CN114196916A - Preparation method of metal reflector and metal reflector - Google Patents
Preparation method of metal reflector and metal reflector Download PDFInfo
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- CN114196916A CN114196916A CN202111544476.8A CN202111544476A CN114196916A CN 114196916 A CN114196916 A CN 114196916A CN 202111544476 A CN202111544476 A CN 202111544476A CN 114196916 A CN114196916 A CN 114196916A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
- C23C14/0084—Producing gradient compositions
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/083—Oxides of refractory metals or yttrium
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/18—Metallic material, boron or silicon on other inorganic substrates
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
- C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/0808—Mirrors having a single reflecting layer
Abstract
The embodiment of the disclosure provides a preparation method of a metal reflector and the metal reflector, wherein the preparation method comprises the following steps: depositing a transition layer and a silver-nickel-chromium alloy layer on the surface of a substrate layer in sequence, wherein argon and oxygen are introduced in the process of depositing the transition layer to ensure that the oxygen content of the transition layer is changed step by step, and oxygen or nitrogen is introduced in the process of depositing the silver-nickel-chromium alloy layer to ensure that the oxygen content or the nitrogen content of the silver-nickel-chromium alloy layer is changed step by step; depositing at least one set of refractive layers on the silver-nichrome layer. The embodiment of the disclosure can realize continuous and stable production of the high-performance reflector, improve the binding force between the core silver-nickel-chromium alloy layer and the substrate layer, reduce the potential structural risk of the product, and improve the production efficiency.
Description
Technical Field
The present disclosure relates to a reflective device, and more particularly, to a method for manufacturing a metal mirror and a metal mirror.
Background
The metal reflector is widely applied to the fields of copiers, projectors, solar light-gathering power generation and the like, Ag or Al is the most commonly used functional layer for producing the reflector, and a silver-nickel-chromium alloy layer is easy to corrode, so that protective layers such as paint films are required in the actual production of the current products, and the production process of the paint film protective layer cannot meet the national requirements on environmental protection.
Subsequent people try to use a dielectric film as a protective layer and increase the reflection of the film, evaporation and other processes are generally adopted in process production, the bonding force of the film is poor due to the fact that the particle energy of the evaporation is only 0.2ev, and the metal reflector produced by the method cannot meet the use requirements of all occasions, meanwhile, the capacity is small, the cost is high, the size of a product is limited, and the market requirements cannot be well met.
The vertical magnetron sputtering equipment has the average particle energy of dozens to dozens of electron volts, the bonding force and compactness of the film layer are obviously superior to the product produced by an evaporation plating machine, and meanwhile, the environment-friendly dielectric layer can replace a pollution paint film protective layer, thereby better meeting the requirements of the times. Due to the larger size and higher production efficiency, it is possible to meet customer demands.
Because the Al reflector is low in reflectivity, the reflectivity is improved by repeatedly depositing the low-refractive-index and high-refractive-index dielectric layers subsequently, the requirement of a customer can be met, the length target position of a production line is limited, manual transfer is needed for multiple times, the production efficiency is reduced, and meanwhile, the labor cost is increased. The Ag base can be coated once to meet the requirement of customers on reflection, and simultaneously, the cost is reduced, but the Ag film has poor durability and cannot pass the double 85 test.
Disclosure of Invention
In view of this, the embodiments of the present disclosure provide a method for manufacturing a metal reflector and a metal reflector, so as to solve the problems in the prior art.
In one aspect, the present disclosure provides a method for manufacturing a metal reflector, including the steps of: depositing a transition layer and a silver-nickel-chromium alloy layer on the surface of a substrate layer in sequence, wherein argon and oxygen are introduced in the process of depositing the transition layer to ensure that the oxygen content of the transition layer is changed step by step, and oxygen or nitrogen is introduced in the process of depositing the silver-nickel-chromium alloy layer to ensure that the oxygen content or the nitrogen content of the silver-nickel-chromium alloy layer is changed step by step; depositing at least one set of refractive layers on the silver-nichrome layer.
In some embodiments, the method further comprises preparing the substrate layer, and when the substrate layer is a glass substrate, preparing the substrate layer comprises polishing the surface of the glass substrate by using a polishing solution and performing ion beam cleaning on the glass substrate.
In some embodiments, the transition layer is made of silicon oxide, and depositing the transition layer includes disposing silicon on the substrate layer and introducing argon and oxygen during deposition of the transition layer to form silicon oxide.
