CN114542421A - Cryopump system and monitoring method thereof - Google Patents
Cryopump system and monitoring method thereof Download PDFInfo
- Publication number
- CN114542421A CN114542421A CN202111347327.2A CN202111347327A CN114542421A CN 114542421 A CN114542421 A CN 114542421A CN 202111347327 A CN202111347327 A CN 202111347327A CN 114542421 A CN114542421 A CN 114542421A
- Authority
- CN
- China
- Prior art keywords
- cryopump
- compressor
- monitor
- controller
- processing apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims description 16
- 238000012544 monitoring process Methods 0.000 title claims description 8
- 238000012545 processing Methods 0.000 claims abstract description 72
- 239000007789 gas Substances 0.000 description 47
- 238000004891 communication Methods 0.000 description 36
- 238000010926 purge Methods 0.000 description 17
- 238000005259 measurement Methods 0.000 description 15
- 238000001816 cooling Methods 0.000 description 13
- 239000003507 refrigerant Substances 0.000 description 13
- 230000005855 radiation Effects 0.000 description 12
- 230000005856 abnormality Effects 0.000 description 11
- 238000010586 diagram Methods 0.000 description 8
- 230000006870 function Effects 0.000 description 8
- 230000008929 regeneration Effects 0.000 description 7
- 238000011069 regeneration method Methods 0.000 description 7
- 238000003860 storage Methods 0.000 description 5
- 239000000470 constituent Substances 0.000 description 4
- 238000005086 pumping Methods 0.000 description 4
- 230000008569 process Effects 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 239000000498 cooling water Substances 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 230000002159 abnormal effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 238000004590 computer program Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000014509 gene expression Effects 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 238000000638 solvent extraction Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Images
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B37/00—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
- F04B37/06—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for evacuating by thermal means
- F04B37/08—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for evacuating by thermal means by condensing or freezing, e.g. cryogenic pumps
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B49/00—Control, e.g. of pump delivery, or pump pressure of, or safety measures for, machines, pumps, or pumping installations, not otherwise provided for, or of interest apart from, groups F04B1/00 - F04B47/00
- F04B49/06—Control using electricity
- F04B49/065—Control using electricity and making use of computers
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B51/00—Testing machines, pumps, or pumping installations
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
- Separation By Low-Temperature Treatments (AREA)
- Filling Or Discharging Of Gas Storage Vessels (AREA)
Abstract
The invention provides a cryopump system capable of easily confirming information related to a cryopump during the operation of a vacuum processing apparatus. A cryopump system (100) is provided with: a cryopump (10); a cryopump controller (110) that controls the cryopump (10); a network (120) connecting the cryopump (10) and the cryopump controller (110) and transmitting information relating to the cryopump (10) between the cryopump (10) and the cryopump controller (110); and a cryopump monitor (130) that is connected to the network (120) and displays information relating to the cryopump (10) transmitted via the network (120). The cryopump controller (110) is disposed in a housing (206) of the vacuum processing apparatus (200), and the cryopump monitor (130) is disposed outside the housing (206) of the vacuum processing apparatus (200).
Description
The present application claims priority based on japanese patent application No. 2020-. The entire contents of this Japanese application are incorporated by reference into this specification.
Technical Field
The invention relates to a cryopump system and a monitoring method thereof.
Background
The cryopump is a vacuum pump that captures and discharges gas molecules by condensation or adsorption onto a cryopanel cooled to an ultra-low temperature. The cryopump is mounted on a vacuum processing apparatus to realize a clean vacuum environment required in a semiconductor circuit manufacturing process or the like.
Patent document 1: japanese patent laid-open No. 2008-2333
The present inventors have studied a cryopump system mounted in a vacuum processing apparatus and found the following problems. It would be advantageous to be able to view information relating to the cryopump during operation of the vacuum processing apparatus. Such information is particularly useful for determining the cause of an abnormality or for returning to a normal state when some abnormality occurs. Therefore, it has been proposed to integrally incorporate a display unit for displaying information into the cryopump. However, even so, there are many times when in operation that information is virtually impossible to view. This is because the cryopump is mounted in the vacuum processing apparatus, and therefore, even if the display portion is provided, it is often hidden in a place that is not visible from the outside. In addition, for safety reasons, such as avoidance of dangerous contact with high voltage or high energy beams used in the vacuum processing apparatus, it is required that a person cannot physically access internal components of the vacuum processing apparatus, such as the cryopump, during operation of the vacuum processing apparatus. When the operation of the vacuum processing apparatus is stopped, the display unit can be viewed close to the cryopump, but the stop of the operation of the apparatus is not preferable because the productivity is lowered.
Disclosure of Invention
An exemplary object of one embodiment of the present invention is to provide a cryopump system capable of easily confirming information related to a cryopump during operation of a vacuum processing apparatus.
According to one embodiment of the present invention, a cryopump system mounted on a vacuum processing apparatus is provided. The cryopump system includes: at least 1 cryopump; a cryopump controller that controls the cryopump; a network connecting the cryopump and the cryopump controller and transmitting information related to the cryopump between the cryopump and the cryopump controller; and a cryopump monitor connected to the network and displaying information related to the cryopump transmitted via the network. The cryopump controller is disposed in a housing of the vacuum processing apparatus, and the cryopump monitor is disposed outside the housing of the vacuum processing apparatus.
According to one embodiment of the present invention, there is provided a method of monitoring a cryopump system mounted in a vacuum processing apparatus. The cryopump system includes: at least 1 cryopump; a cryopump controller which is disposed in a housing of the vacuum processing apparatus and controls the cryopump; and a network connecting the cryopump and the cryopump controller and transmitting information related to the cryopump between the cryopump and the cryopump controller. The method comprises the following steps: connecting a cryopump monitor to a network and disposing the cryopump monitor outside a frame of a vacuum processing apparatus; and displaying information related to the cryopump transmitted via the network on a cryopump monitor.
Any combination of the above-described constituent elements or a mode in which the constituent elements or expressions of the present invention are replaced with each other in a method, an apparatus, a system, or the like is also effective as an embodiment of the present invention.
The present invention provides a cryopump system capable of easily confirming information relating to a cryopump during operation of a vacuum processing apparatus.
Drawings
Fig. 1 is a schematic diagram showing a cryopump system according to an embodiment.
Fig. 2 is a schematic diagram showing an example of a cryopump that can be used in the cryopump system according to the embodiment.
