CN114469108A - Novel microneedle substrate structure - Google Patents
Novel microneedle substrate structure Download PDFInfo
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- CN114469108A CN114469108A CN202210179922.8A CN202210179922A CN114469108A CN 114469108 A CN114469108 A CN 114469108A CN 202210179922 A CN202210179922 A CN 202210179922A CN 114469108 A CN114469108 A CN 114469108A
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
- A61B5/00—Measuring for diagnostic purposes; Identification of persons
- A61B5/24—Detecting, measuring or recording bioelectric or biomagnetic signals of the body or parts thereof
- A61B5/25—Bioelectric electrodes therefor
- A61B5/262—Needle electrodes
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
- A61B5/00—Measuring for diagnostic purposes; Identification of persons
- A61B5/24—Detecting, measuring or recording bioelectric or biomagnetic signals of the body or parts thereof
- A61B5/25—Bioelectric electrodes therefor
- A61B5/279—Bioelectric electrodes therefor specially adapted for particular uses
- A61B5/291—Bioelectric electrodes therefor specially adapted for particular uses for electroencephalography [EEG]
- A61B5/293—Invasive
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Abstract
The application discloses a novel microneedle base structure, which is applied to a neural interface, wherein the neural interface comprises a base structure and a microneedle structure; the micro-needle structure comprises a substrate structure and is characterized in that a slit is formed in the surface of the substrate structure, at least one micro-needle structure is assembled on the substrate structure, the slit and the micro-needle structure do not interfere with each other, the front end of the micro-needle structure is provided with at least one body electrode point, and the body electrode point is led out through a lead and is connected with a signal processing circuit at the rear end. The brain-electrical signal acquisition system solves the problems that the flexible micro-needle is limited in brain-electrical signal acquisition and the rigid micro-needle easily causes brain tissue damage, and realizes the functions of safely and comprehensively acquiring brain-electrical signals.
Description
Technical Field
The application relates to the field of brain-computer interfaces, in particular to a novel microneedle substrate structure.
Background
Neural engineering has become an emerging science and field, combining biomedical engineering techniques and methods, and researching and developing the methods by means of nerve cell regeneration and tissue characteristic evaluation, and interfaces between nerves and electronic equipment. The brain-computer interface is a main implementation mode of nerve engineering, and the brain-computer interface is a direct connection established between the brain of a human or animal and external equipment to realize information exchange between the brain and the equipment. A brain-machine interface, sometimes also referred to as a "brain port" or "brain-machine fusion sense", is a direct connection path established between a human or animal brain (or a culture of brain cells) and an external device. In the case of a one-way brain-computer interface, the computer either accepts commands from the brain or sends signals to the brain (e.g., video reconstruction), but cannot send and receive signals simultaneously. While a bi-directional brain-computer interface allows bi-directional information exchange between the brain and external devices. Research into brain-computer interfaces has continued for over 40 years, and sensory functions that humans have been able to repair or are attempting to repair to date include auditory, visual, and vestibular sensations.
In a brain-computer interface, improved signal recording is mainly attributed to microneedle electrodes which cannot be seen by naked eyes, the improved signal recording penetrates through the outermost layer of the skin and is used for collecting nerve signals, the main function of the improved signal recording is to collect nerve action and sensory potential signals of a human body, the improved signal recording is usually in wired connection with a reading circuit chip used for reading the nerve signals through a lead, and data transmission is realized; although the rigid microneedle array can deeply penetrate into brain tissues to collect electroencephalogram signals, the rigid microneedle array is very easy to cause brain tissue damage due to the rigid characteristics of the rigid microneedle.
Disclosure of Invention
The utility model aims at providing a novel micropin base structure, it is limited, the rigidity micropin causes the problem of brain tissue damage easily to have solved flexible micropin collection brain electrical signal, has realized safety, gathers brain electrical signal comprehensively.
To achieve these objects and other advantages and in accordance with the purpose of the invention, as embodied and broadly described herein, there is provided a novel microneedle base structure applied to a neural interface including a base structure and a microneedle structure; wherein, the surface of the substrate structure is formed with a slit, at least one micro-needle structure is assembled on the substrate structure, and the slit and the micro-needle structure do not interfere with each other.
Further, the base structure surface comprises at least one slit; when the number of the slits is larger than or equal to two, the plurality of slits extend along one direction and are arranged in a staggered mode.
Further, in the direction perpendicular to the extending direction, adjacent slits are projected with a partial overlap.
Further, the slit is a linear slit, a zigzag slit or a wavy slit.
Further, the surface of the substrate structure also comprises at least one groove for assembling the micro-needle structure, and when the number of the slits and the grooves is multiple, the grooves extend along one direction and are arranged in a staggered manner.
Further, the forming material of the base structure includes silicon, polyimide, PDMS, or bacterial cellulose.
Further, the cross section of the substrate structure is square, round, trapezoidal or irregular.
Furthermore, the front end of the micro-needle structure is provided with at least one body electrode point, the body electrode point is led out through a lead and is connected with a signal processing circuit at the rear end, and the tail part of the micro-needle structure is assembled on the substrate structure.
Furthermore, a plurality of the microneedle structures are vertically assembled on the substrate structure in an array shape, or a plurality of the microneedle structures are obliquely assembled on the substrate structure in an array shape.
Further, the micro-needle body is coated with a biodegradable film, and the biodegradable film is used for balancing the stress of different areas of the micro-needle body.
The application at least comprises the following beneficial effects:
1) simple structure and strong adaptability
The novel microneedle substrate structure is provided with a slit, so that the whole substrate has certain flexibility, is attached to the cerebral cortex, ensures high attachment degree, and is convenient for deeply collecting electroencephalogram signals
2) Reduction of implant damage
The micro-needle structure can improve the long-term implantation stability of the micro-needle array and reduce the implantation damage, and the multi-body electrode points on the micro-needles increase the accuracy of the electroencephalogram signals.
3) Improve the detection precision
The front end of the micro-needle structure is provided with a plurality of body electrode points, and a plurality of electrodes acquire signals, so that the accuracy of electroencephalogram signal detection is improved.
Additional advantages, objects, and features of the application will be set forth in part in the description which follows and in part will become apparent to those having ordinary skill in the art upon examination of the following or may be learned from practice of the application.
Drawings
FIG. 1 is a schematic view of the structure of a novel microneedle substrate in example 1 of the present application.
Fig. 2 is a schematic structural diagram of a novel base structure of the micro-needle in example 2 of the present application.
Fig. 3 is a schematic view of a microneedle structure in example 2 of the present application.
Fig. 4 is a schematic view of the microneedle structure array tilted with respect to the substrate structure in example 3 of the present application.
Description of reference numerals: 1 substrate structure, 2 grooves, 3 linear slits, 4 body electrode points, 5 wires and 6 micro-needle structures.
Detailed Description
The present application will now be described in further detail with reference to the accompanying drawings, whereby one skilled in the art can, with reference to the description, make an implementation.
The following description is presented to disclose the application and to enable any person skilled in the art to practice the application. The preferred embodiments in the following description are given by way of example only, and other obvious variations will occur to those skilled in the art. The underlying principles of the application, as defined in the following description, may be applied to other embodiments, variations, modifications, equivalents, and other technical solutions without departing from the spirit and scope of the application.
It will be understood by those skilled in the art that in the present disclosure, the terms "longitudinal," "lateral," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," and the like are used in an orientation or positional relationship indicated in the drawings for ease of description and simplicity of description, and do not indicate or imply that the referenced devices or components must be constructed and operated in a particular orientation and thus are not to be considered limiting.
It is understood that the terms "a" and "an" should be interpreted as meaning that a number of one element or element is one in one embodiment, while a number of other elements is one in another embodiment, and the terms "a" and "an" should not be interpreted as limiting the number.
Example 1
The embodiment 1 of the present application provides a novel microneedle substrate structure, as shown in fig. 1, which includes a substrate structure and a microneedle structure, wherein the substrate structure can be made of nano silicon, has a good deformation adaptability, and can be attached to the cerebral cortex, the thickness of the substrate structure can be adjusted in an actual operable range according to the requirements of actual application, in this embodiment 1, the substrate structure is a rectangular parallelepiped structure, in order to better facilitate the microneedle structure to deeply collect electroencephalogram signals, a plurality of linear slits are formed on the square substrate structure, as shown in fig. 1, the plurality of linear slits extend along one direction (e.g., the X-axis direction) and are arranged in a staggered manner, the width of the linear slits is 3 μm, in the vertical direction of the extending direction (e.g., the Y-axis direction), projections of adjacent slits are partially overlapped, and the linear slits are ensured to be arranged in a staggered manner along one direction, the linear slits are uniformly distributed on the substrate structure, and each position of the substrate structure can be well adapted to the shape of the cerebral cortex. Wherein the extending direction refers to a direction in which the linear slits extend.
The surface of the substrate structure also comprises a plurality of grooves which, like the linear slits, extend along one direction (such as the X-axis direction) and are arranged in a staggered manner, in this example 1, grooves and linear slits were arranged in a staggered manner in each row, the grooves were used to assemble the tails of microneedle structures, the front end of the micro-needle structure is provided with a plurality of body electrode points, the back end of the micro-needle structure is not provided with the body electrode points, the body electrode points are made of metal materials, is fixed at the front end of the micro-needle structure in a welding mode, the body electrode point is led out through a lead, all leads are arranged in a staggered mode to avoid mutual interference, and the micro-needle structure is connected with a signal processing circuit at the rear end, and transmits the acquired electroencephalogram signals to the signal processing circuit for relevant signal processing, the signal processing circuit is not improved in the prior art and is not repeated, and the tail part of the micro-needle structure is vertically assembled on the substrate structure.
The specific process for manufacturing the linear slit on the substrate structure comprises the following steps:
firstly, patterning is carried out, and a slit mask pattern is formed on a substrate and comprises a feature pattern corresponding to the structural feature; then exposure is carried out, the slit mask pattern is transferred onto the photoresist, finally selective etching is carried out, the area which is not protected by the photoresist is etched, and the area which is covered by the photoresist layer is not etched. The etching solution adopted by etching comprises the water-soluble acid comprising strong acid, weak acid and weak acid, wherein the strong acid is nitric acid or sulfuric acid, and the weak acid is phosphoric acid. The strong acid and the weak acid are matched, so that the reaction speed can be slowed down, and the silicon-based surface structure is prevented from being influenced by the excessively high etching speed.
In a practical application scenario, due to the difference in the size of the slit, the stress levels of the regions of the microneedle body are not completely the same, and in practical use, under the same acting force, the region with higher stress may not deform, the flexibility of the microneedle body is poor, and the region with lower stress may deform excessively and break. Wherein, the biodegradable film can be coated on the whole surface of the micro needle body (including the slit), and the biodegradable film can also be coated only on the place outside the slit.
In this embodiment, the stress of the single region between the slits can be determined according to the area of the single region, and the biodegradable film is coated according to the stress difference of each region, specifically, the larger the area of the single region is, the larger the corresponding stress is, and the thinner the coated biodegradable film is; the smaller the area of the individual regions, the lower the corresponding stress, and the thinner and thicker the coated biodegradable film. Wherein the biodegradable film may be coated by a hot-melt coating process.
Wherein the biodegradable film comprises biodegradable polyester and/or copolyester and/or starch-based material, and the thickness of the biodegradable film is less than 20 μm.
Example 2
In the embodiment 2 of the present application, a novel microneedle substrate structure is provided, as shown in fig. 2, which includes a substrate structure and a microneedle structure, wherein the substrate structure is made of a flexible material, and is made of polyimide in this embodiment 1, and has a good deformation adaptability, and can be attached to the cerebral cortex, the thickness of the substrate structure can be adjusted in an actual operable range according to the requirements of practical application, in this embodiment 2, the substrate structure is a disc structure, and in order to better facilitate the microneedle structure to deeply collect electroencephalogram signals, a plurality of linear slits are formed on the disc-shaped substrate structure, as shown in fig. 2, the plurality of linear slits extend along one direction (e.g. the X-axis direction) and are arranged in a staggered manner, the width of the linear slit is 5 μm, and in the direction perpendicular to the extending direction (e.g. the Y-axis direction), the projections of adjacent slits are partially overlapped, the linear slits are ensured to be arranged in a staggered mode along one direction, so that the linear slits are uniformly distributed on the substrate structure, and each position of the substrate structure can be better adapted to the shape of the cerebral cortex.
The surface of the substrate structure also comprises a plurality of grooves which, like the linear slits, extend along one direction (such as the X-axis direction) and are arranged in a staggered manner, in this example 2, grooves and linear slits are arranged in a staggered manner in each row, the grooves are used to assemble the tails of the microneedle structures, as shown in fig. 3, the front end of the micro-needle structure has a plurality of body electrode points, the back end of the micro-needle structure is not provided with body electrode points, the body electrode points are made of metal material, is fixed at the front end of the micro-needle structure in a welding mode, the body electrode point is led out through a lead, all leads are arranged in a staggered mode to avoid mutual interference, and the micro-needle structure is connected with a signal processing circuit at the rear end, and transmits the acquired electroencephalogram signals to the signal processing circuit for relevant signal processing, the signal processing circuit is not improved in the prior art and is not repeated, and the tail part of the micro-needle structure is vertically assembled on the substrate structure.
The specific process for manufacturing the linear slit on the substrate structure comprises the following steps:
firstly, patterning is carried out, and a slit mask pattern is formed on a substrate and comprises a feature pattern corresponding to the structural feature; then exposure is carried out, the slit mask pattern is transferred onto the photoresist, finally selective etching is carried out, the area which is not protected by the photoresist is etched, and the area which is covered by the photoresist layer is not etched. The etching solution adopted by etching comprises the water-soluble acid comprising strong acid, weak acid and weak acid, wherein the strong acid is sulfuric acid, and the weak acid is formed by mixing phosphoric acid, HF acid, formic acid, acetic acid, citric acid and isocitric acid. The strong acid and the weak acid are matched, so that the reaction speed can be slowed down, and the silicon-based surface structure is prevented from being influenced by the excessively high etching speed.
Example 3
The embodiment 3 of the present application provides a novel microneedle substrate structure, comprising a substrate structure and a microneedle structure, wherein the substrate structure is made of a flexible material, and is made of polyimide in this embodiment 3, and has a good deformation adaptability, and can be attached to the cerebral cortex, the thickness of the substrate structure can be adjusted in an actual operable range according to the requirements of practical application, in this embodiment 3, the substrate structure is a disc structure, and in order to better facilitate deep acquisition of electroencephalogram signals by the microneedle structure, a plurality of linear slits are formed on the disc-shaped substrate structure, as shown in fig. 2, the plurality of linear slits extend along one direction (such as the X-axis direction) and are arranged in a staggered manner, the width of the linear slits is 2 μm, and in the direction perpendicular to the extending direction (such as the Y-axis direction), projections of adjacent slits are partially overlapped, so as to ensure that the linear slits are arranged in a staggered manner along one direction, the linear slits are uniformly distributed on the substrate structure, and each position of the substrate structure can be well adapted to the shape of the cerebral cortex.
The surface of the substrate structure further includes a plurality of grooves, which are the same as the linear slits, extend along one direction (such as the X-axis direction) and are arranged in a staggered manner, in this embodiment 3, the grooves and the linear slits are arranged in each row in a staggered manner, and the grooves are used for assembling the tail of the microneedle structure, as shown in fig. 3, the microneedle structure is of a semi-intrusive type, the front end of the microneedle structure is provided with a plurality of body electrode points, the rear end of the microneedle structure is not provided with the body electrode points, the body electrode points are made of metal materials and fixed at the front end of the microneedle structure in a welding manner, the body electrode points are led out through leads, the leads are arranged in a staggered manner to avoid mutual interference and are connected with a signal processing circuit at the rear end, the acquired electroencephalogram signal is transmitted to the signal processing circuit for related electroencephalogram signal processing, the signal processing circuit is not improved in the prior art and is not described again, a plurality of micropin structure be array form slope equipment in on the base structure, guarantee the micropin structure perpendicular to plane of cutting this moment, laminating cerebral cortex better.
The specific process for manufacturing the linear slit on the substrate structure comprises the following steps:
firstly, patterning is carried out, and a slit mask pattern is formed on a substrate and comprises a feature pattern corresponding to the structural feature; then exposure is carried out, the slit mask pattern is transferred onto the photoresist, finally selective etching is carried out, the area which is not protected by the photoresist is etched, and the area which is covered by the photoresist layer is not etched. The etching liquid adopted by etching comprises the water-soluble acid comprising strong acid, weak acid and weak acid, wherein the strong acid is nitric acid, and the weak acid is formed by mixing phosphoric acid and HF acid and glycolic acid. The strong acid and the weak acid are matched, so that the reaction speed can be slowed down, and the silicon-based surface structure is prevented from being influenced by the excessively high etching speed.
Example 4
The embodiment 4 of the present application provides a novel microneedle substrate structure, which is the same as the structure of the embodiment 1, and the difference is that the slit arranged on the substrate structure in the embodiment 4 is a wavy slit, and the width of the wavy slit is 6 μm.
Example 5
Example 5 of the present application provides a novel microneedle substrate structure, which is the same as the structure of example 1, except that the slit provided on the substrate structure in example 5 is a zigzag slit having a width of 7 μm.
While the embodiments of the present application have been disclosed above, it is not limited to the applications listed in the description and the embodiments, which are fully applicable in a variety of fields suitable for this application, and further modifications may readily occur to those skilled in the art, and it is therefore not intended to be limited to the details shown and described herein without departing from the general concept defined by the appended claims and their equivalents.
Claims (10)
1. A novel microneedle base structure for application in a neural interface, comprising a base structure and a microneedle structure; wherein, the surface of the substrate structure is formed with a slit, at least one micro-needle structure is assembled on the substrate structure, and the slit and the micro-needle structure do not interfere with each other.
2. A novel microneedle base structure according to claim 1, wherein the base structure surface comprises at least one slit; when the number of the slits is larger than or equal to two, the plurality of slits extend along one direction and are arranged in a staggered mode.
3. A novel microneedle substrate structure according to claim 2, wherein adjacent slits project with a partial overlap in a direction perpendicular to the direction of extension.
4. A novel microneedle base structure according to claim 2, wherein the slit is a linear slit, a zigzag slit or a wavy slit.
5. A novel microneedle base structure according to claim 1, wherein said base structure surface further comprises at least one groove for assembling said microneedle structure, and when the number of said slits and said grooves is plural, said grooves extend in one direction and are arranged in a staggered manner.
6. A novel microneedle substrate structure according to claim 1, wherein the substrate structure forming material comprises silicon, polyimide, PDMS or bacterial cellulose.
7. A novel microneedle base structure according to claim 1, wherein the cross-section of the base structure is square, circular, trapezoidal or irregular.
8. The novel microneedle substrate structure according to claim 1, wherein the front end of the microneedle structure has at least one body electrode point, the body electrode point is led out through a wire and connected with a signal processing circuit at the rear end, and the tail of the microneedle structure is assembled on the substrate structure.
9. The novel microneedle base structure according to claim 1, wherein a plurality of the microneedle structures are vertically assembled on the base structure in an array form, or a plurality of the microneedle structures are obliquely assembled on the base structure in an array form.
10. A flexible microneedle according to claim 1, wherein said microneedle body is coated with a biodegradable film for balancing the stresses in different regions of said microneedle body.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN202210179922.8A CN114469108A (en) | 2022-02-25 | 2022-02-25 | Novel microneedle substrate structure |
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| Application Number | Priority Date | Filing Date | Title |
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| CN202210179922.8A CN114469108A (en) | 2022-02-25 | 2022-02-25 | Novel microneedle substrate structure |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115500833A (en) * | 2022-08-24 | 2022-12-23 | 武汉衷华脑机融合科技发展有限公司 | Positioning partition plate and planar array type microneedle structure |
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2022
- 2022-02-25 CN CN202210179922.8A patent/CN114469108A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115500833A (en) * | 2022-08-24 | 2022-12-23 | 武汉衷华脑机融合科技发展有限公司 | Positioning partition plate and planar array type microneedle structure |
| CN115500833B (en) * | 2022-08-24 | 2024-01-12 | 武汉衷华脑机融合科技发展有限公司 | Positioning partition plate and area array type microneedle structure |
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