In some embodiments, flowing argon and oxygen during the depositing the transition layer comprises controlling a flow ratio between the argon and the oxygen through a flow valve.
In some embodiments, the causing the oxygen content of the transition layer to gradually change includes causing the oxygen content to gradually decrease from a location in the transition layer that is proximate to the substrate layer to a location that is distal to the substrate layer.
In some embodiments, depositing the silver-nichrome layer comprises sequentially depositing nichrome, silver, and nichrome on the transition layer and passing oxygen through the deposition of the silver-nichrome layer.
In some embodiments, the step-wise varying the oxygen content of the silver-nichrome layer comprises a step-wise decrease in the oxygen content or the nitrogen content of the silver-nichrome layer from a location proximate to the transition layer to a location distal from the transition layer.
In some embodiments, each of the refractive layers includes a low refractive index layer made of at least one of SiOx and Si-SiOx, and a high refractive index layer made of at least one of ZnOx, NbxOx and TiOx.
In some embodiments, the method further comprises depositing a protective layer on the silver-nichrome layer, wherein the protective layer is made of nichrome or chromium.
The embodiment of the disclosure also provides a metal reflector which is manufactured by adopting any one of the preparation methods.
According to the embodiment of the disclosure, the silver-nickel-chromium alloy layer is adopted in the reflector, so that the durability is well improved, the batch production of the silver-nickel-chromium ternary alloy layer is realized by adopting co-sputtering, the product types are reduced, and the working efficiency of the metal reflector is greatly improved.
Drawings
In order to more clearly illustrate the embodiments of the present disclosure or the technical solutions in the prior art, the drawings needed to be used in the description of the embodiments or the prior art will be briefly introduced below, it is obvious that the drawings in the following description are only some embodiments described in the present disclosure, and for those skilled in the art, other drawings can be obtained according to the drawings without creative efforts.
Fig. 1 is a schematic diagram of a method for manufacturing a metal mirror according to an embodiment of the present disclosure.
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present disclosure more clear, the technical solutions of the embodiments of the present disclosure will be described below clearly and completely with reference to the accompanying drawings of the embodiments of the present disclosure. It is to be understood that the described embodiments are only a few embodiments of the present disclosure, and not all embodiments. All other embodiments, which can be derived by a person skilled in the art from the described embodiments of the disclosure without any inventive step, are within the scope of protection of the disclosure.
Unless otherwise defined, technical or scientific terms used herein shall have the ordinary meaning as understood by one of ordinary skill in the art to which this disclosure belongs. The use of "first," "second," and similar terms in this disclosure is not intended to indicate any order, quantity, or importance, but rather is used to distinguish one element from another. The word "comprising" or "comprises", and the like, means that the element or item listed before the word covers the element or item listed after the word and its equivalents, but does not exclude other elements or items. The terms "connected" or "coupled" and the like are not restricted to physical or mechanical connections, but may include electrical connections, whether direct or indirect. "upper", "lower", "left", "right", and the like are used merely to indicate relative positional relationships, and when the absolute position of the object being described is changed, the relative positional relationships may also be changed accordingly.
To maintain the following description of the embodiments of the present disclosure clear and concise, a detailed description of known functions and known components have been omitted from the present disclosure.
A first embodiment of the present disclosure provides a method for manufacturing a metal mirror for forming a metal mirror on a surface of a core layer of an apparatus, including the steps of:
s101, sequentially depositing a transition layer and a silver-nickel-chromium alloy layer on the surface of a substrate layer, wherein argon and oxygen are introduced in the process of depositing the transition layer to enable the oxygen content of the transition layer to change gradually, and oxygen is introduced in the process of depositing the silver-nickel-chromium alloy layer to enable the oxygen content of the silver-nickel-chromium alloy layer to change gradually.
In this step, a substrate layer is first prepared, and the substrate layer may be, for example, a glass substrate, or may be a substrate layer made of other materials. The substrate layer, such as the glass substrate, needs to be polished and cleaned in the process of preparing the substrate layer, for example, a polishing solution such as cerium oxide may be added to a disc brush part of a cleaning machine to polish the surface of the glass substrate, so as to obtain the polished glass substrate, and then the glass substrate is sent into a vacuum coating chamber to be subjected to ion beam cleaning, so as to prepare the glass substrate.
