CN114433518A - Dial plate cleaning method - Google Patents
Dial plate cleaning method Download PDFInfo
- Publication number
- CN114433518A CN114433518A CN202111592828.7A CN202111592828A CN114433518A CN 114433518 A CN114433518 A CN 114433518A CN 202111592828 A CN202111592828 A CN 202111592828A CN 114433518 A CN114433518 A CN 114433518A
- Authority
- CN
- China
- Prior art keywords
- dial
- cleaning
- wiping
- dial plate
- mold
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 223
- 238000000034 method Methods 0.000 title claims abstract description 111
- 238000001179 sorption measurement Methods 0.000 claims abstract description 59
- 239000007788 liquid Substances 0.000 claims description 31
- 238000011084 recovery Methods 0.000 claims description 26
- 239000007779 soft material Substances 0.000 claims description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 11
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 8
- 239000003599 detergent Substances 0.000 claims description 8
- 230000001681 protective effect Effects 0.000 claims description 8
- 241000628997 Flos Species 0.000 claims description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 7
- 239000006260 foam Substances 0.000 claims description 7
- 239000000741 silica gel Substances 0.000 claims description 7
- 229910002027 silica gel Inorganic materials 0.000 claims description 7
- 230000003068 static effect Effects 0.000 claims description 7
- 238000011031 large-scale manufacturing process Methods 0.000 abstract description 3
- 239000000463 material Substances 0.000 description 19
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 12
- 239000000126 substance Substances 0.000 description 8
- 230000000694 effects Effects 0.000 description 6
- 229910052742 iron Inorganic materials 0.000 description 6
- 238000000227 grinding Methods 0.000 description 5
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 5
- 238000005520 cutting process Methods 0.000 description 4
- 239000012459 cleaning agent Substances 0.000 description 3
- 239000004744 fabric Substances 0.000 description 3
- 239000002699 waste material Substances 0.000 description 3
- 239000012535 impurity Substances 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 239000003973 paint Substances 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 238000007790 scraping Methods 0.000 description 2
- RSWGJHLUYNHPMX-UHFFFAOYSA-N Abietic-Saeure Natural products C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 description 1
- 229920000742 Cotton Polymers 0.000 description 1
- KHPCPRHQVVSZAH-HUOMCSJISA-N Rosin Natural products O(C/C=C/c1ccccc1)[C@H]1[C@H](O)[C@@H](O)[C@@H](O)[C@@H](CO)O1 KHPCPRHQVVSZAH-HUOMCSJISA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000002894 chemical waste Substances 0.000 description 1
- 238000004134 energy conservation Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 238000010186 staining Methods 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 1
- 235000021419 vinegar Nutrition 0.000 description 1
- 239000000052 vinegar Substances 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/10—Cleaning by methods involving the use of tools characterised by the type of cleaning tool
- B08B1/14—Wipes; Absorbent members, e.g. swabs or sponges
- B08B1/143—Wipes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/30—Cleaning by methods involving the use of tools by movement of cleaning members over a surface
- B08B1/32—Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B11/00—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
- B08B11/02—Devices for holding articles during cleaning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
Landscapes
- Cleaning In General (AREA)
Abstract
The invention discloses a dial plate cleaning method, which comprises the following steps: the method comprises the following steps: feeding, namely placing a dial to be cleaned on a dial mold; step two: vacuum adsorption, wherein the dial plate on the dial plate mold is firmly adsorbed through a vacuum adsorption assembly, so that the dial plate is prevented from falling off in the cleaning process; step three: and (4) cleaning the dial plate, namely cleaning the dial plate on the dial plate die by using a soft wiping disc assembly. Compared with the existing mode of manually cleaning the dial, the dial cleaning method disclosed by the invention can realize automatic cleaning and large-scale wiping, greatly improves the working efficiency and realizes large-scale production.
Description
Technical Field
The invention relates to the field of dial plate cleaning methods, in particular to a dial plate cleaning method.
Background
At present, the design aiming at the cleaning equipment is diversified, such as the application number is: 2021112245122, a chemical waste barrel rapid cleaning device comprises a base, wherein the upper end surface of the base is fixedly provided with a fixed plate, and the right end surface of the fixed plate is provided with three clamping chutes which are annularly arranged and have openings facing right; according to the invention, the chemical industry barrel is cleaned through the grinding roller, so that chemical industry impurities and iron rust attached to the barrel wall can be directly removed together, the subsequent iron rust removing time is saved, the chemical industry barrel is unfolded through water cutting, the generation of harmful gas caused by the thermal decomposition of chemical industry waste due to the temperature during cutting is prevented, the cutting strength is enhanced by utilizing the scrap iron recovered during grinding, the cost of water cutting grinding materials is saved, the position of the clamping column is adjusted through reasonably utilizing the scrap iron generated during grinding and through worm and gear transmission, the chemical industry barrel can be suitable for chemical industry waste barrels with different sizes, and the practicability is improved. To chemical industry waste drum in this prior art, through grinding roller cleaning process, get rid of along with the rust to chemical industry impurity and the iron rust attached to on the bucket wall from the realization, practiced thrift the time of follow-up rust removal.
Because of the industry-specific and stringent requirements of watch dials, there is no reference to a device and method for cleaning specifically directed to the dial. Most of watch dials are manually marked, and paint or ink is painted after the marks are marked, and then the paint or ink is manually cleaned by using soft cloth. The manual work is basically adopted in the industry for cleaning the watch dial, and the main reason for the manual work is as follows: on the one hand, it is comparatively safe, prevent that the dial plate from scraping the flower, because the material of dial plate generally adopts transparent glass material, scrape the flower easily, on the other hand adopts the manual work to clean relatively cleaner, can carefully watch whether there is the spot to remain when the manual work is cleaned.
