CN114216847B - Constant-temperature single-point scratching experiment device, feeding system thereof and single-point scratching experiment method - Google Patents
Constant-temperature single-point scratching experiment device, feeding system thereof and single-point scratching experiment method Download PDFInfo
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- 238000006748 scratching Methods 0.000 title claims abstract description 99
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- 238000002474 experimental method Methods 0.000 title claims abstract description 35
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 15
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- G—PHYSICS
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- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
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Abstract
The invention relates to a feeding system for a constant-temperature single-point scratch experiment device, which is arranged on one side of a grinding machine, wherein a piezoelectric ceramic driver is arranged in the feeding system. The wiping system on the other side of the grinding machine rotates about its axis of rotation at a linear speed of more than 100m/s. The piezoelectric ceramic driver is used for feeding, so that the feeding movement period is equal to the rotation period of the scratching system, and ultra-high-speed single-point scratching is realized. The scratching experiment device comprises a feeding system, a scratching system, a temperature control system and a heat insulation structure; the temperature control system comprises a constant temperature control circuit, a heating plate and a thermocouple; the heat insulation structure comprises an air inlet, a heat exchange cavity and an air outlet. Compared with the prior art, the invention avoids repeated scratching caused by low-speed feeding in ultra-high-speed single-point scratching. By setting different constant temperature values of the workpiece, the temperature variation of the workpiece in the experiment is increased, and further the influence of different material temperatures on a material removal mechanism in the scratching process can be analyzed.
Description
Technical Field
The invention relates to the technical field of material testing in machining, in particular to a constant-temperature single-point scratching experiment device, a feeding system thereof and a single-point scratching experiment method.
Background
Ultra-high speed grinding is an important process for realizing high-efficiency, high-quality and green machining. In order to research the processing mechanism of the ultra-high-speed grinding, the processing technology of the ultra-high-speed grinding of different materials is searched, and an ultra-high-speed single-point scratch experiment becomes a necessary means for researching the ultra-high-speed grinding. The process achieved by the single point scratch test is actually a single scratch of the material by a single abrasive grain in the grinding wheel. By characterizing the grooves and subsurface thereof created by scratching on the material, researchers can further understand the material removal mechanism.
The current platform for single-point scratching experiments mainly comprises an atomic force microscope, a simple pendulum and a grinding machine. The method comprises the steps of performing a scratching experiment by using an atomic force microscope, wherein the scratching experiment comprises a probe, and a workpiece is scratched at a single point by the probe, but the single point scratching speed of the probe of the atomic force microscope is in the um/s level; the student O' Connor performed a scratch test using a simple pendulum. The relevant experimental procedure is published in article "On the effect of crystallographic orientation on ductile material removal in silicon". In the paper, the length of the pendulum used in the author experiment is 150mm, the reachable speed is below 1m/s, the pendulum is scratched by self gravity, the scratching speed caused by no power is low, and the single point scratching speed can reach the m/s level along the length direction of the pendulum which is long enough.
However, the grinding machine can carry out high-speed scratching experiments, but the highest scratching speed which can be achieved by the scratching system of the existing grinding machine can not exceed 100m/s when the existing grinding machine is used for scratching at high speed. Even if the wiping system is capable of achieving speeds of 100m/s against a certain difficulty, it is difficult for a feed system that is compatible with wiping systems above speeds of 100m/s to achieve a compatible feed speed. Once the speed of the wiping system is too high, and the feeding system cannot reach the matched feeding speed, repeated cutting is formed, so that repeated damage occurs to the subsurface of the material, and the sample is invalid. In addition, the conventional ultra-high-speed single-point scratching does not consider the influence of different material temperatures on the material removal mechanism in the scratching process, but the workpiece cannot be ensured to be carried out at different temperatures in the experimental process, so that an environment capable of ensuring the workpiece at different temperatures is also needed to be provided.
Disclosure of Invention
First, the technical problem to be solved
In view of the above-mentioned shortcomings and disadvantages of the prior art, the present invention provides a constant temperature single point scratching test device, a feeding system and a single point scratching test method thereof, which solve the technical problems that the scratching system has extremely high speed (more than 100 m/s), but the feeding system cannot achieve the matched feeding speed, and the constant temperature maintenance and the thermal expansion of the scratching test device in the ultra-high speed single point scratching with settable constant temperature are solved.
