too much, when the AG glass 4 needs to be polished, the volume of the AG glass 4 will press the hydrofluoric acid polishing solution in the solution tank 1 to make the hydrofluoric acid polishing solution rise, which may cause the hydrofluoric acid polishing solution to overflow, causing safety accidents, the accommodating interlayer 14 is provided, and when the hydrofluoric acid polishing solution overflows, enters the upper part of the containing interlayer 14 through the leakage port 15, prevents hydrofluoric acid polishing solution from overflowing, protects the personal safety of operators, after the AG glass 4 is polished and taken out, the hydrofluoric acid polishing solution falls back, flows to the lower portion of the accommodating interlayer 14 through the inclined guide plate 16 via the liquid leakage port 17, and flows back into the solution tank 1.
As shown in fig. 9, the AG glass transfer apparatus of the present invention includes a bracket and a robot arm, the bracket is installed below the robot arm, the bracket includes a rectangular frame 3, the rectangular frame 3 is sequentially provided with a plurality of groups of support beams from top to bottom, six positive surfaces of the rectangular frame 3 are hollow structures, the cross beams are installed on two opposite surfaces of the rectangular frame 3 with a longer length, if the first cross beam 31 is installed on the left side of the rectangular frame 3, the second cross beam 32 is installed on the right side of the rectangular frame 3, the second cross beam 32 is provided with two second support blocks 34 in parallel, the length surface of the first cross beam 31 is provided with two first support blocks 33 in parallel, the middle portions of the first support blocks 33 and the second support blocks 34 are both provided with support grooves 331, the AG glass 4 is placed in the support grooves 331, and the cross beams are sequentially arranged from top to bottom.
When the AG glass 4 is loaded, firstly lifting the AG glass 4 and changing the AG glass 4 into a horizontal direction, respectively inserting the front end of the AG glass 4 into a first supporting groove 331 of a same group of supporting beams, pushing the AG glass 4 to the bottom by external force, specifically pushing the front end of the AG glass 4 into a last supporting groove 331, finally horizontally arranging the AG glass 4, wherein 2-6 groups of supporting beams are arranged, 2-6 AG glass 4 can be arranged, and after the AG glass 4 is completely arranged, the bracket is driven by a mechanical arm to move, and finally the bracket is soaked into hydrofluoric acid polishing solution in the solution tank 1, specifically, the AG glass 4 is completely soaked into the hydrofluoric acid polishing solution for 10-20 minutes.
As shown in fig. 10, the bracket is provided as a vertical frame 5, the top of the vertical frame 5 is provided with a cover plate 53 with a rectangular groove, the bottom of the vertical frame 5 is provided with a support rod 51 having the same structure as the support beam, the support rod 51 is provided with a third support block 52 and is provided with a support groove 331, the support groove 331 has an opening facing upward and corresponding to the rectangular groove, when in use, the AG glass 4 is firstly erected, the bottom of the AG glass 4 is inserted into the support groove 331 at the outermost side, the top of the AG glass 4 is inserted into the corresponding rectangular groove, the AG glass 4 is pushed inward by external force until the AG glass 4 contacts the innermost side of the rectangular groove, the AG glass 4 is limited and fixed, and the mechanical arm moves and immerses the AG glass into the solution tank 1.
As shown in fig. 11, each set of beams includes a first beam 31 and a second beam 32, which are symmetrically disposed, and any two beams are symmetrically disposed, the first beam 31 and the second beam 32 are different in that the positions thereof are not on the same side, but on opposite sides, two ends of each set of beams are respectively and fixedly connected to the rectangular frame 3, a plurality of beams sequentially disposed from top to bottom are respectively spaced, and the opening positions of the supporting grooves 331 are horizontal, so that the AG glass 4 can be conveniently and quickly placed in the bracket.
The working process of the invention is as follows: manually loading the AG glass 4 into the brackets one by one, then lifting the brackets by the mechanical arm, shifting the brackets to the position above the solution tank 1, slowly placing the brackets into the solution tank 1 to ensure that the AG glass 4 in the brackets is partially and completely immersed into hydrofluoric acid polishing solution, standing the brackets in the hydrofluoric acid polishing solution for 10-20 minutes, then lifting, shifting to the next station, and carrying out the next process treatment.