However, there are many disadvantages to manually wiping a stain on a dial. Firstly, the manual cleaning of the dial plates is low in efficiency, and the number of the dial plates cleaned by each person is certain, so that the manual cleaning of the dial plates cannot adapt to large-scale production. Secondly, the dynamics when can not guarantee to clean when artifical cleans is even, has the condition of scraping the flower with the dial plate. Finally, because some cleaning agents are generally used when manual wiping is adopted, the cleaning agents are generally volatile and corrosive, and the manual operation in the environment for a long time can affect the health of the user, and the cleaning agents used by wiping can not be recycled and can pollute the environment. Therefore, an automatic dial plate cleaning method is urgently needed to be developed, the existing manual operation is replaced, the dial plate cleaning work can be finished efficiently and in high quality, and meanwhile, the energy conservation and the environmental protection can be realized.
Disclosure of Invention
The invention provides a dial plate cleaning method, which solves the problems that the existing dial plate cleaning method is low in efficiency and incapable of ensuring quality in a manual mode and is not environment-friendly.
In order to solve the technical problems, the technical scheme of the invention is as follows: a method of dial plate cleaning comprising the steps of:
the method comprises the following steps: feeding, namely placing a dial to be cleaned on a dial mold;
step two: the dial plate on the dial plate mold is firmly adsorbed through the vacuum adsorption component, so that the dial plate is prevented from falling off in the cleaning process;
step three: and (4) cleaning the dial plate, namely cleaning the dial plate on the dial plate die by using a soft wiping disc assembly.
Preferably, in the third step, during the process of wiping and cleaning the dial on the dial mold by the wiping disc assembly, the wiping disc assembly keeps rotating positively or negatively to wipe the dial on the dial mold, and meanwhile, the dial mold keeps still or keeps rotating in the opposite direction to the wiping disc assembly.
Preferably, in the third step, during the process of wiping and cleaning the dial plate of the dial mould by the wiping plate component, the wiping plate component keeps rotating positively and negatively alternately to wipe the dial plate on the dial mould, and the dial mould keeps still or rotates in the opposite direction to the wiping plate component.
Preferably, in the second step, in the process that the vacuum adsorption assembly firmly adsorbs the dial plate on the dial plate mold, the vacuum adsorption assembly sets the vacuum to be negative 2KPa to negative 12 KPa.
Preferably, in the third step, in the process of wiping and cleaning the dial on the dial mold by the wiping dial assembly, the time for rotationally wiping the dial on the dial mold by the wiping dial assembly is 0.5 to 3 minutes.
Preferably, in the third step, during the process that the wiping disc assembly wipes and cleans the dial on the dial mold, cleaning liquid is added to the wiping disc assembly, so that the cleaning is cleaner.
Preferably, in the process of using the cleaning solution, the cleaning solution is prevented from spilling, and stains and staining liquid behind the dial are prevented from spilling by arranging the protective component.
Preferably, in the process of wiping and cleaning the dial plate on the dial plate mold by the wiping plate assembly, a recovery assembly is arranged to recover stains wiped and cleaned by the wiping plate assembly on the dial plate mold, or to recover the scattered cleaning solution and the stain liquid after the cleaning solution is used.
Preferably, the cleaning liquid is water, detergent or alcohol.
Preferably, in the third step, the wiping tray assembly is made of a soft material such as sponge, silk floss, felt, foam or silica gel.
Preferably, in the second step, the vacuum adsorption assembly at least comprises a vacuum adsorption machine.
Preferably, in step three, the wiper blade assembly includes at least a wiper blade that can rotate automatically.
The invention has the following beneficial effects: (1) compared with the existing mode of manually cleaning the dial, the dial cleaning method disclosed by the invention can realize automatic cleaning and large-scale wiping, greatly improves the working efficiency and realizes large-scale production. (2) The wiping disc component of the invention adopts soft materials, such as sponge, silk floss, felt, foam or silica gel, and the like, and can prevent the dial from being scratched in the wiping process. (3) In addition, the cleaning liquid is added on the wiping tray component, so that the cleaning is cleaner, and the used cleaning liquid can adopt water, detergent, alcohol and the like, so that the cleaning liquid is relatively environment-friendly, does not pollute the environment and does not cause harm to human bodies. (5) Moreover, according to the protection assembly, on one hand, the protection assembly can prevent the cleaning liquid of the cleaning assembly from being spilled outwards in the working process, on the other hand, stains generated after the watch plate is cleaned and the used cleaning liquid can be gathered together, and the recovery assembly is convenient to recover. (6) Because the vacuum adsorption component is arranged, the vacuum of the vacuum adsorption component is set to be negative 2KPa to negative 12KPa, the dial plate on the dial plate mold can be firmly adsorbed, the stability of the dial plate in the cleaning and wiping process is ensured, and the dial plate falling and the scratch in the wiping process can also be prevented. (7) In the process of wiping and cleaning the dial plate on the dial plate mould by the wiping disc assembly, the wiping disc assembly keeps rotating positively or negatively to wipe the dial plate on the dial plate mould, and meanwhile, the dial plate mould keeps still or keeps rotating in the direction opposite to that of the wiping disc assembly; or the wiping disc assembly keeps rotating in the positive direction and the negative direction alternately to wipe the dial on the dial mold, and the dial mold keeps static or rotates in the direction opposite to the direction of the wiping disc assembly; the rotating wiping time is 0.5-3 minutes, so that the arrangement can ensure that the dial is wiped and cleaned more cleanly.
Drawings
Fig. 1 is a flow chart of a method of cleaning a dial according to the present invention.
Fig. 2 is an exploded view of the equipment involved in the dial plate cleaning method of the present invention.