(II) technical scheme
In order to achieve the above purpose, the main technical scheme adopted by the invention comprises the following steps:
on one hand, the feeding system is arranged on one side of a grinding machine of the single-point scratch experiment device, and a piezoelectric ceramic driver is arranged in the feeding system and used for driving a workpiece arranged at one end of the feeding system;
the scratching system on the other side of the grinding machine rotates around the rotation axis of the scratching system, so that the scratching cutter on the scratching system has a rotation linear speed of more than 100 m/s;
the time required by single movement of the workpiece sequentially approaching, holding and moving away from the scratching system is defined as a feeding movement period under the driving of the piezoelectric ceramic driver. Setting the period of the feed motion equal to the period of rotation of the wiping system in an experiment;
a temperature control system is also included in contact with the workpiece for providing a constant temperature condition for the workpiece.
Optionally, a cavity is provided in the feeding system, one end of the piezoelectric ceramic driver is fixedly installed at one end of the cavity, the other end of the cavity is provided with a flexible structure, the flexible structure and the cavity divide the feeding system into a main body part and an installation part, the installation part extends outwards to form a heat insulation protruding table, and the heat insulation protruding table is used for installing the workpiece;
the piezoelectric ceramic driver is contracted or extended in different displacement according to different level states in a state of being connected with the external signal generator, so that the heat insulation boss generates feeding motion along the rotation axis direction of the rotary cutter head 22.
Optionally, an exposed end surface of the heat insulation boss is provided with an opening communicated with the outside, the opening is recessed inwards to form a cavity for heat exchange, and two opposite side walls of the heat insulation boss are respectively provided with an air inlet and an air outlet.
Optionally, the temperature control system comprises a quartz heat insulation sheet, a ceramic heating sheet, a thermocouple and a constant temperature control system;
the quartz heat insulation sheet is arranged on the end surfaces of the workpiece and the heat insulation boss and used for blocking the opening of the heat insulation boss;
the ceramic heating plate is arranged between the workpiece and the quartz heat insulation plate and is used for heating the workpiece;
the thermocouple is arranged between the ceramic heating plate and the quartz heat insulation plate and is used for detecting the temperature of the workpiece and feeding back the temperature to the control system, and the control system controls the temperature of the ceramic heating plate to rise or fall through the controller.
Optionally, the thermocouple is a type K thermocouple.
Optionally, the feeding system comprises a piezoelectric ceramic outer frame, the side of the piezoelectric ceramic outer frame facing the scratching system is provided with the flexible structure, one side of the flexible structure is provided with a heat insulation boss, and one side of the heat insulation boss is provided with a slot;
the piezoelectric ceramic driver is arranged in the piezoelectric ceramic outer frame, and the piezoelectric ceramic passes through the piezoelectric ceramic outer frame through a lead to be connected with an external signal generator.
Optionally, the workpiece is disposed on an end surface of the heat insulation boss, and the workpiece is fixedly mounted on the heat insulation boss through a connecting piece.
On the other hand, the constant-temperature single-point scratching experiment device comprises a grinding machine, a scratching system and the feeding system.
Optionally, the device further comprises a dynamometer, a connecting plate is arranged between the dynamometer and the piezoelectric ceramic outer frame, and two end faces of the connecting plate are respectively fixed with the dynamometer and the piezoelectric ceramic outer frame.
In still another aspect, a single point scratch test method based on the constant temperature single point scratch test device controls the feeding system to feed the workpiece toward the scratch system to form a single point scratch on the surface of the workpiece when the scratch system rotates along the rotation axis thereof at a linear speed of 100m/s or more; the temperature environment of the workpiece is controlled by changing the temperature control system so as to ensure that the workpiece is subjected to experiments at different temperatures.
(III) beneficial effects
The beneficial effects of the invention are as follows: according to the invention, the piezoelectric ceramic driver in the feeding system is used for completing feeding so as to match with the ultra-high-speed scratching speed, so that ultra-high-speed single-point scratching can be realized, and subsurface repeated damage caused by repeated scratching is avoided. Compared with the prior art, the invention can effectively avoid repeated scratching caused by low-speed feeding in ultra-high-speed single-point scratching. The workpiece can be carried out at a constant temperature through the temperature control system, and the temperature variation is increased by setting different constant temperature values of the workpiece, so that the influence of different material temperatures on a material removal mechanism in the scratching process can be analyzed.
