CN214321011U

CN214321011U - Substrate cleaning device

Info

Publication number: CN214321011U
Application number: CN202023165271.2U
Authority: CN
Inventors: 申屠江民; 王连彬; 祝宇; 乔其爽
Original assignee: Zhejiang Laibao Technology Co ltd
Current assignee: Zhejiang Laibao Technology Co ltd
Priority date: 2020-12-24
Filing date: 2020-12-24
Publication date: 2021-10-01
Anticipated expiration: 2030-12-24

Abstract

The utility model provides a substrate cleaning device, including clean bench, lotion groove, first pipeline, be equipped with many driving rollers and at least one washing round brush on the clean bench, the lotion groove is connected to first pipeline front end, and the end is equipped with sprays the mechanism, remains at the panel cleaning machine front end and gets rid of effectively to polishing the remaining polishing powder of back substrate surface, gel, promotes original dull and stereotyped cleaning ability, ensures that polishing substrate surface cleanliness satisfies follow-up coating film requirement and panel processing requirement.

Description

Substrate cleaning device

Technical Field

The utility model belongs to the technical field of dull and stereotyped cleanness, a flat panel display polishing base plate cleaning device is related to.

Background

The flat panel display substrate is usually subjected to surface grinding by adopting a chemical mechanical polishing technology, and the grinding and polishing of the surface of the substrate are realized by alternately performing a chemical action process and a mechanical action process, so that the micro-waviness and the surface quality of the substrate required by flat panel display are achieved.

The conventional polishing method is to polish with cerium oxide, which generates gel substances to be removed and polishing powder residues during the polishing process. However, the surface is not cleaned completely after polishing, which not only causes the yield of the subsequent film plating process and flat panel display process to be reduced, but also causes the reliability and stability of the flat panel display device to be reduced.

In view of the above problems in the above production, how to ensure the substrate cleanliness after polishing has become an important technical problem in the art.

SUMMERY OF THE UTILITY MODEL

In order to solve the base plate by the polishing back, the problem that surface cleaning is not clean under the prerequisite that does not influence original technology and hardware facilities, the utility model provides a base plate cleaning device remains at the remaining polishing powder of flat cleaning machine front end to polishing back substrate surface, gel and gets rid of effectively, promotes original dull and stereotyped cleaning ability, ensures that polishing substrate surface cleanliness satisfies follow-up coating film requirement and flat board processing requirement, satisfies the customer demand better.

The utility model provides a substrate cleaning device, including clean bench, lotion groove, first pipeline, be equipped with many driving rollers and at least one washing round brush on the clean bench, the lotion groove is connected to first pipeline front end, and the end is equipped with sprays the mechanism, it is located to wash the round brush spray the mechanism lower extreme.

The specific cleaning process is that the cleaning liquid in the cleaning liquid tank is sprayed onto the cleaning rolling brush through the spraying mechanism from the first pipeline, the substrate is driven by the driving roller to pass through the cleaning rolling brush, and the cleaning rolling brush cleans the substrate.

In an optional scheme, the substrate cleaning apparatus further includes a second pipe, a front end of the second pipe is located below the cleaning roller brush, a rear end of the second pipe is connected to the cleaning solution tank, and the cleaning solution and the residue after the substrate is cleaned flow into the cleaning solution tank.

In an optional scheme, a liquid pump is arranged on the first pipeline, and the cleaning liquid in the cleaning liquid tank is sucked and pumped to the spraying mechanism through the liquid pump.

In an optional scheme, a heater is further arranged in the washing liquid tank, and the heater can heat the washing liquid in the washing liquid tank, so that the washing liquid has a better washing effect when used for washing the substrate.

In an optional scheme, a filter screen is further arranged in the liquid washing tank, the filter screen can filter residues flowing back through the second pipeline, and the residues are prevented from continuously entering the first pipeline to pollute or damage the substrate.

In an optional scheme, the filter screen is provided with a waste bucket, the filter screen is arranged on an inclined plane, and the waste bucket is positioned on the lower side of the filter screen and used for storing waste materials which flow back and slide down from the filter screen.

In an optional scheme, the periphery of the driving roller is wrapped with a layer of dust-proof cloth to prevent the driving roller from polluting or damaging the substrate when the substrate is driven.

In an alternative scheme, the number of the cleaning rolling brushes is two, one is located above the substrate, and the other is located below the substrate.

The utility model provides a substrate cleaning device, including clean bench, lotion groove, first pipeline, be equipped with many driving rollers and at least one washing round brush on the clean bench, the lotion groove is connected to first pipeline front end, and the end is equipped with sprays the mechanism, remains at the panel cleaning machine front end to polishing the remaining polishing powder of back substrate surface, gel and gets rid of effectively, promotes original dull and stereotyped cleaning power, ensures that polishing substrate surface cleanliness satisfies follow-up coating film requirement and panel processing requirement, satisfies the customer demand better. And simultaneously, the utility model discloses a base plate cleaning device contains washing liquid circulation system, can resources are saved.

