CN114370846A - High-precision optical axis correction method for photoelectric system - Google Patents
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Abstract
The invention relates to a high-precision optical axis correction method for a photoelectric system, belonging to the technical field of photoelectricity; the method comprises the steps of optical axis pointing error source analysis, model construction, data measurement, error parameter identification and optical axis pointing parameter correction. The optical axis error source comprises an optical axis shaking error, an image processing error, a shafting rotation error, a perpendicularity error, an angle sensor measuring error and an angle sensor zero error; and carrying out error parameter identification according to related measurement data by carrying out parametric modeling on 6 errors influencing the optical axis direction, thereby correcting the optical axis direction of the photoelectric system. The invention provides an accurate optical axis pointing model, corrects the optical axis in a software mode, is flexible and convenient to use, reduces the design cost, shortens the development period and obviously improves the pointing precision.
Description
Technical Field
The invention belongs to the technical field of photoelectricity, and particularly relates to a high-precision optical axis correction method for a photoelectric system.
Background
The photoelectric system has the functions of airspace search, detection of an airspace target and tracking. The pointing function of the photoelectric system is a function that the photoelectric detection system can completely and accurately keep the pointing of the optical axis facing any object, the pointing accuracy is one of key technical indexes of the positioning performance of the photoelectric system, the accuracy not only affects target capture and aiming, but also affects the positioning accuracy of a system target, and further affects the accuracy of subsequent firepower striking, and in severe cases, the target cannot be guided into a tracking view field, so that the failure of tracking observation is caused.
At present, there are two basic approaches to improve the pointing accuracy of a photoelectric detection system: hardware tuning and software modification. The former controls various errors in the process of system design, processing and assembly, improves the pointing accuracy of the system as much as possible, leads to overhigh processing and assembly accuracy index, greatly improves the production period and the development cost of products, and even has no realization on the pointing requirement of special high accuracy under the existing processing and assembly level; the latter is to do software correction by the linear transformation to the difference value of the actual direction and the reported direction of the optical axis of the system, and the error parameter identification is inaccurate.
The optical axis correction algorithm of the invention gives an accurate optical axis pointing model from the analysis, modeling and identification of the optical axis error of the photoelectric system, corrects the optical axis, and has the characteristics of flexible and convenient use, design cost reduction, development period shortening and pointing precision improvement.
Disclosure of Invention
The technical problem to be solved is as follows:
in order to avoid the defects of the prior art, the invention provides a high-precision optical axis correction method for an optoelectronic system. The invention provides an accurate optical axis pointing model, corrects the optical axis in a software mode, is flexible and convenient to use, reduces the design cost, shortens the development period and obviously improves the pointing precision.
The technical scheme of the invention is as follows: a high-precision optical axis correction method for an optoelectronic system is characterized by comprising the following steps: the method comprises the steps of optical axis pointing error source analysis, model construction, data measurement, error parameter identification and optical axis pointing parameter correction; error parameter identification is carried out according to related measurement data by carrying out parametric modeling on errors affecting the optical axis direction, so that the optical axis direction of the photoelectric system is corrected;
the method comprises the following specific steps:
the method comprises the following steps: analyzing an optical axis pointing error source;
the photoelectric system pointing error is divided into an optical axis self error and a movement mechanism error; the self error of the optical axis is divided into an optical axis shaking error and an image processing error; the errors of the motion mechanism are divided into shafting rotation errors, perpendicularity errors, angle sensor measurement errors and angle sensor zero errors;
step two: based on the 6 errors in the first step, constructing an optical axis pointing error parameter identification model of the photoelectric system as follows:
in the formula:
is a directional model of an optical axis in a body coordinate system,
for the actual measured orientation of the optical axis, u ═ u1u2 u3 u4 u5 u6]TAs optical axis pointing error parameter, u1、u2、u3、u4、u5、u6Respectively representing 6 error parameters of the optoelectronic system in the step one;
step three: measuring data;
measuring actual optical axis pointing by using total station as reference
Firstly, measuring the coordinates of the central position of a movement mechanism of the photoelectric system, and then measuring the coordinates of a target plate at different positions to obtain the actual direction of the photoelectric system;
simultaneously recording the azimuth and pitch angle information reported when the photoelectric system measures the target plate;
step four: identifying optical axis error parameters of the photoelectric system;
substituting the measured data in the step three into the model in the step two to construct an overdetermined residual equation; working model
In the process, the theoretical optical axis direction of the photoelectric system is consistent with the actual optical axis direction, the photoelectric system optical axis direction error parameter identification problem is converted into an optimization problem, and 6 error parameter values u are solved through an LM-column Wenberg algorithm optimization algorithm1、u2、u3、u4、u5、u6；
Step five: correcting an optical axis pointing parameter;
substituting the 6 error parameter values obtained in the step four into the optical axis pointing model in the step two
In the method, the actual optical axis direction of the photoelectric system is obtained by an azimuth angle alpha and a pitch angle beta measured by an angle sensor: ha(X, Y, Z), the corrected azimuth and pitch angle α of the targeta、βaComprises the following steps:
βa＝arcsin Z
wherein, alpha and beta are the azimuth and the pitch angle reported by the photoelectric system.