Further, in the structure of depositing multiple film layers on the substrate layer after the preparation, the deposition of any film layer related to the embodiment of the present disclosure may be implemented by using a vertical magnetron sputtering coating apparatus, the deposition process is as shown in fig. 1, a separate deposition device for depositing different film layers may be disposed in the vertical magnetron sputtering coating apparatus, and the substrate layer, such as a glass substrate, enters different coating chambers at a traveling speed of 0.5-1.5m/min along an arrow direction to perform the deposition process. Specifically, in this step, a transition layer and a silver-nickel-chromium alloy layer are deposited on the surface of the substrate layer, wherein the transition layer is used for improving the bonding force between the silver-nickel-chromium alloy layer and the substrate layer, and the transition layer can be made of materials such as silicon oxide.
During the deposition of the transition layer, the deposition of silicon oxide is realized, for example, by means of reactive sputtering, specifically, silicon (Si) is firstly disposed on the substrate layer, and argon and oxygen are introduced during the deposition of the transition layer to form silicon oxide (SiOx). In the deposition process, at least two gas pipes are arranged at the part for depositing the transition layer in the vertical magnetron sputtering coating equipment, a flow valve is arranged on the gas pipes, the gas pipes are used for injecting argon and oxygen in the direction of the substrate layer, and the flow ratio between the argon and the oxygen can be controlled through the flow valve. Here, the thickness of the transition layer is preferably 5 to 60nm, and the total power of a deposition apparatus for depositing the transition layer is 0.5 to 40.0 kW.
And introducing argon and oxygen in the process of depositing the transition layer to ensure that the oxygen content of the transition layer is gradually changed, and particularly, the oxygen content of the transition layer from a position close to the substrate layer to a position far away from the substrate layer is gradually reduced. For this purpose, the flow rate of the oxygen gas introduced during the deposition from the lower portion to the upper portion of the transition layer may be gradually reduced while the flow rate of the argon gas introduced is kept constant. Preferably, oxygen is introduced at a lower position in the deposited transition layer, and no more oxygen is introduced beyond a certain thickness of the transition layer, so that a gradual decrease of the oxygen content is achieved from a position in the transition layer close to the substrate layer to a position far from the substrate layer.
After the substrate layer is deposited on the substrate, a silver-nickel-chromium alloy layer is deposited on the substrate layer, for this reason, the silver-nickel-chromium alloy layer is mainly made of silver, the agglomeration characteristic of silver base can realize one-time coating to meet the requirement of reflection, and simultaneously the cost is reduced, but the durability of the silver-base film layer is poor, in order to prevent silver atoms from agglomerating under the influence of the outside, as shown in fig. 1, a first nickel-chromium target (NiCr), a silver target (Ag) and a second nickel-chromium target (NiCr) are sequentially arranged in a vacuum chamber of a deposition device for the silver-nickel-chromium alloy layer to realize the deposition of a ternary alloy layer of silver-nickel-chromium, and the interface between the three metals can also be eliminated. The thickness of the silver-nichrome layer herein is 10.0 to 200.0nm, and the total power of a deposition apparatus for depositing the silver-nichrome layer is 5.0 to 20.0 kW.
Further, in the process of depositing the silver-nichrome layer, for example, the bonding force of the metal bond between three different metal atoms is far less than the bonding force of the bond formed between an oxygen atom and a metal atom, and just because the metal bond is fragile, the bonding force between the silver-nichrome layer and the transition layer and between the silver-nichrome layer and the substrate layer can be improved by heating the substrate layer, but the risk of atomic agglomeration and haze increase of the silver-nichrome layer can also be increased, for this reason, in this step, oxygen needs to be introduced in the process of depositing the silver-nichrome layer, so that the oxygen content of the silver-nichrome layer is gradually changed, and thus, the optimal bonding force in the mass production process is realized under the condition that the reflectivity of the metal mirror is qualified, thereby improving the yield of finished products. Specifically, the oxygen content in the silver-nickel chromium alloy layer is gradually reduced from a position close to the transition layer to a position far from the transition layer.
For this purpose, at least one gas pipe is arranged at the part for depositing the silver-nickel-chromium alloy layer in the vertical magnetron sputtering coating equipment in the deposition process, and the gas pipe is used for spraying oxygen towards the direction of the transition layer, so that when the equipment core layer of the metal reflector to be prepared advances to the position for depositing the silver-nickel-chromium alloy layer, the silver-nickel-chromium alloy reacts with the oxygen along with the introduction of the oxygen to prevent agglomeration and haze increase, and the optimal bonding force is realized.
