CN114388656B - 一种CdTe发电玻璃及其制造方法 - Google Patents

一种CdTe发电玻璃及其制造方法 Download PDF

Info

Publication number
CN114388656B
CN114388656B CN202111641433.1A CN202111641433A CN114388656B CN 114388656 B CN114388656 B CN 114388656B CN 202111641433 A CN202111641433 A CN 202111641433A CN 114388656 B CN114388656 B CN 114388656B
Authority
CN
China
Prior art keywords
layer
cdte
power generation
glass
cds
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN202111641433.1A
Other languages
English (en)
Other versions
CN114388656A (zh
Inventor
彭寿
马立云
汪元元
殷新建
吴一民
方建鹏
陈瑛
储静远
盖琳琳
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
China Triumph International Engineering Co Ltd
Original Assignee
China Triumph International Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by China Triumph International Engineering Co Ltd filed Critical China Triumph International Engineering Co Ltd
Priority to CN202111641433.1A priority Critical patent/CN114388656B/zh
Publication of CN114388656A publication Critical patent/CN114388656A/zh
Application granted granted Critical
Publication of CN114388656B publication Critical patent/CN114388656B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/1828Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof the active layers comprising only AIIBVI compounds, e.g. CdS, ZnS, CdTe
    • H01L31/1836Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof the active layers comprising only AIIBVI compounds, e.g. CdS, ZnS, CdTe comprising a growth substrate not being an AIIBVI compound
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/0248Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
    • H01L31/0352Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions
    • H01L31/035272Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions characterised by at least one potential jump barrier or surface barrier
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/04Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
    • H01L31/042PV modules or arrays of single PV cells
    • H01L31/0445PV modules or arrays of single PV cells including thin film solar cells, e.g. single thin film a-Si, CIS or CdTe solar cells
    • H01L31/046PV modules composed of a plurality of thin film solar cells deposited on the same substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/04Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
    • H01L31/06Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers
    • H01L31/072Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PN heterojunction type
    • H01L31/073Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PN heterojunction type comprising only AIIBVI compound semiconductors, e.g. CdS/CdTe solar cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/543Solar cells from Group II-VI materials

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Sustainable Energy (AREA)
  • Manufacturing & Machinery (AREA)
  • Photovoltaic Devices (AREA)

Abstract

本发明提供一种CdTe发电玻璃的制造方法,采用逆序的镀膜工艺制造CdTe发电玻璃,窗口层位于远离基板一侧,可以直接将钢化玻璃作为前板合片封装,满足BIPV应用需求,实现BIPV发电幕墙玻璃的轻量化;另外逆序方式镀膜,活化过程在CdS/CdSe缓冲层镀膜之前,活化过程避免保证接触层材料的充分扩散,不会对p‑n结产生破坏,有利于降低串阻,提升填充和转换效率。

