CN114388659B - Etching equipment with fixed structure for PERC double-sided battery - Google Patents
Etching equipment with fixed structure for PERC double-sided battery Download PDFInfo
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- CN114388659B CN114388659B CN202210024853.3A CN202210024853A CN114388659B CN 114388659 B CN114388659 B CN 114388659B CN 202210024853 A CN202210024853 A CN 202210024853A CN 114388659 B CN114388659 B CN 114388659B
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- 238000005530 etching Methods 0.000 title claims abstract description 123
- 101001073212 Arabidopsis thaliana Peroxidase 33 Proteins 0.000 title claims abstract description 24
- 101001123325 Homo sapiens Peroxisome proliferator-activated receptor gamma coactivator 1-beta Proteins 0.000 title claims abstract description 24
- 102100028961 Peroxisome proliferator-activated receptor gamma coactivator 1-beta Human genes 0.000 title claims abstract description 24
- 239000000428 dust Substances 0.000 claims description 31
- 239000007921 spray Substances 0.000 claims description 19
- 239000007788 liquid Substances 0.000 claims description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 3
- 239000000741 silica gel Substances 0.000 claims description 3
- 229910002027 silica gel Inorganic materials 0.000 claims description 3
- 239000000126 substance Substances 0.000 description 20
- 239000002904 solvent Substances 0.000 description 14
- 239000013043 chemical agent Substances 0.000 description 6
- 238000005507 spraying Methods 0.000 description 4
- 125000004122 cyclic group Chemical group 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 230000008676 import Effects 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67075—Apparatus for fluid treatment for etching for wet etching
- H01L21/6708—Apparatus for fluid treatment for etching for wet etching using mainly spraying means, e.g. nozzles
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Abstract
The invention relates to the technical field of double-sided batteries, in particular to etching equipment for a PERC double-sided battery with a fixed structure. The etching shell comprises an etching shell, a sliding rail is arranged on the inner wall of the etching shell, a bottom plate is arranged on the inner wall of the etching shell in a sliding mode, a sliding block is arranged at the end portion of the bottom plate, two clamping grooves are formed in the top of the bottom plate in a sliding mode, a screw rod is arranged in the clamping grooves in a rotating mode, the outer wall of the screw rod is in threaded connection with the end portion of a clamping plate, a first gear is arranged on the inner layer of the bottom plate in a rotating mode, two bevel gears which are meshed vertically are arranged between the first gear and the end portion of the screw rod, a supporting plate is arranged on the center of the top of the bottom plate in a sliding mode, a first rack is arranged at the bottom of the supporting plate, the first rack is inserted into the inner layer of the bottom plate, and the outer wall of the first gear is connected with the outer wall of the first gear in a meshed mode. The invention not only can ensure that the clamping plate clamps the edge of the limiting etching plate better, but also can enable the etching plate with larger thickness to be inserted into the etching shell, and after etching, the hand can be conveniently lifted at the bottom of the etching plate, thereby being convenient to operate.
Description
Technical Field
The invention relates to the technical field of double-sided batteries, in particular to etching equipment for a PERC double-sided battery with a fixed structure.
Background
The PERC is a technology of a passivation emitter and a back battery, wherein the PERC double battery is widely used, the PERC double battery needs to be etched by etching equipment during production, an automatic chemical etching machine seen in the market at present forms a continuous uninterrupted feeding state through high-pressure spraying and linear movement of an etched plate of the double battery to corrode a workpiece so as to improve production efficiency, however, the etched plate cannot be limited and fixed during etching, so that a chemical solvent impacts the etched plate to easily deviate, the etching effect is affected, and after the etched plate of the double battery is placed and clamped, the etched plate can be limited and fixed, but the bottom of the etched plate is directly attached to a bottom plate, so that the hand of a worker is easily clamped by the etched plate and the bottom plate, and meanwhile, the worker is required to bend down and lift the etched plate.
