CN114477196A - Method for preparing fumed silica by fluorination method - Google Patents
Method for preparing fumed silica by fluorination method Download PDFInfo
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 86
- 238000000034 method Methods 0.000 title claims abstract description 80
- 229910021485 fumed silica Inorganic materials 0.000 title claims abstract description 21
- 238000003682 fluorination reaction Methods 0.000 title claims abstract description 16
- 238000000354 decomposition reaction Methods 0.000 claims abstract description 45
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims abstract description 43
- 239000000843 powder Substances 0.000 claims abstract description 40
- 239000007789 gas Substances 0.000 claims abstract description 39
- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 claims abstract description 39
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 31
- 238000001035 drying Methods 0.000 claims abstract description 29
- 239000002253 acid Substances 0.000 claims abstract description 28
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 claims abstract description 27
- 239000003546 flue gas Substances 0.000 claims abstract description 26
- 230000015572 biosynthetic process Effects 0.000 claims abstract description 24
- 238000001816 cooling Methods 0.000 claims abstract description 24
- 238000001556 precipitation Methods 0.000 claims abstract description 24
- 238000003786 synthesis reaction Methods 0.000 claims abstract description 24
- 238000001179 sorption measurement Methods 0.000 claims abstract description 23
- 238000004090 dissolution Methods 0.000 claims abstract description 21
- 239000000047 product Substances 0.000 claims abstract description 20
- 238000000746 purification Methods 0.000 claims abstract description 15
- 238000005406 washing Methods 0.000 claims abstract description 14
- 239000001257 hydrogen Substances 0.000 claims abstract description 7
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 7
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 6
- 238000005243 fluidization Methods 0.000 claims abstract description 6
- 239000002244 precipitate Substances 0.000 claims abstract description 6
- 229910001515 alkali metal fluoride Inorganic materials 0.000 claims abstract description 5
- 239000006229 carbon black Substances 0.000 claims abstract description 3
- 230000008569 process Effects 0.000 claims description 37
- 229940104869 fluorosilicate Drugs 0.000 claims description 18
- 229910052783 alkali metal Inorganic materials 0.000 claims description 17
- 150000001340 alkali metals Chemical class 0.000 claims description 17
- 239000000446 fuel Substances 0.000 claims description 8
- 229910000040 hydrogen fluoride Inorganic materials 0.000 claims description 7
- 239000002245 particle Substances 0.000 claims description 7
- 235000012239 silicon dioxide Nutrition 0.000 claims description 7
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 6
- 239000001301 oxygen Substances 0.000 claims description 6
- 229910052760 oxygen Inorganic materials 0.000 claims description 6
- 230000018044 dehydration Effects 0.000 claims description 5
- 238000006297 dehydration reaction Methods 0.000 claims description 5
- 238000000197 pyrolysis Methods 0.000 claims description 3
- 238000001291 vacuum drying Methods 0.000 claims description 3
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims description 2
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 claims description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims description 2
- 229930195733 hydrocarbon Natural products 0.000 claims description 2
- 150000002430 hydrocarbons Chemical class 0.000 claims description 2
- 239000007788 liquid Substances 0.000 claims description 2
- 229910052744 lithium Inorganic materials 0.000 claims description 2
- 229910052700 potassium Inorganic materials 0.000 claims description 2
