CN114647149A - Full-water-base multipurpose silk photoresist based on EvH-converted composite silk and preparation method thereof - Google Patents

Abstract

The invention provides an all-water-based multi-purpose silk photoresist based on EvH-transformed composite silk and a preparation method thereof. The all-water-based multi-purpose silk photoresist is prepared from the silk of the silkworm strain of the transgenic bag moth repeating motif EvH, It includes Bombyx mori silk fibroin and water solvent of the transgenic bag moth. An all-water-based multi-purpose silk photoresist based on EvH-transformed composite silk of the present invention utilizes Bombyx mori silk for industrial production, and is based on the good biocompatibility, biodegradability, physical and chemical stability of Bombyx mori silk, and adopts Bombyx mori fibroin was used to prepare an all-water-based photoresist, which satisfies the environmental friendliness of the processing technology. The photoresist of the invention is genetically improved by using natural silkworm silk protein, and based on the balance control between mechanical properties and molecular weight, a high-resolution micro-nano pattern is realized.

Description

A kind of all-water-based multi-purpose silk photoresist based on trans-EvH composite silk and preparation method thereof

technical field

The invention belongs to the technical field of bioelectronic information, in particular to an all-water-based multipurpose silk photoresist based on EvH-transformed composite silk and a preparation method thereof.

Background technique

Semiconductor chips are an important foundation of information technology. The semiconductor industry has experienced more than 70 years of development since its birth in the 1940s and 1950s. Its rapid development is inseparable from the progress of the core process—lithography. Among them, photoresist is one of the key materials necessary for the lithography process and the most technically difficult. It plays a crucial role in the development of semiconductor technology and has been monopolized by international companies. Domestic substitution must be the general trend. At present, most commercial photoresists use synthetic polymers or add toxic and harmful organic reagents during production, which is detrimental to human health, has certain harm to the ecological environment, and is not conducive to the sustainable development of green ecology.

It is reported that the genetically recombined spider silk protein is used as an all-water-based photoresist. Based on the β-sheet of the secondary structure in the spider silk protein to control its water solubility, multi-dimensional and cross-scale micro-nano structures can be prepared. However, the cost of raising spiders is high and the required raising environment is very harsh, which is not suitable for large-scale application. Faced with the rapidly increasing industrial demand, it is urgent to find an all-water-based photoresist that is suitable for industrial needs and has little negative effect on the environment.

SUMMARY OF THE INVENTION

Based on the above technical problems existing in the prior art, the present invention provides an all-water-based multipurpose silk photoresist based on trans-EvH composite silk and a preparation method thereof.

According to the first aspect of the technical solution of the present invention, there is provided an all-water-based multi-purpose silk photoresist based on trans-EvH composite silk, and the all-water-based multi-purpose silk photoresist is composed of a silkworm strain of a transgenic bag moth repeating motif EvH. The silk is prepared, which includes the silk fibroin of the transgenic bag moth and a water solvent, and the all-water-based photoresist realizes high-resolution micro-nano patterns.

Among them, the molecular weight of silk fibroin is about 25kDa. Further, the form of silk fibroin is liquid or solid powder, and the water solvent is ultrapure water. Bombyx mori silk fibroin components include silk fibroin heavy chain, silk fibroin light chain and glycoprotein. Preferably, silk fibroin is used as a negative glue, or as a positive glue.

According to the second aspect of the technical solution of the present invention, a method for preparing an all-water-based multipurpose silk photoresist based on trans-EvH composite silk is provided, which comprises the following steps:

Step S1, utilize the trans-EvH composite silk to extract silk fibroin;

In step S2, a photoresist pattern is prepared by exposing with a focused ion beam and an electron beam.

Wherein, step S1 further includes step S1-1, degumming: after boiling the 0.5% (M/V) sodium carbonate solution, put the EvH composite silkworm cocoon shell into the sodium carbonate solution at a liquor ratio of 1:100, and cook for 30min -90min (minutes), preferably boiled for 50min, to remove sericin without excessive damage to silk fibroin.

In addition, step S1 further includes step S1-2, after washing the boiled EvH-transformed composite silk in running tap water, immersing it in a cleaning solution, after soaking in the cleaning solution for 30 minutes, changing the cleaning solution once, repeating three times, the The residual sericin is fully cleaned, and then the cleaned EvH-transformed composite silkworm silk is placed in a 60° C. oven for 6h-12h (hours) to dry for use; the cleaning solution is deionized water.