The specific method for polishing the AG glass 4 comprises the following steps: immersing the bracket loaded with a plurality of pieces of AG glass 4 in the solution tank 1 by using the mechanical arm, wherein the floating body 2 floats up to the liquid level 11 of the hydrofluoric acid polishing solution again from the bottom of the AG glass 4; when the floating body 2 is retained at the bottom of the bracket and cannot float naturally, a plurality of air pipes penetrate through the mechanical device, air outlets of the air pipes are positioned at the bottom of the bracket and face hydrofluoric acid polishing liquid at the bottom of the bracket, when the bracket is immersed in the hydrofluoric acid polishing liquid, the air pipes are used for ventilating, air is discharged from the air outlets, the hydrofluoric acid polishing liquid at the bottom of the bracket is disturbed, the floating body 2 retained at the bottom of the bracket is moved, further leaves from the bottom of the bracket and floats to the liquid level 11 of the hydrofluoric acid polishing liquid again; the air pipe is internally provided with a one-way valve, the one-way valve prevents hydrofluoric acid polishing solution from entering the air pipe, and the air pipe and the one-way valve are made of corrosion-resistant materials; after immersing the AG glass 4 for 20 minutes, taking out the AG glass 4 from the solution tank 1; moving the AG glass 4 into a cleaning tank for cleaning, wherein the cleaning tank is filled with cleaning solution; after cleaning, the AG glass is moved to an air blowing port, the surface of the AG glass 4 is air-dried, and then the AG glass is taken out from the bracket for transportation, packaging and storage.
The foregoing is a more detailed description of the invention in connection with specific preferred embodiments and it is not intended that the invention be limited to these specific details. For those skilled in the art to which the invention relates, several simple deductions or substitutions may be made without departing from the spirit of the invention, and all shall be considered as belonging to the scope of the invention.
Claims (10)
1. An apparatus for polishing AG glass, characterized in that: comprises that
A solution tank for storing hydrofluoric acid polishing solution;
the floating bodies are suspended on the liquid surface of the hydrofluoric acid polishing solution and at least cover 90% of the area of the liquid surface of the hydrofluoric acid polishing solution;
the height of the floating body above the liquid level of the hydrofluoric acid polishing solution is H1, the height of the floating body below the liquid level of the hydrofluoric acid polishing solution is H2, and H1: H2 is 2:1-1: 2;
the hydrofluoric acid polishing solution consists of 3 parts of 60% hydrofluoric acid, 5 parts of water and 1 part of 90% sulfuric acid; or 30 percent of hydrofluoric acid, 60 percent of hydrochloric acid, 0.3 to 0.8 percent of cerium oxide and the balance of water;
the solution tank includes outer wall and inner wall, it holds the intermediate layer to form one between outer wall and the inner wall, the inner wall upper end is opened have and is held the communicating bleeder port of intermediate layer, it is equipped with a guide plate in the intermediate layer to hold, and this guide plate will hold the intermediate layer and divide into upper portion and lower part, the guide plate is by holding the intermediate layer middle part to both sides slope, the opening of the lowest portion of guide plate has the weeping mouth, the guide plate is located bleeder port below, it communicates with each other with the solution tank to hold the intermediate layer lower part, it has the filter screen to cover on the bleeder port, the solution tank still has a feed liquor pipe, the feed liquor pipe passes the outer wall stretches into and holds the intermediate layer lower part.
2. The apparatus for polishing AG glass according to claim 1, wherein: each floating body is internally provided with a magnet, two adjacent floating bodies are mutually attracted and attached through the magnets, the floating bodies are made of polytetrafluoroethylene or polypropylene, and the outer surfaces of the floating bodies are uniformly coated with corrosion-resistant nano layers.
3. An apparatus for polishing AG glass according to claim 2, wherein: the floating body comprises a first floating ball and a second floating ball, the diameter of the first floating ball is smaller than that of the second floating ball, a first magnet is arranged in the first floating ball, a second magnet is arranged in the second floating ball, the first floating ball is provided with a first central line perpendicular to the liquid surface of the hydrofluoric acid polishing solution, the second floating ball is provided with a second central line perpendicular to the liquid surface of the hydrofluoric acid polishing solution, the second magnets are distributed around the second central line, and the first central line passes through the first magnets.
4. An apparatus for polishing AG glass according to claim 3, wherein: in the direction parallel to the liquid level, any section of the second floating ball is circular, and a central section is formed on the second floating ball; the second floating ball comprises a first ball body and a second ball body, and the first ball body and the second ball body are symmetrical with the central section; the diameter of the central section is smaller than the diameter of a ball in which the first sphere or the second sphere is located.
5. An apparatus for polishing AG glass according to claim 4, wherein: the diameter of the ball where the first ball body or the second ball body is located is 15-50mm, and the central section of the second floating ball is 5-15 mm.