Drawings

FIG. 1 is a schematic side view of a substrate cleaning apparatus of the present invention;

fig. 2 is a schematic top view of the substrate cleaning apparatus of the present invention.

Reference numerals

1-cleaning table, 2-cleaning solution tank, 3-first pipeline, 4-second pipeline, 11-driving roller, 12-cleaning rolling brush, 21-heater, 22-filter screen, 31-spraying mechanism and 32-liquid pump.

Detailed Description

For a better understanding of the present invention, the following description is given in conjunction with the accompanying drawings and examples, and the following detailed description is given.

As shown in fig. 1-2, the present embodiment provides a substrate cleaning apparatus, which includes a cleaning table 1, a cleaning solution tank 2, and a first pipeline 3, wherein the cleaning table 1 is provided with a plurality of driving rollers 11 and at least one cleaning roller brush 12, the front end of the first pipeline 3 is connected to the cleaning solution tank 2, the end of the first pipeline is provided with a spraying mechanism 31, and the cleaning roller brush 12 is located at the lower end of the spraying mechanism 31. The cleaning procedure is that the cleaning liquid in the cleaning liquid tank 2 is sprayed onto the cleaning roller brush 12 from the first pipeline 3 through the spraying mechanism 31, the substrate is driven by the driving roller to pass through the cleaning roller brush 12, and the cleaning roller brush 12 cleans the substrate.

In this embodiment, the substrate cleaning apparatus further includes a second pipe 4, a front end of the second pipe 4 is located below the cleaning roller 12, a rear end of the second pipe 4 is connected to the cleaning solution tank 2, and the cleaning solution and the residue after cleaning the substrate flow into the cleaning solution tank 2 through the second pipe 4. The design of the second pipeline 4 is added, so that the cyclic utilization of the cleaning liquid is facilitated.

In this embodiment, the first pipe 3 is provided with a liquid pump 32, and since the cleaning liquid tank 2 is located below the substrate, the cleaning liquid in the cleaning liquid tank 2 needs to be sucked and pumped to the spraying mechanism 31 by the liquid pump 32. Meanwhile, the cleaning liquid after cleaning the substrate may flow back from the substrate position to the cleaning liquid tank 2 by gravity.

In the embodiment, the cleaning solution tank 2 is further provided with a heater 21, and the heater 21 can heat the cleaning solution in the cleaning solution tank 2, so that the cleaning solution has a better cleaning effect when cleaning the substrate.

In this embodiment, a filter 22 is further disposed in the liquid washing tank, and the filter 22 can filter the residue flowing back through the second pipeline, so as to prevent the residue from entering the first pipeline 3 continuously to pollute or damage the substrate.

In a specific embodiment, the aperture of the filter screen 22 is 1 to 100 μm.

In this embodiment, there are two cleaning rollers 12, one above the substrate and one below the substrate, and in other embodiments, there may be only one cleaning roller 12 above the substrate, that is, there is no cleaning roller 12 below the substrate.

The substrate cleaning apparatus provided in the above embodiments is a preferred embodiment, and should not be construed as limiting the scope of the present invention, and those skilled in the art should understand that various modifications or substitutions can be made without departing from the spirit of the present invention, and all modifications or substitutions should be considered to be within the scope of the present invention, that is, the scope of the present invention should be determined by the claims. The features of the embodiments and embodiments described herein above may be combined with each other without conflict.

Claims

1. A substrate cleaning device comprises a cleaning table (1), a washing liquid tank (2) and a first pipeline (3), wherein a plurality of driving rollers (11) and at least one cleaning rolling brush (12) are arranged on the cleaning table (1);

the device is characterized in that the front end of the first pipeline (3) is connected with the washing liquid tank (2), the tail end of the first pipeline is provided with a spraying mechanism (31), and the cleaning rolling brush (12) is positioned at the lower end of the spraying mechanism (31).

2. A substrate cleaning apparatus according to claim 1, further comprising a second pipe (4), wherein a front end of the second pipe (4) is located below the cleaning roller (12), and a rear end thereof is connected to the cleaning solution tank (2).

3. A substrate cleaning apparatus according to claim 1, wherein the first conduit (3) is provided with a liquid pump (32).

4. A substrate cleaning apparatus according to claim 1, wherein a heater 21 is provided in the bath tank (2).

5. A substrate cleaning apparatus according to claim 1, wherein a screen (22) is provided in the wash tank.

6. A substrate cleaning apparatus according to claim 5, wherein the mesh (22) has a pore size of 1 to 100 μm.

7. A substrate cleaning apparatus according to claim 5, wherein the screen is provided with a waste bin, the screen (22) is inclined and the waste bin is located below the screen.

8. A substrate cleaning apparatus according to claim 1, wherein the driving roller (11) is coated with a dust-proof cloth on its periphery.

9. A substrate cleaning apparatus according to claim 1, wherein the cleaning roller brush (12) is two.