CN114232102B - Two-dimensional ZnTe crystal material and preparation method and application thereof - Google Patents
Two-dimensional ZnTe crystal material and preparation method and application thereof Download PDFInfo
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- 229910007709 ZnTe Inorganic materials 0.000 title claims abstract description 53
- 239000000463 material Substances 0.000 title claims abstract description 44
- 239000013078 crystal Substances 0.000 title claims abstract description 39
- 238000002360 preparation method Methods 0.000 title claims abstract description 13
- 239000011701 zinc Substances 0.000 claims abstract description 36
- 239000000758 substrate Substances 0.000 claims abstract description 25
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 claims abstract description 22
- 239000012159 carrier gas Substances 0.000 claims abstract description 14
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 14
- 239000001257 hydrogen Substances 0.000 claims abstract description 13
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 claims abstract description 12
- 238000000034 method Methods 0.000 claims abstract description 11
- 238000011144 upstream manufacturing Methods 0.000 claims abstract description 11
- 239000011592 zinc chloride Substances 0.000 claims abstract description 11
- 235000005074 zinc chloride Nutrition 0.000 claims abstract description 10
- 239000002808 molecular sieve Substances 0.000 claims abstract description 8
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 claims abstract description 8
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 7
- 150000002431 hydrogen Chemical class 0.000 claims abstract description 6
- 230000003287 optical effect Effects 0.000 claims abstract description 6
- 230000009471 action Effects 0.000 claims abstract description 5
- 238000006243 chemical reaction Methods 0.000 claims description 16
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 10
- 229910052714 tellurium Inorganic materials 0.000 claims description 8
- 229910052786 argon Inorganic materials 0.000 claims description 6
- 230000035484 reaction time Effects 0.000 claims description 6
- 238000010438 heat treatment Methods 0.000 claims description 5
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 4
- 229910052731 fluorine Inorganic materials 0.000 claims description 4
- 239000011737 fluorine Substances 0.000 claims description 4
- 229910052628 phlogopite Inorganic materials 0.000 claims description 4
- 239000000203 mixture Substances 0.000 claims description 3
- 239000000843 powder Substances 0.000 claims description 3
- 230000015572 biosynthetic process Effects 0.000 abstract description 6
- 238000003786 synthesis reaction Methods 0.000 abstract description 5
- 239000002135 nanosheet Substances 0.000 abstract description 4
- 239000007789 gas Substances 0.000 description 8
- 238000005424 photoluminescence Methods 0.000 description 5
- 229910052725 zinc Inorganic materials 0.000 description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 230000008021 deposition Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 230000007547 defect Effects 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 239000012495 reaction gas Substances 0.000 description 3
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 238000012512 characterization method Methods 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- KZKGLGIVGQYOTG-UHFFFAOYSA-N [F].[Au] Chemical compound [F].[Au] KZKGLGIVGQYOTG-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000013500 data storage Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000013507 mapping Methods 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 239000002070 nanowire Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 239000002096 quantum dot Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
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- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/46—Sulfur-, selenium- or tellurium-containing compounds
- C30B29/48—AIIBVI compounds wherein A is Zn, Cd or Hg, and B is S, Se or Te
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- C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
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- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/60—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape characterised by shape
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Abstract
Description
技术领域technical field
本发明属于光学加密材料领域,更具体地,涉及一种二维ZnTe晶体材料及其制备方法和应用。The invention belongs to the field of optical encryption materials, and more specifically relates to a two-dimensional ZnTe crystal material and its preparation method and application.
背景技术Background technique
随着信息技术的飞速发展,信息安全已经引起了人们的密切关注。加密作为保障信息安全的一种手段,在数据的存储和传输中具有极其重要的意义(ACS Nano 2021,15,6257-6265)。但目前的加密方法大多集中于终端加密,很少涉及内部逻辑运算加密(Angew.Chem.Int.Ed.2019,58,15128-15135)。逻辑运算作为基本的运算单元产生大量的数据,并且很容易受到黑客攻击和篡改。因此,逻辑运算的加密对于进一步提高信息安全至关重要。With the rapid development of information technology, information security has aroused people's close attention. Encryption, as a means of ensuring information security, is extremely important in data storage and transmission (ACS Nano 2021, 15, 6257-6265). However, most of the current encryption methods focus on terminal encryption, and rarely involve internal logic operation encryption (Angew. Chem. Int. Ed. 2019, 58, 15128-15135). As a basic computing unit, logical operations generate a large amount of data, and are vulnerable to hacking and tampering. Therefore, the encryption of logical operations is crucial to further improve information security.