In order to ensure the formation of the metal oxide or the metal nitride, the number of the gas pipes may be set as required, and oxygen or nitrogen is introduced during the deposition of the silver-nickel-chromium alloy layer, so that the oxygen content of the silver-nickel-chromium alloy layer is gradually changed, and particularly, the oxygen content is gradually reduced from a position close to the transition layer to a position far away from the transition layer in the silver-nickel-chromium alloy layer. For this purpose, the flow rate of oxygen or nitrogen gas introduced during deposition from the lower portion to the upper portion of the silver-nichrome layer is gradually reduced. Preferably, the oxygen or nitrogen is introduced at a certain flow rate at a lower position in the deposited silver-nichrome layer, and the flow rate of the introduced oxygen or nitrogen is reduced when the deposition exceeds a predetermined thickness of the silver-nichrome layer, thereby achieving a gradual reduction in oxygen content from a position in the silver-nichrome layer near the transition layer to a position far from the transition layer.
In the prior art, a silver-nickel chromium alloy layer such as aluminum is deposited on the transition layer, but because the reflectivity of aluminum is low, a plurality of reflecting layers have to be added to meet the use requirement, but because the length and the target position of a production line are limited, a secondary or even third plating film increase is caused, the product line is complicated, and the cost of the aspects of sale, inventory, production and the like is increased. However, the silver layer is easy to agglomerate and generate haze, so that the problem is perfectly solved after the silver-nickel chromium alloy layer is introduced.
Preferably, in order to ensure the deposition effect of the silver-nickel-chromium alloy layer, a protective layer may be deposited on the silver-nickel-chromium alloy layer, the step of depositing the protective layer may be added according to the product requirements, and the protective layer may be made of nickel-chromium alloy (NiCr) or chromium (Cr). Wherein, the thickness of the protective layer can be added and adjusted according to the requirements of the final product, and the thickness of the protective layer can be 5.0-50.0 nm.
S102, depositing at least one group of refraction layers on the silver-nickel-chromium alloy layer.
After the silver-nichrome layer is formed through the above-described step S102, at least one set of refractive layers is deposited on the silver-nichrome layer,
it is of course also possible to deposit multiple sets of refractive layers on the silver-nichrome layer, for example two, three or more iterations may be performed as required, thus forming two, three or more sets of said refractive layers. In one embodiment, two sets of refractive layers are formed by deposition, where each set of the refractive layers includes a low refractive index layer and a high refractive index layer. Wherein, the low refractive index layer is an oxide layer, such as SiOx, Si-SiOx and the like, in addition, the total power of a deposition device for depositing the low refractive index layer is 5.0-35.0kW, and the thickness of the low refractive index layer formed by deposition is 10-100 nm; the high refractive index layer is an oxide layer, such as ZnOx, NbxOx, TiOx, etc., and the total power of a deposition apparatus for depositing the high refractive index layer is selected to be 10.0-50.0kW, and the thickness of the high refractive index layer deposited is 10-100 nm.
A second embodiment of the present disclosure provides a metal mirror made by any one of the manufacturing methods described in the first embodiment above. The reflectivity test in the visible light range is carried out on the metal reflector prepared by the first embodiment, specifically comprising the salt spray test and the double 85 test, and the results of the salt spray test and the constant temperature and humidity test show that the silver-nickel chromium alloy layer has no obvious difference with the silver-nickel chromium alloy layer, and both the requirements and relevant standards for reflection are met.
In a specific embodiment, to manufacture the metal mirror, the substrate layer of the metal mirror herein has a thickness of 3mm, the transition layer has a thickness of 10nm, the silver-nickel-chromium alloy layer has a thickness of 75nm, the low refractive index layer has a thickness of 25nm, and the high refractive index layer has a thickness of 79 nm.
For this purpose, the following operation steps are carried out:
(1) preparing and cleaning a glass substrate, adding polishing liquid such as cerium oxide and the like into a disc brush part of a cleaning machine to polish the surface of the glass substrate and obtain a polished glass surface; and (4) entering a vacuum coating cavity for ion beam cleaning.
(2) Then, sequentially putting the glass substrate into a plurality of coating chambers, firstly depositing a transition layer of silicon oxide, setting the total power of a deposition device to be 10kW, and depositing the transition layer to be 10 nm;
(3) putting the glass substrate into a coating chamber for depositing a silver-nickel-chromium alloy layer, depositing the silver-nickel-chromium alloy layer, setting the total power of a deposition device to be 10kW, and depositing the silver-nickel-chromium alloy layer with the thickness of 75 nm;
(4) and (2) putting the glass substrate into a coating chamber for depositing a refraction layer, depositing a silicon oxide refractive index layer, setting the total power of a deposition device to be 15kW, depositing the thickness of the low refractive index layer to be 25nm, depositing a zinc oxide refractive index layer, setting the total power of the deposition device to be 40kW, and depositing the thickness of the low refractive index layer to be 79 nm.
According to the embodiment of the disclosure, the silver-nickel-chromium alloy layer is adopted in the reflector, so that the durability is well improved, the batch production of the silver-nickel-chromium ternary alloy layer is realized by adopting co-sputtering, the product types are reduced, and the working efficiency of the metal reflector is greatly improved.
Further, while operations are depicted in a particular order, this should not be understood as requiring that such operations be performed in the particular order shown or in sequential order. Under certain circumstances, multitasking and parallel processing may be advantageous. Likewise, while several specific implementation details are included in the above discussion, these should not be construed as limitations on the scope of the disclosure. Certain features that are described in the context of separate embodiments can also be implemented in combination in a single embodiment. Conversely, various features that are described in the context of a single embodiment can also be implemented in multiple embodiments separately or in any suitable subcombination.
Although the subject matter has been described in language specific to structural features and/or methodological acts, it is to be understood that the subject matter defined in the appended claims is not necessarily limited to the specific features or acts described above. Rather, the specific features and acts described above are disclosed as example forms of implementing the claims.
While the present disclosure has been described in detail with reference to the embodiments, the present disclosure is not limited to the specific embodiments, and those skilled in the art can make various modifications and alterations based on the concept of the present disclosure, and the modifications and alterations should fall within the scope of the present disclosure as claimed.
Claims (10)
1. A method for preparing a metal reflector is characterized by comprising the following steps:
depositing a transition layer and a silver-nickel-chromium alloy layer on the surface of a substrate layer in sequence, wherein argon and oxygen are introduced in the process of depositing the transition layer to ensure that the oxygen content of the transition layer is changed step by step, and oxygen or nitrogen is introduced in the process of depositing the silver-nickel-chromium alloy layer to ensure that the oxygen content or the nitrogen content of the silver-nickel-chromium alloy layer is changed step by step;
depositing at least one set of refractive layers on the silver-nichrome layer.
2. The method of claim 1, further comprising preparing the substrate layer, wherein when the substrate layer is a glass substrate, preparing the substrate layer comprises passing a polishing liquid to achieve surface polishing of the glass substrate and ion beam cleaning of the glass substrate.
3. The method of claim 1, wherein the transition layer is made of silicon oxide, and depositing the transition layer comprises disposing silicon on the substrate layer and introducing argon and oxygen during deposition of the transition layer to form silicon oxide.
4. The method of claim 3, wherein flowing argon and oxygen during depositing the transition layer comprises controlling a flow ratio between the argon and the oxygen through a flow valve.
5. The method of claim 1, wherein the step-wise varying the oxygen content of the transition layer comprises a step-wise decreasing the oxygen content from a location in the transition layer that is proximate to the substrate layer to a location that is distal to the substrate layer.
6. The method of claim 1, wherein depositing the silver-nichrome layer comprises sequentially depositing nichrome, silver, and nichrome on the transition layer and introducing oxygen during the deposition of the silver-nichrome layer.
7. The method of claim 1, wherein said step-wise varying the oxygen content of the silver-nickel chromium alloy layer comprises step-wise decreasing the oxygen content or the nitrogen content of the silver-nickel chromium alloy layer from a location proximate to the transition layer to a location distal from the transition layer.
8. The method according to claim 1, wherein each group of the refractive layers includes a low refractive index layer made of at least one of SiOx and Si-SiOx and a high refractive index layer made of at least one of ZnOx, NbxOx and TiOx.
9. The method of claim 1, further comprising depositing a protective layer on the silver-nichrome layer, wherein the protective layer is made of nichrome or chromium.
10. A metal mirror produced by the production method according to any one of claims 1 to 9.
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Citations (11)
| Publication number | Priority date | Publication date | Assignee | Title |
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