CN114415482B - Inscribing method and device of super-resolution laser direct writing system based on galvanometer - Google Patents

Inscribing method and device of super-resolution laser direct writing system based on galvanometer Download PDF

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CN114415482B
CN114415482B CN202210324232.7A CN202210324232A CN114415482B CN 114415482 B CN114415482 B CN 114415482B CN 202210324232 A CN202210324232 A CN 202210324232A CN 114415482 B CN114415482 B CN 114415482B
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data
galvanometer
polarity
writing
laser direct
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CN114415482A (en
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汤孟博
张晓依
樊吴申
匡翠方
杨臻垚
詹兰馨
刘旭
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Zhejiang University ZJU
Zhejiang Lab
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Zhejiang University ZJU
Zhejiang Lab
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216Mask projection systems
    • G03F7/70358Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10Scanning systems
    • G02B26/101Scanning systems with both horizontal and vertical deflecting means, e.g. raster or XY scanners
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216Mask projection systems
    • G03F7/70358Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G03F7/70366Rotary scanning
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G03F7/704Scanned exposure beam, e.g. raster-, rotary- and vector scanning

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  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Laser Beam Processing (AREA)

Abstract

The invention discloses a writing method and a device of a super-resolution laser direct writing system based on a galvanometer, wherein the method comprises the following steps: acquiring data to be inscribed and a single scanning range of a galvanometer-based super-resolution laser direct writing system; dividing the data to be inscribed into a plurality of sub-data according to the single scanning range; rotating the subdata according to a global coordinate system to obtain rotating data; acquiring the X polarity and the Y polarity of the galvanometer; according to the X polarity and the Y polarity, the rotation data are overturned to obtain overturning data; fitting the splicing coincidence region between the turning data to obtain the writing data; and according to the writing data, writing by using a super-resolution laser direct writing system based on a galvanometer. The method solves the problems of angular deviation between the galvanometer and a global coordinate system, inconsistency between the X/Y axial direction of the galvanometer and the global coordinate axial direction and inconsistency between splicing and inscribing uniformity.

Description

Writing method and device of super-resolution laser direct writing system based on galvanometer
Technical Field
The application relates to the technical field of laser direct writing lithography, in particular to a writing method and a writing device of a super-resolution laser direct writing system based on a galvanometer.
Background
The laser direct writing technology is a maskless lithography technology which is widely applied in recent years and realizes direct writing by means of laser. The laser beam is used for scanning on the substrate with the photosensitive coating to directly generate the information of the graph, the preparation of a mask plate is not needed, the processes of graph transcription, alignment and the like are omitted, and the manufacturing efficiency and the manufacturing precision are improved. During scanning, the photolithographic substrate moves with the stage.
In the process of implementing the invention, the inventor finds that at least the following problems exist in the prior art:
at present, the processing requirements of nano-sized structures in the sensing field gradually change from two-dimensional structures to three-dimensional structures, from simple materials to complex materials, and from simple structures to complex large-area structures. The technical scheme commonly adopted for large-area structure inscription is that a galvanometer or a multi-surface rotating prism is utilized to drive a light beam to perform raster scanning stepping movement, single-frame or small-range inscription is realized, and then large-area splicing is realized by means of a linear motor. However, due to the factors of angular deviation, direction reversal, frame-to-frame splicing and the like between the galvanometer and the global coordinate system, the method is often difficult to maintain accuracy during large-area writing, and the accuracy, uniformity and success rate of device preparation and material research by the method are reduced.
Disclosure of Invention
The embodiment of the application aims to provide a writing method and a writing device of a galvanometer-based super-resolution laser direct writing system, so as to solve the technical problems of low accuracy, uniformity and success rate of large-area writing in the related technology.
According to a first aspect of the embodiments of the present application, there is provided a writing method for a galvanometer-based super-resolution laser direct writing system, including:
acquiring data to be inscribed and a single scanning range of a super-resolution laser direct writing system based on a galvanometer;
dividing the data to be inscribed into a plurality of sub-data according to the single scanning range;
rotating the subdata according to a global coordinate system to obtain rotating data;
acquiring the X polarity and the Y polarity of the galvanometer;
according to the X polarity and the Y polarity, the rotation data are overturned to obtain overturning data;
fitting the splicing coincidence region between the turning data to obtain the writing data;
and according to the writing data, writing by using a super-resolution laser direct writing system based on a galvanometer.