Disclosure of Invention
The present invention is directed to an etching apparatus for a PERC double-sided battery having a fixed structure, which solves the problems set forth in the background art described above.
In order to achieve the above purpose, the invention provides etching equipment for PERC double-sided batteries with a fixed structure, which comprises an etching shell, wherein a solution tank is arranged at the top of the etching shell, a spray plate is communicated with the bottom of the solution tank, a plurality of spray heads are communicated with the bottom of the spray plate, and the end parts of the spray heads are communicated with the bottom of an inner cavity of the etching shell;
the inner wall of the etching shell is provided with a sliding rail, the inside of the etching shell is slidably provided with a bottom plate, the end part of the bottom plate is provided with a sliding block, the sliding block slides in the sliding rail, the top of the bottom plate is provided with two symmetrical clamping grooves, a screw rod is rotated in the clamping grooves, and the outer wall of the screw rod is in threaded connection with the end part of a clamping plate;
the bottom plate inlayer rotates and is equipped with first gear, first gear tip stretches out the bottom plate inlayer, and is connected with the carousel, first gear with be equipped with two perpendicular engaged conical gear between the lead screw tip, bottom plate top center department slides and is equipped with the backup pad, the backup pad bottom is equipped with first rack, first rack inserts the bottom plate inlayer, just first gear outer wall with first gear outer wall engagement is connected.
When the etching device is specifically used, an etched chemical agent is filled into the solution box, then the etching plate is placed at the top of the bottom plate, the screw rod drives the two clamping plates to gather inwards to clamp the limiting bottom plate, at the moment, the screw rod rotates, meanwhile, the first gear rotates, the first rack is driven to move downwards along the first rack, the supporting plate drives the etching plate to move downwards, the clamping plates can be guaranteed to better clamp the edge of the limiting etching plate, then the sliding block slides in the sliding rail, the bottom plate drives the etching plate to slide into the etching shell, meanwhile, the chemical agent is conveyed into the spraying plate through the water pump, the chemical solution is sprayed out by the plurality of spray heads into the etching shell to etch the etching plate, after etching is finished, the screw rod is rotated, the two clamping plates are outwards diffused, limiting fixation of the etching plate is relieved, at the moment, the screw rod rotates, meanwhile, the first gear is driven to move upwards along the first outer wall of the rack, the supporting plate drives the etching plate to move upwards, and the etching plate is conveniently removed.
As a further improvement of the technical scheme, the top of the sliding rail is provided with a limiting groove, the top of the sliding block is provided with a limiting block, and the limiting block slides in the limiting groove.
As a further improvement of the technical scheme, the bottom of the sliding block is rotatably provided with a roller, and the end part of the roller is connected with a motor output shaft.
As a further improvement of the technical scheme, the inner surface of the clamping plate is provided with a soft cushion, and the soft cushion is made of elastic silica gel.
As a further improvement of the technical scheme, the bottom of the etching shell is communicated with a liquid discharge bucket, and a collecting drawer is inserted into the outer wall of the liquid discharge bucket.
As a further improvement of the technical scheme, the end part of the bottom plate is rotationally connected with the sliding block, a rotating shaft is arranged at the end part of the bottom plate, and the rotating shaft rotates to penetrate through the sliding block.
As a further improvement of the technical scheme, a second rack is arranged on the inner wall of the sliding rail, a second gear is connected to the end portion, away from the bottom plate, of the rotating shaft, and the outer wall of the second gear is meshed with the second rack.
As a further improvement of the technical scheme, the outer wall of the clamping plate is provided with a dust collection shell, and the inner wall of the dust collection shell is provided with an inlet.
As a further improvement of the technical scheme, the bottom of the inner cavity of the dust collection shell is rotatably provided with a guide fan, and a box door is hinged at the opening of the outer wall of the dust collection shell.
As a further improvement of the technical scheme, a third rack is arranged on the side wall of the bottom plate, the end part of the induced fan rotates to extend out of the dust collection shell, a third gear is connected with the end part of the induced fan, and the outer wall of the third gear is meshed with the outer wall of the third rack.