6. An apparatus for polishing AG glass according to claim 1, wherein: when the floating body is spherical, the diameter of the floating body is 5-20mm, the interior of the floating body is of a hollow structure, a weight rod is arranged on the floating body, the weight rod and the floating ball are welded or bonded by ultrasonic waves, the diameter of the weight rod is 2-6mm, the length of the weight rod is 5-15mm, and the weight rod is made of metal materials or rubber materials.
7. A method of polishing AG glass, comprising the steps of:
providing an apparatus for polishing an AG glass as defined in any one of claims 1 to 6;
immersing a bracket loaded with a plurality of pieces of the AG glass immersion liquid in the solution tank by using a mechanical device, wherein the floating body floats up again from the bottom of the AG glass to the liquid level of the hydrofluoric acid polishing liquid;
a plurality of air pipes penetrate through the mechanical device, air outlets of the air pipes are positioned at the bottom of the bracket and face the hydrofluoric acid polishing solution, when the bracket is immersed in the hydrofluoric acid polishing solution, the air pipes are used for ventilating, gas is discharged from the air outlets, the hydrofluoric acid polishing solution at the bottom of the bracket is disturbed, a floating body staying at the bottom of the bracket is moved and further separated from the bottom of the bracket, and the floating body floats to the liquid level of the hydrofluoric acid polishing solution again;
the gas changing pipe is internally provided with a one-way valve, the one-way valve prevents hydrofluoric acid polishing solution from entering the gas pipe, and the gas pipe and the one-way valve are made of corrosion-resistant materials;
after immersing the AG glass for 10-20 minutes, taking the AG glass out of the solution tank;
moving the AG glass into a cleaning tank for cleaning, wherein cleaning solution is filled in the cleaning tank;
after cleaning, the glass is moved to an air blowing port, and the surface of the AG glass is air-dried and then taken out by a bracket for storage.
8. An AG glass transfer apparatus used in the method for polishing AG glass according to claim 7, characterized in that: including bracket and arm, the bracket is installed in the arm below, the bracket includes a rectangular frame, rectangular frame top-down is equipped with multiunit supporting beam in proper order, and each group's supporting beam all includes two relative first supporting beams and the second supporting beam that sets up, be equipped with the supporting shoe on first supporting beam and the second supporting beam lateral wall respectively, this supporting shoe is equipped with two at least.
9. The AG glass transfer apparatus according to claim 8, wherein: the supporting device is characterized in that a supporting groove is formed in the middle of the supporting block, a cushion is attached to the inner wall of the supporting groove and made of corrosion-resistant rubber, the AG glass is arranged in the supporting groove, the supporting beams are provided with 2-6 groups, a gap is formed between each group of supporting beams, and a connecting beam connected with the mechanical arm is arranged on the upper portion of the rectangular frame.
10. The AG glass transfer apparatus according to claim 8, wherein: the bracket further comprises a vertical frame, a cover plate is arranged at the top of the vertical frame, a plurality of rectangular grooves are formed in the side face of the cover plate, a plurality of supporting rods are arranged at the bottom of the vertical frame side by side and correspond to the rectangular grooves in a one-to-one mode, the supporting rods are arranged under the rectangular grooves, at least two supporting blocks are arranged on the upper end face of each supporting rod, supporting grooves are formed in the middle positions of the supporting blocks, openings of the supporting grooves face upwards, and the mechanical arm is connected with the upper end face of the cover plate.
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| Application Number | Priority Date | Filing Date | Title |
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| CN202210450204.XA CN114656158A (en) | 2022-04-26 | 2022-04-26 | Device, method and transfer device for polishing AG glass |
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| Application Number | Priority Date | Filing Date | Title |
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| CN202210450204.XA CN114656158A (en) | 2022-04-26 | 2022-04-26 | Device, method and transfer device for polishing AG glass |
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| CN114656158A true CN114656158A (en) | 2022-06-24 |
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| CN202210450204.XA Pending CN114656158A (en) | 2022-04-26 | 2022-04-26 | Device, method and transfer device for polishing AG glass |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115421254A (en) * | 2022-09-23 | 2022-12-02 | 中国科学院微电子研究所 | Processing method of optical fiber hole and processing equipment based on same |
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| US20070037358A1 (en) * | 2005-08-12 | 2007-02-15 | Jiwontech Co., Ltd. | Apparatus for etching a glass substrate |
| JP2014069886A (en) * | 2012-10-01 | 2014-04-21 | Aramu Kk | Liquid surface covering float |
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