The further technical scheme of the invention is as follows: in the second step:
the further technical scheme of the invention is as follows: and measuring data in the third step is not less than 20 groups, each group measures not less than 10 times, and averaging and recording are carried out.
The further technical scheme of the invention is as follows: in the fourth step, the following solution is solved through the optimization algorithm of the Levenberg algorithm:
firstly, setting an initial value u, an initial parameter lambda, an amplification factor delta and an allowable error epsilon, and calculating to obtain 6 error parameter values through the following formula:
i is the identity matrix with the same dimension as the parameter u being sought.
The further technical scheme of the invention is as follows: wherein the initial value u is set to [ 000000 ]]T(ii) a The initial parameter λ is set as: 0.01; the amplification factor δ is set to: 100, respectively; the allowable error epsilon is the required error of the photoelectric system and is set to 10-5。
Advantageous effects
The invention has the beneficial effects that: the invention discloses a high-precision optical axis correction method for an optoelectronic system. And carrying out error parameter identification according to related measurement data by carrying out parametric modeling on errors influencing the optical axis direction, thereby correcting the optical axis direction of the photoelectric system. The invention provides an accurate optical axis pointing model, corrects the optical axis in a software mode, is flexible and convenient to use, reduces the design cost, shortens the development period and obviously improves the pointing precision.
3-5, a relevant experiment is performed on the optical axis correction method of the optoelectronic system, the azimuth pointing error of the optical axis before correction is as shown in fig. 3, and the maximum azimuth pointing error is 68.81 ″; the corrected azimuth pointing error of the optical axis of the photoelectric system is shown in fig. 4, and the corrected maximum azimuth pointing error is 6.52 ". The optical axis pitch pointing error before correction is shown in fig. 5, and the maximum pitch pointing error is 44.99 ". The corrected optical axis pitch pointing error of the photoelectric system is shown in fig. 6, and the corrected maximum azimuth pointing error is 2.19 ″.
Drawings
FIG. 1 is an optical axis pointing error illustration;
FIG. 2 is an illustration of a data measurement method;
FIG. 3 is a schematic view of the optical axis orientation error before correction according to the present invention;
FIG. 4 is a schematic view of the corrected optical axis orientation error of the present invention;
FIG. 5 is a schematic diagram of the optical axis pitch pointing error of the present invention before correction;
FIG. 6 is a schematic view of the corrected optical axis pitch pointing error of the present invention;
fig. 7 is a flow chart of calculating 6 error parameters to be identified of the optical axis error parameter identification model of the optoelectronic system according to the present invention.
Detailed Description
The embodiments described below with reference to the drawings are illustrative and intended to be illustrative of the invention and are not to be construed as limiting the invention.
Please refer to fig. 1 and fig. 2, wherein fig. 1 is an optical axis pointing error description, and fig. 2 is a data measurement method description. The high-precision optical axis correction method of the photoelectric system comprises the steps of optical axis pointing error source analysis, model construction, data measurement, error parameter identification and optical axis pointing parameter correction. And carrying out error parameter identification according to related measurement data by carrying out parametric modeling on errors influencing the optical axis direction, thereby correcting the optical axis direction of the photoelectric system.
