CN114388659A - PERC double-sided battery etching equipment with fixing structure - Google Patents
PERC double-sided battery etching equipment with fixing structure Download PDFInfo
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- CN114388659A CN114388659A CN202210024853.3A CN202210024853A CN114388659A CN 114388659 A CN114388659 A CN 114388659A CN 202210024853 A CN202210024853 A CN 202210024853A CN 114388659 A CN114388659 A CN 114388659A
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- 238000005530 etching Methods 0.000 title claims abstract description 101
- 101001073212 Arabidopsis thaliana Peroxidase 33 Proteins 0.000 title claims abstract description 25
- 101001123325 Homo sapiens Peroxisome proliferator-activated receptor gamma coactivator 1-beta Proteins 0.000 title claims abstract description 25
- 102100028961 Peroxisome proliferator-activated receptor gamma coactivator 1-beta Human genes 0.000 title claims abstract description 25
- 239000000428 dust Substances 0.000 claims description 31
- 239000007921 spray Substances 0.000 claims description 11
- 239000007788 liquid Substances 0.000 claims description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 3
- 239000000741 silica gel Substances 0.000 claims description 3
- 229910002027 silica gel Inorganic materials 0.000 claims description 3
- 239000000463 material Substances 0.000 claims 1
- 239000000126 substance Substances 0.000 description 22
- 239000002904 solvent Substances 0.000 description 14
- 238000005507 spraying Methods 0.000 description 7
- 238000010521 absorption reaction Methods 0.000 description 5
- 239000013043 chemical agent Substances 0.000 description 4
- 125000004122 cyclic group Chemical group 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 230000008676 import Effects 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67075—Apparatus for fluid treatment for etching for wet etching
- H01L21/6708—Apparatus for fluid treatment for etching for wet etching using mainly spraying means, e.g. nozzles
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Electromagnetism (AREA)
- ing And Chemical Polishing (AREA)
Abstract
The invention relates to the technical field of double-sided batteries, in particular to etching equipment with a fixed structure for a PERC double-sided battery. It includes the sculpture shell, sculpture shell inner wall is equipped with the slide rail, the inside slip of sculpture shell is equipped with the bottom plate, the bottom plate tip is equipped with the slider, the slider slides inside the slide rail, two double-layered grooves have been seted up at the bottom plate top, it has the lead screw to press from both sides the inslot portion and rotate, lead screw outer wall threaded connection has the splint tip, the bottom plate inlayer rotates and is equipped with first gear, be equipped with two perpendicular meshed bevel gear between first gear and the lead screw tip, bottom plate top center department slides and is equipped with the backup pad, the backup pad bottom is equipped with first rack, first rack inserts the bottom plate inlayer, and first gear outer wall is connected with the meshing of first gear outer wall. The invention can ensure that the clamping plate can better clamp and limit the edge of the etching plate, and the etching plate with larger thickness can also be inserted into the etching shell, so that the bottom of the etching plate can be conveniently lifted by a hand after etching, and the operation is convenient.
Description
Technical Field
The invention relates to the technical field of double-sided batteries, in particular to etching equipment with a fixed structure for a PERC double-sided battery.
Background
PERC is a passivation emitter and back cell technology, wherein PERC double-sided cells are widely used, and the PERC double-sided cells need to be etched by means of etching equipment during production, the automatic chemical etching machine in the market forms a continuous and uninterrupted feeding state through high-pressure spraying and linear motion of an etched plate of a double-sided battery to corrode a workpiece so as to improve the production efficiency, but the etching plate cannot be limited and fixed during etching, so that a chemical solvent impacts the etching plate to be easy to deviate and influence the etching effect, and after the etched plate of the double-sided battery is placed and clamped, although the limit fixing can be carried out, the bottom of the etching plate is directly attached to the bottom plate, which is inconvenient for subsequent lifting, so that the hands of workers are easy to be clamped by the etching plate and the bottom plate, meanwhile, the worker needs to bend over and lift up, and the labor intensity is high, so that the etching equipment for the PERC double-sided battery with the fixed structure is provided.
Disclosure of Invention
The present invention is directed to an etching apparatus for a PERC double-sided battery having a fixing structure to solve the above problems of the background art.