Fig. 3 is an exploded view of a part of the equipment involved in the method for cleaning a dial according to the invention.
Names of the corresponding components or flow names represented by numerals or letters in the drawings: 1. a dial plate mold; 2. a vacuum adsorption assembly; 3. a wiper blade assembly; 4. a guard assembly; 5. and (6) recovering the assembly.
The drawings are for illustrative purposes only and are not to be construed as limiting the patent; for the purpose of better illustrating the embodiments, certain features of the drawings may be omitted, enlarged or reduced, and do not represent the size of an actual product; it will be understood by those skilled in the art that certain well-known structures in the drawings and descriptions thereof may be omitted; the same or similar reference numerals correspond to the same or similar parts; the terms describing positional relationships in the drawings are for illustrative purposes only and are not to be construed as limiting the patent.
Detailed Description
In order to facilitate understanding for those skilled in the art, the present invention will be described in further detail with reference to the accompanying drawings and examples. The method comprises the following specific steps:
example 1
As shown in fig. 1-3, a dial cleaning method includes the steps of:
the method comprises the following steps: feeding, namely placing a dial to be cleaned on the dial mold 1;
step two: vacuum adsorption, wherein the dial plate on the dial plate mold is firmly adsorbed through the vacuum adsorption component 2, so that the dial plate mold is prevented from falling in the cleaning process;
step three: and (4) cleaning the dial plate, namely wiping the dial plate on the dial plate mould by using the soft wiping disc component 3. The wiper blade assembly 3 is made of soft material such as sponge, silk floss, felt, foam or silica gel. In this embodiment, the wiping tray assembly 3 is made of felt, but may be made of other soft materials, have certain softness and elasticity, and perform the wiping function.
Specifically, in step three, during the process of wiping and cleaning the dial on the dial mold 1 by the wiping disc assembly 3, the wiping disc assembly 3 keeps rotating positively or negatively to wipe the dial on the dial mold 1, and meanwhile, the dial mold 1 keeps still or keeps rotating in the opposite direction to the wiping disc assembly 3. Or the wiping disk component 3 keeps rotating positively and negatively alternately to wipe the dial on the dial mold, and the dial mold 1 keeps static or rotates in the opposite direction to the wiping disk component 3. In the embodiment, in the third step, during the process that the wiping disc assembly 3 wipes and cleans the dial on the dial mold 1, the wiping disc assembly 3 keeps rotating positively or negatively to wipe the dial on the dial mold 1, and meanwhile, the dial mold 1 keeps still.
Specifically, in the second step, in the process that the vacuum adsorption assembly 2 firmly adsorbs the dial plate on the dial plate mold 1, the vacuum adsorption assembly 2 sets the vacuum to be negative 2KPa to negative 12 KPa. In this embodiment, in step two, the vacuum adsorption component 2 firmly adsorbs the dial plate on the dial plate mold 1, and the vacuum adsorption component 2 sets the vacuum to negative 2 KPa. Of course, the value of the vacuum may be set specifically according to factors such as the size of a specific dial, the bearing pressure, and the wiping strength of the wiper blade assembly, and is not necessarily limited to minus 2KPa to minus 12 KPa.
Specifically, in the third step, in the process of wiping and cleaning the dial on the dial mold 1 by the wiping disc assembly 3, the time for wiping the dial on the dial mold 1 by the wiping disc assembly 3 is 0.5 to 3 minutes. In the present embodiment, in step three, in the process of wiping and cleaning the dial on the dial mold 1 by the wiping disc assembly 3, the time for wiping the dial on the dial mold 1 by the wiping disc assembly 3 is 0.5 minute. Of course, the time for rotating wiping may also be specifically set according to factors such as the size of a specific dial, the wiping cleaning degree, and the wiping friction force of the wiping disc component, and is not necessarily limited to 0.5 minute to 3 minutes.
Specifically, in the third step, in the process that the cleaning disc assembly 3 cleans the dial on the dial mold 1, cleaning liquid is added to the cleaning disc assembly 3, so that the cleaning is cleaner. In this embodiment, the cleaning solution is water, and certainly, can also set up to other cleaning solutions, play clean effect can, do not necessarily limit to water, liquid detergent or alcohol etc..
Specifically, in the use cleaning solution in-process, through setting up protection component 4, prevent that the cleaning solution from unrestrained and prevent the spot and the spot liquid unrestrained behind the clean dial plate. In this embodiment, the fixed setting of protective component 4 is on wiper blade subassembly 3, and what adopt is the cloth material, and of course, protective component also can set up on other positions, and its material also can adopt other materials, as long as it plays the effect that prevents the outside spill of cleaning solution of cleaning component in work, and can be in the same place gathering together the cleaning solution after can cleaning the spot of table dish and using, and it can to conveniently retrieve the subassembly recovery.
Specifically, in the process of wiping and cleaning the dial plate on the dial plate mold 1 by the wiping plate assembly 3, the recovery assembly 5 is arranged to recover the dirt wiped and cleaned by the wiping plate assembly 3 on the dial plate mold 1, or recover the scattered cleaning solution and the dirt liquid after the cleaning solution is used. In this embodiment, the recovery member 5 is configured as a recovery rectangular tank, as shown in fig. 2. Of course, the recovery module may be provided in other forms, or may be provided in other modules, and is not limited to the recovery rectangular groove provided in this embodiment.
Specifically, in the second step, the vacuum adsorption assembly 2 at least includes a vacuum adsorption machine. In this embodiment, as shown in fig. 2, the vacuum suction module includes a vacuum suction machine, and other devices such as a cylinder and a suction hole that are matched with each other, and certainly, if the vacuum suction is to be realized, the vacuum suction module 2 may further set other corresponding devices according to specific requirements, as long as the vacuum suction function can be realized.