Further, the size of the sub-data is smaller than the single scanning range.
Further, rotating the sub-data according to a global coordinate system to obtain rotated data, including:
calculating an included angle between the scanning direction of the galvanometer and the global coordinate system;
and rotating the subdata according to the included angle to obtain rotation data.
Further, the absolute value of the included angle is less than 90 °.
Further, according to the X polarity and the Y polarity, inverting the rotation data includes:
if the X polarity is 1, turning the rotation data left and right;
and if the Y polarity is 1, turning the rotation data up and down.
Further, fitting the splicing overlapping area between the turning data to obtain the writing data, including:
calculating the position information of a coincidence region between any two adjacent turning data to obtain all coordinate information of the coincidence region;
and according to the global coordinate system, carrying out coordinate conversion on the coordinate information to obtain the writing data.
Further, the writing sequence when the super-resolution laser direct writing system based on the galvanometer is used for writing comprises X bidirectional, Y bidirectional, X snake-shaped, Y snake-shaped, X circumference and Y circumference.
According to a second aspect of the embodiments of the present application, there is provided an inscribing apparatus of a galvanometer-based super-resolution laser direct writing system, including:
the first acquisition module is used for acquiring data to be inscribed and a single scanning range of the super-resolution laser direct writing system based on the galvanometer;
the dividing module is used for dividing the data to be inscribed into a plurality of sub-data according to the single scanning range;
the rotation module is used for rotating the subdata according to a global coordinate system to obtain rotation data;
the second acquisition module is used for acquiring the X polarity and the Y polarity of the galvanometer;
the overturning module is used for overturning the rotating data according to the X polarity and the Y polarity to obtain overturning data;
the fitting module is used for fitting the splicing superposition area between the turning data to obtain inscribing data;
and the writing module is used for writing by utilizing a super-resolution laser direct writing system based on a galvanometer according to the writing data.
According to a third aspect of embodiments herein, there is provided an electronic device comprising:
one or more processors;
a memory for storing one or more programs;
when executed by the one or more processors, cause the one or more processors to implement a method as described in the first aspect.
According to a fourth aspect of embodiments herein, there is provided a computer readable storage medium having stored thereon computer instructions which, when executed by a processor, carry out the steps of the method according to the first aspect.
The technical scheme provided by the embodiment of the application can have the following beneficial effects:
according to the embodiment, the sub-data are rotated to integrate the angle deviation between the galvanometer and the global coordinate system; the rotating data is overturned according to the X polarity and the Y polarity of the galvanometer, so that the problem that the X/Y axial direction of the galvanometer is inconsistent with the axial direction of a global coordinate is solved, and the axial direction of the galvanometer does not need to follow a certain specific direction in the process of installing a system; and fitting the splicing coincidence region between the turnover data to ensure that the splicing coincidence region has good uniformity in the X/Y direction of the global coordinate system, thereby effectively improving the engraving quality and the engraving success rate of large-area splicing engraving of the sample.
It is to be understood that both the foregoing general description and the following detailed description are exemplary and explanatory only and are not restrictive of the application.
Drawings
The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate embodiments consistent with the present application and together with the description, serve to explain the principles of the application.
Fig. 1 is a flowchart illustrating a scribing method of a galvanometer-based super-resolution laser direct writing system according to an exemplary embodiment.
Fig. 2 is a flowchart illustrating step S13 according to an exemplary embodiment.
Fig. 3 is a schematic diagram of step S13, shown according to an exemplary embodiment.
Fig. 4 is a flowchart illustrating step S15 according to an exemplary embodiment.
Fig. 5 is a schematic diagram illustrating step S15 according to an exemplary embodiment.
Fig. 6 is a flowchart illustrating step S16, according to an exemplary embodiment.
Fig. 7 is a schematic diagram illustrating a writing sequence according to an example embodiment.
Fig. 8 is a graph comparing a writing sample a and a writing sample b according to an exemplary embodiment.
Fig. 9 is a block diagram of a writing apparatus of a galvanometer-based super-resolution laser direct writing system according to an exemplary embodiment.
FIG. 10 is a schematic diagram illustrating an electronic device in accordance with an example embodiment.
Detailed Description
Reference will now be made in detail to the exemplary embodiments, examples of which are illustrated in the accompanying drawings. When the following description refers to the accompanying drawings, like numbers in different drawings represent the same or similar elements unless otherwise indicated. The embodiments described in the following exemplary embodiments do not represent all embodiments consistent with the present application. Rather, they are merely examples of apparatus and methods consistent with certain aspects of the present application, as detailed in the appended claims.
The terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the application. As used in this application and the appended claims, the singular forms "a", "an", and "the" are intended to include the plural forms as well, unless the context clearly indicates otherwise. It should also be understood that the term "and/or" as used herein refers to and encompasses any and all possible combinations of one or more of the associated listed items.
It is to be understood that although the terms first, second, third, etc. may be used herein to describe various information, such information should not be limited to these terms. These terms are only used to distinguish one type of information from another. For example, first information may also be referred to as second information, and similarly, second information may also be referred to as first information, without departing from the scope of the present application. The word "if" as used herein may be interpreted as "at … …" or "when … …" or "in response to a determination", depending on the context.
The noun explains:
x polarity of the galvanometer: and whether the X direction scanned by the galvanometer is opposite to the X direction of the global coordinate system or not is judged, if so, the X polarity is 1, and otherwise, the X polarity is 0.
Y polarity of the galvanometer: and whether the Y direction scanned by the galvanometer is opposite to the Y direction of the global coordinate system or not is judged, if so, the Y polarity is 1, and otherwise, the Y polarity is 0.
Fig. 1 is a flowchart illustrating a writing method of a galvanometer-based super-resolution laser direct writing system according to an exemplary embodiment, where, as shown in fig. 1, the method is applied to the galvanometer-based super-resolution laser direct writing system and may include the following steps:
step S11: acquiring data to be inscribed and a single scanning range of a galvanometer-based super-resolution laser direct writing system;
step S12: dividing the data to be inscribed into a plurality of sub-data according to the single scanning range;
step S13: according to the global coordinate system, the subdata is rotated to obtain rotation data;
step S14: acquiring the X polarity and the Y polarity of the galvanometer;
step S15: according to the X polarity and the Y polarity, the rotation data are overturned to obtain overturning data;
step S16: fitting the splicing coincidence area between the turning data to obtain the inscribing data;
step S17: and according to the writing data, writing by using a super-resolution laser direct writing system based on a galvanometer.
According to the embodiment, the sub-data are rotated, and the angle deviation between the galvanometer and the global coordinate system is integrated; the rotation data is overturned according to the X polarity and the Y polarity of the galvanometer, so that the problem that the X/Y axial direction of the galvanometer is inconsistent with the axial direction of a global coordinate is solved, and the axial direction of the galvanometer does not need to follow a certain specific direction in the process of installing a system; and fitting the splicing coincidence region between the turnover data to ensure that the splicing coincidence region has good uniformity in the X/Y direction of the global coordinate system, thereby effectively improving the engraving quality and the engraving success rate of large-area splicing engraving of the sample.
Specifically, the galvanometer-based super-resolution laser direct writing system may be an existing system or a system obtained by modifying the existing system, and in an embodiment, the galvanometer-based super-resolution laser direct writing system includes a femtosecond laser, a scanning galvanometer, a high-precision piezoelectric displacement stage, a microscope, an acousto-optic modulator, an NI board, and other devices.
In the specific implementation of step S11, acquiring data to be inscribed and a single scanning range of the galvanometer-based super-resolution laser direct writing system;
specifically, the file format of the data to be inscribed may be of the types STL, PNG, GDSII, JPEG, and the like, a gray scale or a color image.
In an embodiment, the single scan range is 60um to 60um, it should be noted that the scan range here depends on the scan range of the actual system, and the above is only given as an example and is not limited to this range.
In a specific implementation of step S12, dividing the data to be inscribed into a plurality of sub-data according to the single scanning range;
specifically, the size of the sub-data is smaller than the single scanning range.
In an embodiment, the data to be written may be a common image file, such as JPEG format or PNG format, the image pixel size is 1000 × 1000, and the writing pattern is a two-dimensional raster, which is divided into two subdata of 50um × 50 um. It should be noted that, the above only gives an example of a file to be inscribed, and the format, size, etc. of the file to be inscribed can be set according to the actual situation, and the setting is a conventional means in the field.
In a specific implementation of step S13, the sub-data is rotated according to a global coordinate system to obtain rotation data;
specifically, as shown in fig. 2, this step may include the following sub-steps:
step S21: calculating an included angle between the scanning direction of the galvanometer and the global coordinate system;
specifically, the galvanometer scans a straight line along the X direction or the Y direction, and an included angle between the straight line and the X direction or the Y direction of the global coordinate system is measured.
