CN114340799A - 一种用于半导体制造的洁净室系统及其电场除尘方法 - Google Patents

一种用于半导体制造的洁净室系统及其电场除尘方法 Download PDF

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Publication number
CN114340799A
CN114340799A CN202080030939.6A CN202080030939A CN114340799A CN 114340799 A CN114340799 A CN 114340799A CN 202080030939 A CN202080030939 A CN 202080030939A CN 114340799 A CN114340799 A CN 114340799A
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China
Prior art keywords
electric field
anode
cathode
dust
gas
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Inventor
唐万福
赵晓云
王大祥
段志军
邹永安
奚勇
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Shanghai Bixiufu Enterprise Management Co Ltd
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Shanghai Bixiufu Enterprise Management Co Ltd
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Priority claimed from CN202010322636.3A external-priority patent/CN113522525A/zh
Priority claimed from CN202010323654.3A external-priority patent/CN113522526A/zh
Application filed by Shanghai Bixiufu Enterprise Management Co Ltd filed Critical Shanghai Bixiufu Enterprise Management Co Ltd
Priority claimed from PCT/CN2020/086851 external-priority patent/WO2020216356A1/zh
Publication of CN114340799A publication Critical patent/CN114340799A/zh
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Abstract

一种用于半导体制造的洁净室系统(100)及其电场除尘方法，洁净室系统(100)包括洁净室(101)、电场除尘系统(102)；洁净室(101)包括气体入口；电场除尘系统(102)包括除尘系统出口、电场装置(1021)；洁净室(101)的气体入口与电场除尘系统(102)的除尘系统出口连通；电场装置(1021)的电场阴极(10142、4052、5081、3081)和电场阳极10141、4051、5082、3082)用于产生电离电场。

Description

PCT国内申请，说明书已公开。

Claims (19)

  1. PCT国内申请，权利要求书已公开。
CN202080030939.6A 2020-04-22 2020-04-24 一种用于半导体制造的洁净室系统及其电场除尘方法 Pending CN114340799A (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
CN2020103226363 2020-04-22
CN202010322636.3A CN113522525A (zh) 2020-04-22 2020-04-22 一种用于半导体制造的洁净室系统及其多级电场除尘方法
CN202010323654.3A CN113522526A (zh) 2020-04-22 2020-04-22 一种用于半导体制造的洁净室系统及其电场除尘方法
CN2020103236543 2020-04-22
PCT/CN2020/086851 WO2020216356A1 (zh) 2019-04-25 2020-04-24 一种用于半导体制造的洁净室系统及其电场除尘方法

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CN114340799A true CN114340799A (zh) 2022-04-12

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CN202090000508.0U Active CN218132543U (zh) 2020-04-22 2020-04-24 一种用于半导体制造的洁净室系统
CN202090000505.7U Active CN218742503U (zh) 2020-04-22 2020-04-24 一种用于半导体制造的洁净室系统

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Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57150457A (en) * 1981-03-12 1982-09-17 Hitachi Plant Eng & Constr Co Ltd Purifier for air
US20020121352A1 (en) * 2001-03-02 2002-09-05 Lawson J. Alan Electrical field apparatus and methods for fluid for decontamination and other purposes
JP2004057944A (ja) * 2002-07-29 2004-02-26 Nippon Testpanel Co Ltd 排気ガス清浄化装置
CN203108663U (zh) * 2013-01-18 2013-08-07 上海永健仪器设备有限公司 蜂窝静电除尘灭菌模块
CN205518205U (zh) * 2016-03-31 2016-08-31 深圳市中科建设集团有限公司 一种带自动吹风功能的百级无尘车间
CN106733194A (zh) * 2017-03-31 2017-05-31 广东美的厨房电器制造有限公司 静电装置和油烟机
CN107020202A (zh) * 2016-01-29 2017-08-08 黄健伟 一种超净电除尘方法及装置
CN206980986U (zh) * 2017-07-18 2018-02-09 佛山市嘉名环保节能设备科技有限公司 一种静电除尘装置

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57150457A (en) * 1981-03-12 1982-09-17 Hitachi Plant Eng & Constr Co Ltd Purifier for air
US20020121352A1 (en) * 2001-03-02 2002-09-05 Lawson J. Alan Electrical field apparatus and methods for fluid for decontamination and other purposes
JP2004057944A (ja) * 2002-07-29 2004-02-26 Nippon Testpanel Co Ltd 排気ガス清浄化装置
CN203108663U (zh) * 2013-01-18 2013-08-07 上海永健仪器设备有限公司 蜂窝静电除尘灭菌模块
CN107020202A (zh) * 2016-01-29 2017-08-08 黄健伟 一种超净电除尘方法及装置
CN205518205U (zh) * 2016-03-31 2016-08-31 深圳市中科建设集团有限公司 一种带自动吹风功能的百级无尘车间
CN106733194A (zh) * 2017-03-31 2017-05-31 广东美的厨房电器制造有限公司 静电装置和油烟机
CN206980986U (zh) * 2017-07-18 2018-02-09 佛山市嘉名环保节能设备科技有限公司 一种静电除尘装置

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CN218132543U (zh) 2022-12-27

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Application publication date: 20220412