In particular, in step three, the wiper blade assembly 3 includes at least a wiper blade that is automatically rotatable. In this embodiment, as shown in fig. 2, the cleaning disc assembly includes a cleaning disc capable of automatically rotating, and other matched devices such as a motor and a gear, and certainly, if the automatic cleaning of the cleaning disc assembly is to be realized, the cleaning disc assembly may further set other corresponding devices according to specific requirements, as long as the automatic cleaning function can be realized.
The dial plate cleaning method in the embodiment comprises the following specific working procedures: at first carry out the material loading through the dial plate mould, will treat that clear dial plate is placed in the dial plate mould, then, vacuum adsorption, it is firm to adsorb the dial plate on with the dial plate mould through the vacuum adsorption subassembly, prevent to drop at clean in-process, then, use the mild dial plate subassembly of cleaning on the dial plate mould, clean, and simultaneously, add the cleaning solution on cleaning the dial plate subassembly, a use for clean dial plate in the course of the work, finally, protection component through setting up, prevent that the cleaning solution of cleaning component in the work from outwards spilling on the one hand, on the other hand, can gather together the cleaning solution after the clean spot of dial plate and use, conveniently retrieve the subassembly and retrieve. Thereby continuously working circularly.
Example 2
As shown in fig. 1-3, a dial cleaning method includes the steps of:
the method comprises the following steps: feeding, namely placing a dial to be cleaned on the dial mold 1;
step two: vacuum adsorption, wherein the dial plate on the dial plate mold is firmly adsorbed through the vacuum adsorption component 2, so that the dial plate mold is prevented from falling in the cleaning process;
step three: and (4) cleaning the dial plate, namely wiping the dial plate on the dial plate mould by using the soft wiping disc component 3. The wiper blade assembly 3 is made of soft material such as sponge, silk floss, felt, foam or silica gel. In this embodiment, the wiping tray assembly 3 is made of sponge, or other soft material, which has certain softness and elasticity and can perform the wiping function.
Specifically, in step three, during the process of wiping and cleaning the dial on the dial mold 1 by the wiping disc assembly 3, the wiping disc assembly 3 keeps rotating positively or negatively to wipe the dial on the dial mold 1, and meanwhile, the dial mold 1 keeps still or keeps rotating in the opposite direction to the wiping disc assembly 3. Or the wiping disk component 3 keeps rotating positively and negatively alternately to wipe the dial on the dial mold, and the dial mold 1 keeps static or rotates in the opposite direction to the wiping disk component 3. In the third step, in the process of wiping and cleaning the dial plate on the dial plate mold 1 by the wiping plate assembly 3, the wiping plate assembly 3 keeps rotating in the negative direction to wipe the dial plate on the dial plate mold 1, and meanwhile, the dial plate mold 1 keeps rotating in the positive direction.
Specifically, in the second step, in the process that the vacuum adsorption assembly 2 firmly adsorbs the dial plate on the dial plate mold 1, the vacuum adsorption assembly 2 sets the vacuum to be negative 2KPa to negative 12 KPa. In this embodiment, in step two, during the dial plate adsorption on the dial plate mold 1 by the vacuum adsorption assembly 2 is firm, the vacuum is set to negative 12KPa by the vacuum adsorption assembly 2. Of course, the value of the vacuum may be set specifically according to factors such as the size of a specific dial, the bearing pressure, and the wiping strength of the wiper blade assembly, and is not necessarily limited to minus 2KPa to minus 12 KPa.
Specifically, in the third step, in the process of wiping and cleaning the dial on the dial mold 1 by the wiping disc assembly 3, the time for wiping the dial on the dial mold 1 by the wiping disc assembly 3 is 0.5 to 3 minutes. In the present embodiment, in step three, in the process of wiping and cleaning the dial on the dial mold 1 by the wiping disc assembly 3, the time for wiping the dial on the dial mold 1 by the wiping disc assembly 3 is 3 minutes. Of course, the time for rotating wiping may also be specifically set according to factors such as the size of a specific dial, the wiping cleaning degree, and the wiping friction force of the wiping disc component, and is not necessarily limited to 0.5 minute to 3 minutes.
Specifically, in the third step, in the process that the cleaning disc assembly 3 cleans the dial on the dial mold 1, cleaning liquid is added to the cleaning disc assembly 3, so that the cleaning is cleaner. In this embodiment, the cleaning solution is a detergent, and certainly, other cleaning solutions can be set as well, so as to perform a cleaning function, and the cleaning solution is not necessarily limited to water, detergent, alcohol or the like.
Specifically, in the use cleaning solution in-process, through setting up protection component 4, prevent that the cleaning solution from unrestrained and prevent the spot and the spot liquid unrestrained behind the clean dial plate. In this embodiment, the fixed setting of protective component 4 is on wiper blade subassembly 3, and what adopt is the plastics material, and of course, protective component also can set up on other positions, and its material also can adopt other materials, as long as it plays the effect that prevents the outside spill of cleaning solution of cleaning component in work, and can be in the same place gathering together the cleaning solution after can cleaning the spot of table dish and using, and it can to conveniently retrieve the subassembly recovery.
Specifically, in the process of wiping and cleaning the dial plate on the dial plate mold 1 by the wiping plate assembly 3, the recovery assembly 5 is arranged to recover the dirt wiped and cleaned by the wiping plate assembly 3 on the dial plate mold 1, or recover the scattered cleaning solution and the dirt liquid after the cleaning solution is used. In this embodiment, the recovery member 5 is configured as a recovery rectangular tank, as shown in fig. 2. Of course, the recovery module may be provided in other forms, or may be provided in other modules, and is not limited to the recovery rectangular groove provided in this embodiment.