Fig. 3 is a schematic diagram showing an example of a compressor that can be used in the cryopump system according to the embodiment.
Fig. 4 is a schematic diagram showing an example of a cryopump monitor that can be used in the cryopump system according to the embodiment.
In the figure: 10-cryopump, 12-compressor, 100-cryopump system, 110-cryopump controller, 120-network, 130-cryopump monitor, 132-operation section, 136-display section, 200-vacuum processing apparatus, 204-main controller, 206-frame.
Detailed Description
Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. In the following description and the drawings, the same or equivalent constituent elements, components, and processes are denoted by the same reference numerals, and overlapping description is appropriately omitted. For convenience of explanation, in the drawings, the proportion or the shape of each portion is appropriately set, and unless otherwise specified, it is not to be construed restrictively. The embodiments are examples and do not limit the scope of the invention in any way. All the features described in the embodiments or the combinations thereof are not necessarily essential to the invention.
Fig. 1 is a schematic diagram showing a cryopump system 100 according to an embodiment. The cryopump system 100 is mounted on the vacuum processing apparatus 200, and is used to vacuum-evacuate a vacuum chamber 202 of the vacuum processing apparatus 200 to a desired degree of vacuum. The vacuum processing apparatus 200 is configured to process an object to be processed (for example, a wafer) according to a desired vacuum process in a vacuum atmosphere in a vacuum chamber 202. The vacuum processing apparatus 200 may be, for example, an ion implantation apparatus, a sputtering apparatus, a vapor deposition apparatus, or another vacuum processing apparatus.
The vacuum processing apparatus 200 includes a main controller 204 and a housing 206 in addition to a vacuum chamber 202. The main controller 204 is configured to control communication between the vacuum processing apparatus 200 and the cryopump system 100. The main controller 204 may be configured as a control device that controls the vacuum processing apparatus 200, or may be configured as a part of such a control device. The housing 206 forms a casing of the vacuum processing apparatus 200, and accommodates various components of the vacuum processing apparatus 200 therein. The vacuum chamber 202 and the main controller 204 are disposed in the housing 206.
The housing 206 may be an outer case covering the entire surface of the vacuum processing apparatus 200. The housing 206 may include: a frame structure in which the constituent elements of the vacuum processing apparatus 200 are arranged and supported; a panel member for partitioning the inside of the vacuum processing apparatus 200 from the outside; and a door leaf capable of opening or closing for accessing the inside of the vacuum processing apparatus 200 from the outside. The panel member and the door leaf may be mounted on the frame structure. The frame 206 may have a radiation shielding material such as lead, for example, to prevent radiation that may be generated in the vacuum processing apparatus 200 from leaking to the outside.
Alternatively, the frame 206 may not cover the entire surface of the vacuum processing apparatus 200. A part of the frame 206 can be opened to allow a part of the vacuum processing apparatus 200 to be viewed from the outside.
The cryopump system 100 includes: at least 1 cryopump 10; at least 1 compressor 12; a cryopump controller 110; a network 120; and a cryopump monitor 130.
The cryopump 10 is attached to the vacuum chamber 202 of the vacuum processing apparatus 200, and evacuates the vacuum chamber 202. Therefore, the cryopump 10 is disposed in the housing 206 of the vacuum processing apparatus 200 together with the vacuum chamber 202. An exemplary structure of the cryopump 10 that can be used in the cryopump system 100 according to the embodiment will be described later with reference to fig. 2.
The compressor 12 is provided to supply refrigerant gas to an expander (described later) provided in the cryopump 10 and to discharge refrigerant gas from the expander provided in the cryopump 10. The compressor 12 is disposed outside the housing 206 of the vacuum processing apparatus 200 and connected to the expander of the cryopump 10 through the gas line 13. The gas line 13 includes: a high-pressure line 13a connecting the compressor 12 to the expander so that the refrigerant gas is supplied from the compressor 12 to the expander; and a low-pressure line 13b connecting the compressor 12 to the expander so that the refrigerant gas is recovered from the expander to the compressor 12. An exemplary structure of the compressor 12 that can be used in the cryopump system 100 according to the embodiment will be described later with reference to fig. 3.
In addition, in the cryopump system 100, a plurality of cryopumps 10 (for example, several to several tens) or more cryopumps 10 may be provided. In addition, a plurality of compressors 12 may be provided in the cryopump system 100 in order to supply the refrigerant gas to the cryopumps 10 or discharge the refrigerant gas from the cryopumps 10.
The cryopump controller 110 is configured to centrally control the cryopump system 100 in accordance with instructions received from the main controller 204. The cryopump controller 110 is configured to transmit information related to the cryopump system 100 to the main controller 204. Thus, the cryopump controller 110 can control the cryopump 10 and the compressor 12 in accordance with an instruction from the main controller 204, and can transmit information about the cryopump 10 and information about the compressor 12 to the main controller 204.
The cryopump controller 110 is communicatively connected to the main controller 204 via a 1 st communication line 208. The 1 st communication line 208 may be, for example, a communication cable such as RS-232C. The cryopump controller 110 is also disposed in the housing 206 of the vacuum processing apparatus 200, similarly to the main controller 204.
The internal structure of the cryopump controller 110 may be realized by an element or a circuit typified by a CPU or a memory of a computer in terms of a hardware structure, may be realized by a computer program or the like in terms of a software structure, and is appropriately depicted as a functional block realized by cooperation thereof in the drawing. Those skilled in the art will appreciate that these functional modules may be implemented in various forms by a combination of hardware and software. For example, the cryopump controller 110 may be implemented by a combination of a processor (hardware) such as a CPU (Central Processing Unit) or a microcomputer, and a software program executed by the processor (hardware).
The network 120 also communicatively connects the compressor 12 to the cryopump controller 110. In the cryopump system 100, information relating to the compressor 12 is transmitted between the compressor 12 and the cryopump controller 110 via the network 120. The compressor 12 is connected to the cryopump controller 110 through a 3 rd communication line 123. The 3 rd communication line 123 may be, for example, a communication cable such as RS-485.