Description

一种CdTe发电玻璃及其制造方法
技术领域
本发明属于光伏电池技术领域,特别是涉及一种CdTe发电玻璃及其制造方法。
背景技术
碲化镉太阳电池是一种以p型CdTe和n型CdS/CdSe的异质结为基础的薄膜太阳能电池,较单晶硅太阳能电池有制作方便、成本低廉和重量较轻等优点。传统CdTe太阳电池在透明基板上依次沉积透明电极、窗口层、CdS/CdSe缓冲层、CdTe光吸收层、背接触层以及背电极,形成电池结构。由于Cu能够替代CdTe中的Cd原子形成CuCd替位缺陷,使其作为受主杂质增加p-CdTe的掺杂浓度,并且它能够有效地改善CdTe层与电极间的接触以形成准欧姆接触,降低因此被广泛用于制备高效的CdTe太阳电池中。目前CdTe电池的背接触材料中,大部分含有Cu或Cu的化合物,如Cu、Cu2Te、ZnTe:Cu等。但是,热处理过程中铜离子容易扩散到PN结上,造成转换性能的巨大劣化。另外,应用于BIPV幕墙的外立面玻璃要求采用钢化玻璃以满足安全性。传统CdTe发电玻璃产品制成过程中的高温环境使得基板玻璃无法钢化,难以满足BIPV幕墙的应用标准,制成组件后除了背板玻璃封装,应用于建筑幕墙还需要在最外层再附加一层钢化玻璃形成三玻结构。因此,开发一种新型的CdTe发电玻璃结构优化电池性能,并且更适于BIPV应用需求,实属必要。
发明内容
鉴于以上所述现有技术的缺点,本发明的目的在于提供一种CdTe发电玻璃及其制造方法,用于解决现有技术中CdTe发电玻璃的难以满足BIPV幕墙钢化玻璃的问题。
为实现上述目的及其他相关目的,本发明提供一种CdTe发电玻璃的制造方法,包括步骤:
1)提供一个基底,在基底上沉积金属Mo金属电极;
2)在所述Mo金属电极上沉积一层背接触层;
3)在背接触层上沉积CdTe光吸收层,通过活化退火工序对所述CdTe光吸收层进行活化退火处理;
4)在CdTe光吸收层上沉积CdS/CdSe缓冲层,在CdS/CdSe缓冲层上沉积TCO透明电极;
5)提供一个带有三个激光头阵列的激光器,所述激光器的三个激光头同时在TCO透明电极上刻线,第一激光头的激光刻断Mo金属电极、背接触层、CdTe光吸收层、CdS/CdSe缓冲层和TCO透明电极,第二激光头和第三激光头的激光刻断所述CdTe光吸收层、CdS/CdSe缓冲层和TCO透明电极;三个激光头阵列同时工作,将整个膜层分割为多个电池单元;
6)采用丝网印刷工艺在在第一激光器刻线处印刷低温固化绝缘胶,所述低温固化绝缘胶填充于第一激光头刻线槽内;
7)采用丝网印刷工艺在第一激光器和第二激光器刻线处印刷低温固化导电浆料,固化后得到多个电池单元串联的CdTe太阳电池;
8)贴装汇流条,利用密封胶合片盖板玻璃,所述盖板玻璃为钢化玻璃,得到整块CdTe太阳电池组件。
可选地,所述背接触层材料为Cu掺杂ZnTe,厚度为20~30nm。
可选地,所述CdS/CdSe缓冲层厚度为50~100nm,CdTe光吸收层厚度为2.0~4.0μm;所述CdS/CdSe缓冲层和所述CdTe光吸收层的沉积方法包括气相传输沉积或近空间升华沉积。
可选地,所述活化退火温度为350~600℃,时间为5~40min。
可选地,所述TCO透明电极和所述CdS/CdSe缓冲层之间有一层窗口层,窗口层为MgZnO膜层,窗口层的厚度为40~70nm。
可选地,所述TCO透明电极的材料为ITO导电膜层、FTO导电膜层和AZO导电膜层中的一种。
可选地,所述激光刻线宽度20~100μm,每组刻线内相邻刻线边缘间距30~100μm。
可选地,所述低温固化导电浆料为导电银浆、导电铜浆、导电镍浆、导电银包铜浆、导电银包镍浆、导电金浆料中的一种。
可选地,所述低温固化绝缘胶包括环氧绝缘胶、丙烯酸绝缘胶、聚氨酯绝缘胶、PI绝缘胶、绝缘硅胶。
