CN114196929A - Processing method of lithium ion battery collector film - Google Patents
Processing method of lithium ion battery collector film Download PDFInfo
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- CN114196929A CN114196929A CN202111495482.9A CN202111495482A CN114196929A CN 114196929 A CN114196929 A CN 114196929A CN 202111495482 A CN202111495482 A CN 202111495482A CN 114196929 A CN114196929 A CN 114196929A
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- film
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- sputtering
- coating
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/20—Metallic material, boron or silicon on organic substrates
- C23C14/205—Metallic material, boron or silicon on organic substrates by cathodic sputtering
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M4/00—Electrodes
- H01M4/02—Electrodes composed of, or comprising, active material
- H01M4/64—Carriers or collectors
Abstract
The invention provides a processing method of a lithium ion battery collector film, which can avoid using an electroplating technology with environmental pollution and ensure the quality of products. Which comprises the following steps: s1: placing the polymer film as a substrate on a substrate transport device; s2: in a vacuum environment, a base material conveying device carries a base material to enter a mirror magnetron sputtering coating area for carrying out a coating process of a copper base film; finishing a film coating process of a copper bottom film in a mirror image magnetron sputtering film coating area based on a rotary mirror image target magnetron sputtering technology; s3: after the film plating process of the copper base film is finished, the base material is continuously transported to a first high-speed airflow sputtering film plating area under the same vacuum environment by the base material transporting device to finish the film plating process of the thickening layer; and in the first high-speed airflow sputtering coating area, finishing the coating process of the thickening layer based on an airflow sputtering deposition technology.
Description
Technical Field
The invention relates to the technical field of lithium battery processing, in particular to a processing method of a lithium ion battery collector film.
Background
A lithium battery is a battery commonly used in daily life. Therefore, safety and energy density of lithium ion batteries are important parameters in the use of lithium batteries. In a more common lithium battery construction, a thin film stack of multiple thin films of material for the electrodes (anode, cathode), current collectors or collectors (anode current collector, cathode current collector), and separator membranes, with the extensions of the collector film on each front side forming the cell's pole contacts. As shown in fig. 1, a collector film of a lithium battery in the related art is generally composed of a polymer film 1 and a metallic copper film 2 plated on the polymer film 1. However, the current preparation of the metal-plated polymer film adopts the electroplating technology, inevitably faces a plurality of environmental protection problems, and the development of the electroplating technology route is bound in the current society with increasingly strict environmental regulations, thereby influencing the use of the product.
Disclosure of Invention
In order to solve the problem that the production and use of a product are limited due to environmental pollution caused by a coating process of a lithium battery collector film in the prior art, the invention provides a processing method of the lithium battery collector film, which can avoid the use of an electroplating technology with environmental pollution and ensure the quality of the product.
The technical scheme of the invention is as follows: a processing method of a lithium ion battery collector film comprises the following steps:
s1: placing the polymer film as a substrate on a substrate transport device;
it is characterized by also comprising the following steps:
s2: in a vacuum environment, the base material conveying device carries a base material to enter a mirror magnetron sputtering coating area for carrying out a coating process of a copper base film;
finishing a film coating process of a copper bottom film in the mirror image magnetron sputtering film coating area based on a rotary mirror image target magnetron sputtering technology;
s3: after the film plating process of the copper bottom film is finished, the base material conveying device continuously conveys the base material to a first high-speed airflow sputtering film plating area under the same vacuum environment to finish the film plating process of a thickening layer;
and finishing the coating process of the thickening layer in the first high-speed airflow sputtering coating area based on an airflow sputtering deposition technology.
It is further characterized in that:
it further comprises step S4:
s4: after the coating process of the thickening layer is finished, the base material conveying device continues to convey the base material to a second high-speed airflow sputtering coating area under the same vacuum environment, and the coating process of the protective film is finished based on an airflow sputtering deposition technology;
the thickening layer in the step S3 is a copper film or a copper-nickel alloy plated film;
the protective film in the step S4 is a copper-nickel alloy coating film;
the thickness range of the copper bottom film is as follows: 30-100 nanometers, wherein the thickness range of the thickening layer is as follows: 800-900 nm, the thickness range of the protective film is as follows: 300 to 500 nm.
According to the processing method of the lithium ion battery collector electrode film, the product is manufactured based on the rotary mirror target magnetron sputtering technology and the hollow cathode airflow sputtering technology in a vacuum environment, the previous two-step process of vacuum coating and electroplating is changed into a one-step process of a full vacuum process, and the process flow is simplified; the whole manufacturing process is connected in a full vacuum environment, no impurity and pollutant enters, the quality of a film finished product is guaranteed, meanwhile, any pollutant is discharged in the whole manufacturing process, and any process link with pollution possibility including electroplating is not contained, so that the production process of the product completely meets the national requirements, and the product is not limited by the development of process reasons.