The cryopump monitor 130 is connected to the network 120 and displays information related to the cryopump 10 transmitted via the network 120. In addition, cryopump monitor 130 may be configured to display information relating to compressor 12 transmitted via network 120. Alternatively, cryopump monitor 130 may be configured to display information relating to compressor 12 transmitted via network 120 instead
The cryopump monitor 130 is not connected to the network 120 via the main controller 204. That is, the cryopump monitor 130 is configured not to communicate with the main controller 204 of the vacuum processing apparatus 200. In this embodiment, cryopump monitor 130 is connected to cryopump controller 110 by way of a 4 th communication line 124. The 4 th communication line 124 may be, for example, a communication cable such as RS-485.
The cryopump monitor 130 is disposed outside the housing 206 of the vacuum processing apparatus 200. The cryopump monitor 130 is disposed at a position away from the housing 206. In this embodiment, cryopump monitor 130 is disposed on or near compressor 12. The cryopump monitor 130 may be removably mounted to the compressor 12. Alternatively, the cryopump monitor 130 may be provided on a monitor installation surface provided in the vicinity of the compressor 12. The monitor installation surface may be, for example, a wall surface near the compressor 12 or a surface of equipment located near the compressor 12. The cryopump monitor 130 may be a device that can be carried by an operator.
An exemplary structure of the cryopump monitor 130 that can be used in the cryopump system 100 according to the embodiment will be described later with reference to fig. 4.
Fig. 2 is a schematic diagram showing an example of the cryopump 10 that can be used in the cryopump system 100 according to the embodiment. The cryopump 10 includes: an expander 14; a cryopump volume 16; a radiation shield 18; and a cryopanel 20. The cryopump 10 further includes: a pressure sensor 21; a roughing valve 24; a purge valve 26; and a vent valve 28, which are disposed on the cryopump housing 16.
The compressor 12 is configured to recover the refrigerant gas from the expander 14, to boost the pressure of the recovered refrigerant gas, and to supply the refrigerant gas to the expander 14 again. The expander 14, also referred to as a cold head, constitutes a cryogenic refrigerator together with the compressor 12. Expander 14 is also sometimes referred to as a "chiller". The circulation of the refrigerant gas between the compressor 12 and the expander 14 is accompanied by appropriate pressure fluctuations and volume fluctuations of the refrigerant gas in the expander 14, thereby constituting a thermodynamic cycle in which cold is generated, and the expander 14 can provide ultra-low temperature cooling. The refrigerant gas is typically helium, but other suitable gases may be used. For ease of understanding, the flow direction of the refrigerant gas is indicated by arrows in fig. 1. The cryogenic refrigerator is, for example, a two-stage Gifford-McMahon (GM) refrigerator, but may be a pulse tube refrigerator, a stirling refrigerator, or another type of cryogenic refrigerator.
The cryopump housing 16 is a vacuum housing designed to maintain a vacuum during a vacuum pumping operation of the cryopump 10 and to withstand the pressure of the surrounding environment (e.g., atmospheric pressure). The cryopump housing 16 includes a cryopanel housing 16a having an intake port 17 and a refrigerator housing 16 b. The cryopanel housing portion 16a has a dome shape in which the intake port 17 is open and the opposite side is closed, and houses the radiation shield 18 and the cryopanel 20 therein. The refrigerator accommodating portion 16b has a cylindrical shape, one end of which is fixed to the room temperature portion of the expander 14, and the other end of which is connected to the cryopanel accommodating portion 16a, and the expander 14 is inserted into the interior thereof. The pressure sensor 21 measures the pressure in the cryopump container 16.
The radiation shield 18 is thermally connected to the 1 st cooling stage of the expander 14, and is thus cooled to the 1 st cooling temperature (e.g., 80K to 120K). The cryopanel 20 is thermally connected to the 2 nd cooling stage of the expander 14, and is thus cooled to a 2 nd cooling temperature (for example, 10K to 20K) lower than the 1 st cooling temperature. The radiation shield 18 is disposed in the cryopump housing 16 so as to surround the cryopanel 20, and shields heat input from the cryopump housing 16 and the ambient environment to the cryopanel 20. The gas entering from the gas inlet 17 of the cryopump 10 is captured to the cryopanel 20 by condensation or adsorption. In addition, a 1 st temperature sensor 22 for measuring the temperature of the radiation shield 18 and a 2 nd temperature sensor 23 for measuring the temperature of the cryopanel 20 are provided in the cryopump housing 16. The configuration of the cryopump 10 (the arrangement, shape, and the like of the radiation shield 18 and the cryopanel 20) may be any of various known configurations, and therefore, will not be described in detail here.
The roughing valve 24 is attached to the cryopump housing 16 (for example, the refrigerator housing 16 b). The roughing valve 24 is connected to a roughing pump (not shown) provided outside the cryopump 10. The roughing pump is a vacuum pump for vacuum-pumping the cryopump 10 to its operation start pressure. When the roughing valve 24 is opened by the control of the cryopump controller 110, the cryopump container 16 communicates with the roughing pump, and when the roughing valve 24 is closed, the cryopump container 16 and the roughing pump are shut off. When the roughing valve 24 is opened and the roughing pump is operated, the cryopump 10 can be depressurized.
The purge valve 26 is attached to the cryopump housing 16 (e.g., the cryopanel housing 16 a). The purge valve 26 is connected to a purge gas supply device (not shown) provided outside the cryopump 10. When the purge valve 26 is opened by the control of the cryopump controller 110, the purge gas is supplied to the cryopump enclosure 16, and when the purge valve 26 is closed, the supply of the purge gas to the cryopump enclosure 16 is shut off. The purge gas may be, for example, nitrogen or other dry gas, and the temperature of the purge gas may be adjusted to, for example, room temperature or may be heated to a temperature higher than room temperature. The pressure of the cryopump 10 can be increased by opening the purge valve 26 and introducing the purge gas into the cryopump container 16. Further, the cryopump 10 can be warmed from the ultralow temperature to the room temperature or higher.
The vent valve 28 is attached to the cryopump housing 16 (e.g., the refrigerator accommodating portion 16 b). The vent valve 28 is provided to discharge fluid from the interior to the exterior of the cryopump 10. The fluid discharged from the vent valve 28 is substantially a gas, but may also be a liquid or a mixture of gas and liquid. The vent valve 28 may be opened or closed by control of the cryopump controller 110. The vent valve 28 may also be mechanically opened by a pressure differential between the interior and exterior of the cryopump housing 16. The vent valve 28 is also configured to function as a safety valve that releases excessive pressure to the outside when the pressure is generated in the cryopump chamber 16.