Specifically, in the second step, the vacuum adsorption assembly 2 at least includes a vacuum adsorption machine. In this embodiment, as shown in fig. 2, the vacuum suction module includes a vacuum suction machine, and other devices such as a cylinder and a suction hole that are matched with each other, and certainly, if the vacuum suction is to be realized, the vacuum suction module 2 may further set other corresponding devices according to specific requirements, as long as the vacuum suction function can be realized.
In particular, in step three, the wiper blade assembly 3 includes at least a wiper blade that is automatically rotatable. In this embodiment, as shown in fig. 2, the cleaning disc assembly includes a cleaning disc capable of automatically rotating, and other matched devices such as a motor and a gear, and certainly, if the automatic cleaning of the cleaning disc assembly is to be realized, the cleaning disc assembly may further set other corresponding devices according to specific requirements, as long as the automatic cleaning function can be realized.
The dial plate cleaning method in the embodiment comprises the following specific working procedures: at first carry out the material loading through the dial plate mould, will treat that clear dial plate is placed in the dial plate mould, then, vacuum adsorption, it is firm to adsorb the dial plate on with the dial plate mould through the vacuum adsorption subassembly, prevent to drop at clean in-process, then, use the mild dial plate subassembly of cleaning on the dial plate mould, clean, and simultaneously, add the cleaning solution on cleaning the dial plate subassembly, a use for clean dial plate in the course of the work, finally, protection component through setting up, prevent that the cleaning solution of cleaning component in the work from outwards spilling on the one hand, on the other hand, can gather together the cleaning solution after the clean spot of dial plate and use, conveniently retrieve the subassembly and retrieve. Thereby continuously and circularly working.
Example 3
As shown in fig. 1-3, a dial cleaning method includes the steps of:
the method comprises the following steps: feeding, namely placing a dial to be cleaned on the dial mold 1;
step two: vacuum adsorption, wherein the dial plate on the dial plate mold is firmly adsorbed through the vacuum adsorption component 2, so that the dial plate mold is prevented from falling in the cleaning process;
step three: and (4) cleaning the dial plate, namely wiping the dial plate on the dial plate mould by using the soft wiping disc component 3. The wiper blade assembly 3 is made of soft material such as sponge, silk floss, felt, foam or silica gel. In this embodiment, the wiping disc assembly 3 is made of silicone, but may be made of other soft materials, which have certain softness and elasticity and can perform the wiping function.
Specifically, in step three, during the process of wiping and cleaning the dial on the dial mold 1 by the wiping disc assembly 3, the wiping disc assembly 3 keeps rotating positively or negatively to wipe the dial on the dial mold 1, and meanwhile, the dial mold 1 keeps still or keeps rotating in the opposite direction to the wiping disc assembly 3. Or the wiping disk component 3 keeps rotating positively and negatively alternately to wipe the dial on the dial mold, and the dial mold 1 keeps static or rotates in the opposite direction to the wiping disk component 3. In the embodiment, in the third step, during the process of wiping and cleaning the dial on the dial mold 1 by the wiping disc assembly 3, the wiping disc assembly 3 keeps rotating alternately in the positive direction and the negative direction to wipe the dial on the dial mold, and meanwhile, the dial mold 1 keeps still.
Specifically, in the second step, in the process that the vacuum adsorption assembly 2 firmly adsorbs the dial plate on the dial plate mold 1, the vacuum adsorption assembly 2 sets the vacuum to be negative 2KPa to negative 12 KPa. In this embodiment, in step two, during the dial plate adsorption on the dial plate mold 1 by the vacuum adsorption component 2 is firm, the vacuum is set to negative 7KPa by the vacuum adsorption component 2. Of course, the value of the vacuum may be set specifically according to factors such as the size of a specific dial, the bearing pressure, and the wiping strength of the wiper blade assembly, and is not necessarily limited to minus 2KPa to minus 12 KPa.
Specifically, in the third step, in the process of wiping and cleaning the dial on the dial mold 1 by the wiping disc assembly 3, the time for wiping the dial on the dial mold 1 by the wiping disc assembly 3 is 0.5 to 3 minutes. In the present embodiment, in step three, in the process of wiping and cleaning the dial on the dial mold 1 by the wiping disc assembly 3, the time for wiping the dial on the dial mold 1 by the wiping disc assembly 3 in a rotating manner is 1.7 minutes. Of course, the time for rotating wiping may also be specifically set according to factors such as the size of a specific dial, the wiping cleaning degree, and the wiping friction force of the wiping disc component, and is not necessarily limited to 0.5 minute to 3 minutes.
Specifically, in the third step, in the process that the cleaning disc assembly 3 cleans the dial on the dial mold 1, cleaning liquid is added to the cleaning disc assembly 3, so that the cleaning is cleaner. In this embodiment, the cleaning solution is alcohol, and certainly, can also set up to other cleaning solutions, play the cleaning effect can, do not necessarily limit to water, liquid detergent or alcohol etc..
Specifically, in the use cleaning solution in-process, through setting up protection component 4, prevent that the cleaning solution from unrestrained and prevent the spot and the spot liquid unrestrained behind the clean dial plate. In this embodiment, the fixed setting of protective component 4 is on wiping dish subassembly 3, and what adopt is the metal iron material, of course, protective component also can set up on other positions, and its material also can adopt other materials, as long as it plays the outside unrestrained effect of cleaning solution that prevents cleaning component in work, and can be in the same place gathering together the cleaning solution after can cleaning the spot of table dish and using, conveniently retrieve the subassembly and retrieve can.