In order to achieve the purpose, the invention provides etching equipment with a fixed structure for a PERC double-sided battery, which comprises an etching shell, wherein a solution tank is arranged at the top of the etching shell, the bottom of the solution tank is communicated with a spray plate, the bottom of the spray plate is communicated with a plurality of spray heads, and the end parts of the spray heads are communicated with the bottom of an inner cavity of the etching shell;
the inner wall of the etching shell is provided with a slide rail, a bottom plate is arranged in the etching shell in a sliding mode, the end portion of the bottom plate is provided with a slide block, the slide block slides in the slide rail, the top of the bottom plate is provided with two symmetrical clamping grooves, a screw rod rotates in the clamping grooves, and the outer wall of the screw rod is in threaded connection with the end portion of a clamping plate;
the bottom plate inlayer rotates and is equipped with first gear, first gear tip stretches out the bottom plate inlayer, and be connected with the carousel, first gear with be equipped with two perpendicular meshed bevel gears between the lead screw tip, bottom plate top center department slides and is equipped with the backup pad, the backup pad bottom is equipped with first rack, first rack inserts the bottom plate inlayer, just first gear outer wall with first gear outer wall meshing is connected.
When the etching device is used specifically, an etching chemical agent is filled in a solution box, then an etching plate is placed on the top of a bottom plate, a screw rod drives two clamping plates to gather inwards to clamp a limiting bottom plate, the screw rod rotates and a first gear rotates to drive a first rack to move downwards along the first rack, a support plate drives the etching plate to move downwards, the clamping plates can be ensured to better clamp the edge of the limiting etching plate, then a sliding block slides in a sliding rail, the bottom plate drives the etching plate to slide into an etching shell, the chemical agent is conveyed into a spraying plate through a water pump, chemical solution is sprayed out of a plurality of nozzles to enter the etching shell to etch the etching plate, after etching is finished, the screw rod is rotated to diffuse the two clamping plates outwards to remove the limiting fixation of the etching plate, the screw rod rotates and the first gear rotates to drive the first gear to move upwards along the outer wall of the first rack, the support plate drives the etching plate to move upwards, so that the etching plate is convenient to take down.
As a further improvement of the technical scheme, a limiting groove is formed in the top of the sliding rail, a limiting block is arranged at the top of the sliding block, and the limiting block slides in the limiting groove.
As a further improvement of the technical scheme, the bottom of the sliding block is rotatably provided with a roller, and the end part of the roller is connected with a motor output shaft.
As a further improvement of the technical scheme, the inner surface of the clamping plate is provided with a soft cushion which is made of elastic silica gel.
As a further improvement of the technical scheme, the bottom of the etching shell is communicated with a liquid discharge hopper, and a collection drawer is inserted into the outer wall of the liquid discharge hopper.
As a further improvement of the technical scheme, the end part of the bottom plate is rotatably connected with the sliding block, a rotating shaft is arranged at the end part of the bottom plate, and the rotating shaft rotatably penetrates through the sliding block.
As a further improvement of the technical scheme, the inner wall of the sliding rail is provided with a second rack, the end part of the rotating shaft, which is far away from the bottom plate, is connected with a second gear, and the outer wall of the second gear is meshed with the second rack.
As a further improvement of the technical scheme, the outer wall of the clamping plate is provided with a dust collection shell, and the inner wall of the dust collection shell is provided with an inlet.
As a further improvement of the technical scheme, the bottom of the inner cavity of the dust collection shell is rotatably provided with a draught fan, and the opening of the outer wall of the dust collection shell is hinged with a box door.
As a further improvement of the technical scheme, the side wall of the bottom plate is provided with a third rack, the end part of the induced fan rotates and extends out of the interior of the dust collection shell and is connected with a third gear, and the outer wall of the third gear is meshed and connected with the outer wall of the third rack.
Compared with the prior art, the invention has the beneficial effects that:
1. this among two-sided battery etching equipment of PERC with fixed knot constructs, before through the sculpture, the spacing bottom plate of centre gripping is inwards gathered together to two splint, the backup pad drives sculpture board downstream, not only can ensure the spacing sculpture flange edge of the better centre gripping of splint, and make inside the great sculpture board of thickness also can insert the sculpture shell, after the sculpture, two splint outdiffusion, the spacing of relieving the sculpture board is fixed, the backup pad drives sculpture board upstream, realize that the sculpture board bottom keeps away from the bottom plate, conveniently lie in the sculpture board bottom with the hand and lift up, and the sculpture board lifts up, do not need the staff excessively to bow and lift up, and convenient for operation.