Further, step S1 further includes steps S1-3, wherein anhydrous calcium chloride, anhydrous ethanol, and an aqueous solution are prepared in a molar ratio of 1:2:8 to obtain a silk fibroin dissolving solution, and a certain liquor ratio is taken at a bath ratio of 1:10. The amount of silk fiber is put into the silk fibroin dissolving solution, and the silk fiber is completely dissolved under the constant temperature of 30℃-100℃. At this time, there should be no obvious silk insoluble matter in the dissolving solution; the dissolving temperature is 70 °C.

Compared with the prior art, the beneficial effects of a kind of all-water-based multi-purpose silk photoresist based on trans-EvH composite silk and preparation method thereof of the present invention are as follows:

1, a kind of all-water-based multipurpose silk photoresist based on trans-EvH composite silk of the present invention, utilizes Bombyx mori silk to carry out industrialized production, based on the good biocompatibility, biodegradability, physical and chemical stability of Bombyx mori silk, An all-water-based photoresist was prepared by using Bombyx mori fibroin, which satisfies the environmental friendliness of the processing technology.

2. The photoresist of the present invention uses natural silkworm silk protein for genetic improvement, and realizes high-resolution micro-nano patterns based on the balance control between mechanical properties and molecular weight.

3. The present invention proposes to transfer the transgenic bag moth silk protein repeat motif EvH into Bombyx mori silk protein to obtain Bombyx mori silk of a transgenic strain with improved mechanical properties, and to prepare an all-water-based, multi-purpose photoresist with excellent performance. .

4. The photoresist of the present invention is not only simple and low-cost in preparation process, but also conducive to large-scale production of photoresist, which can meet the environmental friendliness of the processing technology, and can also be used for direct preparation of excellent mechanical properties and good etching resistance. , High-precision micro-nano patterns.

5. The all-water-based multi-purpose silk photoresist based on trans-EvH composite silk and the preparation method thereof of the present invention are based on the silk protein polymorphic structure, which can be used as both an electron beam photoresist and an ion beam photoresist. It can realize "positive and negative dual-use", which can be used to optimize commercial photoresist, and has a good application prospect in the field of integrated circuit micro-nano processing.

Description of drawings

Accompanying drawing 1 is the photoresist sample that utilizes FibH promoter to express EvH protein

Accompanying drawing 2 is the photoresist sample molecular size detection result of utilizing FibH promoter to express EvH protein (for genetically modified silkworm EvH silk protein molecule SDS-PAGE detection figure);

Accompanying drawing 3 is the photoresist electron beam negative glue pattern schematic diagram of utilizing FibH promoter to express EvH protein;

Accompanying drawing 4 is the photoresist ion beam negative glue pattern schematic diagram of utilizing FibH promoter to express EvH protein;

5 is a schematic diagram of a photoresist ion beam positive photoresist pattern using the FibH promoter to express EvH protein;

Detailed ways

The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the technical solutions, rather than all the embodiments. . Based on the embodiments of this technical solution, all other embodiments obtained by those of ordinary skill in the art without creative work fall within the protection scope of the present invention. In addition, the scope of protection of the present invention should not be limited only to the specific structures or components or specific parameters described below.

The present invention proposes an all-water-based multi-purpose silk photoresist based on trans-EvH (repeat motif of silkworm silk protein) composite silk. The silkworm silk has mechanical properties that exceed those of spider silk. The sequence was transferred into Bombyx mori fibroin as the target protein.

The all-water-based multipurpose silk photoresist comprises silk protein and an aqueous solution extracted from a silkworm strain, and the silkworm strain is a silkworm strain with a transgenic bag moth repeating motif EvH. Further, by controlling the degree of cross-linking of Bombyx mori fibroin, the "positive and negative dual-use" of high-toughness silk full water-based multi-purpose photoresist can be realized. Can also be used as positive glue. The all-water-based multi-purpose silk based on EvH-transformed composite silk used as a negative glue is insoluble in water after exposure, and the exposed part is left to form a pattern after development; The multi-purpose silk needs to be cross-linked, the part exposed to light is soluble in water, and the unilluminated part is left to form a pattern after development.

The photoresist of the invention is not only technically simple and low-cost, but also suitable for mass production of photoresist, which can meet the environmental friendliness of the processing technology, and can also be used for direct preparation of excellent mechanical properties, good etching resistance and high precision. micro-nano patterns. The photoresist of the present invention is based on the polymorphic structure of silk protein, and can be used as both an electron beam photoresist and an ion beam photoresist. It has a good application prospect in the field of integrated circuit micro-nano processing.