Specifically, in the process of wiping and cleaning the dial plate on the dial plate mold 1 by the wiping plate assembly 3, the recovery assembly 5 is arranged to recover the dirt wiped and cleaned by the wiping plate assembly 3 on the dial plate mold 1, or recover the scattered cleaning solution and the dirt liquid after the cleaning solution is used. In this embodiment, the recovery member 5 is configured as a recovery rectangular tank, as shown in fig. 2. Of course, the recovery module may be provided in other forms, or may be provided in other modules, and is not limited to the recovery rectangular groove provided in this embodiment.
Specifically, in the second step, the vacuum adsorption assembly 2 at least includes a vacuum adsorption machine. In this embodiment, as shown in fig. 2, the vacuum suction module includes a vacuum suction machine, and other devices such as a cylinder and a suction hole that are matched with each other, and certainly, if the vacuum suction is to be realized, the vacuum suction module 2 may further set other corresponding devices according to specific requirements, as long as the vacuum suction function can be realized.
In particular, in step three, the wiper blade assembly 3 includes at least a wiper blade that is automatically rotatable. In this embodiment, as shown in fig. 2, the cleaning disc assembly includes a cleaning disc capable of automatically rotating, and other matched devices such as a motor and a gear, and certainly, if the automatic cleaning of the cleaning disc assembly is to be realized, the cleaning disc assembly may further set other corresponding devices according to specific requirements, as long as the automatic cleaning function can be realized.
The dial plate cleaning method in the embodiment comprises the following specific working procedures: at first carry out the material loading through the dial plate mould, will treat that clear dial plate is placed in the dial plate mould, then, vacuum adsorption, it is firm to adsorb the dial plate on with the dial plate mould through the vacuum adsorption subassembly, prevent to drop at clean in-process, then, use the mild dial plate subassembly of cleaning on the dial plate mould, clean, and simultaneously, add the cleaning solution on cleaning the dial plate subassembly, a use for clean dial plate in the course of the work, finally, protection component through setting up, prevent that the cleaning solution of cleaning component in the work from outwards spilling on the one hand, on the other hand, can gather together the cleaning solution after the clean spot of dial plate and use, conveniently retrieve the subassembly and retrieve. Thereby continuously working circularly.
Example 4
As shown in fig. 1-3, a dial cleaning method includes the steps of:
the method comprises the following steps: feeding, namely placing a dial to be cleaned on the dial mold 1;
step two: vacuum adsorption, wherein the dial plate on the dial plate mold is firmly adsorbed through the vacuum adsorption component 2, so that the dial plate mold is prevented from falling in the cleaning process;
step three: and (4) cleaning the dial plate, namely wiping the dial plate on the dial plate mould by using the soft wiping disc component 3. The wiper blade assembly 3 is made of soft material such as sponge, silk floss, felt, foam or silica gel. In this embodiment, the wiping tray assembly 3 is made of a thin cotton cloth material, or other soft material, which has certain softness and elasticity and can perform the wiping function.
Specifically, in step three, during the process of wiping and cleaning the dial on the dial mold 1 by the wiping disc assembly 3, the wiping disc assembly 3 keeps rotating positively or negatively to wipe the dial on the dial mold 1, and meanwhile, the dial mold 1 keeps still or keeps rotating in the opposite direction to the wiping disc assembly 3. Or the wiping disk component 3 keeps rotating positively and negatively alternately to wipe the dial on the dial mold, and the dial mold 1 keeps static or rotates in the opposite direction to the wiping disk component 3. In the present embodiment, in step three, during the process of wiping and cleaning the dial on the dial mold 1 by the wiping disc assembly 3, the wiping disc assembly 3 keeps rotating alternately in the positive direction and the negative direction to wipe the dial on the dial mold, and at the same time, the dial mold 1 keeps rotating in the opposite direction to the wiping disc assembly 3, that is, keeps rotating alternately in the positive direction and the negative direction.
Specifically, in the second step, in the process that the vacuum adsorption assembly 2 firmly adsorbs the dial plate on the dial plate mold 1, the vacuum adsorption assembly 2 sets the vacuum to be negative 2KPa to negative 12 KPa. In this embodiment, in step two, during the dial plate adsorption on the dial plate mold 1 by the vacuum adsorption assembly 2 is firm, the vacuum is set to negative 10KPa by the vacuum adsorption assembly 2. Of course, the value of the vacuum may be set specifically according to factors such as the size of a specific dial, the bearing pressure, and the wiping strength of the wiper blade assembly, and is not necessarily limited to minus 2KPa to minus 12 KPa.
Specifically, in the third step, in the process of wiping and cleaning the dial on the dial mold 1 by the wiping disc assembly 3, the time for wiping the dial on the dial mold 1 by the wiping disc assembly 3 is 0.5 to 3 minutes. In the present embodiment, in step three, in the process of wiping and cleaning the dial on the dial mold 1 by the wiping disc assembly 3, the time for wiping the dial on the dial mold 1 by the wiping disc assembly 3 is 2 minutes. Of course, the time for rotating wiping may also be set according to factors such as the size of the specific dial, the cleaning degree of wiping, and the wiping friction of the wiping disc assembly, and is not necessarily limited to 0.5 minutes to 3 minutes.
Specifically, in the third step, in the process that the cleaning disc assembly 3 cleans the dial on the dial mold 1, cleaning liquid is added to the cleaning disc assembly 3, so that the cleaning is cleaner. In this embodiment, the cleaning solution is vinegar or rosin water, and certainly, can also set up to other cleaning solutions, play the cleaning effect can, do not necessarily limit to water, liquid detergent or alcohol etc..