2. In this PERC double-sided battery etching equipment with fixed knot constructs, be "frustum" shell through setting up the flowing back fill, can accelerate dropping of chemical solvent, avoid chemical solvent to store up inside the sculpture shell, chemical solvent can drop to inside collecting the steamer tray along the flowing back fill inner wall, and the chemical solvent is collected to convenient push-and-pull collection steamer tray, the follow-up cyclic utilization of being convenient for.
3. In this two-sided battery etching equipment of PERC with fixed knot constructs, when the slider drove the bottom plate and slides along the slide rail, make the second gear rotate along second rack outer wall to make the pivot drive the bottom plate and rotate, rotate when making things convenient for the sculpture, improve chemical solvent's contact homogeneity, improve the sculpture quality.
4. In this two-sided battery of PERC etching equipment with fixed knot constructs, when splint horizontal slip, make the third gear rotate along the meshing of third rack to make the induced air fan rotate, form the negative pressure, make external dust inhale the dust absorption shell from the import inside more convenient, the clearance is absorbed to the levitate dust in convenient etching plate surface, avoids influencing follow-up sculpture.
Drawings
FIG. 1 is an assembly view showing the overall structure of embodiment 1 of the present invention;
FIG. 2 is a sectional view of the whole structure of example 1 of the present invention;
FIG. 3 is a cut-away view of an etched shell structure according to example 1 of the present invention;
FIG. 4 is a schematic diagram of a nozzle plate structure according to embodiment 1 of the present invention;
FIG. 5 is an exploded view of the bottom plate structure of embodiment 1 of the present invention;
FIG. 6 is a schematic view of a structure of a splint according to embodiment 1 of the present invention;
FIG. 7 is a schematic view showing the structure of a drain funnel according to embodiment 1 of the present invention;
FIG. 8 is an exploded view of a slider structure according to embodiment 1 of the present invention;
FIG. 9 is an assembly view of a second gear and a second rack structure according to embodiment 2 of the present invention;
fig. 10 is an exploded view of a dust collection case according to embodiment 3 of the present invention.
The various reference numbers in the figures mean:
1. etching the shell; 11. a slide rail; 110. a limiting groove; 111. a second rack; 12. a solution tank; 13. spraying a plate; 130. a spray head; 14. a liquid discharge hopper; 15. a collection drawer;
2. a base plate; 21. a slider; 210. a limiting block; 211. a roller; 212. a motor; 22. a clamping groove; 221. a screw rod; 222. a bevel gear; 223. a first gear; 224. a turntable; 23. a splint; 230. a soft cushion; 24. a support plate; 240. a first rack; 25. a rotating shaft; 250. a second gear; 26. a dust collection shell; 260. a box door; 261. a fan guide; 262. a third gear; 263. an inlet; 27. and a third rack.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Example 1
Referring to fig. 1 to 8, the embodiment provides an etching apparatus for a PERC double-sided battery with a fixed structure, including an etching shell 1, a solution tank 12 is disposed at the top of the etching shell 1, a spraying plate 13 is communicated with the bottom of the solution tank 12, a plurality of nozzles 130 are communicated with the bottom of the spraying plate 13, the end of the nozzle 130 is communicated with the bottom of the inner cavity of the etching shell 1, an etching chemical is filled in the solution tank 12, the chemical is pumped into the spraying plate 13 by a water pump, the chemical is sprayed from the plurality of nozzles 130 into the etching shell 1, and then the etched plate of the double-sided battery passes through the etching shell 1, so that the chemical is sprayed inside the etching plate to achieve the purpose of etching, and ensure the structural integrity;
in order to collect the follow-up cyclic utilization of chemical solvent, 1 bottom intercommunication of sculpture shell has drain hopper 14, 14 outer walls of drain hopper are inserted and are equipped with collection steamer tray 15, be "frustum" shell through setting up drain hopper 14, can accelerate dropping of chemical solvent, avoid chemical solvent to store up in 1 inside the sculpture shell, chemical solvent can drop to collecting steamer tray 15 inside along 14 inner walls of drain hopper, convenient push-and-pull collection steamer tray 15 collects chemical solvent, the follow-up cyclic utilization of being convenient for.
The inner wall of the etching shell 1 is provided with a sliding rail 11, a bottom plate 2 is arranged in the etching shell 1 in a sliding mode, the end portion of the bottom plate 2 is provided with a sliding block 21, the sliding block 21 slides in the sliding rail 11, the top of the bottom plate 2 is provided with two symmetrical clamping grooves 22, a screw rod 221 is arranged in each clamping groove 22 in a rotating mode, the outer wall of each screw rod 221 is in threaded connection with the end portion of a clamping plate 23, a double-sided battery etched plate can be placed at the top of the bottom plate 2, the screw rod 221 rotates, the end portions of the clamping plates 23 slide along the outer wall of the screw rod 221 in a threaded mode, the two clamping plates 23 are gathered inwards to clamp and fix the etched plate, the etched plate can be fixed, the etched plate is prevented from being impacted and deviated by chemical solution, then the sliding block 21 slides in the sliding rail 11, and the bottom plate 2 drives the etched plate to slide into the etching shell 1 to be etched;
in order to avoid the deviation and the derailment, the top of the slide rail 11 is provided with a limiting groove 110, the top of the slide block 21 is provided with a limiting block 210, the limiting block 210 slides inside the limiting groove 110, and when the slide block 21 drives the bottom plate 2 to move along the inside of the slide rail 11, the limiting block 210 slides inside the limiting groove 110 to limit the sliding direction of the slide block 21, so that the deviation and the derailment are avoided.
In order to improve the degree of automation, the bottom of the sliding block 21 is rotatably provided with a roller 211, the end part of the roller 211 is connected with an output shaft of a motor 212, the motor 212 is powered on to work, the output shaft of the motor 212 drives the roller 211 to rotate, the sliding block 21 rolls along the sliding rail 11 more conveniently, and the degree of automation is improved.
In order to improve the safety, the soft cushion 230 is arranged on the inner surface of the clamping plate 23, the soft cushion 230 is made of elastic silica gel, the elastic force is long in service life, and when the etching plate is clamped by the clamping plate 23, the rigid impact of extrusion can be buffered under the elastic force of the soft cushion 230, so that the safety is improved.
in the first scenario, before etching, an etching plate is placed on the top of a bottom plate 2, so that a screw rod 221 drives two clamping plates 23 to gather together inwards to clamp the limiting bottom plate 2, at the same time, the screw rod 221 rotates and a first gear 223 rotates to drive a first rack 240 to move downwards along the first gear 223, so that a support plate 24 drives the etching plate to move downwards, the clamping plates 23 can be ensured to better clamp the edge of the limiting etching plate, and the etching plate with larger thickness can also be inserted into an etching shell 1;
scene two, the sculpture back, rotate lead screw 221, make two splint 23 outdiffusion, remove the spacing fixed of sculpture board, lead screw 221 rotates first gear 223 rotation simultaneously this moment, drive first rack 240 along first gear 223 outer wall upward movement, make backup pad 24 drive the sculpture board upward movement, realize that the bottom plate 2 is kept away from to the sculpture board bottom, conveniently lie in the sculpture board bottom with the hand and lift up, and the sculpture board lifts up, do not need the staff excessively to bow and lift up, convenient operation.
When the etching device is used specifically, an etched chemical agent is filled in the solution tank 12, then an etching plate is placed on the top of the bottom plate 2, the lead screw 221 drives the two clamping plates 23 to gather inwards to clamp the limiting bottom plate 2, at the same time, the lead screw 221 rotates and the first gear 223 rotates to drive the first rack 240 to move downwards along the first gear 223, the support plate 24 drives the etching plate to move downwards, the edge of the limiting etching plate can be better clamped by the clamping plates 23, then the slide block 21 slides in the slide rail 11, the bottom plate 2 drives the etching plate to slide into the etching shell 1, meanwhile, the chemical agent is conveyed into the spraying plate 13 through the water pump, the chemical solution is sprayed into the etching shell 1 by the plurality of spray heads 130 to etch the etching plate, after etching is finished, the lead screw 221 is rotated to enable the two clamping plates 23 to diffuse outwards to remove the limiting fixation of the etching plate, at the same time, the lead screw 221 rotates and the first gear 223 rotates, the first rack 240 is driven to move upwards along the outer wall of the first gear 223, so that the support plate 24 drives the etching plate to move upwards, and the etching plate is convenient to take down.
Example 2
Considering that the bottom plate 2 drives the etching plate to perform spray etching from the end of the nozzle 130, so that the chemical solution cannot uniformly contact the etching plate, resulting in poor etching effect, in order to improve the etching quality, the embodiment is different from embodiment 1 in that please refer to fig. 9, in which:
rotate between 2 tip of bottom plate and the slider 21 and be connected, 2 tip of bottom plate are equipped with pivot 25, and pivot 25 rotates and passes slider 21, can make bottom plate 2 drive the sculpture board and rotate when carrying out the sculpture, and pivot 25 rotates inside slider 21, rotates when making things convenient for the sculpture, improves chemical solvent's contact homogeneity, improves the sculpture quality.
In order to rotate more even contact chemical solvent, the inner wall of the sliding rail 11 is provided with the second rack 111, the end part of the rotating shaft 25 far away from the bottom plate 2 is connected with the second gear 250, the outer wall of the second gear 250 is meshed with the second rack 111, when the sliding block 21 drives the bottom plate 2 to slide along the sliding rail 11, the second gear 250 rotates along the outer wall of the second rack 111, so that the rotating shaft 25 drives the bottom plate 2 to rotate, and when the sliding etching is carried out conveniently, more even contact chemical solvent can be rotated.
Example 3
Considering that dust floats on the surface of an etched plate in the production of a double-sided battery and affects the etching effect, the present embodiment is different from embodiment 1 in that, in order to clean the dust, please refer to fig. 10, in which:
the outer wall of the clamping plate 23 is provided with the dust collection shell 26, the inner wall of the dust collection shell 26 is provided with the inlet 263, so that dust on the surface of the etching plate can be sucked into the dust collection shell 26 from the inlet 263, the dust floating on the surface of the etching plate can be conveniently absorbed and cleaned, and the subsequent etching is prevented from being influenced.
Wherein, the rotation of dust absorption shell 26 inner chamber bottom is equipped with induced fan 261, and dust absorption shell 26 outer wall opening part articulates there is chamber door 260, can rotate by induced fan 261 and form the negative pressure, and it is more convenient to make external dust inhale dust absorption shell 26 from import 263 inside, makes the dust gathering inside dust absorption shell 26, and follow-up can open chamber door 260 and clear up, guarantees structural integrity.
In order to make the induced fan 261 rotate to suck dust more conveniently, the side wall of the bottom plate 2 is provided with the third rack 27, the end part of the induced fan 261 rotates to extend out of the dust suction shell 26 and is connected with the third gear 262, the outer wall of the third gear 262 is meshed with the outer wall of the third rack 27, and when the clamping plate 23 slides left and right, the third gear 262 rotates along the third rack 27 in a meshed mode, so that the induced fan 261 rotates to suck dust more conveniently, and the structure is more compact.
The foregoing shows and describes the general principles, essential features, and advantages of the invention. It will be understood by those skilled in the art that the present invention is not limited to the embodiments described above, and the preferred embodiments of the present invention are described in the above embodiments and the description, and are not intended to limit the present invention. The scope of the invention is defined by the appended claims and equivalents thereof.
Claims (10)
1. An etching apparatus for PERC double-sided battery having a fixing structure, comprising an etching case (1), characterized in that: a solution tank (12) is arranged at the top of the etching shell (1), the bottom of the solution tank (12) is communicated with a spray plate (13), the bottom of the spray plate (13) is communicated with a plurality of spray heads (130), and the end parts of the spray heads (130) are communicated with the bottom of an inner cavity of the etching shell (1);
the inner wall of the etching shell (1) is provided with a sliding rail (11), a bottom plate (2) is arranged in the etching shell (1) in a sliding mode, a sliding block (21) is arranged at the end portion of the bottom plate (2), the sliding block (21) slides in the sliding rail (11), the top of the bottom plate (2) is provided with two symmetrical clamping grooves (22), a screw rod (221) rotates in the clamping groove (22), and the outer wall of the screw rod (221) is in threaded connection with the end portion of a clamping plate (23);
bottom plate (2) inlayer rotates and is equipped with first gear (223), first gear (223) tip stretches out bottom plate (2) inlayer, and is connected with carousel (224), first gear (223) with be equipped with two perpendicular meshing's conical gear (222) between lead screw (221) the tip, bottom plate (2) top center department slides and is equipped with backup pad (24), backup pad (24) bottom is equipped with first rack (240), first rack (240) insert bottom plate (2) inlayer, just first rack (240) outer wall with first gear (223) outer wall meshing is connected.
2. The etching apparatus for a PERC double sided battery with a fixing structure according to claim 1, wherein: the top of the sliding rail (11) is provided with a limiting groove (110), the top of the sliding block (21) is provided with a limiting block (210), and the limiting block (210) slides in the limiting groove (110).
3. The etching apparatus for a PERC double sided battery with a fixing structure according to claim 1, wherein: the bottom of the sliding block (21) is rotatably provided with a roller (211), and the end part of the roller (211) is connected with an output shaft of a motor (212).
4. The etching apparatus for a PERC double sided battery with a fixing structure according to claim 1, wherein: splint (23) internal surface is equipped with cushion (230), cushion (230) adopt the elasticity silica gel material.
5. The etching apparatus for a PERC double sided battery with a fixing structure according to claim 1, wherein: the bottom of the etching shell (1) is communicated with a liquid discharge hopper (14), and a collection drawer (15) is inserted into the outer wall of the liquid discharge hopper (14).
6. The etching apparatus for a PERC double sided battery with a fixing structure according to claim 1, wherein: the end part of the bottom plate (2) is rotatably connected with the sliding block (21), the end part of the bottom plate (2) is provided with a rotating shaft (25), and the rotating shaft (25) rotates to penetrate through the sliding block (21).
7. The etching apparatus for a PERC double sided battery with a fixing structure according to claim 6, wherein: the inner wall of the sliding rail (11) is provided with a second rack (111), the end part, far away from the bottom plate (2), of the rotating shaft (25) is connected with a second gear (250), and the outer wall of the second gear (250) is meshed with the second rack (111).
8. The etching apparatus for a PERC double sided battery with a fixing structure according to claim 1, wherein: the outer wall of the clamping plate (23) is provided with a dust collection shell (26), and the inner wall of the dust collection shell (26) is provided with an inlet (263).
9. The etching apparatus for a PERC double sided battery with a fixing structure according to claim 8, wherein: the bottom of the inner cavity of the dust collection shell (26) is rotatably provided with a fan (261), and an opening of the outer wall of the dust collection shell (26) is hinged with a box door (260).
10. The etching apparatus for a PERC double sided battery with a fixing structure according to claim 9, wherein: the side wall of the bottom plate (2) is provided with a third rack (27), the end part of the induced fan (261) rotates and extends out of the interior of the dust collection shell (26), and is connected with a third gear (262), and the outer wall of the third gear (262) is meshed and connected with the outer wall of the third rack (27).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210024853.3A CN114388659B (en) | 2022-01-11 | 2022-01-11 | Etching equipment with fixed structure for PERC double-sided battery |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210024853.3A CN114388659B (en) | 2022-01-11 | 2022-01-11 | Etching equipment with fixed structure for PERC double-sided battery |
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| Publication Number | Publication Date |
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| CN114388659A true CN114388659A (en) | 2022-04-22 |
| CN114388659B CN114388659B (en) | 2023-09-15 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202210024853.3A Active CN114388659B (en) | 2022-01-11 | 2022-01-11 | Etching equipment with fixed structure for PERC double-sided battery |
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| CN112490107A (en) * | 2021-01-14 | 2021-03-12 | 北京瓢虫星球信息技术有限公司 | Plasma etching machine and etching method thereof |
| CN212750816U (en) * | 2020-08-03 | 2021-03-19 | 江苏晶旺新能源科技有限公司 | Etching machine is used in production of PERC battery piece |
| CN212946044U (en) * | 2020-05-17 | 2021-04-13 | 许计文 | PERC battery laser marking device |
| CN213546345U (en) * | 2020-12-28 | 2021-06-25 | 平顶山中昱能源有限公司 | Etching blanking table for production of crystalline silicon solar cell panel |
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2022
- 2022-01-11 CN CN202210024853.3A patent/CN114388659B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5536388A (en) * | 1995-06-02 | 1996-07-16 | International Business Machines Corporation | Vertical electroetch tool nozzle and method |
| EP2113935A2 (en) * | 2008-05-01 | 2009-11-04 | Wakom Semiconductor Corporation | Soaking device with single surface etching capability |
| CN212946044U (en) * | 2020-05-17 | 2021-04-13 | 许计文 | PERC battery laser marking device |
| CN212750816U (en) * | 2020-08-03 | 2021-03-19 | 江苏晶旺新能源科技有限公司 | Etching machine is used in production of PERC battery piece |
| CN213546345U (en) * | 2020-12-28 | 2021-06-25 | 平顶山中昱能源有限公司 | Etching blanking table for production of crystalline silicon solar cell panel |
| CN112490107A (en) * | 2021-01-14 | 2021-03-12 | 北京瓢虫星球信息技术有限公司 | Plasma etching machine and etching method thereof |
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