A kind of preparation method of the all-water-based multi-purpose silk photoresist based on trans-EvH composite silk of the present invention, it comprises the following steps:

Step S1, utilize the trans-EvH composite silk to extract silk fibroin;

In step S2, a photoresist pattern is prepared by exposing with a focused ion beam and an electron beam.

Wherein step S1 further comprises the following steps:

Step S1-1, degumming: after boiling the 0.5% (M/V) sodium carbonate solution, put the EvH composite silkworm cocoon shells into the sodium carbonate solution at a liquor ratio of 1:100, and cook for 30min-90min (minutes), Preferably cook for 50min to remove sericin without excessive damage to silk fibroin;

Step S1-2, after washing the boiled EvH-transformed composite silk in running tap water, immersing it in the cleaning solution, after soaking in the cleaning solution for 30 minutes, changing the cleaning solution once, and repeating it three times, the residual sericin can be fully cleaned, Subsequently, the cleaned EvH-transformed composite silk was placed in a 60° C. oven for 6h-12h (hours) and dried for later use; the cleaning solution was deionized water;

In step S1-3, anhydrous calcium chloride, anhydrous ethanol, and an aqueous solution are prepared in a molar ratio of 1:2:8 to obtain a silk fibroin dissolving solution, and a certain amount of silk fibers is taken and placed in silk fibroin in a liquor ratio of 1:10. In the protein dissolving solution, under the constant temperature dissolving at any temperature of 30℃-100℃, the silk fibers are completely dissolved, and there should be no obvious silk insoluble matter in the dissolving solution at this time; The preferred dissolution temperature is 70°C;

In step S1-4, the dissolved silk fibroin solution is placed in a dialysis bag for dialysis for 72h to remove salts and small molecular peptides, the interception of the dialysis bag is 8kDa-14kDa, and the water is changed every 3h-5h during the dialysis process;

In step S1-5, the silk fibroin solution is placed in a dialysis bag to be air-dried and concentrated to obtain a certain concentration of silk fibroin aqueous solution, which can be concentrated to 1% to 30% w/w (mass percent g/g) according to subsequent process requirements, preferably The concentration is 3% to 7% w/w (mass percentage g/g), and after concentrating, an all-water-based photoresist solution of genetically modified silk is obtained, which is stored at low temperature (4° C.). The method for measuring the concentration of silk fibroin solution is as follows: after measuring the weight m ₁ of a petri dish, add 0.5 ml of silk fibroin solution to the petri dish to determine its weight m ₂ , and make it dry at 60°C for 4h-12h After the silk protein is dried, the weight m ₃ of the petri dish containing the silk protein solution is determined, and finally the concentration of the concentrated silk protein aqueous solution is calculated by (m ₂ -m ₁ )/(m ₃ -m ₁ ). The molecular weight of silk protein in aqueous solution is about 25kDa or more.

Here, compared with the traditional photoresist, the photoresist of the present invention mainly contains three kinds of silk fibroin (FibH, FibL, P25) and exogenous bag moth silk protein (EvH), using water as a solvent, without any The organic reagent meets the current development needs of green lithography technology. In addition, the method for preparing genetically modified all-water-based photoresist is simple, efficient and low-cost, which is conducive to large-scale production and greatly expands the development and utilization of the sericulture industry.

In addition, compared with ordinary silk photoresist, the all-water-based photoresist based on genetically modified Bombyx mori silk protein (expressing exogenous bag moth silk protein EvH) has excellent mechanical properties, good etching resistance, and high resolution. The outstanding advantages of the series are that the resolution can reach up to 30nm, which can meet the processing of higher-precision micro-nano patterns and has important utilization value.

In step S2, the photoresist is obtained by exposing the focused ion beam/electron beam, which specifically includes the following steps:

In step S2-1, the transgenic silk fibroin aqueous solution obtained in step S1 is spin-coated on the silicon wafer. When the silk fibroin aqueous solution is spin-coated, the volume of the transgenic silk fibroin aqueous solution used is 0.1 mL to 1 mL (milliliter), and the volume of the spin-coating equipment is 0.1 mL to 1 mL. The rotation speed is 1r/min～5000r/min (revolution/min), and the spin coating time is 10s～10min. After spin coating, curing, curing temperature is 30℃～120℃, curing time is 0.3min～50min; preferably curing temperature is 50℃～100℃, curing time is 5min～30min.

