CN114501765A - Gas dissociation circuit and gas dissociation system based on multi-coil coupling - Google Patents
Gas dissociation circuit and gas dissociation system based on multi-coil coupling Download PDFInfo
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- CN114501765A CN114501765A CN202210096385.0A CN202210096385A CN114501765A CN 114501765 A CN114501765 A CN 114501765A CN 202210096385 A CN202210096385 A CN 202210096385A CN 114501765 A CN114501765 A CN 114501765A
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- 238000010494 dissociation reaction Methods 0.000 title claims abstract description 91
- 230000005593 dissociations Effects 0.000 title claims abstract description 91
- 230000008878 coupling Effects 0.000 title claims abstract description 9
- 238000010168 coupling process Methods 0.000 title claims abstract description 9
- 238000005859 coupling reaction Methods 0.000 title claims abstract description 9
- 238000004804 winding Methods 0.000 claims description 27
- 239000007789 gas Substances 0.000 description 63
- 238000001514 detection method Methods 0.000 description 9
- 238000010586 diagram Methods 0.000 description 9
- 210000002381 plasma Anatomy 0.000 description 9
- 239000003990 capacitor Substances 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 238000012423 maintenance Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000001939 inductive effect Effects 0.000 description 2
- 238000009616 inductively coupled plasma Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000001954 sterilising effect Effects 0.000 description 2
- 238000004659 sterilization and disinfection Methods 0.000 description 2
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000005669 field effect Effects 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- -1 fluorine ions Chemical class 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02J—CIRCUIT ARRANGEMENTS OR SYSTEMS FOR SUPPLYING OR DISTRIBUTING ELECTRIC POWER; SYSTEMS FOR STORING ELECTRIC ENERGY
- H02J50/00—Circuit arrangements or systems for wireless supply or distribution of electric power
- H02J50/10—Circuit arrangements or systems for wireless supply or distribution of electric power using inductive coupling
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02J—CIRCUIT ARRANGEMENTS OR SYSTEMS FOR SUPPLYING OR DISTRIBUTING ELECTRIC POWER; SYSTEMS FOR STORING ELECTRIC ENERGY
- H02J50/00—Circuit arrangements or systems for wireless supply or distribution of electric power
- H02J50/40—Circuit arrangements or systems for wireless supply or distribution of electric power using two or more transmitting or receiving devices
- H02J50/402—Circuit arrangements or systems for wireless supply or distribution of electric power using two or more transmitting or receiving devices the two or more transmitting or the two or more receiving devices being integrated in the same unit, e.g. power mats with several coils or antennas with several sub-antennas
Abstract
The invention provides a gas dissociation circuit based on multi-coil coupling, which comprises at least two dissociation transformers and at least two reactances, wherein each dissociation transformer comprises a first main coil, a first auxiliary coil and a reactance, the first main coils are connected in series, the first auxiliary coils and the reactances are arranged in one-to-one correspondence, the first auxiliary coils and the reactances are connected in series, the turn ratio of all the dissociation transformers is the same, the turn ratio is the ratio of the number of turns of the first main coil to the number of turns of the first auxiliary coil in the same dissociation transformer, the first main coils are connected in series, so that the currents in all the first main coils are equal, the turn ratios of all the dissociation transformers are the same, the currents in all the first auxiliary coils are equal, and the magnetic field intensity generated by the reactances is the same, thereby improving the gas ionization rate. The invention also provides a gas dissociation system.
Description
Technical Field
The invention relates to the technical field of semiconductor manufacturing, in particular to a gas dissociation circuit and a gas dissociation system based on multi-coil coupling.
Background
Plasma is an ionized gaseous substance consisting of positive and negative ions generated by ionizing atoms and radicals after part of electrons are deprived, can be generated by capacitive coupling or radio frequency inductive coupling, and is widely applied to the fields of materials, energy sources, information and the like.