Step S22: rotating the subdata according to the included angle to obtain rotating data;
specifically, the sub-data is rotated by:
Figure DEST_PATH_IMAGE001
wherein, x and y are two-dimensional coordinates of coordinate points of the subdata in the global coordinate system, x 'and y' are two-dimensional coordinates of the subdata in the global coordinate system after rotation,θis the angle.
Specifically, the absolute value of the included angle-θ|<At 90 deg.. Because of the movement used in the systemThe moving device not only comprises a galvanometer, but also comprises other moving displacement tables. The moving devices are unified in a reference coordinate system, and the aim is to reduce the difficulty of designing an algorithm during writing. Meanwhile, the design does not need to strictly correct the consistency of the axial directions of all the devices in the process of installing the system, and only needs to ensure that the devices follow the same reference coordinate system.
In one embodiment, as shown in FIG. 3, the angle between the X direction of the galvanometer scan and the X direction of the global coordinate system is calculatedθRotating the two subdata clockwise respectivelyθTwo rotation data are obtained.
In the specific implementation of step S14, the X and Y polarities of the galvanometer are acquired;
specifically, on the right side of the specified position, a straight line is scanned in the X forward direction of the global coordinate system using a galvanometer, and it is observed whether the straight line is actually on the right side of the position. If the actual result is consistent with the expected result, the X polarity is 0, otherwise it is 1. And scanning a straight line along the Y forward direction of the global coordinate system by using a galvanometer below the specified position, and observing whether the straight line is actually below the position. The Y polarity is 0 if the actual result is consistent with the expected result, and 1 otherwise. After the polarities of the X axis and the Y axis of the galvanometer are obtained, the structure can be inscribed at the appointed position according to actual requirements in the process of inscribing the structure.
In a specific implementation of step S15, the rotation data is inverted according to the X polarity and the Y polarity, so as to obtain inverted data;
specifically, as shown in fig. 4, this step may include the following sub-steps:
step S31: if the X polarity is 1, turning the rotation data left and right;
specifically, if the X polarity of the galvanometer is 1, that is, the X direction of the galvanometer scan is opposite to the X direction of the global coordinate system, the matrix of the rotation data is inverted left and right.
Step S32: and if the Y polarity is 1, turning the rotation data up and down.
Specifically, if the Y-polarity of the galvanometer is 1, that is, the Y-direction of the galvanometer scanning is opposite to the Y-direction of the global coordinate system, the matrix of the rotation data is inverted up and down.
In an embodiment, as shown in fig. 5, if the X direction of the galvanometer scanning is opposite to the X direction of the global coordinate system, and the Y direction of the galvanometer scanning is not opposite to the Y direction of the global coordinate system, the data matrix of the rotation data is inverted left and right, and the correct writing result is obtained.
In the specific implementation of step S16, fitting the splicing overlapping area between the flipped data to obtain the inscribing data;
specifically, as shown in fig. 6, this step may include the following sub-steps:
step S41: calculating the position information of a coincidence area between any two adjacent turning data to obtain all coordinate information of the coincidence area;
specifically, the overlapped area is an area where any two adjacent areas are overlapped at the splicing position, and all coordinate information of the overlapped area can be obtained according to the coordinate calculation method of the foregoing steps. Because the overlapping area is scanned by the laser for multiple times, the energy of the laser is reduced in the overlapping area, and the energy of the overlapping area and the energy of the non-overlapping area can be uniform.
Step S42: according to the global coordinate system, carrying out coordinate conversion on the coordinate information to obtain inscribing data;
specifically, the coordinate information of the overlapping area is converted into coordinate data in the global coordinate system according to the coordinate conversion formula in step S22.
In a specific implementation of step S17, according to the writing data, writing by using a galvanometer-based super-resolution laser direct writing system;
specifically, as shown in fig. 7, the writing sequence at the time of writing may include an X bidirectional in the diagram (a) of fig. 7, a Y bidirectional in the diagram (b) of fig. 7, an X serpentine in the diagram (c) of fig. 7, a Y serpentine in the diagram (d) of fig. 7, an X circumference in the diagram (e) of fig. 7, and a Y circumference in the diagram (f) of fig. 7. It should be noted that, the above only gives examples of six writing sequences, and the writing sequence used in particular can be set according to the actual situation, which is set as the conventional means in the art.