Step S2-2, exposing the uniform genetically modified Bombyx mori silk fibroin thin film formed by curing by selective focused ion beam or electron beam. The accelerating voltage of electron beam exposure is 30kV, the dose dose is 0.5-300C cm-2 (coulomb/square centimeter); the accelerating voltage of focused ion beam is 30kV, the beam current is 2pA, and the exposure time is 0.01s-5s.

In step S2-3, the exposed transgenic silk fibroin film is placed in water for development and drying to obtain a transgenic silk fibroin structure; ultrapure water is preferably used for development, and the development time is 1s to 7200s, and the negative glue pattern obtained after development The genetically modified Bombyx mori silk protein can be transformed by radiation based on the secondary conformation, and the exposed part changes from random coil to helical shape, which is not easy to dissolve after developing, and forms a convex structure with better definition.

To prepare the genetically modified silk fibroin positive gel pattern, the genetically modified silk fibroin film needs to be cross-linked. The cross-linking method is to soak in methanol reagent for 5s to 7200s, preferably, methanol for 30min (minutes) , the secondary conformation of the genetically modified Bombyx mori fibroin is transformed into a β-sheet, and the exposed part is transformed into a short polypeptide by irradiation. The resolution of the all-water-based multipurpose silk photoresist prepared from the trans-EvH composite silk can reach 20nm.

The invention is a composite silkworm silk photoresist based on genetic modification, and the photoresist is an all-water-based photoresist prepared by transferring the repeating motif EvH, which determines excellent mechanical properties, in the silkworm silk into a transgenic silkworm strain. . The composite silk from which EvH was transferred into Bombyx mori has excellent mechanical properties. In addition, the photoresist thus prepared only uses water as the solvent and developer, which is conducive to the green and sustainable development of the ecological environment and has anti-etching properties. Good performance, high resolution and a series of outstanding advantages. Based on the polymorphic structure of silk protein, it can be used as both electron beam photoresist and ion beam photoresist, and can realize "positive and negative dual purposes", which can be used as positive and negative glue, and can be used as a large-scale The high-precision biological micro-nano-fabricated patterns can be prepared by the method, which has a good application and development prospect. The technical solutions of the present invention will be further described below with reference to specific embodiments.

Embodiment 1, the photoresist described in this embodiment is the silk fibroin extracted from the silk fibroin strain (named EvH) of the transgenic bag moth repeating motif EvH. important role. The present embodiment utilizes electron beams to perform exposure processing, and the specific steps are as follows:

1. Dissolving the silkworm cocoons of the silkworm strain that is transferred to EvH, the dissolving method is specifically:

1) Degumming: after boiling in a 0.5% (M/V) sodium carbonate solution, the silkworm strain cocoons of the transgenic bag moth repeating motif EvH are put into it at a liquor ratio of 1:100 and boiled for 30min-90min, preferably 30min, To remove sericin without excessive damage to silk fibroin;

2) After washing the boiled silk in flowing water, soak it in deionized water, change the deionized water once after soaking for 30 minutes, repeat three times, and then place the soaked silk in a 60°C oven for 6h to 12h and dry it for later use;

3) Anhydrous calcium chloride, anhydrous ethanol, and an aqueous solution are prepared in a molar ratio of 1:2:8 to obtain a silk fibroin dissolving solution, and a certain amount of silk fibers are taken in a bath ratio of 1:10 and put into the dissolving solution at a constant temperature of 70 ℃. ℃ until completely dissolved, at this time, there should be no obvious silk insoluble matter in the dissolved solution;

4) Place the dissolved silk fibroin solution in a dialysis bag (the retention capacity of the dialysis bag is 8kDa-14kDa) for 50h～100h, and change the water every 1h～10h during this process; the retention capacity of the dialysis bag is preferably 10kDa ~12kDa, dialysis for 72h, water change every 3h~5h;

5) Put the silk fibroin solution in a dialysis bag to air-dry and concentrate, and then centrifuge at 8000-15000 rad/min for 30 minutes, and obtain silk fibroin with a concentration of 3%-10% w/w (mass percent g/g) according to requirements. Aqueous protein solution, preferably at a concentration of 3%-7% w/w. The method of measuring the concentration of silk protein solution is as follows: Measure the weight m ₁ of a petri dish. After that, 0.5 ml of silk protein solution was added to the petri dish to determine its weight m ₂ and allowed to dry at 60°C for 4h-12h. After the silk protein is dried, its weight m ₃ is determined, and finally its concentration is calculated as (m ₂ -m ₁ )/(m ₃ -m ₁ ). Fig. 1 is a photoresist sample image for expressing exogenous sock moth silk protein EvH using the FibH promoter, wherein T7 indicates that its concentration is 7% w/w (mass percentage g/g). The photoresist sample is colorless and transparent, mainly containing four kinds of silk proteins (FibH, FibL, P25 and EvH), and after dialysis, water is used as a solvent, and no toxic and harmful organic reagents are contained, which satisfies the requirements of micro-nano processing biology to the greatest extent. Compatibility and green environmental protection.