Drawings
FIG. 1 is a schematic view of the overall exploded structure of example 1 of the constant temperature single point scratch test device of the present invention;
FIG. 2 is a schematic view of an assembled structure of the grinding machine not shown in FIG. 1;
FIG. 3 is a schematic longitudinal cross-sectional view of the feed system of the constant temperature single point scratch test device of the present invention;
FIG. 4 is a schematic perspective view of a connecting piece of the constant temperature single point scratch test device;
FIG. 5 is a schematic view showing an exploded structure of a constant temperature single point scratch test apparatus of example 3 of the present invention;
FIG. 6 is a schematic diagram of the assembled structure of FIG. 5;
FIG. 7 is a schematic diagram of the coordinates of the feed cycle of example 2 of the constant temperature single point scratch test device of the present invention;
FIG. 8 is a schematic view of a part of a front view of a wiping system of a constant temperature single point wiping experiment device of the invention;
FIG. 9 is a control circuit diagram of the temperature control system of the constant temperature single point scratch test device of the present invention;
FIG. 10 is a schematic diagram of the thermal insulation design of the constant temperature single point scratch test device of the present invention;
fig. 11 is a schematic diagram of the heat insulation principle of the constant temperature single point scratch test device of the invention.
[ reference numerals description ]
1: grinding machine;
2: a scratching system; 21: rotating the main shaft; 22: rotating the cutterhead; 23: a cutter is scratched; 231: diamond cutter particles; 232: a cutter bar;
3: a feed system; 31: a mounting bracket; 321: a piezoelectric ceramic outer frame; 322: a piezoelectric ceramic driver; 323: a notch; 324: a heat insulation boss; 3241: an air inlet; 3242: an air outlet; 3243: a heat insulating chamber; 325: a flexible structure;
4: a workpiece;
5: a connecting piece; 51: an upper mounting portion; 52: an end portion; 53: a lower mounting portion; 54: an opening;
6: a load cell;
7: a connecting plate;
9: a ceramic heating plate;
10: a thermocouple;
11: and a cooling gas supply device.
Detailed Description
The invention will be better explained by the following detailed description of the embodiments with reference to the drawings. Wherein references herein to azimuthal nouns such as "upper", "lower", "inner" and "outer" are made with reference to the orientation of fig. 1. The side on which the mounting bracket 31 is located is defined as the left side. The side on which the piezoceramic actuator 322 is located is defined as the front side.
Example 1:
referring to fig. 1, a constant temperature single point scratching experiment device provided by the embodiment of the invention comprises a grinding machine 1, a scratching system 2 and a feeding system 3.
The feeding system 3 is arranged at one side of the grinding machine 1 where the single point scratch experiment device is arranged, and a piezoelectric ceramic driver 322 is arranged in the feeding system 3 and is used for driving a workpiece 4 arranged at one end of the feeding system 3.
The wiping system 2 on the other side of the grinding machine 1 rotates about its axis of rotation such that the wiping tool 23 on the wiping system 2 has a rotational linear speed of more than 100m/s. The time required for the workpiece 4 to sequentially approach, hold, and depart from the wiping system 2 once is defined as a feed motion period under the driving of the piezoceramic actuator 322. In the experiment, the period T of rotation (see fig. 7) was set as the period of the feed movement of the wiping system 2. Because the workpiece 4 and the diamond blade 231 can meet only once in one cycle, repeated scratching due to low-speed feeding in ultra-high-speed single-point scratching can be avoided.
The scratching system 2 is arranged on one side (i.e., the right side) of the grinding machine 1, and the scratching system 2 can rotate along the rotation axis thereof at a linear speed of 100m/s or more.
Specifically, the scratching system 2 includes a rotary main shaft 21, a rotary cutter head 22, and a scratching tool 23.
One end of the rotary spindle 21 is driven to rotate along the rotation axis by an external driving member, the other end of the rotary spindle 21 is fixedly connected to the rotary cutterhead 22, and the rotary cutterhead 22 is coaxially arranged with the rotary spindle 21.
The external driving member is a driving member such as an electric spindle.
Further, the rotary cutterhead 22 is made of titanium alloy or carbon fiber. The titanium alloy or carbon fiber is used as the rotary cutter head 22 and the high-precision air seal oil pressure technology is adopted to drive the rotary main shaft 21, so that the highest speed of the scratching cutter 23 can reach 350m/s.
Further, the scratching tool 23 includes a cutter bar 232 and diamond grains 231.
The cutter bar 232 has a cylindrical shape, and one end of the cutter bar 232 is connected to the rotary cutterhead 22. Specifically, a jack slightly larger than the diameter of the cutter bar 232 is formed on one side of the rotary cutter head 22, glue is injected into the jack, then the cutter bar 232 is inserted into the jack, and the cutter bar 232 and the rotary cutter head 22 are adhered together through the glue. The other end of the cutter bar 232 is connected to the diamond cutter 231 by welding.
The diamond cutter 231 may have a triangular tip, a quadrangular tip, a conical shape, or a spherical shape.