Drawings
FIG. 1 is a schematic view of a structure of a collector film in the prior art;
fig. 2 is a schematic view of the structure of a single-sided collector film in the present invention;
fig. 3 is a schematic view of the structure of a double-sided collector film in the present invention;
FIG. 4 is a schematic view of a processing sequence according to the present invention;
FIG. 5 is a schematic structural view of a rotary mirror target magnetron sputtering device for coating a copper base film;
FIG. 6 is a schematic view showing the structure of a high-speed airflow sputter coating apparatus for coating a thickening layer and a protective film.
Detailed Description
The invention relates to a processing method of a lithium ion battery collector film, which comprises the following steps:
s1: placing the polymer film as a substrate on a substrate transport device;
s2: in a vacuum environment, a base material conveying device carries a base material to enter a mirror magnetron sputtering coating area for carrying out a coating process of a copper base film;
finishing a film coating process of a copper bottom film in a mirror image magnetron sputtering film coating area based on a rotary mirror image target magnetron sputtering device;
s3: after the film plating process of the copper base film is finished, the base material is continuously transported to a first high-speed airflow sputtering film plating area under the same vacuum environment by the base material transporting device to finish the film plating process of the thickening layer;
in the high-speed airflow sputtering coating area, the coating process of the thickening layer is completed based on an airflow sputtering deposition technology, also called as a hollow cathode airflow sputtering technology in the document;
the thickening layer in the first high-speed airflow sputtering coating area can be a copper film or a copper-nickel alloy coating;
s4: after the film coating process of the thickening layer is finished, the base material conveying device continues to convey the base material to a second high-speed airflow sputtering film coating area under the same vacuum environment, and the film coating process of the protective film is finished based on the airflow sputtering deposition technology; the protective film is a copper-nickel alloy coating film.
As shown in fig. 4, in actual production, the polymer film 1 is sequentially subjected to low-damage mirror magnetron sputtering coating, first high-speed airflow sputtering coating and second high-speed airflow sputtering coating in sequence under high vacuum, and the coating (thickness of 30 to 100 nm) of the copper base film 3, the coating (thickness of 800 to 900 nm) of the pure copper thickening layer 4 or the copper-nickel alloy thickening layer 4, and the coating (thickness of 300 to 500 nm) of the protective film 5 are respectively completed.
The polymer film 1 is coated in the mirror image magnetron sputtering coating area based on the rotary mirror image target magnetron sputtering equipment 6, and the rotary mirror image target magnetron sputtering equipment 6 with double-sided coating or single-sided coating can be selected according to actual needs. As shown in fig. 5, the number of the substrate transport devices 7 is 1, and the substrate transport devices are arranged on one side of the first rotating target column 6-1 and the second rotating target column 6-2; the other sides of the first rotating target column 6-1 and the second rotating target column 6-2 are provided with a film coating baffle 6-3 for blocking particles sputtered in the other direction.
The polymer film 1 is placed on a film coating surface 7-1 of a base material conveying device 7, and magnetic fields of the two target columns are superposed between the first rotating target column 1 and the second rotating target column 2 to form a non-electric neutral sputtering particle magnetic confinement area, namely a high-energy plasma confinement area 6-5; sputtering the target materials on the two rotating target posts in a magnetic field to generate high-speed particles 6-6 and low-speed particles 6-4; the superimposed magnetic field existing between the two target posts can bend the movement distance of the charged particles moving in the target posts, and the bending amplitude is related to the charge quantity, the movement speed and the magnetic field intensity; on the premise that the magnetic field and the electric quantity are certain, high-speed particles 6-6 with high movement speed, namely high-energy particles, have large deflection amplitude, can be sputtered onto the opposite target material, and cannot be separated from the superposed magnetic field to reach the coating substrate material; and the low-speed particles 6-4, namely low-energy particles, have small deflection amplitude and can contact and attach to the film-coated substrate to finish film coating.
The substrate material is coated based on the low-energy particles, and the high-energy particles cannot be sputtered onto the substrate material, so that the temperature of the substrate material cannot be increased, and the polymer film 1 cannot be thermally damaged; meanwhile, the coating is carried out based on the low-speed particles 6-4, the particles are sputtered onto the substrate material at a low speed, the thorough material cannot be damaged, and the polymer film 1 is prevented from being bombarded and damaged; namely, when the low-damage mirror magnetron sputtering coating is carried out, a compact metal copper film with relatively strong adhesive force is formed on the polymer film as a base film layer, the thickness is about 30-100 nanometers, and ion bombardment damage and thermal damage can not be caused to the polymer film; compared with the polymer film 1 based on other copper plating films, the polymer film 1 and the copper bottom film 3 in the technical scheme have better performance and use safety.