Compared with the prior art, the invention has the beneficial effects that:
1. in this etching equipment for PERC double-sided battery with fixed knot constructs, before through the sculpture, two splint inwards gather together the spacing bottom plate of centre gripping, the backup pad drives etching plate downward movement, not only can ensure the spacing etching plate edge of better centre gripping of splint, and make the great etching plate of thickness also can insert inside the etching shell, after the sculpture, two splint outwards spread, the spacing fixed of etching plate is relieved, the backup pad drives etching plate upward movement, realize that etching plate bottom keeps away from the bottom plate, conveniently be located etching plate bottom and lift up, and the etching plate lifts up, do not need the staff to bow excessively to lift up, convenient operation.
2. In this etching equipment for PERC double-sided battery with fixed knot constructs, be "frustum" shell form through setting up the flowing back fill, can accelerate dropping of chemical solvent, avoid chemical solvent to store up inside the etching shell, chemical solvent can drop to the inside of collecting the steamer tray along flowing back fill inner wall, and convenient push-and-pull collects chemical solvent in the steamer tray, is convenient for follow-up cyclic utilization.
3. In this etching equipment for PERC double-sided battery with fixed knot constructs, when the slider drives the bottom plate and slides along the slide rail, makes second gear rotate along second rack outer wall to make the pivot drive the bottom plate and rotate, rotate when making things convenient for the sculpture, improve chemical solvent's contact homogeneity, improve etching quality.
4. In this etching equipment for PERC double-sided battery with fixed knot constructs, when splint left and right sides is slided, make third gear along third rack meshing rotate to make induced fan rotate, form the negative pressure, make external dust inhale the dust absorption shell inside more convenient from the import, conveniently absorb the clearance to the dust that the etching board surface was floated, avoid influencing follow-up etching.
Drawings
FIG. 1 is a schematic diagram showing the assembly of the whole structure of embodiment 1 of the present invention;
FIG. 2 is a sectional view showing the whole structure of embodiment 1 of the present invention;
FIG. 3 is a cross-sectional view of an etched shell structure according to embodiment 1 of the present invention;
FIG. 4 is a schematic view of a spray plate structure according to embodiment 1 of the present invention;
FIG. 5 is an exploded view of the bottom plate structure of embodiment 1 of the present invention;
FIG. 6 is a schematic view of a clamping plate according to embodiment 1 of the present invention;
FIG. 7 is a schematic view of a drain hopper according to embodiment 1 of the present invention;
FIG. 8 is an exploded view of a slider structure according to embodiment 1 of the present invention;
fig. 9 is a schematic diagram showing the assembly of a second gear and a second rack gear according to embodiment 2 of the present invention;
fig. 10 is an exploded view of the dust-absorbing housing of embodiment 3 of the present invention.
The meaning of each reference sign in the figure is:
1. etching the shell; 11. a slide rail; 110. a limit groove; 111. a second rack; 12. a solution tank; 13. spraying a plate; 130. a spray head; 14. a liquid discharge hopper; 15. a collection drawer;
2. a bottom plate; 21. a slide block; 210. a limiting block; 211. a roller; 212. a motor; 22. a clamping groove; 221. a screw rod; 222. a bevel gear; 223. a first gear; 224. a turntable; 23. a clamping plate; 230. a soft cushion; 24. a support plate; 240. a first rack; 25. a rotating shaft; 250. a second gear; 26. a dust collection shell; 260. a door; 261. a fan; 262. a third gear; 263. an inlet; 27. and a third rack.