The scratching tool 23 is disposed on one side (i.e., left side) of the rotary cutter head 22 near the piezoceramic actuator 322, and the diamond grains 231 on the scratching tool 23 can generate single-point scratching on the workpiece 4 to form scratches.
The invention provides a constant-temperature single-point scratching experiment device, which can realize ultra-high-speed single-point scratching and avoid subsurface repeated damage caused by repeated scratching by taking a piezoelectric driver 32 as a feeding system 3 to match with the ultra-high-speed scratching speed. Compared with the prior art, the invention can effectively avoid repeated scratching caused by low-speed feeding in ultra-high-speed single-point scratching.
The feed system 3 is arranged on the other (i.e. left) side of the grinding machine 1, the feed system 3 comprising a mounting bracket 31.
The mounting bracket 31 is fixedly connected with the grinding machine 1, and the mounting bracket 31 is used for connecting the dynamometer 6, the connecting plate 7, the feeding system 3, the workpiece 4, the connecting piece 5 and the quartz heat insulating sheet 8 to the grinding machine 1 (see fig. 1).
Further, referring to fig. 3, a cavity is provided in the feeding system 3, one end of the piezoceramic actuator 322 is fixedly mounted at one end of the cavity, the other end of the cavity is provided with a flexible structure 325, the flexible structure 325 and the cavity divide the feeding system 3 into a main body and a mounting portion, the mounting portion extends outwards to form a protruding portion, and the protruding portion is used for mounting the workpiece 4.
The piezoceramic actuator 322, in the state of being switched on with the external signal generator, contracts or expands depending on the different electrical level states, so that the thermal insulation boss 324 moves in a feeding manner along the rotational axis of the wiping system 2.
The feeding system 3 comprises a piezoelectric ceramic outer frame 321, a flexible structure 325 is arranged on one side of the piezoelectric ceramic outer frame 321 facing the scratching system 2, a heat insulation boss 324 is arranged on one side of the flexible structure 325, and a slot is arranged on one side of the heat insulation boss 324.
The piezoelectric ceramic driver 322 is disposed in the piezoelectric ceramic outer frame 321, and the piezoelectric ceramic is connected with an external signal generator through a wire passing through the piezoelectric ceramic outer frame 321.
The side of the piezoceramic actuator 322 facing the wiping system 2 is in close contact with the side of the boss 324. One side of the flexible structure 325 is integrally connected with the piezoelectric ceramic outer frame 321, the other side is integrally connected with the heat insulation boss 324, the heat insulation boss 324 penetrates through the notch 323 to extend outwards to form a protruding part, and the protruding part is used for installing the workpiece 4.
The piezoceramic actuator 322 deforms toward the flexible structure 325 according to the signal generated by the external signal generator to push the bonded thermal insulation boss 324 to move toward the side of the wiping system 2, so that the workpiece 4 moves toward the side of the wiping system 2.
Specifically, under voltage driving, the piezoceramic actuator 322 will first generate a micron-sized deformation toward one side of the wiping system 2 (i.e., the right side of the piezoceramic actuator 322), and the micron-sized deformation is conducted to the thermal insulation boss 324, so that the thermal insulation boss 324 drives the workpiece 4 disposed on the thermal insulation boss 324 along the notch 323 to generate a feeding amount toward the wiping system 2 (i.e., the right side of the thermal insulation boss 324). The piezoceramic actuator 322 then drives the workpiece 4 on the insulating boss 324 to move in a micrometer scale toward one side of the scratching system 2 until the workpiece 4 is scratched by the diamond cutter 231 on the scratching system 2. Next, the flexible structure 325 is moved toward the left to return to the original state, and the flexible structure 325 pulls the insulation boss 324 to the left during the return to the original position (i.e., the position before no feeding) along the notch 323 to return to the left. It can be seen that the work piece 4 completes three actions of movement (rightward movement) toward the wiping system 2, holding motionless and movement (leftward movement) away from the wiping system 2 by the cooperation of the piezoceramic actuator 322 and the flexible structure 325 on the heat-insulating boss 324; correspondingly, the piezoceramic actuator 322 is connected to the signal generator by wires, and 4 points are input to the signal generator, thereby defining an analog signal trapezoidal square wave (see fig. 7). Under the action of the trapezoid square wave, the piezoelectric ceramic 322 drives the workpiece 4 on the heat insulation boss 324 to complete the three action processes. At the same time, it is ensured that the feed movement period is equal to the period T of rotation of the wiping system 2, so that repeated wiping by low-speed feeding in ultra-high-speed single-point wiping can be avoided. Then, the workpiece 4 after the single point scratching experiment is removed can be analyzed, and the influence of the ultra-high processing speed (ultra-high strain rate 10-51/s) in grinding on the material removal mechanism is researched, so that an experiment foundation is provided.