通常,光致发光(PL)是最常用的加密方法之一,因为它具有快速的可读性和简单的设计。近年来,许多光致发光材料如量子点、上转换纳米粒子、钙钛矿、和有机染料被用于信息加密(Nano Lett.2021,21,5186-5194)。然而,这些材料在制备后其PL性能通常是不可调的。为了实现加密,需要更复杂的设计来调整PL属性,这不利于应用逻辑操作加密。此外,由于PL在自然光下的不可见性已经被广泛了解,因此光学信息的加密技术很容易被破解。综上,迫切需要一种多模态、高可调性、高安全性的先进加密方法。In general, Photoluminescence (PL) is one of the most commonly used encryption methods due to its fast readability and simple design. In recent years, many photoluminescent materials such as quantum dots, upconversion nanoparticles, perovskites, and organic dyes have been used for information encryption (Nano Lett. 2021, 21, 5186-5194). However, the PL properties of these materials are usually not tunable after preparation. To implement encryption, a more complex design is required to tune the PL properties, which is not conducive to applying logic to operate encryption. Moreover, since the invisibility of PL under natural light has been widely understood, the encryption of optical information can be easily broken. To sum up, there is an urgent need for an advanced encryption method with multi-modality, high adjustability, and high security.
ZnTe是一种直接带隙半导体,带隙为2.26eV。在ZnTe的合成过程中容易产生许多化学计量缺陷,诱导缺陷发射峰的形成,使ZnTe表现出丰富的发光模式(Adv.Mater.2016,28,276-283)。此外,外场很容易调节ZnTe的光学性质,这使得在ZnTe中实现高安全性的逻辑操作加密过程是有前景的(J.Electron.Mater.2004,33,579-582)。因此,ZnTe在逻辑操作加密方面具有明显的优势。但目前关于ZnTe的合成还局限在纳米线方面,在超薄ZnTe纳米片的合成方面还受到许多限制。ZnTe is a direct bandgap semiconductor with a bandgap of 2.26eV. Many stoichiometric defects are easily generated during the synthesis of ZnTe, which induces the formation of defect emission peaks, making ZnTe exhibit rich emission modes (Adv. Mater. 2016, 28, 276-283). In addition, the optical properties of ZnTe can be easily adjusted by an external field, which makes it promising to realize a highly secure logic operation encryption process in ZnTe (J. Electron. Mater. 2004, 33, 579-582). Therefore, ZnTe has obvious advantages in logic operation encryption. However, the current synthesis of ZnTe is still limited to nanowires, and there are still many limitations in the synthesis of ultrathin ZnTe nanosheets.
发明内容Contents of the invention
针对现有技术的以上缺陷或改进需求,本发明提供了一种二维ZnTe晶体材料及其制备方法和应用,其目的在于,制备出形貌规整、元素分布均匀的二维ZnTe晶体材料。In view of the above defects or improvement needs of the prior art, the present invention provides a two-dimensional ZnTe crystal material and its preparation method and application. The purpose is to prepare a two-dimensional ZnTe crystal material with regular shape and uniform element distribution.
为实现上述目的,按照本发明的第一方面,提出了一种二维ZnTe晶体材料的制备方法,包括如下步骤:In order to achieve the above object, according to the first aspect of the present invention, a kind of preparation method of two-dimensional ZnTe crystal material is proposed, comprising the steps:
以氯化锌和碲粉末分别作为Zn源和Te源,将Zn源和Te源分别放置在中心温区上游,并在Zn源和Te源上方均放置分子筛,将衬底放置在中心温区下游;控制中心温区温度850℃~980℃,通过含氢气的载气将蒸发的Zn源和Te源带至衬底处,Zn源和Te源在氢气作用下反应,在衬底上生成片状的二维ZnTe晶体材料。Zinc chloride and tellurium powders were used as Zn source and Te source respectively, Zn source and Te source were placed upstream of the central temperature zone, and molecular sieves were placed above the Zn source and Te source, and the substrate was placed downstream of the central temperature zone ; Control the temperature of the central temperature zone at 850°C to 980°C, and bring the evaporated Zn source and Te source to the substrate through the carrier gas containing hydrogen, and the Zn source and Te source react under the action of hydrogen to form a sheet on the substrate Two-dimensional ZnTe crystal material.