Detailed Description
The following description of the embodiments of the present invention will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present invention, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
Example 1
Referring to fig. 1-8, the embodiment provides an etching apparatus for a PERC double-sided battery with a fixed structure, which comprises an etching shell 1, wherein a solution tank 12 is arranged at the top of the etching shell 1, a spray plate 13 is communicated with the bottom of the solution tank 12, a plurality of spray heads 130 are communicated with the bottom of the spray plate 13, the end parts of the spray heads 130 are communicated with the bottom of an inner cavity of the etching shell 1, an etching chemical agent is filled into the solution tank 12, the chemical agent is conveyed into the spray plate 13 through a water pump, the chemical solution is sprayed out of the spray heads 130 to enter the etching shell 1, then the etched plate of the double-sided battery passes through the etching shell 1, the chemical solution is sprayed into the etching plate to achieve the purpose of etching, and the structural integrity is ensured;
in order to collect the subsequent cyclic utilization of chemical solvent, etching shell 1 bottom intercommunication has the flowing back fill 14, and the flowing back fill 14 outer wall inserts and is equipped with and collects steamer tray 15, is "frustum" shell form through setting up the flowing back fill 14, can accelerate the dropping of chemical solvent, avoids chemical solvent to store up inside etching shell 1, and chemical solvent can drop to the inside of collecting steamer tray 15 along the flowing back fill 14 inner wall, and convenient push-and-pull collects steamer tray 15 and collects chemical solvent, the subsequent cyclic utilization of being convenient for.
The inner wall of the etching shell 1 is provided with a sliding rail 11, the inside of the etching shell 1 is slidably provided with a bottom plate 2, the end part of the bottom plate 2 is provided with a sliding block 21, the sliding block 21 slides in the sliding rail 11, the top of the bottom plate 2 is provided with two symmetrical clamping grooves 22, a screw rod 221 rotates in the clamping grooves 22, the outer wall of the screw rod 221 is in threaded connection with the end part of a clamping plate 23, a double-sided battery etched plate can be placed in the top of the bottom plate 2, the screw rod 221 rotates, the end part of the clamping plate 23 slides along the outer wall of the screw rod 221, the two clamping plates 23 are gathered inwards to clamp and fix the etched plate, so that the etched plate can be fixed, the sliding block 21 is prevented from being impacted and deflected by chemical solution, and then the sliding block 21 slides in the sliding rail 11, so that the bottom plate 2 drives the etched plate to slide into the etching shell 1 for etching;
in order to avoid offset derailment, the top of the sliding rail 11 is provided with a limiting groove 110, the top of the sliding block 21 is provided with a limiting block 210, the limiting block 210 slides in the limiting groove 110, and when the sliding block 21 moves along the sliding rail 11 to drive the bottom plate 2, the limiting block 210 slides in the limiting groove 110 to limit the sliding direction of the sliding block 21, so that offset derailment is avoided.
In order to improve the degree of automation, the bottom of the sliding block 21 is rotatably provided with a roller 211, the end part of the roller 211 is connected with an output shaft of a motor 212, the motor 212 is powered on to work, the output shaft of the motor 212 drives the roller 211 to rotate, the sliding block 21 rolls along the sliding rail 11 more conveniently, and the degree of automation is improved.
In order to improve the safety, the inner surface of the clamping plate 23 is provided with a soft cushion 230, the soft cushion 230 is made of elastic silica gel, the service life of elastic feet is long, and the elastic force of the soft cushion 230 can buffer the rigid impact of extrusion when the clamping plate 23 clamps the etching plate, so that the safety is improved.