Coating films in the first high-speed airflow sputtering coating area and the second high-speed airflow sputtering coating area respectively based on the high-speed airflow sputtering coating equipment 8; the high-speed airflow sputtering coating device 8 completes the coating process of the thickening layer 4 and the protective film 5 by using an airflow sputtering (GFS) deposition technology based on a Hollow cathode glow discharge principle.
As shown in fig. 6, the sputtering target 8-1 has a Hollow cathode form, and generates extremely high density of electrons based on a Hollow Cathode Discharge (HCD) effect; the glow discharge of the sputter target 8-1 is initiated by a supply voltage 8-3, the sputter target 8-1 being usually in the form of two rectangular plates arranged in parallel or in the form of a short tube; the gas supply device 8-2 supplies a working gas 8-6 flowing at a high speed, and argon is generally used. Working gas 8-6 flows through the sputtering target 8-1, flows in from the back opening of the hollow cathode and is discharged from the front opening, and in the process, atomized cathode material is carried and impacted on the coating surface 7-1 of the substrate conveying device 7 to form a film on the surface of the substrate placed on the atomized cathode material. The hollow cathode is cooled by a cooling system 8-4. The sputter target 8-1 is ion-atomized by the glow discharge working gas 8-6, the sputter target 8-1 intensifying the glow discharge by virtue of the geometry of its hollow cathode. Since the process pressure is relatively high, the high-energy plasma particles lose most of their energy on the way to the substrate on the substrate transport device 7, which can thus create a low stress layer.
At the opening of the hollow cathode of the sputtering target 8-1, oxygen 8-5 is supplied as a reactive gas, and a mixture of the working gas 8-6 and the atomized cathode material flows out of the hollow cathode to be mixed with the oxygen; because of the flow impact of the working gas 8-6, oxygen cannot reversely flow into the hollow cathode wall, and cathode passivation and target poisoning phenomena which are usually generated by magnetron sputtering cannot occur. Because the air flow sputtering deposition process does not need to use a magnetic field, the target is uniformly eroded, and the operation can be carried out at high power density, so that the polymer film 1 can be ensured to rapidly finish the film coating processes of the thickening layer 4 and the protective film 5 on the copper bottom film 3 respectively in the first high-speed air flow sputtering film coating area and the second high-speed air flow sputtering film coating area after the copper bottom film 3 is coated by the low-damage mirror image magnetron sputtering film coating, and further, the structural layer of the collector electrode film is ensured to be increased, but the whole process efficiency is not influenced.
The lithium ion battery collector film produced based on the present invention includes: the polymer film 1, a copper bottom film 3, a thickening layer 4 and a protective film 5 which are arranged in sequence; the copper bottom film 3 is arranged on the polymer film 1; the protective film 5 is a copper-nickel alloy layer plated film. The thickness of the polymer film 1 is 2-8 microns; the material of the polymer film 1 includes: PET film, polyimide film, ETFE, or PVDF.
The thickening layer 4 is a copper film or a copper-nickel alloy coating film, which can both ensure that the energy density requirement of the lithium battery can be met and improve the use safety of the battery. The thickening layer in the prior art is realized based on a copper mold, and pure copper is a non-noble metal material, has the best conductivity and is suitable for serving as a main conductive material of a collector film; however, pure copper is relatively unstable in performance and is easily oxidized to deteriorate the performance; the copper-nickel alloy has good oxidation resistance and good conductivity, so that the copper-nickel alloy can be used as a thickening layer to realize a conductive function, and the stability of the battery is further improved on the basis of realizing the conductivity by using the copper-nickel alloy as the thickening layer.
The copper bottom film 3, the thickening layer 4 and the protective film 5 are arranged on one side or two sides of the polymer film 1; as shown in fig. 2, a copper base film 3, a thickening layer 4 and a protective film 5 are provided on one side of a polymer film 1; as shown in fig. 3, a copper base film 3, a thickening layer 4, and a protective film 5 are provided on both sides of a polymer film 1. In specific application, single-sided coating or double-sided coating is determined according to specific requirements of products. No matter single-sided coating or double-sided coating, and no matter the thickening layer uses a copper mould or a copper-nickel alloy coating, the outermost layer uses the copper-nickel alloy coating as the protective film 5, so that the oxidation risk of the copper collector can be reduced, and the use safety of the lithium battery can be improved.
According to specific product requirements, the thickness range of the copper bottom film 3 is as follows: 30-100 nanometers, and the thickness range of the thickening layer 4 is as follows: 800-900 nm, the thickness range of the protective film 5 is as follows: 300 to 500 nm. According to the technical scheme, the copper-nickel alloy layer plated film is arranged on the outermost layer of the lithium ion battery collector film, and an anti-oxidation protective film is formed by utilizing the stability of the copper-nickel alloy, so that the oxidation risk of the copper collector is weakened or eliminated, the energy density of the lithium ion battery is maintained, and the use safety of the battery is improved.
Claims (5)
1. A processing method of a lithium ion battery collector film comprises the following steps:
s1: placing the polymer film as a substrate on a substrate transport device;
it is characterized by also comprising the following steps:
s2: in a vacuum environment, the base material conveying device carries a base material to enter a mirror magnetron sputtering coating area for carrying out a coating process of a copper base film;
finishing a film coating process of a copper bottom film in the mirror image magnetron sputtering film coating area based on a rotary mirror image target magnetron sputtering technology;
s3: after the film plating process of the copper bottom film is finished, the base material conveying device continuously conveys the base material to a first high-speed airflow sputtering film plating area under the same vacuum environment to finish the film plating process of a thickening layer;
and finishing the coating process of the thickening layer in the first high-speed airflow sputtering coating area based on an airflow sputtering deposition technology.
2. The water saturation apparatus according to claim 1, wherein: it further comprises step S4:
s4: and after the coating process of the thickening layer is finished, the base material conveying device continuously conveys the base material to a second high-speed airflow sputtering coating area under the same vacuum environment, and the coating process of the protective film is finished based on an airflow sputtering deposition technology.
3. The water saturation apparatus according to claim 1, wherein: the thickening layer in the step S3 is a copper film or a copper-nickel alloy plating film.
4. The water saturation apparatus according to claim 2, wherein: the protective film in the step S4 is a copper-nickel alloy plating film.
5. The water saturation apparatus according to claim 2, wherein: the thickness range of the copper bottom film is as follows: 30-100 nanometers, wherein the thickness range of the thickening layer is as follows: 800-900 nm, the thickness range of the protective film is as follows: 300 to 500 nm.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111495482.9A CN114196929A (en) | 2021-12-09 | 2021-12-09 | Processing method of lithium ion battery collector film |
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| Application Number | Priority Date | Filing Date | Title |
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| CN202111495482.9A CN114196929A (en) | 2021-12-09 | 2021-12-09 | Processing method of lithium ion battery collector film |
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| CN114196929A true CN114196929A (en) | 2022-03-18 |
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| CN202111495482.9A Withdrawn CN114196929A (en) | 2021-12-09 | 2021-12-09 | Processing method of lithium ion battery collector film |
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Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19513918C1 (en) * | 1995-04-12 | 1996-11-07 | Fraunhofer Ges Forschung | Method of coating submicrometer structures for highly integrated circuits |
| CN201598329U (en) * | 2010-01-12 | 2010-10-06 | 深圳森丰真空镀膜有限公司 | Twin-target magnetron sputtering device provided with gas ion sources |
| CN106981665A (en) * | 2017-04-14 | 2017-07-25 | 深圳鑫智美科技有限公司 | A kind of negative current collector, its preparation method and its application |
| CN113403595A (en) * | 2021-06-01 | 2021-09-17 | 无锡爱尔华光电科技有限公司 | Rotary mirror image target magnetron sputtering equipment |
| CN214458288U (en) * | 2020-12-31 | 2021-10-22 | 无锡爱尔华光电科技有限公司 | Magnetron sputtering coating device with high yield and low damage |
| CN113707886A (en) * | 2021-06-16 | 2021-11-26 | 浙江柔震科技有限公司 | Multifunctional composite current collector and preparation method thereof |
-
2021
- 2021-12-09 CN CN202111495482.9A patent/CN114196929A/en not_active Withdrawn
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19513918C1 (en) * | 1995-04-12 | 1996-11-07 | Fraunhofer Ges Forschung | Method of coating submicrometer structures for highly integrated circuits |
| CN201598329U (en) * | 2010-01-12 | 2010-10-06 | 深圳森丰真空镀膜有限公司 | Twin-target magnetron sputtering device provided with gas ion sources |
| CN106981665A (en) * | 2017-04-14 | 2017-07-25 | 深圳鑫智美科技有限公司 | A kind of negative current collector, its preparation method and its application |
| CN214458288U (en) * | 2020-12-31 | 2021-10-22 | 无锡爱尔华光电科技有限公司 | Magnetron sputtering coating device with high yield and low damage |
| CN113403595A (en) * | 2021-06-01 | 2021-09-17 | 无锡爱尔华光电科技有限公司 | Rotary mirror image target magnetron sputtering equipment |
| CN113707886A (en) * | 2021-06-16 | 2021-11-26 | 浙江柔震科技有限公司 | Multifunctional composite current collector and preparation method thereof |
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Application publication date: 20220318 |