Specifically, in the use cleaning solution in-process, through setting up protection component 4, prevent that the cleaning solution from unrestrained and prevent the spot and the spot liquid unrestrained behind the clean dial plate. In this embodiment, the protection component 4 is fixedly arranged on the wiping tray component 3, and is made of plastic, of course, the protection component can also be arranged at other positions, and the material can also be made of other materials, so long as the protection component plays a role in preventing the cleaning liquid of the cleaning component from spilling outwards in work, and can gather the stains after cleaning the wiping tray and the cleaning liquid after use together, so that the recovery component can be recovered conveniently.
Specifically, in the process of wiping and cleaning the dial plate on the dial plate mold 1 by the wiping plate assembly 3, the recovery assembly 5 is arranged to recover the dirt wiped and cleaned by the wiping plate assembly 3 on the dial plate mold 1, or recover the scattered cleaning solution and the dirt liquid after the cleaning solution is used. In this embodiment, the recovery member 5 is configured as a recovery rectangular tank, as shown in fig. 2. Of course, the recovery component may be disposed in other forms, and may also be disposed on other components, and is not limited to the recovery rectangular groove provided in this embodiment.
Specifically, in the second step, the vacuum adsorption assembly 2 at least includes a vacuum adsorption machine. In this embodiment, as shown in fig. 2, the vacuum suction module includes a vacuum suction machine, and other devices such as a cylinder and a suction hole that are matched with each other, and certainly, if the vacuum suction is to be realized, the vacuum suction module 2 may further set other corresponding devices according to specific requirements, as long as the vacuum suction function can be realized.
In particular, in step three, the wiper blade assembly 3 includes at least a wiper blade that is automatically rotatable. In this embodiment, as shown in fig. 2, the cleaning disc assembly includes a cleaning disc capable of automatically rotating, and other matched devices such as a motor and a gear, and certainly, if the automatic cleaning of the cleaning disc assembly is to be realized, the cleaning disc assembly may further set other corresponding devices according to specific requirements, as long as the automatic cleaning function can be realized.
The dial plate cleaning method in the embodiment comprises the following specific working procedures: at first carry out the material loading through the dial plate mould, will treat that clear dial plate is placed in the dial plate mould, then, vacuum adsorption, it is firm to adsorb the dial plate on with the dial plate mould through the vacuum adsorption subassembly, prevent to drop in clean in-process, then, use the mild dial plate subassembly of cleaning on the dial plate mould, clean, and simultaneously, add the cleaning solution on cleaning the dish subassembly, be used for clean dial plate use in the course of the work, finally, through the protection component who sets up, prevent on the one hand that the cleaning solution of cleaning component in the work from outwards spilling, on the other hand, can be with gathering together the cleaning solution after to the clean spot of dial plate and use, conveniently retrieve the subassembly and retrieve. Thereby continuously working circularly.
It should be understood that the above-described embodiments of the present invention are merely examples for clearly illustrating the present invention, and are not intended to limit the embodiments of the present invention. Other variations and modifications will be apparent to persons skilled in the art in light of the above description. And are neither required nor exhaustive of all embodiments. Any modification, equivalent replacement, and improvement made within the spirit and principle of the present invention should be included in the protection scope of the claims of the present invention.
Claims (12)
1. A dial plate cleaning method, characterized by: the method comprises the following steps:
the method comprises the following steps: feeding, namely placing a dial to be cleaned on the dial mould (1);
step two: the dial plate on the dial plate mold is firmly adsorbed through the vacuum adsorption component (2) in a vacuum adsorption manner, so that the dial plate mold is prevented from falling in the cleaning process;
step three: and (3) cleaning the dial plate, namely wiping the dial plate on the dial plate mould by using a soft wiping disc component (3).
2. The dial cleaning method of claim 1, wherein: in the third step, during the process that the wiping disc component (3) wipes and cleans the dial on the dial mold (1), the wiping disc component (3) keeps rotating positively or negatively to wipe the dial on the dial mold (1), and meanwhile, the dial mold (1) keeps static or keeps rotating in the direction opposite to the direction of the wiping disc component (3).
3. The dial cleaning method of claim 1, wherein: in the third step, during the process that the wiping disc component (3) wipes the dial plate of the dial plate mold (1), the wiping disc component (3) keeps rotating positively and negatively alternately to wipe the dial plate on the dial plate mold, and the dial plate mold (1) keeps static or rotates in the direction opposite to the direction of the wiping disc component (3).
4. The dial cleaning method of claim 1, wherein: in the second step, in the process that the vacuum adsorption component (2) firmly adsorbs the dial plate on the dial plate mold (1), the vacuum adsorption component (2) sets the vacuum to be negative 2KPa to negative 12 KPa.
5. The dial cleaning method according to any one of claims 1 to 4, wherein: in the third step, in the process that the wiping disc component (3) wipes the dial on the dial mold (1), the time for rotationally wiping the dial on the dial mold (1) by the wiping disc component (3) is 0.5-3 minutes.
6. The dial cleaning method of claim 5, wherein: in the third step, cleaning liquid is added to the wiping disc assembly (3) in the process that the wiping disc assembly (3) wipes and cleans the dial on the dial mold (1), so that the cleaning is cleaner.
7. The dial cleaning method of claim 6, wherein: in the process of using the cleaning solution, the cleaning solution is prevented from spilling and the stain liquid behind the dial are prevented from spilling by arranging the protective component (4).
8. The dial cleaning method of claim 7, wherein: in the process that the cleaning disc component (3) cleans the dial plate on the dial plate die (1), the cleaning disc component (3) cleans the dial plate on the dial plate die (1) through arranging the recovery component (5) to recover the stain cleaned by the cleaning disc component (3), or recover the scattered cleaning liquid and the stain liquid after the cleaning liquid is used.
9. The dial cleaning method according to any one of claims 6 to 8, wherein: the cleaning solution is water, detergent or alcohol.