The inner layer of the bottom plate 2 is rotationally provided with a first gear 223, the end part of the first gear 223 extends out of the inner layer of the bottom plate 2 and is connected with a rotary disc 224, two bevel gears 222 which are vertically meshed are arranged between the first gear 223 and the end part of a screw rod 221, the rotary disc 224 can be held to rotate to drive the first gear 223 to rotate, the two bevel gears 222 are meshed to rotate, the screw rod 221 is enabled to rotate more conveniently, a supporting plate 24 is slidably arranged at the center of the top of the bottom plate 2, a first rack 240 is arranged at the bottom of the supporting plate 24, the first rack 240 is inserted into the inner layer of the bottom plate 2, the outer wall of the first rack 240 is meshed with the outer wall of the first gear 223, and the etched plate is inconvenient to lift up in consideration of the follow-up after etching, so that in order to improve convenience, the following situations are included:
firstly, before etching, an etching plate is placed on the top of the bottom plate 2, so that the screw rod 221 drives the two clamping plates 23 to gather inwards to clamp the limiting bottom plate 2, at the moment, the screw rod 221 rotates and simultaneously the first gear 223 rotates to drive the first rack 240 to move downwards along the first gear 223, the supporting plate 24 drives the etching plate to move downwards, the edge of the limiting etching plate can be clamped better by the clamping plates 23, and the etching plate with larger thickness can be inserted into the etching shell 1;
and after the second scene and etching, the screw rod 221 is rotated to enable the two clamping plates 23 to spread outwards, limit fixation of the etching plate is relieved, at the moment, the screw rod 221 rotates and simultaneously the first gear 223 rotates to drive the first rack 240 to move upwards along the outer wall of the first gear 223, so that the supporting plate 24 drives the etching plate to move upwards, the bottom of the etching plate is far away from the bottom plate 2, the hand is conveniently located at the bottom of the etching plate to be lifted, the etching plate is lifted, and the staff is not required to bend to be lifted, so that the operation is convenient.
When the etching device is specifically used, an etching chemical agent is filled into the solution tank 12, then the etching plate is placed on the top of the bottom plate 2, the lead screw 221 drives the two clamping plates 23 to gather inwards to clamp the limiting bottom plate 2, at the moment, the lead screw 221 rotates, the first gear 223 rotates, the first rack 240 moves downwards along the first gear 223, the supporting plate 24 drives the etching plate to move downwards, the edge of the clamping plates 23 can be better clamped, the sliding block 21 slides in the sliding rail 11, the bottom plate 2 drives the etching plate to slide into the etching shell 1, the chemical agent is conveyed into the spraying plate 13 through the water pump, the chemical solution is sprayed out by the plurality of spray heads 130 into the etching shell 1, the etching plate is etched, after etching is finished, the lead screw 221 is rotated, the two clamping plates 23 are outwards diffused, limiting fixation of the etching plate is relieved, at the moment, the first gear 223 rotates, the first rack 240 moves upwards along the outer wall of the first gear 223, the supporting plate 24 drives the etching plate to move upwards, and the etching plate is convenient to take off the etching plate.
Example 2
Considering that the bottom plate 2 drives the etching plate to spray and etch from the end of the nozzle 130, the chemical solution cannot uniformly contact the etching plate, resulting in poor etching effect, so in order to improve etching quality, the difference between this embodiment and embodiment 1 is that, please refer to fig. 9, wherein:
the bottom plate 2 tip is connected with the rotation between the slider 21, and the bottom plate 2 tip is equipped with pivot 25, and pivot 25 rotates and passes slider 21, can make bottom plate 2 drive the etching plate and rotate when carrying out the sculpture, and pivot 25 rotates inside slider 21, rotates when convenient sculpture, improves the contact homogeneity of chemical solvent, improves the etching quality.
In order to rotate more uniform contact chemical solvent, the inner wall of the sliding rail 11 is provided with a second rack 111, the end part of the rotating shaft 25, far away from the bottom plate 2, is connected with a second gear 250, the outer wall of the second gear 250 is meshed with the second rack 111, and when the sliding block 21 drives the bottom plate 2 to slide along the sliding rail 11, the second gear 250 can rotate along the outer wall of the second rack 111, so that the rotating shaft 25 drives the bottom plate 2 to rotate, and more uniform contact chemical solvent can be conveniently rotated during sliding etching.
Example 3
Considering that dust floats on the surface of the etched plate produced by the double-sided battery, the dust affects the etching effect, so in order to clean the dust conveniently, this embodiment is different from embodiment 1, please refer to fig. 10, wherein:
the outer wall of the clamping plate 23 is provided with the dust collection shell 26, and the inner wall of the dust collection shell 26 is provided with the inlet 263, so that dust on the surface of the etching plate can be sucked into the dust collection shell 26 from the inlet 263, and the dust floating on the surface of the etching plate can be conveniently absorbed and cleaned, so that the influence on subsequent etching is avoided.