The expander 14 is provided with a variable speed expander motor 30 that drives the expander 14. The expander motor 30 has an inverter that is capable of varying the motor operating frequency under the control of the cryopump controller 110.
During a vacuum pumping operation of the cryopump 10, the cryopump controller 110 may control the expander motor 30 according to the cooling temperature of the radiation shield 18 (or cryopanel 20). For example, the cryopump controller 110 may control the operating frequency of the expander motor 30 in a manner that maintains the cooling temperature of the radiation shield 18 constant.
During the regeneration operation of the cryopump 10, the cryopump controller 110 may control the roughing valve 24, the purge valve 26, the vent valve 28, and the expander motor 30 in accordance with the pressure in the cryopump enclosure 16 (or, if necessary, in accordance with the temperature of the cryopanel 20 and the pressure in the cryopump enclosure 16).
The cryopump 10 includes an input/output circuit 32 that performs transmission and reception between the cryopump 10 and the cryopump controller 110 collectively. The input output circuit 32 may be, for example, an I/O block or a remote (remote) I/O unit. The input/output circuit 32 is electrically connected to each device (for example, the pressure sensor 21, the 1 st temperature sensor 22, the 2 nd temperature sensor 23, the roughing valve 24, the purge valve 26, the vent valve 28, the expander motor 30, and the like) of the cryopump 10 to transmit and receive signals. The input/output circuit 32 is communicatively connected to the cryopump controller 110 via a 2 nd communication line 122.
Therefore, the cryopump 10 transmits a measurement pressure signal indicating the measurement pressure in the cryopump enclosure 16 measured by the pressure sensor 21 to the cryopump controller 110 via the input/output circuit 32 (and the 2 nd communication line 122). The cryopump 10 transmits a measured temperature signal indicating the measured temperature of each of the 1 st temperature sensor 22 and the 2 nd temperature sensor 23 to the cryopump controller 110 via the input/output circuit 32. The cryopump 10 transmits valve state signals indicating the open/close states of the valves (i.e., the roughing valve 24, the purge valve 26, and the vent valve 28) to the cryopump controller 110 via the input/output circuit 32. The cryopump 10 transmits a motor state signal indicating the switching state and the operating frequency of the expander motor 30 to the cryopump controller 110 via the input-output circuit 32.
In the cryopump 10, the input/output circuit 32 receives a valve control signal indicating an operation command for each valve from the cryopump controller 110, and the input/output circuit 32 transmits the valve control signal to the corresponding valve. The valve that receives the valve control signal is opened or closed according to the valve control signal. Similarly, in the cryopump 10, the input/output circuit 32 receives a motor control signal indicating an operation command to the expander motor 30 from the cryopump controller 110, and the input/output circuit 32 transmits the motor control signal to the expander motor 30. The expander motor 30 is switched or controlled in frequency according to the motor control signal.
In this embodiment, each cryopump 10 is not provided with a display unit (a liquid crystal panel, a monitor, or the like) for displaying information (such as measured pressure, measured temperature, and operating states of the valves and the expander motor 30) related to the cryopump 10.
Fig. 3 is a schematic diagram showing an example of the compressor 12 that can be used in the cryopump system 100 according to the embodiment. The compressor 12 includes: a high-pressure gas outlet 50, a low-pressure gas inlet 51, a high-pressure flow path 52, a low-pressure flow path 53, a 1 st pressure sensor 54, a 2 nd pressure sensor 55, a bypass line 56, a compressor body 57, and a compressor housing 58.
The high-pressure gas outlet 50 is provided in the compressor housing 58 as a working gas discharge port of the compressor 12, and the low-pressure gas inlet 51 is provided in the compressor housing 58 as a working gas suction port of the compressor 12. The high pressure line 13a is connected to the high pressure gas outlet 50, and the low pressure line 13b is connected to the low pressure gas inlet 51. The high-pressure flow path 52 connects the discharge port of the compressor body 57 to the high-pressure gas outlet 50, and the low-pressure flow path 53 connects the low-pressure gas inlet 51 to the suction port of the compressor body 57. The compressor housing 58 houses the high-pressure flow path 52, the low-pressure flow path 53, the 1 st pressure sensor 54, the 2 nd pressure sensor 55, the bypass line 56, and the compressor main body 57. The compressor 12 is also referred to as a compressor unit.
The compressor body 57 is configured to compress the working gas sucked through the suction port therein and discharge the working gas from the discharge port. The compressor body 57 may be, for example, a scroll pump, a rotary pump, or other pump that pressurizes the working gas. The compressor body 57 may be provided with a variable speed compressor motor 57 a. The compressor motor 57a may have an inverter that is capable of varying the motor operating frequency under the control of the cryopump controller 110. Thus, the compressor body 57 can be configured to be able to change the flow rate of the discharged working gas. Alternatively, the compressor body 57 may be configured to discharge a constant and constant flow rate of the working gas. The compressor body 57 is also referred to as a compression bin.
The 1 st pressure sensor 54 is disposed in the high-pressure passage 52 to measure the pressure of the working gas flowing through the high-pressure passage 52. The 2 nd pressure sensor 55 is disposed in the low pressure passage 53 to measure the pressure of the working gas flowing through the low pressure passage 53. Therefore, the 1 st pressure sensor 54 and the 2 nd pressure sensor 55 may also be referred to as a high pressure sensor and a low pressure sensor, respectively.
The bypass line 56 connects the high-pressure flow path 52 and the low-pressure flow path 53 so that the working gas flows from the high-pressure flow path 52 to the low-pressure flow path 53 while bypassing the expander 14. A relief valve 60 for opening or closing the bypass line 56 or controlling the flow rate of the working gas flowing through the bypass line 56 is provided in the bypass line 56. The relief valve 60 is configured to open when a differential pressure equal to or higher than a set pressure acts between the inlet and outlet thereof. The relief valve 60 may be an on-off valve or a flow rate control valve, and may be an electromagnetic valve, for example. The set pressure may be appropriately set according to experience of a designer or experiments or simulation tests performed by the designer. This can prevent the differential pressure between the high-pressure line 13a and the low-pressure line 13b from exceeding the set pressure and becoming excessively large.