Plasma-assisted material processing has found widespread use in many industrial plants. In the semiconductor and optoelectronic industries, plasmas are used in a variety of processes such as plasma enhanced chemical vapor deposition, physical vapor deposition, reactive ion etching, and plasma immersion ion implantation. In addition, low pressure plasmas can also be used for chamber cleaning and flat panel display manufacturing. Surface treatment techniques can be used for sterilization of biomedical devices. In particular, for atmospheric pressure plasma (e.g., ozone), it can be applied to various types of cleaning such as agriculture, food sterilization, water purification, and portable air cleaners. To improve the productivity of the chemical vapor deposition process, preventing the chamber from being contaminated is a major concern.
At present, a plasma source at home and abroad is mainly a radio frequency Inductively Coupled plasma source (ICP), which has the characteristics of low voltage, high density, good uniformity, simple device and high cost performance, and is widely applied in the fields of semiconductor manufacturing and material science, such as etching of polysilicon, silicon dioxide and metal materials, preparation of metal oxide films and the like. The conventional plasma source excites an ignition gas (such as nitrogen) to ionize through an ignition circuit, generates a magnetic field through radio frequency inductive coupling, ionizes a cleaning gas (such as NF3) and maintains stable plasma, so as to generate fluorine ions with a certain density for cleaning a chip processing chamber. However, in the prior art, the strength of the dissociating magnetic field is not uniform, and the dissociation rate is low.
Therefore, there is a need to provide a novel gas dissociation circuit and gas dissociation system to solve the above-mentioned problems in the prior art.
Disclosure of Invention
The invention aims to provide a gas dissociation circuit and a gas dissociation system based on multi-coil coupling, which can improve the uniformity of a gas dissociation magnetic field and improve the gas dissociation rate.
In order to achieve the above object, the gas dissociation circuit of the present invention includes at least two dissociation transformers and at least two reactances, where the dissociation transformer includes a first primary coil and a first secondary coil, the first primary coil is connected in series, the first secondary coil and the reactances are arranged in a one-to-one correspondence, and the first secondary coil and the reactances are connected in series, the turn ratios of all the dissociation transformers are the same, and the turn ratio is a ratio of the number of turns of the first primary coil to the number of turns of the first secondary coil in the same dissociation transformer.
The gas dissociation circuit has the advantages that: the first main coils are connected in series, so that the currents in all the first main coils are equal, the turn ratios of all the dissociation transformers are equal, the currents in all the first auxiliary coils are equal, the magnetic field intensity generated by the reactance is equal, the uniformity of the magnetic field is improved, and the gas ionization rate is improved.
Optionally, the dissociation transformer further includes a first magnetic core, and the first primary coil and the first secondary coil are wound around an outer side of the first magnetic core.
Optionally, the gas dissociation circuit further comprises an ignition unit comprising an ignition transformer comprising a second primary winding and a second secondary winding, the second primary winding and the first primary winding being connected in series.
Optionally, the ignition transformer further comprises a second magnetic core, and the second primary winding and the second secondary winding are wound around the outside of the second magnetic core.
Optionally, the ignition unit further comprises a capacitor connected in parallel with the second primary coil.
Optionally, the ignition unit further comprises an ignition electrode in series with the second sub-coil.
Optionally, the ignition unit further comprises a switching unit connected in parallel with the second primary winding.
Optionally, the switching unit is a power switch.
Optionally, the gas dissociation circuit further comprises a current source in series with the first primary coil.
The invention also provides a gas dissociation system comprising:
a dissociation chamber; and
the gas dissociation circuit, the reactance set up in the dissociation chamber.
The gas dissociation system has the advantages that: the first main coils are connected in series, so that the currents in all the first main coils are equal, the turn ratios of all the dissociation transformers are equal, the currents in all the first auxiliary coils are equal, the magnetic field intensity generated by the reactance is equal, the uniformity of the magnetic field is improved, and the gas ionization rate is improved.