Wherein, the bottom of the inner cavity of the dust collection shell 26 is rotatably provided with a fan 261, and the opening of the outer wall of the dust collection shell 26 is hinged with a box door 260, so that negative pressure can be formed by the rotation of the fan 261, and external dust is sucked into the dust collection shell 26 from an inlet 263 more conveniently, so that the dust is collected in the dust collection shell 26, and the box door 260 can be opened for cleaning subsequently, thereby ensuring the structural integrity.
In order to make the rotation of the induced fan 261 more convenient for dust collection, the side wall of the bottom plate 2 is provided with a third rack 27, the end part of the induced fan 261 rotates to extend out of the dust collection shell 26, and is connected with a third gear 262, the outer wall of the third gear 262 is meshed with the outer wall of the third rack 27, and when the clamping plate 23 slides left and right, the third gear 262 can rotate along the third rack 27 in a meshed manner, so that the induced fan 261 rotates more conveniently for dust collection, and the structure is more compact.
The foregoing has shown and described the basic principles, principal features and advantages of the invention. It will be understood by those skilled in the art that the present invention is not limited to the above-described embodiments, and that the above-described embodiments and descriptions are only preferred embodiments of the present invention, and are not intended to limit the invention, and that various changes and modifications may be made therein without departing from the spirit and scope of the invention as claimed. The scope of the invention is defined by the appended claims and equivalents thereof.
Claims (10)
1. Etching equipment for PERC double-sided battery with fixed structure, including etching shell (1), its characterized in that: the top of the etching shell (1) is provided with a solution tank (12), the bottom of the solution tank (12) is communicated with a spray plate (13), the bottom of the spray plate (13) is communicated with a plurality of spray heads (130), and the end parts of the spray heads (130) are communicated with the bottom of an inner cavity of the etching shell (1);
the inner wall of the etching shell (1) is provided with a sliding rail (11), the inside of the etching shell (1) is slidably provided with a bottom plate (2), the end part of the bottom plate (2) is provided with a sliding block (21), the sliding block (21) slides in the sliding rail (11), the top of the bottom plate (2) is provided with two symmetrical clamping grooves (22), a screw rod (221) rotates in the clamping grooves (22), and the outer wall of the screw rod (221) is in threaded connection with the end part of a clamping plate (23);
the utility model discloses a bottom plate (2) inlayer rotates and is equipped with first gear (223), first gear (223) tip stretches out bottom plate (2) inlayer, and is connected with carousel (224), first gear (223) with be equipped with two perpendicular meshing's conical gear (222) between lead screw (221) tip, bottom plate (2) top center department slides and is equipped with backup pad (24), backup pad (24) bottom is equipped with first rack (240), first rack (240) are inserted bottom plate (2) inlayer, just first rack (240) outer wall with first gear (223) outer wall meshing is connected.
2. The etching apparatus for a PERC double-sided battery having a fixed structure according to claim 1, wherein: limiting grooves (110) are formed in the tops of the sliding rails (11), limiting blocks (210) are arranged on the tops of the sliding blocks (21), and the limiting blocks (210) slide inside the limiting grooves (110).
3. The etching apparatus for a PERC double-sided battery having a fixed structure according to claim 1, wherein: the bottom of the sliding block (21) is rotatably provided with a roller (211), and the end part of the roller (211) is connected with an output shaft of a motor (212).
4. The etching apparatus for a PERC double-sided battery having a fixed structure according to claim 1, wherein: the inner surface of the clamping plate (23) is provided with a soft cushion (230), and the soft cushion (230) is made of elastic silica gel.
5. The etching apparatus for a PERC double-sided battery having a fixed structure according to claim 1, wherein: the bottom of the etching shell (1) is communicated with a liquid discharge hopper (14), and a collecting drawer (15) is inserted into the outer wall of the liquid discharge hopper (14).