作为进一步优选的,所述氢气的流量为5sccm~10sccm。As a further preference, the flow rate of the hydrogen is 5 sccm-10 sccm.
作为进一步优选的,反应时间为10min~20min。As a further preference, the reaction time is 10 minutes to 20 minutes.
作为进一步优选的,相比于Te源,Zn源距中心温区的距离更远。As a further preference, the Zn source is farther away from the central temperature zone than the Te source.
作为进一步优选的,Zn源和Te源分别放置在距中心温区16cm、14cm的上游处,衬底放置在距中心温区10cm的下游处。As a further preference, the Zn source and the Te source are respectively placed 16 cm and 14 cm upstream from the central temperature zone, and the substrate is placed 10 cm downstream from the central temperature zone.
作为进一步优选的,中心温区的升温速度为30℃/min~40℃/min。As a further preference, the temperature rise rate in the central temperature zone is 30° C./min˜40° C./min.
作为进一步优选的,所述载气为氩气和氢气的混合气,且氩气的流量为50sccm。As a further preference, the carrier gas is a mixture of argon and hydrogen, and the flow rate of argon is 50 sccm.
作为进一步优选的,反应在单温区水平管式炉中进行,管口外径25mm,其中中心温区长度为10cm;所述衬底为氟金云母片。As a further preference, the reaction is carried out in a horizontal tube furnace with a single temperature zone, the outer diameter of the nozzle is 25 mm, and the length of the central temperature zone is 10 cm; the substrate is a fluorphlogopite sheet.
按照本发明的第二方面,提供了一种二维ZnTe晶体材料,其采用上述方法制备而成。According to the second aspect of the present invention, a two-dimensional ZnTe crystal material is provided, which is prepared by the above method.
按照本发明的第三方面,提供了一种二维ZnTe晶体材料的应用,将上述二维ZnTe晶体材料用于光学加密。According to the third aspect of the present invention, an application of a two-dimensional ZnTe crystal material is provided, and the above-mentioned two-dimensional ZnTe crystal material is used for optical encryption.
总体而言,通过本发明所构思的以上技术方案与现有技术相比,主要具备以下的技术优点:Generally speaking, compared with the prior art, the above technical solution conceived by the present invention mainly has the following technical advantages:
1、本发明选择氯化锌和碲粉为源,并采用了分子筛,可以减缓氯化锌和碲粉的蒸发速率,氯化锌和碲粉在H2气作用下反应生成ZnTe和HCl气体,氯化锌的熔点较低,降低了反应温度,减小了能耗,实现了制备过程的可控;同时控制中心温区温度,从而得到了形貌规整、元素分布均匀的二维ZnTe晶体材料,实现了厚度为7nm左右的超薄ZnTe纳米片的合成。1, the present invention selects zinc chloride and tellurium powder as source, and adopts molecular sieve, can slow down the evaporation rate of zinc chloride and tellurium powder, zinc chloride and tellurium powder react under the action of H to generate ZnTe and HCl gas, The melting point of zinc chloride is low, which reduces the reaction temperature, reduces energy consumption, and realizes the controllability of the preparation process; at the same time, the temperature in the central temperature zone is controlled, thereby obtaining a two-dimensional ZnTe crystal material with regular shape and uniform element distribution , achieved the synthesis of ultrathin ZnTe nanosheets with a thickness of about 7nm.
2、本发明对控制中心温区温度和载气流量进行综合控制,一方面,反应温度过低会造成ZnTe纳米片产物过少,这是由于温度过低,源的蒸发温度也相应降低导致源蒸发含量较少,进而减少产量;另一方面,反应温度过高会导致源蒸发速率过快,导致有很多颗粒状样品产生,使衬底变得很脏。同时以氩气作为输运气体,以氢气作为反应气体,保证适量的Zn源和Te源到达衬底处,同时有足量的反应气体充分反应,且氢气具有刻蚀减薄的作用,从而得到超薄的片状ZnTe。2. The present invention comprehensively controls the temperature in the temperature zone of the control center and the flow rate of the carrier gas. On the one hand, if the reaction temperature is too low, there will be too few ZnTe nanosheet products. The evaporation content is less, thereby reducing the yield; on the other hand, the high reaction temperature will cause the source evaporation rate to be too fast, resulting in a lot of granular samples and making the substrate dirty. At the same time, argon is used as the transport gas, and hydrogen is used as the reaction gas to ensure that an appropriate amount of Zn source and Te source reach the substrate, and at the same time, there is a sufficient amount of reaction gas to fully react, and hydrogen has the effect of etching and thinning, thus obtaining Ultrathin flake ZnTe.