A high-precision optical axis correction method for an optoelectronic system comprises the following specific steps:
the method comprises the following steps: the pointing errors affecting the photoelectric system are divided into self errors of an optical axis and errors of a moving mechanism; the self error of the optical axis is divided into an optical axis shaking error and an image processing error; the errors of the motion mechanism are divided into shafting rotation errors, perpendicularity errors, angle sensor measurement errors and angle sensor zero errors;
step two: based on the 6 errors in the first step, establishing an optical axis pointing error parameter identification model of the photoelectric system as follows:
in the formula:
for the pointing model of the optical axis in the body coordinate system
u＝[u1 u2 u3 u4 u5 u6]TPointing error parameters for the optical axis;
alpha and beta are the azimuth and the pitch angle of the photoelectric system angle sensor;
Step three: in the second step, the actually measured optical axis points to
The total station is used as a reference for measurement; firstly, measuring the coordinates of the central position of a movement mechanism of the photoelectric system, then measuring the coordinates of a target plate at different positions by adopting a total station to obtain the actually measured optical axis pointing direction
Measuring data is not less than 20 groups, each group measures not less than 10 times, and averaging and recording are carried out.
Simultaneously recording the azimuth and pitch angle information of the target plate by the photoelectric system;
step four: the photoelectric system optical axis error parameter identification model has 6 error parameters needing to be identified, and the measured data in the step three is substituted into the model in the step two to construct an over-determined residual equation; working model
The theoretical optical axis direction and the actual optical axis direction of the photoelectric system are pointedThe problem of identifying the optical axis pointing error parameters of the photoelectric system is converted into an optimization problem, and 6 error parameter values u are solved through a Levenberg algorithm (LM algorithm) optimization algorithm1、u2、u3、u4、u5、u6。
The specific algorithm is solved as follows:
the initial value u is generally set to [ 000000 ]]T；
Initial parameter λ: the general settings are: 0.01;
amplification factor δ: the general settings are: 100, respectively;
allowable error ε: the required error value of the optoelectronic system is generally 10-5；
I is a unit matrix, and the dimension of the unit matrix is the same as that of the solved parameter u;
6 error parameter values are obtained.
Step five: the optical axis pointing parameter correction is to substitute 6 error parameter values obtained in the fourth step into the optical axis pointing model in the second step
In the method, the actual optical axis direction of the photoelectric system is obtained by the pitching and azimuth angles measured by the angle sensor: ha(X, Y, Z), the corrected azimuth and pitch angle α of the targeta，βaComprises the following steps:
βa＝arcsin Z
in summary, the invention improves the pointing accuracy of the system by performing high-accuracy correction on the optical axis of the photoelectric system. And carrying out error parameter identification according to related measurement data by carrying out parametric modeling on errors influencing the optical axis direction, thereby correcting the optical axis direction of the photoelectric system. The invention provides an accurate optical axis pointing model, corrects the optical axis in a software mode, is flexible and convenient to use, reduces the design cost, shortens the development period and obviously improves the pointing precision.
Although embodiments of the present invention have been shown and described above, it is understood that the above embodiments are exemplary and should not be construed as limiting the present invention, and that variations, modifications, substitutions and alterations can be made in the above embodiments by those of ordinary skill in the art without departing from the principle and spirit of the present invention.