In this embodiment, the laser light source of the laser direct writing system is a light source with a wavelength of 780 nm; parameters of a writing sample are pulse width 140fs, repetition frequency is 80MHz, and writing speed is 200 um/s; the sample bearing substrate is a glass substrate; the photoresist is liquid photoresist.
In the embodiment, an unprocessed file to be inscribed is led into a super-resolution laser direct writing system based on a galvanometer, the galvanometer is used for driving a raster scanning stepping inscribing mode, inscribing parameters are selected, inscribing is started, and an inscribing sample a is obtained; then, importing the writing data processed by the method into a dual-channel laser direct writing system, driving a grating scanning stepping writing mode by using a galvanometer, selecting writing parameters, and starting writing to obtain a sample b; fig. 8 (a) is a schematic diagram of a writing sample a, fig. 8 (b) is a schematic diagram of a writing sample b, and the square areas in the diagrams are all the splicing positions of writing, as can be seen from fig. 8, the method can solve the difference of writing effects in the scanning direction and the stepping direction caused by the factors of angle deviation, direction reversal of the galvanometer scanning direction and the global coordinate system, splicing between frames and the like, thereby improving the overall uniformity of the galvanometer scanning stepping large-area writing of the laser direct writing system. By the method, the engraving quality and the engraving success rate of large-area splicing and engraving of the sample are effectively improved.
Corresponding to the embodiment of the writing method of the galvanometer-based super-resolution laser direct writing system, the application also provides an embodiment of a writing device of the galvanometer-based super-resolution laser direct writing system.
Fig. 9 is a block diagram of a writing apparatus of a galvanometer-based super-resolution laser direct writing system according to an exemplary embodiment. Referring to fig. 9, the apparatus may include:
the first acquisition module 21 is configured to acquire data to be written and a single scanning range of the galvanometer-based super-resolution laser direct writing system;
a dividing module 22, configured to divide the data to be inscribed into a plurality of sub-data according to the single scanning range;
the rotation module 23 is configured to rotate the sub-data according to a global coordinate system to obtain rotation data;
a second obtaining module 24, configured to obtain an X polarity and a Y polarity of the galvanometer;
the overturning module 25 is configured to overturn the conversion data according to the X polarity and the Y polarity to obtain overturning data;
a fitting module 26, configured to fit a splicing overlap area between the turning data to obtain inscribing data;
and the writing module 27 is configured to perform writing by using a super-resolution laser direct writing system based on a galvanometer according to the writing data.
With regard to the apparatus in the above embodiment, the specific manner in which each module performs the operation has been described in detail in the embodiment related to the method, and will not be described in detail here.
For the device embodiment, since it basically corresponds to the method embodiment, reference may be made to the partial description of the method embodiment for relevant points. The above-described embodiments of the apparatus are merely illustrative, and the units described as separate parts may or may not be physically separate, and parts displayed as units may or may not be physical units, may be located in one place, or may be distributed on a plurality of network units. Some or all of the modules can be selected according to actual needs to achieve the purpose of the scheme of the application. One of ordinary skill in the art can understand and implement without inventive effort.
Correspondingly, the present application further provides an electronic device, comprising: one or more processors; a memory for storing one or more programs; when the one or more programs are executed by the one or more processors, the one or more processors implement the scribing method of the galvanometer-based super-resolution laser direct writing system as described above. As shown in fig. 10, for a hardware structure diagram of any device with data processing capability where a writing method of a galvanometer-based super-resolution laser direct writing system according to an embodiment of the present invention is located, in addition to the processor, the memory, and the network interface shown in fig. 10, any device with data processing capability where a device is located in an embodiment may further include other hardware generally according to actual functions of the any device with data processing capability, which is not described again.
Accordingly, the present application also provides a computer readable storage medium, on which computer instructions are stored, wherein the instructions, when executed by a processor, implement the method for writing of the galvanometer-based super-resolution laser direct writing system as described above. The computer readable storage medium may be an internal storage unit, such as a hard disk or a memory, of any data processing capability device described in any of the foregoing embodiments. The computer readable storage medium may also be an external storage device of the wind turbine, such as a plug-in hard disk, a Smart Media Card (SMC), an SD Card, a Flash memory Card (Flash Card), and the like, provided on the device. Further, the computer readable storage medium may include both an internal storage unit and an external storage device of any data processing capable device. The computer-readable storage medium is used for storing the computer program and other programs and data required by the arbitrary data processing-capable device, and may also be used for temporarily storing data that has been output or is to be output.