本发明还提供一种CdTe发电玻璃,CdTe发电玻璃包括:
基底,以及形成于基底上的薄膜电池层;
所述薄膜电池层上有汇流条以及密封胶合片的盖板玻璃,所述盖板玻璃为钢化玻璃;
所述薄膜电池层包括结构:从所述基板向上依次为,Mo金属电极、背接触层、CdTe光吸收层、CdS/CdSe缓冲层、TCO透明电极;
所述薄膜电池层通过多组平行刻线形成串联结构,每组刻线包括三个刻缝,第一刻缝刻断Mo金属电极、背接触层、CdTe光吸收层、CdS/CdSe缓冲层和TCO透明电极,第二和第三刻缝刻断所述CdTe光吸收层、CdS/CdSe缓冲层和TCO透明电极;第一刻缝内填充低温固化绝缘胶;第二刻缝内以及第一刻缝上缘覆盖导电胶,形成多个电气串联的电池结构。
如上所述,本发明的一种CdTe发电玻璃的制造方法,具有以下有益效果:采用逆序的镀膜工艺制造CdTe发电玻璃,窗口层位于远离基板一侧,可以直接将钢化玻璃作为前板合片封装,满足BIPV应用需求,实现BIPV发电幕墙玻璃的轻量化;另外逆序方式镀膜,活化过程在CdS/CdSe缓冲层镀膜之前,活化过程避免保证接触层材料的充分扩散,不会对p-n结产生破坏,有利于降低串阻,提升填充和转换效率。
附图说明
图1显示为本发明的一种CdTe发电玻璃的制造方法的工艺流程图。
图2~10显示为本发明的一种CdTe发电玻璃的制造方法各步骤所呈现结构示意图,其中,图10显示为本发明的一种CdTe发电玻璃结构示意图。
元件标号说明:
100 基板
200 Mo金属电极
300 背接触层
401 CdTe光吸收层
402 CdS/CdSe缓冲层
500 TCO透明电极
600 低温固化绝缘胶
700 低温固化导浆料
800 密封胶层
900 盖板玻璃
S1~S8 步骤
具体实施方式
以以下通过特定的具体实例说明本发明的实施方式,本领域技术人员可由本说明书所揭露的内容轻易地了解本发明的其他优点与功效。本发明还可以通过另外不同的具体实施方式加以实施或应用,本说明书中的各项细节也可以基于不同观点与应用,在没有背离本发明的精神下进行各种修饰或改变。
如在详述本发明实施例时,为便于说明,表示器件结构的剖面图会不依一般比例作局部放大,而且所述示意图只是示例,其在此不应限制本发明保护的范围。此外,在实际制作中应包含长度、宽度及深度的三维空间尺寸。
为了方便描述,此处可能使用诸如“之下”、“下方”、“低于”、“下面”、“上方”、“上”等的空间关系词语来描述附图中所示的一个元件或特征与其他元件或特征的关系。将理解到,这些空间关系词语意图包含使用中或操作中的器件的、除了附图中描绘的方向之外的其他方向。此外,当一层被称为在两层“之间”时,它可以是所述两层之间仅有的层,或者也可以存在一个或多个介于其间的层。
在本申请的上下文中,所描述的第一特征在第二特征“之上”的结构可以包括第一和第二特征形成为直接接触的实施例,也可以包括另外的特征形成在第一和第二特征之间的实施例,这样第一和第二特征可能不是直接接触。
参阅图1~10,需要说明的是,本实施例中所提供的图示仅以示意方式说明本发明的基本构想,遂图示中仅显示与本发明中有关的组件而非按照实际实施时的组件数目、形状及尺寸绘制,其实际实施时各组件的型态、数量及比例可为一种随意的改变,且其组件布局型态也可能更为复杂。
本实施例提供一种CdTe发电玻璃的制造方法,步骤流程如图1所示的步骤S1~步骤S8。
具体地,本实施例的CdTe发电玻璃的制造方法具体过程如图2~10所示:
如图2所示,提供一个基底100,在基底上沉积金属Mo金属电极200。
如图3所示,在Mo金属电极200上沉积一层背接触层300,背接触层材料可以是Cu掺杂ZnTe,厚度为20~30nm。