Drawings
FIG. 1 is a schematic diagram of a conventional gas dissociation system according to the prior art;
FIG. 2 is a schematic diagram of a gas dissociation system according to the present invention;
FIG. 3 is a block diagram of an ionization rate detection apparatus according to some embodiments of the present invention;
FIG. 4 is a block diagram of an ignition control subunit in accordance with some embodiments of the invention;
FIG. 5 is a block diagram of a maintenance control subunit in some embodiments of the invention.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings of the present invention, and it is obvious that the described embodiments are some, but not all embodiments of the present invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention. Unless defined otherwise, technical or scientific terms used herein shall have the ordinary meaning as understood by one of ordinary skill in the art to which this invention belongs. As used herein, the word "comprising" and similar words are intended to mean that the element or item listed before the word covers the element or item listed after the word and its equivalents, but does not exclude other elements or items.
Fig. 1 is a schematic structural diagram of a conventional gas dissociation system in the prior art. Referring to fig. 1, a conventional gas dissociation system 100 includes a first transformer 101, a second transformer 102, a power supply 103, and an ignition device 104, where the first transformer 101 includes a first main sub-coil 1011 and a first sub-coil 1012, the second transformer 102 includes a second main sub-coil 1021 and a second sub-coil 1022, one end of the first main sub-coil 1011 and one end of the second main sub-coil 1021 are both connected to one end of the power supply 103, the other end of the first main sub-coil 1011 and the other end of the second main sub-coil 1021 are both connected to the ignition device 104, and the ignition device 104 is connected to the other end of the power supply 103.
Referring to fig. 1, the total current output by the power supply 103 is I, and the first sub-current on the first main-stage sub-coil 1011 is I1A second sub-current level I at the second main sub-coil 10212，I＝I1+I2In the current adjusting process, the total current is adjusted, and the first sub-current and the second sub-current cannot be controlled, because the impedances of the first main sub-coil 1011 and the second main sub-coil 1021 are different, the first sub-current and the second sub-current cannot be guaranteed to be equal in magnitude, the current on the first sub-coil 1012 and the current on the second sub-coil 1022 cannot be guaranteed to be equal in magnitude, and the magnet generated by the first sub-coil 1012 cannot be guaranteed to be equal in magnitudeThe field intensity is different from the magnetic field intensity generated by the second secondary sub-coil 1022, so that the gas ionization rate is different, and the overall gas ionization rate is influenced.
In view of the problems of the prior art, embodiments of the present invention provide a gas dissociation system. Referring to fig. 2, the gas dissociation system 200 includes a gas dissociation circuit 201 and a dissociation chamber 202.
In some embodiments, the gas dissociation circuit comprises at least two dissociation transformers and at least two reactances.
Referring to fig. 2, the gas dissociation circuit 201 includes two dissociation transformers 2011 and two reactances (not shown in the figure), the dissociation transformer 2011 includes a first primary coil 20111 and a first secondary coil 20112, the first primary coil 20111 is connected in series, the first secondary coil 20112 and the reactances are arranged in a one-to-one correspondence manner, the first secondary coil 20112 and the reactances are connected in series, the turn ratio of all the dissociation transformers 2011 is the same, and the turn ratio is the ratio of the number of turns of the first primary coil 20111 to the number of turns of the first secondary coil 20112 in the same dissociation transformer 2011. The first main coils 20111 are connected in series, the currents on the first main coils 20111 are the same, and since the turn ratios of all the dissociation transformers 2011 are the same, the currents on the first auxiliary coils 20112 are the same, and the magnetic field strengths generated by all the first auxiliary coils 20112 are also the same, so that the ionization rates of the gases are the same, and further, the gas ionization rate is improved.
Referring to fig. 2, the dissociation transformer 2011 further includes a first core 20113, and the first primary coil 20111 and the first secondary coil 20112 surround the first core 20113.
Referring to fig. 2, the gas dissociation circuit 201 further includes an ignition unit 2012, the ignition unit 2012 includes an ignition transformer 20121, a capacitor 20122, a switching unit 20123 and an ignition electrode (not shown), the ignition transformer 20121 includes a second primary winding 201211 and a second secondary winding 201212, the second primary winding 201211 is connected in series with the first primary winding 20111, the capacitor 20122 is connected in parallel with the second primary winding 201211, the switching unit 20123 is connected in parallel with the second primary winding 201211, the ignition electrode is connected in series with the second secondary winding 201212, and the ignition electrode is disposed in the dissociation chamber 202.