3、本发明使衬底与中心温区保持一定的距离,可避免因温度过高衬底被破坏;同时根据Zn源和Te源的熔点高低,将Zn源和Te源分别放置在中心温区的上游不同位置处,可保证Zn源和Te源均匀到达衬底,使ZnTe晶体材料中元素分布更加均匀。3. The present invention maintains a certain distance between the substrate and the central temperature zone, which can prevent the substrate from being damaged due to excessive temperature; at the same time, according to the melting points of the Zn source and the Te source, the Zn source and the Te source are respectively placed in the central temperature zone At different positions upstream of the ZnTe crystal material, the Zn source and the Te source can be guaranteed to reach the substrate evenly, so that the element distribution in the ZnTe crystal material is more uniform.
附图说明Description of drawings
图1为本发明实施例制备二维ZnTe晶体材料的装置示意图;Fig. 1 is a schematic diagram of a device for preparing a two-dimensional ZnTe crystal material according to an embodiment of the present invention;
图2a~图2c分别为本发明实施例1-3制备的二维ZnTe晶体材料形貌俯视图;Figures 2a to 2c are top views of the morphology of the two-dimensional ZnTe crystal material prepared in Examples 1-3 of the present invention;
图3为本发明实施例1制备的二维ZnTe晶体材料厚度的测量表征图;Fig. 3 is the measurement characterization diagram of the thickness of the two-dimensional ZnTe crystal material prepared in Example 1 of the present invention;
图4a、图4b分别为本发明实施例1制备的二维ZnTe晶体材料的锌、碲元素成分的分析图。Fig. 4a and Fig. 4b are analysis diagrams of zinc and tellurium elemental components of the two-dimensional ZnTe crystal material prepared in Example 1 of the present invention, respectively.
具体实施方式Detailed ways
为了使本发明的目的、技术方案及优点更加清楚明白,以下结合附图及实施例,对本发明进行进一步详细说明。应当理解,此处所描述的具体实施例仅仅用以解释本发明,并不用于限定本发明。此外,下面所描述的本发明各个实施方式中所涉及到的技术特征只要彼此之间未构成冲突就可以相互组合。In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention. In addition, the technical features involved in the various embodiments of the present invention described below can be combined with each other as long as they do not constitute a conflict with each other.
本发明实施例提供的一种二维ZnTe晶体材料的制备方法,包括如下步骤:A method for preparing a two-dimensional ZnTe crystal material provided in an embodiment of the present invention includes the following steps:
采用单温区水平管式炉,如图1所示,管口外径25mm,在反应前先进行抽真空至10Pa左右,然后充入600sccm Ar至大气压,并反复洗气,以排除残余氧气;A horizontal tube furnace with a single temperature zone is used, as shown in Figure 1, the outer diameter of the nozzle is 25 mm, and the vacuum is evacuated to about 10 Pa before the reaction, and then filled with 600 sccm Ar to atmospheric pressure, and repeatedly scrubbed to remove residual oxygen;
以氯化锌和碲粉末(纯度>99.99%)分别作为Zn源和Te源,将Zn源和Te源分别放置在中心温区上游,并在Zn源和Te源上方均放置分子筛,采用氟金云母片作为沉积衬底,并将其放置在中心温区下游;Zinc chloride and tellurium powders (purity>99.99%) were used as Zn source and Te source respectively, Zn source and Te source were placed upstream of the central temperature zone, and molecular sieves were placed above Zn source and Te source, and fluorine gold was used The mica sheet is used as the deposition substrate and placed downstream of the central temperature zone;
中心温区即恒温区长度10cm,以30℃/min~40℃/min的升温速度将中心温区温度升至850℃~980℃;然后通过含氢气的载气将Zn源和Te源带至衬底处反应,并且压强保持一个大气压,Zn源和Te源在氢气作用下反应生成ZnTe和HCl气体,反应时间10min~20min,反应结束后载气保持不变,产物随炉冷却至室温,从氟金云母片上得到二维ZnTe晶体材料。The central temperature zone, that is, the constant temperature zone, is 10cm in length, and the temperature in the central temperature zone is raised to 850°C to 980°C at a heating rate of 30°C/min to 40°C/min; then the Zn source and the Te source are brought to the React at the substrate, and the pressure is maintained at one atmosphere. The Zn source and the Te source react under the action of hydrogen to generate ZnTe and HCl gas. The reaction time is 10 minutes to 20 minutes. After the reaction, the carrier gas remains unchanged. Two-dimensional ZnTe crystal material obtained on fluorphlogopite sheet.