如图4所示,在背接触层300上沉积CdTe光吸收层401,通过活化退火工序对所述CdTe光吸收层401进行活化退火处理,CdTe光吸收层401厚度为2.0~4.0μm;CdTe光吸收层401的沉积方法可以是气相传输沉积或近空间升华沉积;活化退火温度为350~600℃,时间为5~40min。
如图5所示,在CdTe光吸收层401上沉积CdS/CdSe缓冲层402,所述CdS/CdSe缓冲层402为CdS与CdSe的叠层,CdS/CdSe缓冲层402厚度为50~100nm,CdS/CdSe缓冲层402的沉积方法可以是气相传输沉积或近空间升华沉积。
如图6所示,在CdS/CdSe缓冲层402上沉积TCO透明电极500;TCO透明电极500的材料可以是ITO导电膜层、FTO导电膜层和AZO导电膜层。
如图7所示,提供一个带有三个激光头阵列的激光器,所述激光器的三个激光头同时在TCO透明电极500上刻线,第一激光头的激光P1刻断Mo金属电极200、背接触层300、CdTe光吸收层401、CdS/CdSe缓冲层402和TCO透明电极500,第二激光头和第三激光头的激光P2和P3刻断所述CdTe光吸收层401、CdS/CdSe缓冲层402和TCO透明电极500;三个激光头阵列同时工作,将整个膜层分割为多个电池单元;激光刻线宽度20~100μm,每组刻线内相邻刻线边缘间距30~100μm。
如图8所示,采用丝网印刷工艺在在第一激光器刻线处印刷低温固化绝缘胶600,所述低温固化绝缘胶填充于第一激光头刻线槽内;低温固化绝缘胶600可以是环氧绝缘胶、丙烯酸绝缘胶、聚氨酯绝缘胶、PI绝缘胶、绝缘硅胶。
如图9所示,采用丝网印刷工艺在第一激光器和第二激光器刻线处印刷低温固化导电浆料700,固化后得到多个电池单元串联的CdTe太阳电池;低温固化导电浆料700可以是导电银浆、导电铜浆、导电镍浆、导电银包铜浆、导电银包镍浆、导电金浆料。
如图10所示,贴装汇流条,利用密封胶800合片盖板玻璃900,所述盖板玻璃900为钢化玻璃,得到整块CdTe太阳电池组件。
如图10所示,本实施例还提供一种CdTe发电玻璃,结构至少包括:基底100,以及形成于基底上的薄膜电池层。薄膜电池层上有汇流条以及密封胶800合片的盖板玻璃900,所述盖板玻璃900为钢化玻璃。薄膜电池层包括结构:从所述基板向上依次为,Mo金属电极200、背接触层300、CdTe光吸收层401、CdS/CdSe缓冲层402、TCO透明电极500。薄膜电池层通过多组平行刻线形成串联结构,每组刻线包括三个刻缝,第一刻缝刻断Mo金属电极200、背接触层300、CdTe光吸收层401、CdS/CdSe缓冲层402和TCO透明电极500,第二和第三刻缝刻断所述CdTe光吸收层401、CdS/CdSe缓冲层402和TCO透明电极500;第一刻缝内填充低温固化绝缘胶600;第二刻缝内以及第一刻缝上缘覆盖导电胶700,形成多个电气串联的电池结构。
综上所述,本发明采用逆序的镀膜工艺制造CdTe发电玻璃,窗口层位于远离基板一侧,可以直接将钢化玻璃作为前板合片封装,满足BIPV应用需求,实现BIPV发电幕墙玻璃的轻量化。另外,逆序方式镀膜,活化过程在CdS/CdSe缓冲层镀膜之前,活化过程避免保证接触层材料的充分扩散,不会对p-n结产生破坏,有利于降低串阻,提升填充和转换效率。所以,本发明有效克服了现有技术中的缺点而具有高度的产业价值。
上述实施例仅例示性说明本发明的原理及其功效,而非用于限制本发明。任何熟悉此技术的人士皆可在不违背本发明的精神及范畴下,对上述实施例进行修饰或改变。因此,举凡所属技术领域中具有通常知识者在未脱离本发明所揭示的精神与技术思想下所完成的一切等效修饰或改变,仍应由本发明的权利要求所涵盖。