In some embodiments, the switching unit is a power switch. Optionally, the switch unit is a Metal-Oxide-Semiconductor Field-Effect Transistor (MOSFET) or an Insulated Gate Bipolar Transistor (IGBT).
Referring to fig. 2, the ignition transformer 20121 further includes a second magnetic core 201213, and the second primary winding 201211 and the second secondary winding 201212 surround the second magnetic core 201213.
Referring to fig. 2, the gas dissociation circuit 201 further includes a current source 2013, the current source 2013 being connected in series with the first primary coil 20111.
Referring to fig. 2, the gas dissociation system 200 further comprises an ionization rate detection device 203, wherein the ionization rate detection device 203 is configured to detect an ionization rate of the gas in the dissociation chamber 202.
Fig. 3 is a block diagram of an ionization rate detection apparatus according to some embodiments of the present invention. Referring to fig. 3, the ionization rate detection apparatus 203 includes a sustaining gas input control unit 2031, an output detection unit 2032, and a calculation unit 2033, the sustaining gas input control unit 2031 is configured to control the amount of sustaining gas input to the dissociation chamber 202, the output detection unit 2032 is configured to detect the amount of sustaining gas remaining in the gas output from the dissociation chamber 202, and the calculation unit 2033 is configured to calculate the ionization rate from the amount of sustaining gas input to the dissociation chamber 202 and the amount of sustaining gas remaining in the gas output from the dissociation chamber 202. Optionally, the maintaining gas input control unit 2031 is a flow valve, the output detection unit 2032 is a mass spectrometer, and the calculation unit 2033 is a divider.
In some embodiments, the gas dissociation system further comprises an ignited gas input control unit for controlling the amount of ignited gas input into the dissociation chamber. Optionally, the ignition gas input control unit is a flow valve.
Referring to fig. 2, the gas dissociation system 200 further includes a control unit 204 for adjusting the current source 2013 and the switching unit 20123 according to the current in the second primary winding 201211, a reference current, the ionization rate, and a reference ionization rate.
In some embodiments, the control unit includes an ignition control subunit and a maintenance control subunit,
fig. 4 is a block diagram of an ignition control subunit in some embodiments of the invention. Referring to fig. 4, the ignition control subunit 2041 includes a first comparing unit 20411 and a first proportional integral controller 20412, where the first comparing unit 20411 is configured to compare the reference current with the current in the second main winding to obtain first comparison result data, and the first proportional integral controller 20412 is configured to output a switching unit control signal according to the first comparison result data to control the switching unit to be turned on or off.
In some embodiments, the first comparing unit determines that the reference current and the current in the second main winding are equal in magnitude, and then the first proportional integral controller controls the switching unit to be turned on.
In some embodiments, if the first comparing unit determines that the reference current and the current in the second main coil are not equal, the first proportional-integral controller controls the switching unit to turn off.
FIG. 5 is a block diagram of a maintenance control subunit in some embodiments of the invention. Referring to fig. 5, the sustain control subunit 2042 includes a second comparing unit 20421, a third comparing unit 20422, a second proportional-integral controller 20423 and a third proportional-integral controller 20424, the second comparing unit 20421 is configured to compare the ionization rate with the reference ionization rate to output first error data, the second proportional-integral controller 20423 is configured to output an adjustment reference current according to the first error data, the third comparing unit 20422 is configured to compare the adjustment reference current with the current magnitude in the second main coil to output second error data, and the third proportional-integral controller 20424 is configured to output a current source control signal according to the second error data to adjust the output current magnitude of the current source.
In some embodiments, if the first comparing unit determines that the ionization rate is greater than the reference ionization rate, the adjusted reference current output by the second proportional-integral controller is greater than the reference current, and if the third comparing unit determines that the adjusted reference current is greater than the reference current, the third proportional-integral controller controls the magnitude of the output current of the current source to decrease.
In some embodiments, if the first comparing unit determines that the ionization rate is smaller than the reference ionization rate, the adjusted reference current output by the second proportional-integral controller is smaller than the reference current, and if the third comparing unit determines that the adjusted reference current is smaller than the reference current, the third proportional-integral controller controls the magnitude of the output current of the current source to be larger.