Other embodiments of the present application will be apparent to those skilled in the art from consideration of the specification and practice of the disclosure disclosed herein. This application is intended to cover any variations, uses, or adaptations of the invention following, in general, the principles of the application and including such departures from the present disclosure as come within known or customary practice within the art to which the invention pertains. It is intended that the specification and examples be considered as exemplary only, with a true scope and spirit of the application being indicated by the following claims.
It will be understood that the present application is not limited to the precise arrangements described above and shown in the drawings and that various modifications and changes may be made without departing from the scope thereof. The scope of the application is limited only by the appended claims.

Claims (10)

1. A writing method of a super-resolution laser direct writing system based on a galvanometer is characterized by comprising the following steps:
acquiring data to be inscribed and a single scanning range of a galvanometer-based super-resolution laser direct writing system;
dividing the data to be inscribed into a plurality of sub-data according to the single scanning range;
rotating the subdata according to a global coordinate system to obtain rotating data;
acquiring the X polarity and the Y polarity of the galvanometer;
according to the X polarity and the Y polarity, the rotation data are overturned to obtain overturning data;
fitting the splicing coincidence region between the turning data to obtain the writing data;
according to the writing data, writing by using a super-resolution laser direct writing system based on a galvanometer;
the X polarity of the galvanometer indicates whether the X direction scanned by the galvanometer is opposite to the X direction of the global coordinate system, if so, the X polarity is 1, otherwise, the X polarity is 0; the Y polarity of the galvanometer indicates whether the Y direction scanned by the galvanometer is opposite to the Y direction of the global coordinate system, if so, the Y polarity is 1, otherwise, the Y polarity is 0.
2. The method of claim 1, wherein the sub-data is each smaller in size than the single scan range.
3. The method of claim 1, wherein rotating the sub-data according to a global coordinate system to obtain rotated data comprises:
calculating an included angle between the scanning direction of the galvanometer and the global coordinate system;
and rotating the subdata according to the included angle to obtain rotation data.
4. A method according to claim 3, wherein the absolute value of the included angle is less than 90 °.
5. The method of claim 1, wherein flipping the rotation data according to the X-polarity and Y-polarity comprises:
if the X polarity is 1, turning the rotation data left and right;
and if the Y polarity is 1, turning the rotation data up and down.
6. The method according to claim 1, wherein fitting the splicing overlap region between the flipped data to obtain the writing data comprises:
calculating the position information of a coincidence area between any two adjacent turning data to obtain all coordinate information of the coincidence area;
and according to the global coordinate system, carrying out coordinate conversion on the coordinate information to obtain the writing data.
7. The method of claim 1, wherein the writing sequence for writing using the galvanometer-based super-resolution laser direct writing system comprises X bi-directional, Y bi-directional, X serpentine, Y serpentine, X circumference, or Y circumference.
8. The utility model provides a super-resolution laser direct writing system's device of carving write which is characterized in that based on galvanometer includes:
the first acquisition module is used for acquiring data to be inscribed and a single scanning range of the galvanometer-based super-resolution laser direct writing system;
the dividing module is used for dividing the data to be inscribed into a plurality of sub-data according to the single scanning range;
the rotation module is used for rotating the subdata according to a global coordinate system to obtain rotation data;
the second acquisition module is used for acquiring the X polarity and the Y polarity of the galvanometer;
the overturning module is used for overturning the rotating data according to the X polarity and the Y polarity to obtain overturning data;
the fitting module is used for fitting the splicing superposition area between the turning data to obtain inscribing data;
the writing module is used for writing by utilizing a super-resolution laser direct writing system based on a galvanometer according to the writing data;
the X polarity of the galvanometer indicates whether the X direction scanned by the galvanometer is opposite to the X direction of the global coordinate system, if so, the X polarity is 1, otherwise, the X polarity is 0; the Y polarity of the galvanometer indicates whether the Y direction scanned by the galvanometer is opposite to the Y direction of the global coordinate system, if so, the Y polarity is 1, otherwise, the Y polarity is 0.
9. An electronic device, comprising:
one or more processors;
a memory for storing one or more programs;
the one or more programs, when executed by the one or more processors, cause the one or more processors to implement the method of any of claims 1-7.
10. A computer-readable storage medium having stored thereon computer instructions, which when executed by a processor, perform the steps of the method according to any one of claims 1-7.
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