6) Figure 2 is a graph showing the molecular size detection result of the photoresist sample expressing exogenous silk protein EvH using the FibH promoter. The results show that the molecular size of the extracted genetically modified Bombyx mori silk protein is mainly above 25KDa. The specific method of molecular detection is as follows: add the extracted silk fibroin aqueous solution to 8M urea to dilute 20 times, add 5×SDS-PAGE Loading Buffer, mix well and treat at 98°C for 10min to denature the protein. Use NuPAGE 4-12% Bis-Tris protein gel to separate the denatured protein samples by electrophoresis under the condition of 120V constant pressure. After electrophoresis, use Coomassie brilliant blue staining solution for 10min, and use destaining solution to destain until clear. protein bands.

2. Preparation of micro-nano patterns with excellent resolution and etching resistance:

1) Spin-coating the transgenic silk fibroin aqueous solution on a silicon wafer, the volume of the transgenic silk fibroin used in the spin-coating is 0.1 mL-1 mL, the rotation speed is 1000 r/min-5000 r/min, and the spin-coating time is 10 s-600 s. Dry and solidify to form a transgenic silk fibroin film, which is solidified at 50°C to 100°C, and the solidification time is 1 min to 30 min.

2) electron beam exposure is carried out to the silk fibroin film, the accelerating voltage of electron beam exposure is 30kV, and the dose dose is 0.5-300C cm-2, preferably 1-3C cm-2;

3) The exposed transgenic silk fibroin film sample is placed in water to develop and dry to obtain the transgenic silk fibroin structure; when the genetically modified silk fibroin is used as a negative glue, the secondary conformation of the exposed part changes from random coils. It is an insoluble spiral structure, ultrapure water is used for development, and the development time is 1s to 7200s. After development, the convex negative glue pattern is obtained, and the preferred development time is 30s to 120s;

When preparing the genetically modified Bombyx mori fibroin positive glue, the genetically modified Bombyx mori fibroin film needs to be cross-linked. The cross-linking method is soaking in methanol reagent for 5s to 7200s, the preferred methanol soaking time is 30min, and the silk protein is soaked in methanol The secondary conformation is converted to β-sheet, and the exposed part is converted into a short polypeptide by radiation, which is easily soluble in water. Ultrapure water is used for development. After developing for 1s to 7200s, preferably 30s to 120s, a concave positive glue pattern can be obtained, Figure 3 Electron beam exposure and development pattern for EvH photoresist positive photoresist (spin coating and curing to obtain a uniform protein film, and then immersed in methanol for 30min, and the lithography pattern obtained by electron beam).

Embodiment 2, the photoresist described in this embodiment is the silk fibroin extracted from the silk fibroin strain (named as EvH) of the transgenic bag moth repeating motif EvH using ion beam exposure for processing, and the specific steps are as follows:

1. Dissolve the silkworm cocoons of the EvH-transformed silkworm strain, and the specific dissolving method is consistent with Example 1. The difference between Example 2 and Example 1 is that the subsequent processing technology is different. Example 1 uses electron beam exposure, and Example 2 uses focused ion beam exposure. The focused ion beam exposure has better resolution and sensitivity.

2. Preparation of micro-nano patterns with excellent resolution and etching resistance:

1) Spin-coating the transgenic silk fibroin aqueous solution on a silicon wafer, the volume of the transgenic silk fibroin used in the spin-coating is 0.1 mL-1 mL, the rotation speed is 1000 r/min-5000 r/min, and the spin-coating time is 10 s-600 s. Dry and solidify to form a transgenic silk fibroin film, which is solidified at 50°C to 100°C, and the solidification time is 1 min to 30 min.

2) Expose the silk fibroin thin film with an ion beam, a focused ion beam accelerating voltage of 30 kV, a beam current of 2 pA, and an exposure dose of 0.01 s to 5 s.