As an example, the relief valve 60 may be opened or closed under the control of the cryopump controller 110. Cryopump controller 110 may control spill valve 60 in the following manner: the measured differential pressure between the high-pressure line 13a and the low-pressure line 13b is compared with a set pressure, and the relief valve 60 is opened when the measured differential pressure is equal to or higher than the set pressure, and the relief valve 60 is closed when the measured differential pressure is smaller than the set differential pressure. The cryopump controller 110 may also obtain the measured differential pressure between the high pressure line 13a and the low pressure line 13b from the measured pressures of the 1 st pressure sensor 54 and the 2 nd pressure sensor 55. As another example, the relief valve 60 may be configured to operate as a so-called relief valve that is mechanically opened when a differential pressure equal to or higher than a set pressure acts between the inlet and the outlet.
In this embodiment, the compressor 12 includes an operation panel 62 for operating the compressor 12. The operation panel 62 is provided on the compressor housing 58. The operation panel 62 is provided with an operation unit 63, a control unit 64, and a display unit 65. The operation unit 63 has an input mechanism (for example, an operation button) for receiving an operation of the compressor 12 by an operator. The control unit 64 is mounted inside the operation panel 62, and controls the respective devices of the compressor 12 (for example, the compressor main body 57 (compressor motor 57a) and the relief valve 60) according to the operation of the operation unit 63. The display unit 65 is controlled by the control unit 64, and displays information related to the compressor 12.
The control unit 64 of the compressor 12 may operate as an input/output circuit (e.g., an I/O module or a remote I/O unit) that collectively transmits and receives information between the compressor 12 and the cryopump controller 110. Accordingly, the control portion 64 is electrically connected to each device of the compressor 12 (e.g., the 1 st pressure sensor 54, the 2 nd pressure sensor 55, the compressor main body 57 (the compressor motor 57a), the relief valve 60, etc.) so as to transmit and receive signals. The control unit 64 is connected to the cryopump controller 110 through a 3 rd communication line 123.
Therefore, the compressor 12 transmits a measurement pressure signal indicating the measurement pressure of each of the 1 st pressure sensor 54 and the 2 nd pressure sensor 55 to the cryopump controller 110 via the control unit 64. The compressor 12 transmits a motor state signal indicating the on/off state and the operating frequency of the compressor motor 57a and a valve state signal indicating the open/close state or the degree of opening of the relief valve 60 to the cryopump controller 110 via the control unit 64.
In the compressor 12, the control unit 64 receives a motor control signal indicating an operation command to the compressor motor 57a from the cryopump controller 110, and the control unit 64 transmits the motor control signal to the compressor motor 57 a. The compressor motor 57a is switched or the operation frequency is controlled according to the motor control signal. Similarly, in the compressor 12, the control unit 64 receives a valve control signal indicating an operation command to the relief valve 60 from the cryopump controller 110, and the control unit 64 transmits the valve control signal to the relief valve 60. The relief valve 60 is opened or closed according to the valve control signal.
The compressor 12 may have other various components. For example, an oil separator, an adsorber, or the like may be provided in the high-pressure flow path 52. The low-pressure flow path 53 may be provided with a tank and other components. The compressor 12 may be provided with an oil circulation system for cooling the compressor body 57 with oil, a cooling system for cooling the oil with cooling water, and the like.
Fig. 4 is a schematic diagram showing an example of a cryopump monitor 130 that can be used in the cryopump system 100 according to the embodiment. The cryopump monitor 130 includes an operation unit 132, an input/output circuit 134, and a display unit 136.
The operation unit 132 has an input mechanism (various operation buttons and the like) for receiving an operation of the cryopump system 100 (for example, the cryopump 10 and the compressor 12) by an operator. The operation unit 132 is electrically connected to the input/output circuit 134, and transmits an operation signal indicating an operation on the operation unit 132 to the input/output circuit 134. The cryopump controller 110 receives the operation signal via the input/output circuit 134 (and the 4 th communication line 124), and controls the cryopump 10 (or the compressor 12) according to the operation signal. In this example, the operation unit 132 is provided below the cryopump monitor 130.
An input-output circuit 134 is mounted inside the cryopump monitor 130 and is communicatively connected to the cryopump controller 110 via a 4 th communication line 124. The input output circuit 134 may be, for example, an I/O module or a remote I/O unit. The 4 th communication line 124 is connected to a connector provided in the cryopump monitor 130, and is connected to the input/output circuit 134 via the connector.
The display unit 136 is electrically connected to the input/output circuit 134, and receives a signal indicating information related to the cryopump 10 and/or information related to the compressor 12 from the input/output circuit 134. The display unit 136 displays information related to the cryopump 10 and/or the compressor 12 based on a signal received by the input/output circuit 134 from the cryopump controller 110. For example, the display unit 136 includes a display panel unit 136a and a display lamp unit 136 b. The display panel section 136a may be, for example, a liquid crystal panel or other display device capable of displaying numerals or characters, symbols, and the like representing information related to the cryopump 10 and/or the compressor 12. The display lamp unit 136b may be, for example, an LED lamp or other indicator that indicates information related to the cryopump 10 and/or the compressor 12 by turning on or off the lamp. In this example, the display unit 136 is provided above the cryopump monitor 130.
Examples of the information about the cryopump 10 that can be displayed on the display unit 136 include the following, but are not limited thereto.
The current measurement value measured by the sensor mounted on the cryopump 10 (for example, the measurement pressure of the pressure sensor 21, the measurement temperature of the 1 st temperature sensor 22, the measurement temperature of the 2 nd temperature sensor 23, and the like);
the current operating state of the equipment mounted on the cryopump 10 (for example, the open/close state of the roughing valve 24, the open/close state of the purge valve 26, the open/close state of the vent valve 28, the open/close state of the expander motor 30 (that is, the open/close state of the cryopump 10, etc.), the operating frequency of the expander motor 30, and the like);
an operation history of the cryopump 10 (for example, an operation duration of the cryopump 10, an elapsed time since the start of the regeneration of the cryopump 10, the number of times of regeneration of the cryopump 10, an alarm related to the cryopump 10 generated during the operation of the cryopump 10, a communication time between the cryopump 10 and the cryopump controller 110, a past measurement value measured by a sensor mounted on the cryopump 10, a past operation state of a device mounted on the cryopump 10, and the like);
internal parameters of the cryopump 10 (for example, set cooling temperatures of the radiation shield 18 and the cryopanel 20 for performing a vacuum pumping operation of the cryopump 10, control parameters (for example, a control gain for PID control) for adjusting the temperature of the radiation shield 18 (or the cryopanel 20), various regeneration parameters defining conditions such as a temperature and a pressure for performing regeneration of the cryopump 10, and opening and closing timings of the valves);
other parameters related to the cryopump 10 (e.g., the factory number of the cryopump 10, etc.);
various commands for operating the cryopump 10.
Further, as information on the compressor 12 that can be displayed on the display unit 136, there are the following, for example, but the present invention is not limited thereto.
A current measurement value measured by a sensor mounted on the compressor 12 (for example, a measurement pressure of the 1 st pressure sensor 54, a measurement pressure of the 2 nd pressure sensor 55, a differential pressure between the measurement pressures of the 1 st pressure sensor 54 and the 2 nd pressure sensor 55, and the like);
the current operating state of the equipment mounted on the compressor 12 (the set value of the differential pressure between the high-pressure flow path 52 and the low-pressure flow path 53, the on-off state of the compressor motor 57a (i.e., the on-off state of the compressor 12), the operating frequency of the compressor motor 57a, the open/close state or degree of opening of the relief valve 60, the flow rate of the cooling water for cooling the compressor main body 57, and the like);
an operation history of the compressor 12 (an operation duration of the compressor 12, a use time of the adsorber, an alarm generated during operation of the compressor 12 and related to the compressor 12, a past measurement value measured by a sensor mounted on the compressor 12, a past operation state of a device mounted on the compressor 12, and the like);
internal parameters of the compressor 12;
other parameters related to the compressor 12;
various commands for operating the compressor 12.
The cryopump monitor 130 may include a storage unit such as a mass storage, or may be connected to an external storage device. Past measurement values, operation states, or other displayable information of the cryopump system 100 is stored in the storage unit or the storage device, and can be accessed from the cryopump monitor 130 as necessary and displayed on the cryopump monitor 130.
Also, cryopump monitor 130 may prompt visually, audibly, or otherwise.
The method for monitoring the cryopump system 100 according to the embodiment includes: connecting the cryopump monitor 130 to the network 120 and disposing it outside the housing 206 of the vacuum processing apparatus 200. For example, cryopump monitor 130 is connected to cryopump controller 110 by way of a 4 th communication line 124. Thus, the cryopump monitor 130 is connected to the network 120 and disposed outside the housing 206 of the vacuum processing apparatus 200. Since the cryopump controller 110 is disposed in the housing 206 of the vacuum processing apparatus 200, it is difficult to connect the cryopump monitor 130 to the cryopump controller 110 while the cryopump system 100 is operating (that is, while the vacuum processing apparatus 200 is operating). Therefore, the connection operation of the cryopump monitor 130 is preferably performed before the operation of the cryopump system 100.
The method of monitoring a cryopump system 100 further includes: displaying information related to the cryopump 10 transmitted through the network 120 on the cryopump monitor 130. And, the method may also include: displaying information related to the compressor 12 transmitted via the network 120 on the cryopump monitor 130. These displays may be made during the operation of the cryopump system 100 or during the period when the operation of the cryopump system 100 is stopped.
As described above, in the cryopump system 100, the information on the cryopump 10 and the information on the compressor 12 are all integrated into the cryopump controller 110. The network 120 used for communication in the cryopump system 100 is configured to broadcast communication data (including information on the cryopump 10 (or the compressor 12)) to all nodes, for example, as in RS-485. Thus, by connecting the cryopump monitor 130 to the network 120 (e.g., the cryopump controller 110), the cryopump monitor 130 can acquire (so-called intercept) communication data transmitted between the cryopump controller 110 and the cryopump 10 (or the compressor 12) via the network 120. Thus, the cryopump monitor 130 can display information related to the cryopump 10 (or the compressor 12) based on the acquired communication data.
The method of monitoring the cryopump system 100 may further include: the steps of the cryopump system 100 are controlled in accordance with the operation of the cryopump monitor 130. As described above, the cryopump controller 110 can receive the operation signal generated by the operator operating the operation unit 132 via the input/output circuit 134 (and the 4 th communication line 124), and control the cryopump 10 (or the compressor 12) in accordance with the operation signal. For example, the operation of the cryopump system 100 that can be performed by the operator using the cryopump monitor 130 is, for example, as follows, but is not limited thereto.
The switch of the cryopump 10;
start of regeneration of the cryopump 10 and selection of a regeneration mode;
the operation of the equipment mounted on the cryopump 10 (for example, the opening and closing operations of the roughing valve 24, the purge valve 26, and the vent valve 28, the change in the operating frequency of the expander motor 30, and the like);
calibration (e.g., atmospheric pressure adjustment, zero point adjustment) of a sensor (e.g., pressure sensor 21) mounted on the cryopump 10;
the on/off of the compressor 12.
As described at the beginning of the present specification, it is very convenient if information on the cryopump 10 can be viewed during the operation of the vacuum processing apparatus 200. Such information is particularly useful in determining the cause of an abnormality or in restoring to a normal state when some abnormality occurs in the cryopump system 100.
However, in the existing cryopump products, such an information display tool is not equipped in most cases, and therefore it takes a long time to analyze the abnormality and to recover the normality. In this case, since the cryopump system 100 is connected to the vacuum processing apparatus 200, it is possible to obtain information on the cryopump system 100 from the vacuum processing apparatus 200. In reality, however, the vacuum processing apparatus 200 is not typically designed to have access to so-called information relating to the cryopump system 100. Therefore, the method does not necessarily guarantee that information required for analyzing the abnormality and recovering the normality can be acquired. Further, as one of the causes of the abnormality, there is a possibility that communication between the main controller 204 of the vacuum processing apparatus 200 and the cryopump system 100 is abnormal.
For this reason, it has been proposed to integrally incorporate a display unit for displaying information into the cryopump 10. However, even so, there are many times when in operation that information is virtually impossible to view. This is because the cryopump 10 is mounted in the vacuum processing apparatus 200, and therefore, even if a display portion is provided, it is often hidden in a place that is not visible from the outside. Furthermore, for safety reasons, such as avoiding dangerous contact with high voltage or high energy beams used in the vacuum processing apparatus 200, it is required that a person cannot physically access internal components of the vacuum processing apparatus 200, such as the cryopump 10, during operation of the vacuum processing apparatus 200. When the operation of the vacuum processing apparatus 200 is stopped, the display unit can be viewed close to the cryopump 10, but the stop of the operation of the apparatus is not preferable because the productivity is lowered.