Further, the device also comprises a dynamometer 6, a connecting plate 7 is arranged between the dynamometer 6 and the piezoelectric ceramic outer frame 321, and two end surfaces of the connecting plate 7 are respectively fixed with the dynamometer 6 and the piezoelectric ceramic outer frame 321. The dynamometer 6 obtains the scratch force data of the workpiece 4 through signal amplification and data acquisition. The connection plate 7 is arranged to facilitate the connection of the dynamometer 6 and the piezoelectric ceramic outer frame 321.
Further, the work 4 is disposed on an end face (right end face) of the heat insulation boss 324 facing the wiping system 2, and the work 4 is fixedly mounted on the heat insulation boss 324 by the connection member 5.
Further, the connection 5 is a "U" shaped connection.
The "U" shaped connector has an upper mounting portion 51, an end portion 52 and a lower mounting portion 53 (see FIG. 4).
The end 52 is disposed between the upper mounting portion 51 and the lower mounting portion 53, and a mounting cavity is formed between the upper mounting portion 51 and the lower mounting portion 53, and the mounting cavity is mounted in cooperation with the heat insulation boss 324, so that the workpiece 4 is fixedly mounted on one side end surface (i.e., the right end surface) of the heat insulation boss 324, the upper mounting portion 51 and the lower mounting portion 53 are respectively fixed on the upper end surface and the lower end surface, and the width of the upper mounting portion 51 is greater than that of the lower mounting portion 53.
The "U" shaped connector also has an opening 54 in communication with the exterior, the opening 54 leaving the workpiece 4 partially exposed to the exterior. The connection mode of the U-shaped connecting piece has better effect, so that the workpiece 4 is more firmly fixed on the right end face of the heat insulation boss 324, and the upper mounting part 51 and the lower mounting part 53 are fixed on the fixed end face of the heat insulation boss 324 in a bolt screwing mode.
Further, a quartz heat insulating sheet 8 is provided between the work 4 and the right end face of the heat insulating boss 324. In this embodiment, the heat shield is used for clamping the workpiece 4 in a tight manner.
Example 2:
the linear speed of rotation of the wiping tool 23 of the wiping system 2 is 300m/s, and the parameters of the 4 points input in the signal generator are respectively point 1:0ms, point 2:0.24ms, point 3:0.73ms and point 4: from 0.976, the period of the feed motion of the piezoceramic actuator 322 is known to be 0.976ms. Under this condition, a trapezoid voltage signal square wave (see fig. 7) with a high level of 3V and a low level of 0V is formed, the difference between the high level and the low level causes the piezoceramic driver 322 to shrink or stretch according to different level states, under the action of the signal source, the piezoceramic driver 322 makes the workpiece 4 on the heat insulation boss 324 perform feeding movement along the rotation axis direction of the scratching system 2 at the 0.19ms, the workpiece 4 on the heat insulation boss 324 stops moving at the 0.4ms when moving towards the scratching system 2, the time for stopping the movement of the workpiece 4 on the heat insulation boss 324 is 0.45ms, the scratching point is formed under the scratching cutter 23 of the scratching system 2, namely, at the 0.85ms, the piezoceramic driver 322 of the workpiece 4 feeding system 3 on the heat insulation boss 324 drives the workpiece 4 to move away from the scratching system for a period of time, returns to the initial state, and returns to the initial state at the 1.18ms.
Example 3:
on the basis of example 1, example 3 increased the bulk temperature variation of the workpiece 4, i.e., investigated the effect of the processing speed of the workpiece 4 on the material removal mechanism under different constant bulk temperature conditions. Through closed loop temperature control system and thermal insulation system, experimental apparatus can make the experiment of ultra-high speed single point scratch accomplish under different invariable body temperatures.
Referring to fig. 5, 6 and 9, a constant temperature single point scratch test device with controllable temperature further comprises a temperature control system, a heat insulation boss 324, a ceramic heating plate 9, a thermocouple 10 and a quartz heat insulation plate 8 on the basis of the embodiment 1. The quartz heat insulating sheet 8, the thermocouple 10, the ceramic heating sheet 9, the workpiece 4 are stacked on the end surface of the heat insulating boss 324 in order, and the upper mounting portion 51 and the lower mounting portion 53 of the "U" shaped connector 5 clamp the above components on the end surface of the heat insulating boss 324. Wherein, the ceramic heating plate 9 is used for heating the workpiece; the thermocouple 10 is used for detecting the temperature generated by the ceramic heating plate 9; the quartz heat insulating sheet 8 is used for reducing the transmission speed of heat to the piezoelectric ceramic driver 322; the thermally insulating boss 324 serves to further block heat transfer to the piezoceramic actuator 322.