进一步的,由于Zn源熔点比Te源熔点低,故Zn源离中心温区更远,具体将Zn源和Te源分别放置在距中心温区16cm、14cm的上游处,衬底放置在距中心温区10cm的下游处,避免衬底损坏。Further, since the melting point of the Zn source is lower than that of the Te source, the Zn source is farther away from the central temperature zone. Specifically, the Zn source and the Te source are placed 16 cm and 14 cm upstream from the central temperature zone, and the substrate is placed at a distance from the central temperature zone. 10cm downstream of the temperature zone to avoid damage to the substrate.
进一步的,所述载气为Ar和H2的混合气,其中Ar作为输运气体,H2作为反应气体,且Ar流量为50sccm,H2流量为5sccm~10sccm。Further, the carrier gas is a mixed gas of Ar and H 2 , wherein Ar is used as a transport gas, H 2 is used as a reaction gas, and the flow rate of Ar is 50 sccm, and the flow rate of H 2 is 5 sccm-10 sccm.
以下为具体实施例:The following are specific examples:
实施例1Example 1
采用单温区水平管式炉,管长90cm,外径25mm,管壁厚度2mm,恒温区范围10cm,中心温度设置为950℃,升温速率30℃/分钟。采用氯化锌和碲粉末(纯度>99.99%)作为Zn和Te源,分子筛分别置于源上方,分别放置在距离中心温区上游14cm处和16cm处;采用氟金云母片作为沉积衬底放置在下游距离中心温区10cm处;反应前先进行预抽真空至10Pa左右,然后充入600sccm Ar至大气压,并反复洗气,以排除残余氧气;反应过程中通入50sccm的Ar和5sccm的H2作为载气,并且压强保持一个大气压,反应时间15分钟,反应结束后载气保持不变,产物随炉冷却至室温,从氟金云母片上得到二维ZnTe晶体材料。A horizontal tube furnace with a single temperature zone is used, with a tube length of 90 cm, an outer diameter of 25 mm, a tube wall thickness of 2 mm, a constant temperature zone of 10 cm, a central temperature of 950 °C, and a heating rate of 30 °C/min. Zinc chloride and tellurium powder (purity>99.99%) were used as Zn and Te sources, and molecular sieves were placed above the sources, respectively, at 14 cm and 16 cm upstream from the central temperature zone; fluorine phlogopite sheets were used as deposition substrates 10cm downstream from the central temperature zone; before the reaction, pre-vacuumize to about 10Pa, then fill it with 600sccm Ar to atmospheric pressure, and repeatedly wash the gas to eliminate residual oxygen; pass 50sccm Ar and 5sccm H during the reaction 2 as a carrier gas, and the pressure was maintained at one atmosphere, and the reaction time was 15 minutes. After the reaction, the carrier gas remained unchanged, and the product was cooled to room temperature with the furnace, and a two-dimensional ZnTe crystal material was obtained from a fluorophlogopite sheet.
如图2a所示,是得到的二维ZnTe晶体材料的形貌表征;如图3所示,是对二维ZnTe晶体材料厚度的测量,厚度约为6.4nm,证实所获得产物为二维材料。如图4a和图4b所示,是对二维ZnTe晶体材料的元素成分分析,由产物的元素mapping图可以看出锌和碲两种元素分布均匀,产物为ZnTe晶体材料。As shown in Figure 2a, it is the morphology characterization of the obtained two-dimensional ZnTe crystal material; as shown in Figure 3, it is the measurement of the thickness of the two-dimensional ZnTe crystal material, the thickness is about 6.4nm, confirming that the obtained product is a two-dimensional material . As shown in Figure 4a and Figure 4b, it is the element composition analysis of the two-dimensional ZnTe crystal material. From the element mapping diagram of the product, it can be seen that the two elements of zinc and tellurium are evenly distributed, and the product is a ZnTe crystal material.