3) The exposed transgenic silk fibroin film sample is placed in water to develop and dry to obtain the transgenic silk fibroin structure; when the genetically modified silk fibroin is used as a negative glue, the secondary conformation of the exposed part changes from random coils. It is an insoluble spiral structure. Ultrapure water is used for development. The development time is 1s to 7200s. After development, the convex negative photoresist pattern is obtained. The preferred development time is 30s to 120s. Development pattern (spin coating and curing according to the above method to obtain a uniform protein film, and use focused ion beam exposure for 1s to obtain a 20nm-level lithography pattern);

When preparing the genetically modified silk fibroin positive glue, the genetically modified silk fibroin film needs to be cross-linked. The cross-linking method is to soak in methanol reagent for 5s to 7200s, and the preferred methanol soaking time is 40min. The secondary conformation of the protein is converted to β-sheet, and the exposed part is converted into a short polypeptide by radiation, which is easily soluble in water. Ultrapure water is used for development. After developing for 1s to 7200s, preferably 30s to 120s, a concave positive glue pattern can be obtained. Fig. 5 is the EvH photoresist positive photoresist ion beam exposure and development pattern (the uniform protein film is obtained after spin coating and curing according to the above method, and then soaked in methanol for 30min, and then exposed by the focused ion beam for 0.8s to obtain a 20nm-level lithography pattern) .

The above description is only a preferred embodiment of the present invention, but the protection scope of the present invention is not limited to this. Substitutions should be covered within the protection scope of the present invention.

Claims (9)

1. an all-water-based multipurpose silk photoresist based on trans-EvH composite silk, is characterized in that, the all-water-based multipurpose silk photoresist is prepared by the silk of the silkworm strain of the transgenic bag moth repeating motif EvH, and its The all-water-based photoresist, including silk fibroin of transgenic pouch moth and water solvent, realizes high-resolution micro-nano patterns. 2. The all-water-based multi-purpose silk photoresist based on trans-EvH composite silk according to claim 1, wherein the molecular weight of silk fibroin is about 25kDa. 3. the all-water-based multipurpose silk photoresist based on trans-EvH composite silk according to claim 2, is characterized in that, the form of Bombyx mori silk fibroin is liquid or solid powder, and the water solvent adopts ultrapure water. 4. The all-water-based multipurpose silk photoresist based on trans-EvH composite silk according to claim 3, wherein the silk fibroin composition comprises silk fibroin heavy chain, silk fibroin light chain and glycoprotein. 5. the all-water-based multi-purpose silk photoresist based on trans-EvH composite silk according to claim 4, is characterized in that, Bombyx mori silk fibroin is used as negative glue, or as positive glue. 6. an all-water-based multipurpose silk photoresist preparation method based on trans-EvH composite silk, is characterized in that, it comprises the following steps: Step S1, utilize the trans-EvH composite silk to extract silk fibroin; In step S2, a photoresist pattern is prepared by exposing with a focused ion beam and an electron beam. 7. according to a kind of all-water-based multi-purpose silk photoresist preparation method based on trans-EvH composite silk according to claim 6, it is characterized in that, step S1 further comprises step S1-1, degumming: by 0.5% (M/V) After the sodium carbonate solution is boiled, the trans-EvH composite silkworm cocoon shells are put into the sodium carbonate solution at a liquor ratio of 1:100, and cooked for 30min-90min (minutes), preferably for 50min, to remove sericin and fibroin. Does not cause excessive damage. 8. according to a kind of all-water-based multi-purpose silk photoresist preparation method based on the EvH compound silk of claim 6, it is characterized in that, step S1 further comprises step S1-2, the boiled EvH compound silk is in flow After washing in tap water, soak in the cleaning solution, and after soaking in the cleaning solution for 30 minutes, replace the cleaning solution once and repeat three times to fully clean the residual sericin, and then place the cleaned EvH-transformed composite silk in an oven at 60 °C Dry for 6h-12h (hours) for later use; the cleaning solution is deionized water. 9. a kind of all-water-based multi-purpose silk photoresist preparation method based on trans-EvH composite silk according to claim 7, is characterized in that, step S1 further comprises step S1-3, will anhydrous calcium chloride, dehydrated alcohol 2. The aqueous solution is prepared at a molar ratio of 1:2:8 to obtain a silk fibroin dissolving solution, and a certain amount of silk fibers is put into the silk fibroin dissolving solution at a bath ratio of 1:10, and the solution is heated at any temperature between 30°C and 100°C. Under the constant temperature dissolving, the silk fibers are completely dissolved, and there should be no obvious silk insoluble matter in the dissolving solution at this time; the dissolving temperature is 70 ℃.

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