Thermocouple 10 is a type K thermocouple. The thermocouple 10 feeds back the detected temperature to a control system which controls the temperature of the ceramic heating plate 9 through a controller to reach a set constant temperature.
Specifically, the quartz heat insulating sheet 8 is provided on one end face of the work 4 and the heat insulating boss 324, for blocking the opening of the heat insulating boss 324. A ceramic heating plate 9 is provided between the workpiece 4 and the thermocouple 10 for heating the workpiece 4 and providing a certain temperature. The thermocouple 10 is arranged between the quartz heat insulating sheet 8 and the ceramic heating sheet 9 and is used for detecting the temperature of the workpiece 4 and feeding the temperature back to the control system, and the control system controls the relay to act through the PID controller so as to control the on-off of the 220V alternating current circuit, so that closed-loop temperature control is realized, and the target is stabilized at a constant temperature. Finally, the workpiece 4 is stabilized in a set constant temperature state.
The invention adopts a closed-loop constant temperature system composed of the ceramic heating plate 9, the thermocouple 10 and the control circuit, so that the workpiece 4 is in a constant temperature state. Realizes the single point scratching experiment of controllable temperature and ultra-high speed scratching (> 100 m/s). The piezoelectric ceramic driver 322 arranged in the feeding system 3 is used for completing feeding so as to match with the ultra-high-speed scratching speed, so that ultra-high-speed single-point scratching can be realized, and subsurface repeated damage caused by repeated scratching is avoided. Compared with the prior art, the invention can effectively avoid repeated scratching caused by low-speed feeding in ultra-high-speed single-point scratching. In addition, the invention uses a constant temperature control system and a corresponding heat insulation device, so that the ultra-high speed single-point scratching experiment can be carried out at different controllable constant temperatures. Provides a feasible experimental platform for researching the material removal mechanism in the ultra-high speed grinding process. That is, the temperature of the workpiece 4 is made constant by the ceramic heating plate 9 and the K-type thermocouple 10 to analyze the removal mechanism of the material under different constant temperature conditions. The temperature control system enables the workpiece to be carried out at a constant temperature, and the variable of the temperature of the workpiece in an experiment is increased by setting different constant temperature values of the workpiece, so that the influence of different material temperatures on a material removal mechanism in the scratching process can be analyzed.
As shown in fig. 10 to 11, further, the exposed one end surface of the heat insulation boss 324 has an opening communicating with the outside, and the opening is recessed inward to form a chamber 3243 for heat exchange, and both opposite side walls of the heat insulation boss 324 have an air inlet 3241 and an air outlet 3242, respectively.
Specifically, the heat insulation boss 324 has a hollow chamber 3243, and an air inlet 3241 and an air outlet 3242 communicating with the chamber are respectively provided on front and rear sidewalls of the heat insulation boss 324. The cooling gas supply device 11 introduces cooling gas into the chamber through the gas inlet 3241, exchanges heat with the inner wall of the heat insulation boss 324 (see fig. 11), and discharges hot gas through the gas outlet 3242 on the other side after the heat exchange. During the cooling gas heat exchange process, the gas absorbs heat in the side wall of the heat insulation boss 324, thereby isolating the heat source from transmitting to the piezoelectric ceramic driver 322 and protecting the piezoelectric ceramic driver 322 from high temperature damage. In addition, the thermal insulation boss 324 avoids thermal expansion of the experimental device caused by a heat source, and solves the problem that the tool setting is difficult due to thermal expansion under the heating condition.
A single point scratch test method based on a constant temperature single point scratch test device controls a feeding system 3 to feed a workpiece 4 towards a scratch system 2 to form a single point scratch mark on the surface of the workpiece 4 when the scratch system 2 rotates along the rotation axis of the scratch system at a linear speed of more than 100m/s. By varying the temperature control system, the temperature environment of the workpiece 4 is controlled to ensure that the workpiece 4 is an experiment performed at different temperatures.
Specifically, the method comprises the following steps:
s1, preparing a workpiece: the workpiece 4 is fixedly mounted on the projection of the feed system 3 by means of a "U" shaped connection 5 so that the workpiece 4 is partly exposed. At the same time, the temperature control system sets the ambient temperature of the workpiece 4 as a temperature value of a certain temperature, and the mutual feedback between the thermocouple 10, the ceramic heating plate 9 and the control system ensures that the temperature of the material body of the workpiece 4 is a constant set temperature.