Claims (10)

1.一种CdTe发电玻璃的制造方法,其特征在于,包括步骤:
提供一个基底,在所述基底上沉积Mo金属电极;
在所述Mo金属电极上沉积一层背接触层;
在所述背接触层上沉积CdTe光吸收层,通过活化退火工序对所述CdTe光吸收层进行活化退火处理;
在所述CdTe光吸收层上沉积CdS/CdSe缓冲层,在所述CdS/CdSe缓冲层上沉积TCO透明电极;
提供一个带有三个激光头阵列的激光器,所述激光器的三个激光头同时在TCO透明电极上刻线,第一激光头的激光刻断所述Mo金属电极、背接触层、CdTe光吸收层、CdS/CdSe缓冲层和TCO透明电极,第二激光头和第三激光头的激光刻断所述CdTe光吸收层、CdS/CdSe缓冲层和TCO透明电极;三个激光头阵列同时工作,将整个膜层分割为多个电池单元;
采用丝网印刷工艺在第一激光器刻线处印刷低温固化绝缘胶,所述低温固化绝缘胶填充于第一激光头的刻线槽内;
采用丝网印刷工艺在第一激光器和第二激光器刻线处印刷低温固化导电浆料,固化后得到多个电池单元串联的CdTe太阳电池;
贴装汇流条,利用密封胶合片盖板玻璃,所述盖板玻璃为钢化玻璃,得到整块CdTe太阳电池组件。
2.根据权利要求1所述一种CdTe发电玻璃的制造方法,其特征在于:所述背接触层材料为Cu掺杂ZnTe,厚度为20~30nm。
3.根据权利要求1所述一种CdTe发电玻璃的制造方法,其特征在于:所述CdS/CdSe缓冲层厚度为50~100nm,CdTe光吸收层厚度为2.0~4.0μm;所述CdS/CdSe缓冲层和所述CdTe光吸收层的沉积方法包括气相传输沉积或近空间升华沉积。
4.根据权利要求1所述一种CdTe发电玻璃的制造方法,其特征在于:所述活化退火温度为350~600℃,时间为5~40min。
5.根据权利要求1所述一种CdTe发电玻璃的制造方法,其特征在于:所述TCO透明电极和所述CdS/CdSe缓冲层之间有一层窗口层,窗口层为MgZnO膜层,窗口层的厚度为40~70nm。
6.根据权利要求1所述一种CdTe发电玻璃的制造方法,其特征在于:所述TCO透明电极的材料为ITO导电膜层、FTO导电膜层和AZO导电膜层中的一种。
7.根据权利要求1所述一种CdTe发电玻璃的制造方法,其特征在于:激光器刻线宽度20~100μm,每组刻线内相邻刻线边缘间距30~100μm。
8.根据权利要求1所述一种CdTe发电玻璃的制造方法,其特征在于:所述低温固化导电浆料为导电银浆、导电铜浆、导电镍浆、导电银包铜浆、导电银包镍浆、导电金浆料中的一种。
9.根据权利要求1所述一种CdTe发电玻璃的制造方法,其特征在于:所述低温固化绝缘胶包括环氧绝缘胶、丙烯酸绝缘胶、聚氨酯绝缘胶、PI绝缘胶、绝缘硅胶。
10.一种CdTe发电玻璃,其特征在于,所述CdTe发电玻璃的形成采用如权利要求1-9任意一项所述的CdTe发电玻璃的制造方法,所述CdTe发电玻璃包括:
基底,以及形成于基底上的薄膜电池层;
所述薄膜电池层上有汇流条以及密封胶合片的盖板玻璃,所述盖板玻璃为钢化玻璃;
所述薄膜电池层包括结构:从所述基底向上依次为:Mo金属电极、背接触层、CdTe光吸收层、CdS/CdSe缓冲层、TCO透明电极;
所述薄膜电池层通过多组平行刻线形成串联结构,每组刻线包括三个刻缝,第一刻缝刻断Mo金属电极、背接触层、CdTe光吸收层、CdS/CdSe缓冲层、窗口层和TCO透明电极,第二和第三刻缝刻断所述CdTe光吸收层、CdS/CdSe缓冲层、窗口层和TCO透明电极;第一刻缝内填充有低温固化绝缘胶;第二刻缝内以及第一刻缝上缘覆盖有导电胶,形成多个电气串联的电池结构。
CN202111641433.1A 2021-12-29 2021-12-29 一种CdTe发电玻璃及其制造方法 Active CN114388656B (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202111641433.1A CN114388656B (zh) 2021-12-29 2021-12-29 一种CdTe发电玻璃及其制造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202111641433.1A CN114388656B (zh) 2021-12-29 2021-12-29 一种CdTe发电玻璃及其制造方法

Publications (2)