In some embodiments, when the first comparing unit determines that the ionization rate is equal to the reference ionization rate, the second proportional-integral controller outputs the adjusted reference current equal to the reference current, and when the third comparing unit determines that the adjusted reference current is equal to the reference current, the third proportional-integral controller controls the magnitude of the output current of the current source to be constant.
In some embodiments, the gas dissociation circuit is powered on, that is, the dissociation transformer and the ignition transformer enter an operating state, and the ignition gas input control unit opens to deliver ignition gas to the dissociation chamber;
the ignition control subunit controls the switch unit to be switched off, and the capacitor stores energy and high voltage for ignition;
the ignition control subunit detects whether the reference current and the current in the second main coil are equal, if the reference current and the current in the second main coil are not equal, ignition is performed again until the reference current and the current in the second main coil are equal, and then the ignition control subunit controls the switch unit to be switched on;
the maintaining gas input control unit opens and controls the amount of the maintaining gas input into the dissociation chamber, the maintaining gas enters the dissociation chamber, after a threshold time, for example, 10s, the output detection unit detects the amount of the maintaining gas remaining in the gas output from the dissociation chamber, and the calculation unit calculates the ionization rate according to the amount of the maintaining gas entering the dissociation chamber and the amount of the maintaining gas remaining in the gas output from the dissociation chamber;
the maintaining control subunit adjusts the output current of the current source according to the ionization rate, the reference ionization rate and the reference current.
Although the embodiments of the present invention have been described in detail hereinabove, it is apparent to those skilled in the art that various modifications and variations can be made to these embodiments. However, it is to be understood that such modifications and variations are within the scope and spirit of the present invention as set forth in the following claims. Moreover, the invention as described herein is capable of other embodiments and of being practiced or of being carried out in various ways.
Claims (10)
1. The gas dissociation circuit based on multi-coil coupling is characterized by comprising at least two dissociation transformers and at least two reactances, wherein each dissociation transformer comprises a first main coil and a first auxiliary coil, the first main coils are connected in series, the first auxiliary coils and the reactances are arranged in a one-to-one correspondence mode, the first auxiliary coils are connected in series, the turn ratios of all the dissociation transformers are the same, and the turn ratio is the ratio of the number of turns of the first main coil to the number of turns of the first auxiliary coil in the same dissociation transformer.
2. The gas dissociation circuit of claim 1, wherein the dissociation transformer further comprises a first magnetic core, the first primary coil and the first secondary coil being wound around an outer side of the first magnetic core.
3. The gas dissociation circuit of claim 1, further comprising an ignition unit comprising an ignition transformer including a second primary winding and a second secondary winding, the second primary winding and the first primary winding being connected in series.
4. The gas dissociation circuit of claim 3, wherein the ignition transformer further comprises a second magnetic core, the second primary winding and the second secondary winding surrounding an outer side of the second magnetic core.
5. The gas dissociation circuit of claim 3, wherein the ignition unit further comprises a capacitance in parallel with the second primary coil.
6. The gas dissociation circuit of claim 3, wherein the ignition unit further comprises an ignition electrode in series with the second sub-coil.
7. The gas dissociation circuit of claim 3, wherein the ignition unit further comprises a switching unit in parallel with the second primary winding.
8. The gas dissociation circuit of claim 7, wherein the switching unit is a power switch.
9. The gas dissociation circuit of claim 1, further comprising a current source in series with the first primary winding.
10. A gas dissociation system, comprising:
a dissociation chamber; and
the gas dissociation circuit of any of claims 1-9, wherein the reactance is disposed within the dissociation chamber.
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| Application Number | Priority Date | Filing Date | Title |
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| CN202210096385.0A CN114501765A (en) | 2022-01-26 | 2022-01-26 | Gas dissociation circuit and gas dissociation system based on multi-coil coupling |
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| CN202210096385.0A CN114501765A (en) | 2022-01-26 | 2022-01-26 | Gas dissociation circuit and gas dissociation system based on multi-coil coupling |
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