Claims (5)
1. A high-precision optical axis correction method for an optoelectronic system is characterized by comprising the following steps: the method comprises the steps of optical axis pointing error source analysis, model construction, data measurement, error parameter identification and optical axis pointing parameter correction; error parameter identification is carried out according to related measurement data by carrying out parametric modeling on errors affecting the optical axis direction, so that the optical axis direction of the photoelectric system is corrected;
the method comprises the following specific steps:
the method comprises the following steps: analyzing an optical axis pointing error source;
the photoelectric system pointing error is divided into an optical axis self error and a movement mechanism error; the self error of the optical axis is divided into an optical axis shaking error and an image processing error; the errors of the motion mechanism are divided into shafting rotation errors, perpendicularity errors, angle sensor measurement errors and angle sensor zero errors;
step two: based on the 6 errors in the first step, constructing an optical axis pointing error parameter identification model of the photoelectric system as follows:
in the formula:
is a directional model of an optical axis in a body coordinate system,
for the actual measured orientation of the optical axis, u ═ u1 u2 u3u4 u5 u6]TAs optical axis pointing error parameter, u1、u2、u3、u4、u5、u6Respectively representing 6 error parameters of the optoelectronic system in the step one;
step three: measuring data;
measuring actual optical axis pointing by using total station as reference
Firstly, measuring the coordinates of the central position of a movement mechanism of the photoelectric system, and then measuring the coordinates of a target plate at different positions to obtain the actual direction of the photoelectric system;
simultaneously recording the azimuth and pitch angle information reported when the photoelectric system measures the target plate;
step four: identifying optical axis error parameters of the photoelectric system;
substituting the measured data in the step three into the model in the step two to construct an overdetermined residual equation; working model
In the process, the theoretical optical axis direction of the photoelectric system is consistent with the actual optical axis direction, the photoelectric system optical axis direction error parameter identification problem is converted into an optimization problem, and 6 error parameter values u are solved through an LM-column Wenberg algorithm optimization algorithm1、u2、u3、u4、u5、u6；
Step five: correcting an optical axis pointing parameter;
substituting the 6 error parameter values obtained in the step four into the optical axis pointing model in the step two
In the middle, the photoelectric system is obtained by the azimuth angle alpha and the pitch angle beta measured by the angle sensorActual optical axis pointing: ha(X, Y, Z), the corrected azimuth and pitch angle α of the targeta、βaComprises the following steps:
βa＝arcsinZ
wherein, alpha and beta are the azimuth and the pitch angle reported by the photoelectric system.
2. The high-precision optical axis correction method for an electro-optical system according to claim 1, characterized in that: in the second step:
3. the high-precision optical axis correction method for an electro-optical system according to claim 1, characterized in that: and measuring data in the third step is not less than 20 groups, each group measures not less than 10 times, and averaging and recording are carried out.
4. The high-precision optical axis correction method for an electro-optical system according to claim 1, characterized in that: in the fourth step, the following solution is solved through the optimization algorithm of the Levenberg algorithm:
firstly, setting an initial value u, an initial parameter lambda, an amplification factor delta and an allowable error epsilon, and calculating to obtain 6 error parameter values through the following formula:
i is the identity matrix with the same dimension as the parameter u being sought.
5. The high-precision optical axis correction method for an electro-optical system according to claim 4, characterized in that: wherein the initial value u is set to [ 000000 ]]T(ii) a The initial parameter λ is set as: 0.01; the amplification factor δ is set to: 100, respectively; the allowable error epsilon is the required error of the photoelectric system and is set to 10-5。
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| CN112068322A (en) * | 2020-09-09 | 2020-12-11 | 西安应用光学研究所 | Multi-detector system optical axis parallelism correction method based on laser displacement sensor |
| CN112964238A (en) * | 2021-03-03 | 2021-06-15 | 中国科学院紫金山天文台 | Device and method for improving pointing accuracy of optical telescope auxiliary radio telescope |
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Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1163993A (en) * | 1997-08-26 | 1999-03-05 | Topcon Corp | Optical system for correcting laser light irradiating direction of surveying instrument |
| US10666926B1 (en) * | 2017-07-18 | 2020-05-26 | Edge 3 Technologies, Inc. | Residual error mitigation in multiview calibration |
| CN112068322A (en) * | 2020-09-09 | 2020-12-11 | 西安应用光学研究所 | Multi-detector system optical axis parallelism correction method based on laser displacement sensor |
| CN112964238A (en) * | 2021-03-03 | 2021-06-15 | 中国科学院紫金山天文台 | Device and method for improving pointing accuracy of optical telescope auxiliary radio telescope |
Non-Patent Citations (1)
| Title |
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