In contrast, according to the embodiment, since the cryopump monitor 130 is disposed outside the housing 206 of the vacuum processing apparatus 200 and the information related to the cryopump 10 (and/or the compressor 12) is displayed on the cryopump monitor 130, the operator can easily confirm the displayed information related to the cryopump 10 (and/or the compressor 12) by holding the information in his hand during the operation of the vacuum processing apparatus 200. The operator can obtain the required information at any time in a safe place by looking at the cryopump monitor 130. When a certain abnormality occurs in the cryopump system 100, the operator can quickly determine the cause of the abnormality or recover to a normal state using the information acquired from the cryopump monitor 130.
Also, according to an embodiment, the cryopump monitor 130 is not connected to the network 120 via the main controller 204. For example, cryopump monitor 130 is connected directly to cryopump controller 110 and thus to network 120. Thus, even when an abnormality of the main controller 204 or an abnormality in communication between the cryopump controller 110 and the main controller 204 is suspected, the cryopump monitor 130 can acquire information from the cryopump controller 110 and display the information. The cryopump monitor 130 may acquire and display information that cannot be acquired from the cryopump controller 110 via the main controller 204 (information that the main controller 204 is a cryopump other than the monitor target).
Further, according to the embodiment, the cryopump monitor 130 includes an operation unit 132 for operating the cryopump system 100. Therefore, necessary operations can be performed on the cryopump system 100 from the cryopump monitor 130 separately from the operation of the cryopump system 100 via the main controller 204 of the vacuum processing apparatus 200.
The present invention has been described above with reference to the embodiments. It will be understood by those skilled in the art that the present invention is not limited to the above-described embodiments, various design changes may be made, various modifications may be made, and the modifications are also included in the scope of the present invention.
In the above embodiment, the compressor 12 and the cryopump monitor 130 are connected to the cryopump controller 110 through respective communication cables (the 3 rd communication line 123 and the 4 th communication line 124). In one embodiment, the 3 rd communication line 123 and the 4 th communication line 124 may be 1 communication cable branched at end portions, and the compressor 12 and the cryopump monitor 130 are connected to the cryopump controller 110 using the 1 communication cable.
Instead of directly connecting the cryopump monitor 130 to the cryopump controller 110, the cryopump monitor 130 may be connected to the network 120 by connecting the compressor 12 to a wire, and may be disposed outside the housing 206 of the vacuum processing apparatus 200. In this case, the connection operation of the cryopump monitor 130 may be performed before the operation of the cryopump system 100 or during the operation of the cryopump system 100. The cryopump monitor 130 may be connected to another node (for example, the cryopump 10) on the network 120, connected to the network 120, and disposed outside the housing 206 of the vacuum processing apparatus 200.
The cryopump monitor 130 may be integrally mounted on the compressor 12. For example, the operation panel 62 provided in the compressor 12 may be operated as the cryopump monitor 130.
The cryopump monitor 130 may be configured to switch between enabling and disabling at least a portion of the display function (and/or the operation function). For example, a part of the display function (for example, display of internal parameters of the cryopump 10) may be locked by a password or the like so as not to be used in an initial state of the cryopump monitor 130. The cryopump monitor 130 may be configured to be able to use the display function by releasing the lock.
The connection of cryopump monitor 130 to network 120 may also be wireless. For example, compressor 12 may be wired to cryopump controller 110 and cryopump monitor 130 may be wirelessly connected to compressor 12. Since the cryopump monitor 130 and the compressor 12 are disposed outside the vacuum processing apparatus 200 and close to each other, carriers for wireless communication are easily transmitted between each other. Alternatively, the cryopump controller 110 and the cryopump monitor 130 may be wirelessly connected, as the case may be.
In the above embodiment, the cryopump monitor 130 has the operation section 132, and thus has the operation function of the cryopump system 100. However, in one embodiment, the cryopump monitor 130 may have only a display function without an operation function.
At least 1 cryopump 10 disposed in the cryopump system 100 may be a cold trap. Typically, the cold trap is cooled by a single-stage cryogenic refrigerator, and is disposed at the inlet of a high-vacuum pump such as a turbo-molecular pump, for example, to condense water vapor on the surface of the cold trap and exhaust the condensed water vapor. Cryopump monitor 130 may display information related to the cold trap.
Claims (6)
1. A cryopump system mounted on a vacuum processing apparatus, the cryopump system comprising:
at least 1 cryopump;
a cryopump controller that controls the cryopump;
a network connecting the cryopump and the cryopump controller and transmitting information related to the cryopump between the cryopump and the cryopump controller; and
a cryopump monitor connected to the network and displaying information related to the cryopump transmitted via the network,
the cryopump controller is disposed in a housing of the vacuum processing apparatus, and the cryopump monitor is disposed outside the housing of the vacuum processing apparatus.
2. The cryopump system of claim 1,
the low-temperature pump controller can be connected with a main controller arranged on the vacuum processing device,
the cryopump monitor is not connected to the network via the main controller.
3. Cryopump system according to claim 1 or 2,
further comprising at least 1 compressor, wherein the at least 1 compressor is disposed outside the frame of the vacuum processing apparatus and connected to the network,
the cryopump monitor is disposed at the compressor.
4. The cryopump system of claim 3,
the cryopump monitor displays information relating to the compressor transmitted via the network.
5. The cryopump system of any one of claims 1 to 4,
the cryopump monitor includes an operation unit for operating the cryopump system.