S2, scratching: the wiping system 2 is started to rotate along the rotation axis, and the linear speed of the wiping system 2 reaches more than 100m/s.
S3, single-point scratching: the signal generator can correspondingly output trapezoidal level signals according to the input parameters of 4 points to give the feeding movement period of the heat insulation boss 324, as shown in fig. 7, and the period of the trapezoidal level signals is equal to the single-circle rotation period of the rotary cutterhead 22, namely, the piezoelectric ceramic driver 322 drives the feeding system 3 to generate the feeding movement with the period equal to the rotation period of the rotary cutterhead.
Under the voltage driving of the piezoceramic actuator 322, the piezoceramic actuator 322 will first generate a micrometer-sized deformation toward one side of the wiping system 2 (i.e., the right side of the piezoceramic actuator 322), and the micrometer-sized deformation acts on the flexible structure 325 as a feeding amount, and the flexible structure 325 will generate a feeding amount toward the right side, and the flexible structure 325 will conduct the feeding amount to the heat insulation boss 324, so that the heat insulation boss 324 will drive the workpiece 4 disposed on the heat insulation boss 324 along the notch 323 to generate a feeding amount toward the wiping system 2 (i.e., the right side of the heat insulation boss 324). The piezoceramic actuator 322 then drives the workpiece 4 on the insulating boss 324 to move in a micrometer scale toward one side of the scratching system 2 until the workpiece 4 is scratched by the diamond cutter 231 on the scratching system 2. Then, the flexible structure 325 is moved to the left to restore the original state, and the flexible structure 325 pulls the insulation boss 324 to the left during the restoration process to move to the left along the notch 323 to restore to the original position (i.e., the position before no feeding).
S4, finishing a scratch experiment.
In this embodiment, the feed motion period is the difference between the parameter of the fourth point of the signal source input and the parameter of the first point of the signal source input. Wherein the period of the feed motion is equal to the period T of the rotation of the wiping system 2, ensuring that the wiping tool 23 of the wiping system 2 forms a single point of single wiping on the workpiece 4.
S5, changing a constant temperature value.
By changing the target temperature set value in the PID controller, the closed-loop control circuit controls the ceramic heating plate 9 to control the temperature according to the measured temperature of the thermocouple 10, so that the body temperature of the workpiece 4 reaches the target temperature value set in the PID controller. Repeating the steps S1-S4 for a plurality of times to obtain a plurality of groups of experimental results, and analyzing the influence of different material temperatures on a material removal mechanism through the results of the plurality of experiments.
Further, the workpiece 4 in step S1 is sheet-shaped and has a thickness of less than 3mm.
In the description of the present invention, it should be understood that the terms "first," "second," and the like are used for descriptive purposes only and are not to be construed as indicating or implying a relative importance or number of technical features indicated. Thus, a feature defining "a first" or "a second" may explicitly or implicitly include one or more such feature. In the description of the present invention, the meaning of "a plurality" is two or more, unless explicitly defined otherwise.
In the present invention, unless explicitly specified and limited otherwise, the terms "mounted," "connected," "secured," and the like are to be construed broadly, and may be, for example, fixedly connected, detachably connected, or integrally formed; can be mechanically or electrically connected; can be directly connected or indirectly connected through an intermediate medium; may be a communication between two elements or an interaction between two elements. The specific meaning of the above terms in the present invention can be understood by those of ordinary skill in the art according to the specific circumstances.
In the present invention, unless expressly stated or limited otherwise, a first feature is "on" or "under" a second feature, which may be in direct contact with the first and second features, or in indirect contact with the first and second features via an intervening medium. Moreover, a first feature "above," "over" and "on" a second feature may be a first feature directly above or obliquely above the second feature, or simply indicate that the first feature is higher in level than the second feature. The first feature being "under", "below" and "beneath" the second feature may be the first feature being directly under or obliquely below the second feature, or simply indicating that the first feature is level lower than the second feature.
In the description of the present specification, the terms "one embodiment," "some embodiments," "examples," "particular examples," or "some examples," etc., refer to particular features, structures, materials, or characteristics described in connection with the embodiment or example as being included in at least one embodiment or example of the present invention. In this specification, schematic representations of the above terms are not necessarily directed to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples. Furthermore, the different embodiments or examples described in this specification and the features of the different embodiments or examples may be combined and combined by those skilled in the art without contradiction.
While embodiments of the present invention have been shown and described above, it will be understood that the above embodiments are illustrative and not to be construed as limiting the invention, and that alterations, modifications, substitutions and variations may be made in the above embodiments by those skilled in the art within the scope of the invention.