实施例2Example 2
采用单温区水平管式炉,管长90cm,外径25mm,管壁厚度2mm,恒温区范围10cm,中心温度设置为850℃,升温速率30℃/分钟。采用氯化锌和碲粉末(纯度>99.99%)作为Zn和Te源,分子筛分别置于源上方,分别放置在距离中心温区上游14cm处和16cm处;采用氟金云母片作为沉积衬底放置在下游距离中心温区10cm处;反应前先进行预抽真空至10Pa左右,然后充入600sccm Ar至大气压,并反复洗气,以排除残余氧气;反应过程中通入50sccm的Ar和6sccm的H2作为载气,并且压强保持一个大气压,反应时间15分钟,反应结束后载气保持不变,产物随炉冷却至室温,从氟金云母片上得到二维ZnTe晶体材料,其形貌表征如图2b所示。A horizontal tube furnace with a single temperature zone is used, with a tube length of 90 cm, an outer diameter of 25 mm, a tube wall thickness of 2 mm, a constant temperature zone of 10 cm, a central temperature of 850 °C, and a heating rate of 30 °C/min. Zinc chloride and tellurium powder (purity>99.99%) were used as Zn and Te sources, and molecular sieves were placed above the sources, respectively, at 14 cm and 16 cm upstream from the central temperature zone; fluorine phlogopite sheets were used as deposition substrates 10cm downstream from the central temperature zone; before the reaction, pre-vacuumize to about 10Pa, then fill with 600sccm Ar to atmospheric pressure, and repeatedly wash the gas to eliminate residual oxygen; pass 50sccm Ar and 6sccm H during the reaction 2 as a carrier gas, and the pressure is maintained at an atmospheric pressure. The reaction time is 15 minutes. After the reaction, the carrier gas remains unchanged. The product is cooled to room temperature with the furnace, and a two-dimensional ZnTe crystal material is obtained from a fluorophlogopite sheet. Its morphology is shown in the figure 2b.
实施例3Example 3
采用单温区水平管式炉,管长90cm,外径25mm,管壁厚度2mm,恒温区范围10cm,中心温度设置为980℃,升温速率40℃/分钟。采用氯化锌和碲粉末(纯度>99.99%)作为Zn和Te源,分子筛分别置于源上方,分别放置在距离中心温区上游14cm处和16cm处;采用氟金云母片作为沉积衬底放置在下游距离中心温区10cm处;反应前先进行预抽真空至10Pa左右,然后充入600sccm Ar至大气压,并反复洗气,以排除残余氧气;反应过程中通入50sccm的Ar和8sccm的H2作为载气,并且压强保持一个大气压,反应时间15分钟,反应结束后载气保持不变,产物随炉冷却至室温,从氟金云母片上得到二维ZnTe晶体材料,其形貌表征如图2c所示。A horizontal tube furnace with a single temperature zone is used, with a tube length of 90cm, an outer diameter of 25mm, a tube wall thickness of 2mm, a constant temperature zone of 10cm, a central temperature of 980°C, and a heating rate of 40°C/min. Zinc chloride and tellurium powder (purity>99.99%) were used as Zn and Te sources, and molecular sieves were placed above the sources, respectively, at 14 cm and 16 cm upstream from the central temperature zone; fluorine phlogopite sheets were used as deposition substrates 10cm downstream from the central temperature zone; before the reaction, pre-vacuumize to about 10Pa, then fill with 600sccm Ar to atmospheric pressure, and repeatedly wash the gas to eliminate residual oxygen; pass 50sccm Ar and 8sccm H during the reaction 2 as a carrier gas, and the pressure is maintained at an atmospheric pressure. The reaction time is 15 minutes. After the reaction, the carrier gas remains unchanged. The product is cooled to room temperature with the furnace, and a two-dimensional ZnTe crystal material is obtained from a fluorophlogopite sheet. Its morphology is shown in the figure 2c shown.
本领域的技术人员容易理解,以上所述仅为本发明的较佳实施例而已,并不用以限制本发明,凡在本发明的精神和原则之内所作的任何修改、等同替换和改进等,均应包含在本发明的保护范围之内。It is easy for those skilled in the art to understand that the above descriptions are only preferred embodiments of the present invention, and are not intended to limit the present invention. Any modifications, equivalent replacements and improvements made within the spirit and principles of the present invention, All should be included within the protection scope of the present invention.
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Title |
---|
Characterization of zinc telluride thin films deposited by two-source technique and post-annealed in nitrogen ambient;Akram K.S. et al.;《Journal of Crystal Growth》;20110107;参见第47页左栏第5段-第47页右栏第1段 * |
Optical identification using imperfections in 2D materials;Yameng Cao et al.;《2D Materials》;20170928;参见摘要部分、第2页左栏第1段 * |
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