10. The dial cleaning method of any one of claims 1-4 or 6-8, wherein: in the third step, the wiping disc component (3) is made of soft materials such as sponge, silk floss, felt, foam or silica gel.
11. The dial cleaning method of claim 10, wherein: in the second step, the vacuum adsorption assembly (2) at least comprises a vacuum adsorption machine.
12. The dial cleaning method of claim 10, wherein: in the third step, the wiper disc assembly (3) at least comprises a wiper disc which can rotate automatically.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111592828.7A CN114433518A (en) | 2021-12-23 | 2021-12-23 | Dial plate cleaning method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111592828.7A CN114433518A (en) | 2021-12-23 | 2021-12-23 | Dial plate cleaning method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN114433518A true CN114433518A (en) | 2022-05-06 |
Family
ID=81363553
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202111592828.7A Pending CN114433518A (en) | 2021-12-23 | 2021-12-23 | Dial plate cleaning method |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN114433518A (en) |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11287721A (en) * | 1998-04-03 | 1999-10-19 | Tokyo Electron Ltd | Treatment equipment and treatment method |
| CN101305861A (en) * | 2007-05-18 | 2008-11-19 | 上海华虹Nec电子有限公司 | Brush head for cleaning silicon chip |
| CN101310875A (en) * | 2007-05-25 | 2008-11-26 | 上海华虹Nec电子有限公司 | Scribber head used in semiconductor device manufacture |
| CN103262208A (en) * | 2010-12-03 | 2013-08-21 | 应用材料公司 | Processing assembly for semiconductor workpiece and mehtods of processing same |
| KR20140083877A (en) * | 2012-12-26 | 2014-07-04 | 도쿄엘렉트론가부시키가이샤 | Substrate cleaning apparatus, substrate cleaning method, and storage medium |
| CN205966692U (en) * | 2016-08-08 | 2017-02-22 | 浙江晶瑞电子材料有限公司 | A rotatable worktable for sapphire wafer scrubs |
| CN111250455A (en) * | 2018-11-30 | 2020-06-09 | 夏泰鑫半导体(青岛)有限公司 | Wafer cleaning device |
| CN112452998A (en) * | 2020-11-20 | 2021-03-09 | 歌尔科技有限公司 | Surface cleaning method and device |
-
2021
- 2021-12-23 CN CN202111592828.7A patent/CN114433518A/en active Pending
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11287721A (en) * | 1998-04-03 | 1999-10-19 | Tokyo Electron Ltd | Treatment equipment and treatment method |
| CN101305861A (en) * | 2007-05-18 | 2008-11-19 | 上海华虹Nec电子有限公司 | Brush head for cleaning silicon chip |
| CN101310875A (en) * | 2007-05-25 | 2008-11-26 | 上海华虹Nec电子有限公司 | Scribber head used in semiconductor device manufacture |
| CN103262208A (en) * | 2010-12-03 | 2013-08-21 | 应用材料公司 | Processing assembly for semiconductor workpiece and mehtods of processing same |
| KR20140083877A (en) * | 2012-12-26 | 2014-07-04 | 도쿄엘렉트론가부시키가이샤 | Substrate cleaning apparatus, substrate cleaning method, and storage medium |
| CN205966692U (en) * | 2016-08-08 | 2017-02-22 | 浙江晶瑞电子材料有限公司 | A rotatable worktable for sapphire wafer scrubs |
| CN111250455A (en) * | 2018-11-30 | 2020-06-09 | 夏泰鑫半导体(青岛)有限公司 | Wafer cleaning device |
| CN112452998A (en) * | 2020-11-20 | 2021-03-09 | 歌尔科技有限公司 | Surface cleaning method and device |
Non-Patent Citations (1)
| Title |
|---|
| 梁治齐: "《实用清洗技术手册》", 31 January 2000, 化学工业出版社 * |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN112620275A (en) | Biological culture dish cleaning device is used in school's teaching | |
| CN113618559A (en) | Self-adaptive fragment capturing type surface pretreatment type water pump impeller grinding machine | |
| CN114433518A (en) | Dial plate cleaning method | |
| CN215147439U (en) | Cylindrical grinder with garbage collection structure | |
| CN211582926U (en) | Hand-held type waxing attachment | |
| CN207982981U (en) | A kind of automatic edging machine | |
| CN210125621U (en) | Cleaning device for cell-phone screen | |
| CN217616275U (en) | Automatic wiping equipment for watch dial | |
| CN113500514B (en) | Equal-thickness polished surface flat grinding device with self-cleaning mechanism | |
| CN217616199U (en) | Grinding disc structure | |
| CN210207757U (en) | Miniature carving cleaning device | |
| CN204672585U (en) | A kind of chopping board strip automatic cleaning device | |
| CN211805094U (en) | Engraving machine with residue removing structure | |
| CN212069657U (en) | Display screen wiping device of three-side screen high-speed rail ticket checker | |
| CN211492500U (en) | Trimmer is used in plastic products production | |
| CN110538837B (en) | Glue removing and recycling process for assembly | |
| CN207059488U (en) | The automatic ink removing cleaning device of ink reservoir of DI tank printing machines | |
| CN205217420U (en) | Cell -phone window window cleaner piece device | |
| CN218696849U (en) | Cell-phone frame burr remove device | |
| CN214321011U (en) | Substrate cleaning device | |
| CN217103120U (en) | Sewage recycling device | |
| CN212886729U (en) | Glass double-straight-edge grinding machine | |
| CN214441597U (en) | Power equipment tool placing frame | |
| CN220713840U (en) | Rolling brush for cleaning | |
| CN213380767U (en) | Prosthetic belt cleaning device of pneumatic cylinder that cleaning efficiency is high |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20220506 |
|
| RJ01 | Rejection of invention patent application after publication |