Publication Number Publication Date
CN114388656A CN114388656A (zh) 2022-04-22
CN114388656B true CN114388656B (zh) 2024-04-26

Family

ID=81200722

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202111641433.1A Active CN114388656B (zh) 2021-12-29 2021-12-29 一种CdTe发电玻璃及其制造方法

Country Status (1)

Country Link
CN (1) CN114388656B (zh)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102315328A (zh) * 2011-09-08 2012-01-11 牡丹江旭阳太阳能科技有限公司 一种非晶硅晶体硅结合型太阳能电池及其制备方法
CN108172643A (zh) * 2017-11-29 2018-06-15 成都中建材光电材料有限公司 一种CdTe叠层太阳能电池及其制作方法
CN112201702A (zh) * 2020-10-10 2021-01-08 南开大学 薄膜太阳电池吸收层形成方法、薄膜太阳电池及制备方法
CN112768557A (zh) * 2020-12-31 2021-05-07 中国建材国际工程集团有限公司 一种CdTe太阳电池的制作方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2481094A4 (en) * 2009-12-10 2017-08-09 Uriel Solar Inc. HIGH POWER EFFICIENCY POLYCRYSTALLINE CdTe THIN FILM SEMICONDUCTOR PHOTOVOLTAIC CELL STRUCTURES FOR USE IN SOLAR ELECTRICITY GENERATION

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102315328A (zh) * 2011-09-08 2012-01-11 牡丹江旭阳太阳能科技有限公司 一种非晶硅晶体硅结合型太阳能电池及其制备方法
CN108172643A (zh) * 2017-11-29 2018-06-15 成都中建材光电材料有限公司 一种CdTe叠层太阳能电池及其制作方法
CN112201702A (zh) * 2020-10-10 2021-01-08 南开大学 薄膜太阳电池吸收层形成方法、薄膜太阳电池及制备方法
CN112768557A (zh) * 2020-12-31 2021-05-07 中国建材国际工程集团有限公司 一种CdTe太阳电池的制作方法

Also Published As

Publication number Publication date
CN114388656A (zh) 2022-04-22

Similar Documents

Publication Publication Date Title
US11316057B2 (en) Shingled solar cells overlapping along non-linear edges
EP3095138B1 (en) Module fabrication of solar cells with low resistivity electrodes
KR102018652B1 (ko) 태양 전지
EP2996160A1 (en) Thin-film solar cell panel and manufacturing method therefor
US9608140B2 (en) Solar cell and solar cell module
US20130056044A1 (en) Photovoltaic module fabrication with thin single crystal epitaxial silicon devices
JP6478128B2 (ja) 太陽電池モジュール及び太陽電池モジュールの製造方法
US20220271190A1 (en) Shingled solar cell panel and method of manufacturing the same
US20160233824A1 (en) Photovoltaic module fabrication with thin single crystal epitaxial silicon devices
CN111615752A (zh) 太阳能电池模块
EP3358630B1 (en) Partially translucent photovoltaic modules and methods for manufacturing
US20140251423A1 (en) Solar cell and method of manufacturing the same
CN113178501A (zh) 一种柔性光伏组件及其制备方法
CN209544366U (zh) 一种可降低电池效率损失的太阳能电池结构
KR20100006205A (ko) Cigs 태양전지 모듈 및 그 제조방법
JP6995828B2 (ja) 太陽電池モジュール
US20240032314A1 (en) Solar cell and solar cell module including the same
CN112768557A (zh) 一种CdTe太阳电池的制作方法
CN113270506A (zh) 一种CdTe太阳电池背电极制作方法
CN114388656B (zh) 一种CdTe发电玻璃及其制造方法
CN110335920B (zh) 一种可降低电池效率损失的太阳能电池结构制作方法
CN108922933B (zh) 双面直连太阳能电池组件及制备方法
US20240090246A1 (en) Solar cell, method for manufacturing the same, and solar cell module comprising the same
CN215184006U (zh) 一种半柔性太阳能光伏组件
KR102357660B1 (ko) Hit 셀을 포함하는 슁글드 태양전지 모듈 및 그 제조방법

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant