CN114477188B - Purification method and device for high-purity quartz sand - Google Patents
Purification method and device for high-purity quartz sand Download PDFInfo
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- CN114477188B CN114477188B CN202210197454.7A CN202210197454A CN114477188B CN 114477188 B CN114477188 B CN 114477188B CN 202210197454 A CN202210197454 A CN 202210197454A CN 114477188 B CN114477188 B CN 114477188B
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/80—Compositional purity
Abstract
In order to solve the problems of impurity residues and influence on the purity of quartz sand in the existing quartz sand purification process, the invention provides a purification method of high-purity quartz sand, which comprises the following operations: soaking quartz sand by using a chemical solution, wherein the chemical solution comprises acid liquor and/or alkali liquor, and separating and removing the chemical solution after soaking; soaking quartz sand by using silicon dioxide colloid, and separating and removing the silicon dioxide colloid after soaking; obtaining the purified quartz sand. Meanwhile, the invention also discloses a purifying device of the high-purity quartz sand. The purification method of the high-purity quartz sand provided by the invention can effectively remove impurity ions and molecules in the quartz sand by utilizing the strong adsorption capacity and the charge effect of the silica colloid, improves the purity of the purified quartz sand, and can be combined with other quartz crystal lattice impurity purification steps such as chloridizing roasting and the like to realize the preparation of 4N8 and 5N-grade ultra-high-purity quartz sand required by the semiconductor manufacturing industry.
Description
Technical Field
The invention belongs to the technical field of quartz sand treatment, and particularly relates to a purification method and device of high-purity quartz sand.
Background
The high-purity quartz sand is SiO obtained by treating quartz ore physically (crushing, heating, etc.) and chemically (acid leaching, alkali leaching, etc.) 2 The granular quartz product with the content of more than 99.9 percent has wide application in a plurality of fields such as semiconductors, aerospace, optical communication, photovoltaics and the like. The impurity content of the high-purity quartz sand is generally demanding in the high-end application field, and the purity of the high-purity quartz sand is required to reach 4N8 and 5N ultra-high level in the semiconductor field. Acid leaching, alkaline leaching and the like are key steps for purifying quartz sand in the prior art, and the main principle is that impurities in the quartz sand are dissolved through chemical reaction, and then the high-purity quartz sand with the impurities removed is obtained through steps of filtering, cleaning and the like. However, the prior art such as acid leaching and alkaline leaching has limited direct purification effect, and is difficult to meet the high quality requirement. On the one hand, impurities which cannot be dissolved by chemical treatments such as acid leaching, alkali leaching and the like, such as part of fine inclusion impurities distributed in quartz, and similar impurities of substances in crystal lattices, exist in quartz sand, on the other hand, other impurity ions are introduced by the chemical treatments such as acid leaching, alkali leaching and the like, and part of impurity ions are difficult to completely remove by cleaning. Therefore, related high-purity quartz sand purification technology is to be promoted.
Disclosure of Invention
Aiming at the problems that impurities remain and the purity of quartz sand is affected in the existing quartz sand purification process, the invention provides a purification method and device of high-purity quartz sand.
According to the purification method of the high-purity quartz sand provided by the invention, the method is adoptedSilica colloid is used as treatment fluid for purifying quartz sand, and the silica colloid is nano-scale SiO 2 The liquid phase colloid formed by uniformly dispersing the particles in the water has huge specific surface area and surface energy and has a large amount of negative charges, so that various micro impurities, molecules, ions and the like can be effectively adsorbed. In addition, al 3+ 、K + 、Na + 、Fe 3+ 、Ca 2+ 、Mg 2+ 、Ti 4+ The content of the equal element cations is a main factor affecting the purity of the high-purity quartz sand, and the silicon dioxide colloid has a large amount of negative charges, so that the cationic impurities can be effectively adsorbed, and the quartz sand is purified. Meanwhile, ionic impurities introduced in the chemical solution cleaning process are taken away, so that the quartz sand is deeply purified, and the silica colloid is nano-scale SiO 2 The water dispersion of the particles can not influence the purity of the quartz sand even if a small amount of silica colloid is remained in the subsequent purification process, the water in the silica colloid can be removed in an evaporation or heating mode, the residual silica is consistent with the components of the quartz sand, and no new impurities can be introduced, so that the introduction of the impurities caused by the treatment liquid is avoided, and the purity of the treated quartz sand is ensured. In addition, the method provided by the invention can be combined with other quartz crystal lattice impurity purification steps such as chloridizing roasting and the like to realize the preparation of 4N8 and 5N-grade ultra-high-grade high-purity quartz sand.
The technical scheme adopted by the invention for solving the technical problems is as follows:
in one aspect, the invention provides a method for purifying high-purity quartz sand, which comprises the following operations:
soaking quartz sand by using a chemical solution, wherein the chemical solution comprises acid liquor and/or alkali liquor, and separating and removing the chemical solution after soaking;
soaking quartz sand by using silicon dioxide colloid, and separating and removing the silicon dioxide colloid after soaking;
obtaining the purified quartz sand.
Optionally, prior to "soaking the quartz sand with the chemical solution", further comprising pre-treating the quartz sand, the pre-treating comprising one or more of crushing, screening, calcining, water quenching, pulverizing, magnetic separation, and flotation.
Optionally, the acid liquor comprises one or more of sulfuric acid, hydrochloric acid, nitric acid and hydrofluoric acid, wherein the mass concentration of the acid in the acid liquor is 10% -30%, the soaking temperature of the acid liquor is 50-150 ℃, and the soaking time of the acid liquor is 2-6 h;
the alkali liquor comprises one or more of sodium hydroxide, potassium hydroxide and ammonia water, the mass concentration of alkali in the alkali liquor is 10-30%, the alkali liquor soaking temperature is 50-150 ℃, and the alkali liquor soaking time is 2-6 h.
Optionally, the mass concentration of the silicon dioxide colloid is 20% -30%, and the soaking time is 0.5-2 h.
Optionally, when the silica colloid is used for soaking the quartz sand, an alternating current electric field is applied to two sides of the quartz sand soaked by the silica colloid, and silica particles in the silica colloid are shifted back and forth under the action of the alternating current electric field.
When the silica colloid is separated and removed, a direct current electric field is applied to two sides of quartz sand soaked by the silica colloid, and silica particles in the silica colloid move towards one side under the action of the direct current electric field, so that the separation of the silica colloid and the quartz sand is realized.
Optionally, before the quartz sand is soaked by the chemical solution, heating the quartz sand by microwaves is further included;
after "separation to remove the silica colloid", the silica sand is further heated and dried using microwaves.
On the other hand, the invention provides a purification device for high-purity quartz sand, which comprises a purification container, wherein a reaction zone for soaking the quartz sand is formed in the purification container, and a solution feed port for introducing chemical solution, a colloid feed port for introducing silica colloid, a solution discharge port for discharging chemical solution and a colloid discharge port for discharging silica colloid are arranged on the purification container.
Optionally, a colloid discharging area and a solution discharging area are formed in the purifying container, a quartz fiber filter disc is arranged between the reaction area and the colloid discharging area to be separated from each other, a semipermeable membrane filter disc is arranged between the colloid discharging area and the solution discharging area to be separated from each other, the solution feeding port is communicated with the colloid feeding port in the reaction area, the colloid discharging port is communicated with the colloid discharging area, and the solution discharging port is communicated with the solution discharging area.
Optionally, the purifying device of the high-purity quartz sand further comprises a first electrode, a second electrode and a power supply device, the reaction area, the colloid discharging area and the solution discharging area are sequentially arranged from top to bottom, the first electrode is located at the top of the reaction area, the second electrode is located at the bottom of the solution discharging area, and the power supply device is respectively and electrically connected with the first electrode and the second electrode.
Optionally, the purification device of high-purity quartz sand further comprises a microwave heating device, wherein the microwave heating device is arranged at the periphery of the purification container and is used for heating materials in the reaction zone by microwaves.
Drawings
FIG. 1 is a schematic structural view of a purifying device for high-purity quartz sand provided by the invention;
FIG. 2 is a schematic view of another embodiment of the purification apparatus for high purity silica sand provided by the present invention;
fig. 3 is a schematic view of another embodiment of the purification apparatus for high purity silica sand provided by the present invention.
Reference numerals in the drawings of the specification are as follows:
1. a purification vessel; 11. a reaction zone; 12. a colloid discharging area; 13. a solution discharge zone; 14. a colloid feed inlet; 15. a solution feed port; 16. a colloid discharge port; 17. a solution discharge port; 18. a solid impurity discharge zone; 19. a solid impurity outlet; 2. a first electrode; 3. a second electrode; 4. a power supply device; 5. quartz fiber filter sheets; 6. a semipermeable membrane filter; 7. a microwave heating device; 8. quartz fiber screen.
Detailed Description
In order to make the technical problems, technical schemes and beneficial effects solved by the invention more clear, the invention is further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are for purposes of illustration only and are not intended to limit the scope of the invention.
In the description of the present invention, it should be understood that the terms "upper," "lower," "front," "rear," "left," "right," "top," "bottom," "inner," "outer," and the like indicate or are based on the orientation or positional relationship shown in the drawings, merely to facilitate description of the present invention and to simplify the description, and do not indicate or imply that the devices or elements referred to must have a specific orientation, be configured and operated in a specific orientation, and thus should not be construed as limiting the present invention. In the description of the present invention, unless otherwise indicated, the meaning of "a plurality" is two or more.
The embodiment of the invention provides a purification method of high-purity quartz sand, which comprises the following operations:
soaking quartz sand by using a chemical solution, wherein the chemical solution comprises acid liquor and/or alkali liquor, and separating and removing the chemical solution after soaking;
soaking quartz sand by using silicon dioxide colloid, and separating and removing the silicon dioxide colloid after soaking;
obtaining the purified quartz sand.
Adopts silicon dioxide colloid as a treatment fluid for purifying quartz sand, wherein the silicon dioxide colloid is nano-scale SiO 2 The liquid phase colloid formed by uniformly dispersing the particles in the water has huge specific surface area and surface energy and has a large amount of negative charges, so that various micro impurities, molecules, ions and the like can be effectively adsorbed. In addition, al 3+ 、K + 、Na + 、Fe 3+ 、Ca 2+ 、Mg 2+ 、Ti 4+ The content of the equal element cations is a main factor affecting the purity of the high-purity quartz sand, and the silicon dioxide colloid has a large amount of negative charges, so that the cationic impurities can be effectively adsorbed, and the quartz sand is purified. Meanwhile, ionic impurities introduced in the chemical solution cleaning process are taken away, so that the quartz sand is deeply purified, and the silica sand is oxidizedThe colloid of silica itself is nano-scale SiO 2 The water dispersion of the particles can not influence the purity of the quartz sand even if a small amount of silica colloid is remained in the subsequent purification process, the water in the silica colloid can be removed in an evaporation or heating mode, the residual silica is consistent with the components of the quartz sand, and no new impurities can be introduced, so that the introduction of the impurities caused by the treatment liquid is avoided, and the purity of the treated quartz sand is ensured.
In some embodiments, prior to "soaking the quartz sand with the chemical solution," further comprising pre-treating the quartz sand, the pre-treatment comprising one or more of crushing, screening, calcining, water quenching, pulverizing, magnetic separation, and flotation.
The obvious mineral impurities in the quartz sand are removed through pretreatment, and the granularity of the quartz sand is controlled to be more than 30 meshes.
In some embodiments, the acid solution comprises one or more of sulfuric acid, hydrochloric acid, nitric acid and hydrofluoric acid, wherein the mass concentration of the acid in the acid solution is 10% -30%, the soaking temperature of the acid solution is 50-150 ℃, and the soaking time of the acid solution is 2-6 h;
the alkali liquor comprises one or more of sodium hydroxide, potassium hydroxide and ammonia water, the mass concentration of alkali in the alkali liquor is 10-30%, the alkali liquor soaking temperature is 50-150 ℃, and the alkali liquor soaking time is 2-6 h.
The chemical solution can be selected from acid liquor for one or more treatments, alkali liquor for one or more treatments, or acid liquor and alkali liquor for multiple treatments respectively.
The acid liquor and the alkali liquor are adopted to treat the quartz sand, so that impurities such as metal oxides or metal salts on the surface of the quartz sand can be effectively dissolved, and partial impurities in the quartz sand can be removed.
In some embodiments, the mass concentration of the silica colloid is 20% -30% and the soaking time is 0.5-2 h.
In some embodiments, when the silica colloid is used for soaking the quartz sand, an alternating electric field is applied to two sides of the quartz sand soaked by the silica colloid, and silica particles in the silica colloid are reciprocally displaced under the action of the alternating electric field.
The inventor finds through experiments that when the silica colloid is used for soaking quartz sand, because the silica particles of the silica colloid have certain charges, the silica particles can move under the condition of applying an electric field, and further, the silica particles in the silica colloid can generate reciprocating vibration in an aqueous medium thereof in a mode of applying an alternating electric field, so that the sufficient contact between the silica particles and impurities in the quartz sand is ensured, and the purification effect of the silica colloid is enhanced.
In some embodiments, the alternating electric field has a voltage of 5-100V and a frequency of 10-50 kHz.
In some embodiments, when the silica colloid is removed by separation, a direct current electric field is applied to two sides of quartz sand soaked by the silica colloid, and silica particles in the silica colloid move to one side under the action of the direct current electric field, so that the separation of the silica colloid and the quartz sand is realized.
By utilizing the characteristic that the silica particles in the silica colloid can move under the electric field, the silica particles in the silica colloid can be promoted to move by applying the direct-current electric field so as to realize the separation of the silica particles and the quartz sand, the separation efficiency of the silica colloid and the quartz sand is effectively improved, the residue of the silica particles adsorbed with impurities on the surface of the quartz sand is avoided, and the purity of the purified quartz sand is further improved.
In some embodiments, the voltage of the direct current electric field is 50-500V.
In some embodiments, prior to "soaking the quartz sand with chemical solution", the method further comprises heating the quartz sand with microwaves at a heating power of 500-3000W for a heating time of 0.5-4 hours.
The inclusion impurities in the quartz sand can be destroyed by microwave heating, microcracks are generated on the surface of the quartz sand, the coverage of chemical solution and silica colloid on the quartz sand is increased, and the dissolving and adsorbing effects on the impurities are improved.
After the silica colloid is separated and removed, the quartz sand is heated and dried by microwaves, the heating power is 500-3000W, and the heating time is 0.5-4 h.
After separating the silica colloid, the purity of the quartz sand can not be influenced by the residual silica colloid, the quartz sand can be directly heated without being cleaned by purified water, the quartz sand can be heated in a non-contact way by adopting a microwave heating mode, a device is not required to be replaced, and impurities are prevented from being introduced in the heating process.
In some embodiments, after "heat drying the silica sand using microwaves," further purification of the silica sand by chlorination roasting is included.
As shown in fig. 1, an embodiment of the present invention provides a purification apparatus for high purity silica sand, comprising a purification vessel 1, wherein a reaction zone 11 for soaking the silica sand is formed inside the purification vessel 1, and a solution feed port 15 for introducing a chemical solution, a colloid feed port 14 for introducing a silica colloid, a solution discharge port 17 for discharging the chemical solution, and a colloid discharge port 16 for discharging the silica colloid are provided on the purification vessel 1.
The purification device of the high-purity quartz sand is provided with a solution feed inlet 15 for introducing chemical solution and a colloid feed inlet 14 for introducing silica colloid, and the quartz sand is soaked respectively by the chemical solution and the silica colloid, so that impurity metal ions of the quartz sand can be effectively removed.
In some embodiments, a colloid discharging area 12 and a solution discharging area 13 are formed in the purifying container 1, a quartz fiber filter sheet 5 is arranged between the reaction area 11 and the colloid discharging area 12 and separated from each other, a semipermeable membrane filter sheet 6 is arranged between the colloid discharging area 12 and the solution discharging area 13 and separated from each other, a solution feeding port 15 and a colloid feeding port 14 are communicated with the reaction area 11, a colloid discharging port 16 is communicated with the colloid discharging area 12, and a solution discharging port 17 is communicated with the solution discharging area 13.
The quartz sand raw material and different chemical assistance are realized by using the separation of the quartz fiber filter sheet 5 and the semipermeable membrane filter sheet 6The separation of the agent, the semipermeable membrane filter 6 allows only the solution to pass through, the quartz fiber filter 5 allows the silica gel and the solution to pass through, and the gel can pass through the quartz fiber filter 5 but cannot pass through the semipermeable membrane filter 6. The quartz fiber filter sheet 5 is SiO 2 The fibrous material of single component can avoid introducing impurities. The colloid discharging area 12 and the solution discharging area 13 are formed, which is helpful for recycling processing, and the tailings (silicon dioxide colloid and chemical solution) can be recycled and then used as chemical auxiliary raw materials again.
In some embodiments, the purifying device for high-purity quartz sand further includes a first electrode 2, a second electrode 3, and a power supply device 4, where the reaction zone 11, the colloid discharge zone 12, and the solution discharge zone 13 are sequentially disposed from top to bottom, the first electrode 2 is located at the top of the reaction zone 11, the second electrode 3 is located at the bottom of the solution discharge zone 13, and the power supply device 4 is electrically connected to the first electrode 2 and the second electrode 3 respectively.
The first electrode 2 and the second electrode 3 are used to form an electric field in the purifying vessel 1, and in particular, the power supply device 4 may supply alternating current and direct current to form an alternating current electric field and a direct current electric field in the purifying vessel 1.
Specifically, the first electrode 2 and the second electrode 3 are respectively located at the upper end and the lower end of the purification container 1, when the silica colloid is soaked, the power supply device 4 is turned on, the power supply device is switched to an alternating current gear, an alternating current electric field is generated through the first electrode 2 and the second electrode 3, the silica colloid carries a large amount of negative charges, and moves randomly under the action of the alternating current electric field to be fully contacted with impurities in quartz sand. After the alternating-current gear is started for a certain time, the alternating-current gear is switched to the direct-current gear, so that the second electrode 3 is positively charged, the first electrode 2 is negatively charged, and the colloid moves towards the second electrode 3 under the action of a direct-current electric field.
As shown in fig. 2, in an embodiment, the purifying device for high-purity quartz sand further includes a microwave heating device 7, where the microwave heating device 7 is disposed on the periphery of the purifying container 1, and the microwave heating device 7 is used for microwave heating the material in the reaction zone 11.
As shown in fig. 3, in an embodiment, a solid impurity discharging area 18, a colloid discharging area 12 and a solution discharging area 13 are formed in the purifying container 1, a quartz fiber screen 8 is arranged between the reaction area 11 and the solid impurity discharging area 18 to be separated from each other, a quartz fiber filter sheet 5 is arranged between the solid impurity discharging area 18 and the colloid discharging area 12 to be separated from each other, a semipermeable membrane filter sheet 6 is arranged between the colloid discharging area 12 and the solution discharging area 13 to be separated from each other, a solid impurity outlet 19 communicated with the solid impurity discharging area 18 is arranged on the purifying container 1, a solution feeding port 15 and the colloid feeding port 14 are communicated with the reaction area 11, a colloid discharging port 16 is communicated with the colloid discharging area 12, and a solution discharging port 17 is communicated with the solution discharging area 13.
The solid impurity discharging area 18 is used for screening insoluble small particle impurities generated during purification treatment of quartz sand, quartz fiber screens 8 with different pore sizes can be arranged according to the particle sizes of the contained small particle impurities, and the introduction of other impurities can be avoided by adopting the quartz fiber screens 8 made of quartz fiber materials.
The invention is further illustrated by the following examples.
Example 1
The embodiment is used for explaining the purification method of the high-purity quartz sand disclosed by the invention, and comprises the following operation steps:
(1) Quartz sand raw material: crushing, calcining, water quenching and grinding the raw quartz ore to obtain quartz sand raw material with granularity of 100 meshes, and carrying out microwave heating on the quartz sand raw material with heating power of 2000W for 1h.
(2) Mixed acid leaching: and soaking quartz sand in a chemical solution, wherein the chemical solution is mixed solution of sulfuric acid with the concentration of 20%, hydrochloric acid with the concentration of 20% and hydrofluoric acid with the concentration of 10%, the pickling temperature is 80 ℃, and the pickling time is 4 hours.
(3) Purifying a silicon dioxide colloid: the quartz sand is placed in a silicon dioxide colloid for soaking, wherein the silicon dioxide colloid is an ultra-high purity silicon dioxide colloid with the purity of 99.9999 percent, and the mass concentration is 20 percent. The silica gel is firstly acted by an alternating current electric field (10V/20 kHz) for 5min, fully contacted with quartz sand, then is stood for 30min, and is separated from the quartz sand by the action of a direct current electric field (100V).
(4) And cleaning and drying the quartz sand.
Example 2
This example is for illustrating the purification method of high purity silica sand disclosed in the present invention, and includes most of the operation steps in example 1, which are different in that:
in the step (3), silica colloid is directly adopted to soak quartz sand for 35min without alternating current electric field treatment, and then the quartz sand is separated from the quartz sand under the action of a direct current electric field (100V).
Comparative example 1
This comparative example is a comparative illustration of the purification process of the high purity silica sand disclosed herein, comprising most of the operating steps of example 1, with the difference that:
in the step (3), silica colloid treatment is not performed, and quartz sand is soaked only by purified water.
Performance testing
The quartz sand prepared by the method is subjected to the following performance test:
analysis of silica sand SiO with inductively coupled plasma atomic emission Spectrometry ICP-OES with reference Standard JC/T2027-2010 2 Content, the test results obtained are filled in Table 1.
TABLE 1
| Sample of | Example 1 | Example 2 | Comparative example 1 |
| SiO 2 (％) | 99.9965 | 99.9948 | 99.9908 |
As can be seen from the test results in Table 1, the purification method of the high-purity quartz sand provided by the invention can effectively reduce the impurity content in the quartz sand and improve the purity of the quartz sand.
From the test results of examples 1 and 2, it is evident that the alternating current electric field can promote sufficient contact between silica colloid and quartz sand, and improve the impurity removal effect.
The foregoing description of the preferred embodiments of the invention is not intended to be limiting, but rather is intended to cover all modifications, equivalents, and alternatives falling within the spirit and principles of the invention.
Claims (10)
1. The purification method of the high-purity quartz sand is characterized by comprising the following operations:
soaking quartz sand by using a chemical solution, wherein the chemical solution comprises acid liquor and/or alkali liquor, and separating and removing the chemical solution after soaking;
soaking quartz sand with silica colloid, and separating to remove silica colloid which is nano-scale SiO 2 A liquid phase colloid formed by uniformly diffusing the particles in water;
obtaining the purified quartz sand.
2. The method of purifying high purity silica sand according to claim 1, further comprising, prior to "immersing the silica sand with the chemical solution", pre-treating the silica sand, the pre-treating including one or more of crushing, screening, calcining, water quenching, pulverizing, magnetic separation, and flotation.
3. The method for purifying high-purity quartz sand according to claim 1, wherein the acid solution comprises one or more of sulfuric acid, hydrochloric acid, nitric acid and hydrofluoric acid, the mass concentration of the acid in the acid solution is 10% -30%, the acid solution soaking temperature is 50-150 ℃, and the acid solution soaking time is 2-6 h;
the alkali liquor comprises one or more of sodium hydroxide, potassium hydroxide and ammonia water, the mass concentration of alkali in the alkali liquor is 10-30%, the alkali liquor soaking temperature is 50-150 ℃, and the alkali liquor soaking time is 2-6 h.
4. The method for purifying high-purity quartz sand according to claim 1, wherein the mass concentration of the silica colloid is 20% -30%, and the soaking time is 0.5-2 h.
5. The method for purifying high purity silica sand according to claim 1, wherein when "immersing silica sand in silica colloid", alternating electric fields are applied to both sides of the silica sand immersed in the silica colloid, and silica particles in the silica colloid are reciprocally displaced by the alternating electric fields;
when the silica colloid is separated and removed, a direct current electric field is applied to two sides of quartz sand soaked by the silica colloid, and silica particles in the silica colloid move towards one side under the action of the direct current electric field, so that the separation of the silica colloid and the quartz sand is realized.
6. The method for purifying high purity silica sand according to claim 1, further comprising heating the silica sand with microwaves before "immersing the silica sand with a chemical solution";
after "separation to remove the silica colloid", the silica sand is further heated and dried using microwaves.
7. The purifying device for the high-purity quartz sand is characterized by comprising a purifying container, wherein a reaction zone for soaking the quartz sand is formed in the purifying container, and the purifying container is provided withThe chemical solution comprises acid liquor and/or alkali liquor, and the silicon dioxide colloid is nano-scale SiO 2 The particles uniformly diffuse in the water to form a liquid phase colloid.
8. The purification device of high purity silica sand according to claim 7, wherein a colloid discharge area and a solution discharge area are formed in the purification container, a silica fiber filter sheet is arranged between the reaction area and the colloid discharge area to be separated from each other, a semipermeable membrane filter sheet is arranged between the colloid discharge area and the solution discharge area to be separated from each other, the solution feed inlet and the colloid feed inlet are communicated with the reaction area, the colloid discharge outlet is communicated with the colloid discharge area, and the solution discharge outlet is communicated with the solution discharge area.
9. The purifying device for high-purity quartz sand according to claim 8, further comprising a first electrode, a second electrode and a power supply device, wherein the reaction zone, the colloid discharge zone and the solution discharge zone are sequentially arranged from top to bottom, the first electrode is positioned at the top of the reaction zone, the second electrode is positioned at the bottom of the solution discharge zone, and the power supply device is respectively and electrically connected with the first electrode and the second electrode.
10. The apparatus for purifying high purity silica sand according to claim 7, further comprising a microwave heating device provided at the outer periphery of the purifying vessel, the microwave heating device being for microwave heating of the material in the reaction zone.
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| CN117531703A (en) * | 2024-01-09 | 2024-02-09 | 江苏泓顺硅基半导体科技有限公司 | Screening machine is used in production of high-purity quartz sand |
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Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4804422A (en) * | 1986-02-06 | 1989-02-14 | U.S. Philips Corporation | Method of purifying quartz sand |
| JPH08188412A (en) * | 1995-01-13 | 1996-07-23 | Mitsubishi Chem Corp | High-purity synthetic quartz glass powder, its production, high-purity synthetic quartz glass molding using the same |
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