6. The etching apparatus for a PERC double-sided battery having a fixed structure according to claim 1, wherein: the end part of the bottom plate (2) is rotationally connected with the sliding block (21), a rotating shaft (25) is arranged at the end part of the bottom plate (2), and the rotating shaft (25) rotates to penetrate through the sliding block (21).
7. The etching apparatus for a PERC double-sided battery having a fixed structure according to claim 6, wherein: the inner wall of the sliding rail (11) is provided with a second rack (111), the end part of the rotating shaft (25) away from the bottom plate (2) is connected with a second gear (250), and the outer wall of the second gear (250) is meshed with the second rack (111).
8. The etching apparatus for a PERC double-sided battery having a fixed structure according to claim 1, wherein: the outer wall of the clamping plate (23) is provided with a dust collection shell (26), and the inner wall of the dust collection shell (26) is provided with an inlet (263).
9. The etching apparatus for a PERC double-sided battery having a fixed structure according to claim 8, wherein: the bottom of the inner cavity of the dust collection shell (26) is rotatably provided with a guiding fan (261), and a box door (260) is hinged at an opening of the outer wall of the dust collection shell (26).
10. The etching apparatus for a PERC double-sided battery having a fixed structure according to claim 9, wherein: the side wall of the bottom plate (2) is provided with a third rack (27), the end part of the induced fan (261) rotates to extend out of the dust collection shell (26), a third gear (262) is connected with the end part of the induced fan, and the outer wall of the third gear (262) is meshed with the outer wall of the third rack (27).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210024853.3A CN114388659B (en) | 2022-01-11 | 2022-01-11 | Etching equipment with fixed structure for PERC double-sided battery |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210024853.3A CN114388659B (en) | 2022-01-11 | 2022-01-11 | Etching equipment with fixed structure for PERC double-sided battery |
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| Publication Number | Publication Date |
|---|---|
| CN114388659A CN114388659A (en) | 2022-04-22 |
| CN114388659B true CN114388659B (en) | 2023-09-15 |
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| CN202210024853.3A Active CN114388659B (en) | 2022-01-11 | 2022-01-11 | Etching equipment with fixed structure for PERC double-sided battery |
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| CN112490107A (en) * | 2021-01-14 | 2021-03-12 | 北京瓢虫星球信息技术有限公司 | Plasma etching machine and etching method thereof |
| CN212750816U (en) * | 2020-08-03 | 2021-03-19 | 江苏晶旺新能源科技有限公司 | Etching machine is used in production of PERC battery piece |
| CN212946044U (en) * | 2020-05-17 | 2021-04-13 | 许计文 | PERC battery laser marking device |
| CN213546345U (en) * | 2020-12-28 | 2021-06-25 | 平顶山中昱能源有限公司 | Etching blanking table for production of crystalline silicon solar cell panel |
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2022
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5536388A (en) * | 1995-06-02 | 1996-07-16 | International Business Machines Corporation | Vertical electroetch tool nozzle and method |
| EP2113935A2 (en) * | 2008-05-01 | 2009-11-04 | Wakom Semiconductor Corporation | Soaking device with single surface etching capability |
| CN212946044U (en) * | 2020-05-17 | 2021-04-13 | 许计文 | PERC battery laser marking device |
| CN212750816U (en) * | 2020-08-03 | 2021-03-19 | 江苏晶旺新能源科技有限公司 | Etching machine is used in production of PERC battery piece |
| CN213546345U (en) * | 2020-12-28 | 2021-06-25 | 平顶山中昱能源有限公司 | Etching blanking table for production of crystalline silicon solar cell panel |
| CN112490107A (en) * | 2021-01-14 | 2021-03-12 | 北京瓢虫星球信息技术有限公司 | Plasma etching machine and etching method thereof |
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|---|---|
| CN114388659A (en) | 2022-04-22 |
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