6. A method for monitoring a cryopump system mounted on a vacuum processing apparatus,
the cryopump system includes: at least 1 cryopump; a cryopump controller which is disposed in a housing of the vacuum processing apparatus and controls the cryopump; and a network connecting the cryopump and the cryopump controller and transmitting information related to the cryopump between the cryopump and the cryopump controller,
the method comprises the following steps:
connecting a cryopump monitor to the network and disposing the cryopump monitor outside a housing of the vacuum processing apparatus; and
displaying information related to the cryopump transmitted over the network on the cryopump monitor.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2020-194876 | 2020-11-25 | ||
| JP2020194876A JP7554648B2 (en) | 2020-11-25 | 2020-11-25 | Cryopump system and monitoring method thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN114542421A true CN114542421A (en) | 2022-05-27 |
Family
ID=81658049
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202111347327.2A Pending CN114542421A (en) | 2020-11-25 | 2021-11-15 | Cryopump system and monitoring method thereof |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20220163030A1 (en) |
| JP (1) | JP7554648B2 (en) |
| KR (1) | KR20220072740A (en) |
| CN (1) | CN114542421A (en) |
| TW (1) | TWI819407B (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US12092093B2 (en) * | 2022-03-08 | 2024-09-17 | Air Products And Chemicals, Inc. | Apparatus and method for cryogenic pump cooldown |
| JP2024055145A (en) * | 2022-10-06 | 2024-04-18 | 住友重機械工業株式会社 | Operation method for cryogenic refrigerator, and cryogenic refrigerator |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101424257A (en) * | 2007-11-01 | 2009-05-06 | 佳能安内华科技股份有限公司 | Cryopump apparatus and operation method therefor |
| US20100176294A1 (en) * | 2007-06-11 | 2010-07-15 | Oerlikon Leybold Vacuum Gmbh | Mass spectrometer arrangement |
| CN102410173A (en) * | 2010-09-21 | 2012-04-11 | 住友重机械工业株式会社 | A cryopump system and a method for controlling the cryopump system |
| CN104929897A (en) * | 2014-03-18 | 2015-09-23 | 住友重机械工业株式会社 | Cyropump and method for regenerating the cryopump |
| CN204966992U (en) * | 2015-10-10 | 2016-01-13 | 刘波 | Safe low -voltage distribution box |
| US20170276128A1 (en) * | 2016-03-22 | 2017-09-28 | Sumitomo Heavy Industries, Ltd. | Cryopump, cryopum controller, and cryopumt control method |
| US20180314277A1 (en) * | 2017-05-01 | 2018-11-01 | Johnson Controls Technology Company | Hvac device controller with integrated refrigeration controller interface |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6902378B2 (en) * | 1993-07-16 | 2005-06-07 | Helix Technology Corporation | Electronically controlled vacuum pump |
| US5971711A (en) * | 1996-05-21 | 1999-10-26 | Ebara Corporation | Vacuum pump control system |
| JP4779819B2 (en) | 2006-06-21 | 2011-09-28 | ミツミ電機株式会社 | Cryopump control device and cryopump control method |
| JP2011174376A (en) | 2010-02-23 | 2011-09-08 | Canon Anelva Corp | Cryopump/trap system, and vacuum treatment device comprising the same |
| JP5669659B2 (en) * | 2011-04-14 | 2015-02-12 | 住友重機械工業株式会社 | Cryopump and vacuum exhaust method |
| US9336990B2 (en) * | 2013-08-29 | 2016-05-10 | Varian Semiconductor Equipment Associates, Inc. | Semiconductor process pumping arrangements |
| JP7073489B2 (en) * | 2017-10-29 | 2022-05-23 | スミトモ （エスエイチアイ） クライオジェニックス オブ アメリカ インコーポレイテッド | General-purpose control device for integrating cryogenic devices that require different control mechanisms on a single operating platform |
-
2020
- 2020-11-25 JP JP2020194876A patent/JP7554648B2/en active Active
-
2021
- 2021-11-08 KR KR1020210151951A patent/KR20220072740A/en active Search and Examination
- 2021-11-11 TW TW110142000A patent/TWI819407B/en active
- 2021-11-15 CN CN202111347327.2A patent/CN114542421A/en active Pending
- 2021-11-23 US US17/533,983 patent/US20220163030A1/en not_active Abandoned
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20100176294A1 (en) * | 2007-06-11 | 2010-07-15 | Oerlikon Leybold Vacuum Gmbh | Mass spectrometer arrangement |
| CN101424257A (en) * | 2007-11-01 | 2009-05-06 | 佳能安内华科技股份有限公司 | Cryopump apparatus and operation method therefor |
| US20090126374A1 (en) * | 2007-11-01 | 2009-05-21 | Canon Anelva Technix Corporation | Cryopump apparatus and operation method therefor |
| CN102410173A (en) * | 2010-09-21 | 2012-04-11 | 住友重机械工业株式会社 | A cryopump system and a method for controlling the cryopump system |
| CN104929897A (en) * | 2014-03-18 | 2015-09-23 | 住友重机械工业株式会社 | Cyropump and method for regenerating the cryopump |
| CN204966992U (en) * | 2015-10-10 | 2016-01-13 | 刘波 | Safe low -voltage distribution box |
| US20170276128A1 (en) * | 2016-03-22 | 2017-09-28 | Sumitomo Heavy Industries, Ltd. | Cryopump, cryopum controller, and cryopumt control method |
| US20180314277A1 (en) * | 2017-05-01 | 2018-11-01 | Johnson Controls Technology Company | Hvac device controller with integrated refrigeration controller interface |
Also Published As
| Publication number | Publication date |
|---|---|
| US20220163030A1 (en) | 2022-05-26 |
| KR20220072740A (en) | 2022-06-02 |
| JP2022083523A (en) | 2022-06-06 |
| TW202223237A (en) | 2022-06-16 |
| TWI819407B (en) | 2023-10-21 |
| JP7554648B2 (en) | 2024-09-20 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN114542421A (en) | Cryopump system and monitoring method thereof | |
| JP4686572B2 (en) | Cryopump, vacuum exhaust system, and diagnostic method thereof | |
| US6318093B2 (en) | Electronically controlled cryopump | |
| US5343708A (en) | Electronically controlled cryopump | |
| US5157928A (en) | Electronically controlled cryopump | |
| US10054114B2 (en) | Cryopump and method of monitoring cryopump | |
| US10273949B2 (en) | Cryopump and method of operating the cryopump | |
| US10001117B2 (en) | Cryopump system, cryopump controller, and method for regenerating the cryopump | |
| US4408469A (en) | Refrigerator cryostat | |
| CN114382677B (en) | Cryopump and method for regenerating cryopump | |
| JP4912438B2 (en) | Cryopump and cryopump monitoring method | |
| KR20170110014A (en) | Cryopump, estimating device for amount of absorbed gas of cryopump, and estimating method for amount of absorbed gas of cryopump | |
| CN114320826B (en) | Cryopump and method for regenerating cryopump | |
| JP2000009036A (en) | Control device for vacuum pump | |
| CN118188399A (en) | Cryopump and cryopump regeneration method | |
| JPS6357881A (en) | Running method for multihead cryopump | |
| JP5404702B2 (en) | Vacuum exhaust system | |
| CN118679319A (en) | Cryopump and method of operating cryopump |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination |