CN114438455A - Shielding film for wireless charging and preparation method and manufacturing equipment thereof - Google Patents
Shielding film for wireless charging and preparation method and manufacturing equipment thereof Download PDFInfo
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- CN114438455A CN114438455A CN202111589803.1A CN202111589803A CN114438455A CN 114438455 A CN114438455 A CN 114438455A CN 202111589803 A CN202111589803 A CN 202111589803A CN 114438455 A CN114438455 A CN 114438455A
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- 238000007600 charging Methods 0.000 title claims abstract description 83
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 23
- 238000002360 preparation method Methods 0.000 title claims abstract description 17
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims abstract description 51
- 230000006698 induction Effects 0.000 claims abstract description 24
- 239000010410 layer Substances 0.000 claims description 70
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 57
- 239000012790 adhesive layer Substances 0.000 claims description 34
- 239000000853 adhesive Substances 0.000 claims description 26
- 230000001070 adhesive effect Effects 0.000 claims description 26
- 238000000034 method Methods 0.000 claims description 22
- 239000013077 target material Substances 0.000 claims description 20
- 230000001681 protective effect Effects 0.000 claims description 12
- 238000005477 sputtering target Methods 0.000 claims description 11
- 238000005096 rolling process Methods 0.000 claims description 10
- 238000013329 compounding Methods 0.000 claims description 5
- 230000003213 activating effect Effects 0.000 claims description 3
- 238000007781 pre-processing Methods 0.000 claims description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 abstract description 48
- 229910052742 iron Inorganic materials 0.000 abstract description 10
- 230000008878 coupling Effects 0.000 abstract description 9
- 238000010168 coupling process Methods 0.000 abstract description 9
- 238000005859 coupling reaction Methods 0.000 abstract description 9
- 239000003292 glue Substances 0.000 description 10
- 238000004804 winding Methods 0.000 description 10
- 238000010586 diagram Methods 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 238000004544 sputter deposition Methods 0.000 description 5
- 238000001816 cooling Methods 0.000 description 4
- 230000005674 electromagnetic induction Effects 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000012528 membrane Substances 0.000 description 4
- 238000001228 spectrum Methods 0.000 description 4
- 239000002390 adhesive tape Substances 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 239000000696 magnetic material Substances 0.000 description 3
- 238000010791 quenching Methods 0.000 description 3
- 230000000171 quenching effect Effects 0.000 description 3
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 3
- 230000004913 activation Effects 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000002203 pretreatment Methods 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
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- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
- C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
- C22C38/10—Ferrous alloys, e.g. steel alloys containing cobalt
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/20—Metallic material, boron or silicon on organic substrates
- C23C14/205—Metallic material, boron or silicon on organic substrates by cathodic sputtering
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- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02J—CIRCUIT ARRANGEMENTS OR SYSTEMS FOR SUPPLYING OR DISTRIBUTING ELECTRIC POWER; SYSTEMS FOR STORING ELECTRIC ENERGY
- H02J50/00—Circuit arrangements or systems for wireless supply or distribution of electric power
- H02J50/10—Circuit arrangements or systems for wireless supply or distribution of electric power using inductive coupling
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Computer Networks & Wireless Communication (AREA)
- Power Engineering (AREA)
- Physical Vapour Deposition (AREA)
- Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)
Abstract
The invention discloses a shielding film for wireless charging, a preparation method and manufacturing equipment thereof65Co35)x(TiO2)1‑xA layer, wherein x is 0.76 or more; saturation induction B of the magnetic layersNot less than 1.7T. Compared with the traditional iron-based nanocrystalline thin band, the shielding film for wireless charging has higher saturation magnetic induction intensity and resonance frequency, and improves the magnetic coupling efficiency of the receiving coil of the wireless charging receiving end, thereby effectively improving the wireless charging power, efficiency and speed.
Description
Technical Field
The invention relates to the technical field of wireless charging, in particular to a shielding film for wireless charging and a preparation method and manufacturing equipment thereof.
Background
Along with the development of wireless charging technology, more and more electronic product has had the wireless function of charging, and wireless charging is mostly realized through the electromagnetic induction coupling mode at present, and this electromagnetic induction coupling principle realizes wireless charging through the mutual coupling of the magnetic field that transmitting terminal coil and receiving terminal coil produced, but wireless charging power is less at present, and the charging time is longer, can't adapt to electronic product high power, efficient wireless charging demand.
Most of shielding films used in the existing wireless charging receiving end are iron-based nanocrystalline thin strips subjected to heat treatment, the resonance frequency of the shielding films is low (about 10 MHz), the shielding films are not suitable for working under higher frequency, the saturation magnetic induction intensity is low and is only 1-1.3T, the electromagnetic induction coupling efficiency is low, the electromagnetic induction coupling power is limited, the defects of small maximum output power, small charging speed upper limit and the like exist, and the requirements of high-power and rapid wireless charging of electronic products cannot be met.
Disclosure of Invention
The technical problem to be solved by the invention is as follows: provided are a shielding film for wireless charging with high saturation magnetic induction, a method for manufacturing the shielding film for wireless charging, and a manufacturing apparatus for manufacturing the shielding film for wireless charging.
In order to solve the technical problems, the first technical scheme adopted by the invention is as follows: the shielding film for wireless charging comprises an adhesive layer and a magnetic layer formed on the surface of one side of the adhesive layer through magnetron sputtering, wherein the magnetic layer is (Fe)65Co35)x(TiO2)1-xA layer, wherein x is 0.76 or more; saturation induction B of the magnetic layers≥1.7T。
In order to solve the technical problems, the invention adopts the following technical scheme: the preparation method of the shielding film for wireless charging comprises the following steps,
obtaining single-sided adhesive, wherein the single-sided adhesive comprises a release film, an adhesive layer and a protective film which are sequentially laminated;
tearing the protective film of the single-sided adhesive;
magnetron sputtering, namely performing magnetron sputtering on the surface of one side of the adhesive layer far away from the release film to form a magnetic layer on the surface of one side of the adhesive layer far away from the release filmTo obtain a shielding film for wireless charging, wherein the magnetic layer is (Fe)65Co35)x(TiO2)1-xA layer, wherein x is 0.76 or more; saturation induction B of the magnetic layers≥1.7T。
In order to solve the technical problem, the invention adopts the third technical scheme that: the shielding film manufacturing equipment for wireless charging comprises a film removing chamber and a magnetron sputtering chamber, wherein a film tearing device is arranged in the film removing chamber and used for tearing off a protective film of single-sided adhesive; the magnetron sputtering chamber is internally provided with a magnetron sputtering device, the magnetron sputtering device is used for forming a magnetic layer on the surface of one side of the adhesive layer of the single-sided adhesive, which is far away from the release film, by magnetron sputtering, and the magnetic layer is (Fe)65Co35)x(TiO2)1-xA layer, wherein x is 0.76 or more; saturation induction B of the magnetic layers≥1.7T。
The invention has the beneficial effects that:
compared with the traditional iron-based nanocrystalline thin band, the shielding film for wireless charging has higher saturation magnetic induction intensity and resonance frequency, and improves the magnetic coupling efficiency of the receiving coil of the wireless charging receiving end, thereby effectively improving the wireless charging power, efficiency and speed.
The preparation method of the shielding film for wireless charging can deposit the magnetic film material (namely (Fe) on the adhesive tape by magnetron sputtering only in one step65Co35)x(TiO2)1-xLayer(s)]Compared with the traditional method of preparing the amorphous ribbon by a quenching method and then obtaining the nanocrystalline magnetic material by heat treatment, the method is simpler and more time-saving; and the subsequent wireless charging preparation procedures such as magnetic crushing, bonding and the like can also be realized by the preparation method of the shielding film for wireless charging.
Drawings
Fig. 1 is a schematic structural diagram of a shielding film for wireless charging according to a first embodiment of the present invention;
fig. 2 is a hysteresis loop diagram of a wireless charging shielding film according to a first embodiment of the present invention;
fig. 3 is a magnetic spectrum of the shielding film for wireless charging according to the first embodiment of the present invention;
fig. 4 is a hysteresis loop diagram of a prior art iron-based nanocrystalline magnetic film for wireless charging;
fig. 5 is a magnetic spectrum diagram of a prior art iron-based nanocrystalline magnetic film for wireless charging;
fig. 6 is a flowchart of a method for manufacturing a shielding film for wireless charging according to a second embodiment of the present invention;
fig. 7 is a simplified schematic diagram of a device for manufacturing a shielding film for wireless charging according to a third embodiment of the present invention.
Description of reference numerals:
1. a glue layer;
2. a magnetic layer;
3. a release film;
4. a membrane removing chamber; 41. a film tearing device;
5. a pretreatment chamber; 51. a pretreatment device;
6. a magnetron sputtering chamber; 61. sputtering a target material; 62. a cooling roll;
7. a winding chamber; 71. a winding device.
Detailed Description
In order to explain the technical contents, the objects and the effects of the present invention in detail, the following description is made with reference to the accompanying drawings in combination with the embodiments.
Referring to fig. 1 to 7, the shielding film for wireless charging includes an adhesive layer 1 and a magnetic layer 2 formed on one side surface of the adhesive layer 1 by magnetron sputtering, where the magnetic layer 2 is (Fe)65Co35)x(TiO2)1-xA layer, wherein x is greater than or equal to 0.76; saturation induction B of the magnetic layer 2s≥1.7T。
From the above description, the beneficial effects of the present invention are: compared with the traditional iron-based nanocrystalline thin band, the shielding film for wireless charging has higher saturation magnetic induction intensity and resonance frequency, and improves the magnetic coupling efficiency of the receiving coil of the wireless charging receiving end, thereby effectively improving the wireless charging power, efficiency and speed.
Further, a release film 3 is arranged on the surface of the other side, opposite to the magnetic layer 2, of the adhesive layer 1.
As can be seen from the above description, the release film 3 is removed by the user to give (Fe)65Co35)x(TiO2)1-xThe glue film 1 on layer bonds on external member, has made things convenient for wireless use of charging with the barrier film greatly, does benefit to reinforcing user's use and experiences. The material of the adhesive layer 1 includes, but is not limited to, acrylic adhesives, polycarbonate adhesives, and the like.
The preparation method of the shielding film for wireless charging comprises the following steps,
obtaining single-sided adhesive, wherein the single-sided adhesive comprises a release film, an adhesive layer and a protective film which are sequentially laminated;
tearing the protective film of the single-sided adhesive;
magnetron sputtering, namely carrying out magnetron sputtering on the surface of one side, far away from the release film, of the adhesive layer so as to form a magnetic layer on the surface of one side, far away from the release film, of the adhesive layer, thereby obtaining the shielding film for wireless charging, wherein the magnetic layer is (Fe)65Co35)x(TiO2)1-xA layer, wherein x is 0.76 or more; saturation induction B of the magnetic layers≥1.7T。
From the above description, the beneficial effects of the present invention are: the preparation method of the shielding film for wireless charging can deposit the magnetic film material (namely (Fe) on the adhesive tape by magnetron sputtering only in one step65Co35)x(TiO2)1-xLayer(s)]Compared with the traditional method of preparing the amorphous ribbon by a quenching method and then obtaining the nanocrystalline magnetic material by heat treatment, the method is simpler and more time-saving; and the subsequent wireless charging preparation procedures such as magnetic crushing, bonding and the like can also be realized by the preparation method of the shielding film for wireless charging.
Further, the step of tearing the film and the step of magnetron sputtering also comprise a step of preprocessing, namely activating the surface of one side of the adhesive layer, which is far away from the release film.
As can be seen from the above description, the activation treatment of the deposition surface of the adhesive layer improves the surface energy of the adhesive layer, facilitates the increase of the adhesive force of the deposition surface of the adhesive layer, and ensures (Fe)65Co35)x(TiO2)1-xAnd (5) layer forming effect.
Further, the method also comprises the step of rolling after the magnetron sputtering, wherein the step of rolling is carried out on the shielding film for wireless charging.
As can be seen from the above description, the shielding film for wireless charging is convenient to store and transport after being rolled.
Further, the sputtering target 61 used in the magnetron sputtering is Fe65Co35With TiO2And (4) compounding the target material.
The shielding film manufacturing equipment for wireless charging comprises a film removing chamber 4 and a magnetron sputtering chamber 6, wherein a film tearing device 41 is arranged in the film removing chamber 4, and the film tearing device 41 is used for tearing off a protective film of single-sided adhesive; a magnetron sputtering device is arranged in the magnetron sputtering chamber 6 and is used for forming a magnetic layer on the surface of one side, far away from the release film, of the adhesive layer of the single-sided adhesive by magnetron sputtering, and the magnetic layer is (Fe)65Co35)x(TiO2)1-xA layer, wherein x is 0.76 or more; saturation induction B of the magnetic layers≥1.7T。
Further, the device also comprises a pretreatment chamber 5 arranged between the film removing chamber 4 and the magnetron sputtering chamber 6, and a pretreatment device 51 is arranged in the pretreatment chamber 5.
Further, the device also comprises a winding chamber 7, wherein the winding chamber 7 is communicated with an output port of the magnetron sputtering chamber 6, and a winding device 71 is arranged in the winding chamber 7.
Further, a sputtering target 61 is arranged on the magnetron sputtering device, and the sputtering target 61 is Fe65Co35With TiO2And (4) compounding the target material.
Example one
Referring to fig. 1 to 5, a first embodiment of the present invention is: the shielding film for wireless charging is applied to a wireless charging receiving end and is particularly suitable for high-frequency working conditions.
As shown in fig. 1, the shielding film for wireless charging includes a glue layer 1 and a magnetic layer 2 formed on one side surface of the glue layer 1 by magnetron sputtering, wherein a release film 3 is disposed on the opposite side surface of the glue layer 1 relative to the magnetic layer 2, that is, the magnetic layer 2 is deposited on one side surface of the opposite sides of the glue layer 1, and the release film 3 is disposed on the other side surface of the opposite sides of the glue layer 1. When the magnetic layer 2 is used, a user can tear off the release film 3 to fix the magnetic layer on an external member through the adhesive layer 1.
The magnetic layer 2 is (Fe)65Co35)x(TiO2)1-xA layer, wherein x is 0.76 or more; saturation induction B of the magnetic layer 2s≥1.7T。
In order to fully illustrate the advantages of the shielding film for wireless charging, the inventors prepared a sample in which x is 0.78, that is, the magnetic layer 2 is (Fe), and used an iron-based nanocrystalline magnetic film for wireless charging in the prior art as a control group65Co35)0.78(TiO2)0.22Layer, in particular of Fe65Co35And TiO2The patch is a composite target material, and is prepared under the conditions of the sputtering power of 175W and the working air pressure of 0.17Pa, the magnetic hysteresis loop of the patch is shown in figure 2, the saturation magnetic induction intensity of the patch is 1.8T as can be seen from figure 2, the magnetic spectrum of the patch is shown in figure 3, and the resonance frequency of the patch is above 3GHz as can be seen from figure 3. The iron-based nanocrystalline magnetic film of the control group is made of amorphous Fe74Nb3Si15.5B6.5Cu1The magnetic induction saturation curve of the thin strip prepared under the vacuum heat treatment condition of 580 ℃ is shown in FIG. 4, the saturation induction density is 1.1T as shown in FIG. 4, the magnetic spectrum is shown in FIG. 5, and the resonance frequency is about 10MHz as shown in FIG. 5. Therefore, the shielding film for wireless charging has higher saturation magnetic induction and resonance frequency than the traditional iron-based nanocrystalline ribbon.
Example two
Referring to fig. 6, an embodiment two of the present invention is a method for manufacturing a wireless charging shielding film according to the embodiment one, including the following steps,
obtaining single-sided adhesive, wherein the single-sided adhesive comprises a release film, an adhesive layer and a protective film which are sequentially laminated; in this embodiment, the width of the single-sided adhesive is 50mm, and the thickness is 80 μm.
Tearing the protective film of the single-sided adhesive;
magnetron sputtering, namely carrying out magnetron sputtering on the surface of one side, far away from the release film, of the adhesive layer so as to form a magnetic layer on the surface of one side, far away from the release film, of the adhesive layer, thereby obtaining the shielding film for wireless charging, wherein the magnetic layer is (Fe)65Co35)x(TiO2)1-xA layer, wherein x is 0.76 or more; saturation magnetic induction B of the magnetic layersNot less than 1.7T. It will be readily appreciated that in other embodiments, x may also be other values, such as 0.78, 0.8, 0.82, etc.
In order to improve the adhesive force of the deposition surface of the adhesive layer, the step of film tearing and the step of magnetron sputtering further comprise a step of pretreatment, namely performing activation treatment on the surface of one side, far away from the release film, of the adhesive layer.
The method further comprises the step of rolling after the magnetron sputtering, wherein the shielding film for wireless charging is rolled.
As will be understood, the sputtering target used in magnetron sputtering is Fe65Co35With TiO2And (4) compounding the target material. In order to enable the composition and the saturation magnetic induction intensity of the wireless charging shielding film to meet the preset range, TiO in the composite target material needs to be subjected to2The content of (b) is adjusted. At present, there are two regulation modes, one is Fe65Co35Target material and TiO2The targets are independent (i.e. Fe)65Co35Target material and TiO2When the target material is sputtered at the same time), Fe can be respectively regulated and controlled65Co35Target material and TiO2Sputtering power of the target material; II, when TiO2The sheet being bonded to Fe65Co35While on the target material, by increasing or decreasing Fe65Co35TiO on target material2The number of sheets can be regulated.
EXAMPLE III
Referring to fig. 7, a third embodiment of the present invention is a device for manufacturing a shielding film for wireless charging, which is used in the method for manufacturing a shielding film for wireless charging according to the second embodiment.
Wireless charging is with shielding film manufacture equipment, including the room 4, the pre-treatment chamber 5, the magnetron sputtering room 6 and the rolling room 7 that go up the membrane that communicates in proper order, when preparing wireless charging with shielding film, the one-sided glue passes through in proper order go membrane room 4, pre-treatment chamber 5, magnetron sputtering room 6 and rolling room 7, the one-sided glue is including range upon range of type membrane, glue film and protection film from type in proper order. The film removing chamber 4, the pretreatment chamber 5, the magnetron sputtering chamber 6 and the winding chamber 7 are vacuum chambers respectively.
The film removing device is characterized in that a film tearing device 41 is arranged in the film removing mode, and the film tearing device 41 is used for tearing off the protective film of the single-sided adhesive.
A pretreatment device 51 is arranged in the pretreatment chamber 5, and the pretreatment device 51 is used for activating the surface of one side of the single-sided adhesive layer far away from the release film.
A magnetron sputtering device is arranged in the magnetron sputtering chamber 6, a sputtering target 61 is arranged on the magnetron sputtering device, and the sputtering target 61 is Fe65Co35With TiO2The magnetron sputtering device is used for forming a magnetic layer on the surface of one side, far away from the release film, of the adhesive layer of the single-sided adhesive by magnetron sputtering, and the magnetic layer is (Fe)65Co35)x(TiO2)1-xA layer, wherein x is 0.76 or more; saturation induction B of the magnetic layersNot less than 1.7T. In detail, the magnetron sputtering apparatus includes a cooling roller 62, the sputtering target 61 is disposed close to the cooling roller 62, and in order to save sputtering time, the number of the sputtering targets 61 is plural and is preferably equal to or greater than four (for example, four, five, six, eight, etc.) in the sputtering target 61 disposed around the cooling roller 62. In this example, Fe65Co35Target material and TiO2Independent target material, by adjusting Fe65Co35Target material and TiO2The power of the target can control TiO in the magnetic layer2The content x of (a) is, for example, 0.8. The thickness of the magnetic layer is controlled by adjusting the sputtering air pressure or the moving speed of the single-sided adhesive. Magnetron sputtering chamber 6 maintains a back vacuum of less than 1X 10-3Pa。
The winding chamber 7 is communicated with an output port of the magnetron sputtering chamber 6, and a winding device 71 is arranged in the winding chamber 7.
In summary, the shielding film for wireless charging, the preparation method and the manufacturing equipment thereof provided by the invention are provided, and the screen for wireless chargingCompared with the traditional iron-based nanocrystalline thin band, the shielding film has higher saturation magnetic induction intensity and resonance frequency, and improves the magnetic coupling efficiency of the receiving coil at the wireless charging receiving end, thereby effectively improving the wireless charging power, efficiency and speed. The preparation method of the shielding film for wireless charging can deposit the magnetic film material (namely (Fe) on the adhesive tape by magnetron sputtering only in one step65Co35)x(TiO2)1-xLayer(s)]Compared with the traditional method of preparing the amorphous ribbon by a quenching method and then obtaining the nanocrystalline magnetic material by heat treatment, the method is simpler and more time-saving; and the subsequent wireless charging preparation procedures such as magnetic crushing, bonding and the like can also be realized by the preparation method of the shielding film for wireless charging.
The above description is only an embodiment of the present invention, and is not intended to limit the scope of the present invention, and all equivalent modifications made by the present invention and the contents of the accompanying drawings, which are directly or indirectly applied to the related technical fields, are included in the scope of the present invention.
Claims (10)
1. Wireless shielding film for charging, its characterized in that: comprises an adhesive layer and a magnetic layer formed on the surface of one side of the adhesive layer by magnetron sputtering, wherein the magnetic layer is (Fe)65Co35)x(TiO2)1-xA layer, wherein x is 0.76 or more; saturation induction B of the magnetic layers≥1.7T。
2. The shielding film for wireless charging according to claim 1, wherein: and a release film is arranged on the surface of the other side, opposite to the magnetic layer, of the adhesive layer.
3. The preparation method of the shielding film for wireless charging is characterized by comprising the following steps: comprises the following steps of (a) carrying out,
obtaining single-sided adhesive, wherein the single-sided adhesive comprises a release film, an adhesive layer and a protective film which are sequentially laminated;
tearing the protective film of the single-sided adhesive;
magnetron sputtering, wherein the adhesive layer is far away from the release layerPerforming magnetron sputtering on one side surface of the film to form a magnetic layer on one side surface of the adhesive layer far away from the release film so as to obtain the shielding film for wireless charging, wherein the magnetic layer is (Fe)65Co35)x(TiO2)1-xA layer, wherein x is 0.76 or more; saturation induction B of the magnetic layers≥1.7T。
4. The method for manufacturing a shielding film for wireless charging according to claim 3, wherein: the step of removing the film and the step of magnetron sputtering also comprise a step of preprocessing, namely activating the surface of one side of the adhesive layer, which is far away from the release film.
5. The method for manufacturing a shielding film for wireless charging according to claim 3, wherein: the method further comprises the step of rolling after the magnetron sputtering, wherein the shielding film for wireless charging is rolled.
6. The method for manufacturing a shielding film for wireless charging according to claim 3, wherein: the sputtering target material used in the magnetron sputtering is Fe65Co35With TiO2And (4) compounding the target material.
7. Wireless for charging shielding film manufacture equipment, its characterized in that: the device comprises a film removing chamber and a magnetron sputtering chamber, wherein a film tearing device is arranged in the film removing chamber and used for tearing off a protective film of single-sided adhesive; the magnetron sputtering chamber is internally provided with a magnetron sputtering device, the magnetron sputtering device is used for forming a magnetic layer on the surface of one side of the adhesive layer of the single-sided adhesive, which is far away from the release film, by magnetron sputtering, and the magnetic layer is (Fe)65Co35)x(TiO2)1-xA layer, wherein x is 0.76 or more; saturation induction B of the magnetic layers≥1.7T。
8. The wireless charging shielding film manufacturing apparatus according to claim 7, wherein: the device also comprises a pretreatment chamber arranged between the film removing chamber and the magnetron sputtering chamber, and a pretreatment device is arranged in the pretreatment chamber.
9. The wireless charging shielding film manufacturing apparatus according to claim 7, wherein: the device comprises a magnetron sputtering chamber and is characterized by further comprising a rolling chamber, wherein the rolling chamber is communicated with an output port of the magnetron sputtering chamber, and a rolling device is arranged in the rolling chamber.
10. The wireless charging shielding film manufacturing apparatus according to claim 7, wherein: the magnetron sputtering device is provided with a sputtering target material which is Fe65Co35With TiO2And (4) compounding the target material.
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105027355A (en) * | 2013-03-05 | 2015-11-04 | 阿莫先恩电子电器有限公司 | Composite sheet for shielding magnetic field and electromagnetic wave, and antenna module comprising same |
| US20160057900A1 (en) * | 2013-04-02 | 2016-02-25 | Vacuumschmelze Gmbh & Co. Kg | Shielding film and method for producing a shielding film |
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| CN105027355A (en) * | 2013-03-05 | 2015-11-04 | 阿莫先恩电子电器有限公司 | Composite sheet for shielding magnetic field and electromagnetic wave, and antenna module comprising same |
| US20160057900A1 (en) * | 2013-04-02 | 2016-02-25 | Vacuumschmelze Gmbh & Co. Kg | Shielding film and method for producing a shielding film |
| CN108353524A (en) * | 2015-11-16 | 2018-07-31 | 阿莫技术有限公司 | Wireless power transmission magnetic shielding unit and wireless power transmission module including it |
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