Claims (6)
1. A feed system for constant temperature single point scratch experimental apparatus, feed system (3) set up in one side of grinding machine (1) of single point scratch experimental apparatus, its characterized in that: a piezoelectric ceramic driver (322) is arranged in the feeding system (3) and is used for driving a workpiece (4) arranged at one end of the feeding system (3);
the scratching system (2) at the other side of the grinding machine (1) rotates around the rotation axis of the scratching system, so that the scratching cutter (23) on the scratching system (2) has a rotation linear speed of more than 100 m/s;
-defining the time required for a single movement of the workpiece (4) sequentially towards, towards and away from the wiping system, driven by the piezoceramic actuator (322), as a feed movement period, which is equal to the rotation period of the wiping system (2);
a cavity is formed in the feeding system (3), one end of the piezoelectric ceramic driver (322) is fixedly arranged at one end of the cavity, a flexible structure (325) is arranged at the other end of the cavity, the flexible structure (325) and the cavity divide the feeding system (3) into a main body part and a mounting part, the mounting part extends outwards to form a protruding part, and the protruding part is used for mounting the workpiece (4);
the feeding system (3) comprises a piezoelectric ceramic outer frame (321), wherein a flexible structure (325) is arranged on one side of the piezoelectric ceramic outer frame (321) facing the scratching system (2), and a heat insulation boss (324) is arranged on one side of the flexible structure (325); the piezoelectric ceramic driver (322) is arranged in the piezoelectric ceramic outer frame (321), and the piezoelectric ceramic passes through the piezoelectric ceramic outer frame (321) through a lead to be connected with an external power supply; the piezoelectric ceramic driver (322) contracts or expands according to different level states under the state of being connected with an external signal generator, so that the heat insulation boss (324) moves in a feeding manner along the rotating axial direction of the scratching system (2); the heat insulation boss (324) passes through the notch (323) and extends outwards to form the protruding part; further comprising a temperature control system in contact with the workpiece (4) for providing a constant temperature condition for the workpiece (4);
the temperature control system comprises a quartz heat insulation sheet (8), a ceramic heating sheet (9), a thermocouple (10) and a constant temperature control system;
the quartz heat insulation sheet (8) is arranged between the workpiece (4) and the end face of the heat insulation boss (324) and is used for sealing the opening of the heat insulation boss (324);
the ceramic heating plate (9) is arranged between the workpiece (4) and the quartz heat insulation plate (8) and is used for heating the workpiece (4);
the thermocouple (10) is arranged between the ceramic heating plate (9) and the quartz heat insulation plate (8) and is used for detecting the temperature of the workpiece (4) and feeding back the temperature to the constant temperature control system, and the constant temperature control system controls the temperature rise or the temperature fall of the ceramic heating plate (9) through the controller;
the workpiece (4) is arranged on one end face of the heat insulation boss (324) facing the scratching system (2), and the workpiece (4) is fixedly installed on the heat insulation boss (324) through a connecting piece (5).
2. The feed system of claim 1, wherein: the exposed end face of the heat insulation boss (324) is provided with an opening communicated with the outside, the opening is recessed inwards to form a cavity (3243) for heat exchange, and two opposite side walls of the heat insulation boss (324) are respectively provided with an air inlet (3241) and an air outlet (3242).
3. The feed system of claim 1, wherein: the thermocouple (10) is a K-type thermocouple (10).
4. A constant temperature single point scratch experimental apparatus, its characterized in that: comprising a grinding machine (1), a scratching system (2) and a feeding system according to any of claims 1-3.
5. The constant temperature single point scratch test device of claim 4, wherein: the piezoelectric ceramic outer frame is characterized by further comprising a force measuring instrument (6), wherein a connecting plate (7) is arranged between the force measuring instrument (6) and the piezoelectric ceramic outer frame (321), and two end faces of the connecting plate (7) are respectively fixed with the force measuring instrument (6) and the piezoelectric ceramic outer frame (321).
6. A single point scratch test method based on the constant temperature single point scratch test device of claim 5, which is characterized in that:
controlling the environment of the workpiece (4) to be at a constant temperature through the temperature control system, and controlling the feeding system (3) to feed the workpiece (4) towards the scratching system (2) when the scratching system (2) rotates along the rotation axis of the workpiece at a linear speed of more than 100m/s so as to form a single-point scratching mark on the surface of the workpiece (4); by varying the temperature control system, the temperature environment of the workpiece (4) is controlled to ensure that the workpiece (4) is an experiment performed at different temperatures.
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