- 239000011591 potassium Substances 0.000 claims description 2
- 229910052708 sodium Inorganic materials 0.000 claims description 2
- 239000011734 sodium Substances 0.000 claims description 2
- 239000004215 Carbon black (E152) Substances 0.000 claims 1
- 238000001914 filtration Methods 0.000 claims 1
- 230000014759 maintenance of location Effects 0.000 claims 1
- 239000000243 solution Substances 0.000 abstract description 22
- 239000002994 raw material Substances 0.000 abstract description 12
- 238000006243 chemical reaction Methods 0.000 abstract description 9
- 239000011259 mixed solution Substances 0.000 abstract description 2
- 239000000779 smoke Substances 0.000 abstract 1
- -1 sodium fluorosilicate Chemical compound 0.000 description 18
- FFBHFFJDDLITSX-UHFFFAOYSA-N benzyl N-[2-hydroxy-4-(3-oxomorpholin-4-yl)phenyl]carbamate Chemical compound OC1=C(NC(=O)OCC2=CC=CC=C2)C=CC(=C1)N1CCOCC1=O FFBHFFJDDLITSX-UHFFFAOYSA-N 0.000 description 12
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 11
- 229910052731 fluorine Inorganic materials 0.000 description 9
- 239000011737 fluorine Substances 0.000 description 9
- 238000010521 absorption reaction Methods 0.000 description 8
- 239000007787 solid Substances 0.000 description 8
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 6
- 239000006227 byproduct Substances 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 5
- 208000005156 Dehydration Diseases 0.000 description 4
- 239000007795 chemical reaction product Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 239000000428 dust Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 239000005049 silicon tetrachloride Substances 0.000 description 3
- 239000002699 waste material Substances 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000002686 phosphate fertilizer Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000010306 acid treatment Methods 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 238000007791 dehumidification Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 150000004673 fluoride salts Chemical class 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 230000002787 reinforcement Effects 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 230000008719 thickening Effects 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
- C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
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Abstract
Description
技术领域technical field
本发明涉及化工、材料领域,特别涉及一种氟化法制备气相白炭黑的方法。The invention relates to the fields of chemical industry and materials, in particular to a method for preparing gas-phase silica by a fluorination method.
背景技术Background technique
气相白炭黑(纳米二氧化硅)是极其重要的高科技超微细无机新材料之一,因其粒径很小、表面积大,表面吸附力强,表面能大,化学纯度高、分散性能好、热阻、电阻等方面具有特异的性能,以其优越的稳定性、补强性、增稠性和触变性,在众多学科及领域中具有不可或缺的突出重要性。工业上主要以四氯化硅为原料,采用氢焰法高温火焰合成进行生产。例如,中国专利CN1282603C以四氯化硅为原料,通过高温火焰法合成气相白炭黑,然而,存在四氯化硅原料成本高、副产盐酸难处理等问题。因此,尚待开发更为高效清洁的气相白炭黑新技术。Fumed silica (nano silica) is one of the extremely important high-tech ultra-fine inorganic new materials, because of its small particle size, large surface area, strong surface adsorption, large surface energy, high chemical purity and good dispersion performance , thermal resistance, resistance and other aspects have specific properties, with its superior stability, reinforcement, thickening and thixotropy, it has an indispensable and outstanding importance in many disciplines and fields. In industry, silicon tetrachloride is mainly used as raw material, and it is produced by high temperature flame synthesis by hydrogen flame method. For example, Chinese patent CN1282603C uses silicon tetrachloride as a raw material to synthesize fumed silica by a high-temperature flame method. However, there are problems such as high raw material cost of silicon tetrachloride and intractable by-product hydrochloric acid. Therefore, a more efficient and clean new technology of fumed silica has yet to be developed.
在众多研发路线中,四氟化硅氢焰合成法被认为是最具发展前景的路线之一。四氟化硅气体可从磷肥工业副产氟硅酸或氟硅酸钠分解得到,易于提纯至白炭黑生产所需的较高纯度,合成白炭黑产生的氟化氢副产品市场需求较好。例如,中国专利CN102351150B以磷肥副产的粗四氟化硅为硅源,经过除尘和除湿后,与水蒸气作用,制备气相白炭黑。但是,该路线存在以下三个方面突出问题:(1)若以氟硅酸钠分解获得四氟化硅气体,存在低温分解不完全而高温分解物料粘结难题,尚需进一步研发采用复杂的分解方法,具体见中国专利申请CN110683548A的相关描述;(2)四氟化硅氢焰法制备白炭黑反应体系的热力学平衡转化率偏低(1500℃下仅~70%),经分离回收粉体后烟气进行吸收处理会产生难以处理的氟硅酸溶液;(3)四氟化硅分解产生的烟气及氟硅酸处理产生的氟化氢产品须精制/脱水等处理后进行产品销售,增加了白炭黑生产商运行成本和市场不确定性风险要素。Among the many research and development routes, the hydrogen tetrafluoride flame synthesis method is considered to be one of the most promising routes. Silicon tetrafluoride gas can be obtained from the decomposition of fluorosilicic acid or sodium fluorosilicate by-product of the phosphate fertilizer industry, and it is easy to purify to the higher purity required for the production of silica. For example, Chinese patent CN102351150B uses crude silicon tetrafluoride produced by phosphate fertilizer as a silicon source, and after dust removal and dehumidification, it reacts with water vapor to prepare fumed silica. However, this route has the following three outstanding problems: (1) If the silicon tetrafluoride gas is obtained by decomposing sodium fluorosilicate, there is a problem that the low-temperature decomposition is incomplete and the high-temperature decomposition materials are bonded. For the method, see the relevant description of Chinese patent application CN110683548A for details; (2) the thermodynamic equilibrium conversion rate of the reaction system for preparing silica by tetrafluoride hydrogen flame method is low (only ~70% at 1500 ° C), and the powder is recovered after separation After the flue gas is absorbed and treated, it will produce a difficult-to-treat fluosilicic acid solution; (3) the flue gas generated by the decomposition of silicon tetrafluoride and the hydrogen fluoride products generated by the fluosilicic acid treatment must be purified/dehydrated before product sales, which increases the number of products sold. Silica producers' operating costs and market uncertainty risk factors.
综上所述,现有气相白炭黑制备技术存在转化率偏低、排放的烟气需精制导致成本高等问题。因此,通过工艺技术创新,开发出绿色环保,经济的生产技术具有重要的意义。To sum up, the existing fumed silica preparation technology has the problems of low conversion rate and high cost caused by the need to refine the emitted flue gas. Therefore, it is of great significance to develop a green, environmentally friendly and economical production technology through technological innovation.
发明内容SUMMARY OF THE INVENTION
针对现有气相白体黑制备技术存在的问题,本发明提供了一种氟化法制备气相白炭黑的方法。整个流程以优质硅石为原料,通过氟介质循环有效避免三废和副产品产生,从而实现气相白炭黑的低成本高效清洁生产。因此,本方法具有环境友好,能耗低,产品附加值高等特点。Aiming at the problems existing in the existing technology for preparing gas-phase white body black, the present invention provides a method for preparing gas-phase white carbon black by a fluorination method. The whole process uses high-quality silica as the raw material, and effectively avoids the generation of three wastes and by-products through the circulation of fluorine medium, so as to realize the low-cost, high-efficiency and clean production of fumed silica. Therefore, the method has the characteristics of environmental friendliness, low energy consumption and high added value of products.
为达到上述目的,本发明采用了如下的技术方案:To achieve the above object, the present invention has adopted the following technical scheme:
一种氟化法制备气相白炭黑的方法,所述方法包括以下几个工序:冷却吸收-溶解工序1、吸附沉淀工序2、洗涤净化工序3、干燥工序4、流态化分解工序5和火焰合成工序6,具体按以下步骤进行:A method for preparing fumed silica by fluorination, the method comprises the following steps: cooling absorption-
1)将火焰合成工序6产生的烟气送入冷却吸收-溶解工序1,使烟气中的氟化氢气体和残留的四氟化硅气体被溶解吸收形成氢氟酸和氟硅酸溶液,氢氟酸与优质硅石反应形成氟硅酸;1) The flue gas generated in the
2)将冷却吸收-溶解工序1得到的氟硅酸溶液送入吸附沉淀工序2,并加入流态化分解工序5产生的分解粉体产物,使氟硅酸中的四氟化硅与碱金属氟盐形成碱金属氟硅酸盐沉淀,氢氟酸溶液循环返回冷却吸收-溶解工序1;2) The fluorosilicic acid solution obtained in the cooling absorption-dissolving
3)将吸附沉淀工序2得到的碱金属氟硅酸盐沉淀送入洗涤净化工序3,进行洗涤净化处理,继而过滤得到纯净的碱金属氟硅酸盐粉体;3) the alkali metal fluorosilicate precipitation obtained in the
4)将洗涤净化工序3得到氟硅酸盐粉体送入干燥工序4,进行干燥脱水处理,得到干燥的碱金属氟硅酸盐粉体;4) The fluorosilicate powder obtained in the washing and
5)将干燥工序4得到碱金属氟硅酸盐粉体送入流态化分解工序5,利用四氟化硅循环气体实现氟硅酸盐的流态化部分分解,得到四氟化硅气体,分解后的粉体产物则送入吸附沉淀工序2;5) The alkali metal fluorosilicate powder obtained in the drying
6)将流态化分解工序5得到的四氟化硅气体经过净化后送入火焰合成工序6,通过高温分解得到白炭黑粉体和烟气,烟气中氟化氢气体和残留的四氟化硅气体则送入冷却吸收-溶解工序1。6) The silicon tetrafluoride gas obtained in the
优选地,所述吸收-溶解工序1中硅石原料中二氧化硅的质量含量不低于99.0%,粒径范围为0.1~2.0mm。Preferably, the mass content of silica in the silica raw material in the absorption-
优选地,所述的碱金属氟盐中的碱金属为锂、钾、钠等其中的一种或几种的组合。Preferably, the alkali metal in the alkali metal fluoride salt is one or a combination of lithium, potassium, and sodium.
优选地,所述的脱水干燥工序3采用真空干燥、固定床干燥和流化床干燥中的一种或几种,脱水干燥温度20~200℃,干燥时间0.1~36h。Preferably, the dehydration and
优选地,所述的低温分解工序4采用流化床反应器,流化气为四氟化硅气体,分解温度为400~700℃,停留时间为0.5~3.0h。Preferably, the low-
优选地,所述的火焰合成工序5中使用的燃料可以是氢气和/或一氧化碳,也可以是气态或液态可燃性碳氢化合物中的一种或几种的组合,温度为1000~2000℃,四氟化硅气体、氧气和燃料的摩尔比为1:2~15:1.5~8。Preferably, the fuel used in the
本发明以优质硅石粉体为原料,利用四氟化硅火焰合成产生烟气冷却吸收得到溶液中的氢氟酸进行溶解反应得到氟硅酸溶液;接着,将流态化分解粉体产物加入氟硅酸溶液中,使氟硅酸与碱金属氟盐形成氟硅酸盐沉淀和氢氟酸,氢氟酸溶液循环返回用于冷却吸收-溶解工序;氟硅酸盐经过洗涤净化、过滤干燥后,进行流态化分解得到四氟化硅气体和粉体产物;四氟化硅气体经净化后采用氢焰法合成气相白炭黑产品,所产生的烟气经冷却吸收形成氢氟酸和氟硅酸混合溶液循环用于硅石的溶解。整个流程以优质硅石为原料,通过氟介质循环有效避免三废和副产品产生,从而实现气相白炭黑的低成本高效清洁生产。In the present invention, high-quality silica powder is used as raw material, and flue gas is synthesized by flame synthesis of silicon tetrafluoride to cool and absorb to obtain hydrofluoric acid in the solution, which is dissolved and reacted to obtain a fluorosilicic acid solution; then, the fluidized decomposition powder product is added with fluorine In the silicic acid solution, fluorosilicic acid and alkali metal fluoride are formed into fluorosilicate precipitate and hydrofluoric acid, and the hydrofluoric acid solution is circulated and returned to the cooling absorption-dissolving process; the fluorosilicate is washed, purified, filtered and dried. , carry out fluidized decomposition to obtain silicon tetrafluoride gas and powder products; after the silicon tetrafluoride gas is purified, a hydrogen flame method is used to synthesize gas-phase silica products, and the generated flue gas is cooled and absorbed to form hydrofluoric acid and fluorine The silicic acid mixed solution is circulated for the dissolution of silica. The whole process uses high-quality silica as the raw material, and effectively avoids the generation of three wastes and by-products through the circulation of fluorine medium, so as to realize the low-cost, high-efficiency and clean production of fumed silica.
相比现有技术,本发明具有以下突出的优点:Compared with the prior art, the present invention has the following outstanding advantages:
(1)低温分解工序采用流态化技术强化了氟硅酸钠分解过程的传热传质过程,在较低温度条件下具有较快的反应速率,有效避免了熔融结块;(1) The low temperature decomposition process adopts fluidization technology to strengthen the heat and mass transfer process of the sodium fluorosilicate decomposition process, and has a faster reaction rate under lower temperature conditions, effectively avoiding melting and agglomeration;
(2)有效解决了吸收工序产生的氟硅酸和分解工序产生的固态分解产物的利用问题,实现氟介质的循环利用;(2) The utilization problem of the fluorosilicic acid produced in the absorption process and the solid-state decomposition product produced in the decomposition process is effectively solved, and the recycling of the fluorine medium is realized;
(3)整个工艺过程有效避免了三废和副产品的产生。(3) The whole process effectively avoids the generation of three wastes and by-products.
附图说明Description of drawings
附图用来提供对本发明的进一步阐释,并且构成说明书的一部分,与本发明的实施例一起用于解释本发明,并不构成对本发明的限制。The accompanying drawings are used to provide further explanation of the present invention, and constitute a part of the specification, and are used to explain the present invention together with the embodiments of the present invention, and do not limit the present invention.
图1为本发明所述的一种氟化法制备气相白炭黑的方法流程示意图;Fig. 1 is a kind of fluorination method according to the present invention to prepare the method flow schematic diagram of gas-phase silica;
附图标记:1、冷却吸收-溶解工序,2、吸附沉淀工序,3、洗涤净化工序,4、干燥工序,5、流态化分解工序,6、火焰合成工序。Reference numerals: 1. Cooling absorption-dissolution process, 2. Adsorption precipitation process, 3. Washing and purification process, 4. Drying process, 5. Fluidized decomposition process, 6. Flame synthesis process.
具体实施方式Detailed ways
本说明书中公开地任一特征,除非特别叙述,均可被其他等效或具有类似目的的替代特征加以替换。除非特别叙述,每个特征只是一系列等效或者类似特征中的一个例子而已。所述仅仅是为了帮助理解本发明,不应该视为对本发明的具体限制。Any feature disclosed in this specification, unless expressly stated otherwise, may be replaced by other equivalent or alternative features serving a similar purpose. Unless stated otherwise, each feature is only one example of a series of equivalent or similar features. The description is only for helping understanding of the present invention and should not be regarded as a specific limitation of the present invention.
下面以附图和具体实施方式对本发明作进一步详细的说明。The present invention will be described in further detail below with the accompanying drawings and specific embodiments.
实施例1Example 1
图1为本发明所述的一种氟化法制备气相白炭黑的方法的流程示意图。结合图1,一种氟化法制备气相白炭黑的方法,包括以下几个工序:冷却吸收-溶解工序1,吸附沉淀工序2、洗涤净化工序3、干燥工序4、流态化分解工序5和火焰合成工序6,具体按以下步骤进行:Fig. 1 is a schematic flow diagram of a method for preparing gas-phase silica by a fluorination method according to the present invention. With reference to Fig. 1, a method for preparing fumed silica by fluorination method includes the following steps: cooling absorption-
1)将火焰合成工序6产生的烟气送入冷却吸收-溶解工序1,使烟气中的氟化氢气体和残留的四氟化硅气体被溶解吸收形成氢氟酸和氟硅酸溶液,氢氟酸与优质硅石反应形成氟硅酸;1) The flue gas generated in the
2)将冷却吸收-溶解工序1得到的氟硅酸溶液送入吸附沉淀工序2,并加入流态化分解工序5产生的分解粉体产物,使氟硅酸中的四氟化硅与碱金属氟盐形成碱金属氟硅酸盐沉淀,氢氟酸溶液循环返回冷却吸收-溶解工序1;2) The fluorosilicic acid solution obtained in the cooling absorption-dissolving
3)将吸附沉淀工序2得到的碱金属氟硅酸盐沉淀送入洗涤净化工序3,进行洗涤净化处理,继而过滤得到纯净的氟硅酸盐粉体;3) the alkali metal fluorosilicate precipitation obtained in the
4)将洗涤净化工序3得到氟硅酸盐粉体送入干燥工序4,进行干燥脱水处理,得到干燥的氟硅酸盐粉体;4) sending the fluorosilicate powder obtained in the washing and
5)将干燥工序4得到氟硅酸盐粉体送入流态化分解工序5,利用四氟化硅循环气体实现氟硅酸盐的流态化部分分解,得到四氟化硅气体,分解后的粉体产物则送入吸附沉淀工序2;5) The fluorosilicate powder obtained in the drying
6)将流态化分解工序5得到的四氟化硅气体经过净化后送入火焰合成工序6,通过高温分解得到白炭黑粉体和烟气,烟气中氟化氢气体和残留的四氟化硅气体则送入冷却吸收-溶解工序1。6) The silicon tetrafluoride gas obtained in the
实施例2Example 2
本实施例采用实施例1所述的一种氟化法制备气相白炭黑的方法。所述采用质量含量为99.0%,粒径为0.5mm的二氧化硅粉体作为原料,送入冷却-吸收溶解工序1,与吸收火焰合成工序6烟气得到的氢氟酸溶液反应,形成氟硅酸;再将氟硅酸送入吸附沉淀工序2,与低温分解工序4的固体分解产物进行反应,得到氟硅酸钠;将氟硅酸钠送入干燥工序3,于固定床中100℃干燥处理5h,获得干燥的氟硅酸钠粉体;将干燥的氟硅酸钠粉体送入流态化反应工序5,于400℃反应3.0h,将得到的固体反应产物送入吸附沉淀工序2,而分解产生的四氟化硅气体经过除尘净化后进入火焰合成工序6,在温度为1500℃,四氟化硅、氧气和燃料的摩尔比为1:5:5的条件下分解氧化,获得气相白炭黑,产生的烟气则进入冷却吸收-溶解工序1。In this example, the method for preparing gas-phase silica by a fluorination method described in Example 1 is adopted. The silica powder with a mass content of 99.0% and a particle size of 0.5 mm is used as a raw material, which is sent to the cooling-absorption and
实施例3Example 3
本实施例采用实施例1所述的一种氟化法制备气相白炭黑的方法。所述采用质量含量为99.4%,粒径为2.0mm的二氧化硅粉体作为原料,送入冷却-吸收溶解工序1,与吸收火焰合成工序6烟气得到的氢氟酸溶液反应,形成氟硅酸;再将氟硅酸送入吸附沉淀工序2,与低温分解工序4的固体分解产物进行反应,得到氟硅酸钠;将氟硅酸钠送入干燥工序3,于流化床中200℃干燥处理0.1h,获得干燥的氟硅酸钠粉体;将干燥的氟硅酸钠粉体送入流态化反应工序5,于500℃反应2.0h,将得到的固体反应产物送入吸附沉淀工序2,而分解产生的四氟化硅气体经过除尘净化后进入火焰合成工序6,在温度为1000℃,四氟化硅、氧气和燃料的摩尔比为1:10:8的条件下分解氧化,获得气相白炭黑,产生的烟气则进入冷却吸收-溶解工序1。In this example, the method for preparing gas-phase silica by a fluorination method described in Example 1 is adopted. The silica powder with a mass content of 99.4% and a particle size of 2.0 mm is used as a raw material, which is sent to the cooling-absorption and
实施例4Example 4
本实施例采用实施例1所述的一种氟化法制备气相白炭黑的方法。所述采用质量含量为99.5%,粒径为0.1mm的二氧化硅粉体作为原料,送入冷却-吸收溶解工序1,与吸收火焰合成工序6烟气得到的氢氟酸溶液反应,形成氟硅酸;再将氟硅酸送入吸附沉淀工序2,与低温分解工序4的固体分解产物进行反应,得到氟硅酸钠;将氟硅酸钠送入干燥工序3,于真空干燥箱中20℃干燥处理36h,获得干燥的氟硅酸钠粉体;将干燥的氟硅酸钠粉体送入流态化反应工序5,于400℃反应3.0h,将得到的固体反应产物送入吸附沉淀工序2,而分解产生的四氟化硅气体经过除尘净化后进入火焰合成工序6,在温度为2000℃,四氟化硅、氧气和燃料的摩尔比为1:4:2的条件下分解氧化,获得气相白炭黑,产生的烟气则进入冷却吸收-溶解工序1。In this example, the method for preparing gas-phase silica by a fluorination method described in Example 1 is adopted. The silica powder with a mass content of 99.5% and a particle size of 0.1 mm is used as a raw material, which is sent to the cooling-absorption and
实施例5Example 5
本实施例采用实施例1所述的一种氟化法制备气相白炭黑的方法。所述采用质量含量为99.0%,粒径为1.0mm的二氧化硅粉体作为原料,送入冷却-吸收溶解工序1,与吸收火焰合成工序6烟气得到的氢氟酸溶液反应,形成氟硅酸;再将氟硅酸送入吸附沉淀工序2,与低温分解工序4的固体分解产物进行反应,得到氟硅酸钠;将氟硅酸钠送入干燥工序3,于真空干燥箱中100℃干燥处理24h,获得干燥的氟硅酸钠粉体;将干燥的氟硅酸钠粉体送入流态化反应工序5,于700℃反应0.5h,将得到的固体反应产物送入吸附沉淀工序2,而分解产生的四氟化硅气体经过除尘净化后进入火焰合成工序6,在温度为1500℃,四氟化硅、氧气和燃料的摩尔比为1:15:8的条件下分解氧化,获得气相白炭黑,产生的烟气则进入冷却吸收-溶解工序1。In this example, the method for preparing gas-phase silica by a fluorination method described in Example 1 is adopted. The silica powder with a mass content of 99.0% and a particle size of 1.0 mm is used as a raw material, which is sent to the cooling-absorbing and
本发明的工艺参数(如温度、时间等)区间上下限取值以及区间值都能实现本法,在此不一一列举实施例。The process parameters (such as temperature, time, etc.) of the present invention can implement the method by setting the upper and lower limits of the interval and the interval value, and the embodiments are not listed one by one here.
本发明未详细说明的内容均可采用本领域的常规技术知识。For the content not described in detail in the present invention, conventional technical knowledge in the field can be used.
最后所应说明的是,以上实施例仅用以说明本发明的技术方案而非限制。尽管参照实施例对本发明进行了详细说明,本领域的普通技术人员应该理解,对本发明的技术方案进行修改或者等同替换,都不脱离本发明技术方案的精神和范围,其均应涵盖在本发明的权利要求范围当中。Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention and not to limit them. Although the present invention has been described in detail with reference to the embodiments, those of ordinary skill in the art should understand that any modification or equivalent replacement of the technical solutions of the present invention will not depart from the spirit and scope of the technical solutions of the present invention, and should be included in the present invention. within the scope of the claims.
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